Patent application number | Description | Published |
20080306503 | MECHANICALLY DETACHABLE VASO-OCCLUSIVE DEVICE - A device for delivering an occlusive element such as a vaso-occlusive coil includes an elongate sheath. An elongate releasing member having a distal tip or end is moveable within a lumen of the elongate sheath. A filament is provided having first and second ends with each end being fixed relative to the elongate sheath to form a loop segment. The loop segment of the filament is passed through a securing member located on the proximal end of the occlusive element. The distal tip of the elongate releasing member is inserted into the portion of the loop segment that passes through the securing member to lock the occlusive element relative to the elongate sheath. The occlusive element is released by pulling the elongate releasing member proximally to retract the distal tip from the loop segment of the filament. | 12-11-2008 |
20080306504 | MECHANICALLY DETACHABLE VASO-OCCLUSIVE DEVICE - A device for delivering an occlusive element includes an elongate pusher member having a lumen. A locking member is disposed within the lumen of the elongate pusher member. A moveable elongate releasing member is disposed within the lumen of the elongate pusher member. A filament is secured to the distal end of the elongate releasing member. The occlusive member is locked to the elongate releasing member when the filament passes through a securing member on the occlusive member and is pinched or wedged between the locking member and the elongate releasing member. The occlusive element is in an unlocked state when the elongate releasing member is retracted proximally relative to the elongate pusher member. The filament, along with the elongate releasing member, are retracted proximally until the filament is detached or uncoupled from the securing member of the occlusive member. | 12-11-2008 |
20090062726 | MEDICAL IMPLANT DETACHMENT SYSTEMS AND METHODS - An implant assembly comprises an elongated pusher member, and an implantable device (e.g., a vaso-occlusive device) mounted to the distal end of the pusher member. The implant assembly further comprises an electrolytically severable joint disposed on the pusher member, wherein the implantable device detaches from the pusher member when the severable joint is severed, and a return electrode carried by the distal end of the pusher member (e.g., a coil disposed about the pusher member) in proximity to, but electrically isolated from, the severable joint. The implant assembly further comprises a terminal carried by the proximal end of the pusher member in electrical communication with the severable joint. | 03-05-2009 |
20110213406 | ANCHOR ASSEMBLIES IN STRETCH-RESISTANT VASO-OCCLUSIVE COILS - Vaso-occlusive devices are provided for occluding an aneurysm within the human vasculature. The vaso-occlusive device also includes a stretch-resisting member that extends through at least a portion of a lumen of the primary coil and is directly or indirectly attached to the primary coil at two locations axially separated from each other to prevent or minimize axial stretching of the primary coil. At one location, the stretch-resisting member is coupled to the primary coil via a flexible anchor assembly disposed within the lumen. In one embodiment, the anchor assembly may comprise an anchor coil and a link directly or indirectly coupled between the anchor coil and the stretch-resisting member. Alternatively, the anchor assembly may comprise a chain of twisted links. | 09-01-2011 |
20120271344 | MEDICAL IMPLANT DETACHMENT SYSTEMS AND METHODS - An implant assembly comprises an elongated pusher member, and an implantable device (e.g., a vaso-occlusive device) mounted to the distal end of the pusher member. The implant assembly further comprises an electrolytically severable joint disposed on the pusher member, wherein the implantable device detaches from the pusher member when the severable joint is severed, and a return electrode carried by the distal end of the pusher member (e.g., a coil disposed about the pusher member) in proximity to, but electrically isolated from, the severable joint. The implant assembly further comprises a terminal carried by the proximal end of the pusher member in electrical communication with the severable joint. | 10-25-2012 |
20150025566 | MECHANICALLY DETACHABLE VASO-OCCLUSIVE DEVICE - A device for delivering an occlusive element includes an elongate pusher member having a lumen. A locking member is disposed within the lumen of the elongate pusher member. A moveable elongate releasing member is disposed within the lumen of the elongate pusher member. A filament is secured to the distal end of the elongate releasing member. The occlusive member is locked to the elongate releasing member when the filament passes through a securing member on the occlusive member and is pinched or wedged between the looking member and the elongate releasing member. The occlusive element is in an unlocked state when the elongate releasing member is retracted proximally relative to the elongate pusher member. The filament, along with the elongate releasing member, are retracted proximally until the filament is detached or uncoupled from the securing member of the occlusive member. | 01-22-2015 |
Patent application number | Description | Published |
20110175571 | CHARGER AND METHOD FOR CHARGING FOR SILVER ZINC BATTERIES - A zinc alkaline rechargeable battery pack is disclosed. The zinc alkaline rechargeable battery pack includes a casing including a plurality of electrochemical cells and recharging management circuitry. Each cell of the plurality of electrochemical cells includes an alkaline electrolyte, an anode and a cathode. The anode comprises zinc. The cathode comprises silver, an oxide of silver, silver metal, or a combination of the silver, the oxide of silver and the silver metal. The alkaline electrolyte includes an aqueous hydroxide of an alkali metal. The recharging management circuitry is connected to the plurality of electrochemical cells. The recharging management circuitry includes a processor, a first voltage detector/controller connected to the processor, a second voltage detector/controller connected to the processor, and a current sensor connected to the processor. The first voltage detector/controller, the second voltage detector/controller and current sensor are connected to the plurality of electrochemical cells. A system for charging a zinc alkaline rechargeable battery pack is also disclosed. A method for charging the rechargeable battery pack is also disclosed. | 07-21-2011 |
