Setta
Yuji Setta, Yokohama JP
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20100190327 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND DESIGN SUPPORT APPARATUS - A semiconductor device manufacturing method includes: forming a conductive film over a substrate; forming an assist pattern on the conductive film; forming a metal film to cover the conductive film and the assist pattern; etching back the metal film to form at least one side wall film on a side surface of the assist pattern; removing the assist pattern; forming at least one resist pattern to selectively expose a portion of the conductive film and a portion of the side wall film; performing etching using the resist pattern as a mask to remove the exposed portion of the side wall film; and etching the conductive film using the side wall film as a mask to form a gate electrode and a contact region electrically connected to the gate electrode. | 07-29-2010 |
Yuji Setta, Kawasaki JP
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20090081882 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR DESIGNING PHOTOMASK PATTERN - A method for designing a photomask pattern is provided. First, all line ends of object patterns are determined with reference to layout data. Then, object patterns, front edge portions, and joints, which are aligned on the same line extending along the Y-axis, are connected to form first reticle data. Reticle pattern data having data representing binding portions serving as light blocking portions is formed. The front edge portions being adjacent to each other and aligned in the X-axis are connected and adjacent joints being aligned in the same manner as the front edge portions are also connected to form second reticle data. Then, portions are provided at central regions between the binding portions so as to connect the adjacent binding portions including the front edge portions and the joints. Then, reticle data having data representing the binding portions serving as transparent patterns is formed. | 03-26-2009 |
20110312186 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - The semiconductor device manufacturing method comprises the step of transferring patterns formed on a reticle to a semiconductor substrate by an exposure with oblique incidence illumination. In the step of making the exposure with oblique incidence illumination, the exposure is made with an aperture stop | 12-22-2011 |
Yuji Setta, Mie JP
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20140240683 | FOCUS POSITION ADJUSTING APPARATUS, RETICLE, FOCUS POSITION ADJUSTING PROGRAM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, a step difference estimation unit, an assist pattern generation unit, and a spherical aberration conversion unit are installed. The step difference estimation unit estimates step difference of a processing layer. The assist pattern generation unit adds an assist pattern having different sensitivity to spherical aberration in an exposure process to a mask pattern based on the step difference of the processing layer. The spherical aberration conversion unit converts the step difference of the processing layer into the spherical aberration. | 08-28-2014 |
Yuji Setta, Kuwana Mie JP
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20150060975 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - A nonvolatile semiconductor memory device includes first and second memory blocks which are disposed adjacent to each other in a first direction. The first and second memory blocks each include a plurality of bit lines, a plurality of word lines, which are disposed to extend in a second direction, and a memory cell, which is connected to any of the plurality of word lines. The first memory block includes a first selection gate line which is connected to one end of the memory cell, and the second memory block includes a second selection gate line in the same manner. An end portion of one end of the first selection gate line includes an L-shaped portion, and an end portion of one end of the second selection gate line includes a linear portion. A first contact is disposed on the L-shaped portion of the first selection gate. | 03-05-2015 |
Yuji Setta, Kuwana JP
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20150357410 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - According to one embodiment, it includes an object film and an opening that is formed in the object film and in which a second taper adjoining a first taper is provided. A step is provided at the boundary between the first taper and the second taper. | 12-10-2015 |