Patent application number | Description | Published |
20090053023 | Wafer transfer apparatus, wafer transfer method and storage medium - One sensor constituted of a light emission element and a light-receiving element is provided in a path through which a wafer is transferred. The sensor is positioned so that the wafer passes through an area between the light emission element and the light-receiving element. Coordinates of the center of the wafer are calculated based on encoder values obtained when the wafer starts passing through the sensor and when the wafer completes passing through the sensor, position data of wafer transfer means corresponding to the encoder value, and the diameter of the wafer; and thereby the amount of positional deviation of the center of the wafer from a reference position is calculated. | 02-26-2009 |
20090060691 | SUBSTRATE RECEIVING APPARATUS AND SUBSTRATE RECEIVING METHOD - A substrate receiving apparatus is capable of reducing the size of a substrate processing system. The substrate receiving apparatus is connected to a vacuum processing apparatus. The vacuum processing apparatus performs processing on a substrate. A connecting portion of the substrate receiving apparatus is connected to a container. The container houses a holding member holding a plurality of the substrates. A communication control portion controls a communication between an internal space in the substrate receiving apparatus and the interior of the container, and isolates the internal space from the interior. A holding member transferring-in portion takes the holding member out of the container and transfers the holding member into the internal space. A pressure control portion changes the internal space between an atmospheric pressure and a vacuum by controlling the pressure in the internal space isolated from the interior of the container. | 03-05-2009 |
20090060692 | SUBSTRATE POSITIONAL MISALIGNMENT DETECTION SYSTEM - A substrate positional misalignment detection system capable of detecting positional misalignment of a substrate without moving a detector in the case of using a bottom opening pod having a main body, a lid and a cassette holding wafers. A recursive reflection type sensor adapted to emit and receive light in an upward/downward direction is provided in a supporting unit adapted to support the lid and move up and down the lid together with the cassette. A recursive reflection plate adapted to reflect the emitted light is provided on the ceiling portion of the main body. A light transmitting window is provided in the lid. The recursive reflection type sensor, the light transmitting window, and the recursive reflection plate are aligned linearly in the upward/downward direction. The light emitted by the recursive reflection type sensor is not blocked by the substrate held in a predetermined storage position by the cassette. | 03-05-2009 |
20090060697 | CONTAINER CHANGING SYSTEM AND CONTAINER CHANGING METHOD - A container changing system able to prevent deterioration in the working rate of substrate processing apparatuses and deterioration in the amount of production of semiconductor devices. A second mounting portion is arranged between a carrier of a container conveying unit and a first mounting portion of a substrate processing apparatus with respect to a lifting direction of a container. The second mounting portion is configured to freely advance and withdraw to/from a lifting path of the container. A container lifting unit is arranged between the carrier and the second mounting portion with respect to the lifting direction. In the container lifting unit, a base portion is configured to freely advance and withdraw to/from the lifting path, a second holder is provided below the base portion and can hold the container, and a second lifter is arranged between the base portion and the second holder and configured to lift up/down the second holder between the base portion and the first mounting portion when the second holder is located opposed to the first mounting portion. | 03-05-2009 |
20090116938 | CHECK VALVE AND SUBSTRATE PROCESSING APPARATUS USING SAME - A check valve is installed in a line having a fluid path for preventing generation of a back flow in the fluid path. The check valve includes a cylindrical member in which a part of the fluid path is formed; a valve body installed in the cylindrical member and rotatable between a blocking position for blocking the fluid path and an opening position for opening the fluid path; a rotary shaft which is installed horizontally to divide the valve body into a large area and a small area and allows the valve body to rotate thereabout; and a locking member for locking the valve body in the blocking position. The small area has a larger mass than that of the large area. | 05-07-2009 |
Patent application number | Description | Published |
20130302115 | VACUUM PROCESSING APPARATUS - In this vacuum processing apparatus, four process modules and four load-rock modules are arranged in clusters around a two-stage conveyance vacuum chamber. In the apparatus, the entirety of the second stage of the vacuum conveyance chamber is a third vacuum conveyance area and the third vacuum conveyance area extends from the second stage to the first stage through an aperture to enter between first and second vacuum conveyance areas. A third vacuum conveyance robot has: left and right-side conveyance units, which can move straight in the depth direction in the second stage of the third vacuum conveyance area; and left and right-side conveyance units, which can move straight in the vertical direction, i.e. can move up and down, in the aperture of the vacuum conveyance area. | 11-14-2013 |
20130309047 | SUBSTRATE RELAY APPARATUS, SUBSTRATE RELAY METHOD, AND SUBSTRATE PROCESSING APPARATUS - A substrate relay apparatus ( | 11-21-2013 |
20140110224 | ELECTRIC ACTUATOR - Provided is an electric actuator capable of preventing the release of particles from the body thereof. The electric actuator includes a body made of an elongated enclosure; a slider configured to move in a reciprocating manner along a lengthwise direction of the body; an opening formed in a side surface of the body to correspond to a moving path of the slider; a dust seal band provided to cover the opening; and a pair of electrodes protruding from the body at opposite sides of the opening toward the outside of the body and extending in the lengthwise direction of the body with the opening being interposed between the pair of electrodes. Positive potential is generated in the upper electrode of the pair of electrodes and negative potential is generated in the lower electrode of the pair of electrodes. | 04-24-2014 |
20140188267 | METHOD FOR SETTING SUBSTRATE-TREATMENT TIME, AND STORAGE MEDIUM - In a method for setting substrate-treatment time, substrate-treatment time is set by the following method. A predicted supply time of wafers of a following lot to a substrate processing apparatus is calculated based on a predicted plasma-treatment completion time of another substrate processing apparatus. A predicted plasma-treatment completion time of all of wafers of a present lot is calculated. A predicted idle time after the completion of the plasma treatment of all of the wafers of the present lot is calculated based on the predicted supply time of the following lot and the predicted plasma-treatment completion time of the present lot. If the predicted idle time is equal to or longer than the idle time required for dummy treatment, supplementary idle time is added between the plasma treatments of unprocessed wafers of the present lot. | 07-03-2014 |
20150098788 | SUBSTRATE TRANSFER CHAMBER AND CONTAINER CONNECTING MECHANISM - A substrate transfer chamber for unloading the substrates from the containers includes a housing-shaped main body and a plurality of container connecting mechanisms to which the containers are connected. In the main body, some of the container connecting mechanisms are arranged on top of one another in a height direction of the main body. | 04-09-2015 |