Patent application number | Description | Published |
20110165605 | METHOD FOR DESIGNING MUTANT ENZYME, METHOD FOR PREPARING MUTANT ENZYME, AND MUTANT ENZYME - An object is to provide a novel method of improving an enzyme capable of deamidating a protein. A mutant enzyme is designed by the following steps: (1) specifying one or more amino acids selected from the following group, namely, consisting of an amino acid corresponding to the amino acid at position 35, an amino acid corresponding to the amino acid at position 38, an amino acid corresponding to the amino acid at position 39, an amino acid corresponding to the amino acid at position 40, an amino acid corresponding to the amino acid at position 41, an amino acid corresponding to the amino acid at position 42, an amino acid corresponding to the amino acid at position 43, an amino acid corresponding to the amino acid at position 45, an amino acid corresponding to the amino acid at position 46, an amino acid corresponding to the amino acid at position 49, an amino acid corresponding to the amino acid at position 79, an amino acid corresponding to the amino acid at position 80, an amino acid corresponding to the amino acid at position 81, an amino acid corresponding to the amino acid at position 82, an amino acid corresponding to the amino acid at position 83, an amino acid corresponding to the amino acid at position 84, an amino acid corresponding to the amino acid at position 103, an amino acid corresponding to the amino acid at position 104, an amino acid corresponding to the amino acid at position 105, an amino acid corresponding to the amino acid at position 106, an amino acid corresponding to the amino acid at position 117, an amino acid corresponding to the amino acid at position 142, an amino acid corresponding to the amino acid at position 143, an amino acid corresponding to the amino acid at position 146, an amino acid corresponding to the amino acid at position 166, and an amino acid corresponding to the amino acid at position 185 in an amino acid sequence set forth in SEQ ID NO: 2, in a protein deamidase (an enzyme to be mutated); and (2) constructing an amino acid sequence having substitution of the amino acid(s) specified in the step (1) by another amino acid(s) or having deletion of the amino acid(s) specified in the step (1) using the amino acid sequence for an enzyme to be mutated as a base sequence. | 07-07-2011 |
20120220004 | ETHANOL PRODUCTION FROM OCEAN BIOMASS - An object of the present invention is to provide a method for producing ethanol from polysaccharide alginate contained in a large amounts in brown algae, using the alginate assimilation capacity of the | 08-30-2012 |
Patent application number | Description | Published |
20080196995 | Grease Composition, Grease-Enclosed Bearing, and Rotation-Transmitting Apparatus With Built-In One Way Clutch - The present invention provides a grease composition capable of effectively preventing a rolling surface of a bearing from having hydrogen brittleness-caused peeling, a grease-enclosed bearing in which the grease composition is enclosed, and a rotation-transmitting apparatus with a built-in one-way clutch in which the grease composition is enclosed at a sliding portion. The grease composition contains a base grease consisting of a base oil and a thickener; and an additive added to the base grease. The grease composition prevents a frictional wear surface of the sliding portion or a newly generated surface consisting of iron or the like exposed owing to wear from being peeled owing to hydrogen brittleness. The additive contains a bismuth-based additive or a magnesium-based additive. The bismuth-based additive consists of at least one of inorganic bismuth and organic bismuth not containing a sulfur component. The magnesium-based additive consists of at least one of inorganic magnesium and organic magnesium. The grease-enclosed bearing encloses the above-described grease composition. | 08-21-2008 |
20090005272 | Grease Composition, Grease-Enclosed Bearing, and One-Way Clutch - The present invention provides a grease composition capable of effectively preventing a rolling surface from having hydrogen brittleness-caused peeling, a grease-enclosed bearing in which the grease composition is enclosed, and a one-way clutch in which the grease composition is enclosed at a sliding portion. The grease composition contains a base grease consisting of a base oil and a thickener and an additive added to the base grease. The grease composition is capable of preventing hydrogen brittleness-caused peeling from occurring on a frictionally worn surface of a bearing portion containing an iron-based metal material or a newly generated surface consisting of the iron-based metal material exposed owing to wear. The additive contains at least one aluminum-based additive selected from among an aluminum powder and inorganic aluminum compounds. The mixing ratio of the aluminum-based additive to 100 parts by weight of the base grease is set to 0.05 to 10 parts by weight. | 01-01-2009 |
20090124400 | Rotation-transmitting apparatus with built-in one-way clutch - The present invention provides a rotation-transmitting apparatus with a built-in one-way clutch which is capable of preventing rolling contact surfaces and rolling surfaces of inner and outer rings of a rolling bearing from peeling and fretting wearing and is excellent in its resistance to heat and wear. The rotation-transmitting apparatus with a built-in one-way clutch has an inside rotational member; a cylindrical outside rotational member disposed concentrically with the inside rotational member; a one-way clutch connecting the outside surface of the inside rotational member and the inside surface of the outside rotational member to each other only when the outside rotational member rotates at a higher speed than the inside rotational member; and a pair of rolling bearings allowing the inside rotational member and the outside rotational member to rotate relative to each other. Grease is enclosed inside an internal space of a clutch where a plurality of rollers is mounted and inside a space of the bearing where a plurality of rolling elements is mounted. The grease contains a base oil, a thickener, and an additive. The base oil is PAO oil. As the additive, 0.01 to 15 wt % of at leas one compound selected from among ZnDTC and ZnDTP is contained for the entire amount of the grease. | 05-14-2009 |
20090279824 | GREASE-ENCLOSED BEARING FOR INVERTER-DRIVING MOTOR - The present invention provides a grease-enclosed bearing, for an inverter-driving motor, which is inexpensive and capable of effectively restraining damage from being generated by electrolytic corrosion. The grease-enclosed bearing for the inverter-driving motor has an inner ring ( | 11-12-2009 |
20100092118 | GREASE COMPOSITION AND GREASE-ENCLOSED BEARING - The present invention provides a grease composition capable of effectively preventing a rolling surface of a grease-enclosed bearing from having hydrogen brittleness-caused peeling and the grease-enclosed bearing. The grease composition includes a base grease consisting of a base oil and a thickener and an additive added to the base grease. The additive contains at least an epoxy compound. A mixing ratio of the epoxy compound to 100 parts by weight of the base grease is set to 0.05 to 10 parts by weight. The grease-enclosed bearing using the grease composition includes an inner ring ( | 04-15-2010 |
20100220943 | ROLLING BEARING AND SEAL FOR ROLLING BEARING - It is an object of the present invention to provide a rolling bearing in which efficacy provided by an auxiliary agent for grease can be maintained for a long time to extend its life and a seal for the rolling bearing. A rolling bearing ( | 09-02-2010 |
