Katsunuma, JP
Atsushi Katsunuma, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20100141950 | TUNABLE FILTER, LIGHT SOURCE APPARATUS, AND SPECTRAL DISTRIBUTION MEASURING APPARATUS - Provided is a tunable filter including: a polarization splitter that splits input light into two linearly polarized light rays of mutually orthogonal vibration directions; a wavelength dispersion spectroscopic element that splits the two linearly polarized light rays split by the polarization splitter, into two spectral images having spatial spread in one direction, the two spectral images corresponding to the two linearly polarized light rays; and a reflective spatial modulator device that modulates and reflects linearly polarized light in each wavelength region for the two spectral images independently from each other, where modulated light reflected at the reflective spatial modulator device reenters the wavelength dispersion spectroscopic element and the polarization splitter, thereby splitting and outputting the modulated light, as output light in a wavelength region modulated by the reflective spatial modulator device and output light in a wavelength region not modulated, and input light and reentered light to the polarization splitter and input light and reentered light to the wavelength dispersion spectroscopic element are parallel light fluxes. | 06-10-2010 |
Atsushi Katsunuma, Shiraoka-Shi JP
Patent application number | Description | Published |
---|---|---|
20150234150 | IMAGING DEVICE - Provided is an imaging device ( | 08-20-2015 |
Ayumi Katsunuma, Otawara-Shi JP
Patent application number | Description | Published |
---|---|---|
20080204017 | MRI APPARATUS - An MRI apparatus has a gantry, a bed and a lighting unit collective including a plurality of lighting units. The gantry accommodates a static field magnet configured to generate a static field, a gradient coil configured to generate a gradient magnetic field, and an RF coil configured to transmit or receive an RF pulse as well as having an opening into which a person is inserted. The bed has a removable table-top for an inside and an outside of the opening. The lighting unit group is disposed at at least one of an inside position of the opening and an outside position from which an inside of the opening can be lighted so that the lighting units can carry out lighting such that an amount of emitting light increases bit by bit from a bedside to a counter bedside opposite to the bedside across the opening. | 08-28-2008 |
20090039887 | MAGNETIC RESONANCE IMAGING APPARATUS - A apparatus includes a bore tube inside which an imaging space is formed to place a subject, a static field generating section which is placed outside the tube and generates a static field in the imaging space, a gradient field generating section which is placed between the tube and the static field generating section and generates a gradient field to superimpose on the static field, cover which is mounted to side end of the static field generating section and forms a vacuum space in a surrounding of the gradient filed generating section around together with the tube and the static field generating section, wherein the cover are fixed by fixation parts thereof to the static field generating section and a load of an air pressure to be applied on the covers at a different part from the fixation part is received by the static field generating section. | 02-12-2009 |
20090134874 | MAGNETIC RESONANCE APPARATUS - A magnetic resonance apparatus includes a static field magnet, a gradient field coil, a cover which forms, inside the static field magnet and the gradient field coil, an internal space in which a bed top and a subject placed on the bed top are to be inserted, a radio frequency coil unit which includes a cylindrical base portion and first electronic elements and second electronic elements and is placed in the internal space, a first flow path which is formed between the base portion and the cover to cool the first electronic elements, a second flow path which is formed between the base portion and the cover and communicates with the first flow path to cool the second electronic elements, and a cooling unit which cools the radio frequency coil unit by generating a cooling gas flow flowing from the first flow path to the second flow path. | 05-28-2009 |
20090134875 | MAGNETIC RESONANCE IMAGING SYSTEM AND RF COIL - When an RF coil in a magnetic resonance imaging system includes a plurality of conductive members and circuit elements connected to the conductive members, at least part of each of the conductive members is formed to a thickness so as to dissipate heat generated from the circuit elements. Moreover, the magnetic resonance imaging system is configured to include a cooling unit that circulates cooling air over the surfaces of the circuit elements provided in the RF coil. | 05-28-2009 |
20130314089 | MAGNETIC RESONANCE IMAGING APPARATUS - A magnetic resonance imaging apparatus according to an embodiment includes a static magnetic field magnet, a gradient coil, a bore tube and a sealed space forming unit. The gradient coil is formed to be approximately cylindrical, arranged in a cylinder of the static magnetic field magnet, and adds a gradient magnetic field to the static magnetic field. The bore tube is formed to be approximately cylindrical and arranged in the cylinder of the gradient coil. The sealed space forming unit forms a sealed space enclosing the gradient coil between an inner circumferential side of the static magnetic field magnet and an outer circumferential side of the bore tube. At least a part of at least one of the side ends of the gradient coil does not make contact with the sealed space. | 11-28-2013 |
