Patent application number | Description | Published |
20100165227 | TFT-LCD ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - The present invention relates to a method of manufacturing an array substrate of TFT-LCD. The method includes the following steps. In step | 07-01-2010 |
20100214518 | TFT-LCD ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor liquid crystal display (TFT-LCD) array substrate and a method for forming the same. The thin film transistor liquid crystal display (TFT-LCD) device, comprising gate lines and data lines that intersecting with each other to define pixel regions, wherein a pixel electrode and a thin film transistor are formed in each of the pixel regions, and wherein the data lines each have a mirror-symmetry structure so that coupling capacitance between one data line and the pixel electrodes in an upper adjacent pixel region and a lower pixel region that are adjacent changes oppositely. | 08-26-2010 |
20100220254 | TFT-LCD ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A thin film transistor liquid crystal display (TFT-LCD) array substrate comprising a gate line and a data line formed on a base substrate. The gate line and the data line intersect with each other to define a pixel region, in which a pixel electrode and a thin film transistor (TFT) are formed, and a first insulating layer and a second insulating layer are interposed between the gate line and the data line, and the pixel electrode is disposed between the first insulating layer and the second insulating layer. A method of manufacturing a TFT-LCD is also disclosed. | 09-02-2010 |
20100245735 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - An array substrate comprises a substrate; a plurality of pixel regions in a matrix arrangement on the substrate, and a plurality of signal lines disposed on the substrate and extended parallel to each other. Each pixel region comprises a pixel electrode and a drive switch. At least part of a first signal line and a second signal line of the plurality of the signal lines connected to pixel electrodes in adjacent lines of the pixel region matrix are formed between the pixel electrodes in adjacent lines of the pixel regions matrix. The first signal line and the second signal line are at least partially overlapped in a direction perpendicular to the substrate. An insulating layer is disposed between the overlapped portion of the first and second signal line. | 09-30-2010 |
20100295807 | TOUCH SCREEN, COLOR FILTER SUBSTRATE AND MANUFACTURING METHODS THEREOF - A touch screen and a manufacturing method thereof, and a color filter substrate and a manufacturing method thereof are provided in the invention. The touch screen comprises a substrate, a plurality of touch regions defined by a plurality of first signal lines and a plurality of second signal lines are provided on the substrate. In each touch region, the first signal line is connected with a first piezoelectric switch, the second signal line is connected with a second piezoelectric switch, when the touch region is touched by a force the first piezoelectric switch and the second piezoelectric switch are turned on and transfer voltage signals respectively via the first signal line and the second signal line to determine the coordinate of the touched touch region. | 11-25-2010 |
20110007234 | TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor liquid crystal display (TFT-LCD) array substrate comprises a gate line, a data line, a pixel electrode and a thin film transistor. The pixel electrode and the thin film transistor are formed in a pixel region defined by intersecting of the gate line and the data line, and the thin film transistor comprises a gate electrode, a semiconductor layer, a source electrode and a drain electrode. Two separate parts of the surface of the semiconductor layer are treated by a surface treatment to form into an ohmic contact layer, and the source electrode and the drain electrode are connected with the semiconductor layer through the ohmic contact layer in the two separate parts, respectively. | 01-13-2011 |
20110063239 | TOUCH SCREEN, COLOR FILTER SUBSTRATE AND MANUFACTURING METHOD THEREOF - A touch screen, a color filter substrate and a manufacture method thereof are provided in the embodiment of the invention. The touch screen comprises a substrate; a plurality of first signal lines and a plurality of second signal lines forming on the substrate and intersecting with each other to define a plurality of touch regions; a plurality of sensing electrodes, each of the sensing electrodes being connected between one first signal line and one second signal line. Charges are generated on at least one of the sensing electrodes when the sensing electrode is pressed, so that detecting signals for determining coordinates of a touch point are generated on the first signal line and the second signal line that correspond to the sensing electrode. | 03-17-2011 |
20110063538 | TFT-LCD ASSEMBLY SUBSTRATE, LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME - A TFT-LCD assembly substrate comprises an array structure layer, comprising a plurality of first signal lines and a plurality of second signal lines. Adjacent first signal lines and adjacent second signal lines cross each other to define a plurality of combination pixel regions, and each of the combination pixel regions comprises two pixel regions juxtaposed along a direction of the first signal line, and there are a thin film transistor and a pixel electrode formed in one pixel region of the two pixel regions and there is a common electrode formed in the other pixel region. | 03-17-2011 |