20110207535 | Grease, rolling bearing, constant velocity joint, and rolling parts - The present invention provides grease which prevents frictional wear on a lubricating surface and excellent in performance of preventing occurrence of flaking, heat-resistant performance, and long-term durability, a grease-enclosed rolling bearing, a constant velocity joint, and rolling parts. Grease is composed of base grease, essentially containing a thickener, to which at least 0.01 to 15 wt % of one substance selected from among bismuth and inorganic bismuth compounds is added. The inorganic bismuth compounds are at least one inorganic bismuth selected from among bismuth sulfate, bismuth trioxide, bismuth carbonate, and sodium bismuthate. The above-described grease is used for the rolling bearing and the constant velocity joint. A coating film of at least one substance selected from among the bismuth and the inorganic bismuth is formed on surfaces of the rolling parts. | 08-25-2011 |
20110306429 | GREASE COMPOSITION, GREASE-PACKED BEARING, UNIVERSAL JOINT FOR PROPELLER SHAFT, LUBRICATING OIL COMPOSITION, AND OIL-IMPREGNATED SINTERED BEARING - The present invention provides a grease composition or a lubricating oil composition which is capable of effectively preventing hydrogen brittleness-caused peeling from occurring on a rolling surface of a rolling bearing, is excellent in durability in a high temperature and speed operation, and can be used for a long time. A grease-packed bearing ( | 12-15-2011 |
20110311173 | Rolling bearing - The present invention provides a rolling bearing which is excellent in high-temperatures and high-speed durability and quietness, is capable of effectively preventing hydrogen brittleness-caused peeling from occurring on a rolling surface thereof, and has a low environmental load. A rolling bearing ( | 12-22-2011 |
20120149614 | Grease, rolling bearing, constant velocity joint, and rolling parts - The present invention provides grease which prevents frictional wear on a lubricating surface and excellent in performance of preventing occurrence of flaking, heat-resistant performance, and long-term durability, a grease-enclosed rolling bearing, a constant velocity joint, and rolling parts. Grease is composed of base grease, essentially containing a thickener, to which at least 0.01 to 15 wt % of one substance selected from among bismuth and inorganic bismuth compounds is added. The inorganic bismuth compounds are at least one inorganic bismuth selected from among bismuth sulfate, bismuth trioxide, bismuth carbonate, and sodium bismuthate. The above-described grease is used for the rolling bearing and the constant velocity joint. A coating film of at least one substance selected from among the bismuth and the inorganic bismuth is formed on surfaces of the rolling parts. | 06-14-2012 |
20130170777 | GREASE COMPOSITION AND ROLLING BEARING - The present invention provides a grease composition having an excellent fretting wear resistance in a wide temperature region from low to high temperatures and particularly even at low temperatures and a rolling bearing in which the grease composition is packed. A grease composition ( | 07-04-2013 |
Patent application number | Description | Published |
20100270649 | NITRIDE SEMICONDUCTOR WAFER - A nitride semiconductor wafer is planar-processed by grinding a bottom surface of the wafer, etching the bottom surface by, e.g., KOH for removing a bottom process-induced degradation layer, chamfering by a rubber whetstone bonded with 100 wt %-60 wt % #3000-#600 diamond granules and 0 wt %-40 wt % oxide granules, grinding and polishing a top surface of the wafer, etching the top surface for eliminating a top process-induced degradation layer and maintaining a 0.5 μm-10 μm thick edge process-induced degradation layer. | 10-28-2010 |
20110049679 | METHOD OF PROCESSING OF NITRIDE SEMICONDUCTOR WAFER, NITRIDE SEMICONDUCTOR WAFER, METHOD OF PRODUCING NITRIDE SEMICONDUCTOR DEVICE AND NITRIDE SEMICONDUCTOR DEVICE - A nitride semiconductor wafer is planar-processed by grinding a bottom surface of the wafer, etching the bottom surface by, e.g., KOH for removing a bottom process-induced degradation layer, chamfering by a rubber whetstone bonded with 100 wt %-60 wt % #3000-#600 diamond granules and 0 wt %-40 wt % oxide granules, grinding and polishing a top surface of the wafer, etching the top surface for eliminating a top process-induced degradation layer and maintaining a 0.5 μm-10 μm thick edge process-induced degradation layer. | 03-03-2011 |
20120043645 | METHOD OF PROCESSING OF NITRIDE SEMICONDUCTOR WAFER, NITRIDE SEMICONDUCTOR WAFER, METHOD OF PRODUCING NITRIDE SEMICONDUCTOR DEVICE AND NITRIDE SEMICONDUCTOR DEVICE - A nitride semiconductor wafer is planar-processed by grinding a bottom surface of the wafer, etching the bottom surface by, e.g., KOH for removing a bottom process-induced degradation layer, chamfering by a rubber whetstone bonded with 100 wt %-60 wt % #3000-#600 diamond granules and 0 wt %-40 wt % oxide granules, grinding and polishing a top surface of the wafer, etching the top surface for eliminating a top process-induced degradation layer and maintaining a 0.5 μm-10 μm thick edge process-induced degradation layer. | 02-23-2012 |
20120184108 | METHOD OF PROCESSING OF NITRIDE SEMICONDUCTOR WAFER, NITRIDE SEMICONDUCTOR WAFER, METHOD OF PRODUCING NITRIDE SEMICONDUCTOR DEVICE AND NITRIDE SEMICONDUCTOR DEVICE - A nitride semiconductor wafer is planar-processed by grinding a bottom surface of the wafer, etching the bottom surface by, e.g., KOH for removing a bottom process-induced degradation layer, chamfering by a rubber whetstone bonded with 100 wt %-60 wt % #3000-#600 diamond granules and 0 wt %-40 wt % oxide granules, grinding and polishing a top surface of the wafer, etching the top surface for eliminating a top process-induced degradation layer and maintaining a 0.5 μm-10 μm thick edge process-induced degradation layer. | 07-19-2012 |
Patent application number | Description | Published |
20110068434 | NITRIDE SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHODS FOR MANUFACTURING NITRIDE SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE - A nitride semiconductor substrate having a main surface serving as a semipolar plane and provided with a chamfered portion capable of effectively preventing cracking and chipping, a semiconductor device fabricated using the nitride semiconductor substrate, and a method for manufacturing the nitride semiconductor substrate and the semiconductor device are provided. The nitride semiconductor substrate includes a main surface inclined at an angle of 71° or more and 79° or less with respect to the (0001) plane toward the [1-100] direction or inclined at an angle of 71° or more and 79° or less with respect to the (000-1) plane toward the [−1100] direction; and a chamfered portion located at an edge of an outer periphery of the main surface. The chamfered portion is inclined at an angle θ | 03-24-2011 |
20130032013 | METHOD OF MANUFACTURING GROUP III NITRIDE CRYSTAL SUBSTRATE - A method of manufacturing a group III nitride crystal substrate includes the step of preparing a group III nitride crystal body and the step of producing a group III nitride crystal substrate by slicing the group III nitride crystal body with a resin-fixed-abrasive wire. Accordingly, the method of manufacturing a group III nitride crystal substrate is provided that enables large-sized group III nitride crystal substrates with a small warp and a small arithmetic mean surface roughness to be manufactured by means of a resin-fixed-abrasive wire efficiently with a high yield. | 02-07-2013 |
20130061841 | SAW WIRE AND METHOD OF MANUFACTURING GROUP III NITRIDE CRYSTAL SUBSTRATE USING THE SAME - A method of manufacturing a group III nitride crystal substrate slices a group III nitride crystal body with a saw wire which includes a steel wire having a carbon concentration of 0.90-0.95 mass %, a silicon concentration of 0.12-0.32 mass %, a manganese concentration of 0.40-0.90 mass %, a phosphorus concentration of 0.025 mass % or less, a sulfur concentration of 0.025 mass % or less, and a copper concentration of 0.20 mass % or less, and has a diameter of not less than 0.07 mm and less than 0.16 mm, a tensile strength at break of higher than 4200 N/mm | 03-14-2013 |
