Patrovsky
Andreas Patrovsky, Freising DE
Patent application number | Description | Published |
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20130335110 | PLANAR CIRCUIT TEST FIXTURE - There is provided a test fixture for testing a planar circuit. The test fixture comprises a body adapted to retain therein the planar circuit and to be connected to test equipment. The body provides a transition between the planar circuit and the test equipment and comprises a base member having a first surface and a fixation member having a second surface and connected to the base member through a first connection allowing movement along a first axis of the fixation member relative to the base member, a spacing defined between the first surface and the second surface for retaining therein an end of the planar circuit, the fixation member movable along the first axis relative to the base member for adjusting the spacing. | 12-19-2013 |
Hubert Patrovsky, St. Dorothec CA
Patent application number | Description | Published |
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20100276353 | Rotary cartridge filter - A rotary filter is provided with greatly expanded filter media area within the flow stream of material to be filtered due to use of a series of cylindrical filter cartridges consisting of a core and cylindrical filter media that are attached to and within a rotary disc, thus providing much greater filter area within the size constraints of the rotary disc and the flow channel. This allows removal of contaminating material in the flow stream. The retaining methods used for these cartridges restrains their movement within the flow stream thus allowing backflushing by reversing flow direction and venting the backflush material. The attachment and construction further allows easy removal and replacement of filter media and cartridges. | 11-04-2010 |
Hubert Patrovsky, St. Eustache CA
Patent application number | Description | Published |
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20080226821 | Metal halide reactor for CVD and method - A reaction vessel (reactor) is shown that, filled with metal and placed either within a CVD type furnace or in a housing in fluid communication with the CVD type furnace can produce commercial quantities of a metal halide gas over extended time periods and multiple furnace runs. The control of temperature and the simplicity of this reaction vessel allows temperature differentials between the metal halide gas produced and the CVD type reactor target thus providing differing deposits. The reactor is noteworthy in that no valves, flow restrictors or other equipment which could create corrosion problems is used in the heated/reactive area of the vessel thus producing very high quality metal halide gas. | 09-18-2008 |
Hubert Patrovsky, Ste-Dorothee CA
Patent application number | Description | Published |
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20110159210 | Metal halide reactor deposition method - The invention utilizes a metal halide generating reactor that permits the temperature of the generation of a metal halide from a gaseous halide compound, a halogen gas, or an interhalogen compound at controlled temperatures distinctly different from controlled temperatures of a deposition furnace where metal layers are deposited by CVD processes upon substrates. The method may be further expanded to provide additional layers or reactions on the surface of the substrates with secondary reactions between reactive gases or between species of a metal halide different from the first deposition. Metal halide gases may for example be generated at successive temperatures and with successive different halogen gases or compounds. | 06-30-2011 |
Hubert Patrovsky, Laval CA
Patent application number | Description | Published |
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20130032523 | Rotary cartridge filter with attachments - A rotary filter is provided with greatly expanded filter media area within the flow stream of material to be filtered due to use of a series of cylindrical filter cartridges consisting of a core and cylindrical filter media that are attached to and within a rotary disc, thus providing much greater filter area within the size constraints of the rotary disc and the flow channel. This allows removal of contaminating material in the flow stream. The retaining methods used for these cartridges restrains their movement within the flow stream thus allowing backflushing by reversing flow direction and venting the backflush material. The attachment and construction further allows easy removal and replacement of filter media and cartridges. | 02-07-2013 |