Patent application number | Description | Published |
20130256273 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD - A substrate treatment apparatus includes: a chamber; a substrate being treated with a treatment liquid in the chamber; a temperature measuring unit which measures an internal air temperature of the chamber and/or a temperature of the treatment liquid; a temperature adjusting unit which changes the internal air temperature and/or the temperature of the treatment liquid; a storage unit which stores a map defining a relationship between the air temperature and the treatment liquid temperature so that a treatment liquid temperature level for a given air temperature level is lower than the given air temperature level; and a temperature controlling unit which sets a target value of the internal air temperature of the chamber or the temperature of the treatment liquid based on the map and a measurement value detected by the temperature measuring unit, and controls the temperature adjusting unit based on the target value. | 10-03-2013 |
20130306238 | CHEMICAL LIQUID PREPARATION METHOD OF PREPARING A CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, CHEMICAL LIQUID PREPARATION UNIT PREPARING A CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, AND SUBSTRATE PROCESSING SYSTEM - A substrate processing system includes a chemical liquid preparation unit preparing a chemical liquid to be supplied to a substrate and a processing unit which supplies the chemical liquid, prepared by the chemical liquid preparation unit, to the substrate. The chemical liquid preparation unit supplies an oxygen-containing gas, containing oxygen gas, to a TMAH-containing chemical liquid, containing TMAH (tetramethylammoniumhydroxide),tomaketheoxygen-containing gas dissolve in the TMAH-containing chemical liquid. | 11-21-2013 |
20150075571 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a substrate holding means that holds a substrate horizontally, a substrate rotating means that rotates a substrate held by the substrate holding means about a vertical rotation axis passing through the substrate, a discharging member that discharges a processing liquid toward the substrate, and a high-temperature processing liquid pipe that supplies a processing liquid of a temperature higher than that of the discharging member to the flow passage. The discharging member includes a plurality of discharge ports respectively disposed at a plurality of positions different in distance from the rotation axis and a flow passage connected sequentially to the plurality of discharge ports in order from outside to inside. The discharging member discharges a processing liquid supplied from the flow passage to the plurality of discharge ports from the plurality of discharge ports toward the substrate. | 03-19-2015 |
Patent application number | Description | Published |
20110249362 | SPINDLE MOTOR HAVING CONNECTING MECHANISM CONNECTING LEAD WIRE AND CIRCUIT BOARD, AND STORAGE DISK DRIVE HAVING THE SAME - A spindle motor includes a base portion, a rotor hub, a stator, and a circuit board. The base portion preferably includes a through hole and is arranged to spread out radially around a central axis. The rotor hub is arranged above the base portion to rotate about the central axis. The stator is arranged above the base portion, and includes coils each including at least one lead wire. The circuit board is arranged radially outward of the through hole, and arranged on a lower surface of the base portion. The base portion includes a communicating groove arranged to join the through hole and the circuit board to each other. The at least one lead wire of the coils is arranged to pass inside the through hole and the communicating groove to be electrically connected to the circuit board. The through hole is sealed with a sealant. | 10-13-2011 |
20120033329 | SPINDLE MOTOR AND STORAGE DISK DRIVE - In a motor, an annular radially extending gap is defined between an outer annular surface and a lower surface of an annular cover portion. The radially extending gap has an axial width smaller than a maximum width of an upper seal portion defined between an outer circumferential surface of an upper thrust portion and an inner circumferential surface of a tubular portion. An annular axially extending gap is defined between an inner cylindrical surface and a radially inner edge of the annular cover portion. The axially extending gap has a radial width smaller than the maximum width of the upper seal portion. | 02-09-2012 |
20120250183 | MOTOR AND STORAGE DISK DRIVE - A motor includes a stationary portion and a rotating portion. The rotating portion includes a sleeve portion including one communicating hole arranged to extend completely there through from an upper surface to a lower surface thereof, and a cover portion including a hole portion. The axial extension range of the hole portion is arranged to overlap with the axial extension range of the communicating hole in a radial direction. A center of the hole portion is arranged on a plane including a central axis and a center of the communicating hole. The communicating hole and the hole portion are arranged on opposite sides of the central axis. The following inequality is satisfied: V | 10-04-2012 |
