Patent application number | Description | Published |
20100167203 | Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same - A resist underlayer composition and a method of manufacturing a semiconductor integrated circuit device, the composition including a solvent and an organosilane polymer, the organosilane polymer being a condensation polymerization product of at least one first compound represented by Chemical Formulae 1 and 2 and at least one second compound represented by Chemical Formulae 3 to 5. | 07-01-2010 |
20100167212 | RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME - A resist underlayer composition and a method of manufacturing a semiconductor integrated circuit device, the resist underlayer composition including a solvent and an organosilane-based polymer, the organosilane-based polymer being a polymerization product of at least one first compound represented Chemical Formulae 1 to 3 and at least one second compound represented by Chemical Formulae 4 and 5. | 07-01-2010 |
20100279509 | Silicon-based hardmask composition and process of producing semiconductor integrated circuit device using the same - A silicon-based hardmask composition, including an organosilane polymer represented by Formula 1: | 11-04-2010 |
20110129981 | FILLER FOR FILLING A GAP AND METHOD FOR MANUFACTURING SEMICONDUCTOR CAPACITOR USING THE SAME - A filler for filling a gap includes a hydrogenated polysiloxazane having an oxygen content of about 0.2 to about 3 wt %. A chemical structure of the hydrogenated polysiloxazane includes first, second, and third moieties represented by the following respective Chemical Formulas 1-3: | 06-02-2011 |
20110156185 | Resin Composition for Protection Layer of Color Filter, Protection Layer of Color Filter Using Same and Image Sensor Including Same - Disclosed is a resin composition for a protective layer of a color filter including an acrylate-based resin including a repeating unit represented by each of Chemical Formulae 1 to 3, a melamine-based resin represented by Chemical Formula 4, a thermal acid generator (TAG), and a solvent. | 06-30-2011 |
20120164382 | COMPOSITION FOR FORMING A SILICA LAYER, METHOD OF MANUFACTURING THE COMPOSITION, SILICA LAYER PREPARED USING THE COMPOSITION, AND METHOD OF MANUFACTURING THE SILICA LAYER - A composition for forming a silica layer, a method of manufacturing the composition, a silica layer prepared using the composition, and a method of manufacturing the silica layer, the composition including hydrogenated polysilazane, hydrogenated polysiloxazane, or a combination thereof, wherein a concentration of a sum of hydrogenated polysilazane and hydrogenated polysiloxazane having a weight average molecular weight, reduced to polystyrene, of greater than or equal to about 50,000 is about 0.1 wt % or less, based on a total amount of the hydrogenated polysilazane and hydrogenated polysiloxazane. | 06-28-2012 |
20120177829 | COMPOSITION FOR FORMING SILICA BASED INSULATING LAYER, METHOD FOR MANUFACTURING COMPOSITION FOR FORMING SILICA BASED INSULATING LAYER, SILICA BASED INSULATING LAYER AND METHOD FOR MANUFACTURING SILICA BASED INSULATING LAYER - A composition for forming silica-based insulation layer includes a hydrogenated polysiloxazane including a moiety represented by the following Chemical Formula 1 and a moiety represented by the following Chemical Formula 2, and having a chlorine concentration of about 1 ppm or less: | 07-12-2012 |
20120267766 | RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING THE SAME - A resist underlayer composition includes a solvent and an organosilane condensation polymerization product, the organosilane condensation polymerization product including about 40 to about 80 mol % of a structural unit represented by the following Chemical Formula 1, | 10-25-2012 |
20120270143 | RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES USING THE SAME - A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product including about 10 to about 40 mol % of a structural unit represented by Chemical Formula 1: | 10-25-2012 |
20120270981 | RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING THE SAME - A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3, | 10-25-2012 |
20120270998 | RESIN COMPOSITION FOR TRANSPARENT ENCAPSULATION MATERIAL AND ELECTRONIC DEVICE FORMED USING THE SAME - A resin composition for a transparent encapsulation material, the resin composition including a polysiloxane obtained by copolymerization of a first silicon compound represented by the following Chemical Formula 1 and a second silicon compound including a compound represented by the following Chemical Formula 2, | 10-25-2012 |