20110069247 | TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A method of manufacturing a thin film transistor liquid crystal display (TFT-LCD) array substrate comprises: forming a gate line and a gate electrode on a base substrate, and then depositing a gate insulating layer on the base substrate; forming an active layer, a data line, a source electrode, and a drain electrode on the gate insulating layer, and removing the gate insulating layer in the region other than the regions of the active layer, the data line, the source electrode and the drain electrode; forming a first via hole, a second via hole and a third via hole in a photoresist layer by an exposing and developing process; and forming a pixel electrode, a first connection electrode and a second connection electrode on the photosensitive resin layer. The pixel electrode is connected with the drain electrode through the third via hole. | 03-24-2011 |
20110073864 | ARRAY SUBSTRATE AND MANUFACTURING METHOD - A method of manufacturing an array substrate comprising: forming a data line and a gate line which are crossed with each other and a gate electrode on a base substrate, and the data line is discontinuously disposed so as to be separated from the gate line or the gate line is discontinuously disposed so as to be separated from the data line; forming an active layer and a gate insulating layer including bridge via holes and a source electrode via hole on the base substrate, and the bridge via holes are located at positions respectively corresponding to adjacent discontinuous sections of the data line or adjacent discontinuous sections of the gate line, and the source electrode via hole is located at a position corresponding to the data line; and forming a pixel electrode, a source electrode, a drain electrode and a bridge line on the base substrate, and the pixel electrode and the drain electrode are formed integrally, and the source electrode is connected to the data line through the source electrode via hole, and the bridge line connects the adjacent discontinuous sections of the data line or the adjacent discontinuous sections of the gate line through the bridge via holes. | 03-31-2011 |
20110073867 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - An array substrate comprises a substrate provided with a circuit pattern and covering layers that cover the upper surfaces and side surfaces of respective portions of the circuit pattern. | 03-31-2011 |
20110273639 | ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND LIQUID CRYSTAL DISPLAY - A manufacturing method of an array substrate comprises forming gate lines, data lines, pixel electrodes, and gate electrodes, active layer members, source electrodes, drain electrodes of thin film transistors (TFTs) in pixel units in a display region and forming the gate lines and the data lines in a pad region. A process of forming the data lines, the active layer members, the source electrodes and the drain electrodes in the display region and simultaneously forming the data lines in the pad region is performed. | 11-10-2011 |
20120090991 | MAGNETRON SPUTTERING APPARATUS - A magnetron sputtering apparatus comprising: a deposition chamber; a processing chamber in communication with the deposition chamber, wherein a target area composed of targets is located at the place where the processing chamber is connected with the deposition chamber; a transfer chamber provided adjacent to the processing chamber, wherein a first gas-tight gate is provided on a wall of the transfer chamber, the first gas-tight gate being opened or closed so as to control the vacuum degree in the transfer chamber and to replace the targets; a transfer device which is provided in the processing chamber and/or the transfer chamber, transfers the target between the transfer chamber and the processing chamber via a second gas-tight gate provided on the adjacent walls of the transfer chamber and the processing chamber for replacement when the transfer chamber is in a set vacuum degree state. | 04-19-2012 |
20120099041 | ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND LIQUID CRYSTAL DISPLAY - Embodiments of the invention disclose an array substrate and a manufacturing method thereof and a liquid crystal display. In the array substrate, an additional electrode is formed above a gate line, the additional electrode and the gate line are spaced from each other by a gate insulation layer, and the additional electrode is connected electrically with the common electrode line; pixel electrode extends to over the additional electrode and is overlapped with the additional electrode, the overlapped portion of the pixel electrode and both the additional electrode and the common electrode line forms a storage capacitor. The liquid crystal display according to the embodiment of the invention comprises the above array substrate. | 04-26-2012 |
20120113366 | ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY - An array substrate is provided and it comprises a base substrate and data lines and gate lines that crossed with one another to define pixel units on the base substrate. Each pixel unit comprises a pixel electrode and a thin film transistor (TFT) switch, and the TFT switch comprises a gate electrode, a source electrode, a drain electrode and an active layer. A gate insulation layer is provided between the gate electrode and the active layer, and the gate insulation layer comprises a nontransparent insulation layer. | 05-10-2012 |
20130122622 | TFT-LCD ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A thin film transistor liquid crystal display (TFT-LCD) array substrate comprising a gate line and a data line formed on a base substrate. The gate line and the data line intersect with each other to define a pixel region, in which a pixel electrode and a thin film transistor (TFT) are formed, and a first insulating layer and a second insulating layer are interposed between the gate line and the data line, and the pixel electrode is disposed between the first insulating layer and the second insulating layer. A method of manufacturing a TFT-LCD is also disclosed. | 05-16-2013 |