20120327534 | METHOD OF MANUFACTURING FLUID DYNAMIC BEARING MECHANISM, MOTOR, AND STORAGE DISK DRIVE - A method of manufacturing a bearing mechanism of a motor includes steps a)-e). In step a), a bearing assembly is assembled. In step b), an upper seal gap between an upper thrust portion and an upper hub annular portion is arranged to face downward to increase the width of a gap between an outer tubular portion and a flange portion, or a lower seal gap between the outer tubular portion and a lower hub annular portion is arranged to face downward to increase the width of a gap between the upper thrust portion and the flange portion. In step c), pressure in all gaps is reduced. In step d), lubricating oil is injected into the upper or lower seal gap which faces upward, and a predetermined time or longer is allowed to pass. In step e), pressure is returned to atmospheric pressure. | 12-27-2012 |
20130038964 | SPINDLE MOTOR HAVING CONNECTING MECHANISM CONNECTING LEAD WIRE AND CIRCUIT BOARD, AND STORAGE DISK DRIVE HAVING THE SAME - A spindle motor includes a base portion, a rotor hub, a stator, and a circuit board. The base portion preferably includes a through hole and is arranged to spread out radially around a central axis. The rotor hub is arranged above the base portion to rotate about the central axis. The stator is arranged above the base portion, and includes coils each including at least one lead wire. The circuit board is arranged radially outward of the through hole, and arranged on a lower surface of the base portion. The base portion includes a communicating groove arranged to join the through hole and the circuit board to each other. The at least one lead wire of the coils is arranged to pass inside the through hole and the communicating groove to be electrically connected to the circuit board. The through hole is sealed with a sealant. | 02-14-2013 |
20130120868 | SPINDLE MOTOR AND STORAGE DISK DRIVE - A motor includes a seal cap and a tubular portion. The seal cap includes a first seal cap lower surface which is an annular surface facing axially downward, and a second seal cap lower surface which is an annular surface facing axially downward and arranged radially outward of the first seal cap lower surface. The tubular portion includes a first tubular portion upper surface which is an annular surface arranged axially opposite to the first seal cap lower surface, and a second tubular portion upper surface which is an annular surface arranged radially outward of the first tubular portion upper surface and in contact with the second seal cap lower surface. The first tubular portion upper surface includes an oil-repellent film region covered with an oil-repellent film. A substantially annular radially extending gap is defined between the first tubular portion upper surface and the first seal cap lower surface. | 05-16-2013 |
20130128379 | SPINDLE MOTOR AND STORAGE DISK DRIVE - A motor includes a stationary portion and a rotating portion. The stationary portion includes a shaft portion and an upper thrust portion. The upper thrust portion includes a tubular first outer circumferential surface arranged radially outside the upper thrust portion, and a tubular second outer circumferential surface arranged above the first outer circumferential surface. The rotating portion includes a sleeve portion, a tubular portion, and an annular cover portion. The annular cover portion includes a plate portion and an inner annular projecting portion arranged to project upward or downward. An inner circumferential surface of the inner annular projecting portion is arranged above an inner circumferential surface of the tubular portion. An upper seal portion includes a surface of a lubricating oil located therein. The inner circumferential surface of the inner annular projecting portion and the second outer circumferential surface are arranged opposite to each other with an axially extending gap therebetween. | 05-23-2013 |
Patent application number | Description | Published |
20090020765 | Semiconductor Device and Method for Manufacturing Same - A semiconductor device includes a first conductive type SiC semiconductor substrate; a second conductive type well formed on the SiC semiconductor substrate; a first impurity diffusion layer formed by introducing a first conductive type impurity so as to be partly overlapped with the well in a region surrounding the well; a second impurity diffusion layer formed by introducing the first conductive type impurity in a region spaced apart for a predetermined distance from the impurity diffusion layer in the well; and a gate electrode opposed to a channel region between the first and the second impurity diffusion layers with gate insulating film sandwiched therebetween. | 01-22-2009 |