20140336500 | MAGNETIC RESONANCE IMAGING APPARATUS AND METHOD FOR CONTROLLING MAGNETIC RESONANCE IMAGING APPARATUS - A magnetic resonance imaging apparatus of an embodiment includes: a bed top plate provided with a connector which can be coupled with a receiving coil; a bed which supports the bed top plate, the bed being configured to shift the bed top plate vertically and horizontally, the bed being configured to be jointly coupled with a stretcher apparatus having a stretcher top plate, and the stretcher top plate being placed on top of the bed top plate in a case where the stretcher apparatus is jointly coupled and; a bed controller configured to control a shift of the bed top plate correspondingly to at least one of a joint coupling condition between the bed and the stretcher apparatus and a coupling condition between the receiving coil and the connector. | 11-13-2014 |
Hideto Katsunuma, Iwaki-City JP
Patent application number | Description | Published |
---|---|---|
20150146359 | DISPLAY DEVICE - A shaft is rotatably supported by an upper housing (base), a raising and lowering gear for a monitor is rotatably supported by the shaft, and a pivot gear and a guide member are unrotatably supported by the shaft. A rack and a guide rail are disposed on the back face of the monitor such that the raising and lowering gear meshes the rack and the guide member slidably engages with the guide rail. When the raising and lowering gear rotates by a drive source of a first motor, the guide rail is guided by the guide member to move upward and downward, and accordingly, the height position of the monitor is adjusted. When the pivot gear rotates by a drive source of a second motor, the guide member rotates along with the shaft, and accordingly, the tilt angle of the monitor is adjusted. | 05-28-2015 |
Jun Katsunuma, Kanagawa JP
Patent application number | Description | Published |
---|---|---|
20110188186 | DISPLAY APPARATUS - A display apparatus of present invention includes a tabular display unit having a display screen for displaying an image and a support section constituted by a bent stick member. One end of the support section is inserted into a hole arranged on a back surface of the display unit from a lower side, and the support section is arranged between a placement surface and a lower end of the display unit, whereby the support section supports the display unit from the lower side. | 08-04-2011 |
Satoshi Katsunuma, Kokubunji JP
Patent application number | Description | Published |
---|---|---|
20110040827 | STREAM DATA PROCESSING METHOD AND APPARATUS - A user specifies a group by a user-defined query. An input order is assured among data of a same group. By outputting data belonging to a same group from the same node, an order inputted for a necessary portion is assured. By outputting data belonging to different groups from another node, processing in plural nodes is achieved to avoid reduction in performance. | 02-17-2011 |
Satoshi Katsunuma, Nagareyama-Shi JP
Patent application number | Description | Published |
---|---|---|
20100083379 | INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND COMPUTER READABLE RECORDING MEDIUM - An example of a device comprises a storage which stores data which is input from outside and to which tracking information is added, a section which detects a first reading event of first data from the storage to which the tracking information is added, a section which detects, after the first reading event, a first writing event to part of character string data to the storage, a section which detects, after the first writing event, a second reading event of second data from the storage to which the tracking information is added, a section which detects, after the second reading event, a second writing event to part of the character string data to the storage, and a section which adds, when the first reading/writing event, second reading/writing event are detected, the tracking information to data to be written to the storage by the first and second writing event. | 04-01-2010 |
Satoshi Katsunuma, Kawasaki JP
Patent application number | Description | Published |
---|---|---|
20130226909 | Stream Data Processing Method and Device - Provided is a stream data processing device for processing stream data composed of input data that includes time, the device having: a data input module for receiving the input data; a first key for designating, as data sets, the items of the input data for processing the input data in chronological order; a query recorder for receiving a stream data definition and a query definition, and generating an operator to process the input data; and a data executing module for determining the operator for processing the input data and outputting results; the input module sorting the received input data for each of the data sets according to the item designated by the first key, sorting the input data in chronological order for each of the data sets, and generating an input stream; and the data executing module processing the input stream with the operator for each of the data sets. | 08-29-2013 |
