Morisawa, JP
Akira Morisawa, Kashiwa-Shi JP
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20080273229 | IMAGE READING APPARATUS - Provided is an image reading apparatus communicatable with an image processing apparatus, including: a first reader that reads an image of a first side of a document; a first storage that stores the image read by the first reader; a second reader that reads an image of a second side of the document; a second storage that stores the image read by the second reader; a transmitter that transmits the images stored in the first storage and the second storage to the image processing apparatus; and a controller that, with respect to a first document whose length in a conveyance direction is longer than a predetermined length, causes the transmitter to transmit the image read by the first reader to the image processing apparatus, and causes the first storage and the second storage to store the image read by the second reader. | 11-06-2008 |
20100103484 | DOCUMENT READING APPARATUS - In reading an image of a document in a monochromatic document reading mode, a document reading apparatus reads the image of the document while conveying the document at a speed determined according to a variable magnification ratio, executes digital variable magnification on the read multivalued image in a main scanning direction by using a main scanning direction variable magnification unit, binarizes the multivalued image, and stores the binary image on a memory. In reading an image in a color document reading mode, the document reading apparatus reads the image of the document while conveying the document at a predetermined speed, stores the read multivalued image on the memory, and executes digital variable magnification on the multivalued image in the main scanning direction and a sub scanning direction. | 04-29-2010 |
20120013958 | DOCUMENT READING APPARATUS - A document reading apparatus includes a document positioning plate configured to position a document, a carriage configured to move a light source along the document positioning plate, a reading unit configured to read an image of a document illuminated by a light source of the carriage, a white reference member provided in the displacement range of the carriage, an input unit configured to input a reading start instruction for a document, and a control unit configured to move the carriage along the document positioning plate in response to a reading start instruction input via the input unit. The control unit moves the carriage to a first position at which the white reference member is provided, cause the reading unit to read the white reference member, moves the carriage to a second position that is an acceleration start position for accelerating toward the reading start position of the document positioning plate, and waits for a reading start instruction input from the input unit. | 01-19-2012 |
Daisuke Morisawa, Nirasaki City JP
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20140109833 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus is provided with a process module including a processing container, a rotary table installed within the processing container, the rotary table having a plurality of placing regions to receive substrates, and a process gas supply unit supplying a process gas to the placing regions, a load port in which a transfer container is placed, a dummy substrate receiving unit, a transfer chamber including a transfer mechanism delivering the product substrates or the dummy substrates between the transfer container or the dummy substrate receiving unit and the rotary table, a setting unit setting a placing region to which one of the product substrates is to be transferred, and a control unit outputting a control signal such that the dummy substrates are carried into the remaining placing regions. | 04-24-2014 |
20140112743 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TRANSFER CONTROL METHOD - A substrate processing system includes a plurality of processing chambers configured to perform a predetermined processing with respect to substrates, a transfer device configured to transfer the substrates to the processing chambers in a predetermined order, and a delivery unit configured to deliver the substrates between the delivery unit and the transfer device. The substrate processing system configured to sequentially process the substrates by repeating an operation in a predetermined transfer order. The substrate processing system includes a transfer order setting unit and a transfer control unit configured to switch the first transfer order to the second transfer order. | 04-24-2014 |
Daisuke Morisawa, Yamanashi JP
