Patent application number | Description | Published |
20100207179 | DYNAMIC RANDOM ACCESS MEMORY CELL INCLUDING AN ASYMMETRIC TRANSISTOR AND A COLUMNAR CAPACITOR - A semiconductor fin having a doping of the first conductivity type and a semiconductor column are formed on a substrate. The semiconductor column and an adjoined end portion of the semiconductor fin are doped with dopants of a second conductivity type, which is the opposite of the first conductivity type. The doped semiconductor column constitutes an inner electrode of a capacitor. A dielectric layer and a conductive material layer are formed on the semiconductor fin and the semiconductor column. The conductive material layer is patterned to form an outer electrode for the capacitor and a gate electrode. A single-sided halo implantation may be performed. Source and drain regions are formed in the semiconductor fin to form an access transistor. The source region is electrically connected to the inner electrode of the capacitor. The access transistor and the capacitor collectively constitute a DRAM cell. | 08-19-2010 |
20110018095 | THREE DIMENSIONAL INTEGRATED DEEP TRENCH DECOUPLING CAPACITORS - A method of forming an integrated circuit device includes forming a plurality of deep trench decoupling capacitors on a first substrate; forming a plurality of active circuit devices on a second substrate; bonding the second substrate to the first substrate; and forming electrical connections between the deep trench capacitors and the second substrate. | 01-27-2011 |
20110049674 | INTERDIGITATED VERTICAL PARALLEL CAPACITOR - An interdigitated structure may include at least one first metal line, at least one second metal line parallel to the at least one first metal line and separated from the at least one first metal line, and a third metal line contacting ends of the at least one first metal line and separated from the at least one second metal line. The at least one first metal line does not vertically contact any metal via and at least one second metal line may vertically contact at least one metal via. Multiple layers of interdigitated structure may be vertically stacked. Alternately, an interdigitated structure may include a plurality of first metal lines and a plurality of second metal lines, each metal line not vertically contacting any metal via. Multiple instances of interdigitated structure may be laterally replicated and adjoined, with or without rotation, and/or vertically stacked to form a capacitor. | 03-03-2011 |
20110175152 | METHOD AND STRUCTURE FOR FORMING HIGH PERFORMANCE MOS CAPACITOR ALONG WITH FULLY DEPLETED SEMICONDUCTOR ON INSULATOR DEVICES ON THE SAME CHIP - An integrated circuit is provided that includes a fully depleted semiconductor device and a capacitor present on a semiconductor on insulator (SOI) substrate. The fully depleted semiconductor device may be a finFET semiconductor device or a planar semiconductor device. In one embodiment, the integrated circuit includes a substrate having a first device region and a second device region. The first device region of the substrate includes a first semiconductor layer that is present on a buried insulating layer. The buried insulating layer that is in the first device region is present on a second semiconductor layer of the substrate. The second device region includes the second semiconductor layer, but the first semiconductor layer and the buried insulating layer are not present in the second device region. The first device region includes the fully depleted semiconductor device. A capacitor is present in the second device region. | 07-21-2011 |
20110215412 | STRUCTURE AND METHOD TO FABRICATE pFETS WITH SUPERIOR GIDL BY LOCALIZING WORKFUNCTION - A semiconductor structure and a method of forming the same are provided in which the gate induced drain leakage is controlled by introducing a workfunction tuning species within selected portions of a pFET such that the gate/SD (source/drain) overlap area of the pFET is tailored towards flatband, yet not affecting the workfunction at the device channel region. The structure includes a semiconductor substrate having at least one patterned gate stack located within a pFET device region of the semiconductor substrate. The structure further includes extension regions located within the semiconductor substrate at a footprint of the at least one patterned gate stack. A channel region is also present and is located within the semiconductor substrate beneath the at least one patterned gate stack. The structure further includes a localized workfunction tuning area located within a portion of at least one of the extension regions that is positioned adjacent the channel region as well as within at least a sidewall portion of the at least one gate stack. The localized workfunction tuning area can be formed by ion implantation or annealing. | 09-08-2011 |
20120133023 | THREE DIMENSIONAL INTEGRATED DEEP TRENCH DECOUPLING CAPACITORS - A method of forming an integrated circuit device includes forming a plurality of deep trench decoupling capacitors on a first substrate; forming a plurality of active circuit devices on a second substrate; bonding the second substrate to the first substrate; and forming electrical connections between the deep trench capacitors and the second substrate. | 05-31-2012 |
Patent application number | Description | Published |