20120189896 | ELECTRODE SEPARATOR - The present invention provides a separator for use in an alkaline electrochemical cell comprising a QA polymer material, wherein the separator is substantially resistant to oxidation by silver oxide. | 07-26-2012 |
20130266872 | ELECTRODE SEPARATOR - The present invention provides a separator for use in an alkaline electrochemical cell comprising a polymer material and an inert filler comprising zirconium oxide. Examples of polymer materials useful in this invention include ABS polymer material, halogenated alkylene polymer material, and PE polymer material. | 10-10-2013 |
Patent application number | Description | Published |
20110041161 | Management of Ancillary Content Delivery and Presentation - Embodiments of the present invention address delivery of content, including advertising, in an online or networked digital environment. Undesirable content or content that needs to be removed from the digital environment may be eliminated through invocation of a ‘kill switch’ that terminates further delivery of the aforementioned content. The ‘kill switch’ may also eliminate certain instantiations of that content already delivered to end-user client devices. In order to lessen the need for termination of content following delivery to the digital environment, content developers and content providers may view content scheduled for delivery in digital environment ‘mock ups’ prior to actual delivery. Content developers and content providers, too, may control certain attributes related to content scheduled for delivery to further obviate post-delivery termination or modification. | 02-17-2011 |
20130215024 | GAMING CONTROLLER - A controller for interfacing with an interactive application is provided, including: a housing defined by a main body, a first extension extending from a first end of the main body, and a second extension extending from a second end of the main body, the first extension and the second extension for holding by a first hand and a second hand of a user, respectively; an input device positioned along a top surface of the main body; a touch-sensitive panel defined along the top surface of the main body. | 08-22-2013 |
20140304328 | MANAGEMENT OF ANCILLARY CONTENT DELIVERY AND PRESENTATION - Embodiments of the present invention address delivery of content, including advertising, in an online or networked digital environment. Undesirable content or content that needs to be removed from the digital environment may be eliminated through invocation of a ‘kill switch’ that terminates further delivery of the aforementioned content. The ‘kill switch’ may also eliminate certain instantiations of that content already delivered to end-user client devices. In order to lessen the need for termination of content following delivery to the digital environment, content developers and content providers may view content scheduled for delivery in digital environment ‘mock ups’ prior to actual delivery. Content developers and content providers, too, may control certain attributes related to content scheduled for delivery to further obviate post-delivery termination or modification. | 10-09-2014 |
Patent application number | Description | Published |
20100045983 | Spatially precise optical treatment or measurement of targets through intervening birefringent layers - A treatment pattern (such as a focused spot, an image, or an interferogram) projected on a treatment target may lose precision if the treatment beam must pass through a birefringent layer before reaching the target. In the general case, the birefringent layer splits the treatment beam into ordinary and extraordinary components, which propagate in different directions and form two patterns, displaced from each other, at the target layer. The degree of birefringence and the orientation of the optic axis, which influence the amount of displacement, often vary between workpieces or between loci on the same workpiece. This invention measures the orientation of the optic axis and uses the data to adjust the treatment beam incidence direction, the treatment beam polarization, or both to superpose the ordinary and extraordinary components into a single treatment pattern at the target, preventing the birefringent layer from causing the pattern to be blurred or doubled. | 02-25-2010 |
20120033216 | SPATIALLY PRECISE OPTICAL TREATMENT FOR MEASUREMENT OF TARGETS THROUGH INTERVENING BIREFRINGENT LAYERS - A treatment pattern (such as a focused spot, an image, or an interferogram) projected on a treatment target may lose precision if the treatment beam must pass through a birefringent layer before reaching the target. In the general case, the birefringent layer splits the treatment beam into ordinary and extraordinary components, which propagate in different directions and form two patterns, displaced from each other, at the target layer. The degree of birefringence and the orientation of the optic axis, which influence the amount of displacement, often vary between workpieces or between loci on the same workpiece. This invention measures the orientation of the optic axis and uses the data to adjust the treatment beam incidence direction, the treatment beam polarization, or both to superpose the ordinary and extraordinary components into a single treatment pattern at the target, preventing the birefringent layer from causing the pattern to be blurred or doubled. | 02-09-2012 |
20140072258 | Illumination Techniques for Optically Activated Solid State Switch - Techniques are presented for illuminating an optically activated switch. The switch is illuminated from one side with a high reflector on the opposing side. An anti-reflective coating can also be formed on the side from which the illumination is incident. For more uniform illumination, a homogenizer, such as a micro-lens array, can be used. Illumination can be provided from an array of micro-fibers, which can be set back by a few millimeters from the switch. | 03-13-2014 |
20140072259 | Use of Light Pipes for Illuminations of Optically Activated Solid State Switches - Techniques are presented for illuminating an optically activated switch. The switch is illuminated from one side with a high reflector on the opposing side. An anti-reflective coating can also be formed on the side from which the illumination is incident. For more uniform illumination, a homogenizer, such as a micro-lens array, can be used. Illumination can be provided from an array of micro-fibers, which can be set back by a few millimeters from the switch. In another set of example, a light pipe arrangement can be used to provide the illumination. The light pipe structure can also act as a beam splitter. | 03-13-2014 |
Patent application number | Description | Published |