20130143350 | MANUFACTURE METHOD OF SENSOR - An embodiment of the invention discloses a manufacture method of a sensor comprising: preparing gate scanning lines on a substrate; depositing a gate insulating layer on the gate scanning lines; sequentially depositing a gate insulation thin film, an active layer thin film, an ohmic contact layer thin film, a first conducting layer thin film and a photoelectric conversion layer thin film, and after the depositing, processing a lamination structure of the thin films with a gray-tone mask plate to obtain switch devices and photoelectric sensing devices; and then sequentially preparing a first passivation layer, bias lines and a second passivation layer. | 06-06-2013 |
20130175552 | ARRAY SUBSTRATE AND MANUFACTURING METHOD - Manufacturing an array substrate includes forming data and gate lines which cross and a gate electrode on a substrate. The data line is discontinuously disposed to be separated from the gate line, or the gate line is discontinuously disposed to be separated from the data line. Active and gate insulating layers including bridge and source electrode vias are formed on the substrate. The bridge vias correspond to adjacent discontinuous sections of the data line or the gate line. The source electrode via corresponds to the data line. Pixel, source, and drain electrodes and a bridge line are formed on the substrate. The pixel electrode and the drain electrode are integral. The source electrode is connected to the data line through the source electrode via. The bridge line connects adjacent discontinuous sections of the data line or adjacent discontinuous sections of the gate line through bridge vias. | 07-11-2013 |
20140006558 | METHOD AND DEVICE FOR RESUMING FILE DOWNLOAD | 01-02-2014 |
20140007126 | METHOD AND DEVICE FOR ALLOCATING BROWSER PROCESS | 01-02-2014 |
20140061645 | Thin Film Transistor Array Substrate, Manufacturing Method Thereof, And Display Device - A thin film transistor (TFT) array substrate, a manufacturing method thereof and a display device are provided. The manufacturing method comprises: forming a first passivation layer ( | 03-06-2014 |
20140063503 | ETCHING TIME DETECTION MEANS AND METHOD FOR ETCHING DEVICE - An etching time detection means and an etching time detection method for an etching device. The detection means comprises: a light wave emitter fixed on one substrate of the etching device, a light wave receiver fixed on another substrate and opposed to the light wave emitter, a detection system communicated with the light wave emitter and the light wave receiver for receiving light intensity signals and calculating etching time. With the detection means and the detection method, the automatical detection of etching time can be achieved and the deviation caused by visual observation can be effectively avoided. | 03-06-2014 |
20140077212 | SENSOR AND METHOD FOR MANUFACTURING THE SAME - Embodiments of the present invention disclose a sensor and a method for manufacturing the same, the sensor comprising a plurality of sensing units arranged in array, each of which comprises a thin film transistor device and a photodiode sensor device and the photodiode sensor device comprising: a receiving electrode connected with a drain of the thin film transistor device, a photodiode located on the receiving electrode and covering the thin film transistor device, a transparent electrode on the photodiode and a biasing line connected with the transparent electrode. | 03-20-2014 |
20140077282 | TFT FLAT SENSOR AND MANUFACTURING METHOD THEREFOR - A TFT flat sensor comprises pixel units each comprising: a common electrode and a common electrode insulating layer on a substrate, wherein a first via hole is provided in the common electrode insulating layer at a location corresponding to the common electrode; a gate electrode on the common electrode insulating layer; a first conductive film layer on the common electrode and the gate electrode wherein the first conductive film layer contacts the common electrode through a first via hole; a gate insulating layer, an active layer, a drain electrode and a source electrode, a second conductive film layer, a protection layer and a third conductive film layer on the first conductive film layer; a second via hole is provided in the protection layer at a location corresponding to the source electrode through which the third conductive film layer contacts the source electrode. | 03-20-2014 |
20140087510 | Manufacturing Method Of An Amorphous-Silicon Flat-Panel X-Ray Sensor - An embodiment of the present invention provides a manufacturing method of an amorphous-silicon flat-panel X-ray sensor; the method reduces the number of mask plates to be used, simplifies the production processes, saves production costs, while also improving the product yield. The manufacturing method comprises: on a substrate, after a gate scan line is formed, forming a data line, a TFT switch element and a photosensitive element through one patterning process, wherein on the mask plate used in the patterning process, a region corresponding to a channel of the TFT switch element is semi-transmissive, whereas regions respectively corresponding to the data line, the photosensitive element and the portion of the TFT switch element other than the channel thereof are non-transmissive; thereafter, on the substrate formed with the TFT switch element and the photosensitive element, a passivation layer and a bias line are formed. | 03-27-2014 |
20140103334 | Oxide Semiconductor Thin Film Transistor, Manufacturing Method, And Display Device Thereof - An oxide semiconductor thin film transistor, a manufacturing method and a display device thereof are disclosed. An oxide semiconductor thin film transistor comprises a gate insulating layer ( | 04-17-2014 |