Satoshi Katsunuma, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20160004555 | DATA PROCESSING APPARATUS AND DATA PROCESSING METHOD - A data processing apparatus generates by a stream processing control program, for a time-series first stream data group of stream data out of a time-series stream data sequence, first vector data including elements acquired by collecting respective pieces of stream data of the time-series first stream data group; generates, by the stream processing control program, for a time-series second stream data group including, as a head, a piece of intermediate stream data of the time-series first stream data group and having the same number of pieces of data as the time-series first stream data group, second vector data including elements acquired by collecting respective pieces of stream data of the time-series second stream data group; and inputs, by the stream processing control program, the first and second vector data generated respectively to a batch program to control the batch program to carry out a batch processing. | 01-07-2016 |
Takayuki Katsunuma, Miyagi JP
Patent application number | Description | Published |
---|---|---|
20130267094 | PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS - A plasma etching method for plasma etching, in a processing chamber, an antireflection film laminated on an organic film formed on a substrate by using an etching mask made of a resist film formed on the antireflection film, the plasma etching method includes: depositing a Si-containing compound on the etching mask made of the resist film by using plasma of Si-containing gas in the processing chamber; and etching the antireflection film in a state where the Si-containing compound is deposited on the etching mask. | 10-10-2013 |
20140234992 | PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A plasma etching method is provided for etching a substrate corresponding to an etching object within an etching apparatus that includes a supply condition adjustment unit for adjusting a supply condition for supplying etching gas to the substrate, a temperature adjustment unit for adjusting a temperature of the substrate placed on a stage along a radial direction, and a plasma generating unit for generating plasma within a space between the supply condition adjustment unit and the stage. The plasma etching method includes a control step in which the temperature adjustment unit controls the temperature of the substrate to be uniform within a substrate plane of the substrate, and an adjustment step in which the supply condition adjustment unit adjusts a concentration distribution of active species contained in the plasma generated by the plasma generation unit within the space above the substrate. | 08-21-2014 |
20140273486 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device including a wafer using a plasma etching device which includes a chamber, a chuck provided in the chamber to dispose a wafer to be processed thereon, a focus ring disposed at a peripheral edge portion of the chuck, and a gas supplying mechanism configured to supply various types of gases depending a radial position of the wafer. The method includes: placing a wafer formed with an organic film on the chuck; introducing an etching gas which etches the organic film on the wafer from the process gas supplying mechanism to a central portion of the wafer; introducing an etching inhibiting factor gas having a property of reacting with the etching gas to the peripheral edge portion of the wafer from the gas supplying mechanism; and performing plasma etching on the wafer using the etching gas. | 09-18-2014 |
20150187588 | PLASMA ETCHING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A plasma etching method for etching a substrate includes an adjustment step adjusting a concentration distribution of active species contained in plasma. The adjustment step adjusts a supply rate of an etching gas according to whether a supply region on a substrate to which the etching gas is supplied corresponds to a region where an effect of diffusion of the supplied etching gas is greater than an effect of flow of the supplied etching gas or a region where the effect of flow of the supplied etching gas is greater than the effect of diffusion of the supplied etching gas. | 07-02-2015 |
20150294841 | PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS - Provided is a plasma etching method of etching OCOC film in which HTO films and carbon films are alternately laminated by plasma of mixed gas containing first CF-based gas or second CF-based gas and oxygen gas using a silicon film formed on OCOC film as a mask. The etching of OCOC film includes a first etching process of etching a region spanning from the top surface to the middle of OCOC film by plasma of mixed gas containing first CF-based gas having a predetermined ratio of content of carbon to content of fluorine and oxygen gas and a second etching process of etching a region spanning from the middle of OCOC film to the lowest layer by plasma of mixed gas containing second CF-based gas having a ratio of content of carbon to content of fluorine, which is higher than the predetermined ratio of first CF-based gas, and oxygen gas. | 10-15-2015 |
Takayuki Katsunuma, Kurokawa-Gun JP
Patent application number | Description | Published |
---|---|---|
