Patent application number | Description | Published |
20110220715 | ANALYSIS SYSTEM FOR ANALYZING BIOLOGICAL SAMPLES, METHODS, AND COMPUTER PROGRAM PRODUCT THEREOF - An analysis system for analyzing biological samples, such as body fluids, methods implemented by the analysis system, and a computer program product for implementing the analysis system are disclosed. The system may include first and second lab devices, at least one of the lab devices may have a user identification component for identifying a user, a device identification component for identifying the lab device, and an interface component for sending a user identifier of the identified user and a device identifier of the lab device. The system may include a server computer having a server interface component for receiving the user identifier and the device identifier, and a processing component for determining a step of a workflow to be executed by the identified user, wherein the server interface component is operable to send a signal being indicative of a determined workflow to the lab device identified by the device identifier. | 09-15-2011 |
20140117089 | ANALYSIS SYSTEM FOR ANALYZING BIOLOGICAL SAMPLES, METHODS, AND COMPUTER PROGRAM PRODUCT THEREOF - An analysis system for analyzing biological samples, such as body fluids, methods implemented by the analysis system, and a computer program product for implementing the analysis system are disclosed. The system may include first and second lab devices, at least one of the lab devices may have a user identification component for identifying a user, a device identification component for identifying the lab device, and an interface component for sending a user identifier of the identified user and a device identifier of the lab device. The system may include a server computer having a server interface component for receiving the user identifier and the device identifier, and a processing component for determining a step of a workflow to be executed by the identified user, wherein the server interface component is operable to send a signal being indicative of a determined workflow to the lab device identified by the device identifier. | 05-01-2014 |
Patent application number | Description | Published |
20110267157 | Bistable relay - On a bistable relay, in particular for the high-current range, having a coil arrangement and a movable armature, which armature is attracted or repelled by the magnetic flux that can be generated in the coil arrangement and in the process opens or closes contacts, and in the relay, at least one retention element is provided, with which the armature is fixable in its position, an electric reservoir is provided, with the energy of which the armature is movable into an OFF position of the relay. | 11-03-2011 |
20110267158 | RELAY WITH INTEGRATED SAFETY WIRING - A relay has a coil housing with a coil arrangement and a movable armature, which by a magnetic flux be generated in the coil arrangement by a coil current, permits or interrupts a flow of current via two main contact terminals; and a control unit in the coil housing for controls the coil current, | 11-03-2011 |
20120025936 | ELECTRONIC PLUNGER SWITCH - A plunger switch for use as a switch element in an electrical circuit, has a housing and a plunger movable axially in a bore of the housing in the direction of a longitudinal axis and when in an operating position in which it is depressed toward the housing, acts on an electronic sensor unit situated in the housing, which in turn initiates a switching procedure in the electrical circuit by electrical pulses, and the plunger, in its axial plunging region into the bore of the housing, is peripherally provided with at least one lubricating groove, which permits a lubricating fluid to travel into the axial plunging region between the plunger and bore, and the electronic sensor unit is protected from a penetration of lubricating fluid. | 02-02-2012 |
Patent application number | Description | Published |
20080199996 | METHOD FOR FORMING A SPLIT GATE MEMORY DEVICE - A method forms a split gate memory device. A layer of select gate material over a substrate is patterned to form a first sidewall. A sacrificial spacer is formed adjacent to the first sidewall. Nanoclusters are formed over the substrate including on the sacrificial spacer. The sacrificial spacer is removed after the forming the layer of nanoclusters, wherein nanoclusters formed on the sacrificial spacer are removed and other nanoclusters remain. A layer of control gate material is formed over the substrate after the sacrificial spacer is removed. A control gate of a split gate memory device is formed from the layer of control gate material, wherein the control gate is located over remaining nanoclusters. | 08-21-2008 |
20090042349 | SPLIT GATE MEMORY CELL AND METHOD THEREFOR - A split gate memory cell has a select gate, a control gate, and a charge storage structure. The select gate includes a first portion located over the control gate and a second portion not located over the control gate. In one example, the first portion of the select gate has a sidewall aligned with a sidewall of the control gate and aligned with a sidewall of the charge storage structure. In one example, the control gate has a p-type conductivity. In one example, the gate can be programmed by a hot carrier injection operation and can be erased by a tunneling operation. | 02-12-2009 |
20090111229 | METHOD OF FORMING A SPLIT GATE NON-VOLATILE MEMORY CELL - A method forms a split gate memory cell by providing a semiconductor substrate and forming an overlying select gate. The select gate has a predetermined height and is electrically insulated from the semiconductor substrate. A charge storing layer is subsequently formed overlying and adjacent to the select gate. A control gate is subsequently formed adjacent to and separated from the select gate by the charge storing layer. The charge storing layer is also positioned between the control gate and the semiconductor substrate. The control gate initially has a height greater than the predetermined height of the select gate. The control gate is recessed to a control gate height that is less than the predetermined height of the select gate. A source and a drain are formed in the semiconductor substrate. | 04-30-2009 |
