Seshimo
Hidenori Seshimo, Saitama JP
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20090203691 | Novel 1H-indazole compounds - The present invention provides a novel 1H-indazole compound having an excellent JNK inhibitory action. More specifically, it provides a compound represented by the following formula, a salt thereof or a hydrate of them. | 08-13-2009 |
Hiroyuki Seshimo, Kobe-Shi JP
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20090106774 | INTERPROCESS COMMUNICATION SYSTEM, INTERPROCESS COMMUNICATION CONTROL DEVICE, INTERPROCESS COMMUNICATION CONTROL METHOD, AND COMPUTER PROGRAM PRODUCT - An interprocess communication system comprising: a transmission device; and a reception device connected to the transmission device so as to be able to receive communication data via a network, wherein in the transmission device, a first process, to which a first thread and a plurality of other threads belong, is created, the first thread performing interprocess communication with outside and the plurality of other threads transferring the communication data to the first thread, in the reception device, a second process, to which a second thread and a plurality of other threads belong, is created, the second thread performing interprocess communication with outside and the plurality of other threads receiving the communication data transferred from the second thread, and the first thread transmits, to the second thread, the communication data containing information for identifying a destination thread, is disclosed. An interprocess communication control device and method are also disclosed. | 04-23-2009 |
Hitoshi Seshimo, Tokyo JP
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20100176463 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - In order to provide a technique capable of executing an etching process using a dry etching method and a wet etching method in combination with high processing dimensional accuracy, an interlayer insulating film | 07-15-2010 |
Hitoshi Seshimo, Kanagawa JP
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20110294278 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method for manufacturing a semiconductor device which prevents damage to alignment marks used for alignment between a superjunction structure and process layers at subsequent steps. In the related art, recesses are made in a semiconductor substrate before the formation of the superjunction structure and used as alignment marks and in order to prevent damage to the alignment marks, the alignment marks are covered by an insulating film such as a silicon oxide film during the subsequent process of forming the superjunction structure, but the inventors have found that damage may penetrate the cover film, reach the semiconductor substrate and destroy the marks. In the method according to the invention, alignment marks for alignment between the superjunction structure and process layers at subsequent steps are formed after the formation of the superjunction structure. | 12-01-2011 |
Takehiro Seshimo, Austin JP
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20130344242 | Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers - The use of self-assembled block copolymer structures to produce advanced lithographic patterns relies on control of the orientation of these structures in thin films. In particular, orientation of cylinders and lamellae perpendicular to the plane of the block copolymer film is required for most applications. The preferred method to achieve orientation is by heating. The present invention involves the use of polarity-switching top coats to control block copolymer thin film orientation by heating. The top coats can be spin coated onto block copolymer thin films from polar casting solvents and they change composition upon thermal annealing to become “neutral”. Top coats allow for the facile orientation control of block copolymers which would otherwise not be possible by heating alone. | 12-26-2013 |
Takehiro Seshimo, Austin, TX US
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20130209757 | USING CHEMICAL VAPOR DEPOSITED FILMS TO CONTROL DOMAIN ORIENTATION IN BLOCK COPOLYMER THIN FILMS - The present invention uses vacuum deposited thin films of material to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns. | 08-15-2013 |
20130280497 | Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers - The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging. | 10-24-2013 |
Tatsuya Seshimo, Suwa-Shi JP
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20140285571 | RECORDING APPARATUS - A recording apparatus includes a transportation mechanism that supports and transports a recording medium by a support surface; a recording head that is disposed in a region facing the support surface and is capable of ejecting an ink from a nozzle provided on an ink ejection surface to the recording medium; a suction unit that is capable of sucking the ink inside the nozzle; and a wiping unit that is provided as a separate body from the suction unit and is capable of wiping the ink ejection surface. At least one of the suction unit and the wiping unit is provided on a farther downstream side of the recording medium in a transportation direction than the recording head and a gap between the one and the support surface is wider than a gap between the ink ejection surface and the support surface. | 09-25-2014 |
20140285572 | RECORDING APPARATUS - A recording apparatus includes a transportation mechanism that supports and transports a recording medium by a support surface; a recording head that is disposed in a region facing the support surface and is capable of ejecting an ink from a nozzle provided on an ink ejection surface to the recording medium; a suction unit that is capable of sucking the ink inside the nozzle; and a wiping unit that is provided as a separate body from the suction unit and is capable of wiping the ink ejection surface. The recording head is moved in a direction to be separated from the support surface when sucking the ink inside the nozzle. The suction unit is moved to a suction position facing the ink ejection surface of the recording head. The suction unit is moved below the recording head when wiping the ink ejection surface. | 09-25-2014 |
Tatsuya Seshimo, Asahi-Mura JP
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20080297568 | FLUID SUPPLY SYSTEM AND FLUID EJECTING APPARATUS USING SAME - A liquid supply system including a main tank, a feed pump, a subtank, a negative pressure maintenance mechanism, and a directional control valve. The main tank stores liquid. The feed pump sucks the liquid held in the main tank through a pump suction opening and discharges the liquid through a pump discharge opening. The subtank holds the liquid discharged from the pump discharge opening and supplies the liquid to the liquid ejecting head. The negative pressure maintenance mechanism monitors a supply channel from the subtank to the liquid ejecting head so that the supply channel is opened only when the pressure of a channel to the liquid ejecting head is lower than a predetermined pressure. The directional control valve restrains liquid from flowing from the pump discharge opening to the pump suction opening when the pressure of the pump discharge opening is less than a predetermined pressure. | 12-04-2008 |
20100118084 | FLUID EJECTING APPARATUS - A fluid ejecting apparatus includes: a fluid ejecting head which includes nozzle rows each having a plurality of nozzles and ejects a fluid onto a medium, the fluid ejecting apparatus being capable of performing a flushing operation in which the fluid is ejected to an absorbing member used to absorb the fluid ejected from the nozzles, wherein the absorbing member is a linear member which extends along the nozzle row and is capable of relatively moving to a position retracted from a flying path of the fluid ejected from the nozzles. | 05-13-2010 |
20110080447 | FLUID EJECTING APPARATUS - Provided is a fluid ejecting apparatus including: a fluid ejecting head which includes a nozzle row formed of a plurality of nozzles ejecting a fluid; a linear fluid absorbing member which extends along the nozzle row, and is movable between a position of receiving the fluid ejected from the nozzles and a position retreating from a flying path of the fluid; and a vibration suppressing member which damps vibration of the fluid absorbing member. | 04-07-2011 |