20120282776 | PHOTORESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME - A photoresist underlayer composition includes a solvent, and a polysiloxane resin represented by Chemical Formula 1: | 11-08-2012 |
20130017662 | FILLER FOR FILLING A GAP, METHOD OF PREPARING THE SAME AND METHOD OF MANUFACTURING SEMICONDUCTOR CAPACITOR USING THE SAMEAANM PARK; Eun-SuAACI Uiwang-siAACO KRAAGP PARK; Eun-Su Uiwang-si KRAANM Kim; Bong-HwanAACI Uiwang-siAACO KRAAGP Kim; Bong-Hwan Uiwang-si KRAANM Lim; Sang-HakAACI Uiwang-siAACO KRAAGP Lim; Sang-Hak Uiwang-si KRAANM Kwak; Taek-SooAACI Uiwang-siAACO KRAAGP Kwak; Taek-Soo Uiwang-si KRAANM Bae; Jin-HeeAACI Uiwang-siAACO KRAAGP Bae; Jin-Hee Uiwang-si KRAANM Yun; Hui-ChanAACI Uiwang-siAACO KRAAGP Yun; Hui-Chan Uiwang-si KRAANM Kim; Sang-KyunAACI Uiwang-siAACO KRAAGP Kim; Sang-Kyun Uiwang-si KRAANM Lee; Jin-WookAACI Uiwang-siAACO KRAAGP Lee; Jin-Wook Uiwang-si KR - A filler for filling a gap includes a compound represented by the following Chemical Formula 1. | 01-17-2013 |
20130037921 | RESIST UNDERLAYER COMPOSITION AND PROCESS OF PRODUCING INTEGRATED CIRCUIT DEVICES USING SAME - A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product of hydrolyzed products produced from a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, and a compound represented by Chemical Formula 3. | 02-14-2013 |
20130143363 | ADHESIVE COMPOSITION FOR SEMICONDUCTOR AND ADHESIVE FILM COMPRISING THE SAME - An adhesive film for a semiconductor may include about 60 wt % to about 80 wt % of a thermoplastic resin based on a total solid content of the adhesive film, a phenolic curing agent, and an amine curing agent, and the adhesive film may have a storage modulus of about 2 MPa or more and a reaction curing rate of about 50% or more when cured at 150° C. for 20 minutes. | 06-06-2013 |
20130171564 | Positive Photosensitive Resin Composition, and Display Device and Organic Light Emitting Device Using the Same - Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. | 07-04-2013 |
20130171568 | Positive Photosensitive Resin Composition, and Photosensitive Resin Layer and Display Device Using the Same - Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same. | 07-04-2013 |
20140170562 | Positive Photosensitive Resin Composition - Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm. | 06-19-2014 |
20140187017 | PROCESS OF PREPARING A GAP FILLER AGENT, A GAP FILLER AGENT PREPARED USING SAME, AND A METHOD FOR MANUFACTURING SEMICONDUCTOR CAPACITOR USING THE GAP FILLER AGENT - A method of preparing a gap filler agent includes adding a halosilane to a basic solvent, and, to the basic solvent and the halosilane, adding ammonia in an amount of about 50 to about 70 parts by weight based on 100 parts by weight of the halosilane at a rate of about 1 g/hr to about 15 g/hr. | 07-03-2014 |
20140315367 | RINSE LIQUID FOR INSULATING FILM AND METHOD OF RINSING INSULATING FILM - A rinse liquid for an insulation layer, the rinse liquid including a solvent represented by the following Chemical Formula 1: | 10-23-2014 |
20140346391 | POLYSILOXANE HYDROXIDE THIN-FILM RINSE SOLUTION, AND POLYSILOOXAZINE HYDROXIDE THIN-FILM PATTERN-FORMING METHOD USING THE SAME - Provided is a rinse solution for a hydrogenated polysiloxazane thin film including an additive selected from an alcohol-based solvent, an ester-based solvent, a silanol-based solvent, an alkoxysilane-based solvent, an alkylsilazane-based solvent, and a combination thereof in an amount of 0.01 wt % to 7 wt % based on the total amount of the rinse solution. | 11-27-2014 |
Patent application number | Description | Published |
20080212932 | SYSTEM FOR MANAGING VIDEO BASED ON TOPIC AND METHOD USING THE SAME AND METHOD FOR SEARCHING VIDEO BASED ON TOPIC - A video management method and system based on a topic, and a video search method based on a topic. The video management system includes: a video topic management unit extracting a topic from information associated with a video, storing the extracted topic, and monitoring the video associated with the stored topic; a video storage management unit storing the video and information associated with the video, and managing a storage space based on the topic which is stored in the video topic management unit; and a topic video management unit generating a topic video of the monitored video when the video associated with the stored topic is monitored, and providing a search function and a navigation function of the video which is stored in the video storage management unit. | 09-04-2008 |
