Patent application number | Description | Published |
20150031461 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, AND RECORDING MEDIUM - An example system includes: a contactless communication part that performs contactless communication with a data storage medium having a contactless communication function; a data writing part that writes data to the data storage medium by the contactless communication part; a storage part that stores the data written by the data writing part; and a corruption determination part that determines whether the data stored in the data storage medium is corrupted or not. When the corruption determination part determines that the data is corrupted, the data writing part writes the data stored in the storage part, to the data storage medium. | 01-29-2015 |
20150105150 | STORAGE MEDIUM HAVING STORED THEREIN DISPLAY CONTROL PROGRAM, DISPLAY CONTROL APPARATUS, DISPLAY CONTROL SYSTEM, AND DISPLAY CONTROL METHOD - An input using a pointing device is acquired, and it is determined whether the input using the pointing device is an operation of moving an input position. If it has been determined in the determination of the operation that the input using the pointing device is the operation of moving the input position, an operation direction of the operation of moving the input position is determined. If the determined operation direction corresponds to any one of a plurality of directions determined in advance, a predetermined display target is moved in a direction based on the operation direction, thereby causing the predetermined display target to appear on a display screen. If it has been determined that the operation direction corresponds to any one of the plurality of directions, a common display target is caused to appear, regardless of which one of the plurality of directions the operation direction corresponds to. | 04-16-2015 |
Patent application number | Description | Published |
20100236579 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD - A substrate processing apparatus and a substrate processing method are capable of restraining or preventing the generation of streaky particles on a substrate surface by excellent removal of a rinsing liquid therefrom. The substrate processing apparatus has a substrate inclining mechanism for inclining a substrate held by a substrate holding mechanism. After a rinsing liquid has been supplied onto a substrate to form a liquid mass, the substrate is inclined at a small angle by the substrate inclining mechanism. Then, the liquid mass is downwardly moved without being fragmented and then falls down without leaving minute droplets on the substrate top. Thereafter, the substrate is returned to a horizontal posture and then dried. | 09-23-2010 |
20120223054 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus includes a first processing chamber and a second processing chamber, a first substrate holding unit that holds a substrate in the first processing chamber, a chemical solution supply unit that supplies a chemical solution containing an etching component and a thickening agent to the substrate held by the first substrate holding unit, a substrate transfer unit that transfers the substrate from the first processing chamber to the second processing chamber in a state in which the chemical solution is held on the substrate, and a second substrate holding unit that holds a plurality of substrates on each of which the chemical solution is held in the second processing chamber. | 09-06-2012 |
20130052360 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND NOZZLE - A substrate processing apparatus includes a substrate holding unit that holds a substrate, an injection unit that injects droplets of a processing liquid from a plurality of injection ports respectively toward a plurality of collision positions within a principal surface of the substrate held by the substrate holding unit, and a liquid film forming unit. The liquid film forming unit discharges a protective liquid from a plurality of discharge ports respectively toward a plurality of liquid contact positions within the principal surface of the substrate held by the substrate holding unit to form a plurality of liquid films of the protective liquid that respectively cover different collision positions. | 02-28-2013 |
20130073069 | SCHEDULING METHOD AND RECORDING MEDIUM HAVING SCHEDULING PROGRAM RECORDED THEREON FOR SUBSTRATE TREATING APPARATUS - A scheduling method suitable for a single-substrate type substrate treating apparatus is provided. In the scheduling method, a controller provided in the substrate treating apparatus prepares schedule defining performances of the substrate treating apparatus having a single-substrate type treating unit in a time sequential order. The method comprises the steps of: a step for preparing a plurality of tentative timetables for a plurality of respective substrates, each of the tentative timetables combining a plurality of blocks in a time sequential order, each of the blocks defining a treatment content for one of the substrates; and a scheduling step for preparing a total schedule by acquiring the blocks from the plurality of tentative timetables to dispose the acquired blocks in a time sequential order. | 03-21-2013 |
20140283992 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a first processing chamber and a second processing chamber, a first substrate holding unit that holds a substrate in the first processing chamber, a chemical solution supply unit that supplies a chemical solution containing an etching component and a thickening agent to the substrate held by the first substrate holding unit, a substrate transfer unit that transfers the substrate from the first processing chamber to the second processing chamber in a state in which the chemical solution is held on the substrate, and a second substrate holding unit that holds a plurality of substrates on each of which the chemical solution is held in the second processing chamber. | 09-25-2014 |
20140352742 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus has a cup part for receiving processing liquid such as pure water which is splashed from a substrate. The cup part is formed of electrical insulation material or semiconductor material. Hydrophilic treatment may be performed on an outer annular surface of the cup part and water may be held on the outer annular surface of the cup part while processing the substrate. With the disclosed apparatus, charged potential of the cup part generated by splashing of pure water can be suppressed, without greatly increasing the manufacturing cost of the substrate processing apparatus. As a result, it is possible to prevent electric discharge from occurring on the substrate due to induction charging of the substrate, in application of the processing liquid onto the substrate. | 12-04-2014 |
