Patent application number | Description | Published |
20080239173 | Projector - A projector includes an illumination device that emits an illumination light flux, a color-separating optical system that separates light from the illumination device into plural color lights and directs the color lights to an illuminated area, and a plurality of liquid crystal light valves that have liquid crystal panels. The crystal light valves are configured to maximize light utilization efficiency. | 10-02-2008 |
20100039621 | PROJECTOR - A projector includes: a light source; a polarization conversion element array having an entrance surface on which an effective entrance area and an ineffective entrance area are disposed to form stripes; a modulation device adapted to modulate a linearly polarized light beam emitted from the polarization conversion element array in accordance with an image signal; a projection device adapted to project the modulated light beam; a first light shielding section, a part of the entrance surface being provided with the first light shielding section adapted to shield a part of the incident light beam to the effective entrance area; and a first opening section, the first opening section being another area of the entrance surface than the part provided with the first light shielding section, at least a part of the first opening section reaches an end of the entrance surface. | 02-18-2010 |
20100208214 | PROJECTOR - A projector includes: an illuminating device including a light source device, a first lens array that comprises first regions located at four corners in the first lens array when viewed along a system optical axis and second regions located between the two first regions, and a second lens array; a light modulating device; a projection optical system; a light control device; and a mode selection device. The light control device blocks part of the plural partial light beams by causing first and second light shields to integrally operate, when the brightness priority mode is selected. The light control device always blocks part of the partial light beams with the first light shields and blocks part of the partial light beams by causing the second light shields to operate independently from the first light shields. | 08-19-2010 |
20100265419 | PROJECTOR - A projector includes: a display device which modulates illumination light; a projection lens which projects modulation light produced by the display device; and a holding device which has a holder member supporting the display device, a frame member supporting the projection lens and functions as a base capable of supporting the holder member, and an expanding and contracting member disposed between the frame member and the display device, wherein a temperature coefficient for the expansion and contraction of the expanding and contracting member in the direction of the optical axis of the projection lens corresponds to a temperature coefficient for the increase and decrease of the focal distance of the projection lens. | 10-21-2010 |
20110085145 | PROJECTOR - A projector includes: first and second light blocking members adapted to partially block a light beam from a light source, and a drive section adapted to make the first and second light blocking members perform an opening and closing operation. When the corresponding first and second light blocking members are located at a maximum blocking state, with respect to an opening and closing direction of the first and second light blocking members perpendicular to a system optical axis, a first and second support sections support the first and second light blocking members at predetermined positions on the system optical axis side from intermediate positions corresponding to midpoints of areas between edge portions of the first and second light blocking members on the system optical axis side and parts, to which outer edges of the light beam to be blocked are input. | 04-14-2011 |
20130300951 | PROJECTOR - A projector includes: a display device which modulates illumination light; a projection lens which projects modulation light produced by the display device; and a holding device which has a holder member supporting the display device, a frame member supporting the projection lens and functions as a base capable of supporting the holder member, and an expanding and contracting member disposed between the frame member and the display device, wherein a temperature coefficient for the expansion and contraction of the expanding and contracting member in the direction of the optical axis of the projection lens corresponds to a temperature coefficient for the increase and decrease of the focal distance of the projection lens. | 11-14-2013 |
20140285538 | IMAGE PROCESSING APPARATUS, PROJECTOR, AND IMAGE PROCESSING METHOD - An image processing apparatus includes a signal generation section that generates a drive signal to drive a light attenuation member that attenuates light radiated from a light source based on a difference between first transmittance and second transmittance, the first transmittance being a target value calculated based on image data and the second transmittance being detected based on the position of the light attenuation member, an expansion factor calculation section that calculates an expansion factor based on the first transmittance and the second transmittance, an expansion section that expands the range of the distribution of luminance values in the image data based on the expansion factor calculated by the expansion factor calculation section, and an output section that outputs the image data expanded by the expansion section to a driver that drives a light modulator that modulates light incident thereon. | 09-25-2014 |
