Patent application number | Description | Published |
20100167681 | INTERFERENCE-ROBUST RECEIVER FOR A WIRELESS COMMUNICATION SYSTEM - An interference-robust receiver includes an RF signal processor, a frequency conversion interface and an analog signal processor. The RF signal processor provides an RF signal. The frequency conversion interface includes a passive mixer for generating an intermediate frequency signal by down-converting an in-band part of the RF signal to a passband of a filter and down-converting an out-of-band part of the RF signal to a stopband of the filter. The filter can thus filter the intermediate frequency signal with the passband and the stopband. | 07-01-2010 |
20100260297 | APPARATUS AND METHOD FOR DETERMINING PHASE DIFFERENCE INFORMATION BETWEEN TWO SIGNALS - An apparatus for determining phase difference information between a first signal and a second signal includes a first detector, a second detector and a counter. The first detector is used for detecting a first value of the first signal, the second detector is used for detecting a second value of the second signal, and the counter is used for counting a timing when the first signal is at the first value and a timing when the second signal is at the second value with a reference clock signal to generate a counter value which serves as a basis of the phase difference information. | 10-14-2010 |
20100279641 | RECEIVER FOR WIRELESS COMMUNICATION SYSTEM - One exemplary receiver for a wireless communication system includes a plurality of signal processing components arranged to generate a receiver output according to a radio frequency (RF) signal. The signal processing components include amplifiers having a class-AB biased amplifier included therein. The signal processing components are disposed in a chip, and the class-AB biased amplifier is an amplifier which processes a signal corresponding to the RF signal before any other amplifier included in the chip. Another exemplary receiver for a wireless communication system includes an RF signal processor and a frequency conversion interface. The RF signal processor is to generate an RF signal, and has a class-AB biased amplifier arranged to apply amplification upon the RF signal. The frequency conversion interface is coupled to the RF signal processor, and used for receiving the RF signal generated from the RF signal processor and generating a down-converted result of the RF signal. | 11-04-2010 |
20110287729 | WIRELESS COMMUNICATION RECEIVER HAVING ONE SIGNAL PROCESSING CIRCUIT WHOSE OPERATION MODE IS ADJUSTED BY MONITORING SIGNAL LEVEL OF SPECIFIC SIGNAL OF PRECEDING SIGNAL PROCESSING CIRCUIT AND RELATED WIRELESS COMMUNICATION METHOD - A wireless communication receiver includes a first signal processing circuit, a second signal processing circuit, and a detecting circuit. The first signal processing circuit generates a first processed signal by processing a received radio frequency (RF) signal. The second signal processing circuit is coupled to the first signal processing circuit. The detecting circuit monitors a specific signal of the first signal processing circuit and generates at least a control signal to the second signal processing circuit in response to a signal level of the monitored specific signal. The control signal controls the second signal processing circuit to switch from a first operation mode to a second operation mode. | 11-24-2011 |
20140335810 | RECEIVER FOR WIRELESS COMMUNICATION SYSTEM - One exemplary receiver for a wireless communication system includes signal processing components arranged to generate a receiver output according to a radio frequency (RF) signal. The signal processing components include amplifiers having a class-AB biased amplifier included therein. The signal processing components are disposed in a chip, and the class-AB biased amplifier is an amplifier which processes a signal corresponding to the RF signal before any other amplifier included in the chip. The class-AB biased amplifier has a first amplifier block, a bias circuit and a second amplifier block. The first amplifier block is arranged to receive an input at the input port and generating a first output. The bias circuit is arranged to bias the first amplifier block for a class-AB operation. The second amplifier block is arranged to generate an output at the output port according to the first output. | 11-13-2014 |
Patent application number | Description | Published |
20160034061 | ORGANIC ELECTROLUMINESCENT TOUCH PANEL - An organic electroluminescent touch panel includes a protection unit, a plurality of touch-sensing units, at least one first anti-interference spot, a substrate, a first electrode layer, an organic layer stack and a second electrode layer. The touch-sensing units are coplanarly disposed on the protection unit. A first interval region is formed between the adjacent touch-sensing units. The first anti-interference spot is disposed within the first interval region. The substrate is disposed corresponding to the protection unit. The first electrode layer is disposed on the substrate, the organic layer stack is disposed on the first electrode layer, and the second electrode layer is disposed on the organic layer stack. The first electrode layer, the organic layer stack and the second electrode layer are disposed within the space formed by the protection unit and the substrate. | 02-04-2016 |
