Patent application number | Description | Published |
20080241974 | Determining photoresist parameters using optical metrology - To generate a simulated diffraction signal, one or more values of one or more photoresist parameters, which characterize behavior of photoresist when the photoresist undergoes processing steps in a wafer application, are obtained. One or more values of one or more profile parameters are derived using the one or more values, of the one or more photoresist parameters. The one or more profile parameters characterize one or more geometric features of the structure. A simulated diffraction signal is generated using the one or more values of the one or more profile parameters. The simulated diffraction signal characterizes behavior of light diffracted from the structure. The generated simulated diffraction signal is associated with the one or more values of the one or more photoresist parameters. The generated simulated diffraction signal, the one or more values of the one or more photoresist parameters, and the association between the generated simulated diffraction signal and the one or more values of the one or more photoresist parameters are stored. | 10-02-2008 |
20080241975 | Automated process control using optical metrology and photoresist parameters - To control a photolithography cluster using optical metrology, a structure is fabricated on a wafer using the photolithography cluster. A measured diffraction signal off the structure is obtained. The measured diffraction signal is compared to a simulated diffraction signal. The simulated diffraction signal is associated with one or more values of one or more photoresist parameters. The one or more photoresist parameters characterize behavior of photoresist when the photoresist undergoes processing steps in the photolithography cluster. The simulated diffraction signal was generated using one or more values of one or more profile parameters. The one or more values of the one or more profile parameters used to generate the simulated diffraction signal were derived from the one or more values of the one or more photoresist parameters associated with the simulated diffraction signal. If the measured diffraction signal and the simulated diffraction signal match, then one or more values of one or more photoresist parameters used in the photolithography cluster are determined to be the one or more values of the one or more photoresist parameters associated with the matching simulated diffraction signal. One or more process parameters or equipment settings of the photolithography cluster are adjusted based on the one or more values of the one or more photoresist parameters. | 10-02-2008 |
20080243730 | Training a machine learning system to determine photoresist parameters - To train a machine learning system, a set of different values of one or more photoresist parameters, which characterize behavior of photoresist when the photoresist undergoes processing steps in a wafer application, is obtained. A set of diffraction signals is obtained using the set of different values of the one or more photoresist parameters. The machine learning system is trained using the set of measured diffraction signals as inputs to the machine learning system and the set of different values of the one or more photoresist parameters as expected outputs of the machine learning system. | 10-02-2008 |
Patent application number | Description | Published |
20100242631 | METHOD AND SYSTEM FOR PARTICLES ANALYSIS IN MICROSTRUCTURE DEVICES BY ISOLATING PARTICLES - During the fabrication of microstructure devices, such as integrated circuits, particles may be analyzed by displacing or removing the particles from the device surface and subsequently performing an analysis process. Consequently, a well-defined measurement environment may be established after removal of the particles, which may be accomplished on the basis of nanoprobes and the like. Hence, even critical surface areas may be monitored with respect to contamination and the like on the basis of well-established analysis techniques. | 09-30-2010 |
20100248498 | MATERIAL STRIPPING IN SEMICONDUCTOR DEVICES BY EVAPORATION - A sacrificial material, such as resist material, polymer material, organic residues and the like, may be efficiently removed from a surface of a semiconductor device by evaporating the material under consideration, which may, for instance, be accomplished by energy deposition. For example, a laser beam may be scanned across the surface to be treated so as to evaporate the sacrificial material, such as resist material, while significantly reducing any negative effects on other materials such as dielectrics, metals, semiconductive materials and the like. Moreover, by selecting an appropriate scan regime, a locally selective removal of material may be accomplished in a highly efficient manner. | 09-30-2010 |
20120193807 | DRAM CELL BASED ON CONDUCTIVE NANOCHANNEL PLATE - A capacitor is formed in nano channels in a conductive body. Embodiments include forming a source contact through a first inter layer dielectric (ILD), forming a conductive body on the first ILD, forming a second ILD on the conductive body, forming drain and gate contacts through the second ILD, conductive body, and first ILD, forming nano channels in the conductive body, forming an insulating layer in the channels, and metalizing the channels. An embodiment includes forming the nano channels by forming a mask on the second ILD, the mask having features with a pitch of 50 nanometers (nm) to 100 nm, etching the second ILD through the mask, etching the conductive body through the mask to a depth of 80% to 90% of the thickness of the conductive body, and removing the mask. | 08-02-2012 |
20140299929 | DRAM CELL BASED ON CONDUCTIVE NANOCHANNEL PLATE - A capacitor is formed in nano channels in a conductive body. Embodiments include forming a source contact through a first inter layer dielectric (ILD), forming a conductive body on the first ILD, forming a second ILD on the conductive body, forming drain and gate contacts through the second ILD, conductive body, and first ILD, forming nano channels in the conductive body, forming an insulating layer in the channels, and metalizing the channels. An embodiment includes forming the nano channels by forming a mask on the second ILD, the mask having features with a pitch of 50 nanometers (nm) to 100 nm, etching the second ILD through the mask, etching the conductive body through the mask to a depth of 80% to 90% of the thickness of the conductive body, and removing the mask. | 10-09-2014 |
Patent application number | Description | Published |
