Patent application number | Description | Published |
20110000042 | Integral structure of cotton yarn strips and a circular frame body of a mop - An integral structure of cotton yarn strips and a circular frame body of a mop, comprising: a) a circular frame body having a through hole at the center thereof, and b) a plurality of cotton yarn strips positioned at the bottom of the circular frame body. The top portion of the cotton yarn strips is arranged in an annular way within a molding cavity of the circular frame body such that the circular frame body and the top portion of the cotton yarn strips are integrally formed. A wrapping structure having a narrower bottom is created for fastening the top portion of the cotton yarn strips within the wrapping structure. In this way, the cotton yarn strips and the circular frame body can be rapidly formed for enhancing the production capacity. Moreover, the binding strength act on fibers of the cotton yarn strips | 01-06-2011 |
20110000043 | Disc rotating and positioning structure of a mop - A disc rotating and positioning structure of a mop including a mop head, a mop rod, a pivotal base, a positioning device, a locking device and a bolt. When the mop is dewatered, the mop rod is in an erect position, such that a semicircular cam of the bolt faces upward to drive the locking device to press the disc upward and into a locked and linking status, and when the mop is used for mopping, the mop rod is in an inclined position to drive the semicircular cam of the bolt to shift to a side, such that the locking device is in a non-pressing status with respect to the disc, and a force is applied to rotate the mop head when the mop is used for mopping a floor. Therefore, the present invention can provide a convenient operation and a user-friendly application. | 01-06-2011 |
20110000044 | Mop with the function of dewatering the yarns by twisting in a single direction via an up-and -down linear motion - A mop with the function of dewatering the yarns by twisting in a single direction via an up-and-down linear motion, comprising: a) an internal rod; b) an external rod having a bottom portion in a telescopic connection with a top portion of the internal rod; c) an engaging element positioned within the opening at the top of the internal rod; d) a driving element formed in an elongated shape and positioned within the external rod in such a way that the driving element is moved up and down synchronically with the external rod; e) an actuating element positioned within the engaging element for accommodating the driving element, the engaging element being driven in a single direction when the actuating element is rotated by the driving element; f) a disc body secured to the bottom thereof and having mop yarns; g) a locking mechanism mounted on the external rod for locking the internal rod and the external rod in place or for unlocking them in a telescopic state, wherein the actuating element is rotated by a linear motion of the driving element when the external rod is moved up-and-down; moreover, the engaging element is driven in rotation in a single direction, thereby creating a continuous rotation of the internal rod and the disc body in the same direction by the inertia force; as a result, a centrifugal force is produced to throw away the water absorbed in the mop yarns. In this way, the mop yarns may be dewatered in a more convenient and safer way. | 01-06-2011 |
20110002734 | Swiveling locking mechanism of a telescopic rod of a mop - A swiveling locking mechanism of a telescopic rod of a mop, including: an internal clamping sleeve, an external clamping cylinder, and a U-shaped locking arm. The upper portion of the internal clamping sleeve is constructed as an internal tube for the insertion and the fixing of the bottom of the external rod in place, and the lower portion of thereof is formed as a conic body with an indentation. The external clamping cylinder is mounted on the internal clamping sleeve and provided with two mounting holes corresponding to the positioning holes of the internal tube, and the lower portion thereof is constructed as a trumpet-shaped opening mounted on the conic body. The U-shaped locking arm includes a swivel protrusion and an eccentric cam at the internal wall of both sides thereof for fitting into the positioning holes of the internal clamping sleeve and the mounting holes of the external clamping cylinder, and the eccentric cams are positioned within the mounting holes. In this way, when the U-shaped locking arm swivels on the swivel protrusion, the eccentric cams are offset within the mounting holes such that the external clamping cylinder can be moved upward and downward relative to the external rim of the internal clamping sleeve, and the trumpet-shaped opening of the external clamping cylinder can be brought due to the action of the indentation in a tightened or a loosened position relative to the conic body of the internal clamping sleeve such that the internal and external rods are locked in place or unlocked in a telescopic state. | 01-06-2011 |
