Tokoshima
Hiroto Tokoshima, Tokyo JP
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20110030722 | CLEANING WATER FOR ELECTRONIC MATERIAL, METHOD FOR CLEANING ELECTRONIC MATERIAL AND SYSTEM FOR SUPPLYING WATER CONTAINING DISSOLVED GAS - Cleaning water for an electronic material which exhibits a remarkably improved cleaning effect in comparison with conventional waters containing dissolved gas is provided. The cleaning water for an electronic material comprises water containing dissolved gas containing oxygen and argon as dissolved gases, and has a concentration of dissolved oxygen being equal to or more than 8 mg/L, and a content of dissolved argon gas being equal to or more than 2 volume % of the total amount of dissolved oxygen gas and dissolved argon gas. A method for cleaning an electronic material with the cleaning water for an electronic material. The cleaning water for an electronic material of the present invention, which comprises water containing dissolved oxygen/argon gas, contains a smaller amount of dissolved gas, can obtain an improved cleaning effect even when a small amount of a chemical is used, and therefore, can be produced safely and easily at a low cost. | 02-10-2011 |
20110042281 | GAS-DISSOLVED WATER SUPPLY SYSTEM - Provided is a gas-dissolved water supply system that can efficiently produce highly concentrated gas-dissolved water and can circulate and supply the water to a use point. To a storage tank 1, waste water (cleaning waste water) that is water containing dissolved gas (oxygen) used for cleaning an object to be cleaned is reserved through piping | 02-24-2011 |
20110180491 | METHOD AND APPARATUS FOR TREATING ORGANIC MATTER-CONTAINING WATER - Raw water is made to pass through a raw water supply pipe | 07-28-2011 |
20120055556 | ULTRAPURE WATER PRODUCTION FACILITY AND METHOD OF MONITORING ULTRAPURE WATER - By reducing the amount of monitoring water required to measure and monitor the quality of ultrapure water with a plurality of measuring instruments, the size of an ultrapure water production system is reduced, whereby the system cost is reduced. When a portion of ultrapure water supplied from the ultrapure water production system to a use point is separated to monitor the water quality, the water is allowed to pass through a monitoring system consisting of two or more stages of different types of water quality measuring devices connected in series so that the water quality is monitored. Because the ultrapure water extracted from a supply pipe extending from the ultrapure water production system to the use point is allowed to pass, in series, through two or more stages of different types of water quality measuring devices connected in series, by making these measuring instruments use the same monitoring water, which is required for measuring the water quality, the amount of monitoring water can be reduced. As a result, the size of the ultrapure water production system can be reduced, and hence, the system cost can be reduced. | 03-08-2012 |
20120097595 | DEVICE FOR TREATING HYDROGEN PEROXIDE WATER - The present invention provides a device for treating hydrogen peroxide water, the device being capable of carrying out continuous operation and stable efficient treatment even for drainage containing relatively highly concentrated hydrogen peroxide on the order of several percent and the device having a simple configuration and a relatively compact size. There is provided a device for treating hydrogen peroxide water, including: an inlet for water to be treated; an outlet for treated water; a hydrogen peroxide decomposition reactor | 04-26-2012 |
20140230908 | SUPPLY METHOD FOR LIQUID AND SUPPLY APPARATUS - A solution having a predetermined concentration is stably supplied to a use point, at which the amount of use of the solution changes, by only modifying currently-used equipment at a low cost and in a space-saving manner. In order to supply a solution containing a solute at a predetermined concentration from a preparation portion of the solution to a use point through a supply pipe, a retention portion that has no gas-liquid interface and at which the solution is retained is provided at an intermediate portion of the supply pipe. Even when the amount of use of the solution at the use point changes, the change is absorbed by the retention portion, whereby a solution having a predetermined concentration can be stably supplied to the use point. Such a retention portion is advantageous in terms of space saving since the retention portion can be formed by using, for example, a long pipe portion or a large-diameter portion of a pipe having no gas-liquid interface. Such a retention portion can be installed in existing equipment at a low cost by only slightly modifying an intermediate portion of a supply pipe. | 08-21-2014 |
20150136705 | METHOD FOR TREATING HYDROGEN PEROXIDE WATER - A method for treating drainage containing hydrogen peroxide that has been used for sterilizing and washing an inside of a water treatment system or washing and surface finishing of electronic components includes passing the drainage through the hydrogen peroxide decomposition reactor, injecting effluent water from the hydrogen peroxide decomposition reactor into a side part of the tubular container of the gas-liquid separator, and contacting the drainage with the hydrogen peroxide decomposition catalyst to decompose the hydrogen peroxide in the drainage into oxygen and water, thereby yielding the treated water. | 05-21-2015 |
