Patent application number | Description | Published |
20090317743 | Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound - A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure. | 12-24-2009 |
20100233626 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R | 09-16-2010 |
20120094236 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND - A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure. | 04-19-2012 |
20120214101 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z | 08-23-2012 |
20120276481 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESIST COMPOSITION - A method of forming a resist pattern, the method including: forming a resist film on a substrate using a resist composition containing a base component (A) that exhibits reduced solubility in an organic solvent under the action of acid, an acid generator component (B) that generates acid upon exposure and a fluorine-containing polymeric compound (F), exposing the resist film, and patterning the resist film by negative tone development using a developing solution containing the organic solvent, thereby forming a resist pattern, wherein the base component (A) contains a resin component (A1) containing a structural unit (a1) derived from an acrylate ester, the dissolution rates of (A1) and (F) in the developing solution are each at least 10 nm/s, and the absolute value of the difference in the dissolution rates of (A1) and (F) in the developing solution is not more than 80 nm/s. | 11-01-2012 |
20130017500 | METHOD OF FORMING RESIST PATTERNAANM Yokoya; JiroAACI Kawasaki-shiAACO JPAAGP Yokoya; Jiro Kawasaki-shi JPAANM Nakamura; TsuyoshiAACI Kawasaki-shiAACO JPAAGP Nakamura; Tsuyoshi Kawasaki-shi JPAANM Shimizu; HiroakiAACI Kawasaki-shiAACO JPAAGP Shimizu; Hiroaki Kawasaki-shi JPAANM Takeshita; MasaruAACI Kawasaki-shiAACO JPAAGP Takeshita; Masaru Kawasaki-shi JPAANM Nito; HidetoAACI Kawasaki-shiAACO JPAAGP Nito; Hideto Kawasaki-shi JPAANM Saito; HirokuniAACI Kawasaki-shiAACO JPAAGP Saito; Hirokuni Kawasaki-shi JP - A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an exposed portion thereof, the base generated from the photo-base generator component upon the exposure and an acid provided to the resist film are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the acid provided to the resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion of the resist film has been dissolved and removed. | 01-17-2013 |
20130078572 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition used in a method of forming a resist pattern including applying a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component to a substrate to form a resist film; subjecting the resist film to exposure; baking after subjecting the resist film to exposure, wherein at an exposed portion of the resist film, the base generated from the photo-base generator component upon exposure and an acid provided to the resist film in advance are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of acid provided to the resist film in advance; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern. | 03-28-2013 |
20130084523 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including: a step (1) in which a resist film is formed by coating a resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution, a photo-base generator component (C) that generates a base upon exposure, an acid supply component (Z) and a compound (F) containing at least one selected from the group consisting of a fluorine atom and a silicon atom and containing no acid decomposable group which exhibits increased polarity by the action of acid on a substrate; a step (2) in which the resist film is subjected to exposure; a step (3) in which baking is conducted after the step (2); and a step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern, and a resist composition used in the step (1). | 04-04-2013 |
20130115555 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - There are provided a method of forming a resist pattern includes: a step ( | 05-09-2013 |
20130177853 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including: step (1) in which a resist composition containing a base component (A) that exhibits increased solubility in an alkali developing solution and a compound represented by general formula (C1) is applied to a substrate to form a resist film, step (2) in which the resist film is subjected to exposure, step (3) in which baking is conducted after step (2), and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern; and the resist composition used in step (1): | 07-11-2013 |
20130189618 | METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including: step (1) in which a resist composition including a base component, a photobase generator component and an acid supply component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to exposure without being subjected to prebaking; step (3) in which baking is conducted after step (2), such that, at an exposed portion of the resist film, the base generated from the photobase generator component upon the exposure and an acid derived from the acid supply component are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of the acid derived from the acid supply component; and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern. | 07-25-2013 |
20130337382 | COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A compound represented by general formula (b1) shown below (in the formula, Y | 12-19-2013 |