20110088193 | Non-stepping wringer bucket - A non-stepping wringer bucket includes a bucket body, having a top surface substantially in a form of an opening, and a bottom surface having a protruding base; a support shaft, the under part of the support shaft covered and fixed on the protruding base, the upper part of the support shaft protruding from the top of the protruding base, forming a combining-section having a ringed trough; an orientate element made from flexible material, wherein the orientate element in the form of an awl, tapering on the top, and with a mid hole matched up the ringed trough thus the ringed trough sheathed with the orientate element, forming the bottom of the protruding part of the orientate element into a positioned surface; a dewatering basket and a rotating element installed at the bottom of a rotating base, the rotating base sheathed onto the support shaft and installed at the bottom of the dewatering basket. In accordance of the invention provides a low cost and to prevent the water from seeping through the non-stepping wringer bucket. | 04-21-2011 |
Patent application number | Description | Published |
20110154749 | OUTER FRAME DRAINAGE STRUCTURE OF CONCENTRATOR TYPE SOLAR CELL MODULE - An outer frame drainage structure of a concentrator type solar cell module, wherein, a drainage element having a predetermined height is disposed between a side board and a frame edge, hereby keeping a drainage slit between said side board and the corresponding frame edge, so that moisture will not remain inside the concentrator type solar cell module, thus the concentrator type solar cell module is able to operate in an optimal light-to-electricity conversion efficiency. In a structure mentioned above, a concave slit is formed through engaging and positioning an extended and bent positioning portion of the side board into a positioning slot of the frame edge, and the concave slit is linked to the drainage slit, thus facilitating exit of moisture and preventing intrusion of foreign objects effectively. | 06-30-2011 |
20110174018 | MANUFACTURING PROCESS FOR SILICONE GLASS CONCENTRATOR LENS - A manufacturing process of silicone glass concentrator lens, wherein, a mold is provided with a material inlet hole and an air outlet hole that are respectively used for pouring in liquid silicone and exiting air respectively. Wherein, firstly, the mold is connected to a glass carrier plate in a vertical arrangement, then pouring the liquid silicone into the mold through the material inlet hole, thus exiting the excessive air through the air outlet hole of the mold automatically. Through the application of this manufacturing process, a bubble-free silicone glass concentrator lens can be made in a fast manner without the occurrences of liquid silicone overflow, hereby reducing the production cost. | 07-21-2011 |
20110174358 | FRAME STRUCTURE OF CONCENTRATOR TYPE SOLAR CELL MODULE - A frame structure of a concentrator type solar cell module, with its carrier portion and connection and fixing portion of a frame edge designed into a vertical and stack-up arrangement, thus reducing significantly a thickness of the frame edge, such that upon carrying a concentrator lens array, the proportion of light receiving area is increased, hereby raising the photo-electrical conversion efficiency of the concentrator type solar cell module. Therefore, in this way, in a condition of maintaining a same load mechanical strength, the ineffective light receiving area can be reduced significantly, while raising the photo-electrical conversion efficiency of the solar cell module. | 07-21-2011 |
20120125398 | CONDENSING LENS FOR HIGH CONCENTRATION PHOTOVOLTAIC MODULE AND MANUFACTURING METHOD THEREOF - The present invention discloses a manufacturing method of a condensing lens for a high concentration photovoltaic (HCPV) module. A buffer layer made of silicone is added between a glass and the condensing lens for adhering the glass to the condensing lens. Because the buffer layer can be formed on the glass before adhering to the condensing lens, a higher temperature for increasing adhesion between the glass and the buffer layer can be applied. It also allows the follow-up processes to have sufficient treatment time, thereby increasing the flexibility of processing schedule. | 05-24-2012 |
Patent application number | Description | Published |
20100214673 | Fresnel zone lens with grid - There is disclosed a perfectly plain FRESNEL zone lens. The perfectly plain FRESNEL zone lens includes a plurality of focusing units and a grid formed together with the focusing units by injection molding for example. The grid consists a plurality of cells. Each of the focusing units is disposed in a related one of the cells. | 08-26-2010 |
20110259386 | THERMOELECTRIC GENERATING MODULE - A thermoelectric generating module includes at least one thermoelectric unit and at least one light-concentrating unit. The thermoelectric unit has a first surface and a second surface disposed oppositely. The light-concentrating unit is disposed adjacent to the thermoelectric unit and concentrates light on the first surface of the thermoelectric unit. | 10-27-2011 |
