Patent application number | Description | Published |
20100289924 | IMAGER THAT ADDS VISUAL EFFECTS TO AN IMAGE - An imager is provided having an imaging sensor and an image processor. The imaging sensor creates an image signal by photographing a subject. The image processor creates image data by processing the image signal, conducts a visual effects process, and stores post-processing information that includes information based on the visual effects process in the image data, so that an image file is created. | 11-18-2010 |
20100289925 | IMAGER THAT ADDS VISUAL EFFECTS TO AN IMAGE - An imager is provided having an imaging sensor, an image processor, and a recorder. The imaging sensor creates an image signal by photographing a subject. The image processor processes the image signal with visual effects processing so as to create image data, and adds metadata to the image data so as to create an image file. The metadata contains post-processing information includes information based on the visual effects process. The recorder stores the image file. The visual effects process is used in processing the image data. The image processor conducting a post process in which more than one visual effects process is carried out, a new image file is created, and the new image file is stored in the recorder. The post-processing information has a post-processing counter and pre-processing information. The post-processing counter indicates the number of times the post process is carried out. The pre-processing information represents the state of a preprocessed image file prior to post processing. | 11-18-2010 |
20120249832 | APPARATUS AND METHOD FOR PHOTOGRAPHING INFORMATION MANAGEMENT - A photographing information management method, which includes: judging whether there is equality between photographing position information added to an image file stored in an external storage medium which is detachably attachable to an imaging apparatus and photographing position information stored in an internal memory of the imaging apparatus; and when it is judged that the two pieces of photographing position information have the equality, displaying an image and the photographing position information of the image file on a display screen of the imaging apparatus. | 10-04-2012 |
20120250561 | DATA COLLECTION SYSTEM, DATA COLLECTION DEVICE, WIRELESS COMMUNICATION DEVICE, AND COMMUNICATION METHOD FOR COLLECTING DATA - A wireless communication device in a data collection system starts measuring a time when the wireless communication device receives a wireless signal from a data collection device. The wireless communication device changes the wireless channel, transmits a detection signal for detecting the data collection device, and starts measuring a time after transmitting the detection signal when the wireless communication device is unable to receive a next wireless signal from the data collection device even after passage of a predetermined time since the wireless communication device has previously received the wireless signal. The wireless communication device changes the wireless channel to be used, depending on whether the wireless communication device has received a response signal from the data collection device in response to the detection signal within a predetermined time. | 10-04-2012 |
20140369359 | COMMUNICATION DEVICE AND COMMUNICATION CONTROL METHOD - A communication device is included in an ad hoc network in a reactive routing scheme. The communication device includes a receiving unit, a selecting unit, and a transfer control unit. The receiving unit receives a route request frame including overall quality information on routes through which the route request frame has passed. The selecting unit selects a route request frame to be transferred to another communication device based on the quality information, from the route request frames received by the receiving unit through a plurality of routes. The transfer control unit transfers the route request frame selected by the selecting unit to the another communication device, and discards the route request frame when a quality value indicated by the quality information of the route request frame is smaller than a predetermined reference value. | 12-18-2014 |
20140376359 | DATA COMMUNICATION APPARATUS, DATA COMMUNICATION SYSTEM, AND DATA COMMUNICATION METHOD - A data communication apparatus forms a mesh network together with at least one gateway includes a frame generating unit and a frame transferring unit. The frame generating unit generates a meter data frame to transmit to a gateway. The meter data frame is a frame including meter data. The frame transferring unit transfers the meter data frame received from another data communication apparatus. The meter data frame is addressed to the gateway. The frame generating unit transmits the meter data frame to which number of alternate routing that indicates number of allowable transmission attempts from a data communication apparatus adjacent to a destination gateway of the meter data frame to the gateway is added. The frame transferring unit changes the number of alternate routing added thereto to a value smaller by 1 than a value that has been set and transits the meter data frame to another data communication apparatus. | 12-25-2014 |
Patent application number | Description | Published |
20090079465 | SEMICONDUCTOR INTEGRATED CIRCUIT - The present invention aims to make each power shutdown area appropriate. | 03-26-2009 |
20090141569 | SEMICONDUCTOR MEMORY DEVICE - Cell power supply lines are arranged for memory cell columns, and adjust impedances or voltage levels of the cell power supply lines according to the voltage levels of bit lines in the corresponding columns, respectively. In the data write operation, the cell power supply line is forced into a floating state according to the bit line potential on a selected column and has the voltage level changed, and a latching capability of a selected memory cell is reduced to write data fast. Even with a low power supply voltage, a static semiconductor memory device that can stably perform write and read of data is implemented. | 06-04-2009 |
20100090282 | SEMICONDUCTOR INTEGRATED CIRCUIT - The semiconductor integrated circuit has so-called SOI type first MOS transistors (MNtk, MPtk) and second MOS transistors (MNtn, MPtn). The first MOS transistors have a gate isolation film thicker than that the second MOS transistors have. The first and second MOS transistors constitute a power-supply-interruptible circuit ( | 04-15-2010 |
20110273952 | SEMICONDUCTOR MEMORY DEVICE THAT CAN STABLY PERFORM WRITING AND READING WITHOUT INCREASING CURRENT CONSUMPTION EVEN WITH A LOW POWER SUPPLY VOLTAGE - Cell power supply lines are arranged for memory cell columns, and adjust impedances or voltage levels of the cell power supply lines according to the voltage levels of bit lines in the corresponding columns, respectively. In the data write operation, the cell power supply line is forced into a floating state according to the bit line potential on a selected column and has the voltage level changed, and a latching capability of a selected memory cell is reduced to write data fast. Even with a low power supply voltage, a static semiconductor memory device that can stably perform write and read of data is implemented. | 11-10-2011 |
20120243302 | SEMICONDUCTOR MEMORY DEVICE THAT CAN STABLY PERFORM WRITING AND READING WITHOUT INCREASING CURRENT CONSUMPTION EVEN WITH A LOW POWER SUPPLY VOLTAGE - Cell power supply lines are arranged for memory cell columns, and adjust impedances or voltage levels of the cell power supply lines according to the voltage levels of bit lines in the corresponding columns, respectively. In the data write operation, the cell power supply line is forced into a floating state according to the bit line potential on a selected column and has the voltage level changed, and a latching capability of a selected memory cell is reduced to write data fast. Even with a low power supply voltage, a static semiconductor memory device that can stably perform write and read of data is implemented. | 09-27-2012 |