20140282538 | MINIMIZING SCSI LIMITATIONS FOR VIRTUAL MACHINES - Examples disclosed herein provide systems, methods, and software for minimizing Small Computer System Interface (SCSI) limitations on virtual machines are disclosed herein. In one example, a method of operating a volume combining system to combine volumes for a virtual machine includes identifying two or more volumes to be attached to the virtual machine. The method further provides combining the two or more volumes into a single volume, and attaching the single volume to the virtual machine. | 09-18-2014 |
20140282623 | ATTACHING APPLICATIONS BASED ON FILE TYPE - Disclosed herein are systems, methods, and software for attaching applications to a computing device based on a file type selection. In one example, a method for operating a an application attaching system to dynamically make applications available to a computing device includes identifying an application attach triggering event based on a file selection of a certain file type on the computing device. The method further includes, in response to the application attach triggering event, identifying an application within an application volume based on the certain file type. The method also includes attaching the application volume to computing device, and associating the application to the certain file type on the computing device. | 09-18-2014 |
20150074116 | INDEXING ATTACHABLE APPLICATIONS FOR COMPUTING SYSTEMS - Examples disclosed herein provide systems, methods, and software for indexing attachable applications for computing systems. In one example, a method of attaching an application to a computing system includes identifying an application attach triggering event for the computing system. The method further includes, identifying a storage location for the application based on the application attach triggering event and an application index, and attaching at least one storage volume to the computing system corresponding to the storage location. | 03-12-2015 |
Patent application number | Description | Published |
20110091520 | Sustained Release Intraocular Implants and Methods for Treating Ocular Neuropathies - Biocompatible intraocular implants include a beta adrenergic receptor antagonist and a polymer associated with the beta adrenergic receptor antagonist to facilitate release of the beta adrenergic receptor antagonist into an eye for an extended period of time. The beta adrenergic receptor antagonist may be associated with a biodegradable polymer matrix, such as a matrix of a two biodegradable polymers. The implants may be placed in an eye to treat one or more ocular conditions, such as an ocular neuropathies, for example, various forms of glaucoma. | 04-21-2011 |
20110251201 | Sustained release intraocular implants and methods for preventing retinal dysfunction - Biocompatible intraocular implants include an alpha-2 adrenergic receptor agonist and a polymer associated with the alpha-2 adrenergic receptor agonist to facilitate release of the alpha-2 adrenergic receptor agonist into an eye for an extended period of time. The alpha-2 adrenergic receptor agonist may be associated with a biodegradable polymer matrix, such as a matrix of a two biodegradable polymers. The implants may be placed in an eye to prevent the occurrence of one or more ocular conditions, or to reduce one or more symptoms of an ocular condition, such as an ocular neurosensory disorder and the like. | 10-13-2011 |
20120122821 | STEROID-CONTAINING SUSTAINED RELEASE INTRAOCULAR IMPLANTS AND RELATED METHODS - Biocompatible intraocular implants include a steroid and an auxiliary agent, where the auxiliary agent is present in an amount sufficient to lessen the severity of at least one side effect compared to the use of an otherwise identical implant lacking said auxiliary agent. The steroid and the auxiliary agent may be present on the same intraocular implant or on different implants. The steroid and auxiliary agent may be associated with a biodegradable polymer matrix, such as a matrix of a two biodegradable polymers. Or, the steroid may be associated with a polymeric coating having one or more openings effective to permit the steroid to be released into an external environment. The implants containing the steroid and an auxiliary agent may be placed in an eye to treat one or more ocular conditions while reducing the side effects otherwise accompanying steroid use. | 05-17-2012 |
20130017244 | Sustained release intraocular implants and related methods - Biocompatible intraocular implants include a steroid and a polymer associated with each other to facilitate release of the steroid into an eye for a period of time greater than about two months. The steroid may be associated with a biodegradable polymer matrix, such as a matrix of a two biodegradable polymers. Or, the steroid may be associated with a polymeric coating having one or more openings effective to permit the steroid to be released into an external environment. The implants may be placed in an eye to treat one or more ocular conditions. The steroid is released from the implant for more than about two months, and may be release for more than several years. | 01-17-2013 |
20130236525 | Sustained release intraocular implants and related methods - Biocompatible intraocular implants include a steroid and a polymer associated with each other to facilitate release of the steroid into an eye for a period of time greater than about two months. The steroid may be associated with a biodegradable polymer matrix, such as a matrix of a two biodegradable polymers. Or, the steroid may be associated with a polymeric coating having one or more openings effective to permit the steroid to be released into an external environment. The implants may be placed in an eye to treat one or more ocular conditions. The steroid is released from the implant for more than about two months, and may be release for more than several years. | 09-12-2013 |
20130236526 | Sustained Release Intraocular Implants and Methods for Preventing Retinal Dysfunction - Biocompatible intraocular implants include an alpha-2 adrenergic receptor agonist and a polymer associated with the alpha-2 adrenergic receptor agonist to facilitate release of the alpha-2 adrenergic receptor agonist into an eye for an extended period of time. The alpha-2 adrenergic receptor agonist may be associated with a biodegradable polymer matrix, such as a matrix of a two biodegradable polymers. The implants may be placed in an eye to prevent the occurrence of one or more ocular conditions, or to reduce one or more symptoms of an ocular condition, such as an ocular neurosensory disorder and the like. | 09-12-2013 |