Patent application number | Description | Published |
20080210680 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus of which through holes in a mounting stage can be properly sealed. A substrate processing apparatus comprises a plate-like mounting stage having a plurality of first through holes, a base member including a plurality of second through holes that have female thread portions, a plurality of pin-shaped members being passed through and fitted into the first and second through holes and including flange portions, a plurality of sealing surfaces, and a plurality of sealing members disposed such as to enclose openings of the first through holes. One ends of the pin-shaped members project out from the sealing surfaces, and the other ends have male thread portions capable of engaging with female thread portions of the base member. When the base member moves away from the mounting stage, an end of each of the female thread portions comes into abutment with an end of each of the male thread portions. | 09-04-2008 |
20080257494 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus capable of rapidly raising and lowering the processing temperature of a substrate. The substrate processing apparatus has a mounting stage adapted to be mounted with a substrate and to control the processing temperature of the mounted substrate. The mounting stage comprises a temperature control device disposed in a mounting surface of the mounting stage for mounting the substrate thereon, a coolant inflow chamber into which a coolant is flowed, and a heat transmission/insulation switch-over chamber disposed between the temperature control device and the coolant inflow chamber so that a heat-transmitting gas is flowed into and vacuum-exhausted from the heat transmission/insulation switch-over chamber. The temperature control device has therein a gas inflow chamber into which a hot gas is flowed. | 10-23-2008 |
20090049981 | MECHANISM FOR VARYING CYLINDER STOP POSITION AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME - A cylinder stop position varying mechanism is employed in a cylinder having a piston and a shaft. The cylinder stop position varying mechanism includes a stopper fitted onto the shaft; a pair of limiters for stopping a reciprocating movement of the piston by contact with the stopper; and a limiter moving mechanism for varying positions of the limiters. The cylinder is driven by a hydraulic pressure, and the limiter moving mechanism is provided to each of the pair of limiters to control positions of the limiters independently. | 02-26-2009 |
20100140085 | MAGNETRON PLASMA PROCESSING APPARATUS - A magnetron plasma processing apparatus has a baffle plate interposed between a processing space and a gas exhaust port so as to confine a plasma in the processing space in a processing chamber. The baffle plate has through holes allowing the processing space and the gas exhaust port to communicate with each other. The baffle plate is provided along lines of magnetic force of a magnetic field at a position where the plate is located. | 06-10-2010 |
20110000894 | COOLING BLOCK FORMING ELECTRODE - The present invention is a cooling block that forms an electrode for generating a plasma for use in a plasma process, and includes a channel for a cooling liquid, the cooling block comprising: a first base material and a second base material respectively made of aluminum, at least one of the first and second base materials having a recess for forming a channel for a cooling liquid; and a diffusion bonding layer, in which zinc is diffused in aluminum, and an anti-corrosion layer of a zinc oxide film, the layers being formed by interposing zinc between the first and second base materials, and by bonding the first and second base materials with zinc interposed therebetween in a heating atmosphere containing oxygen. | 01-06-2011 |
20120178263 | SUBSTRATE PROCESSING APPARATUS - [Problem] To provide a substrate processing apparatus capable of preventing adherence of hydrogen fluoride to an inner surface the like of a chamber. | 07-12-2012 |
20130168369 | COOLING BLOCK FORMING ELECTRODE - The present invention is a cooling block that forms an electrode for generating a plasma for use in a plasma process, and includes a channel for a cooling liquid, the cooling block comprising: a first base material and a second base material respectively made of aluminum, at least one of the first and second base materials having a recess for forming a channel for a cooling liquid; and a diffusion bonding layer, in which zinc is diffused in aluminum, and an anti-corrosion layer of a zinc oxide film, the layers being formed by interposing zinc between the first and second base materials, and by bonding the first and second base materials with zinc interposed therebetween in a heating atmosphere containing oxygen. | 07-04-2013 |
Patent application number | Description | Published |
20100243166 | GAS FLOW PATH STRUCTURE AND SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes: a depressurizable processing chamber | 09-30-2010 |