20140126278 | SEMICONDUCTOR MEMORY DEVICE THAT CAN STABLY PERFORM WRITING AND READING WITHOUT INCREASING CURRENT CONSUMPTION EVEN WITH A LOW POWER SUPPLY VOLTAGE - Cell power supply lines are arranged for memory cell columns, and adjust impedances or voltage levels of the cell power supply lines according to the voltage levels of bit lines in the corresponding columns, respectively. In the data write operation, the cell power supply line is forced into a floating state according to the bit line potential on a selected column and has the voltage level changed, and a latching capability of a selected memory cell is reduced to write data fast. Even with a low power supply voltage, a static semiconductor memory device that can stably perform write and read of data is implemented. | 05-08-2014 |
Patent application number | Description | Published |
20080299292 | Method of coating substrate - A method of coating by supplying a liquid material from a nozzle tip to form a film on a substrate surface facing to the nozzle, having the steps of: preparing a translation mechanism, which is capable of moving the nozzle in an in-plane direction and in a thickness direction of the substrate; making the nozzle to come gradually closer to the substrate, after positioning of the nozzle on the in-plane of the substrate, by using the translation mechanism; detecting electric current flowing through the nozzle from the substrate surface, when a semiconductor droplet supplied from the nozzle tip contacts with an electrode installed at the substrate surface; stopping accession of the nozzle to the substrate, when the electric current exceeds threshold value set in advance; and making the nozzle tip apart from the substrate farther than in the stopping, so as to coat the substrate with the liquid material. | 12-04-2008 |
20090015545 | Imaging apparatus and operation method of the same - To provide a low-voltage-driven, low-power-consumption, electrophoretic imaging device and an operation method of the same. An electrophoretic imaging device includes an electrode in contact with an electrophoretic dispersion liquid in which particles are dispersed, and a holding electrode disposed on a side of the electrode opposed on a side thereof in contact with the electrophoretic dispersion liquid with an insulating layer interposed between the electrode and holding electrode. | 01-15-2009 |
20090114958 | Wiring Board and Method for manufacturing the Same - A wiring board with an electronic device comprising a plurality of trenches arranged in parallel on a substrate, a common trench communicating the plurality of trenches with each other at one of their ends on the substrate, a metal layer formed at the bottom of the plurality of trenches, and an electrode layer connected with the metal layer and formed on a bottom of the common trench, wherein the electrode layer on the bottom of the common trench constitutes a source electrode or a drain electrode of a field effect transistor, whereby the wiring board and an electronic circuit having a good fine wire pattern and a good narrow gap between the patterns using a coating material can be formed, and a reduction for a cost of an organic thin film electronic device and the electronic circuit can be attained since they can be realized through a development of a printing technique. | 05-07-2009 |
20090159950 | Semiconductor Device and manufacturing Method of Semiconductor Device - A conductor pattern including a gate electrode and an auxiliary pattern spaced apart by a narrow gap is formed on a substrate, an insulating film for a gate insulating film is formed so as to cover the same, a resist film is formed thereon, and the resist film is exposed from a back surface side of the substrate. In the exposure, the conductor pattern functions as a mask, but a resolution is reduced so that the resist film cannot resolve the dimension of the gap, whereby a portion corresponding to the gap is not formed in the resist pattern after development. By the lift-off method using the resist pattern, the source and drain electrodes aligned with the gate electrode are formed. The shape of the source and drain electrodes can be adjusted to an arbitrary shape by adjusting the shape of the auxiliary pattern. | 06-25-2009 |
20110222188 | PERPENDICULAR RECORDING MAGNETIC HEAD, MANUFACTURING METHOD THEREOF AND MAGNETIC DISK DRIVE - The reduction in a recording magnetic field due to the narrowing of recording track width along with the improved surface recording density is prevented and the increasing of accuracy in the track width is achieved, enabling an improvement in recording performance. In a perpendicular magnetic recording head, a main pole | 09-15-2011 |
20120162811 | MAGNETIC RECORDING HEAD HAVING A NON-CONFORMAL SIDE GAP AND METHODS OF PRODUCTION THEREOF - In one embodiment, a magnetic head includes a main pole having a leading side and a trailing side relative to a downtrack direction, a side gap layer positioned adjacent to the main pole in a crosstrack direction, and a side shield layer positioned adjacent the side gap layer in a crosstrack direction. The downtrack direction is in a direction of medium travel relative to the main pole, the crosstrack direction is perpendicular to the downtrack direction, the side gap layer is characterized by having a groove therein in the downtrack direction having the main pole positioned therein, the side shield is characterized by having a groove formed therein in the downtrack direction having the side gap layer positioned therein, the side gap is non-conformal in shape, and a position of the side shield relative to a position of the main pole is characterized as being self-aligned. | 06-28-2012 |
Patent application number | Description | Published |
20090235867 | SUSCEPTOR FOR VAPOR PHASE EPITAXIAL GROWTH DEVICE - There is provided a susceptor for a vapor phase epitaxial growth device, by which skidding at the time of loading a silicon wafer is prevented and the wafer can be loaded at a fixed position of the susceptor: wherein a ring-shaped groove having sloping planes widening toward a surface of the susceptor are formed on the outermost circumference of the bottom surface; and gas release openings penetrating through to the back surface of the susceptor are formed, each having a sectional area of 2.0 to 3.0 mm | 09-24-2009 |
20090314210 | Epitaxial growth susceptor - A susceptor for use in an epitaxial growth apparatus and method where a plurality of circular through-holes are formed in the bottom wall of a pocket in an outer peripheral region a distance of up to about ½ the radius toward the center of the circular bottom wall. The total opening surface area of these through-holes is 0.05 to 55% of the surface area of the bottom wall. The opening surface area of each of the through-holes provided at this outer peripheral region is 0.2 to 3.2 mm | 12-24-2009 |
20110031592 | SILICON EPITAXIAL WAFER AND METHOD FOR PRODUCTION THEREOF - Disclosed is a wafer having a good haze level in spite of the fact that the inclination angle of {110} plane in the wafer is small. Also disclosed is a method for producing a silicon epitaxial wafer, which comprises the steps of: growing an epitaxial layer on a silicon single crystal substrate having a main surface of {110} plane of which an off-angle is less than 1 degree; and polishing the surface of the epitaxial layer until the surface of the epitaxial layer has a haze level of 0.18 ppm or less (as measured by SP2 at a DWO mode). | 02-10-2011 |
