Patent application number | Description | Published |
20080213677 | PHOTOMASK MANUFACTURING METHOD USING CHARGED BEAM WRITING APPARATUS - A first relationship between the charge dose of a charged beam writing apparatus and the dimensional accuracy of a photomask pattern is obtained, and a charge dose is determined from given dimensional accuracy on the basis of the first relationship. On the basis of the determined charge dose, a resist by which a resist pattern having desired dimensions is formed with the charge dose is selected. A second relationship between the write condition of the charged beam writing apparatus and the write time necessary to write the selected resist with the charge dose is obtained for each write pattern. The write condition is determined for each write pattern on the basis of a condition given to the write time and the second relationship. | 09-04-2008 |
20100028788 | MANUFACTURING METHOD OF PHOTOMASK FOR MULTIPLE EXPOSURE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING ABOVE PHOTOMASK - A position deviation and an image of a danger control pattern predicted after multiple exposure of each mask used for multiple exposure are acquired and an image after lap exposure by means of the masks based on the above image and position deviation information. At this time, parameters such as an offset amount caused by overlapping of images of the masks, rotation amount and the like are changed and a parameter capable of avoiding occurrence of faults in a dangerous pattern in an image predicted after lap exposure is calculated. | 02-04-2010 |
20110062623 | METHOD OF FORMING A PATTERN FORMATION TEMPLATE - According to one embodiment, a concavo-convex pattern of a first template where a concavo-convex main pattern has been formed in a main pattern region and a concavo-convex peripheral pattern has been formed in a peripheral region is transferred to a second template substrate by imprint techniques. Then, a second template with a step between a region corresponding to the main pattern region and a region corresponding to the peripheral region is formed by retreating the peripheral region of the second template substrate by etching. | 03-17-2011 |
20110062632 | TEMPLATE WITH IDENTIFICATION MARK AND METHOD OF MANUFACTURING THE SAME - According to one embodiment, a template with an identification mark for use in SFIL includes a pattern formation template including a main pattern region where a desired pattern is formed as a convex/concave pattern on the upper surface of a light-transmitting substrate, and an identification mark that is formed on the lower surface of the substrate to partially overlap the main pattern region, and makes the template identifiable. | 03-17-2011 |
20110287345 | ELECTRON BEAM DRAWING APPARATUS, ELECTRON BEAM DRAWING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING TEMPLATE MANUFACTURING METHOD - According to one embodiment, there is provided a electron beam drawing apparatus includes an irradiation module which irradiates a resist coated onto a substrate with a electron beam, and a control module which controls the irradiation module and which acquires the relationship between an irradiation dose of the electron beam and a positional shift amount of a pattern, acquires a reference irradiation dose of the electron beam necessary to form a pattern on the resist, acquires an allowable positional shift amount allowed for the pattern, acquires a limit irradiation dose of the electron beam corresponding to the allowable positional shift amount on the basis of the relationship, acquires a saturated irradiation dose corresponding to a saturated positional shift amount on the basis of the relationship, and controls the irradiation module so as to irradiate all the divided pattern regions with a electron beam sequentially at least once. | 11-24-2011 |
20110318501 | TEMPLATE FORMING METHOD - According to one embodiment, there is provided a template forming method that transfers a pattern from a first template to a to-be-processed substrate and subjects the to-be-processed substrate to a processing process to form a second template by using an imprinting method, includes forming a first resist film on a pattern forming region on the to-be-processed substrate, selectively forming a second resist film on a mark forming region on the to-be-processed substrate, transferring a concavo-convex pattern formed on the first template to the first resist film, and processing the to-be-processed substrate with the first resist film to which the concavo-convex pattern is transferred and the second resist film used as a mask. | 12-29-2011 |
Patent application number | Description | Published |