20140197135 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS - A plasma processing method includes forming a silicon oxide film on a surface of a member provided within a chamber with plasma of a silicon-containing gas without oxygen while controlling a temperature of the member to be lower than a temperature of another member; performing a plasma process on a target object loaded into the chamber with plasma of a processing gas after the silicon oxide film is formed on the surface of the member; and removing the silicon oxide film from the surface of the member with plasma of a fluorine-containing gas after the target object on which the plasma process is performed is unloaded to an outside of the chamber. | 07-17-2014 |
20150243522 | ETCHING METHOD - An etching method can etch a region formed of silicon oxide. The etching method includes an exposing process (process (a)) of exposing a target object including the region formed of the silicon oxide to plasma of a processing gas containing a fluorocarbon gas, etching the region, and forming a deposit containing fluorocarbon on the region; and an etching process (process (b)) of etching the region with a radical of the fluorocarbon contained in the deposit. Further, in the method, the process (a) and the process (b) are alternately repeated. | 08-27-2015 |
Takayuki Katsunuma, Nirasaki-Shi JP
Patent application number | Description | Published |
---|---|---|
20090047795 | PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM - A plasma processing apparatus includes a first radio frequency (RF) power supply unit for applying a first RF power for generating a plasma from a processing gas to at least one of a first and a second electrode which are disposed facing each other in an evacuable processing chamber. The first RF power supply unit is controlled by a control unit so that a first phase at which the first RF power has a first amplitude for generating a plasma and a second phase at which the first RF power has a second amplitude for generating substantially no plasma are alternately repeated at predetermined intervals. | 02-19-2009 |
20130122714 | PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM - A plasma processing apparatus includes a first radio frequency (RF) power supply unit for applying a first RF power for generating a plasma from a processing gas to at least one of a first and a second electrode which are disposed facing each other in an evacuable processing chamber. The first RF power supply unit is controlled by a control unit so that a first phase at which the first RF power has a first amplitude for generating a plasma and a second phase at which the first RF power has a second amplitude for generating substantially no plasma are alternately repeated at predetermined intervals. | 05-16-2013 |
Takayuki Katsunuma, Kurokawa JP
Patent application number | Description | Published |
---|---|---|
20120225561 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND COMPUTER-READABLE STORAGE MEDIUM - There is provided a semiconductor device manufacturing method for forming a step-shaped structure in a substrate by etching the substrate having thereon a multilayer film and a photoresist film on the multilayer film and serving as an etching mask. The multilayer film is formed by alternately layering a first film having a first permittivity and a second film having a second permittivity different from the first permittivity. The method includes a first process for plasma-etching the first film by using the photoresist film as a mask; a second process for exposing the photoresist film to hydrogen-containing plasma; a third process for trimming the photoresist film; and a fourth process for etching the second film by using the trimmed photoresist film and the plasma-etched first film as a mask. The step-shaped structure is formed in the multilayer film by repeatedly performing the first process to the fourth process in this sequence. | 09-06-2012 |
Takayuki Katsunuma, Kanagawa JP
Patent application number | Description | Published |
---|---|---|
20150265763 | FLUIDIC PUMP - Provided is a liquid delivering pump which can determine whether the pump is suitable for use, while in a standby state, and thus, the pump can be efficiently managed and utilized. | 09-24-2015 |
Toshinari Katsunuma, Nisshin-Shi JP
Patent application number | Description | Published |
---|---|---|
20100199810 | FASTENING TOOL - When bolts are fastened to tack a door to a car body by means of a conventional impact wrench, the shavings stick to the surface of the door or car body, thereby to cause the poor coating quality such as a seeding when the inter-coating or finish-coating is performed in the coating procedure. An impact wrench provided is a fastening tool for fastening a bolt gripped by a socket, in a nut. The impact wrench includes a suction cover for covering the surroundings of the socket, and a suction port capable of sucking the atmosphere in the portion covered with the suction cover, and is constituted such that the atmosphere in the suction cover is sucked through the suction port to recover the shavings left at the time of fastening the bolt. This constitution makes it possible to prevent the shavings from being scattered to the surroundings. When the door is temporarily attached at the coating step to a car body, the poor coating quality such as the seeding, as might otherwise be caused by the shavings stuck to the surface of the car body or door, can be prevented and improved. | 08-12-2010 |