20130134434 | NITRIDE SEMICONDUCTOR SUBSTRATE - A nitride semiconductor device includes a main surface and an indicator portion. The main surface is a plane inclined by at least 71° and at most 79° in a [1-100] direction from a (0001) plane or a plane inclined by at least 71° and at most 79° in a [−1100] direction from a (000-1) plane. The indicator portion indicates a (−1017) plane, a (10-1-7) plane, or a plane inclined by at least −4° and at most 4° in the [1-100] direction from these planes and inclined by at least −0.5° and at most 0.5° in a direction orthogonal to the [1-100] direction. | 05-30-2013 |
20130252401 | NITRIDE SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHODS FOR MANUFACTURING NITRIDE SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE - A nitride semiconductor substrate having a main surface serving as a semipolar plane and provided with a chamfered portion capable of effectively preventing cracking and chipping, a semiconductor device fabricated using the nitride semiconductor substrate, and a method for manufacturing the nitride semiconductor substrate and the semiconductor device are provided. The nitride semiconductor substrate includes a main surface inclined at an angle of 71° or more and 79° or less with respect to the (0001) plane toward the [1-100] direction or inclined at an angle of 71° or more and 79° or less with respect to the (000-1) plane toward the [−1100] direction; and a chamfered portion located at an edge of an outer periphery of the main surface. The chamfered portion is inclined at an angle θ | 09-26-2013 |
20140103353 | GROUP III NITRIDE COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, LAMINATED GROUP III NITRIDE COMPOSITE SUBSTRATE, AND GROUP III NITRIDE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A group III nitride composite substrate includes a support substrate and a group III nitride film. A ratio s | 04-17-2014 |
Patent application number | Description | Published |
20100175509 | METHOD OF PROCESSING COPPER ARSENIC COMPOUND - Provided is a method of easily producing scorodite which is stable and has excellent filtering properties with excellent reproducibility and without using complex operations, when processing arsenic that is included in non-ferrous smelting intermediates, and particularly when processing copper arsenic compounds in the form of an intermetallic compound. Scorodite is produced by a leaching step of leaching arsenic from a non-ferrous melting intermediate containing a copper arsenic compound in the form of an intermetallic compound in the presence of a sulfidizing agent and an oxidizing agent, a solution adjusting step of oxidizing trivalent arsenic to pentavalent arsenic by adding the oxidizing agent to the leaching solution, and a crystallizing step of converting the arsenic in the adjusted solution to scorodite crystals. | 07-15-2010 |
20100196230 | METHOD OF PROCESSING NON-FERROUS SMELTING INTERMEDIATE CONTAINING ARSENIC - Provided is a method of easily producing easily-filterable and stable scorodite that meets the leaching standard (conformance to Japanese Environmental Agency Notice 13) with excellent reproducibility and without using complex operations, when processing arsenic that is included in non-ferrous smelting intermediates, and particularly when processing arsenic in the form of a sulfide. Scorodite is produced by a leaching step of leaching arsenic from a non-ferrous melting intermediate containing arsenic in the weakly acid region, a solution adjusting step of oxidizing trivalent arsenic to pentavalent arsenic by adding an oxidizing agent to the leaching solution, and a crystallizing step of converting the arsenic in the adjusted solution to scorodite crystals. | 08-05-2010 |
20100196231 | Method Of Processing Non-Ferrous Smelting Intermediates Containing Arsenic - The object is to remove arsenic in a stable form from an arsenic-containing smelting intermediate product. Thus, disclosed is a method for treating an arsenic-containing nonferrous smelting intermediate product, which comprises: a leaching step of subjecting a mixed slurry of a nonferrous smelting intermediate product containing arsenic in the form of a sulfide and a nonferrous smelting intermediate product containing arsenic and metal copper to the oxidation/leaching in an acidic range to produce a leaching solution; a solution preparation step of adding an oxidizing agent to the leaching solution to oxidize trivalent arsenic into pentavalent arsenic, thereby producing a preparation solution; and a crystallization step of converting arsenic contained in the preparation solution into a scorodite crystal. | 08-05-2010 |
20100215570 | METHOD OF ALKALI PROCESSING SUBSTANCE CONTAINING ARSENIC - To provide a method of generating, with good reproducibility and ease and without complicated operations, scorodite which satisfies the elution standard (in accordance with Notification of No. 13 of Japanese Environment Agency) and which has good filterbility and stability for processing arsenic contained in a non-ferrous smelting intermediate, particularly, for processing a diarsenic trioxide form. A method of processing diarsenic trioxide, including: a leaching step of adding water and alkali to a non-ferrous smelting intermediate that contains diarsenic trioxide to produce slurry, heating the slurry, and leaching arsenic; a solution adjusting step of adding an oxidizing agent to the leachate to oxidize trivalent arsenic to pentavalent arsenic so as to obtain an adjusted solution; and a crystallizing step of converting arsenic in the adjusted solution to scorodite crystal. | 08-26-2010 |
20100266484 | METHOD OF PROCESSING DIARSENIC TRIOXIDE - To provide a method of generating, with good reproducibility and ease and without complicated operations, scorodite which satisfies the elution standard (in accordance with Notification of No. 13 of Japanese Environment Agency) and which has good filterbility and stability for processing arsenic contained in a diarsenic trioxide form. A method of processing diarsenic trioxide, including: a leaching step of adding water to diarsenic trioxide to produce slurry, heating the slurry, and leaching arsenic while adding an oxidant to obtain leachate; a deoxidization step of removing the oxidant so as to obtain an adjusted solution; and a crystallizing step of converting arsenic in the adjusted solution to scorodite crystal. | 10-21-2010 |
Patent application number | Description | Published |
20090231562 | EFFECTIVE LIGHT SOURCE SHAPE DATABASE GENERATION METHOD, OPTICAL IMAGE CALCULATION METHOD, RECORDING MEDIUM, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD - The present invention provides a method of generating a database of effective light source shapes including a generation step of generating an initial database representing an effective light source shapes corresponding to a plurality of conditions settable for an illumination optical system, a measurement step of setting an arbitrary condition for the illumination optical system, and measuring an effective light source shape, a calculation step of calculating a difference amount between an effective light source shape when each of the plurality of conditions is set for the illumination optical system and the effective light source shape included in the initial database, and a correction step of correcting the effective light source shapes included in the initial database using the difference amounts and compiling the corrected effective light source shapes into an actual database. | 09-17-2009 |