20110283517 | Method for Aligning a Lens Array to a Cell Array - A concentration photovoltaic module includes a lens array and a cell array. The lens array includes lenses and alignment windows. The cell array includes solar cells and alignment points. A method is provided for aligning the lens array to the cell array. In the method, a collimation module is made with collimated light sources. The concentration photovoltaic module is located under the collimation module so that the alignment windows are located under the collimated light sources. The collimated light sources are used to turn sunlight into collimated light beams and cast the collimated light beams onto the cell array through the alignment windows. The lens array is moved relative to the cell array so that the collimated light beams are directed to the alignment points. Hence, light beams emitted from the lenses are directed to the solar cells. | 11-24-2011 |
20140048134 | CONCENTRATOR SOLAR RECEIVER WITH IMPROVED HOMOGENIZER - A concentrator solar receiver with an improved homogenizer is revealed. A homogenizer used in a concentrator solar module is improved. Instead of a smooth flat surface, a bottom surface of the homogenizer can be a positively curved surface, a conic solid, or a truncated tapered structure. Moreover, the bottom surface can be a rough surface. Thus not only the glue-overflow problem occurred during adhesion of the homogenizer to the solar cell can be solved, but also the possibility of air bubbles remaining between the glue and the homogenizer is reduced. Therefore the yield rate of a concentrator solar module is improved and the service life of the concentrator solar module is prolonged. | 02-20-2014 |
20140048497 | Frame Using Interior Connectors for Holding Highly-Concentrated Solar Cells - A frame is provided for highly-concentrated photovoltaic cells. The frame uses vertical and horizontal rods. Connectors are fixed at where the vertical and horizontal rods connect. The frame is constructed with the rods and connectors coordinated with fixing components. Thus, solar cell receivers can be directly set at any place on the frame; and the frame can be easily constructed and safely moved. Furthermore, location space is effectively used and weather resistance is achieved. | 02-20-2014 |
20140283908 | CONCENTRATED PHOTOVOLTAIC RECEIVER WITH FIXING STRUCTURE - A concentrated photovoltaic receiver with a fixing structure includes a support member to support and position a light homogenizer. The light homogenizer won't incline or come off due to gravity or other factors during sun-tracing process of the concentrated photovoltaic module. Besides, the support member has a through hole corresponding in position to a concentrated photovoltaic cell and functioning as a fixture for the light homogenizer, such that the light homogenizer can be connected to the concentrated photovoltaic cell at an accurate position and height. Through the structure of the support member, the present invention can prevent the external mist, greasy dirt, dust or the like from adhering to the outer walls of the light homogenizer. | 09-25-2014 |
20150021842 | FIXTURE FOR ATTACHING HOMOGENIZER OF CONCENTRATOR SOLAR RECEIVER - A fixture for attaching a homogenizer of a concentrator solar receiver is revealed. By fixing bodies and a sleeve being connected to or separated from each other, a homogenizer is attached firmly with adhesive in an inverted cone-shaped space. Moreover, an installation position and the adhesion height of the homogenizer can be controlled precisely. Thus time and labor consumed in assembling the homogenizer are dramatically reduced and good adhesion performance is achieved. | 01-22-2015 |
20150047821 | HEATING DEVICE STRUCTURE - The present relates to a heating device structure, which comprises a heat conducting member to mate with the heat dissipation fins of an electronic device. Thereby, during the packaging process of the electronic device, the effect of multi-point heating can be achieved by combining the heat conducting member and the fins. Accordingly, heating can be performed rapidly to reach the soldering temperature. Without the influence of the structure of heat dissipation fins, the heating process will not be performed at low efficiency. | 02-19-2015 |
20150096608 | FIXING APPARATUS FOR BALL LENS - The present invention relates to a fixing apparatus for ball lens used for facilitating installation of concentrator solar cell receiver module. The present invention can finish installing the fixing base for ball lens at a time and positioning the ball lens rapidly and accurately. It can also control the distance between the ball lens and the solar cell excellently. In addition, the present invention further has the function of sheltering the circuit of concentrator solar cell receiver module. When off-axis illumination of sunlight occurs, direct illumination of sunlight on, and consequently high-temperature burnout of, the circuit can be avoided. Thereby, the lifetime of the circuit can be extended effectively and the probability of failure can be reduced as well. | 04-09-2015 |