20110114014 | METHOD FOR MANUFACTURING EPITAXIAL WAFER AND WAFER HOLDER USED IN THE METHOD - A susceptor having a recessed portion and a ring-like step portion is arranged in a reaction chamber, and a plurality of through bores are formed in a bottom wall in the recessed portion excluding the step portion. A lift pin inserted in each of the through bores temporarily holds a wafer, then a lower surface of an outer peripheral portion of the wafer is mounted on the step portion to accommodate the wafer in the recessed portion, and a raw material gas is circulated in the reaction chamber to form an epitaxial layer on a wafer surface in the recessed portion. When forming the epitaxial layer on the wafer surface, the lift pin protrudes upwards from an upper surface of the bottom wall, and a height h of a top portion of the lift pin based on the upper surface of the bottom wall as a reference is set to the range from a position where the height h exceeds 0 mm to a position immediately before the lift pin comes into contact with the wafer. | 05-19-2011 |
20120090536 | METHOD FOR PRODUCING SILICON EPITAXIAL WAFER - The method for producing a silicon epitaxial wafer according to the present invention has: a growth step G at which an epitaxial layer is grown on a silicon single crystal substrate; a first polishing step E at which, before the growth step G, both main surfaces of the silicon single crystal substrate are subjected to rough polishing simultaneously; and a second polishing step H at which, after the growth step G, the both main surfaces of the silicon single crystal substrate are subjected to finish polishing simultaneously. | 04-19-2012 |
Patent application number | Description | Published |
20100230667 | LIGHT TRANSMITTING SUBSTRATE, METHOD FOR MANUFACTURING LIGHT TRANSMITTING SUBSTRATE, ORGANIC LED ELEMENT AND METHOD FOR MANUFACTURING ORGANIC LED ELEMENT - The present invention is intended to provide an organic LED element in which the extraction efficiency is improved up to 80% of emitted light, and provides a translucent substrate comprising a translucent glass substrate; a scattering layer formed on the glass substrate and comprising a glass which contains a base material having a first refractive index for at least one wavelength of light to be transmitted and a plurality of scattering materials dispersed in the base material and having a second refractive index different from that of the base material; and a translucent electrode formed on the scattering layer and having a third refractive index higher than the first refractive index, wherein distribution of the scattering materials in the scattering layer decreases toward the translucent electrode. | 09-16-2010 |
20110001159 | SUBSTRATE FOR ELECTRONIC DEVICE, LAYERED BODY FOR ORGANIC LED ELEMENT, METHOD FOR MANUFACTURING THE SAME, ORGANIC LED ELEMENT, AND METHOD FOR MANUFACTURING THE SAME - An organic LED element having improved reliability in a long-term use, and having improved external extraction efficiency up to 80% of emitted light is provided. A substrate for an electronic device according to the present invention includes: a translucent substrate; a scattering layer including a glass and being provided on the translucent electrode; a coating layer provided on the scattering layer; and scattering materials that are present in the scattering layer and the coating layer and are not present on a surface of the coating layer, in which a surface of the coating layer has waviness in which a ratio Ra/Rλa of waviness height Ra to waviness period Rλa exceeds 1.0×10 | 01-06-2011 |
20110278622 | Glass for scattering layer of organic LED device and organic LED device - A glass to be used in a scattering layer of an organic LED element, and an organic LED element using the scattering layer are provided. The organic LED element of the present invention includes, a transparent substrate, a first electrode provided on the transparent electrode, an organic layer provided on the first electrode, and a second electrode provided on the organic layer, and further includes a scattering layer including, in terms of mol % on the basis of oxides, 15 to 30% of P | 11-17-2011 |
20110287264 | Glass composition and member having the same on substrate - A glass composition having high refractive index, softening property at low temperature and small average thermal expansion coefficient, and a member provided with the composition on a substrate, are provided. The glass composition of the present invention has a refractive index (n | 11-24-2011 |
20120025245 | Substrate for electronic device and electronic device using same - Provided is an electronic device having a long life and a large effective area. Furthermore, provided is an optical device capable of controlling specular visibility. And provided is a substrate for the optical device, which includes a scattering layer having excellent scattering properties and having a desired refractive index while retaining surface smoothness. Further, there is provided a substrate for the electronic device, which includes a substrate having first and second main surfaces facing each other and an electrode pattern formed on the first main surface of the substrate, in which the first main surface of the first and second main surfaces is a surface which forms waviness made up of curved faces, the waviness of the surface has a wavelength Rλa of greater than 50 μm and a ratio Ra/Rλa of waviness roughness Ra of the surface which forms waviness to the wavelength Rλa of the waviness is from 1.0×10 | 02-02-2012 |
20130134407 | GLASS FOR SCATTERING LAYER OF ORGANIC LED ELEMENT, AND ORGANIC LED ELEMENT - A glass used for a scattering layer of an organic LED element, and an organic LED element using the scattering layer are provided. The present invention relates to an organic LED element including a transparent substrate, a first electrode, an organic layer, and a second electrode in this order, which includes a scattering layer including, in terms of mol % on the basis of oxides thereof: 15 to 30% of P | 05-30-2013 |
20130187141 | ORGANIC EL ELEMENT, TRANSLUCENT SUBSTRATE AND METHOD OF MANUFACTURING ORGANIC EL ELEMENT - An organic EL element includes a transparent substrate; a first electrode; an organic light emitting layer formed on the first electrode; and a second electrode formed on the organic light emitting layer, wherein a scattering layer including a base material made of glass and scattering substances dispersed in the base material is provided on the transparent substrate, and a light extraction assistance layer is provided between the scattering layer and the first electrode, the light extraction assistance layer being made of an inorganic material other than glass. | 07-25-2013 |
20130264555 | ORGANIC EL ELEMENT AND TRANSLUCENT SUBSTRATE - A translucent substrate may include a transparent support substrate, and a light extracting layer formed on the transparent support substrate, including a glass material having a first refractive index in a range of 1.6 to 2.2 for D line, and a scattering material having a second refractive index different from the first refractive index for the D line. The light extracting layer may have a surface formed with a plurality of projections including at least one of an approximately pyramid-shaped projection having one peak point and an approximately triangular prism-shaped projection having one peak edge. An inclination angle formed by an edge and a base edge of an approximate triangle, obtained in a vertical cross section passing through the peak point or the peak edge of the projection, may be in a range of 10° to 60°. | 10-10-2013 |
20140048790 | ORGANIC EL ELEMENT, TRANSLUCENT SUBSTRATE AND METHOD OF MANUFACTURING ORGANIC LED ELEMENT - An organic LED element includes a transparent substrate, a light scattering layer, a first electrode, an organic light emitting layer, and a second electrode. The light scattering layer includes a base material made of glass, and scattering substances dispersed in the base material. The light scattering layer has a refractive index [N″] greater than a refractive index [N′] of the transparent substrate. First and second layers made of a material other than molten glass are arranged between the light scattering layer and the first electrode. A refractive index N | 02-20-2014 |
