Patent application number | Description | Published |
20110046894 | METHOD FOR DISCRIMINATING BETWEEN MALIGNANT AND BENIGN TISSUE LESIONS - An embodiment of the present invention includes a method for discriminating between benign and malignant tissue lesions. The method includes the steps of using a plurality of maps of physiology and morphology parameters generated from reflectance measurements and pure morphology parameters generated from reflectance measurements. The method also includes calculating entropies and cross entropies of the plurality of maps, and calculating a plurality of pure morphology parameters. Further, the method includes assigning a weight to each entropy and a weight to a logarithm of each entropy, a weight to each cross entropy and a weight to a logarithm of each cross entropy, and a weight to each pure morphology parameter and a weight to a logarithm of each pure morphoiogy parameter. The method further includes computing a diagnostic index, defining a cost function, defining a proper threshold value for a diagnostic index and solving an optimization problem to determine a set of weights from the assigned weights to maximize specificity for 100% sensitivity. Further, the method uses calculations, the cost function and the diagnostic index to determine whether the tissue lesion is benign or malignant. | 02-24-2011 |
20110054298 | OPTICAL METHOD FOR DETERMINING MORPHOLOGICAL PARAMETERS AND PHYSIOLOGICAL PROPERTIES OF TISSUE - In an embodiment of the present disclosure, an optical method for determining morphological parameters and physiological properties of tissue is presented. The method includes using reflectance measurements from a tissue area for a plurality of wavelengths, using a bio-optical model, using radiative transfer modeling and using a non-linear inversion procedure. The method further includes systematically varying values of the morphological parameters and physiological properties of the tissue and simultaneously varying the inherent optical properties, which are linked to the morphological parameters and the physiological properties of the tissue, until the non-linear inversion procedure returns values for the morphological parameters and the physiological properties of the tissue such that an agreement between the reflectance measurements and reflectances computed by the radiative transfer model, based on the returned morphological parameters and the physiological properties of the tissue values and corresponding inherent optical properties values, reach a predetermined level of accuracy. | 03-03-2011 |
Patent application number | Description | Published |
20080198363 | System and Method to Align and Measure Alignment Patterns on Multiple Layers - A system and method are used to increase alignment accuracy of feature patterns through detection of alignment patterns on both a surface layer and at least one below surface layers of an object. A first frequency of light, such as visible light, is used to detect alignment patterns on the surface layer and a second frequency of light, such as infrared light, is used to detect patterns one layer below the surface. For example, reflected light of a first frequency and transmitted light of a second frequency are co-focused onto detector after impinging on respective alignment patterns. The co-focused light is then used to determine proper alignment of the object for subsequent pattern features. This substantially increases accuracy of alignment of pattern features between layers, as compared to conventional systems. | 08-21-2008 |
20090046373 | Illumination System with Low Telecentricity Error and Dynamic Telecentricity Correction - An illuminator with substantially reduced telecentricity error relative to conventional illuminators includes one or more modules having movable optical elements with low telecentricity error that may be adjusted to compensate for telecentricity errors. The modules may include a zoom zoom axicon, a condenser, and a multi field relay. The zoom zoom axicon may include one or more lenses adjustable in up to six degrees of freedom. The condenser and the multi field relay may include one or more lenses adjustable in up to six degrees of freedom or a set of two or more mirrors with one or more of the mirrors adjustable in up to six degrees of freedom. The illuminator may also include a control system to control the adjustments of the movable optical elements. A lithography system including such an illuminator is also presented, along with a method of providing illumination with low telecentricity error. | 02-19-2009 |
20090091734 | Illumination System - A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam. | 04-09-2009 |
20090122289 | Thin Film Continuous Spatially Modulated Grey Attenuators and Filters - A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate. | 05-14-2009 |
20090168072 | Illumination System - A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam. | 07-02-2009 |
20090251786 | Optical System for Transforming Numerical Aperture - A system is provided to form illumination light beams having desirable divergence and directivity. For instance, the system can include an optical element and a relay. The optical element can include a pupil defining element. Further, the relay can have a first and second lens array arranged in series and configured to receive the plurality of beams and to re-image the plurality of beams into a corresponding plurality of beams in an image plane. Each of the plurality of corresponding beams can have a numerical aperture less than a numerical aperture of each of the plurality of beams. | 10-08-2009 |