20080230259 | Method and Structure for Implementing Control of Mechanical Flexibility With Variable Pitch Meshed Reference Planes Yielding Nearly Constant Signal Impedance - A method and structure are provided for implementing flexible circuits of various electronic packages and circuit applications. A meshed reference plane includes a variable mesh pitch arranged for control of mechanical flexibility. A dielectric core separates a signal layer from the variable pitch meshed reference plane. An electrically conductive coating covers the surface of the variable pitch meshed reference plane yielding substantially constant signal impedance for the signal layer. | 09-25-2008 |
20090189635 | METHOD AND APPARATUS FOR IMPLEMENTING REDUCED COUPLING EFFECTS ON SINGLE ENDED CLOCKS - A method and apparatus implement reduced noise coupling effects on single ended clocks, and a design structure on which the subject circuit resides is provided. A clock receiver includes a clock voltage reference that is generated from received clock peaks and valleys of a received input clock signal. The received clock peaks (VT) and the received clock valleys (VB) are continuously sampled. The clock voltage reference is set, for example, equal to an average of VT and VB; or ((VT+VB)/2). | 07-30-2009 |
20100013026 | INTEGRATED CIRCUITS COMPRISING RESISTORS HAVING DIFFERENT SHEET RESISTANCES AND METHODS OF FABRICATING THE SAME - The fabrication of integrated circuits comprising resistors having the same structure but different sheet resistances is disclosed herein. In one embodiment, a method of fabricating an integrated circuit comprises: concurrently forming a first resistor laterally spaced from a second resistor above or within a semiconductor substrate, the first and second resistors comprising a doped semiconductive material; depositing a dopant receiving material across the first and second resistors and the semiconductor substrate; removing the dopant receiving material from upon the first resistor while retaining the dopant receiving material upon the second resistor; and annealing the first and second resistors to cause a first sheet resistance of the first resistor to be different from a second sheet resistance of the second resistor. | 01-21-2010 |
20100237425 | High Threshold Voltage NMOS Transistors For Low Power IC Technology - Transistors exhibiting different electrical characteristics such as different switching threshold voltage or different leakage characteristics are formed on the same chip or wafer by selectively removing a film or layer which can serve as an out-diffusion sink for an impurity region such as a halo implant and out-diffusing an impurity such as boron into the out-diffusion sink, leaving the impurity region substantially intact where the out-diffusion sink has been removed. In forming CMOS integrated circuits, such a process allows substantially optimal design for both low-leakage and low threshold transistors and allows a mask and additional associated processes to be eliminated, particularly where a tensile film is employed to increase electron mobility since the tensile film can be removed from selected NMOS transistors concurrently with removal of the tensile film from PMOS transistors. | 09-23-2010 |
Patent application number | Description | Published |
20100193854 | NON-VOLATILE MEMORY DEVICE USING HOT-CARRIER INJECTION - Each of a hot-carrier non-volatile memory device and a method for fabricating the hot carrier non-volatile memory device is predicated upon a semiconductor structure and related method that includes a metal oxide semiconductor field effect transistor structure. The semiconductor structure and related method include at least one of: (1) a spacer that comprises a dielectric material having a dielectric constant greater than 7 (for enhanced hot carrier derived charge capture and retention); and (2) a drain region that comprises a semiconductor material that has a narrower bandgap than a bandgap of a semiconductor material from which is comprised a channel region (for enhanced impact ionization and charged carrier generation). | 08-05-2010 |
20100207246 | METHOD OF MAKING AN MIM CAPACITOR AND MIM CAPACITOR STRUCTURE FORMED THEREBY - A method of forming an MIM capacitor having interdigitated capacitor plates. Metal and dielectric layers are alternately deposited in an opening in a layer of insulator material. After each deposition of the metal layer, the metal layer is removed at an angle from the side to form the capacitor plate. The side from which the metal layer is removed is alternated with every metal layer that is deposited. When all the capacitor plates have been formed, the remaining opening in the layer of insulator material is filled with dielectric material then planarized, followed by the formation of contacts with the capacitor plates. There is also an MIM capacitor structure having interdigitated capacitor plates. | 08-19-2010 |
20120119310 | STRUCTURE AND METHOD TO FABRICATE A BODY CONTACT - A structure and method to fabricate a body contact on a transistor is disclosed. The method comprises forming a semiconductor structure with a transistor on a handle wafer. The structure is then inverted, and the handle wafer is removed. A silicided body contact is then formed on the transistor in the inverted position. The body contact may be connected to neighboring vias to connect the body contact to other structures or levels to form an integrated circuit. | 05-17-2012 |
20130099354 | CAPACITOR WITH DEEP TRENCH ION IMPLANTATION - An improved semiconductor capacitor and method of fabrication is disclosed. Embodiments utilize a deep trench which is then processed by performing a pre-amorphous implant on the trench interior to transform the interior surface of the trench to amorphous silicon which eliminates the depletion region that can degrade capacitor performance. | 04-25-2013 |