Patent application number | Description | Published |
20090100594 | OSCILLATING FAUCET STRUCTURE OF A DUAL-OUTLET SYSTEM - The present invention provides an oscillating faucet structure of a dual-outlet system to improve the shortcomings of a typical faucet of a dual-outlet system. The faucet structure includes a main body, seat post and combined footstock. A hollow groove is assembled within the seat post at top of the main body and used to accommodate the first and second water regulators. The main body has first and oscillating outlet heads, which can freely oscillate for flexible regulation. The combined footstock is assembled on top of the seat post of main body for mounting the second oscillating outlet head, thus enabling easy removal, repair or replacement of defective components with improved applicability. | 04-23-2009 |
20100006166 | DRINKING FAUCET WITH MONITORING DEVICE - The present invention provides a drinking faucet with monitoring device, which resolves the shortcomings of a typical monitoring mechanism in the main valve body that is exposed to dampness and is vulnerable to damage. The monitoring mechanism is laterally assembled onto the switching control valve seat of the main valve body of the drinking faucet. So, it is possible to prevent any fault of electronic components from dampness, prolong their service life, and facilitate the repair and replacement in the event of damage or faulty components. | 01-14-2010 |
20100096026 | INTAKE PIPE FOR A DRINKING WATER TAP - The present invention provides an intake pipe for drinking water taps, including a metal screwed conduit and a plastic inner pipe. The metal screwed conduit has screw threads configured on its periphery, and a through pipe hole inside. The plastic inner pipe is placed in the through pipe hole. On top of the plastic inner pipe, there is an expanded ring to be held tightly against the top end of the metal screwed conduit. The bottom end of the plastic inner pipe extends to the bottom of the metal screwed conduit. An O-ring seal is placed between the metal screwed conduit and the plastic inner pipe. The O-ring seal can be configured between the top end of the metal screwed conduit and the expanded ring of the plastic inner pipe, or between the through pipe hole of the metal screwed conduit and the outside wall of the plastic inner pipe. | 04-22-2010 |
Patent application number | Description | Published |
20150262536 | DISPLAY DEVICE - A display device is provided. The display device includes a switch including a gate, an active layer disposed on the gate, a source electrode connected to the active layer, and a drain electrode connected to the active layer. In particular, the distance between the edge of the gate electrode and the edge of the active layer is 1.2 to 3 μm. The drain electrode includes a connection portion, an oblique portion, and an extension portion, wherein the oblique portion is disposed between the connection portion and the extension portion, and wherein at least a part of the oblique portion overlaps with the gate electrode. | 09-17-2015 |
20150263043 | DISPLAY DEVICE - The present disclosure provides a display device, including: a display region, a driving element, and the display region electrically connected to the driving element through a plurality of signal line pairs. In particular, at least one of the signal line pairs includes a first conductive line and a second conductive line, and the first conductive line is electrically isolated from the second conductive line. In the signal line pair, at least a part of the first conductive line overlaps the second conductive line. | 09-17-2015 |
Patent application number | Description | Published |
20130256446 | CABLE WINDING DEVICE AND FIXING AND WINDING MECHANISM THEREOF - A cable winding device comprises a case, a reel disc, a cable, and a cable locking structure. The case comprises a first case element and a second case element. The reel disc is disposed between the first case element and the second case element, wherein the reel disc has a leaf spring. The cable is wound on the reel disc. The cable locking structure has a fixing part and at least partially penetrates the first case element and the reel disc. When a pulling operation of the cable causes the leaf spring to be sustained against the fixing part, a desired length of the cable is pulled out from the case and locked. When the cable locking structure is pressed and the fixing part is detached from the leaf spring, the cable pulled outside the case is rewound on the reel disc. | 10-03-2013 |