20090233194 | PARAMETER DETERMINATION METHOD, EXPOSURE METHOD, DEVICE FABRICATION METHOD, AND STORAGE MEDIUM - The present invention provides a parameter determination method of determining an optical parameter and a process parameter by using an optical simulator which calculates a resist image to be formed on a resist applied on a substrate, based on the optical parameter of an exposure apparatus which transfers a pattern of a mask onto the substrate, and a process simulator which calculates a process image to be formed on the substrate, based on the process parameter representing information concerning the resist and information concerning a process to be performed on the resist. | 09-17-2009 |
20090310116 | RECORDING MEDIUM STORING PROGRAM FOR DETERMINING EXPOSURE PARAMETER, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE - An exposure method comprises setting an exposure condition using a value of an exposure parameter when plural types of patterns are transferred onto a substrate. The method of determining a value of an exposure parameter comprises calculating an optical image, formed on an image plane upon illuminating a pattern on an object plane, for each of combinations of plural values of an exposure parameter and plural values of at least one of an exposure amount and a defocus amount, calculating, for each of the plural values of the exposure parameter, a deviation between a contour of a target optical image and a calculated contour of the optical image, in each of the plural types of patterns, and determining a value of the exposure parameter, at which a maximum value of the deviations among the plural types of patterns is minimum, as a value of the exposure parameter when exposing the substrate. | 12-17-2009 |
20100009275 | EXPOSURE METHOD AND MEMORY MEDIUM STORING COMPUTER PROGRAM - A method comprises determining an exposure condition by executing a process including computing an image formed on an image plane under the current exposure condition while changing the exposure condition, and evaluating a line width of the computed image, and exposing the substrate under the determined exposure condition, wherein the determining includes, computing a simplified evaluation value of the computed image, changing the exposure condition and executing the process in the changed exposure condition, after evaluating the computed image if the simplified evaluation value satisfies an allowable value, and changing the exposure condition and executing the process in the changed exposure condition without evaluating the computed image if the simplified evaluation value does not satisfy the allowable value. | 01-14-2010 |
20100102255 | METHOD OF TRANSFERRING PATTERN OF RETICLE, COMPUTER READABLE STORAGE MEDIUM, AND METHOD OF MANUFACTURING DEVICE - A method includes setting a target pattern to be formed on a substrate using a reticle, obtaining a first pattern using the reticle and a first illumination condition, calculating, a second illumination condition under which the target pattern is transferred onto the substrate using the reticle, and a third illumination condition under which the first pattern is transferred onto a substrate using the reticle, using mathematical models each of which defines the relationship between an illumination condition and a virtual pattern transferred onto a substrate using the illumination condition, determining a fourth illumination condition, obtained by adding the difference between the calculated second illumination condition and third illumination condition to the first illumination condition, as the illumination condition, and transferring the pattern of the reticle onto the substrate by illuminating the reticle using the determined illumination condition. | 04-29-2010 |
20110206270 | STORAGE MEDIUM STORING COMPUTER PROGRAM FOR DETERMINING AT LEAST ONE OF EXPOSURE CONDITION AND MASK PATTERN - A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result. | 08-25-2011 |
20120033194 | DECISION METHOD AND STORAGE MEDIUM - The present invention provides a decision method of causing a computer to decide an exposure condition to be set in an exposure apparatus including an illumination optical system that illuminates a pattern including a plurality of pattern elements, and a projection optical system that projects the pattern onto a substrate, including a step of obtaining a distance between intersections of a first line, used to evaluate dimensions of images of the pattern elements, and contours of the images of the pattern elements by obtaining the image of the pattern formed on the image plane of the projection optical system, and a step of determining whether there exist intersections of a second line, used to evaluate whether the images of the pattern elements are resolved, and the contours of the images of the pattern elements to evaluate whether the images of the pattern elements are resolved. | 02-09-2012 |
20120092639 | RESIST PATTERN CALCULATION METHOD AND CALCULATION PROGRAM STORAGE MEDIUM - A recording medium stores a program for causing a computer to execute a method of calculating a resist pattern. The method includes: a first step of calculating a light intensity distribution of an optical image formed on the resist, based on the reticle pattern and an exposure condition; a second step of convoluting, using a first diffusion length, the calculated light intensity distribution; a third step of calculating a representative light intensity from the calculated light intensity distribution or the convoluted light intensity distribution; a fourth step of correcting the convoluted light intensity distribution by adding, to the convoluted light intensity distribution, a correction function including a first function given by: | 04-19-2012 |
20130010272 | DETERMINATION METHOD, STORAGE MEDIUM AND INFORMATION PROCESSING APPARATUS - The present invention provides a determination method of determining exposure conditions of an exposure apparatus including an illumination optical system which illuminates a mask, and a projection optical system which projects a pattern of the mask onto a substrate, the method including a step of setting an illumination parameter for a light intensity distribution formed on a pupil plane of the illumination optical system, and an aberration parameter for an aberration of the projection optical system, and a step of determining a value of the illumination parameter and a value of the aberration parameter so that an image performance of an optical image of the pattern of the mask satisfies an evaluation criterion set for a target pattern to be formed on an image plane of the projection optical system. | 01-10-2013 |
20130149636 | PATTERN DETERMINING METHOD, PATTERN DETERMINING APPARATUS AND STORAGE MEDIUM - A method of determining a pattern of a mask for an exposure apparatus includes a first calculation step of calculating a value of a first evaluation function used to evaluate a cost of drawing a provisional pattern on a mask blank to manufacture the mask, a second calculation step of calculating a value of a second evaluation function used to evaluate an image formed on an image plane when a mask having the provisional pattern is arranged on an object plane, and a changing step of, when calculation results of the first and second calculation steps do not meet a termination condition, changing at least one of the provisional pattern, an illumination condition in the exposure apparatus, and a drawing condition of the pattern for the mask blank. | 06-13-2013 |
20130329202 | PATTERN GENERATION METHOD - A pattern generation method for generating a pattern of a cell used to generate a pattern of a mask using a computer, includes obtaining data of pattern of the cell, calculating image of the pattern of the cell to obtain an evaluation value of the image by repeatedly changing a parameter value of an exposure condition when the mask which has the pattern of the cell is illuminated to project image of the pattern of the cell onto a substrate to expose the substrate, and a parameter value of the pattern of the cell, and determining parameter value of the pattern of the cell when the evaluation value satisfies a predetermined evaluation standard. | 12-12-2013 |
