Patent application number | Description | Published |
20090011341 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - To provide a reflective mask blank for EUV lithography having an absorber layer, which presents a low reflectance to a light in the wavelength ranges of EUV light and pattern inspection light, and which is easily controlled to have desired film composition and film thickness. | 01-08-2009 |
20100304283 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - A reflective mask blank for EUV lithography is provided which has an absorber layer wherein stress and crystal structure can be easily controlled. | 12-02-2010 |
20110104595 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND MASK FOR EUV LITHOGRAPHY - Provision of an EUV mask whereby an influence of reflected light from a region outside a mask pattern region is suppressed, and an EUV mask blank to be employed for production of such an EUV mask. | 05-05-2011 |
20110171566 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - A reflective mask blank for EUV lithography having an absorbing layer which has a low reflectivity with respect to wavelength regions of EUV light and pattern inspection light, and which is easily controllable to obtain desired film composition and film thickness. | 07-14-2011 |
20110200920 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - A reflective mask blank for EUV lithography having a low-reflective layer which has a low reflectivity with respect to wavelengths of EUV light and a mask pattern inspection light and which satisfies a predetermined reflectivity (405 nm: <40%, 600 to 650 nm: 30 to 50%, 800 to 900 nm: >50%, 1,000 to 1,200 nm: <90%) in a wavelength region (400 to 1,200 nm) required for the mask production process and the pattern transcription process. | 08-18-2011 |
20120107733 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - Provision of a reflective mask blank for EUV lithography having an absorber layer having optical constants suitable for reducing the film thickness. | 05-03-2012 |
20120322000 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME - To provide an EUV mask blank provided with a low reflective layer, which has excellent properties as an EUV mask blank. A reflective mask blank for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light, an absorber layer for absorbing EUV light and a low reflective layer to an inspection light (wavelength: 190 to 260 nm) for a mask pattern, formed in this order on the substrate, wherein the low reflective layer has a stacked structure having a first layer containing at least 95 at % in total of silicon (Si) and nitrogen (N), and a second layer containing at least 95 at % in total of tantalum (Ta), oxygen (O) and nitrogen (N) or a second layer containing at least 95 at % in total of tantalum (Ta) and nitrogen (N), stacked in this order from the absorber layer side. | 12-20-2012 |
20140335215 | BLANK FOR NANOIMPRINT MOLD, NANOIMPRINT MOLD, AND METHODS FOR PRODUCING SAID BLANK AND SAID NANOIMPRINT MOLD - The present invention relates to a blank for a nanoimprint mold, comprising a glass substrate and a hard mask layer formed on the glass substrate, wherein the hard mask layer contains chromium (Cr) and nitrogen (N) and has a Cr content of 45 to 95 at %, an N content of 5 to 55 at % and a total content of Cr and N of 95 at % or more and the thickness of the hard mask layer is 1.5 nm or more and less than 5 nm. | 11-13-2014 |
Patent application number | Description | Published |
20080258118 | Colored composite microparticles, process for producing the colored composite microparticles, colorant, color filter and ink for ink-jet printing - There are provided colored composite microparticles having a fine primary particle diameter and exhibiting a high tinting strength, an excellent dispersibility and an excellent light fastness; a process for producing the colored composite microparticles; and a dispersion of the colored composite microparticles. The colored composite microparticles are composite particles comprising silica and an organic pigment in which the silica is enclosed in the organic pigment and contained in an amount of 0.001 to 9% by weight (calculated as Si) based on the weight of the composite particles. The coloring composition for color filters is prepared by dispersing a colorant for color filters comprising the colored composite microparticles in a coloring composition base material, whereas the ink for ink-jet printing is prepared by dispersing a colorant for inks for ink-jet printing comprising the colored composite microparticles in an ink base solution. The colored composite microparticles have a high tinting strength and are excellent in dispersibility and light fastness, and therefore, can be suitably used in various applications such as ordinarily used paints, printing inks, etc., irrespective of an aqueous system or a solvent system. | 10-23-2008 |
20090017384 | Process for producing composite cathode active material for non-aqueous electrolyte secondary cell - The present invention relates to a process for producing a composite cathode active material for a non-aqueous electrolyte secondary cell which is subjected to surface treatment, comprising:
| 01-15-2009 |