Patent application number | Description | Published |
20100045502 | CURRENT OUTPUT TYPE DIGITAL-ANALOG CONVERSION CIRCUIT, AND GRAPHIC DISPLAY DEVICE - A current output type digital-analog conversion circuit which outputs a current signal includes a decoder for decoding higher-order bits of input digital data, a plurality of binary current generators, and a current adder. Each of the binary current generators includes a device for outputting a binary current which increases linearly as binary values according to lower-order bits of the input digital data, and a device for outputting a predetermined all-ON current. Either the device for outputting the binary current or the element for outputting the all-ON current of the binary current generator is selected according to a decode signal output by the decoder. The current adder adds up and outputs the binary currents and the all-ON currents output by the plurality of binary current generators. | 02-25-2010 |
20100188175 | DATA TRANSMISSION SYSTEM AND METHOD, AND ELECTRONIC APPARATUS PROVIDED WITH SAME DATA TRANSMISSION SYSTEM - A data transmission system includes a transmitter including a drive unit outputting complementary signals to first and second transmission lines according to data for transmission, and a receptor including first and second termination resistors, and a receiver circuit. One ends of the first and second termination resistors are respectively connected to first and second nodes that are connected to first and second transmission lines and other ends of the first and second termination resistors are connected in common to a third node. The receiver circuit supplies a current to the third node and outputs received data corresponding to data for transmission, in accordance with a potential difference between the first and second nodes. | 07-29-2010 |
20100284051 | OPTICAL SCANNING DEVICE AND IMAGE OUTPUT APPARATUS - The present invention provides an optical scanning device that prevents a disadvantageous increase in device size. Transfer optical system | 11-11-2010 |
20110007171 | COMMUNICATION SYSTEM, TRANSMISSION DEVICE AND RECEPTION DEVICE - A transmission device displays a public image (a first image) provided to unspecified users, a private image (a second image) provided to particular users, and a mask image of the private image in a time division multiplexed manner, and transmits a private image sync signal synchronized with display of the private image. A reception device receives the private image sync signal transmitted from the transmission device and shoots by a shooting unit the private image displayed on the transmission device by using the private image sync signal, and displays the shot image on a display unit. | 01-13-2011 |
20110243497 | OPTICAL SWITCH, IMAGE DISPLAY DEVICE, IMAGE FORMING DEVICE, AND METHOD FOR MANUFACTURING OPTICAL SWITCH - An optical switch includes electro-optic crystal, and electrode unit including a plurality of electrodes arranged on the same plane in electro-optic crystal to extend in parallel to one another. A refractive index of a part of electro-optic crystal is changed by an electric field generated at electrode unit, thereby switching transmission and reflection of light incident on electro-optic crystal. Electro-optic crystal has an entrance surface through which light enters and an exit surface from which light exits. Electrode unit is located between the entrance surface and the exit surface. An angle θx formed between a longitudinal direction of electrodes and at least one surface from among the entrance surface and the exit surface is set near an angle that satisfies the expression θx=90°−Sin | 10-06-2011 |
20110255148 | OPTICAL SWITCH - An optical switch changes the refractive index of an electro-optical crystal according to an electric field applied to the electro-optical crystal so as to switch depending on whether the electro-optical crystal enables incident light to pass through or whether the electro-optical crystal enables incident light to be totally reflected. The optical switch includes an electrode section including a plurality of electrodes and formed in the electro-optical crystal, a principal plane including the largest area of each electrode on a same plane of the electro-optical crystal; an insulator layer on at least one plane of the electro-optical crystal, the plane being parallel with the electrode section, the insulator layer made of an insulator with lower dielectric constant than the electro-optical crystal; and a temperature control device formed on and in contact with the insulator layer and controls a temperature of the electrode section or dissipates heat generated in the electrode section. | 10-20-2011 |
20120275001 | OPTICAL SCANNING DEVICE, OPTICAL SCANNING METHOD, PROGRAM, AND IMAGE DISPLAY DEVICE - An optical scanning device includes: a first scanning; a first scanning mirror driving unit; a light emission signal output unit; a light receiving unit; and a phase control unit which controls the first scanning mirror driving unit so as to delay a phase of the oscillation of the first scanning mirror when the light receiving unit outputs the detection signal before intermediate time in a case where the light receiving unit does not output the detection signal during a predetermined period of time, the phase control unit controlling the first scanning mirror driving unit so as to advance a phase of the oscillation of the first scanning mirror when the light receiving unit outputs the detection signal after the intermediate time in the case where the light receiving unit does not output the detection signal during the predetermined period of time. | 11-01-2012 |
20130229580 | MULTI-PROJECTION DISPLAY SYSTEM AND METHOD OF ADJUSTING BRIGHTNESS THEREOF - A multi-projection display system is provided with a plurality of sensor units corresponding to projector units. The sensor units detect brightness for each color in a projected image that is projected on a screen and supply the detection results. The projector unit generates a brightness correction table on the basis of the image signal of a specific picture element of the projected image realized by an adjacent projector unit and on the basis of the brightness of the specific picture element of the projected image of the adjacent projector unit that is detected by a sensor unit for matching the brightness of the image projected by its own projector unit with that of the adjacent projector unit, refers to the brightness correction table to correct brightness for each color of the image signals that are received as input, and projects onto a screen the light of each color in accordance with the corrected image signals. | 09-05-2013 |
20130229630 | PROJECTOR AND CONTROL METHOD - A projector includes a screen which has color stripes that are periodically arranged and that generate visible light corresponding to incident light. A laser light source section emits a light beam. A laser scanning section scans the light beam on a region of the color stripes arranged on the screen. A light detection section detects feedback light radiated from the screen corresponding to the light beam. A control section adjusts a light emission timing and a light emission period of the laser light source section based on a detection result of the light detection section and causes the laser light source section to emit the light beam such that light pulses enter the individual color stripes. | 09-05-2013 |