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20160093520 | PROCESSING APPARATUS AND PROCESSING METHOD - Disclosed is a processing apparatus. The processing apparatus includes: a load port in which a conveyance container accommodating a plurality of semiconductor wafers is placed; a dummy wafer storage area in which a conveyance container accommodating a plurality of dummy wafers is placed; a normal-pressure conveyance room in which a first conveyance arm is installed; an equipment that processes the plurality of semiconductor wafers in a state where the semiconductor wafers and the dummy wafers which are conveyed are placed in slots, respectively; and a controller that controls each component of the processing apparatus. The controller classifies the dummy wafers accommodated in the conveyance container into a plurality of groups, and controls the first conveyance arm to preferentially convey the dummy wafers within one of the classified groups to the equipment and, in replacing the dummy wafers, to perform replacement of the dummy wafers group to group as classified. | 03-31-2016 |
Daisuke Morisawa, Nirasaki-Shi JP
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20080306615 | CONTROL DEVICE OF SUBSTRATE PROCESSING APPARATUS AND CONTROL PROGRAM THEREFOR - A control device is provided that flexibly controls a substrate processing apparatus for each product process. Four process recipes PM | 12-11-2008 |
20090143890 | SUBSTRATE PROCESSING APPARATUS, PROGRAM, STORAGE MEDIUM AND CONDITIONING NECESSITY DETERMINING METHOD - A control unit of a substrate processing apparatus controls a process to be performed in a chamber. The process includes a step of performing a preceding first process; a step of performing a subsequent second process after performing the first process; a step of determining whether to perform an inter-process conditioning, for arranging the environment in the chamber, during a period between the end of the first process and the start of the second process, based on information on the first process and information on the second process; and a step of performing the inter-process conditioning prior to the second process when it is determined in the determining step that the inter-process conditioning is to be performed. | 06-04-2009 |
Daisuke Morisawa, Yamanshi JP
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20150040828 | SUBSTRATE PROCESSING SYSTEM - A substrate processing system for sequentially processing substrates includes processing chambers, a transfer unit, and a control unit controlling the processing chambers and the transfer unit. The control unit includes a transfer control unit controlling an operation of the transfer unit, a transfer order setting unit setting a transfer order of substrates to the processing chambers, an accumulation unit for accumulating a film thickness of a formed thin film or the number of processed substrates after completion of previous cleaning or previous pre-coating in the processing chambers, a processing chamber priority determination unit for determining priority of processing the substrates in the processing chambers based on predetermined rules, and an execution instruction unit for executing conditioning in the processing chambers. The control unit prevents the substrates from being simultaneously processed in all processing chambers during one cycle of executing conditioning once in each of the processing chambers. | 02-12-2015 |
Fuminori Morisawa, Kyoto JP
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20140347130 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND HIGH-FREQUENCY POWER AMPLIFIER MODULE - The invention provides a semiconductor integrated circuit device and a high-frequency power amplifier module capable of reducing variations in the transmission power characteristics. The semiconductor integrated circuit device and the high-frequency power amplifier module each include, for example, a bandgap reference circuit, a regulator circuit, and a reference-voltage correction circuit which is provided between the bandgap reference circuit and the regulator circuit and which includes a unity gain buffer. The reference-voltage correction circuit corrects variations in a bandgap voltage from the bandgap reference circuit. The reference-voltage correction circuit includes first to third resistance paths having mutually different resistance values, and corrects the variations by selectively supplying a current which reflects an output voltage of the unity gain buffer to any one of the first to third resistance paths. The selection in this case is performed by connecting a bonding wire to any one of the terminals REF | 11-27-2014 |
20160062382 | BAND-GAP REFERENCE VOLTAGE CIRCUIT - A band-gap referenced voltage circuit with smaller parasitic resistance which brings reduced band-gap error is disclosed. This reduced error stems from the unique configuration of stacked diode and a shorter wiring line to a resistor. The band-gap referenced voltage circuit includes two diodes, an operational amplifier with non-inverting and inverting inputs and an output for the band-gap voltage output, and three resistors. Employing the stacked configuration of the diode with the top anode electrode, the wiring line which connects the non-inverting input of the operational amplifier and the voltage reference diode is made short. Then the resistance of the wiring line, called also parasitic resistance, would be small. | 03-03-2016 |
Fuminori Morisawa, Kanagawa JP