20090042064 | NON-MAGNETIC PARTICLES FOR NON-MAGNETIC UNDERCOAT LAYER OF MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM - The present invention relates to non-magnetic particles for non-magnetic undercoat layer of magnetic recording medium, comprising: hematite particles; an inner coating layer comprising a phosphorus-containing inorganic compound which is formed on a surface of the respective hematite particles; and an outer coating layer comprising an aluminum-containing inorganic compound which is formed on an outside of the inner coating layer comprising the phosphorus-containing inorganic compound. | 02-12-2009 |
20090220823 | FERROMAGNETIC METAL PARTICLES AND PROCESS FOR PRODUCING THE SAME, AND MAGNETIC RECORDING MEDIUM - The present invention relates to ferromagnetic metal particles having a bulk density (ρa) of not more than 0.25 g/cm | 09-03-2009 |
20110068307 | Colored composite microparticles, process for producing the colored composite microparticles, colorant, color filter and ink for ink-jet printing - There are provided colored composite microparticles having a fine primary particle diameter and exhibiting a high tinting strength, an excellent dispersibility and an excellent light fastness; a process for producing the colored composite microparticles; and a dispersion of the colored composite microparticles. The colored composite microparticles are composite particles comprising silica and an organic pigment in which the silica is enclosed in the organic pigment and contained in an amount of 0.001 to 9% by weight (calculated as Si) based on the weight of the composite particles. The coloring composition for color filters is prepared by dispersing a colorant for color filters comprising the colored composite microparticles in a coloring composition base material, whereas the ink for ink-jet printing is prepared by dispersing a colorant for inks for ink-jet printing comprising the colored composite microparticles in an ink base solution. The colored composite microparticles have a high tinting strength and are excellent in dispersibility and light fastness, and therefore, can be suitably used in various applications such as ordinarily used paints, printing inks, etc., irrespective of an aqueous system or a solvent system. | 03-24-2011 |
20120164320 | MANUFACTURING METHOD OF SOFT MAGNETIC MATERIAL AND MANUFACTURING METHOD OF DUST CORE - A manufacturing method of a soft magnetic material has a step of preparing a metal magnetic particle containing iron as the main component, and a step of forming an insulating film surrounding the surface of the metal magnetic particle. The step of forming the insulating film includes a step of mixing and stirring the metal magnetic particle, aluminum alkoxide, silicon alkoxide, and phosphoric acid. | 06-28-2012 |
20140322437 | NON-MAGNETIC PARTICLES FOR NON-MAGNETIC UNDERCOAT LAYER OF MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM - The present invention relates to non-magnetic particles for non-magnetic undercoat layer of magnetic recording medium, comprising: hematite particles; an inner coating layer comprising a phosphorus-containing inorganic compound which is formed on a surface of the respective hematite particles; and an outer coating layer comprising an aluminum-containing inorganic compound which is formed on an outside of the inner coating layer comprising the phosphorus-containing inorganic compound. | 10-30-2014 |
20150064553 | NEGATIVE ELECTRODE ACTIVE SUBSTANCE PARTICLES FOR NON-AQUEOUS ELECTROLYTE SECONDARY BATTERIES AND PROCESS FOR PRODUCING THE SAME, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY - The present invention relates to a negative electrode active substance for non-aqueous electrolyte secondary batteries comprising composite particles comprising metal particles, and a thermosetting resin or a carbonized product of the thermosetting resin, the composite particles having an average particle diameter of 5 to 100 μm; and a lithium ion secondary battery using the negative electrode active substance for non-aqueous electrolyte secondary batteries. The lithium ion secondary battery of the present invention is a non-aqueous electrolyte secondary battery that is prevented from suffering from volume expansion owing to occlusion of Li therein. | 03-05-2015 |
Patent application number | Description | Published |
20080199787 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - To provide a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness. | 08-21-2008 |
20080318140 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE SAME - To provide an EUV mask blank of which the decrease in the reflectance during EUV exposure is suppressed, and a substrate with a functional film to be used for production of such an EUV mask blank. | 12-25-2008 |
20090130574 | SPUTTERING TARGET USED FOR PRODUCTION OF REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - To provide a sputtering target to be used for production of an EUV mask blank, capable of preventing particles by film peeling even when formation of a reflective multilayer film as a reflective layer and a Ru layer as a protective layer is carried out at a production level using actual machines for a large number of cycles. | 05-21-2009 |
20090253055 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE MASK BLANK - Provided are a substrate with a conductive film for an EUV mask blank in which the generation of particles due to abrasion between an electrostatic chuck and the substrate is prevented; and a substrate with a multilayer reflective film and an EUV mask blank each employing such a substrate with a conductive film. | 10-08-2009 |