20140146311 | METHOD OF DETERMINING MASK PATTERN AND EXPOSURE CONDITION, STORAGE MEDIUM, AND COMPUTER - A determining method includes the steps of setting a first parameter to define the shape of the plurality of pattern elements of the mask, setting a second parameter to define the effective light source distribution; and repeating the process of calculation of the image of the mask pattern and calculation of a value of an evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the mask pattern, wherein parameters of pattern elements are set as one parameter by using a value of an index representing the proximity effect. | 05-29-2014 |
Patent application number | Description | Published |
20090153937 | LIGHT QUANTITY CONTROL DEVICE - A light quantity control device includes: a bottom board having an opening; a first blade and a second blade linearly moving in opposing directions and changing in an opening area of the opening; a supporting blade overlapping the first blade and closing the opening in cooperation with the first blade and the second blade; and a driving lever connected to the first blade, the second blade, and the supporting blade, and driving the first blade, the second blade, and the supporting blade by rotation of the driving lever. The first blade and the supporting blade are engaged with an identical pin provided in the driving lever. The first blade and the supporting blade are misaligned in such a way to reduce an overlapping degree of the first blade and the supporting blade. The first blade and the supporting blade bring the opening to the fully closed state in cooperation with the second blade. | 06-18-2009 |
20090154913 | LIGHT QUANTITY CONTROL DEVICE - A light quantity control device includes: a bottom board having an opening; a first blade, a supporting blade and a second blade linearly moving in opposing directions and controlling light quantity passing through the opening; and a driving lever connected to the set of blades and driving the set of blades by rotation of the driving lever. The driving lever rotates within degrees centering on a phantom line A passing through a rotational center of the driving lever and being parallel with the moving directions of the blades. | 06-18-2009 |
20090154914 | LIGHT QUANTITY CONTROL DEVICE - A light quantity control device includes: a bottom board having an opening; a first blade, a supporting blade, and a second blade linearly moved in opposing directions and controlling the opening to a fully open state, a fully closed state, and a small aperture state; a driving lever connected to the set of blades and driving the set of blades by rotation of the driving lever; and a stopper restricting a rotational range of the driving lever. The set of blades controls the opening to the small aperture state when the driving lever is positioned at one end of the rotational range defined by the stopper. | 06-18-2009 |
20110128603 | FOCAL PLANE SHUTTER AND OPTICAL DEVICE - A focal plane shutter includes: a board including an opening; a blade closing and opening the opening; a driving lever holding a movable iron piece, swingably supported, and driving the blade; a self-holding solenoid being able to adsorb the movable iron piece in a non-energized state, and an adsorptive force in an energized state being smaller than an adsorptive force in the non-energized state; and a biasing member biasing the driving lever to move away from the self-holding solenoid. The driving lever includes an engagement portion engaging the movable iron piece and made of a non-magnetic material. | 06-02-2011 |
20120134660 | FOCAL PLANE SHUTTER AND OPTICAL APPARATUS - A focal plane shutter includes: a board including an opening; blades capable of opening and closing the opening; a drive lever swingably supported, holding a movable iron piece and driving the blades; a self-holding type solenoid capable of adsorbing to the movable iron piece by a given attraction force in a non-energized state, and reducing the given attraction force in an energized state; a biasing member biasing the drive lever to move the drive lever away from the self-holding type solenoid; and a set member moving the drive lever to abut the drive lever with the self-holding type solenoid, wherein the self-holding type solenoid is energized to reduce the given attraction force when the drive lever is swung by the set member to abut the movable iron piece with the self-holding type solenoid. | 05-31-2012 |
Patent application number | Description | Published |
20080318140 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE SAME - To provide an EUV mask blank of which the decrease in the reflectance during EUV exposure is suppressed, and a substrate with a functional film to be used for production of such an EUV mask blank. | 12-25-2008 |
20100035165 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY - Provision of a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in the wavelength regions of EUV light and pattern inspection light and whose film composition and film thickness are easily controllable to desired ones. | 02-11-2010 |
20140017601 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODUCTION, AS WELL AS SUBSTRATE WITH REFLECTIVE LAYER FOR SUCH MASK BLANK AND PROCESS FOR ITS PRODUCTION - Process for producing a substrate with reflective layer for EUVL, which comprises forming a reflective layer for reflecting EUV light on a substrate, wherein the reflective layer is a multilayer reflective film having a low refractive index layer and a high refractive index layer alternately stacked plural times by a sputtering method, and depending upon the in-plane distribution of the peak reflectivity of light in the EUV wavelength region in a radial direction from the center of the substrate at the surface of the multilayer reflective film, at least one layer among the respective layers constituting the multilayer reflective film is made to be a reflectivity distribution correction layer having a thickness distribution provided in a radial direction from the center of the substrate, to suppress the in-plane distribution of the peak reflectivity of light in the EUV wavelength region in a radial direction from the center of the substrate. | 01-16-2014 |
20140186752 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS PRODUCTION - A process for producing a reflective mask blank for EUV lithography (EUVL), which comprises forming a multilayer reflective film for reflecting EUV light on a film-forming surface of a substrate, then forming a protective layer for protecting the multilayer reflective film, on the multilayer reflective film, and forming an absorber layer for absorbing EUV light, on the protective layer, to produce a reflective mask blank for EUVL, wherein the multilayer reflective film is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, the absorber layer is a layer containing at least Ta and N, and after forming the Mo/Si multilayer reflective film, the protective layer is formed, and after forming a Si thin film or Si oxide thin film having a thickness of at most 2 nm on the protective layer, the absorber layer is formed. | 07-03-2014 |
Patent application number | Description | Published |
20110141695 | ELECTRONIC DEVICE - According to one embodiment, an electronic device includes a circuit board, a heat generating element, a heat dissipater, and a pushing member. The circuit board is housed in a housing. The heat generating element is mounted on the circuit board. The heat dissipator is configured to dissipate heat generated by the heat generating element. The pushing member is configured to push part of the heat dissipator against the heat generating element. At least part of the pushing member is attached to a structure other than the circuit board. | 06-16-2011 |