20100243167 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes: a cylindrical shaped chamber configured to accommodate a substrate; a movable electrode capable of moving along a central axis of the cylindrical shaped chamber within the cylindrical shaped chamber; a facing electrode facing the movable electrode within the cylindrical shaped chamber; and an expansible/contractible partition wall connecting the movable electrode with an end wall on one side of the cylindrical shaped chamber. In the substrate processing apparatus, a high frequency power is applied to a first space between the movable electrode and the facing electrode, a processing gas is introduced thereto, and the movable electrode is not in contact with a sidewall of the cylindrical shaped chamber. At least one low dielectric member is provided in a second space between the movable electrode and the end wall on one side of the cylindrical shaped chamber. | 09-30-2010 |
20100304505 | PROCESSING METHOD AND STORAGE MEDIUM - There is provided a processing method for performing a recovery process on a damaged layer formed on a surface of a low-k film of a target substrate by introducing a processing gas containing a methyl group into a processing chamber. The method includes: increasing an internal pressure of the processing chamber up to a first pressure lower than a processing pressure for the recovery process by introducing a dilution gas into the processing chamber maintained in a depressurized state; then stopping the introduction of the dilution gas, and increasing the internal pressure of the processing chamber up to a second pressure as the processing pressure for the recovery process by introducing the processing gas into a region where the target substrate exists within the processing chamber; and performing the recovery process on the target substrate while the processing pressure is maintained. | 12-02-2010 |
20110186229 | GAS SHOWER STRUCTURE AND SUBSTRATE PROCESSING APPARATUS | 08-04-2011 |
20110226420 | ELECTRODE AND PLASMA PROCESSING APPARATUS - There is provided a plasma processing apparatus including a processing chamber | 09-22-2011 |
Patent application number | Description | Published |
20100281903 | EVAPORATOR AND COOLING DEVICE - Service life of the compressor is extended. The evaporator is provided with the housing having the suction port connectable to the suction portion of the compressor in order to evaporate at least part of a droplet or misty working fluid in the housing by a suction effect of the compressor through the suction port, comprising a filter installed in the housing, the filter dividing a space in the housing into the first space for generating the droplet or misty working fluid and the second space for communicating with the suction port, the filter being inclined away from the suction port as advancing upward, and the filter transmitting therethrough vapor resulting from evaporation of the droplet or misty working fluid while capturing the droplet or misty working fluid. | 11-11-2010 |
20100293992 | CONDENSER AND COOLING DEVICE - In the condenser provided with two of the degassing chambers separated by a cooling fluid, communication between the degassing chambers is prevented even if a pressure difference is increased between the degassing chambers. The condenser has the housing having the vapor inflow port connectable to the discharge portion of the compressor, the first degassing chamber, in the housing, communicating with the vapor inflow port, and the second degassing chamber, in the housing, arranged above the first degassing chamber across the partition portion, and the passing portion for permitting a cooling fluid to flow from the second degassing chamber to the first degassing chamber, wherein the first degassing chamber is separated from the second degassing chamber by the cooling fluid in the passing portion, and the passing portion has a pressure head space for containing a specified volume of cooling fluid so as to absorb a variation in a pressure difference between the first degassing chamber and the second degassing chamber. | 11-25-2010 |
20110174009 | COMPRESSOR AND REFRIGERATING MACHINE - A compressor and a refrigerating machine which enable an easy disposal of a lubricant, are friendly to the natural environment, and have simple configurations, are provided. | 07-21-2011 |
Patent application number | Description | Published |
20100043975 | MOVABLE GAS INTRODUCTION STRUCTURE AND SUBSTRATE PROCESSING APPARATUS HAVING SAME - In a gas introduction structure that is reciprocatingly movable in a predetermined direction, a processing gas introduction system is configured to introduce a processing gas into a processing chamber in which a substrate is subjected to a predetermined processing under a clean atmosphere; and a processing gas supply line is configured to be connected to the processing gas introduction system and an external processing gas supply source to supply the processing gas from the processing gas supply source to the processing gas introduction system, mutual relative positions of the processing gas supply source and the processing gas introduction system being changed. The processing gas supply line includes: a first bendable portion connected to the processing gas supply source; a second bendable portion connected to the processing gas introduction system; and a non-bendable pipe interposed between the first bendable portion and the second bendable portion. | 02-25-2010 |
