Patent application number | Description | Published |
20110268684 | HAIR CONDITIONERS COMPRISING IMIDAZOLINES AND ESTER OILS - Cosmetic preparations, in particular hair conditioners, contain at least one imidazoline derivative including at least two long fat groups, and at least two ester oils. | 11-03-2011 |
20110318293 | Hair Preparation Comprising Royal Jelly - Agent for changing the color and/or permanently changing the shape of keratinic fibers, wherein the agent contains in a cosmetic carrier at least one color- and/or shape-changing component as well as an animal-based care agent, in particular royal jelly, in combination with a polyalkoxylated fatty substance. The agents are suitable for reducing hair damage which occurs in connection with oxidative hair treatment such as oxidative hair coloring, hair lightening and perming. | 12-29-2011 |
20140120050 | ANTI-DRANDRUFF HAIR CARE PRODUCTS WITH SELECTIVE ACTIVE INGREDIENTS AND A CATIONIC KERATIN - Hair treatment agents include selected cationic alkyloligoglucosides, alkyloligoglucosides, selected ester oils, and quaternary ammonium compounds as care-providing substances. | 05-01-2014 |
20140158148 | HAIR CARE PRODUCTS WITH SELECTED QUARTERNARY AMMONIUM COMPOUNDS AND SILICONES CONTAINING SUGAR STRUCTURES - The present invention relates to hair treatment agents containing selected quaternary ammonium compounds and silicones containing sugar structures. | 06-12-2014 |
20140328787 | HAIR CARE COMPOSITION WITH SELECTED CATIONIC ALKYL OLIGOGLUCOSIDES AND OTHER QUATERNARY AMMONIUM COMPOUNDS - Hair treatment compositions include an active ingredient combination including selected cationic alkyl oligoglucosides and quaternary ammonium compounds as care agents.f | 11-06-2014 |
20150272859 | HAIR CARE PRODUCTS WITH SILICONES CONTAINING SUGAR STRUCTURES AND SELECTED OTHER SILICONES - Hair treatment agents include alkoxylated silicones and/or dimethicones and/or cyclomethicones and/or dimethiconols and/or amino functional silicones and silicones that include sugar structures. | 10-01-2015 |
20150272860 | HAIR CARE PRODUCTS WITH SELECTED AMINO ACIDS AND/OR SELECTED OLIGOPEPTIDES AND/OR SELECTED CATIONIC PROTEIN HYDROLYZATES AND SILICONES CONTAINING SUGAR STRUCTURES - Hair treatment agents include selected amino acids and/or selected oligopeptides and/or selected cationic protein hydrolysates and silicones that include sugar structures. | 10-01-2015 |
20150272865 | HAIR CARE PRODUCTS WITH ANTI-DANDRUFF AGENTS AND SELECTED SILICONES CONTAINING SUGAR STRUCTURES - Compositions for treating keratinic fibers, in particular human hair, which in addition to the conditioning properties and the luster and feel of keratinic fibers, in particular human hair, have an improved effect with regard to the removal of dandruff on the keratinic fibers. | 10-01-2015 |
Patent application number | Description | Published |
20100041030 | DISPLACEMENT ASSAY FOR DETECTING NUCLEIC ACID OLIGOMER HYBRIDIZATION EVENTS - Described is a method for detecting nucleic acid oligomer hybridization events that comprises the steps providing a modified surface, the modification consisting in attaching at least one type of probe nucleic acid oligomer, providing at least one type of signal nucleic acid oligomer, the signal nucleic acid oligomers being modified with at least one detection label and the signal nucleic acid oligomers having a section that is complementary or largely complementary to the probe nucleic acid oligomers, providing a sample having target nucleic acid oligomers, bringing a defined quantity of the signal nucleic acid oligomers into contact with the modified surface, bringing the sample and the target nucleic acid oligomers contained therein into contact with the modified surface, detecting the signal nucleic acid oligomers and comparing the values obtained when detecting the signal nucleic acid oligomers with reference values. According to the present invention, the signal nucleic acid oligomers have a larger number of bases than the probe nucleic acid oligomers and exhibit at least one docking section, the docking section exhibiting no structure that is complementary or largely complementary to any section of the probe nucleic acid oligomers, and the target nucleic acid oligomers having a section that is complementary or largely complementary to the docking section. | 02-18-2010 |
20120088234 | DEVICE FOR PERFORMING PCRS - A device is described to perform reactions, in which the device includes at least one test cell with a cavity to receive the test sample and at least a first, a second and a third spatially discrete regulatable temperature units. The three temperature units thus define three spatially discrete temperature areas. At least one means is provided to perform a rotary movement of the test cell. The cavity provided to receive the test sample can be moved across the three spatially discrete temperature areas, in which the cavity in one position of the test cell, remains in contact with a least two of the temperature areas. | 04-12-2012 |
20140288461 | SWAB HAVING A LUER CONNECTION - The invention relates to a swab system, comprising a sample tube, which is closed at the front end and open at the rear end, and a swab. The swab has an elongated, tubular swab rod, wherein the swab rod is provided with a sample-gathering means at the front end of the swab rod and a gripping piece at the rear end of the swab rod. The gripping piece closes the rear, open end of the sample tube in an accurately fitting manner and is equipped with a closing cap for covering the gripping piece in a sealed manner. The gripping piece has the internal taper of a Luer connection, wherein the internal taper of the Luer connection has a fluid connection to the tubular swab rod. | 09-25-2014 |
Patent application number | Description | Published |