20140140992 | Sustained Release Formulations for Delivery of Proteins to the Eye and Methods of Preparing Same - The present invention provides for injectable pharmaceutical sustained release formulations for delivery of active agents, particularly therapeutic proteins, to the eye. The formulations are biocompatible, biodegradable sustained release formulations comprising low-solubility liquid excipients and relatively small amounts (less than about 10%) of biocompatible, biodegradable polymer such as PLA or PLGA polymers. A unit dose of 5 μL to 100 μL of the formulation provides for sustained release of the agent for at least 14 days. | 05-22-2014 |
20140180245 | DOSE GUIDES FOR INJECTION SYRINGE - Devices that guide the accurate loading and dispensing of predetermined doses of fluid from injection syringes are disclosed. | 06-26-2014 |
20140199366 | SUSTAINED RELEASE INTRAOCULAR IMPLANTS AND METHODS FOR TREATING OCULAR NEUROPATHIES - Biocompatible intraocular implants include a beta adrenergic receptor antagonist and a polymer associated with the beta adrenergic receptor antagonist to facilitate release of the beta adrenergic receptor antagonist into an eye for an extended period of time. The beta adrenergic receptor antagonist may be associated with a biodegradable polymer matrix, such as a matrix of a two biodegradable polymers. The implants may be placed in an eye to treat one or more ocular conditions, such as an ocular neuropathies, for example, various forms of glaucoma. | 07-17-2014 |
20140213646 | Sustained Release Formulations for the Treatment of Intraocular Pressure or Glaucoma - The present embodiments provide for methods of treating elevated intraocular pressure or glaucoma using a sustained release medicament consisting of prostaglandin in benzyl benzoate that is injected intraocularly no more frequently than once every two months. | 07-31-2014 |
20140322295 | STEROID-CONTAINING SUSTAINED RELEASE INTRAOCULAR IMPLANTS AND RELATED METHODS - Biocompatible intraocular implants include a steroid and an auxiliary agent, where the auxiliary agent is present in an amount sufficient to lessen the severity of at least one side effect compared to the use of an otherwise identical implant lacking said auxiliary agent. The steroid and the auxiliary agent may be present on the same intraocular implant or on different implants. The steroid and auxiliary agent may be associated with a biodegradable polymer matrix, such as a matrix of a two biodegradable polymers. Or, the steroid may be associated with a polymeric coating having one or more openings effective to permit the steroid to be released into an external environment. The implants containing the steroid and an auxiliary agent may be placed in an eye to treat one or more ocular conditions while reducing the side effects otherwise accompanying steroid use. | 10-30-2014 |
Patent application number | Description | Published |
20130068384 | Method and Apparatus for Three Dimensional Large Area Welding and Sealing of Optically Transparent Materials - Methods and systems for three dimensional large area welding and sealing of optically transparent materials are disclosed, including generating a beam of ultra-short pulses from an ultra-short pulsed laser; directing the beam to an acoustic-optic modulator to control the repetition rate of the beam; directing the beam to an attenuator after passing through the acoustic-optic modulator to control the energy of the beam; directing the beam to a focusing lens after passing through the attenuator to focus the beam between a top substrate and a bottom substrate in order to weld the top substrate to the bottom substrate, wherein the top substrate and the bottom substrate are in intimate contact; and controlling the position of the top substrate and the bottom substrate relative to the beam using a three-axis stage in order to weld the top substrate to the bottom substrate at different points. Other embodiments are described and claimed. | 03-21-2013 |
20130277340 | Fiber Based Spectroscopic Imaging Guided Laser Material Processing System - Methods and systems for fiber-based near-field material processing are disclosed, including generating electromagnetic radiation from a USP laser coupled to a central processing unit; coupling the electromagnetic radiation to an acousto-optic modulator; coupling the electromagnetic radiation to a beam delivery system; coupling the electromagnetic radiation to a beam delivery/collection fiber; using the electromagnetic radiation to generate a plasma on a target mounted to an adjustable stage coupled to the central processing unit; coupling the electromagnetic radiation from the plasma to the beam delivery/collection fiber; coupling the electromagnetic radiation to an optical fiber bundle; coupling the electromagnetic radiation to a spectrum analysis unit; coupling the electromagnetic radiation to a detector; and coupling the detector to the central processing unit; wherein the central processing unit uses the output from the detector as feedback in making adjustments to the USP laser and the adjustable stage. Other embodiments are described and claimed. | 10-24-2013 |
20130278930 | Near-Field Material Processing System - Methods and systems for real time feedback and control of near-field material processing are disclosed, including generating electromagnetic radiation from a USP laser coupled to a central processing unit; coupling the electromagnetic radiation to an acousto-optic modulator; coupling the electromagnetic radiation to a beam delivery system; coupling the electromagnetic radiation to a beam delivery fiber; using the electromagnetic radiation to generate a plasma on a target mounted to an adjustable stage coupled to the central processing unit; coupling the electromagnetic radiation from the plasma to a plasma spectrum collection system; coupling the electromagnetic radiation to a spectrum analysis unit; coupling the electromagnetic radiation to a detector; and coupling the detector to the central processing unit; wherein the central processing unit uses the output from the detector as feedback in making adjustments to the USP laser and the adjustable stage. Other embodiments are described and claimed. | 10-24-2013 |
20140231021 | Method and Apparatus for Three Dimensional Large Area Welding and Sealing of Optically Transparent Materials - Methods and systems for three dimensional large area welding and sealing of optically transparent materials are disclosed, including generating a beam of ultra-short pulses from an ultra-short pulsed laser; directing the beam to an acoustic-optic modulator to control the repetition rate of the beam; directing the beam to an attenuator after passing through the acoustic-optic modulator to control the energy of the beam; directing the beam to a focusing lens after passing through the attenuator to focus the beam between a top substrate and a bottom substrate in order to weld the top substrate to the bottom substrate, wherein the top substrate and the bottom substrate are in intimate contact; and controlling the position of the top substrate and the bottom substrate relative to the beam using a three-axis stage in order to weld the top substrate to the bottom substrate at different points. Other embodiments are described and claimed. | 08-21-2014 |
