Patent application number | Description | Published |
20100179047 | OPTICAL MEMBER COMPRISING TIO2-CONTAINING SILICA GLASS - The present invention relates to an optical member including a TiO | 07-15-2010 |
20100261597 | TIO2-CONTAINING SILICA GLASS - The present invention is to provide a TiO | 10-14-2010 |
20100317505 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention is to provide a TiO | 12-16-2010 |
20100323872 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
20100323873 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
20110028299 | TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention provides a TiO | 02-03-2011 |
20110179827 | PROCESS FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS - The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F | 07-28-2011 |
20110239706 | METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS - The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following processes steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F | 10-06-2011 |
20110239707 | METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS - The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F | 10-06-2011 |
20110256344 | GLASS SUBSTRATE FOR SEMICONDUCTOR DEVICE COMPONENT AND PROCESS FOR PRODUCING GLASS SUBSTRATE FOR SEMICONDUCTOR DEVICE COMPONENT - It is an object of the present invention to provide a glass substrate having plural through-holes which is not likely to peel from a silicon wafer, even though laminated on and jointed to a the silicon wafer and then subjected to heat treatment. | 10-20-2011 |
20110301015 | PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO | 12-08-2011 |
20110314868 | METHOD FOR PRODUCING GLASS BODY AND METHOD FOR PRODUCING OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention relates to a method for producing a glass body containing: hydrolyzing a silicon compound and a compound containing a metal serving as a dopant, in a flame projected from a burner to form glass fine particles; and depositing and growing the formed glass fine particles on a base material, in which a raw material mixed gas containing a gas of the silicon compound, a gas of the compound containing a metal serving as a dopant, and either one of a combustible gas and a combustion supporting gas is fed into a central nozzle (A) positioning in the center of the burner; the other gas of the combustible gas and the combustion supporting gas is fed into a nozzle (B) different from the central nozzle (A) of the burner; a combustible gas or a combustion supporting gas is arbitrarily fed into a nozzle different from the nozzles (A) and (B); and a flow rate of the raw material mixed gas is 50% or more and not more than 90% of the largest flow rate among flow rate(s) of the combustible gas(ses) and the combustion supporting gas(ses) fed from other nozzle or nozzles than the central nozzle (A). | 12-29-2011 |
20120100341 | METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL - The present invention relates to a process for production of a TiO | 04-26-2012 |
20120121857 | METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL - The present invention relates to a process for production of a TiO | 05-17-2012 |
20120149543 | TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention relates to a TiO | 06-14-2012 |
20120205343 | METHOD FOR PRODUCING SILICA-BASED GLASS SUBSTRATE FOR IMPRINT MOLD, AND METHOD FOR PRODUCING IMPRINT MOLD - The present invention relates to a method for producing a silica glass substrate for an imprint mold, containing: obtaining a glass body from a glass-forming raw material containing an SiO | 08-16-2012 |
20120238434 | SILICA GLASS CONTAINING TIO2 - The present invention relates to a TiO | 09-20-2012 |
20120264584 | SUBSTRATE FOR EUVL OPTICAL MEMBER - The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO | 10-18-2012 |
20120292793 | PROCESS FOR PRODUCING ARTICLE HAVING FINE CONCAVE AND CONVEX STRUCTURE ON SURFACE - The present invention relates to a method for producing an article having a fine concave and convex structure on a surface thereof, comprising the following steps (i) to (iii): (i) step of sandwiching a photocurable composition between a mold having an inverted structure of the fine concave and convex structure on a surface thereof and a substrate; (ii) step of irradiating the photocurable composition with light; and (iii) step of separating the mold from the cured product to obtain an article comprising the substrate having on a surface thereof the cured product having the fine concave and convex structure on a surface thereof, in which the mold contains TiO | 11-22-2012 |