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20110210795 | HIGH FREQUENCY POWER AMPLIFIER AND OPERATING METHOD THEREOF - A high-frequency power amplifier which can reduce a variation of power gain due to the dependence on gate length of a power amplification field effect transistor is provided. The high-frequency power amplifier comprises, over a semiconductor chip, a bias control circuit, a bias transistor and an amplification transistor which are coupled so as to configure a current mirror circuit, and a gate length monitor circuit comprising a replicating transistor. The amplification transistor amplifies an RF signal and a bias current of the bias control circuit is supplied to the bias transistor. The transistors are fabricated by the same semiconductor manufacturing process, and have the same variation of gate length. The gate length monitor circuit generates a detection voltage depending on the gate length. According to the detection voltage, the bias control circuit controls the bias current, thereby compensating the gate length dependence of transconductance of the amplification transistor. | 09-01-2011 |
20110260796 | BIAS CIRCUIT, POWER AMPLIFIER, AND CURRENT MIRROR CIRCUIT - There is provided a bias circuit that can operate even at low voltage and control a current reflecting a change in drain voltage. A first current mirror circuit for feeding back a drain terminal current of an FET which receives an output of an operational amplifier at a gate terminal to an input terminal of the operational amplifier and a second current mirror circuit are coupled in parallel. A variable voltage is coupled to the first current mirror circuit, and a fixed voltage is coupled to the second current mirror circuit. Even if the variable voltage becomes lower than the threshold voltage of FETs configuring the first current mirror circuit, the second current mirror circuit feeds back the current to the input terminal of the operational amplifier with reliability. | 10-27-2011 |
20120176198 | BIAS GENERATION CIRCUIT, POWER AMPLIFIER MODULE, AND SEMICONDUCTOR DEVICE - There is provided a bias circuit including a power amplifier in which influence of variation of a gate length L is reduced and variation of a gain among products is low. Two NPN- and PNP-type current mirror circuits | 07-12-2012 |
Jun Morisawa, Kochi JP
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20110020605 | Embossed crepe paper and its manufacturing method - An object of the present invention is to provide an embossed crepe paper which can clearly be formed into fine embossed shapes, and is excellent in the fluffy feel and therefore excellent in such as absorbency for fats. As a means of achieving this object, the method for manufacturing an embossed crepe paper, according to the present invention, is a method for manufacturing an embossed crepe paper comprising a step of embossing a raw crepe paper, wherein: a raw paper having a basis weight of 6 to 28 g/m | 01-27-2011 |
Katsuhiro Morisawa, Osaka JP
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20140027286 | Electrophoretic Mobility Measurement Cell And Measurement Apparatus And Method Using The Same - An electrophoretic mobility measurement cell includes a container having a rectangular parallelepiped internal space for introducing a sample solution, two electrodes for applying an electric field to the internal space, tubular sample injection and extraction portions in communication with the internal space, first and second caps for covering the sample injection and extraction portions and sealing the internal space, the first cap has a first side surface contacting an inner side surface of the tubular sample injection portion, the inner side surface formed so that the cross-sectional area of the tube increases with distance from the internal space, and the area of the cross section of the first side surface decreases in the direction of insertion of the first cap. The cell and electrode portions are formed integrally, the electrode portions are made disposable together with the cell, and bubbles are unlikely to remain during injection of the sample solution. | 01-30-2014 |
Kazuhiko Morisawa, Miyagi JP
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20080303996 | OPTICAL COMPENSATION MEMBER, LIQUID CRYSTAL DISPLAY DEVICE, COMPOSITION FOR ALIGNMENT LAYER, AND ALIGNMENT LAYER - An optical compensation member is provided and includes an alignment layer, and an optical anisotropic layer composed of liquid crystal molecules and provided on the alignment layer, wherein the alignment layer contains an additive which suppresses transmission of light in a specific wavelength range. | 12-11-2008 |
Kunio Morisawa, Toyota-Shi JP
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20120168275 | VEHICLE PARKING LOCK DEVICE - A vehicle parking lock device having a parking rod; a tapered parking cam disposed at a leading end portion of the parking rod; and a cam guiding device that guides the parking cam moved together with the parking rod in association with a projection of the parking rod toward the leading end portion to move a parking lock pole with the parking cam to a position of engagement with a parking lock gear rotated together with a transmission output member, the cam guiding device including a first guiding member in a cylindrical shape and a second guiding member in a half cylindrical shape that is disposed subsequently to the first guiding member, the second guiding member having a tapered guiding concave surface that guides the parking cam toward the parking lock pole in association with the projection of the parking rod toward the leading end portion. | 07-05-2012 |