Patent application number | Description | Published |
20080291228 | METHODS AND APPARATUS FOR INKJET PRINTING WITH MULTIPLE ROWS OF PRINT HEADS - According to the present invention, multiple rows of nozzles within a print head may be arranged proximal to and offset from each other to facilitate inkjet printing. Print heads may comprise a single row of nozzles or may comprise a plurality of rows of nozzles. Each row of nozzles may be situated such that the immediately adjacent row of nozzles may be offset by a predetermined distance. In some embodiments, adjacent rows of nozzles may each print with the same color. In this way, adjacent offset rows of nozzles may be used in combination to dispense ink drops into sub-pixel wells in improved patterns and with improved ink distribution within the sub-pixel well. These offset print techniques may also enable tighter grouping of ink drops within a sub-pixel well and enable faster printing operations. | 11-27-2008 |
20090255911 | LASER SCRIBING PLATFORM AND HYBRID WRITING STRATEGY - Laser scribing can be performed on a workpiece ( | 10-15-2009 |
20090267975 | METHODS AND APPARATUS FOR ALIGNING PRINT HEADS - In a first aspect, a system is provided. The system includes ( | 10-29-2009 |
20090321397 | LASER-SCRIBING PLATFORM - Laser-scribing systems and translation stages operable to support a workpiece during laser scribing are provided. A laser-scribing system includes a base section, a bed supported by the base section, a laser, a first driving mechanism operable to move a workpiece longitudinally along the bed, and a second driving mechanism. The bed comprises a movable section configured to translate with respect to the base section. The movable section comprises a gap to allow a laser beam to pass through. The laser is positioned to direct the laser beam through the gap. The second driving mechanism is operable to laterally translate the laser and the movable section in order to scribe a pattern on the workpiece. | 12-31-2009 |
Patent application number | Description | Published |
20140262038 | PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING - Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools. | 09-18-2014 |
20140271097 | PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING - Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools. | 09-18-2014 |
20140273406 | PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING - Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools. | 09-18-2014 |
20140273481 | PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING - Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools. | 09-18-2014 |
20140273488 | PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING - Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools. | 09-18-2014 |
20140273489 | PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING - Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools. | 09-18-2014 |
Patent application number | Description | Published |
20110170766 | Adaptive Signature Detection - A processor-based method for detecting defects in an integrated circuit, by creating an image of at least a portion of the integrated circuit with a sensor, grouping pixels of the image into bins based at least in part on a common characteristic of the pixels that are grouped within a given bin, creating a histogram of the pixels in each of the bins, calculating a mean value of the histogram for each of the bins, comparing the mean value for each of the bins to a threshold value, flagging as defect candidates those bins where the mean value of the bin varies from the threshold value by more than a predetermined amount, and performing signature detection on the bins that are flagged as defect candidates, where the image of the integrated circuit is not directly compared to any other image of an integrated circuit. | 07-14-2011 |
20120141013 | REGION BASED VIRTUAL FOURIER FILTER - The present invention includes searching imagery data in order to identify one or more patterned regions on a semiconductor wafer, generating one or more virtual Fourier filter (VFF) working areas, acquiring an initial set of imagery data from the VFF working areas, defining VFF training blocks within the identified patterned regions of the VFF working areas utilizing the initial set of imagery data, wherein each VFF training block is defined to encompass a portion of the identified patterned region displaying a selected repeating pattern, calculating an initial spectrum for each VFF training block utilizing the initial set of imagery data from the VFF training blocks, and generating a VFF for each training block by identifying frequencies of the initial spectrum having maxima in the frequency domain, wherein the VFF is configured to null the magnitude of the initial spectrum at the frequencies identified to display spectral maxima. | 06-07-2012 |
20130035876 | DETECTING DEFECTS ON A WAFER - Methods and systems for detecting defects on a wafer are provided. | 02-07-2013 |
20140185919 | Detecting Defects on a Wafer - Methods and systems for detecting defects on a wafer are provided. One method includes identifying one or more characteristics of first raw output generated for a wafer that correspond to one or more geometrical characteristics of patterned features formed on the wafer and assigning individual output in second raw output generated for the wafer to different segments based on the identified one or more characteristics of the first raw output and based on the individual output in the second raw output and individual output in the first raw output that were generated at substantially the same locations on the wafer such that the one or more geometrical characteristics of the patterned features that correspond to each of the different segments in the second raw output are different. | 07-03-2014 |
20140270474 | Detecting Defects on a Wafer - Methods and systems for detecting defects on a wafer are provided. One method includes determining difference values for pixels in first output for a wafer generated using a first optics mode of an inspection system and determining other values for pixels in second output for the wafer generated using a second optics mode of the inspection system. The first and second optics modes are different from each other. The method also includes generating a two-dimensional scatter plot of the difference values and the other values for the pixels in the first and second output corresponding to substantially the same locations on the wafer. The method further includes detecting defects on the wafer based on the two-dimensional scatter plot. | 09-18-2014 |
