Patent application number | Description | Published |
20130195930 | Inulin and Inulin Acetate Formulations - The disclosure provides compositions that include microparticles or nanoparticles of beta inulin or inulin acetate and an active agent, where the active agent is contained within individual microparticles or nanoparticles. The active agent can be, for example, a vaccinating antigen, an antigenic peptide sequence, or an immunoglobulin. The compositions can be incorporated into various formulations for administration to a subject such as a human or animal. The invention further provides methods of using the compositions and formulations, including methods of stimulating an immune response in a subject, or enhancing an immune response in a subject, for the purpose of treating, preventing, or inhibiting an infectious disease, autoimmune disease, immunodeficiency disorder, neoplastic disease, degenerative disease, an aging disease, or a combination thereof. | 08-01-2013 |
20140271530 | CURCUMINOID COMPLEXES WITH ENHANCED STABILITY, SOLUBILITY AND/OR BIOAVAILABILITY - Methods and materials relating to a medicament preparation comprising a curcuminoid component and a eudragit component provided as a curcuminoid-eudragit complex, which enhance the bioavailability of the curcumin component and are useful for the treatment of various diseases including cancer, neurodegeneration, inflammation, and immunodeficiency. In some aspects, the curcuminoid component comprises curcumin to prepare a curcumin-eudragit complex and a medicament comprising curcumin-eudragit complexes. | 09-18-2014 |
Patent application number | Description | Published |
20080269022 | EXERCISING MACHINE WITH ADJUSTABLE STRIDE LENGTH AND HEIGHT - An exercising machine includes a base frame, a rotary member, left and right rocker link units, left and right cross links, and front and rear coupling units. The rotary member is mounted rotatably on the base frame. The left and right rocker link units are coupled pivotably to the base frame. The front coupling unit couples pivotably the rotary member to a selected one of engaging segments of each of the left and right cross link units to thereby permit adjustment of stride height. The rear coupling unit couples pivotably each of the left and right cross links to a selected one of engaging segments of each of the left and right rocker link units to thereby permit adjustment of stride length. | 10-30-2008 |
20080274860 | EXERCISING MACHINE WITH ADJUSTABLE STRIDE LENGTH AND HEIGHT - An exercising machine includes a base frame, a rotary member, left and right rocker link units, left and right foot pedals, left and right cross links, and left and right coupling units. The rotary member is mounted rotatably on the base frame. Each of the left and right rocker link units is coupled pivotably to the base frame. The left and right foot pedals are coupled pivotably and respectively to the left and right rocker link units. Each of the left and right cross links has a length that is adjustable, is coupled pivotably to the rotary member, and is coupled pivotably to a respective one of the left and right rocker link units. | 11-06-2008 |
20100029445 | Exercising Device - An exercising device includes a front frame, a resistance flywheel mounted rotatably on the front frame, a drive wheel connected drivingly to the resistance flywheel, a crank wheel, a shaft connected rotatably to the front frame and extending centrally through the drive wheel and eccentrically through the crank wheel for co-rotating the drive wheel and the crank wheel, two pedal units connected respectively to left and right ends of the shaft, a handle assembly mounted on top of the front frame, a rear frame extending rearwardly from the front frame, a slide seat mounted slidably on the rear frame, a chair supported on the slide seat, and a link mechanism connected to and disposed between the slide seat and the crank wheel. The link mechanism is driven by the crank wheels as to move forward and rearward the slide seat. | 02-04-2010 |
20120077645 | EXERCISING DEVICE - An exercising device includes left and right linking units each having a swing link pivotally mounted on a front support of a frame, a crank link coupling a crank arm to the swing link, and a pedal link connected to a lower end of the swing link, and left and right foot engaging pedals each mounted on a rear linkage end of the pedal link to be movable along an elliptical path with rotation of the crank arms. A sloping ramp member has an inclined surface to guide the foot engaging pedals to simulate stair climbing during the elliptical movement of the foot engaging pedals through left and right rollable anti-friction members mounted under the foot engaging pedals and rollably engaged with the inclined surface. | 03-29-2012 |
20120088635 | Elliptical Exercise Apparatus - An elliptical exercise apparatus includes a frame unit having a base frame, two crank arms, and two link units disposed respectively on left and right sides of the frame unit and each including a pedal rod connected pivotally to one of the crank arms. An adjustment unit includes a motor mounted on the frame unit, a threaded rod connected drivenly to the motor, a pull unit connected pivotally to the frame unit and connected drivenly to the threaded rod, and two roller sets connected pivotally to and disposed respectively on left and right sides of the pull unit. Each roller set is disposed in rolling contact with the pedal rod of a respective link unit. The roller sets are limitedly movable toward or away from an axis of rotation of the crank arms by a pulling action of the pull unit. | 04-12-2012 |