20120107993 | METHOD OF MAKING A MICRO-ELECTRO-MECHANICAL-SYSTEMS (MEMS) DEVICE - A method of forming a MEMS device includes forming a sacrificial layer over a substrate. The method further includes forming a metal layer over the sacrificial layer and forming a protection layer overlying the metal layer. The method further includes etching the protection layer and the metal layer to form a structure having a remaining portion of the protection layer formed over a remaining portion of the metal layer. The method further includes etching the sacrificial layer to form a movable portion of the MEMS device, wherein the remaining portion of the protection layer protects the remaining portion of the metal layer during the etching of the sacrificial layer to form the movable portion of the MEMS device. | 05-03-2012 |
20130285228 | Glass Frit Wafer Bond Protective Structure - A bonded semiconductor device comprising a support substrate, a semiconductor device located with respect to one side of the support substrate, a cap substrate overlying the support substrate and the device, a glass frit bond ring between the support substrate and the cap substrate, an electrically conductive ring between the support substrate and the cap substrate. The electrically conductive ring forms an inner ring around the semiconductor device and the glass frit bond ring forms an outer bond ring around the semiconductor device. | 10-31-2013 |
20140167188 | REDUCING MEMS STICTION BY INTRODUCTION OF A CARBON BARRIER - A mechanism for reducing stiction in a MEMS device by decreasing an amount of carbon from TEOS-based silicon oxide films that can accumulate on polysilicon surfaces during fabrication is provided. A carbon barrier material film is deposited between one or more polysilicon layer in a MEMS device and the TEOS-based silicon oxide layer. This barrier material blocks diffusion of carbon into the polysilicon, thereby reducing accumulation of carbon on the polysilicon surfaces. By reducing the accumulation of carbon, the opportunity for stiction due to the presence of the carbon is similarly reduced. | 06-19-2014 |
20140167189 | REDUCING MEMS STICTION BY DEPOSITION OF NANOCLUSTERS - A mechanism for reducing stiction in a MEMS device by decreasing surface area between two surfaces that can come into close contact is provided. Reduction in contact surface area is achieved by increasing surface roughness of one or both of the surfaces. The increased roughness is provided by forming a micro-masking layer on a sacrificial layer used in formation of the MEMS device, and then etching the surface of the sacrificial layer. The micro-masking layer can be formed using nanoclusters. When a next portion of the MEMS device is formed on the sacrificial layer, this portion will take on the roughness characteristics imparted on the sacrificial layer by the etch process. The rougher surface decreases the surface area available for contact in the MEMS device and, in turn, decreases the area through which stiction can be imparted. | 06-19-2014 |
20150054096 | REDUCING MEMS STICTION BY INTRODUCTION OF A CARBON BARRIER - A mechanism for reducing stiction in a MEMS device by decreasing an amount of carbon from TEOS-based silicon oxide films that can accumulate on polysilicon surfaces during fabrication is provided. A carbon barrier material film is deposited between one or more polysilicon layer in a MEMS device and the TEOS-based silicon oxide layer. This barrier material blocks diffusion of carbon into the polysilicon, thereby reducing accumulation of carbon on the polysilicon surfaces. By reducing the accumulation of carbon, the opportunity for stiction due to the presence of the carbon is similarly reduced. | 02-26-2015 |
Patent application number | Description | Published |
20110143220 | THIAZOLE COMPOUNDS AS ADDITIVES IN ELECTROLYTE SOLUTIONS IN ELECTROCHEMICAL CELLS AND BATTERIES - The present invention relates to an electrolyte solution comprising at least one solvent as component A, at least one electrolyte as component B and from 0.1 to 20% by weight, based on the total electrolyte solution, of at least one heteroaromatic compound of the general formula (I) as component C, the use of such a compound in electrolyte solutions, the use of such an electrolyte solution in an electrochemical cell or for metal plating, and also electrochemical cells comprising a corresponding electrolyte solution. | 06-16-2011 |
20120082872 | ADDITIVE FOR ELECTROLYTES - Spiro ammonium salts as an additive for electrolytes in electric current producing cells, in particular electric current producing cells comprising a Li-based anode, are provided. In some embodiments, the electric current producing cell comprises a cathode, a Li-based anode, and at least one electrolyte wherein the electrolyte contains at least one spiro ammonium salt. | 04-05-2012 |
20150083604 | THIAZOLE COMPOUNDS AS ADDITIVES IN ELECTROLYTE SOLUTIONS IN ELECTROCHEMICAL CELLS AND BATTERIES - The present invention relates to an electrolyte solution comprising at least one solvent as component A, at least one electrolyte as component B and from 0.1 to 20% by weight, based on the total electrolyte solution, of at least one heteroaromatic compound of the general formula (I) as component C, the use of such a compound in electrolyte solutions, the use of such an electrolyte solution in an electrochemical cell or for metal plating, and also electrochemical cells comprising a corresponding electrolyte solution. | 03-26-2015 |