Patent application number | Description | Published |
20090165828 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS - A substrate treatment method including the steps of: generating droplets of a treatment liquid by mixing the treatment liquid with a gas; and causing the treatment liquid droplets generated in the liquid droplet generating step to impinge on a surface of a substrate being treated. The treatment liquid droplets have a volume median diameter of 5 μm to 40 μm. | 07-02-2009 |
20110031326 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS - A valve is closed while a cleaning liquid is fed into a tubular body of a cleaning nozzle, and a piezoelectric element applies vibrations to the cleaning liquid. This causes droplets of the cleaning liquid to be produced and discharged from a plurality of discharge holes. The droplet diameter of the discharged droplets is in the range from 15 to 200 μm, and the distribution of the droplet diameter is such that the value of where a value of 3σ does not exceed 10% of the average droplet diameter. The droplet speed is in the range from 20 to 100 meters per second, and the distribution of the droplet speed is such that the value of where a value of 3σ does not exceed 10% of the average droplet speed. The droplet flow rate is not less than 10 milliliters per minute. Discharging the droplets of the cleaning liquid from the cleaning nozzle toward a substrate while satisfying these discharge conditions improves cleaning efficiency without damages to the substrate. | 02-10-2011 |
20120222707 | NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD - A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels. | 09-06-2012 |
20130062526 | POSITRON CT APPARATUS AND A TIMING CORRECTION METHOD - A PET apparatus and a timing correction method of this invention select two target gamma-ray detectors which count coincidences, select a reference detector which is one detector out of the two selected gamma-ray detectors, select a gamma-ray detector different from the other, opposite detector, and when repeating the selection, make a time lag histogram concerning two gamma-ray detectors selected in the past a reference, and correct a time lag histogram concerning gamma-ray detectors selected this time based on the reference. By repeating an operation to make the corrected time lag histogram concerning the two gamma-ray detectors a new reference, an optimal time lag histogram can be obtained without repeating many measurements and computations. | 03-14-2013 |
20130247943 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS - A valve is closed while a cleaning liquid is fed into a tubular body of a cleaning nozzle, and a piezoelectric element applies vibrations to the cleaning liquid. This causes droplets of the cleaning liquid to be produced and discharged from a plurality of discharge holes. The droplet diameter of the discharged droplets is in the range from 15 to 200 μm, and the distribution of the droplet diameter is such that the value of where a value of 3σ does not exceed 10% of the average droplet diameter. The droplet speed is in the range from 20 to 100 meters per second, and the distribution of the droplet speed is such that the value of where a value of 3σ does not exceed 10% of the average droplet speed. The droplet flow rate is not less than 10 milliliters per minute. Discharging the droplets of the cleaning liquid from the cleaning nozzle toward a substrate while satisfying these discharge conditions improves cleaning efficiency without damages to the substrate. | 09-26-2013 |
20130327365 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS - A valve is closed while a cleaning liquid is fed into a tubular body of a cleaning nozzle, and a piezoelectric element applies vibrations to the cleaning liquid. This causes droplets of the cleaning liquid to be produced and discharged from a plurality of discharge holes. The droplet diameter of the discharged droplets is in the range from 15 to 200 μm, and the distribution of the droplet diameter is such that the value of where a value of 3σ does not exceed 10% of the average droplet diameter. The droplet speed is in the range from 20 to 100 meters per second, and the distribution of the droplet speed is such that the value of where a value of 3ν does not exceed 10% of the average droplet speed. The droplet flow rate is not less than 10 milliliters per minute. Discharging the droplets of the cleaning liquid from the cleaning nozzle toward a substrate while satisfying these discharge conditions improves cleaning efficiency without damages to the substrate. | 12-12-2013 |
20140261572 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD - The inventive substrate treatment apparatus includes a change controlling unit which changes at least one of a protection liquid application position relative to a liquid droplet nozzle and a protection liquid incident angle relative to the liquid droplet nozzle, the protection liquid application position being a position at which the protection liquid is applied on an upper surface of the substrate, the protection liquid incident angle being an angle at which the protection liquid is incident on the liquid application position; wherein the change controlling unit controls the liquid application position and the incident angle in a first condition when the spraying region is located on an upper surface center portion of the substrate, and controls the liquid application position and the incident angle in a second condition when the spraying region is located on an upper surface peripheral portion of the substrate. | 09-18-2014 |