20120088636 | Elliptical Exercise Apparatus - An elliptical exercise apparatus includes a frame unit having a base frame and an upstanding frame, two crank arms, and an adjustment unit including a motor, a slide mounted movably on the upstanding frame, and a threaded rod connected threadedly to the slide and connected drivenly to the motor. Two swing units are disposed respectively on left and right sides of the frame unit and each includes a handle movable along with the slide, a link rod connected pivotally between an intermediate portion of the handle and one of the crank arms, a pivot arm connected pivotally to the link rod, and a pedal rod connected pivotally between a lower connecting portion of the handle and the pivot arm. The slide moves upwardly or downwardly along the upstanding frame when the motor is activated to adjust the position of the handle relative to the upstanding frame. | 04-12-2012 |
20130225377 | Stretching Exercise Apparatus - A stretching exercise apparatus includes a first leg frame, a second leg frame oppositely spaced apart from the first leg frame, a seat frame connected transversely to the first and second leg frames, a leg lift frame pivoted to the first leg frame, an upright bar extending upwardly from and connected foldably to a top end of the first leg frame, and an elastic cord unit extending through the upright bar and the first leg frame and having one end connected to the leg lift frame and another end extending outwardly of the upright bar. | 08-29-2013 |
Patent application number | Description | Published |
20130308628 | NAT TRAVERSAL FOR VOIP - A method of communication between users' electronic communication devices connected to a network via NAT devices, comprising: sending a call request to a signaling server, locating a relay server IP address, sending the call request and the relay server IP address to the receiving device, sending the relay server IP address to the calling device, starting communication via the relay server and following said communication start: identifying and reporting by the devices' public and private addresses, establishing connectivity between the devices and continuing the communication in a peer-to-peer mode. | 11-21-2013 |
20140307543 | VOIP BANDWIDTH MANAGEMENT - A computerized method of optimizing audio quality in a voice stream between a sender and a receiver VoIP applications, comprising: defining by the receiver time intervals; determining by the receiver at the end of each time interval whether congestion exists, by calculating (i) one-way-delay and (ii) trend, using double-exponential smoothing; estimating by the receiver a bandwidth available to the sender based on said calculation; sending said estimated bandwidth by the receiver to the sender; and using by the sender said bandwidth estimate as maximum allowed send rate. | 10-16-2014 |
20150373060 | Using Smart TV Capabilities to Enhance Audio/Video Call - A method of using capabilities of a smart TV to enhance an audio and/or video call, including discovering by a first smartphone a near smart TV; establishing communication between the first smartphone and the smart TV; checking by the first smartphone the smart TV's capabilities; and using the smart TV capabilities to enhance a call between the first smartphone and a second smartphone or to enhance an application running on the first smartphone. | 12-24-2015 |
Patent application number | Description | Published |
20110263320 | AMUSEMENT DEVICES AND GAMES INVOLVING PROGRESSIVE JACKPOTS - Various embodiments of a successive choice game including methods and apparatus are described. Further embodiments are disclosed. | 10-27-2011 |
20120046110 | MULTI-PROCESS COMMUNICATION REGARDING GAMING INFORMATION - Various embodiments that may generally relate to mobile gaming, location determination, mobile devices, authentication, and so on are described. Various methods are described. Various apparatus are described. Further embodiments are described. | 02-23-2012 |
20120058826 | MULTI-PROCESS COMMUNICATION REGARDING GAMING INFORMATION - Various embodiments that may generally relate to mobile gaming, location determination, mobile devices, authentication, and so on are described. Various methods are described. Various apparatus are described. Further embodiments are described. | 03-08-2012 |
20150238857 | MULTI-PROCESS COMMUNICATION REGARDING GAMING INFORMATION - Various embodiments that may generally relate to mobile gaming, location determination, mobile devices, authentication, and so on are described. Various methods are described. Various apparatus are described. Further embodiments are described. | 08-27-2015 |
Patent application number | Description | Published |
20100248398 | E-CHUCK FOR AUTOMATED CLAMPED FORCE ADJUSTMENT AND CALIBRATION - The present disclosure provides a semiconductor manufacturing method. The method includes performing a first process to a wafer; measuring the wafer for wafer data after the first process; securing the wafer on an E-chuck in a processing chamber; collecting sensor data from a sensor embedded in the E-chuck; adjusting clamping forces to the E-chuck based on the wafer data and the sensor data; and thereafter performing a second process to the wafer secured on the E-chuck in the processing chamber. | 09-30-2010 |