20150043804 | Adaptive Local Threshold and Color Filtering - Methods and systems for detecting defects on a wafer using adaptive local thresholding and color filtering are provided. One method includes determining local statistics of pixels in output for a. wafer generated using an inspection system, determining which of the pixels are outliers based on the local statistics, and comparing the outliers to the pixels surrounding the outliers to identify the outliers that do not belong to a cluster of outliers as defect candidates. The method also includes determining a value for a difference in color between the pixels of the defect candidates and the pixels surrounding the defect candidates. The method further includes identifying the defect candidates that have a value for the difference in color greater than or equal to a predetermined value as nuisance defects and the defect candidates that have a value for the difference in color less than the predetermined value as real defects. | 02-12-2015 |
20150062571 | Tuning Wafer Inspection Recipes Using Precise Defect Locations - Systems and methods for determining one or more parameters of a wafer inspection process are provided. One method includes aligning optical image(s) of an alignment target to their corresponding electron beam images generated by an electron beam defect review system. The method also includes determining different local coordinate transformations for different subsets of alignment targets based on results of the aligning. In addition, the method includes determining positions of defects in wafer inspection system coordinates based on coordinates of the defects determined by the electron beam defect review system and the different local coordinate transformations corresponding to different groups of the defects into which the defects have been separated. The method further includes determining one or more parameters for an inspection process for the wafer based on defect images acquired at the determined positions by a wafer inspection system. | 03-05-2015 |
20150063677 | Scratch Filter for Wafer Inspection - Methods and systems for filtering scratches from wafer inspection results are provided. One method includes generating a defect candidate map that includes image data for potential defect candidates as a function of position on the wafer and removing noise from the defect candidate map to generate a filtered defect candidate map. The method also includes determining one or more characteristics of the potential defect candidates based on portions of the filtered defect candidate map corresponding to the potential defect candidates. In addition, the method includes determining if each of the potential defect candidates are scratches based on the one or more characteristics determined for each of the potential defect candidates and separating the potential defect candidates determined to be the scratches from other defects in inspection results for the wafer. | 03-05-2015 |
Patent application number | Description | Published |
20090195854 | REFLECTIVE SPATIAL LIGHT MODULATOR HAVING DUAL LAYER ELECTRODES AND METHOD OF FABRICATING SAME - A reflective spatial light modulator device features two pairs of electrodes formed on different metallization layers. Elevation of the upper electrode pair reduces its distance from the overlying reflecting surface, thereby requiring a smaller applied voltage to generate an equivalent electrostatic attractive force for altering or maintaining physical orientation of the reflecting surface relative to incident light. In one embodiment, the reduced distance between the electrode and reflecting surface allows operation at lower voltages, reducing the possibility of breakdown and avoiding the need for complex device designs to eliminate such breakdown. In another embodiment, the reduced distance between the electrode and the reflecting surface allows the use of stiffer hinges for the reflecting surface, thereby increasing the speed of device operation. Other embodiments can employ both reduced voltage operation and the use of stiffer hinge structures. | 08-06-2009 |
20120313189 | METHOD OF PREVENTING STICTION OF MEMS DEVICES - A method and apparatus are disclosed for reducing stiction in MEMS devices. The method comprises patterning a CMOS wafer to expose Titanium-Nitride (TiN) surface for a MEMS stop and patterning the TiN to form a plurality of stop pads on the top metal aluminum surface of the CMOS wafer. The method is applied for a moveable MEMS structure bonded to a CMOS wafer. The TiN surface and/or plurality of stop pads minimize stiction between the MEMS structure and the CMOS wafer. Further, the TiN film on top of aluminum electrode suppresses the formation of aluminum hillocks which effects the MEMS structure movement. | 12-13-2012 |
20120326248 | METHODS FOR CMOS-MEMS INTEGRATED DEVICES WITH MULTIPLE SEALED CAVITIES MAINTAINED AT VARIOUS PRESSURES - A Microelectromechanical systems (MEMS) structure comprises a MEMS wafer. A MEMS wafer includes a handle wafer with cavities bonded to a device wafer through a dielectric layer disposed between the handle and device wafers. The MEMS wafer also includes a moveable portion of the device wafer suspended over a cavity in the handle wafer. Four methods are described to create two or more enclosures having multiple gas pressure or compositions on a single substrate including, each enclosure containing a moveable portion. The methods include: A. Forming a secondary sealed enclosure, B. Creating multiple ambient enclosures during wafer bonding, C. Creating and breaching an internal gas reservoir, and D. Forming and subsequently sealing a controlled leak/breach into the enclosure. | 12-27-2012 |
20140213007 | INTERNAL ELECTRICAL CONTACT FOR ENCLOSED MEMS DEVICES - A method of fabricating electrical connections in an integrated MEMS device is disclosed. The method comprises forming a MEMS wafer. Forming a MEMS wafer includes forming one cavity in a first semiconductor layer, bonding the first semiconductor layer to a second semiconductor layer with a dielectric layer disposed between the first semiconductor layer and the second semiconductor layer, and etching at least one via through the second semiconductor layer and the dielectric layer and depositing a conductive material on the second semiconductor layer and filling the at least one via. Forming a MEMS wafer also includes patterning and etching the conductive material to form one standoff and depositing a germanium layer on the conductive material, patterning and etching the germanium layer, and patterning and etching the second semiconductor layer to define one MEMS structure. The method also includes bonding the MEMS wafer to a base substrate. | 07-31-2014 |
