Patent application number | Description | Published |
20120308023 | ACTIVE NOISE CONTROL SYSTEM FOR EXHAUST SYSTEMS AND METHOD FOR CONTROLLING THE SAME - An active noise control system for exhaust systems of a combustion engine operated vehicle comprises an anti-sound control connectable to an engine control of the vehicle and a loudspeaker connected to the control for receiving control signals and designed for generating an anti-sound in a sound generator, fluidically connectable to the exhaust system. In the control, at least two curves are stored in order to cancel airborne sound conducted in the exhaust system through outputting the signal to the loudspeaker. The curves cover different temperature ranges of the exhaust gas, which temperature ranges overlap one another by pairs or directly adjoin one another. The control is furthermore designed to select a curve suitable for a respective temperature of the exhaust gas conducted in the exhaust system from the available curves by means of signals output by the engine control and output signals to the loudspeaker making use of this curve. | 12-06-2012 |
20130013147 | ANTI-SOUND SYSTEM FOR EXHAUST SYSTEMS AND METHOD FOR CONTROLLING THE SAME - Based on sound measured in the interior of an exhaust system components of an ideal control signal are calculated, the components comprising sine wave oscillations comprising amplitudes phase-shifted by 90° relative to each other. From the amplitudes, an overall amplitude is calculated. If the overall amplitude is greater than a reference amplitude, calculating a correction factor from the reference amplitude and the overall amplitude, weighting the amplitudes with the correction factor to obtain weighted amplitudes, and forming the sum of the products of the weighted amplitudes with the associated sine wave oscillations and outputting the sum as control signal to a loudspeaker, follows. Otherwise, if the overall amplitude is smaller or equal to the reference amplitude, forming the sum of the products of the amplitudes of the ideal control signal with the associated sine wave oscillations and outputting the sum as control signal to the loudspeaker, follows. | 01-10-2013 |
Patent application number | Description | Published |
20080252876 | System for Measuring the Image Quality of an Optical Imaging System - A measuring system ( | 10-16-2008 |
20080252888 | APPARATUS FOR POLARIZATION-SPECIFIC EXAMINATION, OPTICAL IMAGING SYSTEM, AND CALIBRATION METHOD - A device for polarization-specific examination of an optical system having a detector part that has polarization detector means for recording the exit state of polarization of radiation emerging from the optical system. Also, an associated optical imaging system, and a calibration method for the device. The device includes a polarization detector with a polarizing grating structure. Provided as an alternative is a device for snapshot polarimetry having a birefringent element and downstream polarizer element that adequately polarizes nonquasi-parallel radiation. The device may be used for determining the influence on the state of polarization of UV radiation by a microlithographic projection objective. | 10-16-2008 |
20090040498 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus and method are provided. In some embodiments, a microlithographic projection exposure apparatus includes a light source to generate pulsed light, an illumination device, a projection objective, and at least one photoelastic modulator between the pulsed light source and the illumination device. The illumination device is configured to illuminate an object plane of the projection objective. The projection object projects an image of an object in the object plane of the projection objective to the image plane of the projection objective. | 02-12-2009 |
20100315651 | SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM - A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy. | 12-16-2010 |
20110063597 | OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD - An optical system for a microlithographic projection exposure apparatus, and a microlithographic exposure method are disclosed. An optical system for a microlithographic projection exposure apparatus includes an illumination device, which has a mirror arrangement having a plurality of mirror elements which are adjustable independently of one another for altering an angular distribution of the light reflected by the mirror arrangement, and at least one polarization state altering device like, e.g., a photoelastic modulator. | 03-17-2011 |
20110255065 | METHOD AND APPARATUS FOR MODIFYING A SUBSTRATE SURFACE OF A PHOTOLITHOGRAPHIC MASK - Disclosed is a method of modifying of a surface of a substrate of a photolithographic mask for extreme ultraviolet radiation comprising the step of focusing femtosecond light pulses of a laser system onto the substrate so that a plurality of color centers is generated inside the substrate, wherein the color centers are distributed to cause a modification of the substrate surface. | 10-20-2011 |
20130021592 | ARRANGEMENT FOR AND METHOD OF CHARACTERISING THE POLARISATION PROPERTIES OF AN OPTICAL SYSTEM - An arrangement for and a method of characterising the polarisation properties of an optical system, in particular an optical system of a microlithographic projection exposure apparatus. The arrangement includes at least one polarisation state generator ( | 01-24-2013 |
20130209926 | CONTROLLABLE TRANSMISSION AND PHASE COMPENSATION OF TRANSPARENT MATERIAL - A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate. | 08-15-2013 |
20130293869 | SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM - Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light. | 11-07-2013 |
20140347646 | METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPTICAL SYSTEM - The invention relates to a method for compensating at least one defect of an optical system which comprises introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated. | 11-27-2014 |
20140347654 | SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM - Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light. | 11-27-2014 |
Patent application number | Description | Published |
20100227952 | FLAME-PROOFED POLYMER MATERIAL - The invention relates to a polymer material comprising a halogen-free flame-proofing agent incorporated into the polymer matrix, the flame-proofing agent comprising at least ammonium polyphosphate(s) and/or derivatives thereof and an oligomer or polymer 1,3,5-triazine derivative or mixtures of a plurality thereof and at least one compound selected from phosphates, pyrophosphates, polyphosphates, organic and inorganic phosphonates, organic and inorganic phosphinates, stannates, molybdates or borates of the elements of the main groups II, III, IV or of the sub-group elements Fe, Zn, Ti, Mn, Zr, Mo, pre-condensed melamine derivatives, melamine salts and addition compounds, ethylene diamine phosphate, piperazine phosphate, piperazine polyphosphate, 1,3,5-trihydroxyethyl isocyanurate, 1,3,5-triglycidyl isocyanurate and triallyl isocyanurate. The weight ratio of constituents A to constituents B is 10:1 to 1:1, constituents A and B together amounting to between 60 and 99 wt. % and constituents C and D to between 1 and 40 wt. % of the total weight of constituents A, B, C and D. The polymer material is a thermoplastic elastomer (TPE). | 09-09-2010 |
20100298474 | HALOGEN-FREE FLAME-PROOFING AGENT - Halogen-free flame retardant for incorporation into a polymer matrix, wherein the flame retardant contains at least ammonium polyphosphate(s) and/or derivatives thereof and an oligomeric or polymeric 1,3,5-triazine derivative or mixtures of several thereof and at least one compound selected from monozinc phosphate, zinc borate, trizinc phosphate, zinc pyrophosphate, zinc polyphosphate, zinc hydroxystannate, zinc stannate, boron phosphate, monoaluminium phosphate, trialuminium phosphate, aluminium metaphosphate and mixtures thereof, precondensed melamine derivatives, melamine salts and adducts, ethylenediamine phosphate, piperazine phosphate, piperazine polyphosphate, 1,3,5-trihydroxyethyl isocyanurate, 1,3,5-triglycidyl isocyanurate and triallyl isocyanurate. | 11-25-2010 |