20100224325 | PLASMA PROCESSING APPARATUS AND ELECTRODE FOR SAME - A plasma processing apparatus includes a processing chamber in which a target object is processed by a plasma, a first and a second electrode that are provided in the processing chamber to face each other and have a processing space therebetween, and a high frequency power source that is connected to at least one of the first and the second electrode to supply a high frequency power to the processing chamber. And at least one of the first and the second electrode includes a base formed of a plate-shaped dielectric material and a resistor formed of a metal and provided between the base and the plasma. | 09-09-2010 |
20110155322 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a processing chamber in which a target substrate is processed; an application electrode and a facing electrode provided to face each other in the processing chamber, a plasma generation space being formed between the application electrode and the facing electrode; and an RF power supply connected to the application electrode, an RF power being supplied from the RF power supply to the application electrode. At least one of the application electrode and the facing electrode includes a base formed of a metal, and a dielectric body inserted into the base, one or more metal plate electrodes being buried in the dielectric body. | 06-30-2011 |
20110162799 | PLASMA PROCESSING APPARATUS AND ELECTRODE USED THEREIN - A plasma processing apparatus includes a depressurizable processing chamber; an electrode provided in the processing chamber; and a high frequency power supply for supplying a high frequency power into the processing chamber to thereby generating a plasma. Further, the electrode includes a base formed of a dielectric material; a dielectric body buried in the base and formed of the same dielectric material as the base; and a conductive adhesive layer provided in a bonding portion between the base and the dielectric body, the conductive adhesive layer bonding together and fixing the base and the dielectric body to each other. | 07-07-2011 |
Patent application number | Description | Published |
20080300728 | Flow rate control system and shower plate used for partial pressure control system - A partial pressure control system | 12-04-2008 |
20090020228 | PLASMA PROCESSING APPARATUS AND PLASMA GENERATION CHAMBER - A plasma processing apparatus comprises a processing chamber having installed therein a stage upon which a wafer W is placed and a plasma generation chamber communicating with the processing chamber. The plasma generation chamber includes a reaction container having a tubular side wall, a coil wound around the side wall, to which a specific level of high-frequency power is applied, and a film coating covering the outer surface of the side wall. The film coating is a thin film that blocks ultraviolet light originating from the plasma generated inside the reaction container and is constituted of an insulating material with a heat resisting property. | 01-22-2009 |
20090078694 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE STAGE USED THEREIN - The substrate stage according to the present invention stage includes a stage upon which a wafer is placed, a heater element installed within the stage, an upright support that ranges upright from a bottom of a processing chamber and is constituted with a tubular member that includes a small tube portion, a large tube portion and a middle portion present between the small tube portion and the large tube portion, an outer heat shield plate disposed so as to surround the outer side of the small tube portion and an inner heat shield plate disposed so as to close off an inner side of the large tube portion. The outer heat shield plate and the inner heat shield plate are disposed so that an inner edge of the outer heat shield plate and an outer edge of the inner heat shield plate overlap along the entire circumference. | 03-26-2009 |
20090084502 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a barrier wall member disposed between a plasma generation chamber and a processing chamber to separate the plasma generation chamber from the processing chamber. The barrier wall member assumes a fin structure achieved by disposing in a radial pattern numerous plate-like fin members extending from a central area thereof toward a peripheral edge. An upper end portion of each fin member overlaps a lower end portion of an adjacent fin member. The fin members are disposed with gaps formed between them and are made to range upward with a tilt along the circumferential direction. | 04-02-2009 |
20100163179 | Substrate Processing Apparatus - [Problem] To provide a substrate processing apparatus capable of preventing adherence of hydrogen fluoride to an inner surface the like of a chamber. | 07-01-2010 |
20110226421 | PLASMA PROCESSING APPARATUS - An intensity distribution of an electric field of a high frequency power used for generating plasma is controlled by using an electrode made of a homogeneous material and a moving body. There is provided a plasma processing apparatus for introducing a processing gas into an evacuable processing chamber | 09-22-2011 |
Patent application number | Description | Published |