20150179854 | METHOD OF PACKAGING BALL LENS OF SOLAR COLLECTOR AND STRUCTURE THEREOF - A method of packaging ball lends of a solar collector contains step of coating optical clear adhesives on colloid layers twice, and the optical clear adhesives are solidified so that a solar cell, plural gold wires, and an electric circuit are packaged, thus eliminating use of a conventional support component, lowering weight of the solar collector, and simplifying the solar collector. Moreover, a dam is applied to absorb stray light so as to enhance light absorption of the solar cell and working efficiency of the solar collector. | 06-25-2015 |
20160039190 | METHOD FOR PACKAGING SECONDARY OPTICAL ELEMENT - The present invention relates to a method for packaging secondary optical element. By coating optical glue on the bottom surface of the secondary optical element and on the substrate and by hardening individually, as well as using the technical characteristics of flipping the substrate and the fixture, the secondary optical element can fall naturally and be positioned above an optoelectric device such as a solar cell or a light-emitting diode. No additional fastener is required for supporting the secondary optical element. | 02-11-2016 |
Patent application number | Description | Published |
20120235063 | Systems and Methods Providing Electron Beam Writing to a Medium - A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams. | 09-20-2012 |
20120264062 | ELECTRON BEAM LITHOGRAPHY SYSTEM AND METHOD FOR IMPROVING THROUGHPUT - An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer. | 10-18-2012 |
20130146780 | SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM - A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams. | 06-13-2013 |
20130157389 | Multiple-Patterning Overlay Decoupling Method - A method for fabricating a semiconductor device is disclosed. An exemplary method includes forming a first structure in a first layer by a first exposure and determining placement information of the first structure. The method further includes forming a second structure in a second layer overlying the first layer by a second exposure and determining placement information of the second structure. The method further includes forming a third structure including first and second substructures in a third layer overlying the second layer by a third exposure. Forming the third structure includes independently aligning the first substructure to the first structure and independently aligning the second substructure to the second structure | 06-20-2013 |
20130203001 | Multiple-Grid Exposure Method - A method for fabricating a semiconductor device is disclosed. An exemplary method includes receiving an integrated circuit (IC) layout design including a target pattern on a grid. The method further includes receiving a multiple-grid structure. The multiple-grid structure includes a number of exposure grid segments offset one from the other by an offset amount in a first direction. The method further includes performing a multiple-grid exposure to expose the target pattern on a substrate and thereby form a circuit feature pattern on the substrate. Performing the multiple-grid exposure includes scanning the substrate with the multiple-grid structure in a second direction such that a sub-pixel shift of the exposed target pattern occurs in the first direction, and using a delta time (Δt) such that a sub-pixel shift of the exposed target pattern occurs in the second direction. | 08-08-2013 |
20130232453 | NON-DIRECTIONAL DITHERING METHODS - A method of data preparation in lithography processes is described. The method includes providing an integrated circuit (IC) layout design in a graphic database system (GDS) grid, converting the IC layout design GDS grid to a first exposure grid, applying a non-directional dither technique to the first exposure, coincident with applying dithering to the first expose grid, applying a grid shift to the first exposure grid to generate a grid-shifted exposure grid and applying a dither to the grid-shifted exposure grid, and adding the first exposure grid (after receiving dithering) to the grid-shifted exposure grid (after receiving dithering) to generate a second exposure grid. | 09-05-2013 |
20130232455 | ERROR DIFFUSION AND GRID SHIFT IN LITHOGRAPHY - The present disclosure involves a method of data preparation in lithography processes. The method of data preparation includes providing an integrated circuit (IC) layout design in a graphic database system (GDS) grid, and converting the IC layout design GDS grid to a second exposure grid by applying an error diffusion and a grid shift technique to a sub-pixel exposure grid. | 09-05-2013 |
20130273474 | Grid Refinement Method - The present disclosure provides an embodiment of a method, for a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern generator having a first pixel size S | 10-17-2013 |