20130034687 | GLASS SUBSTRATE FOR FORMING THROUGH-SUBSTRATE VIA OF SEMICONDUCTOR DEVICE - A glass substrate for forming a through-substrate via of a semiconductor device includes a plurality of penetration holes. In the glass substrate, an α-count is 0.05 c/cm | 02-07-2013 |
20130123092 | TIO2-CONTAINING QUARTZ GLASS SUBSTRATE AND METHOD FOR PRODUCING SAME - The present invention relates to a TiO | 05-16-2013 |
20130149494 | TiO2-CONTAINING QUARTZ-GLASS SUBSTRATE FOR AN IMPRINT MOLD AND MANUFACTURING METHOD THEREFOR - The present invention relates to a TiO | 06-13-2013 |
20130274086 | ALKALI FREE GLASS AND METHOD FOR PRODUCING ALKALI FREE GLASS - The present invention relates to an alkali-free glass having a strain point of 725° C. or higher, an average thermal expansion coefficient at from 50 to 300° C. of from 30×10 | 10-17-2013 |
20130324389 | GLASS COMPOSITION, GLASS SUBSTRATE FOR SOLAR CELLS USING GLASS COMPOSITION, AND GLASS SUBSTRATE FOR DISPLAY PANEL - The present invention relates to a glass composition including, in terms of mol % on the basis of oxides: from 55 to 70% of SiO | 12-05-2013 |
20140017500 | CHEMICALLY STRENGTHENED GLASS FOR DISPLAY DEVICE - The present invention relates to a chemically strengthened glass for a display device, having a visible light transmittance Tva of 50% or more and less than 91% at a thickness of 1 mm using A light source, and an excitation purity Pe of less than 0.5% at a thickness of 1 mm. | 01-16-2014 |
20140102144 | FLOAT GLASS FOR CHEMICAL STRENGTHENING - A float glass for chemical strengthening, having a bottom surface to contact a molten metal during molding and a top surface facing the bottom surface. An absolute value of a difference between a normalized hydrogen concentration at a depth of 5 to 10 μm that is a value obtained by dividing a hydrogen concentration at a depth of 5 to 10 μm by a hydrogen concentration at a depth of 50 to 55 μm in the top surface and the normalized hydrogen concentration at a depth of 5 to 10 μm in the bottom surface is 0.35 or less. | 04-17-2014 |
20140170505 | METHOD OF MANUFACTURING LITHIUM ION CONDUCTIVE SOLID ELECTROLYTE AND LITHIUM-ION SECONDARY BATTERY - A method of manufacturing a lithium ion conductive solid electrolyte includes (a) a step of preparing an object to be processed including a crystalline material, that includes alkali metal other than lithium and whose ionic conductivity at room temperature is greater than or equal to 1×10 | 06-19-2014 |
20140242391 | GLASS PLATE TO BE TEMPERED - To provide a glass plate to be tempered, which has a low thermal expansion coefficient at relatively low temperature, and which can have a sufficiently high surface compression stress by a conventional heat tempering process, even when it is thin. A glass plate to be tempered, which contains B | 08-28-2014 |
20140287905 | METHOD FOR MANUFACTURING ALKALI-FREE GLASS - A method for manufacturing an alkali-free glass includes heating the glass raw material at a temperature of 1,400 to 1,800° C. in a melting furnace to thereby prepare a molten glass, and forming the molten glass into a sheet shape, wherein heating by combustion flame of a burner and electrical heating of the molten glass by a heating electrode arranged so as to be dipped in the molten glass in the melting furnace are used in combination in the heating in the melting furnace, and when an electrical resistivity of the molten glass at 1,400° C. is Rg (Ωcm) and an electrical resistivity of a refractory constituting the melting furnace at 1,400° C. is Rb (Ωcm), the glass raw material and the refractory are selected so as to satisfy Rb>Rg. | 09-25-2014 |
20140366581 | PRODUCTION METHOD FOR NON-ALKALI GLASS - The present invention relates to a production method for a non-alkali glass, containing putting glass raw materials in a melting furnace, heating to a temperature of 1,350 to 1,750° C. to prepare a molten glass, and forming the molten glass into a sheet shape by float method, in which the heating in the melting furnace concurrently utilizes heating by combustion flame of burners and electrical heating of the molten glass by heating electrodes arranged so as to be dipped in the molten glass in the melting furnace, and in which when electrical resistivity at 1,350° C. of the molten glass is represented by Rg (Ωcm) and electrical resistivity at 1,350° C. of a refractory constituting the melting furnace is represented by Rb (Ωcm), the glass raw materials and the refractory are selected so as to achieve Rb>Rg. | 12-18-2014 |
20150045201 | NON-ALKALI GLASS AND METHOD FOR PRODUCING SAME - The present invention relates to a non-alkali glass having a strain point of 710° C. or higher, an average thermal expansion coefficient at from 50 to 300° C. of from 30×10 | 02-12-2015 |
