Shih-Che
Shih-Che Chen, Taipei TW
Patent application number | Description | Published |
---|---|---|
20100259618 | Digital Peephole Viewer Device - The present invention discloses a digital peephole viewer device, which integrates with a door lens assembly on a door board to acquire optical images captured by the door lens assembly, converts the optical images into digital images, and then presents the digital images. The digital peephole viewer device of the present invention comprises a housing, an image capture unit, a signal processing unit, a display unit and a connection means. The image capture unit has a first lens to receive the optical images captured by the door lens assembly. The signal processing unit converts the optical images into continuous dynamic digital images. The display unit presents the continuous dynamic digital images. The connection means integrates the housing with the door lens assembly. | 10-14-2010 |
Shih-Che Chien, New Taipei TW
Patent application number | Description | Published |
---|---|---|
20160090646 | COATED ARTICLE, METHOD FOR MAKING THE SAME AND ELECTRONIC DEVICE USING THE SAME - A coated article includes a glass substrate and a film on at least one surface of the glass substrate. The film includes Al | 03-31-2016 |
Shih-Che Huang, Pflugerville, TX US
Patent application number | Description | Published |
---|---|---|
20120169763 | Preprocessing a Current Frame According to Next Frames - Methods and systems for displaying frames, including being provided with current-frame values to be displayed on a display, the display comprising one or more response parameters, being provided with one or more next-frame values, the one or more next-frame values to be displayed on the display sequentially after the current frame values, and adjusting the current-frame values according to the one or more next-frame values and the one or more response parameters. | 07-05-2012 |
Shih-Che Huang, New Taipei City TW
Patent application number | Description | Published |
---|---|---|
20130328069 | ACTIVE DEVICE, DRIVING CIRCUIT STRUCTURE, AND DISPLAY PANEL - An active device, a driving circuit structure, and a display panel are provided. The active device includes a gate, a gate insulation layer covering the gate, a semiconductor layer disposed above the gate, an etching stop layer disposed on the gate insulation layer and the semiconductor layer, a source, and a drain. The gate forms a meandering pattern on a substrate. The semiconductor layer has an area substantially defining a device region where the active device is. The etching stop layer has a first contact opening and a second contact opening. The first contact opening and the second contact opening separated from each other and both exposing the semiconductor layer. The source and the drain separated from each other are disposed on the etching stop layer and in contact with the semiconductor layer through the first contact opening and the second contact opening, respectively. | 12-12-2013 |
Shih-Che Lin, Toufen Township TW
Patent application number | Description | Published |
---|---|---|
20130341686 | Semiconductor Devices, Transistors, and Methods of Manufacture Thereof - Semiconductor devices, transistors, and methods of manufacture thereof are disclosed. In one embodiment, a semiconductor device includes a gate dielectric disposed over a workpiece, a gate disposed over the gate dielectric, and a spacer disposed over sidewalls of the gate and the gate dielectric. A source region is disposed proximate the spacer on a first side of the gate, and a drain region is disposed proximate the spacer on a second side of the gate. A metal layer is disposed over the source region and the drain region. The metal layer extends beneath the spacers by about 25% or greater than a width of the spacers. | 12-26-2013 |
20150061035 | Semiconductor Devices, Transistors, and Methods of Manufacture Thereof - Semiconductor devices, transistors, and methods of manufacture thereof are disclosed. In one embodiment, a semiconductor device includes a gate dielectric disposed over a workpiece, a gate disposed over the gate dielectric, and a spacer disposed over sidewalls of the gate and the gate dielectric. A source region is disposed proximate the spacer on a first side of the gate, and a drain region is disposed proximate the spacer on a second side of the gate. A metal layer is disposed over the source region and the drain region. The metal layer extends beneath the spacers by about 25% or greater than a width of the spacers. | 03-05-2015 |