Patent application number | Description | Published |
20090085040 | Liquid crystal display device and fabricating method thereof - A thin film transistor substrate and a fabricating method simplify a process and enlarge a capacitance value of a storage capacitor without any reduction of aperture ratio. A transparent first conductive layer and an opaque second conductive layer of a double-layer structured gate line are formed having a step coverage. A pixel electrode is provided on the gate insulating film within a pixel hole of said pixel area passing through the passivation film to be connected to the thin film transistor. A storage capacitor overlaps with the pixel electrode with having the gate insulating film therebetween and has a lower storage electrode protruded from the first conductive layer. | 04-02-2009 |
20090284676 | Thin film transistor substrate and fabricating method thereof, liquid crystal display panel using the same and fabricating method thereof - A thin film transistor substrate and a fabricating method thereof; and a liquid crystal display panel employing the same and a fabricating method thereof for simplifying a process are disclosed. A thin film transistor substrate, including: a gate line on a substrate; a data line crossing the gate line having a gate insulating film therebetween to define a pixel area; a pixel hole in the pixel area; a pixel electrode made of a transparent conductive film on the gate insulating film in the pixel hole in the pixel area; and a thin film transistor including a gate electrode connected to the gate line, a source electrode connected to the data line, a drain electrode connected to the pixel electrode, and a semiconductor layer defining a channel between the source electrode and the drain electrode, wherein the semiconductor layer overlaps with a source/drain metal pattern including the data line, the source electrode, and the drain electrode; wherein the drain electrode protrudes from the semiconductor layer toward an upper portion of the pixel electrode, and the drain electrode connects to the pixel electrode; and wherein the semiconductor layer is removed from where it overlaps the transparent conductive film. | 11-19-2009 |
20090290084 | Liquid crystal display device and method of fabricating same - A liquid crystal display device is provided that comprises a gate line; a first insulating film on the gate line; a data line crossing the gate line to define a pixel region, the pixel region having a transmissive area and a reflective area; a thin film transistor connected to the gate line and the data line; a pixel electrode formed in the pixel region; a second insulating film on the thin film transistor; a storage capacitor including a storage upper electrode overlapping the gate line; a transmission hole exposing at least a portion of the pixel electrode, and a reflective electrode formed in the reflective area of the pixel region, the reflective electrode connecting the pixel electrode with thin film transistor and the storage upper electrode, wherein the gate line and the pixel electrode include a first transparent conductive layer. | 11-26-2009 |
20090291517 | Liquid crystal display device and fabricating method thereof - A liquid crystal display device is provided that includes: first and second substrates; a gate line of a double layer having a first transparent conductive layer and a second opaque conductive layer on the first substrate; a first insulation film on the gate line; a data line crossing the gate line to define a pixel region, the pixel region having a transmissive area and a reflective area; a thin film transistor connected to the gate and data lines; a pixel electrode having the first conductive layer in the pixel region and a second conductive layer along the boundary of the first conductive layer; a storage upper electrode to form a storage capacitor by overlapping with the gate line the first insulation film there between; a transmission hole to expose the side of the storage upper electrode and a drain electrode of the thin film transistor by passing through the first insulation film and a second insulation film on the thin film transistor; a reflective electrode connected the second conductive layer of the pixel electrode with the drain electrode and the storage upper electrode through an edge portion of the transmission hole; and a liquid crystal layer between the first and second substrates. | 11-26-2009 |
20100015740 | Liquid crystal display device and fabricating method thereof - A liquid crystal display device, including: first and second substrates; a gate line on the first substrate; a data line crossing the gate line having a gate insulating film therebetween to define a pixel area; a pixel electrode formed of a transparent conductive film in a pixel hole passing through the gate insulating film in the pixel area; and a thin film transistor including a gate electrode, a source electrode, a drain electrode, and a semiconductor layer defining a channel between the source electrode and the drain electrode, wherein the semiconductor layer overlaps with a source and drain metal pattern including the data line, the source electrode and the drain electrode; and wherein the drain electrode protrudes from the semiconductor layer toward inside of the pixel electrode to be connected to the pixel electrode. | 01-21-2010 |