20130273475 | Grid Refinement Method - The present disclosure provide one embodiment of a method of a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern generator having a first pixel area S1 to generate a data grid having a second pixel area S2 that is equal to n | 10-17-2013 |
20130320225 | DEVICES AND METHODS FOR IMPROVED REFLECTIVE ELECTRON BEAM LITHOGRAPHY - A device for reflective electron-beam lithography and methods of producing the same are described. The device includes a substrate, a plurality of conductive layers formed on the substrate, which are parallel to each other and separated by insulating pillar structures, and a plurality of apertures in each conductive layer. Apertures in each conductive layer are vertically aligned with the apertures in other conductive layers and a periphery of each aperture includes conductive layers that are suspended. | 12-05-2013 |
20130323918 | METHODS FOR ELECTRON BEAM PATTERNING - A method for electron-beam patterning includes forming a conductive material layer on a substrate; forming a bottom anti-reflective coating (BARC) layer on the conductive material layer; forming a resist layer on the BARC layer; and directing an electron beam (e-beam) to the sensitive resist layer for an electron beam patterning process. The BARC layer is designed such that a top electrical potential of the resist layer is substantially zero during the e-beam patterning process. | 12-05-2013 |
20130327962 | Electron Beam Lithography System and Method For Improving Throughput - An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer. | 12-12-2013 |
20130330670 | Electron Beam Lithography System and Method for Improving Throughput - An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer. | 12-12-2013 |
20140004468 | MULTIPLE-GRID EXPOSURE METHOD | 01-02-2014 |
20140007023 | METHOD FOR PROXIMITY CORRECTION | 01-02-2014 |
20140217305 | SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM - A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams. | 08-07-2014 |
20140368806 | Grid Refinement Method - The present disclosure provides an embodiment of a method, for a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern generator having a first pixel size S1 to generate an alternating data grid having a second pixel size S2 that is 12-18-2014 | |
20150035851 | Method for Image Dithering - The present disclosure provides a method for image dithering. The method includes providing a polygon related to an integrated circuit (IC) layout design in a graphic database system (GDS) grid; converting the polygon to an intensity map in the GDS grid, the intensity map including a group of partial pixels and a group of full pixels; performing a first quantization process to a partial pixel to determine a first error; applying the first error to one or more full pixels; performing a second quantization process to a full pixel to determine a second error; and distributing the second error to one or more full pixels. The partial pixels correspond to pixels partially covered by the polygon, and the full pixels correspond to pixels fully covered by the polygon. | 02-05-2015 |
20150040079 | Method for Electron Beam Proximity Correction with Improved Critical Dimension Accuracy - The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having a feature; fracturing the feature into a plurality of polygons that includes a first polygon; assigning target points to edges of the first polygon; calculating corrected exposure doses to the first polygon, wherein each of the correct exposure doses is determined based on a respective one of the target points by simulation; determining a polygon exposure dose to the first polygon based on the corrected exposure doses; and preparing a tape-out data for lithography patterning, wherein the tape-out data defines the plurality of polygons and a plurality of polygon exposure doses paired with the plurality of polygons. | 02-05-2015 |
20150052489 | LONG-RANGE LITHOGRAPHIC DOSE CORRECTION - A method of quantifying a lithographic proximity effect and determining a lithographic exposure dosage is disclosed. In an exemplary embodiment, the method for determining an exposure dosage comprises receiving a design database including a plurality of features intended to be formed on a workpiece. A target region of the design database is defined such that the target region includes a target feature. A region of the design database proximate to the target region is also defined. An approximation for the region is determined, where the approximation represents an exposed area within the region. A proximity effect of the region upon the target feature is determined based on the approximation for the region. A total proximity effect for the target feature is determined based on the determined proximity effect of the region upon the target feature. | 02-19-2015 |
20150077731 | SYSTEMS AND METHODS FOR HIGH-THROUGHPUT AND SMALL-FOOTPRINT SCANNING EXPOSURE FOR LITHOGRAPHY - The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier. | 03-19-2015 |