20090123021 | System, method, and medium indexing photos semantically - A system, method and medium indexing a plurality of photos semantically based on a user's annotation. The method includes analyzing the user's annotation and extracting a shared index from the user's annotation, detecting a situation change in the plurality of photos, and indexing the plurality of photos according to the situation change based on the shared index. | 05-14-2009 |
20100085735 | OPTICAL SHEETS - Disclosed is an optical sheet for use in liquid crystal displays, which simultaneously functions to uniformly diffuse light emitted from a light guide plate and a diffusion plate and to increase brightness, decreases the loss of light, and enables the fabrication of thinner liquid crystal displays. | 04-08-2010 |
20110268422 | Method, system, and medium for providing broadcasting service using home server and mobile phone - A method, system, and medium of providing various types of broadcast services such as a record, a summary, a navigation and a real-time event service with respect to a broadcast content, utilizing a home server, according to a user's request. A broadcast service providing method includes: storing broadcast summary data, navigation data and real-time event data which is generated by analyzing received broadcast data according to a broadcast record request from a user's portable device, in a database; and providing the user's portable device with a streaming service with respect to the stored broadcast summary data, the navigation data and the real-time event data, according to a summary selection request from the user's portable device. | 11-03-2011 |
20120039515 | Method and system for classifying scene for each person in video - Described is a method of classifying a scene for each person in a video, the method including: detecting a face within input video frames; detecting a shot change of the input video frames; extracting a person representation frame in the shot; performing a person clustering in the extracted person representation frame based on time information; detecting a scene change by separating a person portion from a background based on face extraction information, and comparing the person portion and the background; and merging similar clusters from the extracted person representation frame and performing a scene clustering for each person. | 02-16-2012 |
20120191737 | VIRTUAL WORLD PROCESSING DEVICE AND METHOD - Disclosed are a virtual world processing device and method. By way of example, data collected from the real world is converted to binary form data which is then transmitted, or is converted to XML data, or the converted XML data is further converted to binary form data which is then transmitted, thereby allowing the data transmission rate to be increased and a low bandwidth to be used, and, in the case of a data-receiving adaptation RV engine, the complexity of the adaptation RV engine can be reduced as there is no need to include an XML parser. | 07-26-2012 |
20130103703 | SYSTEM AND METHOD FOR PROCESSING SENSORY EFFECTS - A system and method for processing sensory effects. According to an embodiment of the present disclosure, sensory effects included in content may be implemented in the real world by generating command data for controlling a sensory device based on sensory effect information and specific information about the sensory device. In addition, the data transmission rate is high and a low bandwidth may be used by encoding metadata as binary before transmission, or encoding as XML before transmission, or encoding as XML and then further encoding as binary before transmission. | 04-25-2013 |
20130112914 | Slurry Composition For Polishing And Method Of Manufacturing Phase Change Memory Device Using The Same - A slurry composition includes an abrasive agent, an oxidizing agent, and a first adsorption inhibitor including a polyethylene oxide copolymer. A method of manufacturing a phase change memory device may include providing a substrate including an interlayer insulating film having a trench and a phase change material layer on the interlayer insulating film filling the trench, and performing chemical mechanical polishing on the phase change material layer using the slurry composition to form a phase change material pattern layer. | 05-09-2013 |