20130284559 | PARK LOCK FOR NARROW TRANSMISSION - A park lock of a transmission, including a park gear; a park pawl rotating about a pawl shaft, the park pawl having a pawl portion locking the park gear, the park pawl including a cam contact portion; a park rod responsive to an operation of a controller, the park rod having a cam portion pressing the cam contact portion to have park pawl engage the park gear; a park sleeve receiving the cam portion and defining a first contact point providing a reactive force to the cam contact portion of the park pawl pressing against the cam portion at a second contact point; a pawl torsional spring biasing the park pawl towards disengagement; and a pawl stopper limiting the rotation of the park pawl wherein motions are constrained within a plane of the transmission and components are rotatingly disposed in parallel axis bores in one half of a transmission case. | 10-31-2013 |
20140285045 | DRIVE DEVICE FOR VEHICLE - A vehicular drive system is provided with at least one electric motor and a bevel gear portion which are accommodated within a casing formed by a plurality of casing members fixed to each other, wherein: said casing includes a first casing member to which a stator of each of said at least one electric motor is fixed, and a second casing member which is fixed to said first casing member so as to cooperate with said first casing member to form a space accommodating said at least one electric motor and which has a support portion supporting said bevel gear portion; and a rotor of said each electric motor is rotatably supported at opposite ends thereof by said first casing member and said second casing member, respectively, while said bevel gear portion is rotatably supported by said second casing member through said support portion. | 09-25-2014 |
20140341757 | OIL PUMP FOR VEHICLE AND VEHICLE WITH THE SAME - A plate is interposed between a rear cover and a pump body. The pump chamber is formed between the plate and the pump body. | 11-20-2014 |
Naoko Morisawa, Ebina-Shi JP
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20110003244 | TONER, METHOD FOR PREPARING THE TONER, AND IMAGE FORMING METHOD USING THE TONER - The toner includes a binder resin; a colorant; and a release agent. The first inter-particle force Fp(A) of the toner, which is measured under an environmental condition of 23° C. and 60% RH after the toner is pressed for 1 minute at 25° C. under a compression stress of 15 kg/cm | 01-06-2011 |
Naoko Morisawa, Kanagawa JP
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20140178088 | FIXING DEVICE AND IMAGE FORMING APPARATUS - A fixing device includes a rotary member comprising a heat generation layer; an excitation coil generating magnetic flux, disposed along an axial direction of the rotary member and opposite the rotary member, to heat by induction the heat generation layer; a first demagnetizing coil layered on the excitation coil and generating magnetic flux in a direction reverse to and cancel the magnetic flux that the excitation coil generates; a sheet size detector to obtain a size of a recording sheet on which an image is to be formed by passing through the rotary member; and a drive controller to control driving of the first demagnetizing coil. The drive controller drives the first demagnetizing coil after information including the sheet size information has been obtained. | 06-26-2014 |
Naoya Morisawa, Hyogo JP
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20150380769 | NONAQUEOUS ELECTROLYTE SECONDARY BATTERY - A nonaqueous electrolyte secondary battery as an example of an embodiment of the present disclosure includes a positive electrode, a negative electrode, and a nonaqueous electrolyte containing a nonaqueous solvent including fluoromethyl propionate. The lithium fluoride (LiF) adheres to a surface of the positive electrode and sulfur (S) compound adheres to a surface of the negative electrode and a proportion of fluorinated solvent is 55% by weight or more to a total weight of the nonaqueous solvent. | 12-31-2015 |
Rui Morisawa, Kanagawa JP
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20100232100 | Electronic Apparatus - An electronic apparatus includes a display portion, a main body portion, an articulated coupling mechanism, and an interlock mechanism. The display portion includes a display screen. The main body portion is coupled to the display portion. The articulated coupling mechanism includes, at each of end portions, a plurality of coupling members each having a rotation axis and being rotatably coupled to one another in series about the rotation axis, the plurality of coupling members coupled in series having one end coupled to the main body portion side and the other end coupled to the display portion side. The interlock mechanism interlocks rotations of the plurality of coupling members with one another in the articulated coupling mechanism. | 09-16-2010 |