20110216509 | ELECTRONIC APPARATUS - According to one embodiment, an electronic apparatus is provided with a first housing that comprises a first ground and a second housing comprising a second ground. The electronic apparatus further comprises (i) a plurality of first protrusions on an inner surface of the first housing, at least one of the plurality of first protrusions comprising, on a peripheral surface thereof, a first conductor electrically connected to the first ground; (ii) a hinge pivotably connecting the first housing and the second housing; and (iii) a cable extending between inside the first housing and inside the second housing through the hinge, supported by the plurality of first protrusions, electrically connected to the first conductor in the first housing, and electrically connected to the second ground in the second housing, the cable electrically connecting the first ground and the second ground. | 09-08-2011 |
20130342548 | DISPLAY MODULE AND ELECTRONIC APPARATUS - According to one embodiment, a display module includes a display unit, a control unit and a ground unit. The display unit includes a circuit and is configured to display an image. The control unit is connected to the display unit, is configured to control the display unit, and includes a first electrically conductive portion. The ground unit is connected to the circuit of the display unit and the first electrically conductive portion of the control unit and configured to ground the circuit of the display unit and the control unit. | 12-26-2013 |
20140320746 | TELEVISION RECEIVER AND ELECTRONIC DEVICE - According to one embodiment, a television receiver includes: a first housing; a component; a wall; and an electrical conductor. The component is exposed to the outside of the first housing with a gap between the component and the first housing. A wall is with a face facing the gap. The wall includes an opening. The gap is connected to inside of the first housing through the opening. The electrical conductor is on an inner face of the first housing. | 10-30-2014 |
Patent application number | Description | Published |
20090127081 | MEMS SWITCH - An object is that contact between an upper switch electrode and a lower switch electrode is not hindered. The present invention relates to a MEMS switch including a substrate; a structural layer with a beam structure in which at least one end is fixed to the substrate; a lower drive electrode layer and a lower switch electrode layer which are provided below the structural layer and on a surface of the substrate; and an upper drive electrode layer and an upper switch electrode layer which are provided on a surface of the structural layer, which is opposite to the substrate, so as to face the lower drive electrode layer and the lower switch electrode layer, respectively, in which the upper switch electrode layer is larger than the lower switch electrode layer. | 05-21-2009 |
20090145629 | Micromachine and Method for Manufacturing the Same - A structure which prevents thinning and disconnection of a wiring is provided, in a micromachine (MEMS structure body) formed with a surface micromachining technology. A wiring (upper auxiliary wiring) over a sacrificial layer is electrically connected to a different wiring (upper connection wiring) over the sacrificial layer, so that thinning, disconnection, and the like of the wiring formed over the sacrificial layer at a step portion generated due to the thickness of the sacrificial layer can be prevented. The wiring over the sacrificial layer is formed of the same conductive film as an upper driving electrode which is a movable electrode and is thus thin. However, the different wiring is formed over a structural layer, which is formed by a CVD method and has a rounded step, and has a thickness of 200 nm to 1 μm, whereby thinning, disconnection, and the like of the wiring can be further prevented. | 06-11-2009 |
20090212296 | METHOD FOR MANUFACTURING DISPLAY DEVICE - A first conductive film, a first insulating film, a semiconductor film, an impurity semiconductor film, a second conductive film, and a first resist mask are formed; first etching is performed to expose at least a surface of the first conductive film; second etching accompanied by side etching is performed on part of the first conductive film to form a gate electrode layer; a second resist mask is formed; third etching is performed to form a source and drain electrode layers, a source and drain regions, and a semiconductor layer; a second insulating film is formed; an opening portion is formed in the second insulating film to partially expose the source or drain electrode layer; a pixel electrode is selectively formed in the opening portion and over the second insulating film; and a supporting portion formed using the gate electrode layer is formed in a region overlapping with the opening portion. | 08-27-2009 |
20100187535 | MANUFACTURING METHOD OF THIN FILM TRANSISTOR AND MANUFACTURING METHOD OF DISPLAY DEVICE - To provide a method for manufacturing a thin film transistor and a display device using a small number of masks, a thin film transistor is manufactured in such a manner that a first conductive film, an insulating film, a semiconductor film, an impurity semiconductor film, and a second conductive film are stacked; then, a resist mask is formed thereover; first etching is performed to form a thin-film stack body; second etching in which the first conductive film is side-etched is performed by dry-etching to form a gate electrode layer; and a source electrode, a drain electrode, and the like are formed. Before the dry etching, it is preferred that at least a side surface of the etched semiconductor film be oxidized. | 07-29-2010 |
20100273319 | Method for Manufacturing Semiconductor Device - A method for manufacturing a semiconductor device includes: forming a first and second layers not firmly adhering to each other over a substrate; forming a first semiconductor element layer and a first insulating layer over the second layer; forming a hole reaching the first layer in the first insulating layer; oxidizing the first layer exposed at a bottom of the hole; forming a wiring electrically connected to the first semiconductor element layer over the first insulating layer and in the hole; and separating the first layer and the substrate from the second layer and the first semiconductor element layer and expose the wiring. Further, another method includes providing an anisotropic conductive adhesive between a second semiconductor element layer separated through a manufacturing process similar to the above and the wiring, whereby the first and second semiconductor element layers are electrically connected through the anisotropic conductive adhesive and the wiring. | 10-28-2010 |
20110133177 | Semiconductor Element, Semiconductor Device, And Method For Manufacturing The Same - The semiconductor element includes an oxide semiconductor layer on an insulating surface; a source electrode layer and a drain electrode layer over the oxide semiconductor layer; a gate insulating layer over the oxide semiconductor layer, the source electrode layer, and the drain electrode layer; and a gate electrode layer over the gate insulating layer. The source electrode layer and the drain electrode layer have sidewalls which are in contact with a top surface of the oxide semiconductor layer. | 06-09-2011 |
20110180796 | SEMICONDUCTOR DEVICE - An object is to provide a semiconductor device including an oxide semiconductor, which maintains favorable characteristics and achieves miniaturization. The semiconductor device includes an oxide semiconductor layer, a source electrode and a drain electrode in contact with the oxide semiconductor layer, a gate electrode overlapping with the oxide semiconductor layer, and a gate insulating layer provided between the oxide semiconductor layer and the gate electrode, in which the source electrode and the drain electrode each include a first conductive layer, and a second conductive layer having a region which extends in a channel length direction from an end portion of the first conductive layer. | 07-28-2011 |