20100070317 | ARCHITECTURAL DESIGN FOR SELL FROM STOCK APPLICATION SOFTWARE - Methods, systems, and apparatus, including computer program products, for implementing a software architecture design for a software application implementing sell from stock software useful to process quotations, capture orders, process delivery and invoice. The application is structured as multiple process components interacting with each other through service interfaces, and multiple service operations, each being implemented for a respective process component. The process components include an Accounting process component; a Financial Accounting Master Data Management process component; an Outbound Delivery Processing process component; a Site Logistics Processing process component; an Inventory Processing process component; a Customer Requirement Processing process component; a Supply and Demand Matching process component; a Logistics Execution Control process component; a Due Item Processing process component; a Balance of Foreign Payment Management process component; a Payment Processing process component; a Customer Invoice Processing process component; a Customer Quote Processing process component; and a Sales Order Processing process component. | 03-18-2010 |
20100070318 | PROVIDING LOGISTICS EXECUTION APPLICATION AS ENTERPRISE SERVICES - Methods and apparatus, including systems and computer program products, for a service architecture design that provides enterprise services having logistics execution functionality at the level of an enterprise application. The design includes a set of service operations, process components, and optionally deployment units. Suitable business objects are also described. | 03-18-2010 |
20100070324 | Architectural Design for Plan-Driven Procurement Application Software - Methods, systems, and apparatus, including computer program products, for implementing a software architecture design for a software application implementing plan-driven procurement. The application is structured as multiple process components interacting with each other through service interfaces, and multiple service operations, each being implemented for a respective process component. The process components include an Inbound Delivery Processing process component, a Site Logistics Processing process component, an Inventory Processing process component, a Purchase Request Processing process component, a Purchase Order Processing process component, a Purchasing Contract process component, a Supplier Invoice Processing process component, a Demand Forecast Processing process component, a Supply and Demand Matching process component, an External Procurement Trigger and Response process component, and a Logistics Execution Control process component. | 03-18-2010 |
20100070330 | ARCHITECTURAL DESIGN FOR CUSTOMER RETURNS HANDLING APPLICATION SOFTWARE - Methods, systems, and apparatus, including computer program products, for implementing a software architecture design for a software application implementing customer returns handling. The application is structured as multiple process components interacting with each other through service interfaces, and multiple service operations, each being implemented for a respective process component. The process components include an Accounting process component, a Customer Return Processing process component, a Sales Order Processing process component, a Customer Invoice Processing process component, a Due Item Processing process component, a Balance of Foreign Payment Management process component, a Payment Processing process component, a Supply and Demand Matching process component, an Inventory Processing process component, a Site Logistics Processing process component, and an Inbound Delivery Processing process component. | 03-18-2010 |
20100070331 | ARCHITECTURAL DESIGN FOR SERVICE REQUEST AND ORDER MANAGEMENT APPLICATION SOFTWARE - Methods, systems, and apparatus, including computer program products, for implementing a software architecture design for a software application implementing service request and order management. The application is structured as multiple process components interacting with each other through service interfaces, and multiple service operations, each being implemented for a respective process component. The process components include an Outbound Delivery process component, a Site Logistics Processing process component, an Inventory Processing process component, a Customer Requirement Processing process component, a Supply and Demand Matching process component, a Logistics Execution Control process component, a Service Request Processing process component, a Service Order Processing process component, and a Service Confirmation Processing process component. | 03-18-2010 |
20100070337 | PROVIDING SUPPLY CHAIN CONTROL SOFTWARE AS ENTERPRISE SERVICES - Methods and apparatus, including systems and computer program products, for a services architecture design that provides enterprise services having supply chain control functionality at the level of an enterprise application. The design includes a set of service operations, process components, and optionally deployment units. Suitable business objects are also described. | 03-18-2010 |
20100138258 | ARCHITECTURAL DESIGN FOR INTRA-COMPANY STOCK TRANSFER APPLICATION SOFTWARE - Methods, systems, and apparatus, including computer program products, for implementing a software architecture design for a software application implementing intra-company stock transfer of physical inventory. The application is structured as multiple process components interacting with each other through service operations, each implemented for a respective process component. The process components include a Supply and Demand Matching process, a Customer Requirement Processing process component, a Logistics Execution Control process component, a Site Logistics Processing process component, an Outbound Delivery Processing process component, an Inbound Delivery Processing process component, an Inventory Processing process component, a Production and Site Logistics Auxiliaries process component and a Freight Documents Processing process component. | 06-03-2010 |
20110307353 | Managing Consistent Interfaces for Goods Tag, Production Bill of Material Hierarchy, and Release Order Template Business Objects across Heterogeneous Systems - A business object model, which reflects data that is used during a given business transaction, is utilized to generate interfaces. This business object model facilitates commercial transactions by providing consistent interfaces that are suitable for use across industries, across businesses, and across different departments within a business during a business transaction. In some operations, software creates, updates, or otherwise processes information related to a goods tag, a production bill of material hierarchy, and/or a release order template business object. | 12-15-2011 |
20140006220 | CONSISTENT INTERFACE FOR SITE LOGISTICS CONFIRMATION AND SITE LOGISTICS REQUEST | 01-02-2014 |
20140006300 | Consistent Interface for Outbound Delivery | 01-02-2014 |
20140006305 | Consistent Interface for Confirmed Inbound Delivery | 01-02-2014 |