20130278906 | PROJECTOR AND CONTROL METHOD - A projector includes a screen having a periodic array of color stripes for producing visible light depending on incident light, a light source that remits a light beam, a projection unit that scans an area of the screen where the color stripes are disposed, with the light beam in a direction across the color stripes, to display an image on the screen, a detector that detects the visible light from each of the color stripes as a feedback light pulse, and a controller that adjusts a start-of-emission timing of the light source based on a start-of-detection timing at which the feedback light pulse is detected by the detector and a detection period during which the feedback light pulse is detected by the detector, and controlling the light source to emit the light beam in order to apply light pulses to the color stripes within boundaries thereof. | 10-24-2013 |
20130335390 | Multi-projection Display and Brightness Adjustment Method Thereof - A multi-projection display includes: a plurality of projector units; a plurality of optical sensors that are provided corresponding to each of the projector units; and a main control unit that both causes adjustment images to be projected by each of the projector units and vertically synchronizes each projected adjustment image. Each projector unit acquires by a respective optical sensor brightness values of the picture elements that are adjacent between the adjustment image that is projected by the projector unit and the adjustment images that are projected by other projector units and adjusts the brightness of the projected image based on the differences in the acquired brightness values. | 12-19-2013 |
20130335641 | Projection System, Projection-type Image Display Device, and Multi-Projection System - A projection screen includes: phosphor regions arranged cyclically in an in-plane direction of a display region; a plurality of black stripes and reference black stripes that partition the display region into the phosphor regions; and an optical information formation unit that is provided in a specific position within the display region and that generates readable optical information. | 12-19-2013 |
Patent application number | Description | Published |
20090032507 | METHOD FOR PRODUCING METAL MASK FOR SCREEN PRINTING - A method for producing a metal mask for screen printing is provided, in which dross that is deposited at the time a boring operation is conducted via a laser beam is removed, without causing warpage or bending. The method for producing a metal mask for screen printing includes steps of: forming openings in the metal plate by melting the metal plate at positions irradiated by the laser beam; and ejecting an abrasive onto the other surface of the metal plate after the openings are formed. The abrasive ejected in the abrasive ejection step is one having a predetermined flat shape (plate-shaped abrasive), so as to form a plate shape having a flat surface, or an elastically deformable abrasive, with an average grain diameter of a dispersed or carried abrasive grain being 1 mm to 0.1 μm, and which is ejected at an incident angle of equal to or less than 80 degrees with respect to the other surface of the metal plate, and at an ejection pressure of 0.01 MPa to 0.7 MPa or at an ejection speed of 5 m/sec to 150 m/sec, so as to slide along the other surface of the metal plate. | 02-05-2009 |
20090130959 | BLASTING METHOD AND BLASTING MACHINE - In blasting with an abrasive containing liquid to confer elasticity, the abrasive from which liquid evaporates in the course of continuance use is uniformly supplied with liquid. Liquid for swelling an elastic abrasive is sprayed in an air flow for transporting the abrasive in a blasting machine | 05-21-2009 |
20110005142 | PROCESS FOR PRODUCING GEL-LIKE ABRASIVE MATERIAL AND GEL-LIKE ABRASIVE MATERIAL - An abrasive that can impart a mirror finish, glossiness, or the like to a surface of a workpiece by blasting is provided. A crosslinked polyrotaxane compound having a network structure where crosslinking points are circular molecules of polyrotaxane and also having abrasive grains dispersedly mixed therein is obtained by causing chemical bonding between the circular molecules of the polyrotaxane in a state where the abrasive grains and the polyrotaxane are mixed. Then, the crosslinked polyrotaxane compound is granulated to a predetermined grain diameter to obtain a gel-like abrasive where a part of the dispersedly mixed abrasive grain is exposed at the surface. By using the thus-obtained gel-like abrasive in blasting by projecting the abrasive at an angle tilted with respect to a surface of a workpiece, mirror finishing or the like is possible without making the surface of the workpiece pearskin-like. | 01-13-2011 |
20130023187 | Method For Grinding Side Portion of Hard, Brittle Material Substrate - An elastic abrasive with abrasive grains dispersed in or adhered to an elastic base material is ejected toward a side portion of a substrate together with compressed air. The elastic abrasive is ejected toward a predetermined processing area centered on a processing point in an ejection direction that intersects a widthwise line at the processing point and that forms a predetermined inclination angle selected from a range of 2° to 60° relative to a contact line. Moreover, an ejection nozzle and the workpiece are moved relatively to each other so that the processing area is moved at a fixed speed in a circumferential direction of the workpiece and so that the ejection direction is maintained at each processing point after moving. If multiple stacked substrates are to be processed, the processing area is moved at a fixed speed also in a widthwise direction of the substrates. | 01-24-2013 |
20130306148 | METHOD FOR FABRICATING SUBSTRATE FOR SOLAR CELL AND SOLAR CELL - The problem addressed by the present invention is providing a technique for fabricating, by a method simpler than conventional methods, a silicon substrate that is effective for light trapping, one surface of which has a textured structure and the other surface of which has higher reflectivity than the surface having the textured structure. The fabrication method for this semiconductor substrate comprises: a sandblasting step in which a first surface of a silicon substrate in an as-sliced state, fabricated by slicing a silicon ingot, is surface treated by sandblasting and, after the sandblasting step, a step for carrying out surface treatment using an etching solution that contains either or both of hydrofluoric acid and nitric acid on the silicon substrate. | 11-21-2013 |
20140329441 | METHOD FOR PRODUCING ELASTIC GRINDING MATERIAL, ELASTIC GRINDING MATERIAL, AND BLASTING METHOD USING SAID ELASTIC GRINDING MATERIAL - A long-lasting elastic grinding material capable of subjecting surfaces of objects to mirror-finishing, glossifying and the like via blasting thereof. A nucleus ( | 11-06-2014 |
Patent application number | Description | Published |
20080241489 | Method of forming resist pattern and semiconductor device manufactured with the same - A method of forming a resist pattern through liquid immersion exposure in which exposure is performed such that a liquid film is formed between a substrate for a semiconductor device on which a processed film is formed and an objective lens arranged above the substrate is provided, and the substrate treated with a water-repellent agent solution composed of at least a water-repellent agent and a solvent is exposed to light. | 10-02-2008 |
20090039519 | SEMICONDUCTOR DEVICE, PHOTOMASK, SEMICONDUCTOR DEVICE PRODUCTION METHOD, AND PATTERN LAYOUT METHOD - A semiconductor device according to an aspect of the invention includes plural line pattern and plural pad patterns. The line patterns are repeatedly disposed with a space pattern interposed therebetween. The pad pattern straddles plural columns of the line patterns. The pad pattern is connected to the line pattern located on one side of the pad pattern in one of the plural columns, the pad pattern is connected to the line pattern located on the other side of the pad pattern in another column of the plural columns, and the line pattern located on one side of the pad pattern includes an open-circuit portion in another column. Therefore, a semiconductor device in which an interconnection pattern including the fine line-and-space-shape line pattern and the pad pattern is accurately formed at low cost, a semiconductor device production method, and a photomask used to produce the semiconductor device can be provided. | 02-12-2009 |