20130344436 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition which generates a base upon exposure and exhibits increased solubility in an alkali developing solution under the action of acid, and the resist composition including: a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid; an acidic compound component (G1) including a nitrogen-containing cation having a pKa value of 7 or less and a counteranion; and a buffer component (K) including a nitrogen-containing cation and a counteranion being a conjugate base for the acid having a pKa value of 0 to 5. | 12-26-2013 |
20150147702 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including forming a resist film by coating a resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution, a photo-base generator component (C) that generates a base upon exposure, an acid supply component (Z) and a compound (F) containing at least one selected from the group consisting of a fluorine atom and a silicon atom and containing no acid decomposable group which exhibits increased polarity by the action of acid on a substrate; subjecting the resist film to exposure baking the exposed resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern. | 05-28-2015 |
Patent application number | Description | Published |
20090231388 | WASTE INK ABSORBENT MEMBER, AND WASTE INK CONTAINER AND INK JET RECORDING APPARATUS EQUIPPED WITH WASTE INK ABSORBENT MEMBER - To provide a waste ink absorbing tank, capable, even in the case of utilizing an ink of a high coagulating property, of causing a waste ink absorbent member to efficiently absorb such ink. A waste ink absorbent member has a hole portion corresponding to an introducing position of the waste ink, and the hole portion is opened on a lateral face of the absorbent member. The waste ink, introduced into the hole portion moves in one direction toward the waste ink absorbent member and absorbed therein. | 09-17-2009 |
20100075046 | AQUEOUS INK, AQUEOUS INK SET, INK CARTRIDGE, INK-JET RECORDING APPARATUS, INK-JET RECORDING METHOD, AND IMAGE-FORMING METHOD - An aqueous ink comprises water, a water-insoluble coloring material, and plurality of water-soluble organic solvents and the plurality of water-soluble organic solvents including a good medium or good mediums for the water-insoluble coloring material and a poor medium or poor mediums for the water-insoluble coloring material. The ratio of the content of the poor medium and the content of the good medium is in a specific range. A water-soluble organic solvent showing the maximum Ka value out of respective Ka values of the plurality of water-soluble organic solvents is the poor medium. When the aqueous ink is in contact with a specific reaction liquid, the dissolution state or dispersed state of the water-insoluble coloring material in the ink is made unstable. As a result, an image which has a sufficiently large area factor even with a small amount of ink droplets and is excellent in image density, bleeding resistance, and fixability can be obtained. In addition, the aqueous ink is excellent in storage stability. | 03-25-2010 |
20110076518 | RECORDING MEDIUM - The invention provides a recording medium having 2 or more ink receiving layers on a substrate, wherein an upper layer of the ink receiving layers, which is a layer most distant from the substrate, and a lower layer, which is a layer located just under the upper layer, contain at least one selected from alumina hydrate and alumina, an acid and a hydrophilic binder, the acid contained in the upper layer is a carboxylic acid represented by the general formula [I], and the acid contained in the lower layer is a sulfonic acid represented by the general formula [II]. | 03-31-2011 |
20110104411 | RECORDING MEDIUM - The invention provides a recording medium comprising a substrate and an ink receiving layer that is provided on the substrate and contains alumina hydrate and a binder. A surface of the ink receiving layer is covered with a partial coating formed by a plurality of coatings containing a cationic polyurethane. The plurality of coatings have an average major diameter of 0.03 μm or more and less than 1.00 μm. The partial coating provides a coverage of 10% or more and less than 70% with respect to the surface of the ink receiving layer. | 05-05-2011 |
20110135855 | RECORDING MEDIUM AND METHOD FOR PRODUCING RECORDING MEDIUM - The invention provides a method for producing a recording medium, comprising a step of coating one or more ink receiving layers provided on at least one surface of a substrate with an outermost layer coating liquid to form an outermost layer, an ink receiving layer, of said one or more ink receiving layers, which is nearest to the outermost layer containing alumina hydrate and a binder. The outermost layer coating liquid contains monodispersive and spherical cationic colloidal silica particles having an average particle size of 30 nm or more and 60 nm or less, polyvinyl alcohol having a saponification degree of 75% by mol or more and 85% by mol or less and a viscosity-average polymerization degree of 1,500 or more and 2,200 or less, and cationic polyurethane emulsion particles having an average particle size of 10 nm or more and 100 nm or less. | 06-09-2011 |
20110256324 | INK JET RECORDING MEDIUM - In an ink jet recording medium having at least two ink receiving layers, the total content of boric acid, a borate, and a water-soluble zirconium salt of a lower ink receiving layer located close to a support substrate to the total content of alumina and an alumina hydrate thereof is higher than the total content of boric acid, a borate, and a water-soluble zirconium salt of an upper ink receiving layer located apart from the support substrate to the total content of alumina and an alumina hydrate thereof. | 10-20-2011 |