20090067037 | OPTICAL AMPLIFICATION APPARATUS AND OPTICAL COMMUNICATION APPARATUS - An optical amplification apparatus includes an optical amplification medium which has an input end and an output end, and amplifies an optical signal by a predetermined amplification rate; a first light source for launching excited light which excites the optical amplification medium; an isolator connected to the output end of the optical amplification medium; and a second light source for launching idle light which has a predetermined wavelength and is launched into the optical amplification medium from a point between the optical amplification medium and the isolator. The optical amplification medium, the first light source, the isolator, and the second light source are contained in the package of the optical amplification apparatus. The apparatus may further include a set of an optical absorption member for absorbing the idle light and an circulator connected to the input end of the optical amplification medium, or an input-side isolator connected to the input end of the optical amplification medium. | 03-12-2009 |
20100108154 | MATERIAL GAS CONCENTRATION CONTROL SYSTEM - A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration. | 05-06-2010 |
20120250014 | SPECTROPHOTOMETER AND METHOD FOR CALIBRATING THE SAME - The disclosure provides a spectrophotometer, including a light source for irradiating light into a sample gas, a photodetector for detecting light transmitted through the sample gas, an optical filter, and an operation device for calculating a concentration of an actual gas to be measured, contained in the sample gas based on a detection signal value obtained from the photodetector. The operation device calculates the concentration of the actual gas based on function a for associating a concentration of a substitute gas with the actual gas obtained from a reference instrument, function β for associating a relation between a light absorption of the actual gas and the substitute gas in the reference instrument, with a relation between a light absorption of the actual gas the substitute gas in a calibration instrument, and a function indicating a relation between the concentration of the substitute gas and the detection signal value. | 10-04-2012 |
Patent application number | Description | Published |
20100003017 | IMAGING APPARATUS AND METHOD OF STARTING THE SAME - When a power source | 01-07-2010 |
20120047109 | DATA STRUCTURE PRODUCTION METHOD AND BACKUP DEVICE - There is provided a data structure production method for producing a multilevel directory structure in a backup device. The multilevel directory structure includes target data having at least one of video data and audio data. The data structure production method includes producing a first directory that establishes a first directory hierarchy, producing at least one second directory that establishes a second directory hierarchy lower than the first directory hierarchy wherein the target data is stored in the at least one second directory, and storing the at least one second directory in the first directory provided the first directory is less than or equal to a predetermined size. | 02-23-2012 |
20120210077 | RECORDING SYSTEM, RECORDING METHOD AND COMPUTER PROGRAM - A recording system includes a controller configured to write content data on at least first and second storage media, in parallel with each other. If there is a period in which the content data has failed to be written on the first storage medium but has been written successfully on the second storage medium, the controller finds, on the first storage medium, a storage space, of which the size is equal to or greater than that of partial data that is the content data that has been written successfully on the second storage medium during the period, and writes recovery information on one or more storage media other than the first storage medium. The recovery information includes some pieces of information to identify the first storage medium, to specify the storage space, and to define an area on the second storage medium on which the partial data has been written. | 08-16-2012 |
Patent application number | Description | Published |
20090159587 | PLANAR HEATER - A planar heater | 06-25-2009 |
20120247673 | ELECTRODE HAVING GAS DISCHARGE FUNCTION AND PLASMA PROCESSING APPARATUS - An electrode having a gas discharge function, where the degree of freedom related to a maximum gas flow rate is abundant, an electrode cover member may be thinned, and a change of a gas behavior according to time is difficult to be generated in a processing chamber during gas introduction. The electrode includes: a base material having a plurality of gas holes; and an electrode cover member having a plurality of gas holes respectively corresponding to the plurality of gas holes of the base material in a one-to-one manner, fixed to the base material, and disposed facing a processing space in which the object is plasma-processed, wherein a gas hole diameter of the electrode cover member is larger than a gas hole diameter of the base material. | 10-04-2012 |
20130033899 | REFLECTING BASE MATERIAL, BACKLIGHT UNIT, AND METHOD FOR MANUFACTURING REFLECTING BASE MATERIAL - A reflecting base material that can reliably prevent the occurrence of uneven brightness, a backlight unit that uses the same, and a method for manufacturing the same are provided. Surface profile information of the reflecting base material | 02-07-2013 |
20140163967 | VERIFYING THE TERMS OF USE FOR ACCESS TO A SERVICE - Provided are techniques in which a document accompanying a service is acquired, a natural language analysis is performed on the acquired document, a determination is made from the results of the natural language analysis whether an item defined in the access control policy is found in the acquired document and, when the item defined in the access control policy is found in the acquired document, the access control policy is referenced and access to the service controlled accordingly. | 06-12-2014 |