20090075187 | PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND EXPOSURE MASK SET - First, a first exposure process is performed using dipole illumination with only a grating-pattern forming region as a substantial object to be exposed. Next, a second exposure process is performed with only a standard-pattern forming region as a substantial object to be exposed. A development process is then performed to obtain a resist pattern. A mask for the first exposure process is such that a light blocking pattern is formed on the whole surface of a standard-pattern mask part corresponding to the standard-pattern forming region. A mask for the second exposure is such that a light blocking pattern is formed on the whole surface of a grating-pattern mask part corresponding to the grating-pattern forming region. | 03-19-2009 |
20100104983 | PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND EXPOSURE MASK SET - First, a first exposure process is performed using dipole illumination with only a grating-pattern forming region as a substantial object to be exposed. Next, a second exposure process is performed with only a standard-pattern forming region as a substantial object to be exposed. A development process is then performed to obtain a resist pattern. A mask for the first exposure process is such that a light blocking pattern is formed on the whole surface of a standard-pattern mask part corresponding to the standard-pattern forming region. A mask for the second exposure is such that a light blocking pattern is formed on the whole surface of a grating-pattern mask part corresponding to the grating-pattern forming region. | 04-29-2010 |
20100203456 | METHOD OF FORMING RESIST PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - The present invention improves the OPE characteristic generated by the difference between sparse and dense mask patterns and promotes fidelity in the design of the pattern. Because of this, the present invention includes a step of forming a resist having an acid dissociative dissolution suppression group on a substrate, a step of coating the resist with an acid polymer dissolved in an alcohol based solvent and forming an upper layer film, a step of exposing through a mask, a step of performing a baking process, and a step of processing with an alkali developer, and wherein in the step of performing a baking process, a mixing layer is formed on the resist by the upper layer film and in which a thicker mixing layer is formed in an unexposed part of a region where the pattern density of the mask pattern is high compared to a region where the pattern density is low. | 08-12-2010 |
Patent application number | Description | Published |
20100041165 | PROBE-IMMOBILIZED CARRIER STORING MANUFACTURING CONDITION DATA AND MANUFACTURING METHOD AND APPARATUS THEREOF, DETECTING METHOD OF TARGET SUBSTANCE BY USE OF THE PROBE-IMMOBILIZED CARRIER, AND MEASURING APPARATUS, RECORDING MEDIUM, KIT AND SYSTEM FOR USE IN THE DETECTING METHOD - A target substance is more accurately detected by recording a manufacturing condition specific to a probe-immobilized carrier that influences a measurement result for the detection of the target substance, and correcting the measurement result obtained from the detection of the target substance by use of the probe-immobilized carrier on the basis of the recorded manufacturing condition. The influence of variations in the immobilization states of the probe onto the solid phase carrier on the measurement result of the target substance can be eliminated. | 02-18-2010 |
20100209925 | HYBRIDIZATION METHOD AND APPARATUS - A target nucleic acid contained in a sample solution is hybridized with a probe nucleic acid capable of binding specifically to the target nucleic acid and immobilized on a substrate. The process includes hybridizing the target nucleic acid with the probe nucleic acid, collecting the sample solution that has undergone the hybridization, amplifying the target nucleic acid contained in the collected sample solution, and hybridizing the amplified nucleic acid with the probe nucleic acid. | 08-19-2010 |
20100240122 | Spotter provided with spot pattern encryption function and detection device coping with spot pattern encryption - Plural probes spotted on a probe immobilization substrate are arranged such that the probes cannot be specified by a third party easily. When the plural probes are spotted on the probe immobilization substrate, a position where each probe is spotted is changed for each probe immobilization substrate to be prepared, whereby types of probes to be arranged in respective spot addresses are encrypted. The preset invention provides a spotter, a dispensing device to be used for the spotter, a probe immobilization substrate that is prepared using the spotter, and a detection device that decodes encrypted positions where the respective probes are spotted. | 09-23-2010 |
20110237463 | APPARATUS FOR APPLYING SOLUTION - An apparatus for applying a solution to be used for manufacturing DNA chips is provided in a holding member with a sensor for monitoring a substrate temperature, a temperature adjusting section for controlling the substrate temperature, and a control section for feeding back a control temperature, by using the monitored temperature, to the temperature adjusting section for controlling the substrate temperature, wherein the substrate temperature is controlled to such a level as will accelerate the reaction between the substrate and probes in the sample solution. | 09-29-2011 |
20120274812 | IMAGING APPARATUS AND CONTROL METHOD THEREOF - The present invention provides an imaging apparatus capable of facilitating a user's check of a focus adjustment state at the time of multiple exposure shooting, and also allowing a user to easily check in what kind of composition an image to be shot now will be combined with an already captured image immediately before shooting. The imaging apparatus includes a display control unit configured to perform control to display a through-the-lens image captured by an imaging unit on a display unit while sequentially updating the through-the-lens image during a focus adjustment, and display a multiple image combination result image generated by combining the through-the-lens image captured by the imaging unit and at least one already captured image on the display unit while sequentially updating the multiple image combination result image after completion of the focus adjustment. | 11-01-2012 |
20120274813 | IMAGING APPARATUS AND CONTROL METHOD THEREOF - The present invention provides an imaging apparatus capable of performing a live view display showing a multiple image combination result image generated by combining a through-the-lens image with an already captured image at a more suitable combination ratio according to a user's intended operation during multiple exposure shooting. The imaging apparatus switches a multiple image combination result image displayed as a live view from a multiple image combination result image combined at a first combination ratio to a multiple image combination result image combined at a second combination ratio allowing a user to preliminarily check a combination ratio for generating a multiple image combination result image to be recorded into a recording medium, according to a user's operation. | 11-01-2012 |
Patent application number | Description | Published |
