Koyo
Hirotaka Koyo, Tokyo JP
Patent application number | Description | Published |
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20090013724 | Glass Processing Method Using Laser and Processing Device - A glass processing method comprising steps (i), (ii) carried out in the order mentioned. In step (i), a laser pulse ( | 01-15-2009 |
20090291261 | Glass Substrate Processing Method and Glass Component - A glass substrate processing method includes irradiating laser light L onto a glass substrate | 11-26-2009 |
20100029460 | GLASS FOR ANODIC BONDING - The present invention provides a glass for anodic bonding having a low thermal expansion coefficient and capable of being subjected to laser beam micromachining. The present invention is a glass for anodic bonding having a base glass composition containing 1 to 6 mol % of Li | 02-04-2010 |
20100216625 | GLASS FOR LASER MACHINING - A glass for laser processing that is processed through laser beam irradiation, wherein the glass for laser processing has a composition that satisfies the following relationships: | 08-26-2010 |
Hirotaka Koyo, Takarazuka-Shi JP
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20080209950 | Processing Method for Glass Substrate, Processed Glass Product and Stress Applying Apparatus - A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof; and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate. | 09-04-2008 |
Mizuho Koyo, Tokyo JP
Patent application number | Description | Published |
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20120244318 | COVER GLASS FOR PHOTOELECTRIC CONVERSION DEVICES AND METHOD FOR PRODUCING THE SAME - In order to eliminate non-uniformity in the appearance of a cover glass for photoelectric conversion devices, the reflectance curve of the cover glass is extremely flattened. Provided is a cover glass for photoelectric conversion devices that includes a glass sheet having an uneven surface such as a figured glass, and a reflection-reducing film formed on the uneven surface. The reflection-reducing film includes silica fine particles and a binder for the silica fine particles. The silica fine particles are arranged in a single layer on the top portion of the uneven surface of the glass sheet, while the silica fine particles are arranged in stacks to a thickness equivalent to at least three layers on the bottom portion of the uneven surface. The uneven surface of the glass sheet has an average spacing Sm of at least 0.4 mm but not more than 2.5 mm and an arithmetic average roughness Ra of 0.5 μm to 5 μm. The cover glass has a reflectance of at least 1.5% but not more than 3% over the entire wavelength range of 380 nm to 780 nm for incident light from the side on which the reflection-reducing film is formed. | 09-27-2012 |
Sakamoto Koyo, Osaka JP
Patent application number | Description | Published |
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20100203792 | METHOD FOR MANUFACTURING PLASMA DISPLAY PANEL - In order to realize a plasma display panel with high-definition/high-luminance display performance as well as with low power consumption, after formation of a primary film, a metal oxide paste made up of aggregated particles of metal oxide particles, an organic resin component, and diluting solvent is applied and fired. Thereby, a plurality of aggregated particles of the metal oxide particles are attached and formed onto the primary film. The metal oxide paste is obtained by mixing a first metal oxide paste with a content of the aggregated particles of the metal oxide, the organic resin component, and the diluting solvent being not smaller than 1.5 vol % and a second metal oxide paste made up only of the organic resin component and the diluting solvent. | 08-12-2010 |