Patent application number | Description | Published |
20080246098 | SPLIT-CHANNEL ANTIFUSE ARRAY ARCHITECTURE - Generally, the present invention provides a variable thickness gate oxide anti-fuse transistor device that can be employed in a non-volatile, one-time-programmable (OTP) memory array application. The anti-fuse transistor can be fabricated with standard CMOS technology, and is configured as a standard transistor element having a source diffusion, gate oxide, polysilicon gate and optional drain diffusion. The variable gate oxide underneath the polysilicon gate consists of a thick gate oxide region and a thin gate oxide region, where the thin gate oxide region acts as a localized breakdown voltage zone. A conductive channel between the polysilicon gate and the channel region can be formed in the localized breakdown voltage zone during a programming operation. In a memory array application, a wordline read current applied to the polysilicon gate can be sensed through a bitline connected to the source diffusion, via the channel of the anti-fuse transistor. More specifically, the present invention provides an effective method for utilizing split channel MOS structures as an anti-fuse cell suitable for OTP memories. | 10-09-2008 |
20090250726 | LOW VT ANTIFUSE DEVICE - A one time programmable memory cell having an anti-fuse device with a low threshold voltage independent of core circuit process manufacturing technology is presented. A two transistor memory cell having a pass transistor and an anti-fuse device, or a single transistor memory cell having a dual thickness gate oxide, are formed in a high voltage well that is formed for high voltage transistors. The threshold voltage of the anti-fuse device differs from the threshold voltages of any transistor in the core circuits of the memory device, but has a gate oxide thickness that is the same as a transistor in the core circuits. The pass transistor has a threshold voltage that differs from the threshold voltages of any transistor in the core circuits, and has a gate oxide thickness that differs from any transistor in the core circuits. The threshold voltage of the anti-fuse device is lowered by omitting some or all of the threshold adjustment implants that is used for high voltage transistors fabricated in the I/O circuits. | 10-08-2009 |
20090251943 | TEST CIRCUIT FOR AN UNPROGRAMMED OTP MEMORY ARRAY - Circuits for testing unprogrammed OTP memories to ensure that wordline and bitline connections, column decoders, wordline drivers, correctness of decoding, sensing and multiplexing operate properly. The OTP testing system includes one or both of column test circuitry and row test circuitry. The column test circuitry charges all the bitlines to a voltage level similar to that provided by a programmed OTP memory cell during a read operation, in response to activation of a test wordline. The bitline voltages can be sensed, thereby allowing for testing of the column decoding and sense amplifier circuits. The row test circuitry charges a test bitline to a voltage level similar to that provided by a programmed OTP memory cell during a read operation, in response to activation of a wordline of the OTP memory array. This test bitline voltage can be sensed, thereby allowing for testing of the row decoding and driver circuits. | 10-08-2009 |
20090262566 | MASK PROGRAMMABLE ANTI-FUSE ARCHITECTURE - A memory array having both mask programmable and one-time programmable memory cells connected to the wordlines and the bitlines. All memory cells of the memory array are configured as one-time programmable memory cells. Any number of these one-time programmable memory cells are convertible into mask programmable memory cells through mask programming, such as diffusion mask programming or contact/via mask programming. Manufacturing of such a hybrid memory array is simplified because both types of memory cells are constructed of the same materials, therefore only one common set of manufacturing process steps is required. Inadvertent user programming of the mask programmable memory cells is inhibited by a programming lock circuit. | 10-22-2009 |
20090290434 | DUAL FUNCTION DATA REGISTER - A dual function serial and parallel data register with integrated program verify functionality. The master and slave latching circuits of the dual function data register can concurrently store two different words of data. In a program verify operation, the master latch stores program data and the slave latch will receive and store read data. Comparison logic in each register stage will compare the data of both latches, and integrate the comparison result to that of the previous register stage. The final single bit result will indicate the presence of at least one bit that has not been programmed. Automatic program inhibit logic in each stage will prevent successfully programmed bits from being re-programmed in each subsequent reprogram cycle. Either data word can be serially clocked out by selectively starting the shift operations on either the low or high active logic level of a clock signal. | 11-26-2009 |
20100002527 | POWER UP DETECTION SYSTEM FOR A MEMORY DEVICE - A power up detection system for a memory device. Two rows of memory cells are mask programmed to include a word of data having an arbitrary size. The word in the second row is a single-bit shifted version of the word in the first row, such that each bit is shifted one bit position in a predetermined direction. The bits of the first word are read from the first row into slave latches of the register stages of a data register, and then shifted into the master latches of the next register stage of the data register. The bits of the second word are read from the second row into the slave latches of the register stages. Data comparison logic compares data stored in the master and slave latches of each register stage, and provides a signal indicating matching data between the first latches and the second latches, thereby indicating successful power up of the memory device. | 01-07-2010 |
20120081942 | TEST CELLS FOR AN UNPROGRAMMED OTP MEMORY ARRAY - Test cells are included in a one-time programmable (OTP) memory array for detecting semiconductor fabrication misalignment, which can result in a potentially defective memory array. The test cells are fabricated at the same time as the normal OTP cells, except they are smaller in size along one dimension in order to detect mask misalignment along that dimension. Any fabricated test cell which cannot be programmed indicates a level of fabrication mask misalignment has occurred and the OTP memory array should not be used. | 04-05-2012 |
20130059238 | REVERSE OPTICAL PROXIMITY CORRECTION METHOD - A method for fabricating an anti-fuse memory cell having a semiconductor structure with a minimized area. The method includes providing a reference pattern for the semiconductor structure, and applying a reverse OPC technique that includes inverting selected corners of the reference pattern. The reverse OPC technique uses photolithographic distortions to provide a resulting fabricated pattern that is intentionally distorted relative to the reference pattern. By inverting corners of a geometric reference pattern, the resulting distorted pattern will have an area that is reduced relative to the original reference pattern. This technique is advantageous for reducing the area of a selected region of a semiconductor structure which may otherwise not be possible through normal design parameters. | 03-07-2013 |
20140209989 | ANTI-FUSE MEMORY CELL - An anti-fuse memory cell having a variable thickness gate oxide. The variable thickness gate oxide is formed by depositing a first oxide over a channel region of the anti-fuse memory cell, removing the first oxide in a thin oxide area of the channel region, and then thermally growing a second oxide in the thin oxide area. The remaining first oxide defines a thick oxide area of the channel region. The second oxide growth occurs under the remaining first oxide, but at a rate less than thermal oxide growth in the thin oxide area. This results in a combined thickness of the first oxide and the second oxide in the thick oxide area being greater than second oxide in the thin oxide area. | 07-31-2014 |