20110293860 | RECORDING MEDIUM - The invention provides a recording medium having excellent ink absorbency and capable of forming a sharp image thereon. The recording medium has a substrate, and a first layer and an outermost layer provided on the substrate in this order, wherein the first layer contains at least one of alumina and alumina hydrate, the outermost layer contains a pigment and is lower in refractive index than the first layer, and the absolute dry coating amount of the outermost layer is 0.1 g/m | 12-01-2011 |
20120015119 | RECORDING MEDIUM - A recording medium includes an ink-receiving layer on a substrate, in which the ink-receiving layer contains hydrated alumina, a C | 01-19-2012 |
20120070591 | RECORDING MEDIUM - A recording medium includes an ink-receiving layer on a substrate, in which the ink-receiving layer contains a hydrated alumina, an alkylsulfonic acid having 1 to 4 carbon atoms, and at least one salt of a sulfur compound represented by general formula (1) or (2): | 03-22-2012 |
20120094039 | INK JET RECORDING MEDIUM - An ink jet recording medium including a substrate and an ink receiving layer provided on the substrate and composed of two or more layers of at least an upper layer and a lower layer. The ink receiving layer contains polyvinyl alcohol in an amount of 12.7% by mass or more based on the total mass of the ink receiving layer. The upper layer is a layer most distant from the substrate, contains a pigment and polyvinyl alcohol, the pigment containing 90% by mass or more of alumina hydrate, and has a thickness of 3.0-10.0 μm. The lower layer is positioned just under the upper layer, contains a pigment and polyvinyl alcohol, the pigment containing 20% by mass or more of silica, and has a thickness 2.5-10 times larger than that of the upper layer and an average pore radius 0.90-1.30 times larger than that of the upper layer. | 04-19-2012 |
20120207949 | RECORDING MEDIUM - A recording medium includes a support; and an ink-receiving layer, the ink-receiving layer having a lower layer and an upper layer, in which the lower layer contains fine inorganic particles, polyvinyl alcohol, and boric acid, the fine inorganic particles including at least one compound selected from alumina, hydrated alumina, and vapor-phase-process silica, in which the upper layer contains fine inorganic particles, polyvinyl alcohol, and boric acid, the fine inorganic particles including at least one compound selected from alumina and hydrated alumina, in which the lower layer has a boric acid content of 2.0% by mass to 7.0% by mass with respect to polyvinyl alcohol, and in which the upper layer has a boric acid content of 10.0% by mass to 30.0% by mass with respect to polyvinyl alcohol. | 08-16-2012 |
20120207950 | INK JET RECORDING MEDIUM - An ink jet recording medium including a substrate and two or more ink receiving layers provided on the substrate, wherein a first ink receiving layer that is an outermost ink receiving layer of the two or more ink receiving layers and a second ink receiving layer adjacent to the first ink receiving layer contain an alumina pigment, polyvinyl alcohol and boric acid. The first ink receiving layer contains polyvinyl alcohol in an amount of 7.0-10.5% by mass or less based on the alumina pigment and contains boric acid in an amount of 1.1-1.4% by mass or less based on the alumina pigment. The second ink receiving layer contains polyvinyl alcohol in an amount of 10.5-17.0% by mass or less based on the alumina pigment and contains boric acid in an amount of 1.5-2.5% by mass or less based on the alumina pigment. | 08-16-2012 |
20120218345 | WASTE INK ABSORBENT MEMBER, AND WASTE INK CONTAINER AND INK JET RECORDING APPARATUS EQUIPPED WITH WASTE INK ABSORBENT MEMBER - To provide a waste ink absorbing tank, capable, even in the case of utilizing an ink of a high coagulating property, of causing a waste ink absorbent member to efficiently absorb such ink. A waste ink absorbent member has a hole portion corresponding to an introducing position of the waste ink, and the hole portion is opened on a lateral face of the absorbent member. The waste ink, introduced into the hole portion moves in one direction toward the waste ink absorbent member and absorbed therein. | 08-30-2012 |
20120295042 | INKJET RECORDING MEDIUM - An inkjet recording medium includes a support and an ink-receiving layer which is disposed on the support and which contains an alumina pigment and an alkylsulfonic acid having the carbon number of 1 or more and 4 or less. The ink-receiving layer further contains a polymeric compound, a water-soluble zirconium compound, and boric acid or a borate. The polymeric compound is one obtained by cationizing at least one amino group of a product with acid, the product being obtained by the reaction of at least three compounds, that is, (i) a sulfur-containing organic compound containing two or more active hydrogen atoms, (ii) a polyisocyanate compound containing two or more isocyanate groups, and (iii) an amine compound containing two or more active hydrogen atoms. | 11-22-2012 |
20130108809 | RECORDING MEDIUM | 05-02-2013 |
20130129943 | RECORDING MEDIUM - A recording medium includes, in sequence, a support, a first ink-receiving layer, and a second ink-receiving layer, in which a content of a boric acid in the first ink-receiving layer is 2.0% by mass or more and 7.0% by mass or less with respect to a content of a polyvinyl alcohol in the first ink-receiving layer, a content of a boric acid in the second ink-receiving layer is 10.0% by mass or more and 30.0% by mass or less with respect to a content of a polyvinyl alcohol in the second ink-receiving layer, an outermost surface layer of the recording medium has a content of particles of 0.5% by mass or more and 5.0% by mass or less, the particles having an average secondary particle size of 1.0 μm or more and 20.0 μm or less with respect to a content of an inorganic pigment. | 05-23-2013 |