Satoshi Morisawa, Hitachi JP
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20090003507 | METHOD AND APPARATUS FOR SUPPRESSING CORROSION OF CARBON STEEL, METHOD FOR SUPPRESSING DEPOSIT OF RADIONUCLIDE ONTO CARBON STEEL MEMBERS COMPOSING A NUCLEAR POWER PLANT, AND FILM FORMATION APPARATUS - The present invention is a method for suppressing corrosion of carbon steel members composing a nuclear power plant. That is, the processing solution contains a chemical including iron (II) ions, an oxidizing agent for oxidizing at least one part of the iron (II) ions into iron (III) ion, and a pH adjustment agent for adjusting pH. The pH of the processing solution is adjusted in the range of 5.5 to 9.0 by the pH adjustment agent. The processing solution is introduced into a purifying system pipe having the carbon steel members. The iron (II) ions are adsorbed on an inner surface of the purifying system pipe, namely, a surface of the carbon steel members. The ferrite film is formed on the surface of the carbon steel members by oxidizing the absorbed iron (II) ions. Therefore, corrosion of the carbon steel members is suppressed by the ferrite film. | 01-01-2009 |
20090003508 | Method of suppressing deposition of radioactive isotope - A formic acid aqueous solution that contains Fe (II) ions is produced by dissolving metal iron in a formic acid aqueous solution. Nitrogen is supplied from a nitrogen supply device to a chemical liquid tank and then discharged from a discharge line to reduce the dissolved oxygen concentration in the aqueous solution. The chemical liquid tank is filled with the formic acid aqueous solution sealed with nitrogen, and is transferred from a factory to a nuclear reactor building designated as radiation-controlled areas. Inside the nuclear reactor building, the chemical liquid tank is installed in a film deposition apparatus connected to a reactor water recirculation pipeline. The formic acid aqueous is supplied from the chemical liquid tank to the inside of the reactor water recirculation pipeline, and then a ferrite film is formed on the inner surface of the reactor water recirculation pipeline. | 01-01-2009 |
20090290675 | METHOD AND APPARATUS FOR SUPPRESSING CORROSION OF CARBON STEEL, METHOD FOR SUPPRESSING DEPOSIT OF RADIONUCLIDE ONTO CARBON STEEL MEMBERS COMPOSING A NUCLEAR POWER PLANT, AND FILM FORMATION APPARATUS - The present invention is a method for suppressing corrosion of carbon steel members composing a nuclear power plant. That is, the processing solution contains a chemical including iron (II) ions, an oxidizing agent for oxidizing at least one part of the iron (II) ions into iron (III) ion, and a pH adjustment agent for adjusting pH. The pH of the processing solution is adjusted in the range of 5.5 to 9.0 by the pH adjustment agent. The processing solution is introduced into a purifying system pipe having the carbon steel members. The iron (II) ions are adsorbed on an inner surface of the purifying system pipe, namely, a surface of the carbon steel members. The ferrite film is formed on the surface of the carbon steel members by oxidizing the absorbed iron (II) ions. Therefore, corrosion of the carbon steel members is suppressed by the ferrite film. | 11-26-2009 |
20090316852 | METHOD FOR SUPPRESSING DEPOSIT OF RADIONUCLIDE ONTO STRUCTURE MEMBER COMPOSING NUCLEAR POWER PLANT AND FERRITE FILM FORMATION APPARATUS - A method for suppressing deposit of radionuclide onto structure member composing a nuclear power plant, comprising the steps of: | 12-24-2009 |
Shigeki Morisawa, Suzuka-Shi JP
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20080213017 | POST-PROCESSING APPARATUS - A post-processing apparatus includes: a compile tray; a post-processing member; a stacker tray; a sheet conveying path including a discharging path, a waiting path and a discharging-path switching member; a sheet conveying member; an one-end alignment medium conveying member; a discharging member; and a discharging-member controlling section. | 09-04-2008 |
Shinkatsu Morisawa, Osaka JP
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20080274546 | ARTIFICIAL PHYSIOLOGICAL SALT SOLUTION AND MANUFACTURING METHOD FOR SAME - An artificial physiological salt solution, wherein the active hydrogen reaction value is 0.01 to 1, the pH is 4.0 to 7.9 and the osmotic pressure is 260 mOsm/L to 2560 mOsm/L, as well as a manufacturing method for the same are provided as a novel artificial physiological salt solution, which has active oxygen eliminating activity and anti-inflammation effects, and can be appropriately used in a multitude of applications such as organ cleaning solutions (cleaning solutions for the eyes, cleaning solutions for the nose and the like), artificial infusions, artificial amniotic fluid, protective solutions, cell/tissue cultures and the like, as well as a manufacturing method for the same. | 11-06-2008 |