20150246365 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND NOZZLE - A substrate processing apparatus includes a substrate holding unit, an injection unit that injects droplets of a processing liquid from a plurality of injection ports respectively toward a plurality of collision positions on the substrate, and a liquid film forming unit. The liquid film forming unit discharges a protective liquid from a plurality of discharge ports toward a plurality of liquid contact positions that respectively cover different collision positions. The plurality of injection ports and the plurality of discharge ports may be formed in a nozzle. A nozzle moving unit may be provided, to move the nozzle along the substrate. | 09-03-2015 |
20150264790 | PROCESSING FLUID SUPPLY DEVICE, SUBSTRATE PROCESSING DEVICE, PROCESSING FLUID SUPPLY METHOD, SUBSTRATE PROCESSING METHOD, PROCESSING FLUID PROCESSING DEVICE, AND PROCESSING FLUID PROCESSING METHOD - A processing liquid supplying apparatus is arranged to discharge a processing liquid from a discharge port to supply the processing liquid to a processing object, and the processing liquid supplying apparatus includes a first piping, through the interior of which the processing liquid can flow, the interior of the first piping being in communication with the discharge port, and an X-ray irradiating means irradiating X-rays onto the processing liquid present inside the first piping. The first piping has an opening in its pipe wall and the opening is closed by a window member formed using a material that can transmit the X-rays, and the X-ray irradiating means irradiates the X-rays onto the processing liquid present inside the first piping via the window member. | 09-17-2015 |
Patent application number | Description | Published |
20080309467 | DRIVING APPARATUS OF MOVER - A driving apparatus drives a mover arranged for feedback of a touch panel. A reference voltage generation unit generates a reference voltage having a signal waveform to be applied to the mover. A pulse modulator generates a PWM signal of which duty ratio is controlled by feedback so that a feedback voltage corresponding to a drive voltage to be applied to the mover approaches the reference voltage. A switching element of the DC/DC converter is turned ON/OFF by a PWM signal from the pulse modulator, so that an output voltage of the DC/DC converter is controlled, and a drive voltage corresponding to the output voltage is applied to the mover. | 12-18-2008 |
20100066336 | POWER CONTROL CIRCUIT - A control circuit | 03-18-2010 |
20110006694 | DC/DC CONVERTER CONTROL CIRCUIT, AND POWER SUPPLY APPARATUS, LIGHT EMITTING APPARATUS AND ELECTRONIC DEVICE USING THE SAME - A control circuit is provided for a separately excited DC/DC converter which directly monitors output voltage to detect a short-circuit state, and performs overcurrent protection. A switching controller of the control circuit controls a switching operation of a switching transistor of the separately excited DC/DC converter. A voltage comparator compares the output voltage and a threshold voltage, to detect the short-circuit state. After a predetermined start-up time has elapsed after beginning start-up of the separately excited DC/DC converter, when the voltage comparator detects the short-circuit state, the switching controller halts the switching operation of the switching transistor, and makes detection of the short-circuit state by the voltage comparator non-operative before elapse of the start-up time. After detecting the short-circuit state and halting the switching operation of the switching transistor for a predetermined halt time, the switching controller begins start-up of the separately excited DC/DC converter once again. | 01-13-2011 |
Patent application number | Description | Published |
20090013204 | INFORMATION PROCESSING DEVICE AND MOBILE PHONE - An information processing device, for use in a mobile terminal unable to obtain power consumption information from an external source, which can estimate, based on an actual performance value, a battery life, power consumption for processing that changes depending on the usage by the user, and so on, and ensures execution of processing specified by the user for a specified period of time, the information processing device comprising a power consumption calculating unit which calculates, for each processing executed by the information processing device, power consumption information concerning an amount of power consumed by executing each processing; a request generating unit which compares the amount of power indicated by the power consumption information and a remaining amount of power of the information processing device, and generates a request to execute predetermined processing according to a result of the comparison; and a request processing unit which executes the predetermined processing in response to the generated request. | 01-08-2009 |
20110202930 | RESOURCE EXCLUSION CONTROL METHOD AND EXCLUSION CONTROL SYSTEM IN MULTIPROCESSORS AND TECHNOLOGY ASSOCIATED WITH THE SAME - When locking of a lock object by a process is attempted, whether the locking succeeded is determined. Having determined that the locking succeeded, the process is executed at a relatively high processing speed in an interval during which the locking is valid as compared to an interval during which the locking is invalid. | 08-18-2011 |
Patent application number | Description | Published |
20130087074 | COPPER-BASED ALLOY AND STRUCTURAL MATERIAL COMPRISING SAME - A copper-based alloy which contains 7.8 to 8.8 mass % of Al, 7.2 to 14.3 mass % of Mn and a remainder made up by Cu and unavoidable impurities, has a largest crystal grain diameter of more than 8 mm, has good shape memory properties, and enables the production of a structural material having a cross-section size suitable for use as a structure body or the like; and a structural material comprising the copper-based alloy. The copper-based alloy may additionally contain at least one element selected from the group consisting of Ni, Co, Fe, Ti, V, Cr, Si, Ge, Nb, Mo, W, Sn, Bi, Sb, Mg, P, Be, Zr, Zn, B, C, S, Ag and a misch metal in the total amount of 0.001 to 5 mass %. | 04-11-2013 |