20150045203 | NON-ALKALI GLASS AND METHOD FOR PRODUCING SAME - The present invention relates to a non-alkali glass having a strain point of from 710° C. to lower than 725° C., an average thermal expansion coefficient at from 50 to 300° C. of from 30×10 | 02-12-2015 |
20150087494 | ALKALI-FREE GLASS AND METHOD FOR PRODUCING SAME - The present invention relates to an alkali-free glass having a strain point of 710° C. or higher, an average thermal expansion coefficient at from 50 to 350° C. of from 30×10 | 03-26-2015 |
20150087495 | ALKALI-FREE GLASS AND METHOD FOR PRODUCING SAME - The present invention relates to an alkali-free glass having a strain point of 680 to 735° C., an average thermal expansion coefficient at from 50 to 350° C. of from 30×10 | 03-26-2015 |
Patent application number | Description | Published |
20090208760 | ENERGY-TRANSMITTING OR ULTRAVIOLET LIGHT-TRANSMITTING OPTICAL FIBER PREFORM AND PRODUCTION PROCESS THEREOF - The present invention is to provide an optical fiber preform suitable for the production of an energy-transmitting or ultraviolet light-transmitting optical fiber, which has an excellent transmittance of a high-energy light of 50 KW/cm | 08-20-2009 |
20100028787 | SUBSTRATE FOR EUV MASK BLANKS - A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided. | 02-04-2010 |
20100323871 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE - The present invention provides a TiO | 12-23-2010 |
20130034688 | GLASS SUBSTRATE FOR FORMING THROUGH-SUBSTRATE VIA OF SEMICONDUCTOR DEVICE - A glass substrate for forming a through-substrate via of a semiconductor device includes a first surface and a second surface, and penetration holes extending from the first surface to the second surface, wherein at least one of the first and second surfaces is chemically strengthened. | 02-07-2013 |
20130105744 | ULTRAVIOLET TRANSMITTING NEAR INFRARED CUT FILTER GLASS | 05-02-2013 |
20130276480 | METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL - The present invention relates to a process for production of a TiO | 10-24-2013 |
20130288877 | NON-ALKALI GLASS, AND PROCESS FOR PRODUCTION OF NON-ALKALI GLASS - The present invention relates to an alkali-free glass having a strain point of 735° C. or higher, an average thermal expansion coefficient at from 50 to 350° C. of from 30×10 | 10-31-2013 |
20130291597 | METHOD OF CUTTING STRENGTHENED GLASS PLATE - A method of cutting a strengthened glass including a front surface layer and a back surface layer in each of which a compression stress remains, respectively, and an intermediate layer formed between the front surface layer and the back surface layer, in which a tensile stress remains, the method includes: cutting the strengthened glass plate by heating the intermediate layer at an irradiation area of a laser beam at a temperature less than or equal to an annealing point while transmitting 70.0% to 99.8% of the laser beam having a wavelength between 800 to 1100 nm injected into the front surface and moving the irradiation area of the laser beam at a speed greater than or equal to 1.0 mm/sec, so that a crack, which penetrates the strengthened glass plate in a thickness direction of the strengthened glass plate, follows the irradiation area. | 11-07-2013 |
20130291598 | METHOD OF CUTTING STRENGTHENED GLASS PLATE - A method of cutting a strengthened glass including, a front surface layer and a back surface layer each having a remaining compression stress, respectively, and an intermediate layer formed between the front surface layer and the back surface layer, having an internal remaining tensile stress, the method includes heating the intermediate layer at an irradiation area of a laser beam at a temperature less than or equal to an annealing point to generate a tensile stress less than a value of the internal remaining tensile stress of the intermediate layer or a compression stress at the center of the irradiation area for suppressing the propagation of the crack. | 11-07-2013 |
20140005026 | GLASS TO BE TEMPERED | 01-02-2014 |
20150072130 | ALKALI-FREE GLASS SUBSTRATE AND METHOD FOR REDUCING THICKNESS OF ALKALI-FREE GLASS SUBSTRATE - The present invention relates to an alkali-free glass substrate with a thickness of 0.4 mm or less, which has been reduced in thickness by 5 μm or more by a hydrofluoric acid (HF) etching treatment, in which the alkali-free glass substrate contains an alkali-free glass described below, and the alkali-free glass substrate after reduced in thickness has a specific modulus of 32 MNm/kg or more and a photoelastic constant of 31 nm/MPa/cm or less, the alkali-free glass having a strain point of 710° C. or higher, an average thermal expansion coefficient at 50 to 350° C. of from 30×10 | 03-12-2015 |