20150212423 | Pattern Generator For A Lithography System - A pattern generator includes a mirror array plate having a mirror, at least one electrode plate disposed over the mirror array plate, a lens let disposed over the mirror, and at least one insulator layer sandwiched between the mirror array plate and the electrode plate. The electrode plate includes a first conducting layer and a second conducting layer. The lens let has a non-straight sidewall formed in the electrode plate. The pattern generator further includes at least one insulator sandwiched between two electrode plates. The non-straight sidewall can be a U-shaped sidewall or an L-shaped sidewall. | 07-30-2015 |
20160049278 | Apparatus for Charged Particle Lithography System - An apparatus for use in a charged particle multi-beam lithography system is disclosed. The apparatus includes a plurality of charged particle doublets each having a first aperture and each configured to demagnify a beamlet incident upon the first aperture thereby producing a demagnified beamlet. The apparatus further includes a plurality of charged particle lenses each associated with one of the charged particle doublets, each having a second aperture, and each configured to receive the demagnified beamlet from the associated charged particle doublet and to realize one of two states: a switched-on state, wherein the demagnified beamlet is allowed to travel along a desired path, and a switched-off state, wherein the demagnified beamlet is prevented from traveling along the desired path. In embodiments, the first aperture is greater than the second aperture, thereby improving particle beam efficiency in the charged particle multi-beam lithography system. | 02-18-2016 |
20160055291 | Grid Refinement Method - The present disclosure provides an embodiment of a method, for a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern generator having a first pixel size S | 02-25-2016 |
20160091795 | SYSTEMS AND METHODS FOR HIGH-THROUGHPUT AND SMALL-FOOTPRINT SCANNING EXPOSURE FOR LITHOGRAPHY - The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier. | 03-31-2016 |
Patent application number | Description | Published |
20150177595 | LIGHT-CONTROLLING DEVICE WITH REPLACEABLE OPTICAL FILTER - In a light-controlling device with replaceable optical filter, a slot seat has a slot, and the middle of the slot has a light-transmitting area. An optical filter is inserted into the slot and has a light-filtering member exposed to the light-transmitting area. The present invention directly extracts the optical filter in the slot whereby different color filters corresponding to external light are rapidly replaced without repeatedly disassembling the light-controlling device. | 06-25-2015 |
20150185590 | FOLDABLE SUBDUED-LIGHTING DEVICE - A foldable subdued-lighting device is provided, comprising a base pedestal, and on an upper surface of the base pedestal is an assembly part. The assembly part is covered with a soft subdued-lighting mask, and there are a plurality of light-guiding refraction protrusions which surround and are disposed on an inner surface of the soft subdued-lighting mask. When the proposed device is applied to a lamp, the light emitted from the lamp passes through the light-guiding refraction protrusions, such that the original light is spread and diffused to become a subdued light. The proposed device is advantageous of generating a subdued light by using the light-guiding refraction protrusions to refract the light emitted from the lamp, and also generating light with high intensity by folding the soft subdued-lighting mask itself such that the transparency of the soft subdued-lighting mask is adjusted. | 07-02-2015 |
20150336727 | ACCESSORY STORAGE DEVICE - An accessory storage device comprises a plurality of transparent casings each having a through hole and at least one slot; and a fixing pivot passing through the through hole of each transparent casing to cascade the transparent casings, wherein the slot interconnects with an opening, and wherein an accessory is inserted through the opening into the slot for storage. The transparent casings of the accessory storage device can be spread fanwise to reveal the accessories stored inside the transparent casings or the labels on the transparent casings. Thereby, the user can fast find out the required accessories stored in the accessory storage device. | 11-26-2015 |
20150370145 | LIGHTING CONTROL DEVICE - A lighting control device is mounted in a photoflash and comprises a fixing seat and a honeycomb grid installed in said fixing seat. The terminal of an extension of one end of the honeycomb grid has a first installation member, and the other end of the honeycomb grid has a honeycomb member. An annular region of the outer surface of the honeycomb member, which is adjacent to the first installation member, has a second installation member. In application, the first or second installation member is sleeved by the fixing seat to make the photoflash generate a desired lighted area according to requirement. Thereby, the present invention can change the distance between the honeycomb member and the photoflash and adjust the area lighted by the photoflash via varying the installation way of the honeycomb grid. | 12-24-2015 |