Patent application number | Description | Published |
20100135123 | ACOUSTIC SENSOR ELEMENT - A micromechanical acoustic sensor element, which has at least one diaphragm and at least one fixed counter element, the diaphragm being situated in a cavity between a substrate and the counter element and acting as movable electrode of a capacitor system, the counter element acting as first fixed counter electrode of this capacitor system, and at least one through hole being formed in the substrate for the application of sound pressure to the diaphragm. For fixation and strengthening purposes, the counter element is connected to the substrate via at least one support element. The support element is situated in the region of the cavity, and an opening is formed in the diaphragm for the support element. | 06-03-2010 |
20110001200 | MICROMECHANICAL COMPONENT AND METHOD FOR THE MANUFACTURE THEREOF - A method for manufacturing a micromechanical component and the micromechanical component produced thereby. This component is preferably a diaphragm or a diaphragm layer which is independently produced for the purpose of subsequent assembly with other components. | 01-06-2011 |
20110002359 | SENSOR AND METHOD FOR PRODUCING THE SAME - A sensor, in particular for the spatially resolved detection, includes a substrate, at least one micropatterned sensor element having an electric characteristic whose value varies as a function of the temperature, and at least one diaphragm above a cavity, the sensor element being disposed on the underside of the at least one diaphragm, and the sensor element being contacted via connecting lines, which extend within, on top of or underneath the diaphragm. In particular, a plurality of sensor elements may be formed as diode pixels within a monocrystalline layer formed by epitaxy. Suspension springs, which accommodate the individual sensor elements in elastic and insulating fashion, may be formed within the diaphragm. | 01-06-2011 |
20110079081 | Manufacturing method for a micromechanical component and micromechanical component - A manufacturing method for a micromechanical component having the following steps: at least partially covering a first side of a substrate using a first insulating layer, forming at least one actuator plate electrode, at least one contact terminal, and at least one spring component from at least one first conductive material, covering at least the at least one actuator plate electrode, the at least one contact terminal, and the at least one spring component using a second insulating layer, forming at least one stator plate electrode from at least one second conductive material, forming at least one first trench in the substrate for producing a displaceable mass and a frame of a mounting, etching being performed in a first direction, and removing at least one partial mass of the second insulating layer, which is between the at least one actuator plate electrode and the at least one stator plate electrode, etching being performed in a second direction. Also described is a related micromechanical component. | 04-07-2011 |
20110198713 | MICROMECHANICAL COMPONENT HAVING A REAR VOLUME - In a method for manufacturing a micromechanical component, a cavity is produced in the substrate from an opening at the rear of a monocrystalline semiconductor substrate. The etching process used for this purpose and the monocrystalline semiconductor substrate used are controlled in such a way that a largely rectangular cavity is formed. | 08-18-2011 |
20120038065 | Method for Producing an Electrical Circuit and Electrical Circuit - A method for producing an electrical circuit having at least one semiconductor chip is disclosed. The method includes forming a wiring layer at a contact side of the at least one semiconductor chip, which is encapsulated with a potting compound apart from the contact side. The wiring layer has at least one conductor loop for the purpose of forming an electrical coil. | 02-16-2012 |
20120061860 | Method for Constructing an Electrical Circuit, and Electrical Circuit - A method for constructing an electrical circuit that includes at least one semiconductor chip encapsulated with a potting compound is disclosed. The method includes applying a galvanic layer arrangement for forming an electrochemical element on an element of the electrical circuit including the at least one semiconductor chip. | 03-15-2012 |
20120091545 | SEMICONDUCTOR COMPONENT HAVING A MICROMECHANICAL MICROPHONE STRUCTURE - A simple and cost-effective form of implementing a semiconductor component having a micromechanical microphone structure, including an acoustically active diaphragm as a deflectable electrode of a microphone capacitor, a stationary, acoustically permeable counterelement as a counter electrode of the microphone capacitor, and means for applying a charging voltage between the deflectable electrode and the counter electrode of the microphone capacitor. In order to not impair the functionality of this semiconductor component, even during overload situations in which contact occurs between the diaphragm and the counter electrode, the deflectable electrode and the counter electrode of the microphone capacitor are counter-doped, at least in places, so that they form a diode in the event of contact. In addition, the polarity of the charging voltage between the deflectable electrode and the counter electrode is such that the diode is switched in the blocking direction. | 04-19-2012 |
20120126346 | METHOD FOR CREATING A MICROMECHANICAL MEMBRANE STRUCTURE AND MEMS COMPONENT - In a method for manufacturing a micromechanical membrane structure, a doped area is created in the front side of a silicon substrate, the depth of which doped area corresponds to the intended membrane thickness, and the lateral extent of which doped area covers at least the intended membrane surface area. In addition, in a DRIE (deep reactive ion etching) process applied to the back side of the silicon substrate, a cavity is created beneath the doped area, which DRIE process is aborted before the cavity reaches the doped area. The cavity is then deepened in a KOH etching process in which the doped substrate area functions as an etch stop, so that the doped substrate area remains as a basic membrane over the cavity. | 05-24-2012 |
20130241012 | EUTECTIC BONDING OF THIN CHIPS ON A CARRIER SUBSTRATE - A method for producing a semiconductor component ( | 09-19-2013 |