20130196090 | RECORDING MEDIUM - A recording medium includes a base and at least one ink-receiving layer. A first ink-receiving layer that is at least one ink-receiving layer contains inorganic particles having an average primary particle size of 1 μm or less and inorganic particles coated with a metal oxide. The inorganic particles coated with the metal oxide have an average primary particle size of 15.0 μm or more. When the maximum of a FLOP value of the recording medium is denoted by FLOP | 08-01-2013 |
Patent application number | Description | Published |
20140004281 | RECORDING MEDIUM | 01-02-2014 |
20140004282 | RECORDING MEDIUM | 01-02-2014 |
20140044898 | RECORDING MEDIUM - A recording medium includes, in sequence, a support, a first ink-receiving layer containing a first inorganic particle and a first binder, a second ink-receiving layer containing a second inorganic particle and a second binder, and a third ink-receiving layer which is an outermost surface layer and contains a third inorganic particle, a third binder, and a particle different from the third inorganic particle and having an average secondary particle size of 1.0 to 20.0 μm. A mass ratio of a content of the first binder to a content of the first inorganic particle is larger than a mass ratio of a content of the second binder to a content of the second inorganic particle. A content of the particle having the specific average secondary particle size is 0.5% by mass or more with respect to a content of the third inorganic particle. | 02-13-2014 |
20140099453 | RECORDING MEDIUM - The invention provides a recording medium having a substrate, a first ink receiving layer and a second link receiving layer which is an outermost layer in this order, wherein the first ink receiving layer contains alumina hydrate and polyvinyl alcohol, the second ink receiving layer contains alumina hydrate, polyvinyl alcohol, a cationic polymer particle and a zirconium compound, and the thickness of the second ink receiving layer is 3 μm or more and 10 μm or less. | 04-10-2014 |
20140106092 | RECORDING MEDIUM - A recording medium includes, in sequence, a support; a first ink-receiving layer including an inorganic particle, a water-soluble polymer having a hydroxyl group, a water-soluble polymer not having a hydroxyl group, and a boric acid compound; and a second ink-receiving layer including an inorganic particle, a water-soluble polymer having a hydroxyl group, and a boric acid compound. The second ink-receiving layer does not include the water-soluble polymer not having the hydroxyl group, or the second ink-receiving layer includes the water-soluble polymer not having the hydroxyl group but the content of the water-soluble polymer not having the hydroxyl group relative to that of the inorganic particle in the second ink-receiving layer is smaller than the content of the water-soluble polymer not having the hydroxyl group relative to that of the inorganic particle in the first ink-receiving layer. | 04-17-2014 |
20140234559 | RECORDING MEDIUM - A recording medium includes a substrate and ink receiving layers including a first ink receiving layer and a second ink receiving layer in that order. The first ink receiving layer contains first inorganic particles including alumina and silica particles, and a first binder. In the first ink receiving layer, the mass ratio of the first binder to the first inorganic particles is from 0.13 to 0.33, and the mass ratio of the alumina particles to the silica particles is from 0.43 to 2.33. The second ink receiving layer contains second inorganic particles and a second binder. The mass ratio of the second binder to the second inorganic particles is from 0.05 to 0.30. The second ink receiving layer has a thickness from 2 μm to 10 μm, and the total thickness of ink receiving layers is from 10 μm to 30 μm. | 08-21-2014 |
20150174936 | RECORDING MEDIUM - A recording medium including, in the following order, a base, an ink-receiving layer containing inorganic particles, and a protective layer. The protective layer contains colloidal silica, gas phase process silica, and at least one kind of particles selected from resin particles and wet process silica particles. The average particle size of the at least one kind of particles is 1.5 μm or more. | 06-25-2015 |
20150174937 | RECORDING MEDIUM AND PROCESS FOR PRODUCING THE SAME - A recording medium including a first resin layer, a porous undercoating layer and a first ink-receiving layer provided in this order on one surface of a base and including a second resin layer and a second ink-receiving layer provided in this order on the other surface of the base, wherein 60° specular glossinesses of a surface of the first resin layer closer to the first ink-receiving layer and a surface of the second resin layer closer to the second ink-receiving layer are each 65% or more, and the porous undercoating layer has a thickness of 3 μm or less. | 06-25-2015 |
20150283841 | RECORDING MEDIUM - A recording medium includes a substrate, a first ink receiving layer and a second ink receiving layer in that order. The first ink receiving layer contains at least one inorganic pigment selected from the group consisting of alumina, hydrated alumina and fumed silica, polyvinyl alcohol, and a boric acid compound. The second ink receiving layer contains fumed silica, particles having an average particle size in a specific range, polyvinyl alcohol, and a boric acid compound. The boric acid compound content in the first ink receiving layer is in a predetermined range, and the boric acid compound content in the second ink receiving layer is in a predetermined range. The particle content in the second ink receiving layer is in a predetermined range. | 10-08-2015 |