20140352742 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus has a cup part for receiving processing liquid such as pure water which is splashed from a substrate. The cup part is formed of electrical insulation material or semiconductor material. Hydrophilic treatment may be performed on an outer annular surface of the cup part and water may be held on the outer annular surface of the cup part while processing the substrate. With the disclosed apparatus, charged potential of the cup part generated by splashing of pure water can be suppressed, without greatly increasing the manufacturing cost of the substrate processing apparatus. As a result, it is possible to prevent electric discharge from occurring on the substrate due to induction charging of the substrate, in application of the processing liquid onto the substrate. | 12-04-2014 |
20150053244 | NOZZLE, AND SUBSTRATE PROCESSING APPARATUS - A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels. | 02-26-2015 |
Patent application number | Description | Published |
20100327168 | TWO-DIMENSIONAL POSITION MAP CORRECTING METHOD, AND RADIATION DETECTING APPARATUS - A radiation detecting apparatus of this invention includes an arithmetic processing device which carries out arithmetic processes for drawing boundaries based on peaks of signal strengths and separating respective positions by the boundaries, and for determining, by using spatial periodicity of the peaks, the number of peaks having failed to be separated, with a plurality of peaks connecting to each other. If the separation fails with a plurality of peaks connecting to each other, the number of peaks in error is determined using spatial periodicity of the peaks. Thus, by using spatial periodicity of the peaks, the number of peaks in error can be determined and boundaries can be set easily. As a result, incident positions can also be discriminated easily, and detecting positions of radiation can be determined easily. | 12-30-2010 |
20110001050 | TWO-DIMENSIONAL POSITION MAP CORRECTING METHOD (AS AMENDED) - A radiation detecting apparatus of this invention includes an arithmetic processing device which has a first adding step for adding signal strengths in one portion of a two-dimensional position map, draws respective boundaries based on results of addition in the first adding step, and corrects the two-dimensional position map based on signal strengths enclosed by these boundaries. The signal strengths of one portion of the two-dimensional position map, and not all the areas of the two-dimensional position map, are added. As a result, incident positions can be discriminated efficiently, and radiation detecting positions can be determined efficiently. | 01-06-2011 |
Patent application number | Description | Published |
20080234456 | Stretched Film of Olefin Polymer - The present invention aims at providing a stretched film of an olefin polymer excellent in anti-static property, which is obtained from an olefin polymer composition comprising an olefin polymer and potassium salt of an ethylene-unsaturated carboxylic acid copolymer, and a gist in construction resides in a stretched film of an olefin polymer, which has been obtained from an olefin polymer composition (C) comprising an olefin polymer (A) and potassium salt of an ethylene-unsaturated carboxylic acid copolymer (B) and has been stretched at a stretching factor in terms of plane factor of at least 3 times. | 09-25-2008 |
20090261097 | SYNTHETIC RESIN HOLLOW BODY - A synthetic resin hollow body which includes a hollow molding body made of a resin, the hollow molding body capable of holding a liquid material, and a resin sheathing body formed outside the hollow molding body in an integrating manner with the hollow molding body, wherein the resin sheathing body is made of a highly transparent synthetic resin having a total ray transmittance of at least 80%. The synthetic resin hollow body can exhibit a satisfactory decorating property and a satisfactory recycle property and is hardly damaged. In addition, the product cost and operation cost can be suppressed. | 10-22-2009 |
20100025895 | MANUFACTURING METHOD OF SYNTHETIC RESIN HOLLOW BODY - A manufacturing method of a synthetic resin hollow body in which a molten resin is injected for an over-molding outside a hollow molding body made of a resin provided with a hollow body and at least an opening portion to form a resin sheathing body in an integrating manner with the hollow molding body. The method includes the step of injecting the molten resin for an over-molding under the state in which the hollow molding body is partially or wholly filled with a fluid substance. The manufacturing method of a synthetic resin hollow body is capable of suppressing resin cost and operation cost and can improve decorating property. | 02-04-2010 |
Patent application number | Description | Published |
20110108094 | LAMINATED SHEET FOR SOLAR CELL AND SOLAR CELL MODULE USING THE SAME - Provided is a laminated sheet for solar cell having a back sheet base material including a fluoro-resin or a polyester resin, and a sealing material layer which includes an ethylene copolymer composition containing a copolymer of an ethylene and a polar monomer which has a polar group selected from a group consist of a carboxylic acid group and a group derived from a carboxylate and a dialkoxysilane having an amino group is laminated on a surface of the back sheet base material where a chemical treatment or a physical treatment for improving adhesiveness has been applied, by a melt extrusion lamination method. Thereby, a laminated sheet having excellent productivity and excellent interlayer adhesion strength between the back sheet and the sealing material is obtained. | 05-12-2011 |
20110114653 | RESIN MOLDING APPARATUS, RESIN MOLDING METHOD, AND RESIN CONTAINER - A resin molding apparatus of a simplified structure is provided that offers high handling efficiency by a work robot, thereby improving a throughput. The resin molding apparatus ( | 05-19-2011 |
20110263792 | PROCESS FOR PRODUCING MASTERBATCH, MASTERBATCH, AND USE THEREOF - Disclosed is a process for producing a masterbatch, comprising a step of melt-kneading an ionomer that an ethylene-unsaturated carboxylic acid copolymer is partially neutralized with potassium and a hydrophobic polymer comprised of a hydrocarbon compound, and a step of drying the melt-kneaded mixture at a temperature of not less than the Vicat softening point of the ionomer after the melt-kneading. | 10-27-2011 |