20140264655 | SURFACE ROUGHENING TO REDUCE ADHESION IN AN INTEGRATED MEMS DEVICE - In an integrated MEMS device, moving silicon parts with smooth surfaces can stick together if they come into contact. By roughening at least one smooth surface, the effective area of contact, and therefore surface adhesion energy, is reduced and hence the sticking force is reduced. The roughening of a surface can be provided by etching the smooth surfaces in gas, plasma, or liquid with locally non-uniform etch rate. Various etch chemistries and conditions lead to various surface roughness. | 09-18-2014 |
20140349434 | INTERNAL ELECTRICAL CONTACT FOR ENCLOSED MEMS DEVICES - A method of fabricating electrical connections in an integrated MEMS device is disclosed. The method comprises forming a MEMS wafer. Forming a MEMS wafer includes forming one cavity in a first semiconductor layer, bonding the first semiconductor layer to a second semiconductor layer with a dielectric layer disposed between the first semiconductor layer and the second semiconductor layer, and etching at least one via through the second semiconductor layer and the dielectric layer and depositing a conductive material on the second semiconductor layer and filling the at least one via. Forming a MEMS wafer also includes patterning and etching the conductive material to form one standoff and depositing a germanium layer on the conductive material, patterning and etching the germanium layer, and patterning and etching the second semiconductor layer to define one MEMS structure. The method also includes bonding the MEMS wafer to a base substrate. | 11-27-2014 |
Patent application number | Description | Published |
20080316644 | PMR with improved writability and process controllability by double layer patterning - Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors. | 12-25-2008 |
20100061016 | Method to make an integrated side shield PMR head with non conformal side gap - A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section. | 03-11-2010 |
20120008236 | PMR with improved writability and process controllability by double layer patterning - Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors. | 01-12-2012 |
20120012555 | Method to make an integrated side shield PMR head with non-conformal side gap - A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section. | 01-19-2012 |
20120125885 | PERPENDICULAR WRITE HEAD WITH WRAP AROUND SHIELD AND CONFORMAL SIDE GAP - A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES. | 05-24-2012 |
20130026131 | Method For Manufacturing Wraparound Shield Write Head Using Hard Masks - The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention. | 01-31-2013 |
20130078483 | USE OF MAGNETIC MATERIAL FOR RIE STOP LAYER DURING DAMASCENE MAIN POLE FORMATION - A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield. | 03-28-2013 |
20140268420 | MAGNETIC WRITE HEAD HAVING A WRITE POLE WITH A CONSTANT FLARE ANGLE AND MULTIPLE YOKE ANGLES - A magnetic write head having a write pole with a novel configuration improving write field strength and field gradient while also reducing adjacent track interference and far track interference. The write pole is configured with a pole tip portion that has a narrow track width, preferably 15-30 degrees and a main yoke portion with a larger flare angle of about 45 degrees. The write pole also has an intermediate portion located between the pole tip and main pole portions. The intermediate portion includes a first portion adjacent to the pole tip that has a flare angle greater than the flare angle of the main yoke and has a second portion with a flare angle less than the flare angle of the yoke. | 09-18-2014 |
Patent application number | Description | Published |
20100153658 | Deadlock Avoidance By Marking CPU Traffic As Special - Deadlocks are avoided by marking read requests issued by a parallel processor to system memory as “special.” Read completions associated with read requests marked as special are routed on virtual channel | 06-17-2010 |
20130067127 | METHOD AND APPARATUS FOR INTERLEAVING BURSTS OF HIGH-SPEED SERIAL INTERCONNECT LINK TRAINING WITH BUS DATA TRANSACTIONS - In an apparatus according to one embodiment of the present disclosure, a communications link comprises a first device and a second device communicating with each other via the communications link at a plurality of different speeds. However, prior to communicating via the communications link for the first time at a second speed, the first device and second device complete a first training cycle at the second speed. Further, during this first training cycle for the second speed, the first training cycle for the second speed will pause before the first training cycle at the second speed completes, and the first device and second device communicate at a first speed for a period of time before returning to the paused first training cycle at the second speed. When the paused first training cycle for the second speed continues, the first training cycle for the second speed will continue where it had paused. | 03-14-2013 |
20140012904 | PROVIDING BYTE ENABLES FOR PEER-TO-PEER DATA TRANSFER WITHIN A COMPUTING ENVIRONMENT - Non-contiguous or tiled payload data are efficiently transferred between peers over a fabric. Specifically, a client transfers a byte enable message to a peer device via a mailbox mechanism, where the byte enable message specifies which bytes of the payload data being transferred via the data packet are to be written to the frame buffer on the peer device and which bytes are not to be written. The client transfers the non-contiguous or tiled payload payload data to the peer device. Upon receiving the payload data, the peer device writes bytes from the payload data into the target frame buffer for only those bytes enabled via the byte enable message. One advantage of the present invention is that non-contiguous or tiled data are transferred over a fabric with improved efficiency. | 01-09-2014 |
20140013023 | SYSTEM AND METHOD FOR SENDING ARBITRARY PACKET TYPES ACROSS A DATA CONNECTOR - A processing unit exchanges data with another processing unit across a data connector that supports a particular communication protocol. When the communication protocol is updated to support a new packet type, a specification of that new packet type may be stored within software registers included within the processing unit. Under circumstances that require the use of the new packet type, packet generation logic may read the packet specification of the new packet type, then generate and transmit a packet of the new type. | 01-09-2014 |