20090045121 | Dialysis Solution Preparation Water, Dialysis Solution Using Such Water, Method of Producing Dialysis Solution, and Dialysis Equipment - Dialysis solution preparation water having a dissolved hydrogen concentration of 50 to 600 ppb, a pH of 7 to 10, and satisfying the water quality criterion defined at ISO 13959, used to prepare a dialysis solution by diluting a dialysis base agent including at least 50 ng/mL of a glucose degradation product, a method of preparing a dialysis solution by diluting a dialysis base agent using the dialysis solution preparation water, and a dialysis solution obtained thereby. By dialysis equipment comprising means for supplying dialysis solution preparation water having a dissolved hydrogen oxygen of 50 to 600 ppb, a pH of 7 to 10, and satisfying a water quality criterion defined at ISO 13959, means for storing a dialysis base agent including at least 50 ng/mL of a glucose degradation product, and means for preparing a dialysis solution by diluting the dialysis base agent with the dialysis solution preparation water, there can be provided a dialysis solution that can prevent the adverse effect of glucose degradation products on the biological body, a dialysis solution preparation water used therefor, a method of producing a dialysis solution, and dialysis equipment. | 02-19-2009 |
Shinkatsu Morisawa, Osaka-Shi JP
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20150060285 | APPARATUS FOR PRODUCING WATER FOR PREPARATION OF DIALYSIS SOLUTION - There is provided an apparatus for producing water for preparation of a dialysis solution, including an electrolytic water generation device that performs electrolysis using a solid polymer membrane, and a reverse osmosis membrane treatment device, the electrolytic water generation device being capable of reducing drained water as much as possible, and performing intense electrolysis to increase the amount of dissolved hydrogen without raising pH. | 03-05-2015 |
Shuichi Morisawa, Saitama-Shi JP
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20080228732 | DOCUMENT IMAGE MANAGEMENT DEVICE AND DOCUMENT IMAGE MANAGEMENT METHOD - The present invention is to improve user operability when the same operation is repeated on a document image management device. A device having a executing unit for receiving selection of processing to be executed on a file or folder from an operator, and executing the processing, which selection is received, on the file or folder, includes: a search unit for searching for a file or folder on which the processing has been executed in the past in the executing unit when receiving the selection of the processing from the operator; and an operation target display unit for showing on a display screen the identification information on the file or folder searched for by the search unit. | 09-18-2008 |
Taku Morisawa, Joetsu-Shi JP
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20110151381 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS - A fluorinated monomer has formula (1) wherein R | 06-23-2011 |
20120148945 | RESIST COMPOSITION AND PATTERNING PROCESS - A polymer having a partial structure —C(CF | 06-14-2012 |
20120220112 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition based on a polymer comprising recurring units of (meth)acrylate having a cyclic acid labile group and a dihydroxynaphthalene novolak resin, and containing a photoacid generator is improved in resolution, step coverage and adhesion on a highly reflective stepped substrate, has high resolution, and forms a pattern of good profile and minimal edge roughness through exposure and development. | 08-30-2012 |
Taku Morisawa, Jyoetsu JP
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20110305979 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS - The invention provides a resist top coat composition wherein the composition contains polymer (P1-1) with a weight-average molecular weight of 1,000 to 500,000, having at least repeating units represented by the following general formulae (1a), (1b-1), and (1c). There can be a resist top coat composition having excellent water repellent and water sliding properties with fewer development defects and with a good resist pattern profile after development, and a patterning process using this composition. | 12-15-2011 |
20140335453 | METHOD FOR PRODUCING RESIST COMPOSITION - Provided by the present invention is a method for producing a resist composition, especially a silicon-containing resist underlayer film composition, with fewer film defects, the composition used in immersion exposure, double patterning, development by an organic solvent, and so forth. Specifically, provided is a method for producing a resist composition to be used for manufacturing a semiconductor device, wherein the resist composition is filtered using a filter which filters through 5 mg or less of an eluate per unit surface area (m | 11-13-2014 |
Toshihiro Morisawa, Yokohama JP
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20090253222 | Etching process state judgment method and system therefor - An etching process state judgment method comprising: a spectral data obtaining step, in which an optical emission spectrum distribution is obtained by monitoring optical emission during an etching process of a plurality of wafers; a peak detection step, in which peaks are detected from the optical emission spectrum distribution at a specific time point during the etching process, to obtain peak characteristics; a common peak identifying step, in which peaks common to the wafers are identified among the peaks detected in the peak detection step; and a state detection step, in which the characteristics are compared regarding the common peaks, to detect a state of each wafer in the etching process. | 10-08-2009 |