20100073622 | Method of fabricating liquid crystal display device - The present invention provides a liquid crystal display panel that is adaptive for preventing a liquid crystal contamination as well as improving an adhesive strength of a sealant and an organic insulating film, and a fabricating method thereof. A liquid crystal display device according to an embodiment of the present invention includes: a first and a second substrate having a liquid crystal region, a sealant region, and an outer region; a wiring disposed on the first substrate, the wiring crossing the sealant region; a gate insulating film disposed on the wiring; an organic insulating film disposed on a portion of the wiring; and a sealant disposed on the sealant region of the first and second substrates, wherein the sealant is in contact with the gate insulating film. | 03-25-2010 |
20100165224 | LIQUID CRYSTAL DISPLAY DEVICE AND FABRICATING METHOD THEREOF - A method of fabricating a liquid crystal display device includes in a first mask process, forming a first mask pattern group including a gate line, a gate electrode connected to the gate line and a common line parallel to the gate line that have a first conductive layer group structure having at least double conductive layers. A second mask process forms a gate insulating film on the first mask pattern group and a semiconductor pattern thereon. A third mask process forms a third mask pattern group including a data line, a source electrode connected to the data line and a drain electrode opposite the source electrode that have a second conductive layer group structure having at least double conductive layers, and a protective film interfacing with the third mask pattern group on the gate insulating film. | 07-01-2010 |
20100195009 | TRANSFLECTIVE LIQUID CRYSTAL DISPLAY DEVICE AND FABRICATING METHOD THEREOF - A liquid crystal display device is provided that includes: first and second substrate; a gate line of a double layer having a first transparent conductive layer and a second opaque conductive layer on the first substrate; a first insulation layer on the gate line; a data line crossing the gate line to define a pixel region, the pixel region having a transmissive region and a reflective region; a thin film transistor connected to the gate and data lines; a pixel electrode formed of the transparent conductive layer in the pixel region; an upper storage electrode forming a storage capacitor by overlapping the gate line with the gate insulating film there between; a transmission hole to exposing the pixel electrode by passing through a second insulation layer on the thin film transistor to the first insulation layer; a reflective electrode connecting the pixel electrode with a drain electrode and the upper storage electrode through an edge part of the transmission hole; a gate pad extending from the first conductive layer of the gate line; a data pad formed of the first conductive layer and connected to the data line through a data link; and a liquid crystal layer between the first and second substrates, wherein the first and second insulation layers are removed in the gate and data pads. | 08-05-2010 |
20100231820 | LIQUID CRYSTAL DISPLAY DEVICE AND FABRICATING METHOD THEREOF - A thin film transistor substrate for applying a horizontal electric field and a fabricating method thereof for simplifying a process are disclosed. In a liquid crystal display device according to the present invention, a gate line on a substrate; a data line crossing the gate line having a gate insulating film there between to define a pixel area; a thin film transistor including a gate electrode, a source electrode, a drain electrode and a semiconductor layer to define a channel between the source electrode and the drain electrode; a common line on the substrate; a common electrode in the pixel area; and a pixel electrode in the pixel area to form a horizontal electrode field with the common electrode, wherein the data line, the source electrode and the drain electrode have an opaque conductive pattern and a transparent conductive pattern, the pixel electrode is formed by an extension of the transparent conductive pattern of the drain electrode, and a protective film borders with the transparent conductive pattern and in the remaining area thereof. | 09-16-2010 |
20100237349 | LIQUID CRYSTAL DISPLAY DEVICE AND FABRICATING METHOD THEREOF - Disclosed is a thin film transistor substrate for a fringe filed switching type liquid crystal display device, and a fabrication method thereof, that reduces the number of required mask processes, and thus improves fabrication efficiency. The fabrication method involves three mask processes, wherein the masks are partial transmitting masks, and the resulting photo-resist patterns have varying thicknesses. By having photo-resist layers of varying thicknesses, structures can be formed in multiple etching steps using the same photo-resist pattern by incrementally removing the photo-resist according to its thickness. The thin film transistor substrate has a common line, a common electrode, a gate line and a gate electrode formed directly on the substrate. The common electrode overlaps the pixel electrode in the pixel area. | 09-23-2010 |
20110063556 | LIQUID CRYSTAL DISPLAY DEVICE AND FABRICATING METHOD THEREOF - A LCD device includes a gate line on a substrate and a data line crossing the gate line to define a pixel area; a thin film transistor source and drain electrodes; a common line parallel to the gate line; a common electrode extended from the common line and a pixel electrode extending from the drain electrode wherein the gate line and the common line have a first conductive layer group having at least double conductive layers, and the common electrode is formed by an extension of at least one transparent conductive layer of the common line; and the gate line, the source electrode and the drain electrode have a second conductive layer group having at least double conductive layers, and the pixel electrode is formed by an extension of at least one transparent conductive layer of the drain electrode. | 03-17-2011 |