20100237469 | PHOTOMASK, SEMICONDUCTOR DEVICE, AND CHARGED BEAM WRITING APPARATUS - A photomask has a pattern formed by writing of a charged beam on basis of a charged beam control data. The charged beam control data is produced by: setting a plurality of correction points in a writing area on pattern data; performing a simulation of writing with a charged beam on basis of the pattern data to divide the writing area, at time of writing each of the correction points, into a written area of writing been already completed and an unwritten area of writing yet to be performed; deriving, for each of the correction points, a first charging amount distribution due to a fogging effect around each of the correction points using a subset of the pattern data belonging to the written area; deriving, for each of the correction points, a second charging amount distribution modified from the first charging amount distribution on basis of an effect by which the charging amount due to the fogging effect is reduced at a position irradiated with the charged beam; deriving amount of pattern displacement at each of the correction points on basis of the second charging amount distribution; and deriving correction parameters of pattern position on basis of the amount of pattern displacement. | 09-23-2010 |
20130249918 | METHOD OF FORMING DRAWING PATTERN, METHOD OF GENERATING DRAWING DATA, AND DRAWING DATA GENERATING DEVICE - According to a method of forming a drawing pattern of an embodiment, by setting the positions of drawing shots for a drawing pattern, drawing data is generated based on pattern data. A plurality of types of drawing data are generated based on one type of pattern data by setting the positions of the drawing shots to positions different for each piece of the drawing data when the drawing data is generated. In addition, multiple exposures are performed for the substrate by using the plurality of types of the drawing data when the drawing pattern is formed on the substrate. | 09-26-2013 |
20150021191 | PATTERN TRANSFER MOLD AND PATTERN FORMATION METHOD - According to one embodiment, a pattern transfer mold includes a base body, first and second stacked bodies, first and second electrodes. The base body includes a base unit including a first surface, a first protrusion provided on the first surface and having a first side surface, and a second protrusion provided on the first surface, separated from the first protrusion, and having a second side surface opposing the first side surface. The first stacked body is provided on the first side surface, and includes first conductive layers and a first insulating layer. The second stacked body is provided on the second side surface, separated from the first stacked body, and includes second conductive layers and a second insulating layer. The first electrode is electrically connected to at least one of the first conductive layers. The second electrode is electrically connected to at least one of the second conductive layers. | 01-22-2015 |
Patent application number | Description | Published |
20100144815 | AMINO ACID COMPOSITION - An amino acid composition is provided that can promote fat burning, improve endurance, and reduce fatigue during, for example, marathons, and that can lessen obesity and increase stress resistance. | 06-10-2010 |
20110222795 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND STORAGE MEDIUM - An image processing apparatus of the present invention includes: a separation section that separates image components having different attributes contained in electronic document data expressing an original image; a selection section that selects which mode from plural modes including a reusability emphasis mode for performing predetermined re-laying out of the image components with emphasis on reusability; and a generation section that re-lays the image components separated by the separation section according to the mode selected by the selection section, and generates software data corresponding to software for use. | 09-15-2011 |
20110304894 | IMAGE PROCESSING APPARATUS AND COMPUTER READABLE MEDIUM - An image processing apparatus includes a read unit and a first correction unit. The read unit reads a document and generates multilevel image data from the document. The first correction unit corrects the multilevel image data contained in a first range predetermined as a color indicating a fluorescent color so as to move the multilevel image data contained in the first range to an outside of a print color range when at least a part of the multilevel image data is contained in the first range. | 12-15-2011 |
20120063683 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM - An image processing apparatus includes a separating unit, a setting unit, and a determining unit. The separating unit separates an image into types of partial images other than a specific type, which is likely to be erroneously separated. The setting unit makes setting designating whether or not predetermined two types of partial images of the separated partial images are to be easily determined to be partial images of the specific type. The determining unit determines whether or not at least one of the predetermined two types of the partial images is the partial image of the specific type or not based upon the setting. | 03-15-2012 |
