Dandu
Pradeepa Dandu, Potsdam, NY US
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20100081281 | Abrasive compositions for chemical mechanical polishing and methods for using same - A colloidal dispersion for chemical mechanical polishing comprising: (a) an abrasive component; and (b) from about 0.05% to about 10% by weight of the abrasive component, a water-soluble amphoteric polymer comprising at least one macromolecular chain B and a part A bonded to a single end of the at least one macromolecular chain B, wherein the macromolecular chain B is derived from one or more ethylenically unsaturated monomers having quaternary ammonium groups or inium groups, and wherein the part A is a polymeric or nonpolymeric group comprising at least one anionic group; wherein the dispersion has a pH of between about 1.5 and about 6. The colloidal dispersion is capable of polishing a substrate comprising silicon nitride and silicon oxide with a reverse selectivity ratio of at least about 27, typically at least 50 the reverse selectivity ratio being the ratio of the rate of removal of the silicon nitride to the rate of removal of the silicon oxide. | 04-01-2010 |
20130122705 | ABRASIVE COMPOSITIONS FOR CHEMICAL POLISHING AND METHODS FOR USING SAME - A colloidal dispersion for chemical mechanical polishing comprising: (a) an abrasive component; and (b) from about 0.05% to about 10% by weight of the abrasive component, a water-soluble amphoteric polymer comprising at least one macromolecular chain B and a part A bonded to a single end of the at least one macromolecular chain B, wherein the macromolecular chain B is derived from one or more ethylenically unsaturated monomers having quaternary ammonium groups or inium groups, and wherein the part A is a polymeric or nonpolymeric group comprising at least one anionic group; wherein the dispersion has a pH of between about 1.5 and about 6. The colloidal dispersion is capable of polishing a substrate comprising silicon nitride and silicon oxide with a reverse selectivity ratio of at least about 27, typically at least 50 the reverse selectivity ratio being the ratio of the rate of removal of the silicon nitride to the rate of removal of the silicon oxide. | 05-16-2013 |
P.r. Veera Dandu, Hillsboro, OR US
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20110294404 | Tunable Polish Rates By Varying Dissolved Oxygen Content - A method and system for tunable removal rates and selectivity of materials during chemical-mechanical polishing using a chemical slurry or solution with increased dissolved oxygen content. The slurry can optionally include additives to improve removal rate and/or selectivity. Further selectivity can be obtained by varying the concentration and type of abrasives in the slurry, using lower operating pressure, using different pads, or using other additives in the dispersion at specific pH values. | 12-01-2011 |
20140299271 | Tunable Polish Rates By Varying Dissolved Oxygen Content - A system for tunable removal rates and selectivity of materials during chemical-mechanical polishing using a chemical slurry or solution with increased dissolved oxygen content. The slurry can optionally include additives to improve removal rate and/or selectivity. Further selectivity can be obtained by varying the concentration and type of abrasives in the slurry, using lower operating pressure, using different pads, or using other additives in the dispersion at specific pH values. | 10-09-2014 |
Rahul Dandu, Woodbridge, NJ US
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20090211371 | FLOW MEASURING DEVICE - A pneumotach for measuring respiratory gas flow is provided and includes a housing defining a lumen and having a longitudinal axis; and an airfoil diametrically supported within the lumen of the housing and extending at least partially thereacross, the airfoil defining a chord axis. The chord axis may be angled with respect to the longitudinal axis. | 08-27-2009 |
Raju S. Dandu, Salina, KS US
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20130135321 | Three-Dimensional Display Apparatus Electromechanical System - A three-dimensional display apparatus electromechanical system for displaying three-dimensional images without special viewing aids is disclosed. The electromechanical apparatus includes three flat surface screens, two rotating wheels or single screen not limited to other variations that will enable similar operation of the apparatus. The imaging system includes a CRT or similar device and control system to generate two-dimensional images to project the images at different depth locations through a focus system on to the moving projection screens. | 05-30-2013 |
Ravikumar Varma Dandu, San Diego, CA US
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20100141470 | SYSTEMS, METHODS, AND COMPUTER PROGRAM PRODUCTS FOR REFRESHING DATA - A method performs an update for a first device that consumes information with a known expiration time. The first device operates within a network that accommodates other devices also consuming the information. The method includes setting a time for the first device to refresh the information, the time to refresh being based on a pseudorandom time offset. The method also includes sending a refresh request to a resource for the data during the set time. | 06-10-2010 |
Reddeppareddy Dandu, Downingtown, PA US
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20110059959 | NOVEL MULTICYCLIC COMPOUNDS AND THE USE THEREOF - The present invention is directed to novel multicyclic molecules that mediate enzymatic activity. In particular, the compounds may be effective in the treatment of diseases or disease states related to the activity of PARP, VEGFR2, and MLK3 enzymes, including, for example, neurodegenerative diseases, inflammation, ischemia, and cancer. | 03-10-2011 |
20120004253 | Novel Fused Pyrrolocarbazoles - The present invention relates generally to selected fused pyrrolocarbazoles, including pharmaceutical compositions thereof and methods of treating diseases therewith. The present invention is also directed to intermediates and processes for making these fused pyrrolocarbazoles. | 01-05-2012 |
Reddeppa Reddy Dandu, Downingtown, PA US
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20100298332 | Substituted Spirocyclic Piperidine Derivatives as Histamine-3 (H3) Receptor Ligands - The present invention provides compounds of Formula (I): | 11-25-2010 |
20110071131 | Substituted Spirocyclic Piperidine Derivatives as Histamine-3 (H3) Receptor Ligands - The present invention provides compounds of Formula (I): | 03-24-2011 |
20110098269 | Substituted Pyridazinone Derivatives as Histamine-3 (H3) Receptor Ligands - The present invention provides compounds according to Formulas I, II, III, IV, V, VI, VII or VIII: | 04-28-2011 |
20130310389 | SUBSTITUTED SPIROCYCLIC PIPERIDINE DERIVATIVES AS HISTAMINE-3 (H3) RECEPTOR LIGANDS - The present invention is directed to methods of treating disorders mediated by Histamine H | 11-21-2013 |
20140275077 | URACIL DERIVATIVES AS AXL AND C-MET KINASE INHIBITORS - The present application provides compounds of Formula I | 09-18-2014 |
Srinivas Dandu, Bellevue, WA US
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20140101731 | SECURE IDENTIFICATION OF COMPUTING DEVICE AND SECURE IDENTIFICATION METHODS - A method implemented on a computing device provides for identifying the device and/or a user to an application on the device. The method comprises receiving a function call for a public identifier, responding to the function call, performing a hash operation and returning the public identifier. Responding to the function call comprises requesting a publisher ID from a first memory location within the device and requesting a private ID from a second memory location. Performing a hash operation on the publisher ID and the private ID creates the public identifier. The public identifier is then returned to the application. A method of allowing a developer to test an application on a mobile device or emulator is also described. A mobile device programmed to return a public identifier to an application is also described. | 04-10-2014 |