20160034063 | ANTI-INTERFERENCE TOUCH DISPLAY PANEL - An anti-interference touch display panel comprises a color filter substrate, an active matrix transistor substrate, a display functional layer, a plurality of touch-sensing units and at least one first anti-interference spot. The active matrix transistor substrate is disposed corresponding to the color filter substrate. The display functional layer is disposed between the color filter substrate and the active matrix transistor substrate. The touch-sensing units are coplanarly disposed on the color filter substrate, and a first interval region is formed between the adjacent-touch sensing units. The first anti-interference spot is disposed within the first interval region. | 02-04-2016 |
20160034074 | ANTI-INTERFERENCE TOUCH SENSING STRUCTURE - An anti-interference touch sensing structure includes a first substrate, a plurality of touch sensing units and at least a first anti-interference spot. The touch sensing units are coplanarly disposed on the first substrate, and a first interval region is formed between the adjacent touch sensing units. The first anti-interference spot is disposed within the first interval region. | 02-04-2016 |
20160034075 | OPTOELECTRONIC MODULATION STACK - An optoelectronic modulation stack includes a substrate, a plurality of touch sensing units, at least a first anti-interference spot and a nano-structural layer. The touch sensing units are coplanarly disposed on the substrate, and a first interval region is formed between the adjacent touch sensing units. The first anti-interference spot is disposed within the first interval region, and the width of the first anti-interference spot is substantially less than that of the substrate or touch sensing unit. The nano-structural layer is disposed below the first anti-interference spot and includes a plurality of nano structures. When the light passes through the nano structures and the first anti-interference spot, the optical characteristic of the light is changed. | 02-04-2016 |
20160034104 | FLEXIBLE ELECTRONIC STRUCTURE AND MANUFACTURING METHOD THEREOF - A manufacturing method of an anti-interference flexible electronic structure formed by a carrier separation process comprises the steps of: providing a carrier; attaching a flexible substrate to the carrier; forming a plurality of touch-sensing units coplanarly on the flexible substrate, wherein a first interval region is formed between the adjacent touch-sensing units; coplanarly forming at least a first anti-interference spot within the first interval region, wherein a distance is between the first anti-interference spot and the adjacent touch-sensing unit; and separating the flexible substrate from the carrier. | 02-04-2016 |
Patent application number | Description | Published |
20090274123 | METHOD OF CELL MEASUREMENT BASED ON CELL RESELECTION AND MEASURED REPORT IN UMTS CELLULAR SYSTEM - A cell measurement method used in a mobile station camping on a serving cell is provided, wherein the serving cell sends system information of neighbor cells to the mobile station. A first set of the neighbor cells is determined based on a measurement rule for cell reselection. A second set of the neighbor cells is determined based on a report request for radio link establishment. A subset is chosen from the second set. Finally, the neighbor cells of a union of the first set and the subset are measured. | 11-05-2009 |
20090305728 | METHOD FOR ALLOCATING PAGING RESOURCE TO A MOBILE STATION HAVING MULTIPLE SUBSCRIBER IDENTITIES AND RESOURCE ALLOCATING APPARATUS THEREOF - A method for allocating paging resource to a mobile station, communicating with a communication network and having multiple subscriber identities, includes: allocating paging resource to the mobile station according to a first equipment identity and a first subscriber identity of the mobile station when the first equipment identity and the first subscriber identity are received for registration, and allocating the same paging resource to the mobile station when the first equipment identity and a second subscriber identity of the mobile station are received for registration, transmitting a paging message targeting at the first subscriber identity at a paging block with a first block index, and transmitting a paging message targeting at the second subscriber identity at a paging block with the first block index. | 12-10-2009 |
20100075716 | METHODS FOR SHARING MOBILITY STATUS BETWEEN SUBSCRIBER IDENTITY CARDS AND SYSTEMS UTILIZING THE SAME - A method for sharing a mobility status in a mobile station with a first subscriber identity card and a second subscriber identity card is provided. The mobility status indicating the movement extent of the mobile station is obtained by the first subscriber identity card being currently camping on a first cell of a first network operator. Settings corresponding to a mobility-dependent procedure for the second subscriber identity card being currently failure to camp on any second cell of a second network operator are configured, thereby enabling the mobility-dependent procedure to be performed with consideration of the obtained mobility status. | 03-25-2010 |
