Yuji Harada
Yuji Harada, Toyama JP
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20100264493 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - To provide a semiconductor device which includes a P-type Si substrate, an ESD protection element, and a protected element. The ESD protection element includes a source N-type diffusion region, and a high-concentration P-type diffusion region formed from under the source N-type diffusion region to at least under part of a gate electrode, covering the source N-type diffusion region within the P-type Si substrate, and having a higher P-type impurity concentration than the P-type Si substrate. The protected element includes a drain N-type diffusion region, and a low-concentration P-type diffusion region that is in contact with the drain N-type diffusion region within the P-type Si substrate. The drain electrode of the ESD protection element and the drain electrode of the protected element are connected, and the high-concentration P-type diffusion region | 10-21-2010 |
20110006339 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A lateral hybrid IGBT is provided including: a RESURF region which is an n-type dopant layer formed in a surface portion of a substrate | 01-13-2011 |
Yuji Harada, Joetsui-Shi JP
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20090208867 | Resist Composition, Resist Protective Coating Composition, and Patterning Process - A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant and a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected is useful as an additive to a photoresist composition and as a protective coating material for immersion lithography. When processed by immersion lithography, the resist composition and protective coating composition exhibit good water repellency and water slip and produce few development defects. | 08-20-2009 |
Yuji Harada, Niigata JP
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20090197200 | Resist top coat composition and patterning process - The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion photolithography. The present invention provides a resist top coat composition for forming a top coat on a photoresist film, wherein the resist top coat composition comprises, at least: a polymer I including a repeating unit a represented by the following general formula (1); and a polymer II including repeating unit having a sulfonic acid or an amine salt of a sulfonic acid: | 08-06-2009 |
Yuji Harada, Jyoetsu JP
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20110305979 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS - The invention provides a resist top coat composition wherein the composition contains polymer (P1-1) with a weight-average molecular weight of 1,000 to 500,000, having at least repeating units represented by the following general formulae (1a), (1b-1), and (1c). There can be a resist top coat composition having excellent water repellent and water sliding properties with fewer development defects and with a good resist pattern profile after development, and a patterning process using this composition. | 12-15-2011 |
20120214100 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME - There is disclosed a resist composition, wherein the composition is used in a lithography and comprises at least: a polymer (A) that becomes a base resin whose alkaline-solubility changes by an acid, a photo acid generator (B) generating a sulfonic acid represented by the following general formula (1) by responding to a high energy beam, and a polymer additive (C) represented by the following general formula (2). There can be provided a resist composition showing not only excellent lithography properties but also a high receding contact angle, and in addition, being capable of suppressing a blob defect in both the immersion exposures using and not using a top coat; and a patterning process using the same. | 08-23-2012 |
Yuji Harada, Akashi-Shi JP
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20140353340 | DIE CASTING MACHINE AND CONTROL METHOD OF DIE CASTING MACHINE - The damage to devices are avoided, by performing operation control of a hydraulic operating means and an electric servomotor, that are adapted as drive sources in an injection step, separately and not performing coordinate control. A die casting machine | 12-04-2014 |
Yuji Harada, Higashihiroshima-Shi JP
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20150144093 | CONTROL DEVICE FOR DIRECT INJECTION GASOLINE ENGINES - A control device for direct injection gasoline engines includes a fuel injection control part (engine control device) composed to control a fuel injection aspect of an injector. The fuel injection control part changes an injection mode of the injector by changing the lift amount of the injector and the injection interval of the fuel respectively. The fuel injection control part switches between a first injection mode, which includes multiple times of the fuel injection with the small lift amount of the injector and the small interval of the fuel injection, and a second injection mode, which includes multiple times of the fuel injection with the bigger lift amount of the injector and the larger interval of the fuel injection than those of the first injection mode, according to an operating state of the engine body. | 05-28-2015 |
20150211431 | CONTROL DEVICE OF GASOLINE DIRECT-INJECTION ENGINE - A control device of a gasoline direct-injection engine is provided. The control device includes an engine body, an injector, and a controller. Within a high load operating range, the controller causes the injector to perform a pre-injection and a post injection. In the pre-injection, the fuel is injected to cause a fuel concentration within an in-cylinder radially peripheral section to be higher than a fuel concentration within an in-cylinder radially central section at a timing for the fuel to ignite. In the post injection, the fuel is injected to cause the fuel concentration within the radially central section to be higher than the fuel concentration within the radially peripheral section at a timing for the fuel to ignite. The timing for the fuel injected in the post injection to ignite is after an oxidative reaction of the fuel injected in the pre-injection occurs and after a compression top dead center. | 07-30-2015 |
Yuji Harada, Tokyo JP
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20150221400 | SHAFT SEALING STRUCTURE AND REACTOR COOLANT PUMP - The shaft sealing structure includes a seal ring that has abutment portions formed by dividing the seal ring along the axial direction and that is provided around a main shaft in a ring-like manner; a support member that is provided in the seal ring along the circumferential direction of the main shaft; and a thermoswitch that is connected to the support member between the abutment portions and that presses the support member toward the center of the main shaft when the temperature rises to a temperature higher than that during normal operation, in which the seal ring is fixed at a position separated from the main shaft during the normal operation and is moved by the support member toward the center of the main shaft when the temperature rises to a temperature higher than that during the normal operation. | 08-06-2015 |