20130267112 | POWER CONNECTOR ASSEMBLY AND ADAPTER PLUG WITH LOCKING MECHANISM - A power connector assembly includes an appliance plug and an adapter plug. The appliance plug has at two first contact terminals, wherein each of the first contact terminals has a perforation. The adapter plug includes a casing, a switching element, at least two second contact terminals, and at least two locking elements. Each of the locking elements has a protrusion part. When the switching element is located at a first position, the protrusion part of the locking element is accommodated within the perforation of the corresponding first contact terminal, so that the locking element is in a locked state. In the locked state, the first contact terminal and the corresponding locking element are coupled with each other and the first contact terminal and the corresponding second contact terminal are electrically connected with each other. | 10-10-2013 |
Patent application number | Description | Published |
20130075364 | PATTERNING PROCESS AND MATERIALS FOR LITHOGRAPHY - Methods for forming a pattern in a lithography process for semiconductor wafer manufacturing are provided. In an example, a method includes forming a photoresist layer over a material layer; performing a first exposure process on the photoresist layer, thereby forming an exposed photoresist layer having soluble portions and unsoluble portions; treating the exposed photoresist layer, wherein the treating includes one of performing a second exposure process on the exposed photoresist layer and forming an adsorbing chemical layer over the exposed photoresist layer; and developing the exposed and treated photoresist layer to remove the soluble portions of the photoresist layer, wherein the unsoluble portions of the photoresist layer form a photoresist pattern that exposes portions of the material layer. | 03-28-2013 |
20140218714 | SYSTEM, METHOD AND RETICLE FOR IMPROVED PATTERN QUALITY IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND METHOD FOR FORMING THE RETICLE - A reticle for use in an extreme ultraviolet (euv) lithography tool includes a trench formed in the opaque border formed around the image field of the reticle. The trench is coated with an absorber material. The reticle is used in an euv lithography tool in conjunction with a reticle mask and the positioning of the reticle mask and the presence of the trench combine to prevent any divergent beams of radiation from reaching any undesired areas on the substrate being patterned. In this manner, only the exposure field of the substrate is exposed to the euv radiation. Pattern integrity in neighboring fields is maintained. | 08-07-2014 |
20140256146 | Method and Structure to Improve Process Window for Lithography - The present disclosure provides a method for forming resist patterns. The method includes providing a substrate; forming a material layer including a plurality of quenchers on the substrate; forming a resist layer on the material layer; exposing the resist layer; and developing the resist layer to form a structure featuring resist remaining layer on an upper surface of the material layer, and a plurality of resist features on the resist remaining layer to improve the yield of lithography process | 09-11-2014 |
20140268074 | Lithography System with an Embedded Cleaning Module - The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism. | 09-18-2014 |
20140347644 | SYSTEM AND METHOD FOR PERFORMING LITHOGRAPHY PROCESS IN SEMICONDUCTOR DEVICE FABRICATION - Systems and methods that include providing for measuring a first topographical height of a substrate at a first coordinate on the substrate and measuring a second topographical height of the substrate at a second coordinate on the substrate are provided. The measured first and second topographical heights may be provided as a wafer map. An exposure process is then performed on the substrate using the wafer map. The exposure process can include using a first focal point when exposing the first coordinate on the substrate and using a second focal plane when exposing the second coordinate on the substrate. The first focal point is determined using the first topographical height and the second focal point is determined using the second topographical height. | 11-27-2014 |
20150085264 | ROTARY EUV COLLECTOR - An EUV collector is rotated between or during operations of an EUV photolithography system. Rotating the EUV collector causes contamination to distribute more evenly over the collector's surface. This reduces the rate at which the EUV photolithography system loses image fidelity with increasing contamination and thereby increases the collector lifetime. Rotating the collector during operation of the EUV photolithography system can induce convection and reduce the contamination rate. By rotating the collector at sufficient speed, some contaminating debris can be removed through the action of centrifugal force. | 03-26-2015 |