20120115452 | COMMUNICATION APPARATUSES FOR HANDLING APPARATUS TERMINATED OR ORIGINATED COMMUNICATION REQUESTS WITH INCREASED COMMUNICATION CAPABILITY AND METHODS THEREOF - A communication apparatus has at least one radio transceiver module, a first subscriber identity card with a first address and a second subscriber identity card with a second address. The first subscriber identity card camps on a first cell belonging to a first wireless network via the radio transceiver module, and the second subscriber identity card camps on a second cell belonging to a second wireless network via the radio transceiver module. The communication apparatus includes first processor logic coupled to the radio transceiver module, the first subscriber identity card and the second subscriber identity card, receiving a communication request requesting for establishing wireless communication between the first subscriber identity card and a peer communication entity. | 05-10-2012 |
20130260756 | COMMUNICATION METHOD FOR A MOBILE STATION COMMUNICATING WITH A COMMUNICATION NETWORK, AND ASSOCIATED MOBILE STATION - A communication method for a mobile station communicating with a communication network and an associated mobile station are provided, wherein the mobile station has a first subscriber identity and a second subscriber identity. The method includes: sending a connection setup request for registration of the first subscriber identity; sending a connection setup request for registration of the second subscriber identity; and receiving paging messages targeted at either the first subscriber identity or the second subscriber identity at paging blocks with the same block index. | 10-03-2013 |
Patent application number | Description | Published |
20120236139 | DESTRUCTIVE WEB THICKNESS MEASURING SYSTEM OF MICRODRILLS AND METHOD THEREOF - A destructive web thickness measuring system of microdrills includes a computer device, a dual-axis motion platform module, a drill grinding module, a positioning vision module, and a web thickness measuring vision module. When the computer device controls the dual-axis motion platform module to move a microdrill to a first locating position, the computer device performs a positioning procedure according to a first image captured by the positioning vision module, and then performs a grinding procedure, so that the drill grinding module grinds the microdrill to a sectional position to be inspected. When the ground microdrill moves to an image measuring position, the computer device performs an image computing procedure according to a second image captured by the web thickness measuring vision module, so as to obtain a web thickness value. Therefore, the destructive web thickness measuring system of microdrills can automatically measure the web thickness value. | 09-20-2012 |
20120242827 | AUTOMATED OPTICAL INSPECTION SYSTEM FOR THE RUNOUT TOLERANCE OF CIRCULAR SAW BLADES - An automated optical inspection system for the runout tolerance of circular saw blades comprises a rotating device, a first and a second optical inspection module, and a computing device. The rotating device is used to rotate a circular saw blade. The circular saw blade includes multiple teeth, and each tooth has a side and a back. The first/second optical inspection module is used to capture a side/back image of the tooth. The computing device activates the rotating device to rotate the circular saw blade, and activates the first and the second optical inspection module to capture the side image and the back image of each tooth upon rotation of the circular saw blade. The computing device performs a radial-position-calculating procedure according to the side images, to obtain an amount of radial runout, and performs an axial-position-calculating procedure according to the back images, to obtain an amount of axial runout. | 09-27-2012 |
Patent application number | Description | Published |
20110137281 | Drug delivery device - A drug delivery device mainly has a housing, which can be easily held and operated. The housing has one end formed with an adjustment seat capable of adjusting a range distance, and the other end connected to a gas pressure control source for providing mainstream and substream gas pressures. Disposed in the housing are a drug delivery pressuring tube, an embedded drug-can connecting seat or an external drug-can connecting seat, a replaceable drug-can container and a gas communication tube. According to this design, the minor liquid drug can be controlled, the drug-can can be replaced and the continuous quantitative injection of drug can be made. Also, all damaged or dirty members of the invention may be disassembled, cleaned or replaced. | 06-09-2011 |
20120302960 | DRUG PRESSURING AND DELIVERING SYSTEM WITH INTERNAL QUANTITATIVE PUSHER - A drug pressuring and delivering system has an internal quantitative pusher for providing stable and precise drug delivery, and a drug pressuring and delivering device for introducing a compression gas for pressuring and ejecting a drug into an atomized drug. The quantitative pusher adopts a bidirectional motor for driving a screw rod to rotate forward or reversely to push the push rod forward or backward, such that the drug is delivered through a solenoid and a drug delivering needle in a cylinder drug delivering pipe and then quantitatively delivered to a drug delivery pressuring tube. In addition, an introduced mainstream gas in the drug delivery pressuring tube forms a gas-liquid mixing and pressuring action to achieve the precisely quantitative and uniform atomization high speed ejection function. Also, all members of the invention can be assembled/disassembled, so that the damaged or contaminated members can be detached, cleaned or replaced. | 11-29-2012 |