20140349797 | ENDLESS BELT - Disclosed herein is a method of manufacturing an endless belt, including the steps of: reacting a diamine monomer with a dianhydride monomer in a reactor filled with a conductive filler-dispersed liquid to obtain a reaction product, aging the reaction product and then discharging the aged reaction product from the reactor to prepare a semiconductive polyamic acid solution having a molecular weight distribution (Mw/Mn) of 1.3˜3.0 and a weight average molecular weight (Mw) of 30,000˜300,000; and applying the semiconductive polyamic acid solution to a seamless mold and completing an imidization reaction to obtain a polyimide film. | 11-27-2014 |
20140367151 | TRANSPARENT ELECTRODE - Disclosed herein is a transparent electrode, including: a colorless transparent polyimide film substrate; and a conductive layer formed on the substrate and including a conductive material containing carbon nanotubes, wherein the conductive layer includes a polymer binder. The transparent electrode is advantageous in that carbon nanotubes strongly adhere to a plastic substrate and the transparent electrode exhibits environmental stability. | 12-18-2014 |
20140374222 | ENDLESS BELT HAVING MEANDERING PREVENTION GUIDE - Disclosed herein is an endless belt having a meandering prevention guide, wherein the meandering prevention guide is heat-treated, and thermoplastic double-sided adhesive tape exhibiting adhesivity using heat is applied to the meandering prevention guide. | 12-25-2014 |
20150021513 | CMP SLURRY COMPOSITION FOR POLISHING AN ORGANIC LAYER AND METHOD OF FORMING A SEMICONDUCTOR DEVICE USING THE SAME - A chemical mechanical polishing (CMP) slurry composition for polishing an organic layer and a method of forming a semiconductor device using the same are disclosed. The CMP slurry composition may include from 0.001% to 5% by weight of oxide-polishing particles; from 0.1% to 5% by weight of an oxidant; from 0% to 5% by weight of a polishing regulator; from 0% to 3% by weight of a surfactant; from 0% to 3% by weight of a pH regulator; and from 79% to 99.889% by weight of deionized water. The use of the CMP slurry composition makes it possible to allow a silicon-free organic layer to be polished with a selectivity higher than 6:1 with respect to an oxide layer. | 01-22-2015 |
Patent application number | Description | Published |
20110241175 | HARDMASK COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PROCESS FOR PRODUCING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - A hardmask composition for forming a resist underlayer film, a process for producing a semiconductor integrated circuit device, and a semiconductor integrated circuit device, the hardmask composition including an organosilane polymer, and a stabilizer, the stabilizer including one of acetic anhydride, methyl acetoacetate, propionic anhydride, ethyl-2-ethylacetoacetate, butyric anhydride, ethyl-2-ethylacetoacetate, valeric anhydride, 2-methylbutyric anhydride, nonanol, decanol, undecanol, dodecanol, propylene glycol propyl ether, propylene glycol ethyl ether, propylene glycol methyl ether, propylene glycol, phenyltrimethoxysilane, diphenylhexamethoxydisiloxane, diphenylhexaethoxydisiloxane, dioctyltetramethyldisiloxane, hexamethyltrisiloxane, tetramethyldisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, hexamethyldisiloxane, and mixtures thereof. | 10-06-2011 |
Patent application number | Description | Published |
20150041959 | HARDMASK COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PROCESS FOR PRODUCING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - A hardmask composition for forming a resist underlayer film, a process for producing a semiconductor integrated circuit device, and a semiconductor integrated circuit device, the hardmask composition including an organosilane polymer, a stabilizer, the stabilizer including methyl acetoacetate, ethyl-2-ethylacetoacetate, nonanol, decanol, undecanol, dodecanol, acetic acid, phenyltrimethoxysilane, diphenylhexamethoxydisiloxane, diphenylhexaethoxydisiloxane, dioctyltetramethyldisiloxane, tetramethyldisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, hexamethyldisiloxane, or mixtures thereof, and a solvent, wherein the solvent includes acetone, tetrahydrofuran, benzene, toluene, diethyl ether, chloroform, dichloromethane, ethyl acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, ethyl lactate, γ butyrolactone, methyl isobutyl ketone, or mixtures thereof, the solvent is present in an amount of about 70 to about 99.9% by weight, based on a total weight of the composition, and the stabilizer is present in an amount of about 0.0001 to about 3.0% by weight, based on a total weight of the composition. | 02-12-2015 |