20100250172 | SYSTEM AND METHOD FOR IMPLEMENTING WAFER ACCEPTANCE TEST ("WAT") ADVANCED PROCESS CONTROL ("APC") WITH ROUTING MODEL - System and method for implementing wafer acceptance test (“WAT”) advanced process control (“APC”) are described. In one embodiment, the method comprises performing an inter-metal (“IM”) WAT on a plurality of processed wafer lots; selecting a subset of the plurality of wafer lots using a lot sampling process; and selecting a sample wafer group using the wafer lot subset, wherein IM WAT is performed on wafers of the sample wafer group to obtain IM WAT data therefore. The method further comprises estimating final WAT data for all wafers in the processed wafer lots from IM WAT data obtained for the sample wafer group and providing the estimated final WAT data to a WAT APC process for controlling processes. | 09-30-2010 |
20100268367 | METHOD FOR BIN-BASED CONTROL - A method for providing bin-based control when manufacturing integrated circuit devices is disclosed. The method comprises performing a plurality of processes on a plurality of wafer lots; determining a required bin quantity, an actual bin quantity, and a projected bin quantity; comparing the determined required bin quantity with the determined actual bin quantity and determined projected bin quantity; and modifying at least one of the plurality of processes on the plurality of wafer lots if the determined actual bin quantity and determined projected bin quantity fail to satisfy the determined required bin quantity. | 10-21-2010 |
20100292824 | SYSTEM AND METHOD FOR IMPLEMENTING A WAFER ACCEPTANCE TEST ("WAT") ADVANCED PROCESS CONTROL ("APC") WITH NOVEL SAMPLING POLICY AND ARCHITECTURE - System and method for implementing wafer acceptance test (“WAT”) advanced process control (“APC”) are described. In one embodiment, the method comprises performing a key process on a sample number of wafers of a lot of wafers; performing a key inline measurement related to the key process to produce metrology data for the wafers; predicting WAT data from the metrology data using an inline-to-WAT model; and using the predicted WAT data to tune a WAT APC process for controlling a tuning process or a process APC process. | 11-18-2010 |
20110010215 | METHOD FOR A BIN RATIO FORECAST AT NEW TAPE OUT STAGE - A method for providing a bin ratio forecast at an early stage of integrated circuit device manufacturing processes is disclosed. The method comprises collecting historical data from one or more processed wafer lots; collect measurement data from one or more skew wafer lots; generating an estimated baseline distribution from the collected historical data and collected measurement data; generating an estimated performance distribution based on one or more specified parameters and the generated estimated baseline distribution; determining a bin ratio forecast by applying a bin definition and a yield degradation factor estimation to the generated estimated performance distribution; determining one or more production targets based on the bin ratio forecast; and processing one or more wafers based on the one or more determined production targets. | 01-13-2011 |
20110042006 | E-CHUCK WITH AUTOMATED CLAMPED FORCE ADJUSTMENT AND CALIBRATION - The present disclosure describes a semiconductor manufacturing apparatus. The apparatus includes a processing chamber designed to perform a process to a wafer; an electrostatic chuck (E-chuck) configured in the processing chamber and designed to secure the wafer, wherein the E-chuck includes an electrode and a dielectric feature formed on the electrode; a tuning structure designed to hold the E-chuck to the processing chamber by clamping forces, wherein the tuning structure is operable to dynamically adjust the clamping forces; a sensor integrated with the E-chuck and sensitive to the clamping forces; and a process control module for controlling the tuning structure to adjust the clamping forces based on pre-measurement data from the wafer and sensor data from the sensor. | 02-24-2011 |
20110314336 | Physical Failure Analysis Guiding Methods - A method includes providing a plurality of failure dies, and performing a chip probing on the plurality of failure dies to generate a data log comprising electrical characteristics of the plurality of failure dies. An automatic net tracing is performed to trace failure candidate nodes in the failure dies. A failure layer analysis is performed on results obtained from the automatic net tracing. Physical failure analysis (PFA) samples are selected from the plurality of failure dies using results obtained in the step of performing the failure layer analysis. | 12-22-2011 |
20120016509 | Semiconductor Processing Dispatch Control - An embodiment is a method for semiconductor processing control. The method comprises identifying a key process stage from a plurality of process stages based on a parameter of processed wafers, forecasting a trend for a wafer processed by the key process stage and some of the plurality of process stages based on the parameter, and dispatching the wafer to one of a first plurality of tools in a tuning process stage. The one of the first plurality of tools is determined based on the trend. | 01-19-2012 |