20140289262 | GENERATING AN ORDERED LIST OF MANAGED TARGETS - An apparatus generates an ordered list of managed targets. A list generating hardware unit generates a list of managed targets. A list displaying hardware unit displays, on a display device, the list of managed targets. The list generating hardware unit further acquires, from a predetermined storage device, history information relating to a session for each managed target from the list of managed targets, where the history information includes information for identifying a session executor who executed the session at a session time. The list generating hardware unit is further configured to determine, using acquired history information related to the session for each managed target from the list of managed targets, an order of the managed targets in the list of managed targets according to rules that are set based on a content of managed information for each managed target. | 09-25-2014 |
20140304686 | RESPONDING TO A PROBLEM DURING SOFTWARE TESTING - An apparatus executes and tests software. The apparatus comprises: an execution hardware unit that executes software to be tested; an interface screen control hardware unit that causes a display device to display an interface screen by the software to be tested and receives a user's input operation using the interface screen; and a problem report management hardware unit that manages information on a problem that has occurred during a test of the software, wherein the problem report management hardware unit includes: a selection operation receiving hardware unit that receives a selection of a component part of the interface screen; an input receiving hardware unit that receives a user's input of information; and a report generating hardware unit that generates report information on the component part, based on information on the component part related to the selection received. | 10-09-2014 |
20140330553 | VERIFYING THE TERMS OF USE FOR ACCESS TO A SERVICE - Provided are techniques in which a document accompanying a service is acquired, a natural language analysis is performed on the acquired document, a determination is made from the results of the natural language analysis whether an item defined in the access control policy is found in the acquired document and, when the item defined in the access control policy is found in the acquired document, the access control policy is referenced and access to the service controlled accordingly. | 11-06-2014 |
20150173464 | End Stop, Slide Fastener and Ornamental Fastener - There is provided an end stop. A male member and a female member are configured to sandwich opposing side edge portions of a pair of fastener tapes from both sides thereof in an upward and downward direction. The male member includes a circular disk-shaped male base member and an inserting male portion. The female member includes a circular disk-shaped female base member and a receiving female portion. A facing surface of at least one of the male base portion and the female base portion is provided with a protrusion group. The protrusion group is configured so that a plurality of protrusions protruding to come at least in contact with each fastener tape are arranged to be spaced from each other at predetermined angles over the entire circumference of the facing surface along a circumferential direction thereof | 06-25-2015 |
Patent application number | Description | Published |
20080273153 | LIQUID CRYSTAL PANEL AND LIQUID CRYSTAL DISPLAY APPARATUS - The liquid crystal panel according to an embodiment of the present invention includes, in the stated order from a viewer side: a first polarizer; a first optical compensation layer; a liquid crystal cell; a second optical compensation layer; and a second polarizer, wherein:
| 11-06-2008 |
20080304587 | Ofdm Reception Device - An OFDM reception device detects a time at which impulse noise occurs in a received OFDM signal, and specifies a start position candidate period that does not have intersymbol interference and is estimated to have a guard interval signal in a symbol. When setting a FFT window of an effective symbol length in a symbol duration of each symbol, if the impulse noise occurrence time is included in the symbol, the OFDM reception device determines a start position of the FFT window within a range of the start position candidate period so as to exclude the impulse noise occurrence time as much as possible. | 12-11-2008 |
20150064348 | Method for Manufacturing Optical Film - The invention relates to a method for manufacturing an optical film. The method includes an unwinding step, a cleaning step and an application step. In the unwinding step, a long-band shaped flexible base having a first principal surface and a second principal surface is unwound from a continuous roll, and the base is continuously fed to a downstream side. In the cleaning step, a cleaning liquid is supplied between the second principal surface of the base and a cleaning roll, and the cleaning liquid is applied and spread over the base by the cleaning roll to clean the second principal surface of the base. Thereafter, in the application step, a resin solution is applied onto the first principal surface of the base and then the resin solution is dried. | 03-05-2015 |
Patent application number | Description | Published |
