Patent application number | Description | Published |
20090004871 | PROCESSING METHOD AND PLASMA PROCESSING DEVICE - A plasma processing method using plasma includes steps of applying current to a coil and introducing gas into a processing chamber, applying a bias power that does not generate plasma, applying a source power to generate plasma so that a plasma density distribution is high above an outer circumference of a semiconductor wafer and low above a center of the semiconductor wafer, and forming a shape of a sheath layer having a positive ion space charge directly above the semiconductor wafer so as to be convex in an upper direction from the semiconductor wafer, thereby eliminating foreign particles trapped in a boundary of the sheath layer having a positive ion space charge directly above the semiconductor wafer, generating plasma for processing the semiconductor wafer under a condition different from the conditions of the previous steps. | 01-01-2009 |
20090194235 | PLASMA PROCESSING APPARATUS - The object of the invention is to provide a plasma processing apparatus having enhanced plasma processing uniformity. The plasma processing apparatus comprises a processing chamber | 08-06-2009 |
20100297849 | PLASMA ETCHING METHOD FOR ETCHING AN OBJECT - The invention provides a plasma etching method capable of suppressing bowing of an opening of the object to be etched, and solving the lack of opening at a high aspect ratio portion in deep hole processing having a high aspect ratio. A plasma etching method for etching an object to be etched in a plasma etching apparatus using a mask patterned and formed on the object to be etched comprises sequentially performing a first step for etching the mask while attaching deposits on a side wall of an opening close to a surface of the mask pattern of the mask using fluorocarbon gas C | 11-25-2010 |
20110209828 | METHOD AND APPARATUS FOR PLASMA PROCESSING - The invention provides a plasma processing apparatus capable of minimizing the non-uniformity of potential distribution around wafer circumference, and providing a uniform process across the wafer surface. The apparatus is equipped with a focus ring formed of a dielectric, a conductor or a semiconductor and having RF applied thereto, the design of which is optimized for processing based on a design technique clarifying physical conditions for flattening a sheath-plasma interface above a wafer and the sheath-plasma interface above the focus ring. A surface voltage of the focus ring is determined to be not less than a minimum voltage for preventing reaction products caused by wafer processing from depositing thereon. The surface height, surface voltage, material and structure of the focus ring are optimized so that the height of an ion sheath formed on the focus ring surface is either equal or has a height difference within an appropriate tolerance range to the height of the ion sheath formed on the wafer surface. Optimization of the structure is realized by setting up an appropriate tolerance range taking into consideration the variation caused by consumption of the focus ring. | 09-01-2011 |
20130174105 | METHOD AND APPARATUS FOR PLASMA PROCESSING - A plasma processing apparatus is disclosed for minimizing the non-uniformity of potential distribution around wafer circumference. The apparatus includes a focus ring formed of a dielectric, and a conductor or a semiconductor having RF applied thereto. A surface voltage of the focus ring is determined to be not less than a minimum voltage for preventing reaction products caused by wafer processing from depositing thereon. The surface height, surface voltage, material, and structure of the focus ring are optimized so that the height of an ion sheath formed on the focus ring surface is either equal or has a height difference within an appropriate tolerance range to the height of the ion sheath formed on the wafer surface. | 07-04-2013 |
20130199728 | PLASMA PROCESSING APPARATUS - The object of the invention is to provide a plasma processing apparatus having enhanced plasma processing uniformity. The plasma processing apparatus comprises a processing chamber | 08-08-2013 |
20140137059 | METHOD AND APPARATUS FOR PLASMA PROCESSING - Plasma processing focus ring design arrangements, including: acquiring a surface voltage and a sheath thickness above a surface of the object to be processed, and a surface voltage and a sheath thickness above a surface of the focus ring, by an equivalent circuit analysis; performing 2D plasma and 2D electric field analysis, based on the equivalent circuit analysis; and designing configuration of the focus ring and the processing stage, to achieve a plasma-sheath interface flattening condition by making a sum of a height from a height reference point to a surface of the object and a sheath thickness from the surface of the object to a plasma-sheath interface above the object, equal to a sum of a height from the height reference point to a surface of the focus ring and a sheath thickness from the surface of the focus ring to a plasma-sheath interface above the focus ring. | 05-15-2014 |
Patent application number | Description | Published |
20100189365 | Imaging apparatus, retrieval method, and program - An imaging apparatus includes an image acquisition mechanism configured to acquire an image by imaging a subject to output an acquired image; an acquired image characteristic amount extraction mechanism configured to extract a characteristic amount of the acquired image acquired by the image acquisition mechanism; and a retrieval mechanism configured to retrieve images of which the characteristics are identical or similar to the characteristics of the acquired image from other images other than the acquired image using the characteristic amount extracted by the acquired image characteristic amount extraction mechanism. | 07-29-2010 |
20100207727 | Information processing apparatus, method, and program - An information processing apparatus includes: a biometric information acquirer configured to acquire a user's biometric information; an instructions receiver configured to receive instructions from the user; and an associating unit configured to associate the biometric information with information obtained on the basis of the instructions. | 08-19-2010 |
20100209166 | Recording device, recording method, and program - A recording device that duplicates contents recorded in a first recording medium on a detachable second recording medium includes: selection means for selecting duplication subject contents to be duplicated on the second recording medium among the contents recorded in the first recording medium; duplicating means for duplicating the selected duplication subject contents on the second recording medium; generation means for generating label surface information that indicates contents recorded in the second recording medium after the duplication subject contents are duplicated thereon and is to be printed on a label surface of the second recording medium; and print control means for causing the generated label surface information to be printed on the label surface of the second recording medium. | 08-19-2010 |
20100211380 | INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD, AND PROGRAM - An information processing apparatus includes: an acquiring unit acquiring text data as data associated with plural contents; a separating unit separating the text data acquired by the acquiring means into words of a predetermined unit in accordance with attributes; a comparing unit calculating a correspondence length indicating the number of words which continuously correspond to each other in order of the attributes between the text data, by comparing the words, which are separated by the separating means, between the text data of the plural contents; a calculating unit calculating a similarity degree score indicating a similarity degree between the contents corresponding to the text data on the basis of the correspondence length obtained by the comparing means; and a display controlling unit controlling displaying outlines of the plural contents on the basis of the similarity degree score between a predetermined content and another content among the plural contents. | 08-19-2010 |
20100300310 | Print apparatus, print method, and print program - A print apparatus includes: a print image generation unit that generates a circular print image by bonding one end and the other end of a single direction of a representative image where an image characteristic portion extending in a single direction is depicted to represent contents recorded on the recording disc; and a print unit that prints the print image on one surface of the recording disc by matching a center of the recording disc with a center of the print image. | 12-02-2010 |