20110289795 | SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PROGRAM - A substrate drying apparatus includes a drying gas nozzle configured so that, assuming that a surface WA of the substrate W is a projection plane, regarding the drying gas flow Gf in the nozzle moving direction Dr, a collision position Gfw with the substrate W is located downstream of a projected discharge position Gfv′, the projected discharge position Gfv′ being a discharge position from the drying gas nozzle projected on the projection plane. In a three-dimensional space, the drying gas flow Gf is inclined, such that an angle α formed by an axis Ga of the drying gas flow Gf and a vertical line Wp of the substrate W is in a range from a half contact angle θ/2 to an angle determined by deducting the half contact angle θ/2 from 90°, the half contact angle θ/2 being a half of the contact angle θ. | 12-01-2011 |
20120312323 | SUBSTRATE CLEANING METHOD AND ROLL CLEANING MEMBER - There is provided a substrate cleaning method which optimizes the shape of a roll cleaning member and can efficiently clean a substrate surface with a high degree of cleaning and reduce the number of defects remaining on the substrate surface. The substrate cleaning method performs scrub cleaning of a surface of a substrate with a roll cleaning member, having a large number of nodules on the surface and extending linearly over approximately an entire length of a diameter of the substrate and which forms a cleaning area between it and the substrate surface, by bringing the nodules into contact with the substrate surface while rotating the roll cleaning member and the substrate each in one direction. During this scrub cleaning, the area of contact between the nodules and the substrate surface in the cleaning area is made smaller in a forward-direction cleaning area. | 12-13-2012 |
20120325266 | METHOD OF PREDICTING CLEANING PERFORMANCE AND SUBSTRATE CLEANING METHOD - A cleaning performance prediction method determines a first distance from the origin of an X-Y plane to a first cleaning point on the X-Y plane, and the X-Y coordinates being determined for cleaning of the substrate to be carried out under first cleaning conditions. The method also determines a second distance from the origin of the X-Y plane to a second cleaning point on the X-Y plane, the X-Y coordinates of the second cleaning point being determined in the same manner as those of the first cleaning point but for cleaning of the substrate to be carried out under second cleaning conditions different from the first cleaning conditions. | 12-27-2012 |
20130219740 | SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PROGRAM - A substrate drying apparatus includes a drying gas nozzle configured so that, assuming that a surface WA of the substrate W is a projection plane, regarding the drying gas flow Gf in the nozzle moving direction Dr, a collision position Gfw with the substrate W is located downstream of a projected discharge position Gfv′, the projected discharge position Gfv′ being a discharge position from the drying gas nozzle projected on the projection plane. In a three-dimensional space, the drying gas flow Gf is inclined, such that an angle α formed by an axis Ga of the drying gas flow Gf and a vertical line Wp of the substrate W is in a range from a half contact angle θ/2 to an angle determined by deducting the half contact angle θ/2 from 90°, the half contact angle θ/2 being a half of the contact angle θ. | 08-29-2013 |
20130220368 | SUBSTRATE CLEANING METHOD - A substrate cleaning method can prevent corrosion of copper interconnects even when the cleaning method, which uses two-fluid jet cleaning, is used for cleaning of a surface of a substrate after polishing. The substrate cleaning method includes: carrying out primary cleaning of a surface of a substrate by scrub cleaning using a neutral or alkaline liquid chemical as a cleaning liquid; carrying out finish cleaning of the surface of the substrate by two-fluid jet cleaning which cleans the surface of the substrate in a non-contact manner by jetting carbonated water, comprising pure water or ultrapure water containing dissolved CO | 08-29-2013 |
20130312790 | SUBSTRATE CLEANING METHOD - A substrate cleaning method is used for performing scrub cleaning of a surface of a substrate. The substrate cleaning method includes rotating a roll cleaning member and a substrate respectively in one direction while keeping the roll cleaning member in contact with the substrate in a cleaning area, and supplying a cleaning liquid to a surface of the substrate to scrub-clean the surface of the substrate in the presence of the cleaning liquid in the cleaning area. The cleaning liquid is supplied initially to an inverse-direction cleaning area of the cleaning area where the relative rotational velocity between the roll cleaning member and the substrate is relatively high, and thereafter to a forward-direction cleaning area of the cleaning area where the relative rotational velocity between the roll cleaning member and the substrate is relatively low while the substrate makes one revolution on a central axis thereof. | 11-28-2013 |
20140158159 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - A substrate cleaning apparatus performs scrub cleaning of a surface of a substrate by keeping a roll cleaning member and the surface of the substrate in contact with each other in the presence of a cleaning liquid. The substrate cleaning apparatus includes a first chemical liquid supply nozzle comprising a nozzle configured to supply a chemical liquid toward the substrate so that the chemical liquid is brought into contact with the surface of the substrate in a first contact area extending in an elongated shape, and a second chemical liquid supply nozzle comprising a nozzle configured to supply a chemical liquid toward the substrate so that the chemical liquid is brought into contact with the surface of the substrate in a second contact area spreading in an elliptical shape. | 06-12-2014 |
20140158160 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - A substrate cleaning apparatus performs scrub cleaning of a surface of a substrate such as a semiconductor wafer. The substrate cleaning apparatus includes a cleaning member having a lower-end contact surface, and a cleaning liquid supply nozzle configured to supply a cleaning liquid to the surface of the substrate. The cleaning member is configured to scrub-clean the surface of the substrate by moving the cleaning member in one direction while the cleaning member is being rotated about its rotational axis and by rubbing the lower-end contact surface of the cleaning member against the surface of the substrate which is being rotated horizontally in the presence of the cleaning liquid. The cleaning member has an inverted truncated-cone shape wherein the angle α between the lower-end contact surface and a straight line on an outer circumferential surface of the cleaning member is larger than 90° and is not more than 150°. | 06-12-2014 |
20140182628 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - A substrate cleaning apparatus includes: a substrate holder configured to hold and rotate a substrate; an ultrasonic cleaning unit configured to impart an ultrasonic vibration energy to deaerated pure water and then supply the deaerated pure water onto a surface of the substrate; a pure water spray nozzle configured to spray deaerated pure water onto the surface of the substrate; a chamber surrounding the substrate holder and the pure water spray nozzle; and an inert gas supply line configured to supply an inert gas into the chamber. | 07-03-2014 |
20140182632 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - A substrate cleaning apparatus cleans a surface of a substrate such as a semiconductor wafer in a non-contact state by using two-fluid jet cleaning. The substrate cleaning apparatus includes a substrate holding mechanism configured to hold and rotate the substrate, with the front surface facing downward, in a horizontal state, and a two-fluid nozzle configured to jet a two-fluid jet flow, comprising a gas and a liquid, upwardly toward the front surface of the substrate held by the substrate holding mechanism. | 07-03-2014 |