20110193080 | Semiconductor device and electronic appliance - One object is to provide a semiconductor device that includes an oxide semiconductor and is reduced in size with favorable characteristics maintained. The semiconductor device includes an oxide semiconductor layer, a source electrode and a drain electrode in contact with the oxide semiconductor layer, a gate electrode overlapping with the oxide semiconductor layer; and a gate insulating layer between the oxide semiconductor layer and the gate electrode. The source electrode or the drain electrode includes a first conductive layer and a second conductive layer having a region extended in a channel length direction from an end face of the first conductive layer. The sidewall insulating layer has a length of a bottom surface in the channel length direction smaller than a length in the channel length direction of the extended region of the second conductive layer and is provided over the extended region. | 08-11-2011 |
20110249228 | SEMICONDUCTOR DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE - In a liquid crystal display device in which a liquid crystal layer exhibiting a blue phase is sandwiched between a first substrate and a second substrate, a pixel electrode layer is electrically connected to a drain electrode layer of a transistor and a common electrode layer is electrically connected to a conductive layer formed through the same steps as the drain electrode layer. The pixel electrode layer and the common electrode layer are over an interlayer film and spaced apart from each other. An opening formed in the interlayer film is filled with liquid crystal, and the liquid crystal layer is formed. | 10-13-2011 |
20110281389 | Micromachine and Method for Manufacturing the Same - A structure which prevents thinning and disconnection of a wiring is provided, in a micromachine (MEMS structure body) formed with a surface micromachining technology. A wiring (upper auxiliary wiring) over a sacrificial layer is electrically connected to a different wiring (upper connection wiring) over the sacrificial layer, so that thinning, disconnection, and the like of the wiring formed over the sacrificial layer at a step portion generated due to the thickness of the sacrificial layer can be prevented. The wiring over the sacrificial layer is formed of the same conductive film as an upper driving electrode which is a movable electrode and is thus thin. However, the different wiring is formed over a structural layer, which is formed by a CVD method and has a rounded step, and has a thickness of 200 nm to 1 μm, whereby thinning, disconnection, and the like of the wiring can be further prevented. | 11-17-2011 |
20120003539 | METHOD FOR MANUFACTURING ULTRA SMALL PARTICLE, POSITIVE ELECTRODE ACTIVE MATERIAL OF SECOND BATTERY USING THE METHOD FOR MANUFACTURING ULTRA SMALL PARTICLE AND METHOD FOR MANUFACTURING THE SAME, AND SECONDARY BATTERY USING THE POSITIVE ELECTRODE ACTIVE MATERIAL AND METHOD FOR MANUFACTURING THE SAME - An object is to form a positive electrode active material having small and highly uniform particles by a simple process. A template is formed by forming holes in the template by a nanoimprinting method, and the template is filled with a gel-like LiFePO | 01-05-2012 |
20120007087 | METHOD FOR MANUFACTURING DISPLAY DEVICE - A first conductive film, a first insulating film, a semiconductor film, an impurity semiconductor film, a second conductive film, and a first resist mask are formed; first etching is performed to expose at least a surface of the first conductive film; second etching accompanied by side etching is performed on part of the first conductive film to form a gate electrode layer; a second resist mask is formed; third etching is performed to form a source and drain electrode layers, a source and drain regions, and a semiconductor layer; a second insulating film is formed; an opening portion is formed in the second insulating film to partially expose the source or drain electrode layer; a pixel electrode is selectively formed in the opening portion and over the second insulating film; and a supporting portion formed using the gate electrode layer is formed in a region overlapping with the opening portion. | 01-12-2012 |
20120015245 | MANUFACTURING METHOD OF ELECTRODE OF POWER STORAGE DEVICE, ELECTRODE OF POWER STORAGE DEVICE, AND POWER STORAGE DEVICE - A shiny is manufactured using a low-molecular-weight organic acid as a dispersant and a nonaqueous organic solvent as a solvent, whereby a coated electrode for a power storage device in which an active material which has been made into microparticles each having a particle diameter of 100 nm or less is uniformly dispersed can be manufactured. By the use of the coated electrode manufactured in this manner, a power storage device with high charge/discharge characteristics can be manufactured. In other words, a power storage device with high capacity density can be realized because the amount of impurities is small and the power density is high due to the sufficient dispersion of the active material in the active material layer. | 01-19-2012 |
20120177842 | METHOD FOR MANUFACTURING POWER STORAGE DEVICE - The power extraction efficiency of a nonaqueous electrolyte secondary battery such as a lithium ion battery is improved. A material having magnetic susceptibility anisotropy such as an olivine type oxide including a transition metal element is used for active material particles. The active material particles and an electrolyte solution are mixed to form a slurry. The slurry is applied to a current collector, and then the current collector is left in a magnetic field. Thus, the active material particles are oriented. With the use of active material particles oriented in such a manner, the power extraction efficiency can be improved. | 07-12-2012 |
20130224581 | NEGATIVE ELECTRODE OF POWER STORAGE DEVICE AND POWER STORAGE DEVICE - A mixture of amorphous PAHs and at least one of a carrier ion storage metal, a Sn compound, a carrier ion storage alloy, a metal compound, Si, Sb, and SiO | 08-29-2013 |
20140027767 | Semiconductor Element, Semiconductor Device, And Method For Manufacturing The Same - The semiconductor element includes an oxide semiconductor layer on an insulating surface; a source electrode layer and a drain electrode layer over the oxide semiconductor layer; a gate insulating layer over the oxide semiconductor layer, the source electrode layer, and the drain electrode layer; and a gate electrode layer over the gate insulating layer. The source electrode layer and the drain electrode layer have sidewalls which are in contact with a top surface of the oxide semiconductor layer. | 01-30-2014 |
20140367678 | Semiconductor Element, Semiconductor Device, And Method For Manufacturing The Same - The semiconductor element includes an oxide semiconductor layer on an insulating surface; a source electrode layer and a drain electrode layer over the oxide semiconductor layer; a gate insulating layer over the oxide semiconductor layer, the source electrode layer, and the drain electrode layer; and a gate electrode layer over the gate insulating layer. The source electrode layer and the drain electrode layer have sidewalls which are in contact with a top surface of the oxide semiconductor layer. | 12-18-2014 |
20150014605 | LITHIUM-MANGANESE COMPOSITE OXIDE, SECONDARY BATTERY, AND ELECTRIC DEVICE - The amount of lithium ions that can be received and released in and from a positive electrode active material is increased, and high capacity and high energy density of a secondary battery are achieved. Provided is a lithium-manganese composite oxide represented by Li | 01-15-2015 |