20140082120 | EFFICIENT CPU MAILBOX READ ACCESS TO GPU MEMORY - Techniques are disclosed for peer-to-peer data transfers where a source device receives a request to read data words from a target device. The source device creates a first and second read command for reading a first portion and a second portion of a plurality of data words from the target device, respectively. The source device transmits the first read command to the target device, and, before a first read operation associated with the first read command is complete, transmits the second read command to the target device. The first and second portions of the plurality of data words are stored in a first and second portion a buffer memory, respectively. Advantageously, an arbitrary number of multiple read operations may be in progress at a given time without using multiple peer-to-peer memory buffers. Performance for large data block transfers is improved without consuming peer-to-peer memory buffers needed by other peer GPUs. | 03-20-2014 |
Patent application number | Description | Published |
20090032192 | Method for Resist Strip in Presence of Low K Dielectric Material and Apparatus for Performing the Same - A method and apparatus is provided for using a plasma generated from a processing gas mixture including H | 02-05-2009 |
20090121324 | ETCH WITH STRIATION CONTROL - A method for etching a feature in an etch layer is provided. A patterned photoresist mask is formed over the etch layer with photoresist features with sidewalls wherein the sidewalls of the photoresist features have striations forming peaks and valleys. The striations of the sidewalls of the photoresist features are reduced. The reducing the striations comprises at least one cycle, wherein each cycle comprises etching back peaks formed by the striations of the sidewalls of the photoresist features and depositing on the sidewalls of the photoresist features. Features are etched into the etch layer through the photoresist features. The photoresist mask is removed. | 05-14-2009 |
20100148317 | CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL - A method for forming a feature in an etch layer is provided. A photoresist layer is formed over the etch layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls. A control layer is formed over the photoresist layer and bottoms of the photoresist features. A conformal layer is deposited over the sidewalls of the photoresist features and control layer to reduce the critical dimensions of the photoresist features. Openings in the control layer are opened with a control layer breakthrough chemistry. Features are etched into the etch layer with an etch chemistry, which is different from the control layer break through chemistry, wherein the control layer is more etch resistant to the etch with the etch chemistry than the conformal layer. | 06-17-2010 |
20100159707 | GAS DISTRIBUTION SYSTEM HAVING FAST GAS SWITCHING CAPABILITIES - A gas distribution system for supplying different gas compositions to a chamber, such as a plasma processing chamber of a plasma processing apparatus is provided. The gas distribution system can include a gas supply section, a flow control section and a switching section. The gas supply section provides first and second gases, typically gas mixtures, to the flow control section, which controls the flows of the first and second gases to the chamber. The chamber can include multiple zones, and the flow control section can supply the first and second gases to the multiple zones at desired flow ratios of the gases. The gas distribution system can continuously supply the first and second gases to the switching section and the switching section is operable to switch the flows of the first and second gases, such that one of the first and second process gases is supplied to the chamber while the other of the first and second gases is supplied to a by-pass line, and then to switch the gas flows. The switching section preferably includes fast switching valves operable to quickly open and close to allow fast switching of the first and second gases, preferably without the occurrence of undesirable pressure surges or flow instabilities in the flow of either gas. | 06-24-2010 |
20100327413 | HARDMASK OPEN AND ETCH PROFILE CONTROL WITH HARDMASK OPEN - A method for opening a carbon-based hardmask layer formed on an etch layer over a substrate is provided. The hardmask layer is disposed below a patterned mask. The substrate is placed in a plasma processing chamber. The hardmask layer is opened by flowing a hardmask opening gas including a COS component into the plasma chamber, forming a plasma from the hardmask opening gas, and stopping the flow of the hardmask opening gas. The hardmask layer may be made of amorphous carbon, or made of spun-on carbon, and the hardmask opening gas may further include O | 12-30-2010 |
20110281435 | FAST GAS SWITCHING PLASMA PROCESSING APPARATUS - A plasma chamber with a plasma confinement zone with an electrode is provided. A gas distribution system for providing a first gas and a second gas is connected to the plasma chamber, wherein the gas distribution system can substantially replace one gas in the plasma zone with the other gas within a period of less than 1 s. A first frequency tuned RF power source for providing power to the electrode in a first frequency range is electrically connected to the at least one electrode wherein the first frequency tuned RF power source is able to minimize a reflected RF power. A second frequency tuned RF power source for providing power to the plasma chamber in a second frequency range outside of the first frequency range wherein the second frequency tuned RF power source is able to minimize a reflected RF power. | 11-17-2011 |
20120309201 | CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL - A method for forming a feature in an etch layer is provided. A photoresist layer is formed over the etch layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls. A control layer is formed over the photoresist layer and bottoms of the photoresist features. A conformal layer is deposited over the sidewalls of the photoresist features and control layer to reduce the critical dimensions of the photoresist features. Openings in the control layer are opened with a control layer breakthrough chemistry. Features are etched into the etch layer with an etch chemistry, which is different from the control layer break through chemistry, wherein the control layer is more etch resistant to the etch with the etch chemistry than the conformal layer. | 12-06-2012 |