20110297964 | AC SWITCH - An AC switch includes a first compound semiconductor MOSFET and a second compound semiconductor MOSFET whose sources are connected with each other, a first output terminal connected to the drain of the first compound semiconductor MOSFET, and a second output terminal connected to the drain of the second compound semiconductor MOSFET. The withstand voltage between the first output terminal and the second output terminal in an off state is not less than 400 V. The resistance between the first output terminal and the second output terminal in an on state is not more than 20 mΩ. | 12-08-2011 |
20120012861 | SEMICONDUCTOR DEVICE - A semiconductor device including a semiconductor layer of a first conductivity type; a plurality of body regions of a second conductivity type, each formed in a region extending from the surface of the semiconductor layer to a halfway portion of the same in the thickness direction, and each spaced apart from each other in a direction perpendicular to the thickness direction; source regions of the first conductivity type, each formed on the surface layer part of each body region and spaced away from the edges of each body region; a gate insulating film formed on the semiconductor layer; and gate electrodes formed on the gate insulating film. In the semiconductor layer, trenches extending between two neighboring source regions are formed by digging from the source of the semiconductor layer, the inside surface of the trenches are covered by the gate insulating film, and the gate electrodes comprise surface-facing parts, which face the surface of the semiconductor layer, and buried parts, which are buried in the trenches. | 01-19-2012 |
20130009256 | SEMICONDUCTOR DEVICE - The semiconductor device according to the present invention includes a semiconductor layer of a first conductivity type, body regions of a second conductivity type plurally formed on a surface layer portion of the semiconductor layer at an interval, a source region of the first conductivity type formed on a surface layer portion of each body region, a gate insulating film provided on the semiconductor layer to extend between the body regions adjacent to each other, a gate electrode provided on the gate insulating film and opposed to the body regions, and a field relaxation portion provided between the body regions adjacent to each other for relaxing an electric field generated in the gate insulating film. | 01-10-2013 |
20130248981 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR SAME - A semiconductor device includes a first conductive-type semiconductor layer, a second conductive-type body region formed in a surficial portion of the semiconductor layer, a first conductive-type source region formed in a surficial portion of the body region, a gate insulating film provided on the semiconductor layer and containing nitrogen atoms, the gate insulating film including a first portion in contact with the semiconductor layer outside the body region, a second portion in contact with the body region, and a third portion in contact with the source region, and a gate electrode provided on the gate insulating film in an area extending across the semiconductor layer outside the body region, the body region, and the source region. The third portion of the gate insulating film has a thickness greater than the thickness of the first portion and the thickness of the second portion. | 09-26-2013 |
20140054611 | SEMICONDUCTOR DEVICE - A semiconductor device including a semiconductor layer of a first conductivity type; a plurality of body regions of a second conductivity type; source regions of the first conductivity type, formed on a surface layer part of each body region and spaced away from the edges of each body region; a gate insulating film formed on the semiconductor layer; and gate electrodes formed on the gate insulating film. In the semiconductor layer, trenches extending between two neighboring source regions are formed, the inside surface of the trenches are covered by a gate insulating film, and the gate electrodes comprise surface-facing parts, which are buried in the trenches. | 02-27-2014 |
Patent application number | Description | Published |
20090111971 | PROTEIN REFOLDING AGENT AND REFOLDING METHOD - A refolding agent and refolding method which make it possible to produce high-purity proteins in high productivity. The refolding agent includes a phosphorus-containing compound (A) and an oxycarbonyl group-containing compound (B). The refolding method includes the step of treating the unfolded protein with the refolding agent. As the compound (A), there may be mentioned at least one species selected from inorganic phosphoric acids, alkyl phosphate esters, sugar phosphate esters, and salts of these, and as the compound (B), there may be mentioned at least one species selected from formic acid, acetic acid, propionic acid, lactic acid, tartaric acid, and salts of these. | 04-30-2009 |