20150202688 | Metal Particle Manufacturing System - A metal particle manufacturing system includes: a first airtight container, in which a metal film is placed and conveyed; a plasma melting chamber for heating and melting the metal film into ultrafine particle metal; a second airtight container for cooling and suspending the ultrafine particle metal for collection and being taken out; and a circulating conveyor belt for providing conveying channels between the first airtight container, the plasma melting chamber and the second airtight container. Airtight channels are provided to cover between the first airtight container, the plasma melting chamber and the second airtight container. With this implementation, the highly pure ultrafine particle metal with the purity reaching 99.99% can be obtained. | 07-23-2015 |
Patent application number | Description | Published |
20100271765 | BASE AND ELECTRONIC DEVICE USING THE SAME - A base includes an engaging module, a release button and a code lock module. The release button presses the engaging module to release the host. The code lock module includes a cam assembly, a plurality of dials and a retaining assembly. The cam assembly includes cams arranged along an axis. Each of the dials has a recess for containing one of the cams. The retaining assembly includes a lock head and an elastic element. When one of the dials is rotated to separate one of the cams from the recess, the cam assembly pushes the lock head to be fastened to the release button and make the elastic element deform. When the dials are rotated to allow each recess to contain one cam, the cam assembly moves away from the lock head, and the elastic element restores to drive the lock head to be separated from the release button. | 10-28-2010 |
20100309623 | INDUSTRIAL COMPUTER - An industrial computer includes a first casing, a second casing, a storage unit, and a heat dissipation unit. The second casing and the first casing form a closed casing, and outside of the second casing has a containing area. The storage unit is disposed in the closed casing, contacts the second casing, and corresponds to the containing area. The heat dissipation unit is disposed at the containing area. | 12-09-2010 |
20100309624 | INDUSTRIAL COMPUTER - An industrial computer includes a first casing, a second casing, a storage unit, a cover, and a heat dissipation unit. The second casing and the first casing form a closed casing, and the outside of the second casing has a containing area. The storage unit is disposed at the containing area. The cover is removably assembled at the second casing to cover the containing area and contact the storage unit. The heat dissipation unit is disposed at the cover. | 12-09-2010 |
20130015317 | Vibration Isolation Storage ModuleAANM Huang; Ho-ChingAACI Taipei CityAACO TWAAGP Huang; Ho-Ching Taipei City TWAANM Wang; Hui-ChenAACI Taipei CityAACO TWAAGP Wang; Hui-Chen Taipei City TWAANM Tang; Yi-ChunAACI Taipei CityAACO TWAAGP Tang; Yi-Chun Taipei City TW - A vibration isolation storage module used in a computer is disclosed. The vibration isolation storage module includes a storage device, two brackets, a damping-fixing device, and a damping-positioning device. The storage device is disposed on a base of the computer. The two brackets are respectively disposed on two corresponding sides of the storage device. The damping-fixing device has elasticity and is disposed on the brackets to connect the storage device with the bracket and absorbs shock on the storage device with respect to the bracket. The damping-positioning device has elasticity and is disposed on the brackets to connect the bracket with the base and absorbs shock on the bracket with respect to the base. | 01-17-2013 |
20130043367 | Weight Balance Module and Gravity Center Adjustable Storage Device Using the Same - A weight balance module and a gravity center adjustable storage device using the same are provided. The weight balance module is disposed on a bottom face of a storage device and includes a balance plate and at least one balance piece. The balance plate has a plurality of predefined areas. The balance piece is selectively disposed on one of the plurality of the predefined areas. | 02-21-2013 |
Patent application number | Description | Published |
20110217630 | INTENSITY SELECTIVE EXPOSURE PHOTOMASK - An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage. Each of the features of the first and second array includes an opening disposed in an area of attenuating material. | 09-08-2011 |
20120040278 | INTENSITY SELECTIVE EXPOSURE PHOTOMASK - An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage. | 02-16-2012 |
20120072874 | DISSECTION SPLITTING WITH OPTICAL PROXIMITY CORRECTION AND MASK RULE CHECK ENFORCEMENT - The present disclosure provides one embodiment of an integrated circuit (IC) design method. The method includes receiving an IC design layout having a plurality of main features; applying a main feature dissection to the main features of the IC design layout and generating sub-portions of the main features; performing an optical proximity correction (OPC) to the main features; performing a mask rule check (MRC) to a main feature of the IC design layout; and modifying one of the sub-portions of the main feature if the main feature fails the MRC. | 03-22-2012 |