20110003413 | MANUFACTURING METHOD OF SEMICONDUCTOR PHOTONIC DEVICE SUBSTRATE - In a manufacturing method of a semiconductor photonic device substrate, before multi-layer films different in material composition are successively and gradually crystal-grown in one chamber, an inter-layer growth rate model showing a relation in growth rate between each layer is defined, a growth rate of a film corresponding to at least one or more layers is obtained by actual crystal growth using an individual substrate, a growth rate of a film corresponding to other layers is estimated from the obtained growth rate by the inter-layer growth rate model, and a growth time is determined in accordance with a film thickness of each layer of the semiconductor photonic device substrate based on the actually obtained growth rate and the estimated growth rate. These steps are carried out by using a computer system connected to an MOCVD equipment, and then, a crystal growth of the semiconductor photonic device substrate is performed. | 01-06-2011 |
20110315661 | ETCHING APPARATUS, ANALYSIS APPARATUS, ETCHING TREATMENT METHOD, AND ETCHING TREATMENT PROGRAM - There is provided an etching apparatus in which, without setting the information of the substance and the chemical reaction, a small number of representative wavelengths can be selected from a waveform at a lot of wavelengths, and an analysis process of etching data which needs large man-hours can be eliminated to efficiently set the monitoring of the etching. The etching apparatus includes: a lot/wafer/step-depending OES-data searching/acquiring function | 12-29-2011 |
20120310403 | ETCHING APPARATUS, CONTROL SIMULATOR,AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - Based on a model for determining optical emission intensity values Y at wavelengths from actuator values X of an etching apparatus, X is calculated from Y to achieve preferable Run-to-Run control over Y. A relation between X and Y is defined as a control model (matrix model C | 12-06-2012 |
20130173042 | SEMICONDUCTOR MANUFACTURING EQUIPMENT - Semiconductor manufacturing equipment includes: a controller controlling driving and processes of various parts of the semiconductor manufacturing equipment, and a sensor monitoring each physical amount in the semiconductor manufacturing equipment or a status of each chemical response amount; a database; and an arithmetic section executing: processing of reading out equipment data, calculating a correlation matrix between time points based on a plurality of pieces of signal data to be compared, calculating eigen values and eigen vectors from the correlation matrix, and calculating principal component scores by principal component analysis; processing of comparing magnitudes of the eigen values of the principal components, arranging the eigen values in descending order to display a list thereof; and processing of displaying a scatter diagram where the principal component scores of the respective signals are plotted in a feature space selecting the principal component corresponding to the eigen value having a contribution ratio. | 07-04-2013 |
Toshihiro Morisawa, Yokohama-Shi JP
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20110083808 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus including: a monitor device which monitors a process quantity generated at plasma processing; a monitor value estimation unit which has monitor quantity variation models for storing change of a monitor value of the process quantity in accordance with the number of processed specimens and which estimates a monitor value for a process of a next specimen by referring to the monitor quantity variation models; and a control quantity calculation unit which stores a relation between a control quantity for controlling the process quantity of the vacuum processing device and a monitor value and which calculates the control quantity based on a deviation of the estimated monitor value from a target value to thereby control the process quantity for the process of the next specimen. Thus, a process model indicating variation of the state of a process processing apparatus can be added to a control loop in such run-to-run control that process conditions are changed according to each wafer process, so that stable processed results can be obtained even when variation occurs in processes. | 04-14-2011 |