20120077420 | METHOD OF MANUFACTURING ANNULAR BODY - A method includes: charging a polishing material into a polishing apparatus that polishes a surface of a cylindrical film including a resin; alternately and repeatedly performing a surface-roughening operation of causing the polishing material to collide with the surface of the cylindrical film, thereby roughening the surface, and a cylindrical film replacing operation of replacing the cylindrical film on which roughening of the surface has been completed with another cylindrical film on which roughening of the surface has not been completed; replacing the polishing material by partially discharging the polishing material, and charging a new polishing material so that the percentage of the new polishing material with respect to the total amount of the polishing material after the new polishing material is charged becomes 30% by weight or more; and alternately and repeatedly performing the surface-roughening operation and the cylindrical film replacing operation again. | 03-29-2012 |
20140268251 | STARTUP OPERATION CONTROL APPARATUS, IMAGE PROCESSING APPARATUS, STARTUP OPERATION CONTROL METHOD, AND NON-TRANSITORY COMPUTER READABLE MEDIUM - A startup operation control apparatus includes a main-power-source operation unit, a determining unit, a memory, and a controller. The main-power-source operation unit is operated to supply and shut off power from a power source. The determining unit determines whether or not the main-power-source operation unit has been operated. The memory stores, every time an operation mode of a processing device that operates by receiving power supply from the power source changes, information representing the changed operation mode in an updating manner. If the determining unit determines, upon a shift from a power shutoff state to a power supply state, that the main-power-source operation unit has not been operated, the controller performs control so that the processing device operates in the operation mode represented by the information stored in the memory. | 09-18-2014 |
Patent application number | Description | Published |
20090130464 | Antistatic Hard Coat Film - An antistatic hard coat film showing antistatic property and antireflection property for outer lights as well as superior hard coat properties such as superior surface hardness and antiscratching property is provided. The antistatic hard coat film of the present invention comprises an antistatic hard coat layer formed from an ionizing radiation curable resin, a pigment and a polymer antistatic agent having an organopolysiloxane unit and a quaternary ammonium salt unit, and the hard coat layer contains 1 to 5% by weight of the pigment. Weight ratio of the ionizing radiation curable resin and the polymer antistatic agent is preferably 6:4 to 5:5. | 05-21-2009 |
20090315844 | FILM FOR OPTICAL USE, TRANSPARENT CONDUCTIVE MEMBER AND TRANSPARENT TOUCH PANEL USING THE SAME - The present invention provides a film for optical use wherein interference patterns are inconspicuous, while hard coat properties and image sharpness are maintained. | 12-24-2009 |
20100035053 | CURABLE COMPOSITION, CURED PRODUCT AND LAMINATE - A hard coat layer on which adhered fingerprints are inconspicuous is provided. The hard coat layer | 02-11-2010 |
20100040840 | FILM FOR INSERT MOLDING AND RESIN-MOLDED ARTICLE USING THE SAME - A film for insert molding comprising a base material film and a hard coat layer provided on at least one surface of the base material film, wherein the hard coat layer is formed from an ionizing radiation curable resin containing a reactive monomer having a cyclo ring structure containing at least one kind of element selected from carbon, nitrogen, oxygen, and silicon. The hard coat layer of this film for insert molding has sufficient surface hardness, and can prevent cracks which are likely to be generated at the time of molding (it has superior anti-cracking property). | 02-18-2010 |
20100040871 | HARD COAT FILM AND LAYERED MATERIAL - The hard coat film | 02-18-2010 |
20100053101 | OPTICAL FILM, LAMINATE AND TOUCH PANEL - An optical film that can make interference fringes inconspicuous with maintaining high surface hardness and transmission sharpness is provided. | 03-04-2010 |
20110216029 | SHEET WITH REFORMED LAYER AND MANUFACTURING METHOD THEREOF - Provided is a simple method for preventing oligomer deposition onto a film surface. Oligomer deposition onto the surface of a film substrate | 09-08-2011 |