20130155498 | MICROSCOPE APPARATUS FOR PHASE IMAGE ACQUISITION - A microscope apparatus includes a condenser lens to make an illuminating electromagnetic wave relatively homogeneous, a first beam splitter splitting the illuminating electromagnetic wave after the condenser lens, a movable reflector module, a second beam splitter, an objective lens to project the illuminating electromagnetic wave propagating after an object to be observed toward an observing device. The object is loaded between the first beam splitter and the second beam splitter. The microscope apparatus is configured to split the illuminating electromagnetic wave into two paths at the first beam splitter. A first path goes through the first and the second beam splitters, and a second path goes through the movable reflector module to rejoin the first path at the second beam splitter. The microscope apparatus is configured acquire phase images with interferences of the electromagnetic wave from the two paths with at least two distance settings of the movable reflector module. | 06-20-2013 |
20130232454 | OPTICAL PROXIMITY CORRECTION FOR MASK REPAIR - Integrated circuit (IC) methods for optical proximity correction (OPC) modeling and mask repair are described. The methods include use of an optical model that generates a simulated aerial image from an actual aerial image obtained in an optical microscope system. In the OPC modeling methods, OPC according to stage modeling is simulated, and OPC features may be added to a design layout according to the simulating OPC. In the mask repair methods, inverse image rendering is performed on the actual aerial image and diffraction image by applying an optical model that divides an incoherent exposure source into a plurality of coherent sources. | 09-05-2013 |
20130246981 | DISSECTION SPLITTING WITH OPTICAL PROXIMITY CORRECTION TO REDUCE CORNER ROUNDING - The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having an main feature, the main feature including two corners and an edge spanning between the two corners; performing a feature adjustment to the edge; performing a dissection to the edge such that the edge is divided to include two corner segments and one center segment between the two corner segments; performing a first optical proximity correction (OPC) to the main feature for a center target associated with the center segment; thereafter, performing a second OPC to the main feature for two corner targets associated with the corner segments; and thereafter, performing a third OPC to main feature for the center target, resulting in a modified design layout. | 09-19-2013 |
20130275926 | NOVEL METHODOLOGY OF OPTICAL PROXIMITY CORRECTION OPTIMIZATION - A method for performing OPC and evaluating OPC solutions is disclosed. An exemplary method includes receiving a design database corresponding to an IC circuit mask. A first lithography simulation and evaluation is performed on the design database utilizing a first set of performance indexes. A modification is made to the design database based on a result of performing the first lithography simulation and evaluation. A second lithography simulation and evaluation is performed on the design database utilizing a second set of performance indexes to verify the modification. If necessary, the design database is modified again based on a result of the second lithography simulation and evaluation. The modified design database is provided to a mask manufacturer for manufacturing the mask corresponding to the modified design database. | 10-17-2013 |
20130292836 | VIA-FREE INTERCONNECT STRUCTURE WITH SELF-ALIGNED METAL LINE INTERCONNECTIONS - The present disclosure provides a semiconductor device. The semiconductor device includes a first conductive line disposed over a substrate. The first conductive line is located in a first interconnect layer and extends along a first direction. The semiconductor device includes a second conductive line and a third conductive line each extending along a second direction different from the first direction. The second and third conductive lines are located in a second interconnect layer that is different from the first interconnect layer. The second and third conductive lines are separated by a gap that is located over or below the first conductive line. The semiconductor device includes a fourth conductive line electrically coupling the second and third conductive lines together. The fourth conductive line is located in a third interconnect layer that is different from the first interconnect layer and the second interconnect layer. | 11-07-2013 |
20140013287 | FRACTURE AWARE OPC - The present disclosure describes an OPC method of preparing data for forming a mask. The method includes setting a plurality of dissection points at the main feature and further includes setting a target point at the main feature. The method includes arranging the two dissection points crossing the main feature symmetrically each other. The method includes separating two adjacent dissection points at one side of the main feature by a maximum resolution of the mask writer. The method includes dividing the main feature into a plurality of segments using the dissection points. The method includes performing an OPC convergence simulation to a target point. The method includes correcting the segments belonging to an ambit of the target point and further includes correcting the segment shared by two ambits. | 01-09-2014 |