20140277626 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus including: a monitor device which monitors a process quantity generated at plasma processing; a monitor value estimation unit which has monitor quantity variation models for storing change of a monitor value of the process quantity in accordance with the number of processed specimens and which estimates a monitor value for a process of a next specimen by referring to the monitor quantity variation models; and a control quantity calculation unit which stores a relation between a control quantity for controlling the process quantity of the vacuum processing device and a monitor value and which calculates the control quantity based on a deviation of the estimated monitor value from a target value to thereby control the process quantity for the process of the next specimen. Thus, a process model indicating variation of the state of a process processing apparatus can be added to a control loop in such run-to-run control that process conditions are changed according to each wafer process, so that stable processed results can be obtained even when variation occurs in processes. | 09-18-2014 |
Toshihiro Morisawa, Kanagawa JP
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20090171638 | Advanced-process-control system utilizing a lambda tuner - An advanced process control (APC) system. The APC system comprises a database for receiving process data from a measurement tool for a plurality of process runs and for storing the process data. A lambda tuner determines a tuned-lambda value corresponding to a process-capability-index value based on upper and lower process control limits and statistics derived from the process data. A process-run controller updates a recipe value based on the received process data and the tuned-lambda value. | 07-02-2009 |
Toshikazu Morisawa, Tokorozawa-Shi JP
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20090144537 | INFORMATION PROCESSING APPARATUS AND METHOD FOR STARTING UP INFORMATION PROCESSING APPARATUS - An information processing apparatus includes: a power button; a switching unit that switches a plurality of peripheral devices connected to the apparatus between a detectable state and an undetectable state; a determination unit that determines whether the start-up operation is a normal start-up operation for starting up all of the peripheral devices or a specific start-up operation for starting up a specific peripheral device that is selected from among the peripheral devices; a first switching control unit that controls the switching unit to switch the specific peripheral device to the detectable state and to switch a non-specific peripheral device that is selected from among the peripheral devices except the specific peripheral device to the undetectable state; and a second switching control unit that controls the switching unit to switch the non-specific peripheral device to the detectable state after the specific peripheral device is detected by the operating system. | 06-04-2009 |
Toshizumi Morisawa, Takamatsu-Shi JP
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20100321195 | LOOSE PART MONITORING METHOD AND SYSTEM - A loose part monitoring method and system for preventing the generation of a false alarm as much as possible, including analyzing a group of detection signals that have been output from a plurality of sensors placed on a wall defining a fluid flow path, wherein the group of detection signals are analyzed for a rising gradient that is related to change in intensity of impulsive sound, a damping time that is related to change of intensity of the impulsive sound, and a frequency spectrum that is related to pitch of the impulsive sound in order to determine whether the group of detection signals are false or true. | 12-23-2010 |
Yuichi Morisawa, Yokohama JP
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20160090911 | GAS TURBINE FACILITY - A gas turbine facility | 03-31-2016 |
Yuichi Morisawa, Yokohama-Shi JP
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20150020497 | GAS TURBINE FACILITY - A gas turbine facility | 01-22-2015 |
Yusuke Morisawa, Sanda JP
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20140065717 | METHOD AND APPARATUS FOR MEASURING CONCENTRATION OF ADVANCED-OXIDATION ACTIVE SPECIES - A method for measuring the concentration of advanced-oxidation active species includes a step of measuring the absorption characteristics of a wavelength region including the wavelength of 195 to 205 nm of a sample and a step of determining the concentration of the advanced-oxidation active species from the aforementioned measured absorption characteristics on the basis of the absorption coefficient of the advanced-oxidation active species in the wavelength region including the wavelength of 195 to 205 nm. The method and the apparatus can measure the concentration of the advanced-oxidation active species directly in line without the need for adding an additive. | 03-06-2014 |
20150021491 | METHOD AND APPARATUS FOR MEASURING CONCENTRATION OF ADVANCED-OXIDATION ACTIVE SPECIES - A method for measuring the concentration of advanced-oxidation active species includes a step of measuring the absorption characteristics of a wavelength region including the wavelength of 195 to 205 nm of a sample and a step of determining the concentration of the advanced-oxidation active species from the aforementioned measured absorption characteristics on the basis of the absorption coefficient of the advanced-oxidation active species in the wavelength region including the wavelength of 195 to 205 nm. The method and the apparatus can measure the concentration of the advanced-oxidation active species directly in line without the need for adding an additive. | 01-22-2015 |