Patent application number | Description | Published |
20110220803 | RADIATION SIGNAL-PROCESSING UNIT AND RADIATION DETECTOR PROVIDED WITH THE SAME - A radiation signal-processing unit including a position identifying device for identifying an incident radiation position in a radiation detector; a count data-memory device for storing positional information outputted from the position identifying device, a count ratio-calculation device for calculating a count ratio based on the positional information stored in the count data-memory device, a reference count ratio-memory device for memorizing a reference count ratio as the count ratio calculated under a state where fluorescence to be detected does not overlap each other temporally, and a correction instruction device for reading the reference count ratio from the reference count ratio-memory device and comparing the ratio with the count ratio, thereby instructing execution of correction of a radiation generating position to the position identifying device. | 09-15-2011 |
20130175451 | RADIATION DETECTOR - A radiation detector is provided that allows correction so as to identify incident gamma-ray positions accurately with no influence of afterglow of fluorescence. The radiation detector includes an intensity-data acquiring section for acquiring intensity data representing intensity of fluorescence outputted from a light detector for every temporally-constant sampling interval, and a correction-value acquiring section section for acquiring a correction value used for correction of variations in intensity data resulting from afterglow of the fluorescence. In addition, the radiation detector includes an integrating section for correcting the intensity data using the correction value. This allows correct calculation of the integrated value m with no influence of the afterglow of fluorescence. | 07-11-2013 |
20130294673 | DATA PROCESSOR AND RADIATION TOMOGRAPHY APPARATUS PROVIDED WITH THE SAME - Provided is a data processor used for imaging a plurality of subjects collectively. In the data processor, trimming is automatically performed to spatial data containing data on three-dimensional information for enhancing working efficiencies of experiments. Specifically, data on the subjects contained in the spatial data is divided into individual divisional data automatically and collectively. This eliminates necessity for individual trimming of the cross sectional images by the experimenter, resulting in significantly facilitating the latter image analysis. | 11-07-2013 |
20150041661 | RADIATION DETECTOR SIGNAL PROCESSOR AND RADIATION DETECTOR PROVIDED THEREWITH - Disclosed is a radiation detector signal processor that allows accurate identification of a variation in fluorescence detection intensity. With a construction of the disclosure, the variation is obtainable in accordance with detection data (a peak value) of fluorescence and a specified number of light spread indicating how the fluorescence generated in a scintillator spreads spatially until reaching each of detecting elements. Such a construction allows accurate obtainment of the variation in the radiation detector in which the fluorescence is detected with a plurality of light detecting elements while spreading. A radiation detector is adjusted in accordance with the variation, achieving more accurate positional identification by the radiation detector. | 02-12-2015 |
Patent application number | Description | Published |
20130077848 | TWO-DIMENSIONAL POSITION MAP CORRECTING METHOD - Even when areas delimited by delimiting points are not appropriate and area division has failed, success or failure of area division in such areas can easily be determined by applying a map determination condition in the map determining step (step S | 03-28-2013 |
20140261557 | SUBSTRATE PROCESSING APPARTUS AND STANDBY METHOD FOR EJECTION HEAD - In a substrate processing apparatus, an ejection surface of an ejection head located at a standby position is immersed in an immersion liquid retained in a reservoir during standby of the ejection head. This prevents drying of a plurality of outlets provided in the ejection head and drying of processing liquid flow passages that communicate with the outlets. It is thus possible to suppress or prevent clogging of the fine outlets. When the ejection head resumes processing on a substrate, the immersion liquid in the reservoir is discharged and then a liquid removing part removes the immersion liquid adhering to the ejection surface. Accordingly, it is possible to prevent the immersion liquid remaining on the ejection surface from dropping and adhering to the substrate (so-called “liquid dripping”) when, for example, the ejection head is moved to a position above the substrate. | 09-18-2014 |
20140261586 | SUBSTRATE PROCESSING APPARATUS - In a substrate processing apparatus, an election head from a position above a substrate held by a substrate holding part to an inspection position above a standby pod disposed outside a cup part. At the inspection position, a processing liquid ejected from the ejection head toward the standby pod is irradiated with planar light emitted from a light emitting part. An imaging part acquires an inspection image including bright dots appearing on the processing liquid, and a determination part determines the quality of the ejection operation of the ejection head on the basis of the inspection image. Accordingly, it is possible to eliminate the influence of reflected light from the substrate and droplets, mist, or the like of the processing liquid having collided with the substrate and to accurately determine the quality of the ejection operation of the ejection head. | 09-18-2014 |