20080197384 | Field Effect Transistor Arrangement - A field effect transistor arrangement includes an electrically insulating layer, a source region, a drain region and a channel region arranged between source region and drain region, wherein the source region, the drain region and the channel region are in each case arranged on or above the electrically insulating layer, and also a gate region having an electrically insulating gate layer and an electrically conductive gate layer, which adjoins the channel region or is arranged at a distance from the latter and which extends at least partly along the channel region, wherein the source region and the drain region are in each case produced from electrically conductive carbon, and wherein the channel region is produced from strained silicon. | 08-21-2008 |
20080283910 | INTEGRATED CIRCUIT AND METHOD OF FORMING AN INTEGRATED CIRCUIT - An integrated circuit and method of forming an integrated circuit is disclosed. One embodiment includes a FinFET of a first type having a first gate electrode and a FinFET of a second type having a second gate electrode. The first gate electrode is formed in a gate groove that is defined in a semiconductor substrate and a bottom side of a portion of the second gate electrode is disposed above a main surface of the semiconductor substrate. | 11-20-2008 |
20080296674 | TRANSISTOR, INTEGRATED CIRCUIT AND METHOD OF FORMING AN INTEGRATED CIRCUIT - A transistor, an integrated circuit and a method of forming an integrated circuit is disclosed. One embodiment includes a gate electrode. The gate electrode is disposed in a gate groove formed in a semiconductor substrate and includes a conductive carbon material. | 12-04-2008 |
20080299722 | Manufacturing method for forming a recessed channel transistor, method for forming a corresponding integrated semiconductor memory device and corresponding self-aligned mask structure - The present invention provides a method for forming a recessed channel transistor comprising the steps of:
| 12-04-2008 |
20090057778 | INTEGRATED CIRCUIT AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT - An integrated circuit including a memory device comprises an array portion comprising memory cells and conductive lines, an upper surface of the conductive lines being disposed beneath a surface of a semiconductor substrate, and a support portion comprising transistors of a first type, the transistors of the first type comprising a first gate electrode including vertical portions that are vertically adjacent to a channel of the transistor of the first type. | 03-05-2009 |
20090086523 | Integrated circuit and method of forming an integrated circuit - An integrated circuit comprises a memory cell array portion and a support circuitry portion. The memory cell array portion comprises at least one bitline and at least one wordline, which is disposed above the bitline. The support circuitry portion comprises a FinFET comprising a gate electrode. An upper side of a portion of the gate electrode is disposed at the same height as an upper side of a portion of the bitline. A method of manufacturing an integrated circuit comprises the steps of forming a memory cell array and forming a support circuitry. The step of forming the memory cell array comprises forming a bitline and forming a wordline disposed above the bitline. The step of forming the support circuitry comprises forming a FinFET. The step of forming the FinFET comprises forming a gate electrode, an upper side of a portion of the gate electrode being formed at the same height as an upper side of a portion of the bitline. | 04-02-2009 |
20100078711 | METHOD OF MANUFACTURING INTEGRATED CIRCUITS INCLUDING A FET WITH A GATE SPACER - A method of manufacturing integrated circuits including a FET with a gate spacer. One embodiment provides forming a lamella of a semiconductor material and two insulator structures on opposing sides of the lamella. The lamella is recessed. A fin is formed from a central portion of the lamella. The fin is thinner than a first and a second portion of the lamella which face each other on opposing sides of the fin. A first spacer structure is formed which encompasses a first portion of the fin, the first portion adjoining to the first lamella portion. A gate electrode is disposed adjacent to the first spacer structure and encompasses a further portion of the fin on a top side and on two opposing lateral sides. | 04-01-2010 |
Patent application number | Description | Published |
20130059431 | DEVICE AND METHOD FOR SUBSTRATE PROCESSING - The present invention relates to a device for processing substrates in a processing system with at least one process tool disposed in at least one process area, which tool has two substrate levels disposed opposite each other in the process area, which are aligned at least approximately vertical, wherein the device is adapted to process at least two substrates at the same time in the process area by means of the process tool, wherein the substrates can be disposed in the substrate levels such that coatings of the substrates face each other and, at least during processing, a quasi-closed process space is formed between the substrates. It further relates to a method for processing coated substrates in a processing system, wherein the substrates have coatings and the substrates are each disposed opposite each other such that the coatings of the substrates face each other and, at least during processing, a quasi-closed process space is formed between the substrates. | 03-07-2013 |
20130067723 | DEVICE FOR FORMING A REDUCED CHAMBER SPACE, AND METHOD FOR POSITIONING MULTILAYER BODIES - A device for forming a reduced chamber space, which is a process box or a process hood, containing an apparatus, which positions at least two multilayer bodies each including a surface to be processed, wherein the apparatus is designed such that the multilayer bodies are opposite to each other, wherein the surfaces to be processed are facing away from each other such that the multilayer bodies can be processed as a multilayer body arrangement in a processing system. In addition, a method for positioning the two multilayer bodies comprising a surface to be processed, with the two multilayer bodies disposed in such a device such that multilayer bodies are opposite each other, wherein the surfaces to be processed are facing away from each other, such that the multilayer bodies are processable as a multilayer body arrangement in a processing system. | 03-21-2013 |