20140182634 | SUBSTRATE CLEANING APPARATUS - A substrate cleaning apparatus cleans a surface of a substrate in a non-contact state. The substrate cleaning apparatus includes a substrate holding mechanism configured to hold and rotate the substrate, a two-fluid nozzle configured to jet a two-fluid jet flow, comprising a gas and a liquid, downwardly toward the front surface of the substrate held by the substrate holding mechanism, and a moving mechanism configured to move the two-fluid nozzle in one direction from a central portion toward a radially outer side of the substrate held by the substrate holding mechanism. The two-fluid nozzle is inclined so that an angle between an ejection center line of the two-fluid jet flow jetted from the two-fluid nozzle and a vertical line becomes a certain inclined angle, and the two-fluid jet flow collides with the front surface of the substrate at a forward position in a moving direction of the two-fluid nozzle. | 07-03-2014 |
20140187122 | POLISHING APPARATUS - A polishing apparatus includes: a pure water supply line configured to supply deaerated pure water into the polishing apparatus; a gas dissolving unit coupled to the pure water supply line and configured to dissolve a gas in the deaerated pure water to produce gas-dissolved pure water; a gas-dissolved pure water delivery line coupled to the gas dissolving unit and configured to deliver the gas-dissolved pure water; an ultrasonic cleaning unit coupled to the gas-dissolved pure water delivery line and configured to impart an ultrasonic vibration energy to the gas-dissolved pure water, which has been delivered through the gas-dissolved pure water delivery line, and then eject the gas-dissolved pure water onto an object to be cleaned; and a controller configured to control the gas dissolving unit and the ultrasonic cleaning unit. | 07-03-2014 |
20140248782 | SUBSTRATE PROCESSING METHOD - A substrate processing method includes rotating a substrate about a central axis thereof; starting irradiation of a surface of the substrate with soft X-rays; simultaneously with or after starting the irradiation of the surface of the substrate with the soft X-rays, starting supply of pure water onto the surface of the substrate; stopping the supply of the pure water onto the surface of the substrate; and then stopping the irradiation of the surface of the substrate with the soft X-rays. | 09-04-2014 |
20140253136 | SURFACE POTENTIAL MEASURING APPARATUS AND SURFACE POTENTIAL MEASURING METHOD - An apparatus for measuring a surface potential of an object on an underlying structure is disclosed. A relatively-moving mechanism moves a probe and a second support member relative to each other until the probe faces a reference structure on the second support member, an electric potential measuring device measures the surface potential of the reference structure through the probe, the controller calibrates the electric potential measuring device such that a measured value of the surface potential of the reference structure becomes 0, the relatively-moving mechanism moves the probe and a first support member relative to each other until the probe faces the object on the first support member after the calibration, and the electric potential measuring device measures the surface potential of the object through the probe. | 09-11-2014 |
20140259728 | SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PROGRAM - A substrate drying apparatus includes a drying gas nozzle configured so that, assuming that a surface WA of the substrate W is a projection plane, regarding the drying gas flow Gf in the nozzle moving direction Dr, a collision position Gfw with the substrate W is located downstream of a projected discharge position Gfv′, the projected discharge position Gfv′ being a discharge position from the drying gas nozzle projected on the projection plane. In a three-dimensional space, the drying gas flow Gf is inclined, such that an angle α formed by an axis Ga of the drying gas flow Gf and a vertical line Wp of the substrate W is in a range from a half contact angle θ/2 to an angle determined by deducting the half contact angle θ/2 from 90°, the half contact angle θ/2 being a half of the contact angle θ. | 09-18-2014 |
20140299163 | SUBSTRATE PROCESSING METHOD - A substrate processing method which can reduce electrostatic charge of a substrate surface is disclosed. The substrate processing method includes: performing a first processing step of supplying a liquid containing pure water onto a substrate while rotating the substrate; and then performing a second processing step of supplying the liquid onto the substrate, while rotating the substrate, under a condition in which a rate of increase in a surface potential of the substrate is lower than that in the first processing step. | 10-09-2014 |
20140331440 | SUBSTRATE CLEANING APPARATUS - A substrate cleaning apparatus including a self-cleaning device is disclosed. The substrate cleaning apparatus includes a self-cleaning device configured to clean a cylindrical scrub-cleaning tool that is rubbed against a substrate surface. The self-cleaning device includes a cleaning body having an inner circumferential surface that is shaped along an circumferential surface of the scrub-cleaning tool, and at least one cleaning nozzle configured to eject a cleaning fluid toward the circumferential surface of the scrub-cleaning tool through a gap between the circumferential surface of the scrub-cleaning tool and the inner circumferential surface of the cleaning body. | 11-13-2014 |
20140352608 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus capable of preventing corrosion of metal interconnects of a substrate formed thereon is disclosed. The substrate processing apparatus includes a substrate holder configured to hold a substrate horizontally and rotate the substrate, and a slit nozzle configured to supply a processing liquid onto a surface of the substrate. The slit nozzle is adjacent to the surface of the substrate and extends in approximately a radial direction of the substrate. | 12-04-2014 |
20150034121 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - A substrate cleaning apparatus capable of quickly removing cleaning liquid that has been used in cleaning of a substrate with a roll cleaning tool from the substrate. The substrate cleaning apparatus includes a substrate holder configured to hold and rotate a substrate; a cleaning-liquid supply nozzle configured to supply cleaning liquid onto a first region of the substrate; a roll cleaning tool configured to be placed in sliding contact with the substrate in the presence of the cleaning liquid to thereby clean the substrate; and a fluid supply nozzle configured to supply fluid, which is constituted by pure water or chemical liquid, onto a second region of the substrate. The second region is located at an opposite side of the first region with respect to the roll cleaning tool, and a supply direction of the fluid is a direction from a central side toward a peripheral side of the substrate. | 02-05-2015 |
20150040419 | SUBSTRATE CLEANING AND DRYING APPARATUS - An apparatus for cleaning and drying a substrate is disclosed. The apparatus includes a substrate holder configured to hold a substrate, a rotating device configured to rotate the substrate holder, a cylindrical cup surrounding a peripheral portion of the substrate, and a gas ejector disposed below the substrate. The gas ejector has at least one gas discharge opening arranged along an entire circumference of the substrate. The gas ejector is configured to discharge a gas downwardly from the gas discharge opening to induce downward flow of air in a gap between a peripheral portion of the substrate and the cylindrical cup. | 02-12-2015 |