20100035165 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - Provision of a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in the wavelength regions of EUV light and pattern inspection light and whose film composition and film thickness are easily controllable to desired ones. | 02-11-2010 |
20110070534 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - To provide a reflective mask blank for EUV lithography having a low reflective layer having a low reflectance in the wavelength region of EUV light and an inspection light for a mask pattern, particularly having low reflection properties in the entire wavelength region (190 to 260 nm) of an inspection light for a mask pattern, and having a high etching rate in chlorine type gas etching. | 03-24-2011 |
20130164660 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - To provide a reflective mask blank for EUV lithography having an absorber layer having optical constants suitable for reducing the thickness. A mask blank for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and palladium (Pd), and in the absorber layer, the content of tantalum (Ta) is from 10 to 80 at %, the content of palladium (Pd) is from 20 to 90 at %, and the total content of Ta and Pd is from 95 to 100 at %. | 06-27-2013 |
20130316272 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - To provide an EUV mask blank with which the etching selectivity under etching conditions for absorber layer is sufficiently high, line edge roughness after pattern formation will not be large, and a pattern with high resolution can be obtained. | 11-28-2013 |
20130323630 | SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM AND REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - To provide a substrate with a conductive film for an EUV mask blank, which has a conductive film having a low sheet resistance, excellent surface smoothness and excellent contact to an electrostatic chuck, and with which deformation of the substrate by the film stress in an EUV mask blank can be suppressed. | 12-05-2013 |
20140186752 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS PRODUCTION - A process for producing a reflective mask blank for EUV lithography (EUVL), which comprises forming a multilayer reflective film for reflecting EUV light on a film-forming surface of a substrate, then forming a protective layer for protecting the multilayer reflective film, on the multilayer reflective film, and forming an absorber layer for absorbing EUV light, on the protective layer, to produce a reflective mask blank for EUVL, wherein the multilayer reflective film is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, the absorber layer is a layer containing at least Ta and N, and after forming the Mo/Si multilayer reflective film, the protective layer is formed, and after forming a Si thin film or Si oxide thin film having a thickness of at most 2 nm on the protective layer, the absorber layer is formed. | 07-03-2014 |
20140356770 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - To provide an EUV mask blank which has an absorber layer having such a structure that the phase difference between a reflective layer and the absorber layer is in the vicinity of 180°, and the change of the phase difference between the reflective layer and the absorber layer is small to the film thick change of the absorber layer, and of which the absorber layer can be expected to be further thinner than a conventional absorber layer. | 12-04-2014 |
Patent application number | Description | Published |
20080248245 | Soft Magnetic Material, Method of Manufacturing Soft Magnetic Material, Dust Core, and Method of Manufacturing Dust Core - A soft magnetic material includes a plurality of composite magnetic particles. Each of the plurality of composite magnetic particles has a metal magnetic particle including iron, a lower film surrounding the surface of the metal magnetic particle and including a nonferrous metal, and an insulating upper film surrounding the surface of the lower film and including an inorganic compound. The inorganic compound contains at least one element of oxygen and carbon. The nonferrous metal has an affinity with at least one of oxygen and carbon that is larger than such affinity of iron. The nonferrous metal has a diffusion coefficient with respect to at least one of oxygen and carbon that is smaller than such diffusion coefficient of iron. Thus, a soft magnetic material that provides desirable magnetic properties, a method of manufacturing a soft magnetic material, a dust core, and a method of manufacturing a dust core are provided. | 10-09-2008 |
20090047519 | SOFT MAGNETIC MATERIAL, DUST MAGNETIC CORE, PROCESS FOR PRODUCING SOFT MAGNETIC MATERIAL AND PROCESS FOR PRODUCING DUST MAGNETIC CORE - The soft magnetic material includes a plurality of composite magnetic particles having a metal magnetic particle and an insulating film surrounding the surface of the metal magnetic particle. The metal magnetic particle contains iron as the main component. The insulating film contains aluminum, silicon, phosphorus, and oxygen. The insulating film satisfies the relationship 0.4≦M | 02-19-2009 |
20100255188 | SOFT MAGNETIC MATERIAL, POWDER MAGNETIC CORE AND METHOD OF MANUFACTURING SOFT MAGNETIC MATERIAL - A soft magnetic material is a soft magnetic material including a composite magnetic particle ( | 10-07-2010 |