20120073755 | ELECTRODE AND PLASMA PROCESSING APPARATUS - Electric field intensity distribution of a high frequency power for plasma generation can be controlled without generating abnormal electric discharge. There is provided an electrode for a plasma processing apparatus capable of supplying a gas. The electrode may include a base member | 03-29-2012 |
20140069585 | PLASMA ETCHING APPARATUS - Disclosed is a plasma etching apparatus which includes: a base formed of a metal that has a lower expansion coefficient than aluminum; an electrostatic chuck disposed on a mounting surface of the base and configured to mount an object to be processed; a bonding layer which bonds the base to the electrostatic chuck; and a heater provided within the electrostatic chuck. In the plasma etching apparatus, the base is provided with a metal portion that is formed through a cold spraying by using a metal that has a higher thermal conductivity than the metal for forming the base. | 03-13-2014 |
20140202635 | MOUNTING TABLE AND PLASMA PROCESSING APPARATUS - A mounting table includes an electrostatic chuck having a mounting surface and a backside opposite to the mounting surface, a first through hole being formed in the mounting table; a base joined to the backside of the electrostatic chuck and having a second through hole in communication with the first through hole; a lifter pin which is received in a pin hole formed by the first through hole and the second through hole, the lifter pin being movable up and down to protrude beyond and retract below the mounting surface. An upper end portion of the lifter pin has a shape in which a diameter decreases toward a lower end of the lifter pin to correspond to a shape of the upper end portion of the pin hole. The upper end portion of the lifter pin is in surface contact with the upper end portion of the pin hole. | 07-24-2014 |
20150129134 | PLACEMENT TABLE AND PLASMA PROCESSING APPARATUS - A placement table includes: a base; an electrostatic chuck disposed on the base and including a placement surface on which a workpiece is placed; a plurality of heat generating members disposed at a side opposite to the placement surface of the electrostatic chuck; a power supply configured to generate a current for causing each of the plurality of heat generating members to generate heat; a plurality of electric wires installed to extend in a direction crossing the placement surface from the plurality of heat generating members, respectively, and configured to connect the power supply with the heat generating members, respectively; and a filter mounted on each of the plurality of electric wires to remove a high frequency component having a frequency higher than that of the current generated by the power supply. | 05-14-2015 |
20150243541 | ELECTROSTATIC CHUCK, PLACING TABLE, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUFACTURING ELECTROSTATIC CHUCK - Disclosed is an electrostatic chuck configured to hold a processing target object. The electrostatic chuck includes a dielectric substrate and a protective film. The substrate has a surface which is constituted by a bottom face, and a plurality of projecting portions. The plurality of projecting portions is formed to protrude from the bottom face. Each of the projecting portions includes a top face, and a side face. The top face comes in contact with the processing target object, and the side face extends from the bottom face to the top face. The protective film is made of yttrium oxide. The protective film is formed on the side faces of the plurality of projecting portions and the bottom face such that the top faces are exposed. | 08-27-2015 |
Patent application number | Description | Published |
20140116797 | WORK VEHICLE - A wheel loader includes a vehicle frame, an engine, a supporting mechanism, a diesel articulate filtering device, and a connecting pipe. The engine is mounted on the vehicle frame, and the supporting mechanism is fixed to the vehicle frame. The diesel particulate filtering device is mounted on the supporting mechanism above the engine and has an exhaust gas inlet facing the rear. An exhaust upstream side end part of the connecting pipe is coupled to an exhaust part of the engine, and an exhaust downstream side end part of the connecting pipe is connected to an exhaust gas inlet of the diesel particulate filtering device from the rear. The connecting pipe includes an extending part that is disposed below the diesel particulate filtering device and extends rearward of the diesel particulate filtering device from the exhaust upstream side end part, and a flexible pipe part provided in the extending part. | 05-01-2014 |
20140196974 | WHEEL LOADER - A wheel loader includes a vehicle frame, an engine, an operating fluid tank, a stand, a rear support frame, and a base member. The engine is mounted on the vehicle frame. The operating fluid tank is disposed in front of the engine. The stand is fixed to the vehicle frame and supports the operating fluid tank. The rear support frame is disposed facing the stand with the engine interposed there-between and fixed to the vehicle frame. The base member is disposed above the engine and has one end fixed to an upper part of the stand and the other end fixed to an upper part of the rear support frame. A diesel particular filter, a nitrogen oxide reduction catalytic converter, and a connecting pipe are all mounted on the base member with the connecting pipe connecting the diesel particulate filtering device and the nitrogen oxide reduction catalytic converter. | 07-17-2014 |