20140109026 | Novel Methodology of Optical Proximity Correction Optimization - A method for performing optical proximity correction (OPC) and evaluating OPC solutions is disclosed. An exemplary method includes receiving a design database corresponding to an IC circuit mask. A first OPC modification to a mask feature of the design database is made by performing a first OPC process. The OPC process includes: dividing the mask feature into child shapes and adjusting an attribute of a child shape based on an edge placement error (EPE) factor. A first lithography simulation is performed utilizing a first set of performance indexes after making the first OPC modification, and a second OPC modification to the mask feature is made based on a result of the first lithography simulation. A second lithography simulation of the mask feature is performed utilizing a second set of performance indexes to verify the first and second OPC modifications, and the design database is provided for manufacturing. | 04-17-2014 |
20140123084 | System and Method for Improving a Lithography Simulation Model - A method of performing initial optical proximity correction (OPC) with a calibrated lithography simulation model. The method includes providing a photomask having an integrated circuit (IC) pattern formed thereon, acquiring an aerial image of the IC pattern formed on the photomask using an optical microscope, and calibrating an optical component of the lithography simulation model based on the aerial image. The method also includes exposing and developing a photoresist layer on a semiconductor wafer using the photomask to form a post-development pattern on the photoresist layer, acquiring a post-development image of the post-development pattern on the photoresist layer, and calibrating the photoresist component of the lithography simulation model based on the post-development image. Further, the method includes performing initial optical proximity correction (OPC) on an IC design layout based on a simulation of the IC design layout by the lithography simulation model including the calibrated optical and photoresist components. | 05-01-2014 |
20140157212 | Distinguishable IC Patterns with Encoded Information - A method of designing an IC design layout having similar patterns filled with a plurality of indistinguishable dummy features, in a way to distinguish all the patterns, and an IC design layout so designed. To distinguish each pattern in the layout, deviations in size and/or position from some predetermined equilibrium values are encoded into a set of selected dummy features in each pattern at the time of creating dummy features during the design stage. By identifying such encoded dummy features and measuring the deviations from image information provided by, for example, a SEM picture of a wafer or photomask, the corresponding pattern can be located in the IC layout. For quicker and easier identification of the encoded dummy features from a given pattern, a set of predetermined anchor dummy features may be used. | 06-05-2014 |
20140170537 | METHOD OF DEFINING AN INTENSITY SELECTIVE EXPOSURE PHOTOMASK - An embodiment of a feed-forward method of determining a photomask pattern is provided. The method includes providing design data associated with an integrated circuit device. A thickness of a coating layer to be used in fabricating the integrated circuit device is predicted based on the design data. This prediction is used to generate a gradating pattern. A photomask is formed having the gradating pattern. | 06-19-2014 |
20150085356 | MICROSCOPE APPARATUS AND METHOD FOR PHASE IMAGE ACQUISITION - A microscope apparatus includes an electromagnetic wave source configured to generate an illuminating electromagnetic wave, a first beam splitter configured to split the illuminating electromagnetic wave into a first component along a first path and a second component along a second path, a movable reflector module configured to adjust a portion of the second path, and a second beam splitter configured to recombine the first component and the second component. An observing device is configured to receive the recombined first component and second component and the microscope apparatus is configured acquire a phase image from the observing device based on positioning of the movable reflector module and representative of an electric field distribution near an object located along the first path between the first beam splitter and the second beam splitter. | 03-26-2015 |
20150143304 | Target Point Generation for Optical Proximity Correction - A method performed by a computer processing system includes receiving a design pattern for an integrated circuit, applying a function to the design pattern to generate a model contour, generating a plurality of Optical Proximity Correction (OPC) target points along the model contour, adjusting the design pattern to create an adjusted pattern, and performing a simulation on the adjusted pattern to create a simulated contour. | 05-21-2015 |
20150161321 | POLYGON-BASED OPTICAL PROXIMITY CORRECTION - Methods and systems for design of integrated circuits including performing OPC are discussed. In one embodiment, design data having a geometric feature is provided. A base feature is formed from the geometric feature, which has a substantially linear edge. A pseudo dissection point is determined on the base feature. Add or trim a polygon from the base feature to form a modified feature. An OPC process is performed on the modified feature to generate an output design. The output design is used to fabricate a semiconductor device on a semiconductor substrate. | 06-11-2015 |