Hiroto Tokoshima, Shimotsuga-Gun JP
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20090165829 | Process for Producing Gas-Containing Cleaning Water, Apparatus for Producing the Cleaning Water and Cleaning Apparatus - A process for producing a gas-containing cleaning water which contains a specific gas dissolved in water, which process comprises dissolving the specific gas into water under an increased pressure exceeding an atmospheric pressure to prepare a gas-containing water having a concentration of the gas exceeding solubility of the gas under an atmospheric pressure and, then, removing a portion of the dissolved gas by decreasing pressure on the gas-containing water; an apparatus for producing a gas-containing cleaning water which comprises an apparatus for dissolving a gas ( | 07-02-2009 |
20120067380 | CLEANING LIQUID, CLEANING METHOD, LIQUID GENERATING APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATING METHOD - An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved. | 03-22-2012 |
Hiroto Tokoshima, Shinjuku-Ku JP
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20120325927 | CLEANING METHOD - Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid. | 12-27-2012 |
20130068260 | METHOD OF CLEANING ELECTRONIC MATERIAL AND CLEANING SYSTEM - An electronic material cleaning system includes a chemical cleaning means, a wet cleaning means and a single-wafer cleaning apparatus. The chemical cleaning means comprises a functional chemical storage tank and an electrolytic reaction apparatus connected to the functional chemical storage tank via a concentrated sulfuric acid electrolysis line. The functional chemical storage tank can supply a functional chemical to the single-wafer cleaning apparatus via a functional chemical supply line. The wet cleaning means comprises a pure water supply line, a nitrogen gas supply line connected to a nitrogen gas source and an internal mixing type two-fluid nozzle connected respectively to the pure water supply line and the nitrogen gas supply line. Droplets generated from a nitrogen gas and ultrapure water can be sprayed from the tip of the two-fluid nozzle. | 03-21-2013 |
Hiroto Tokoshima, Nakano-Ku, Tokyo JP
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20150303053 | METHOD FOR PRODUCING OZONE GAS-DISSOLVED WATER AND METHOD FOR CLEANING ELECTRONIC MATERIAL - A method for producing ozone gas-dissolved water includes a process in which a mixed gas of an ozone gas and an oxygen gas and degassed water are supplied to an ozone-dissolving section and the mixed gas is dissolved in the degassed water. The amount of the mixed gas supplied to the ozone-dissolving section is controlled such that the sum of the dissolved oxygen gas concentration of the degassed water and the increment of the dissolved oxygen gas concentration calculated from the amount of the oxygen gas in the mixed gas and the amount of the degassed water on the assumption that ozone in the mixed gas entirely decomposes into oxygen is less than or equal to the saturated solubility of the oxygen gas under conditions using the obtained ozone gas-dissolved water. | 10-22-2015 |
Susumu Tokoshima, Osaka JP
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20100205645 | DIGITAL TELEVISION BROADCAST RECEIVER - A digital television broadcast receiver includes a memory section, a reception section and a control section. The memory section stores a channel list associating selected channel numbers with broadcast signals, respectively. Each of the broadcast signals includes a country identifier indicative of a country from which the broadcast signal is transmitted. The memory section stores reception country information indicative of a country that is preset as a reception country, and compliance information indicative of countries that have a rule to transmit a broadcast signal with a logical channel number for high-resolution broadcast. The control section registers the logical channel number for the high-resolution broadcast of a first broadcast signal if the reception country matches both the country of the country identifier and one of the countries of the compliance information, and if the first broadcast signal includes the logical channel number for the high-resolution broadcast. | 08-12-2010 |
Teruhiko Tokoshima, Aki-Gun JP
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20080209690 | Hose assembly with clamp, and band holder - A band holder holds a clamp band for a hose. The band holder includes an arm for covering an outer peripheral portion of the hose, connecting portions provided at free ends of the arm for connecting the free ends to form a circular shape of the arm, and a holding portion projecting from the arm for holding the clamp band. A fixing device fixes at least the holding portion to the hose. A hose assembly includes the band holder, a flexible hose to be connected to a tubular member, and a clamp band covering an outer surface of the hose for connecting the hose to the tubular member. The clamp band includes a band portion, and a screw unit provided at ends of the band portion for a clamp operation so that the screw unit tightens the band portion. | 09-04-2008 |