20090143569 | BACTERIOLYTIC AGENT - The present invention is a bacteriolytic agent containing a cationic surfactant (A) of which a counteranion is an acid having a pKa (25° C.) of 0 to 10. As the counterion, a carboxylate anion is preferable. As the cationic surfactant (A), a quaternary ammonium salt-type surfactant is preferable. Examples of the useful substance include a protein, an amino acid, a nucleic acid, an antibiotic, sugars or vitamins. | 06-04-2009 |
Patent application number | Description | Published |
20120240958 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD - A substrate treatment apparatus includes a treatment vessel in which a substrate is accommodated, a treatment liquid supply unit, a chamber enclosing the treatment vessel, a substrate holding unit, a circulation unit and a control unit. The circulation unit circulates the treatment liquid from the treatment vessel through a circulation path extending through a filter and a temperature controller and spouts the treatment liquid toward the substrate accommodated in the treatment vessel to recover the treatment liquid in the treatment vessel. The control unit controls the liquid surface level of the treatment liquid retained in the treatment vessel below the substrate held at a substrate treatment position. | 09-27-2012 |
20140273498 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - In a substrate processing apparatus, provided are an upper nozzle for supplying a chemical liquid having a temperature higher than that of a substrate onto an upper surface of the substrate and a heating liquid supply nozzle for supplying a heating liquid having a temperature higher than that of the substrate onto a lower surface of the substrate. It is thereby possible to suppress or prevent a decrease in the temperature of the chemical liquid supplied on the upper surface of the substrate from a center portion of the substrate toward an outer peripheral portion thereof. In a supply nozzle, the heating liquid supply nozzle is positioned on the inner side of a heating gas supply nozzle for ejecting heating gas in drying the substrate. It is thereby possible to simplify and downsize a structure used for heating the lower surface of the substrate. | 09-18-2014 |
20140290703 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus includes a substrate supporting part for supporting a substrate in a horizontal state, an upper nozzle for discharging deionized water as a cleaning solution toward a center portion of an upper surface of the substrate, and a substrate rotating mechanism for rotating the substrate supporting part together with the substrate around a central axis directed in a vertical direction. In the substrate processing apparatus, the plurality of discharge ports are provided in the upper nozzle, and the flow rate of the deionized water to be supplied onto the center portion of the substrate from the upper nozzle can be ensured, with the flow rate of the deionized water from each discharge port reduced. It is thereby possible to perform appropriate cleaning of the upper surface of the substrate while suppressing electrification at the center portion of the substrate. | 10-02-2014 |
Patent application number | Description | Published |
20100310205 | Hybrid Coupling Structure of the short Range Plasmon Polariton and Conventional Dielectric Waveguide, A Coupling Structure of the Long Range Plasmon Polariton and Conventional Dielectric Waveguide, and Applications Thereof - The present invention provides a hybrid coupling structure of a short range surface plasmon polariton and a conventional dielectric waveguide, including a dielectric substrate layer, a dielectric waveguide layer positioned on the said dielectric substrate layer, a coupling matching layer positioned on the said dielectric waveguide layer and a short range surface plasmon waveguide portion, formed on the said coupling matching layer, for conducting the short range surface plasmon polariton. The present invention also provides a coupling structure of a long range surface plasmon polariton and a dielectric waveguide, including a dielectric substrate layer, a dielectric waveguide layer, a coupling matching layer and a long range surface plasmon waveguide portion upward from below respectively. | 12-09-2010 |
20140348195 | TWO DIMENSIONAL PHOTONIC CRYSTAL VERTICAL CAVITY SURFACE EMITTING LASERS - The 2D-PC vertical cavity surface emitting laser includes: a PC layer; and a lattice point for forming resonant-state arranged in the photonic crystal layer, and configured so that a light wave in a band edge in photonic band structure in the PC layer is diffracted in a plane of the PC layer, and is diffracted in a surface vertical direction of the PC layer. The perturbation for diffracting the light wave in the surface vertical direction of the PC layer is applied to the lattice point for forming resonant-state. The term “perturbation” means that modulation is periodically applied to the lattice point for forming resonant-state. For example, the periodic modulation may be refractive index modulation, hole-diameter modulation, or hole-depth modulation. | 11-27-2014 |