Patent application number | Description | Published |
20090059269 | RECORDING APPARATUS IMAGE SUPPLY DEVICE AND RECORDING SYSTEM AND CONTROL METHOD AND PROGRAM THEREOF - When a print command that designates a layout recording function by its upper layer, and designates a frame print function by its lower layer is transmitted from a camera to a printer, the printer determines a layout print function that prints a plurality of images on a single sheet, based on the upper layer. In a case where the printer can determine the lower layer of the command, the printer acquires details of a layout. In a case where the printer cannot determine the lower layer of the command, the printer determines a normal frame print function. The printer prints a normal layout image or special frame image in accordance with the determined layout of images. | 03-05-2009 |
20100309520 | IMAGE SUPPLY DEVICE, CONTROL METHOD OF THE DEVICE, AND PRINTING SYSTEM - In this invention, to enable printing of an image that has undergone an image process or print process complying with the desire of a user on an image supply device side, real object handles and virtual object handles are set to, of images to be supplied to the printing device, images that require a predetermined image process and remaining images, respectively. A print job including the object handle of a print target image is issued in accordance with a print instruction. If the handle of an image requested by the printing device in response to the issued print job is a virtual object handle, the predetermined image process is executed for image data corresponding to the handle, and the processed image data is supplied to the printing device. | 12-09-2010 |
20110102533 | MOVEMENT DETECTION APPARATUS AND RECORDING APPARATUS - An apparatus performs a pattern matching operation based on a template pattern size in the moving direction set according to information about the moving state of an object between acquisitions of first and second data, such as an encoder configured to acquire information about the moving state of the object. | 05-05-2011 |
20110211857 | APPARATUS AND METHOD FOR PRINT CONTROL - A print control apparatus and method for determining a sheet size specified by a first print job and a sheet size specified by a second print job, deciding on a sheet width usable by the first print job and a sheet width usable by the second print job based on determined respective sheet sizes, deciding on a sheet width of a continuous sheet to be used by the first print job and the second print job based on the decided respective sheet widths, and printing an image based on the first print job and an image based on the second print job on a continuous sheet supplied from a sheet supplying unit that supplies a continuous sheet having the decided sheet width. | 09-01-2011 |
20110243637 | PRINT CONTROL APPARATUS AND METHOD - In printing data of a plurality of pages on a continuous sheet, it is determined whether the data is to be printed on a single side of the continuous sheet or on both sides thereof. A first sequence of pages arranged on a first side of the continuous sheet occurring when it is determined that the data is to be printed on the single side and a second sequence of pages arranged on the first side of the continuous sheet occurring when it is determined that the data is to be printed on the both sides such that the first and second sequences are opposite to each other. Each of the first and second sequences indicates whether the pages are arranged in descending order or in ascending order. | 10-06-2011 |
20120076560 | PRINT CONTROL APPARATUS AND METHOD - In order to prevent a printing process from clogging by reason of being incapable of discharging a sheet to a discharge destination in the case of duplex printing on a continuous sheet, the number of pages to be printed continuously on the same side of the sheet is decided so that the number of required discharging destinations conforms to the number of available discharge destinations. Then, according to the decision, printing on the same side of the sheet is performed, and the sheet is discharged to the respective discharge destinations. | 03-29-2012 |
20120199022 | PRINTING METHOD AND PRINTING APPARATUS - A state of a print head is checked by printing a plurality of images in order on a sheet fed from a sheet feeding unit, and reading the printed images. A region that is inappropriate for performing printing on the fed sheet is detected. When the inappropriate region has been detected, printing the images is stopped and the sheet is cut. Of the cut sheets, the sheet at an upstream is sent back to the sheet feeding unit. Subsequently, the sheet is again fed to perform printing and conduct a test. | 08-09-2012 |
20120199026 | PRINTING METHOD AND PRINTING APPARATUS - A printing apparatus sequentially prints a plurality of images on a first surface of a sheet, and then sequentially prints a plurality of images on a second surface that is a back surface of the first surface. When a state of a printing unit is determined not to be normal when printing on the first surface, the printing apparatus executes processing for maintenance by using a sheet different from the sheet used for printing on the first surface. | 08-09-2012 |
20130100187 | PRINT CONTROL APPARATUS, PRINT CONTROL METHOD, AND RECORDING MEDIUM - A print control apparatus configured to cause a printing unit to perform print processing includes a determination unit configured to determine whether a condition for executing maintenance processing of the printing unit is satisfied, a shortening unit configured to shorten redundant maintenance operations in first maintenance processing and second maintenance processing in a case where the determination unit determines that a condition for executing the second maintenance processing is satisfied before completion of the first maintenance processing, and a control unit configured to cause the first maintenance processing and the second maintenance processing to be carried out after the shortening unit shortens the redundant maintenance operations. | 04-25-2013 |
20140078547 | PRINT CONTROL APPARATUS AND METHOD FOR PRINTING IMAGES ON A CONTINUOUS SHEET - A print control apparatus and method for determining a sheet size specified by a first print job and a sheet size specified by a second print job, deciding on a sheet width usable by the first print job and a sheet width usable by the second print job based on determined respective sheet sizes, deciding on a sheet width of a continuous sheet to be used by the first print job and the second print job based on the decided respective sheet widths, and printing an image based on the first print job and an image based on the second print job on a continuous sheet supplied from a sheet supplying unit that supplies a continuous sheet having the decided sheet width. | 03-20-2014 |
20140104338 | PRINT CONTROL APPARATUS AND METHOD - An apparatus capable of causing a print unit to print data on a continuous sheet includes a reception unit, a determination unit, and a print control unit. The reception unit receives data of a plurality of pages to be printed by the print unit. The determination unit determines whether the data of the received plurality of pages is to be printed on a single side or on both sides of the continuous sheet. The print control unit causes printing of the data of the received plurality of pages on the continuous sheet in a manner such that an orientation of a surface of a discharged continuous sheet in a case where being discharged after having been printed on its both sides and an orientation of a surface of a discharged continuous sheet in a case where being discharged after having been printed on its single side is the same. | 04-17-2014 |