20120130525 | ADAPTIVE AND AUTOMATIC DETERMINATION OF SYSTEM PARAMETERS - A MIMO optimizer is used to identify tunable process parameters for processing equipment. | 05-24-2012 |
20130013097 | Semiconductor Processing Dispatch Control - An embodiment is a method for semiconductor processing control. The method comprises identifying a key process stage from a plurality of process stages based on a parameter of processed wafers, forecasting a trend for a wafer processed by the key process stage and some of the plurality of process stages based on the parameter, and dispatching the wafer to one of a first plurality of tools in a tuning process stage. The one of the first plurality of tools is determined based on the trend. | 01-10-2013 |
20130144419 | INTEGRATED CIRCUIT MANUFACTURING TOOL CONDITION MONITORING SYSTEM AND METHOD - A system and method for monitoring a process tool of an integrated circuit manufacturing system are disclosed. An exemplary method includes defining zones of an integrated circuit manufacturing process tool; grouping parameters of the integrated circuit manufacturing process tool based on the defined zones; and evaluating a condition of the integrated circuit manufacturing process tool based on the grouped parameters. | 06-06-2013 |
20130150997 | METHOD AND SYSTEM FOR TOOL CONDITION MONITORING - A method and system for removing control action effects from inline measurement data for tool condition monitoring is disclosed. An exemplary method includes determining a control action effect that contributes to an inline measurement, wherein the inline measurement indicates a wafer characteristic of a wafer processed by a process tool; and evaluating the inline measurement without the control action effect contribution to determine a condition of the process tool. | 06-13-2013 |
20130306621 | REAL-TIME CALIBRATION FOR WAFER PROCESSING CHAMBER LAMP MODULES - An apparatus, a system and a method are disclosed. An exemplary apparatus includes a wafer processing chamber. The apparatus further includes radiant heating elements disposed in different zones and operable to heat different portions of a wafer located within the wafer processing chamber. The apparatus further includes sensors disposed outside the wafer processing chamber and operable to monitor energy from the radiant heating elements disposed in the different zones. The apparatus further includes a computer configured to utilize the sensors to characterize the radiant heating elements disposed in the different zones and to provide a calibration for the radiant heating elements disposed in the different zones such that a substantially uniform temperature profile is maintained across a surface of the wafer. | 11-21-2013 |
20140074258 | ADAPTIVE AND AUTOMATIC DETERMINATION OF SYSTEM PARAMETERS - A method of automatically determining process parameters for processing equipment includes processing at least one first substrate in the processing equipment at a first time; and processing at least one second substrate in the processing equipment at a second time. The method includes collecting data on process monitors for the at least one first substrate; and the at least one second substrate. The method includes receiving the data by a multiple-input-multiple-output (MIMO) optimization system. The method includes revising a sensitivity matrix, by a MIMO optimizer, using the data and an adaptive-learning algorithm, wherein the adaptive-learning algorithm revises the sensitivity matrix based on a learning parameter which is related to a rate of change of the processing equipment over time. The method includes determining a set of process parameters for the processing equipment by the MIMO optimizer, wherein the MIMO optimizer uses the revised sensitivity matrix to determine the process parameters. | 03-13-2014 |
20140207271 | TOOL OPTIMIZING TUNING SYSTEMS AND ASSOCIATED METHODS - The present disclosure provides various methods for tuning process parameters of a process tool, including systems for implementing such tuning. An exemplary method for tuning process parameters of a process tool such that the wafers processed by the process tool exhibit desired process monitor items includes defining behavior constraint criteria and sensitivity adjustment criteria; generating a set of possible tool tuning process parameter combinations using process monitor item data associated with wafers processed by the process tool, sensitivity data associated with a sensitivity of the process monitor items to each process parameter, the behavior constraint criteria, and the sensitivity adjustment criteria; generating a set of optimal tool tuning process parameter combinations from the set of possible tool tuning process parameter combinations; and configuring the process tool according to one of the optimal tool tuning process parameter combinations. | 07-24-2014 |
20140303765 | Semiconductor Processing Dispatch Control - An embodiment is a method for semiconductor processing control. The method comprises identifying a key process stage from a plurality of process stages based on a parameter of processed wafers, forecasting a trend for a wafer processed by the key process stage and some of the plurality of process stages based on the parameter, and dispatching the wafer to one of a first plurality of tools in a tuning process stage. The one of the first plurality of tools is determined based on the trend. | 10-09-2014 |