Masako Sugihara, Nishinomiya-Shi JP
Masako Sugihara, Nishinomiya-Shi JP
Patent application number | Description | Published |
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20100203446 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN - A chemically amplified photoresist composition, comprises: an acid generator (A) represented by the formula (I), and a resin which comprises a structural unit (b1) derived from a monomer that becomes soluble in an alkali by an action of an acid, a structural unit (b2) derived from a monomer that has an adamantyl group having at least two hydroxyl groups, and a structural unit (b3) derived from a monomer that has a lactone ring; | 08-12-2010 |
20100230136 | METHOD FOR PRODUCING RESIST PATTERN - The present invention provides a method for producing a resist pattern sufficiently miniaturized having an excellent shape including: repeating a process of forming a patterned resist film comprising the following step (1): | 09-16-2010 |
20100304292 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-BB): | 12-02-2010 |
20100304294 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-AA): | 12-02-2010 |
20100304296 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-CC): | 12-02-2010 |
20100316951 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt having a group represented by the formula (I): | 12-16-2010 |
20100316952 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (a1): | 12-16-2010 |
20110014566 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I-Pa): | 01-20-2011 |
20110014567 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I—Pb): | 01-20-2011 |
20110014568 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt having a divalent group represented by the formula (aa): | 01-20-2011 |
20110065041 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (I): | 03-17-2011 |
20110117493 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (X): | 05-19-2011 |
20110117494 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (X): | 05-19-2011 |
20110117495 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (X): | 05-19-2011 |