20100079748 | Inspection Apparatus, Lithographic Apparatus and Method for Sphero-Chromatic Aberration Correction - A semiconductor inspection system and method are described. The system includes an illumination system transmitting light at a given wavelength and an optical system receiving light from the illumination system and transmit light at the given wavelength to a surface. The optical system includes at least one lens that is moveable (for example, a zoomable lens) to change the nominal wavelength of the semiconductor inspection system to correspond to the illumination wavelength of the illumination system so that the sphero-chromatic aberration of the semiconductor inspection system meets a user-defined tolerance. | 04-01-2010 |
20110279805 | OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD - Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imageable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imageable radiation from the wide angle input lens group and focus the imageable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface. | 11-17-2011 |
20110317136 | Inspection Apparatus Employing Wide Angle Objective Lens With Optical Window - An optical window is used to facilitate best performance for imaging an object placed in a separate ambiance. The window can be in a particle detection system, comprising a separator between first and second environments. The separator comprises an opening and an optical element located within the opening. An object is located in the second environment. An objective lens is located in the first environment and a detector is located in the second environment and is configured to detect particles on a surface of the object. | 12-29-2011 |
20120086800 | Surface Inspection System with Advanced Illumination - Disclosed are apparatuses, methods, and lithographic systems for surface (e.g., mask) inspection. A surface inspection system can include a plurality of illumination sources, an optical system, and an image sensor. The plurality of illumination sources can be a standalone illumination system or integrated into the lithographic system, where the plurality of illumination sources can be configured to illuminate radiation onto a target portion of a surface. The optical system can be configured to receive at least a portion of reflected radiation from the target portion of the surface. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected radiation. The surface inspection system can also include an analysis device configured to analyze the aerial image for defects. | 04-12-2012 |
20130083306 | Inspection Apparatus, Lithographic Apparatus, and Device Manufacturing Method - An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements. | 04-04-2013 |
20140098356 | OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD - Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imageable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imageable radiation from the wide angle input lens group and focus the imageable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface. | 04-10-2014 |
20150085291 | Compact Self-Contained Holographic and Interferometric Apparatus - A compact, self-contained holographic and interferometric apparatus and methods for eliminating vibration, including methods for eliminating relative displacement and vibration errors present in object and reference beam paths, are disclosed. The self-contained apparatus ( | 03-26-2015 |
Patent application number | Description | Published |
20090272910 | METHOD OF DETECTION OF FAST NEUTRONS - A simple method is developed for detection of fast neutrons for systems of detection of radioactive materials, which does not involve moderator systems, operates on the real time scale and ensures high detection efficiency. The method includes conversion of the cascade of gamma-quanta formed as a result of inelastic scattering of neutrons in a converter material with high atomic number into a set of light scintillations by a scintillator, processing of signals obtained in recording of said scintillations, formation of counting pulses with frequency proportional to the neutron flux and their recording according to an appropriate algorithm. Inorganic scintillators with high effective atomic number are used, and, as converter materials for inelastic scattering of neutrons, materials with high atomic numbers are used, which are a constituent part of said inorganic scintillators. Processing of the obtained signals is carried out by their integration with time constant of at least 30 microseconds, and formation of counting pulses is made by selection of the integrated signals in the energy range equivalent to 10-300 keV. Examples of inorganic scintillators comprising material with high effective atomic number used as the converter are crystals BGO, GSO, ZnWO, CWO, Cs(Tl), Na(Tl), and Li(Eu). | 11-05-2009 |
20100040195 | X-ray radiographic method of recognition of materials and device for its realization - An efficient X-ray radiographic method for recognition of materials of inspected objects and a corresponding device with improved functional possibilities are proposed, ensuring direct determination of the effective atomic number Z | 02-18-2010 |