20150241776 | Method for Lithography Patterning - A method of reducing resist outgassing for EUV lithography is disclosed. The method includes forming a material layer over a substrate wherein a top surface of the material layer contains a certain concentration of a quencher or a base. The method further includes forming a resist layer over the top surface of the material layer and exposing the resist layer to a EUV radiation for patterning. The quencher or the base underneath the resist layer acts to suppress resist outgassing during the EUV exposure. The material layer itself may serve as a hard mask layer or an anti-reflection layer for the patterning process, in addition to being the carrier of the quencher or the base. The method can be used in other types of lithography, such as e-beam lithography, for reducing resist outgassing. | 08-27-2015 |
20150255272 | SYSTEM, METHOD AND RETICLE FOR IMPROVED PATTERN QUALITY IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND METHOD FOR FORMING THE RETICLE - A reticle for use in an extreme ultraviolet (euv) lithography tool includes a trench formed in the opaque border formed around the image field of the reticle. The trench is coated with an absorber material. The reticle is used in an euv lithography tool in conjunction with a reticle mask and the positioning of the reticle mask and the presence of the trench combine to prevent any divergent beams of radiation from reaching any undesired areas on the substrate being patterned. In this manner, only the exposure field of the substrate is exposed to the euv radiation. Pattern integrity in neighboring fields is maintained. | 09-10-2015 |
20150262836 | Method for Integrated Circuit Patterning - Provided is a method of forming a pattern for an integrated circuit. The method includes forming a first layer over a substrate, wherein the first layer's etch rate is sensitive to a radiation, such as an extreme ultraviolet (EUV) radiation or an electron beam (e-beam). The method further includes forming a resist layer over the first layer and exposing the resist layer to the radiation for patterning. During the exposure, various portions of the first layer change their etch rate in response to an energy dose of the radiation received therein. The method further includes developing the resist layer, etching the first layer, and etching the substrate to form a pattern. The radiation-sensitivity of the first layer serves to reduce critical dimension variance of the pattern. | 09-17-2015 |
Patent application number | Description | Published |
20120074153 | SOFT RING - A soft ring addresses issues, such as casing deformation, waterproof capacity, and dust control. The soft ring is configured for use with a casing of an electronic device, and the casing has a first housing and a second housing coupled together. A ring-shaped receiving groove is disposed on the first housing for receiving the soft ring and a ring-shaped flange is disposed on the second housing for pressing the soft ring along the coupling portion of the first housing and the second housing. The soft ring is characterized in that a channel is disposed along the soft ring. The soft ring advantageously features a high compressed capacity and a low reaction force to thereby prevent the casing from deformation and improve the waterproof capacity and dust control of the casing. | 03-29-2012 |
20120087070 | PORTABLE ELECTRONIC DEVICE - A portable electronic device includes a body, a casing, and a resilient element. The casing accommodates the body such that the body can slide within the casing. The casing has an opening through which an electrical connection unit connected to the body protracts out of, or retracts into, the casing. The resilient element has an end connected to the casing and another end abutting against the body. The resilient element exerts a resilient restoring force upon the body in response to the sliding of the body. The casing has a stop structure configured to operate in conjunction with an engagement structure of the body and thereby limit the range of the sliding of the body. The engagement structure can be disengaged from the stop structure to separate the body from the casing. Accordingly, the portable electronic device has multiple uses, namely quick maintenance, easy assembly, body protection, and automatic accommodation. | 04-12-2012 |
20120087071 | LATCH STRUCTURE AND ELECTRONIC DEVICE - A latch structure prevents separation of first and second bodies of an electronic device which might otherwise occur as a result of a fall, requires little force to operate, and serves to switch a coupling status of the first and second bodies of the electronic device. The first body has a receiving unit and a coupling unit. The second body has an L-shaped groove. A base of the latch structure has a casing slidable in the receiving unit and a resilient element for providing a resilient restoring force. The casing has a protruding member for coupling with the L-shaped groove. A resilient coupling unit of the latch structure is disposed on the base and configured to engage the coupling unit. | 04-12-2012 |