20140125890 | THREE-DIMENSIONAL GLASSES AND CONTROL CHIP THEREOF - Embodiments of the present invention provide three-dimensional glasses and a control chip thereof. The three-dimensional glasses comprise: a normal black mode liquid crystal eyeglass; a normal white mode liquid crystal eyeglass; and a control chip, connected to both of the normal black mode liquid crystal eyeglass and the normal white mode liquid crystal eyeglass, wherein a voltage output terminal of the control chip simultaneously supplies a high level or a low level to the normal black mode liquid crystal eyeglass and the normal white mode liquid crystal eyeglass based on a predetermined high and low level switching frequency. | 05-08-2014 |
20140160389 | TFT-LCD ASSEMBLY SUBSTRATE, LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME - A TFT-LCD assembly substrate comprises an array structure layer, comprising a plurality of first signal lines and a plurality of second signal lines. Adjacent first signal lines and adjacent second signal lines cross each other to define a plurality of combination pixel regions, and each of the combination pixel regions comprises two pixel regions juxtaposed along a direction of the first signal line, and there are a thin film transistor and a pixel electrode formed in one pixel region of the two pixel regions and there is a common electrode formed in the other pixel region. | 06-12-2014 |
20140175430 | THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE, AND DISPLAY DEVICE - The technical disclosure relates to a thin film transistor and a manufacturing method thereof, an array substrate and a display device. The thin film transistor comprises a base substrate, a gate electrode, an active layer, source/drain electrodes, a pixel electrode and one or more insulating layers, wherein at least one of the insulating layers comprises a bottom insulating sub-layer and a top insulating sub-layer, the top insulating sub-layer having a hydrogen content higher than that of the bottom insulating sub-layer. | 06-26-2014 |
20140175443 | TFT ARRAY SUBSTRATE MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE - According to embodiments of the invention, there are provided a TFT array substrate, a manufacturing method thereof and a liquid crystal display. The manufacturing method comprises manufacturing a pattern including a gate electrode, a gate insulating layer pattern with a via hole, a pattern including an active layer, a pattern including source and drain electrodes and a pattern including a first electrode on a substrate. The formation of the gate insulating layer pattern with the via hole and the pattern including the active layer are completed through one patterning process, the pattern including the gate electrode at least includes the gate electrode and a gate leading wire, the via hole of the gate insulating layer is located over the gate leading wire, and the active layer is located over the gate electrode. | 06-26-2014 |
20140203283 | FLAT PANEL DETECTOR AND MANUFACTURING METHOD THEREOF, CAMERA DEVICE - A flat panel detector comprises a photoelectric conversion layer and a pixel detecting element disposed under the photoelectric conversion layer. The pixel detecting element comprises: a pixel electrode for receiving charges, a storage capacitor for storing the received charges, and a thin film transistor for controlling outputting of the stored charges. The storage capacitor comprises a first electrode and a second electrode. The first electrode comprises an upper electrode and a bottom electrode that are disposed opposite to each other and electrically connected. A second electrode is sandwiched between the upper electrode and the bottom electrode. It is insulated between the upper electrode and the second electrode and between the second electrode and the bottom electrode. | 07-24-2014 |
20140231804 | SENSOR AND METHOD FOR FABRICATING THE SAME - A sensor and its fabrication method are provided, the sensor comprises: a base substrate ( | 08-21-2014 |
20140335641 | METHOD FOR FABRICATING SENSOR - A method for fabricating a sensor includes: forming, on a base substrate, a pattern of a source electrode and a drain electrode, a pattern of a data line, a pattern of a receiving electrode, a pattern of a photodiode, and a pattern of a transparent electrode disposed by using a first patterning process; forming a pattern of an ohmic layer by using a second patterning process; forming a pattern of an active layer by using a third patterning process; forming a pattern of a gate insulating layer by using a fourth patterning process, wherein the gate insulating layer has a via hole above the transparent electrode; and forming a pattern of a gate electrode, a pattern of a gate line, and a pattern of a bias line connected to the transparent electrode via the via hole above the transparent electrode by using a fifth patterning process | 11-13-2014 |
20140342490 | METHOD FOR FABRICATING SENSOR - A method for fabricating a sensor, comprises: forming, on a base substrate, a pattern of a data line ( | 11-20-2014 |
20150014751 | SENSOR AND METHOD FOR FABRICATING THE SAME - A sensor and its fabrication method are provided. The sensor comprises: a base substrate, a group of gate lines and a group of data lines arranged as crossing each other, and a plurality of sensing elements arranged in an array and defined by the group of gate lines and the group of data lines, each sensing element comprising a Thin Film Transistor (TFT) device and a photodiode sensing device, wherein the photodiode sensor device comprises: a bias line disposed on the base substrate; a transparent electrode disposed on the bias line and being electrically contacted with the bias line; a photodiode disposed on the transparent electrode; and a receiving electrode disposed on the photodiode; the TFT device is located above the photodiode. When the sensor is functioning, light is directly transmitted onto the photodiode sensor device through the base substrate. In comparison with conventional technologies, the light loss is largely reduced and the light absorption usage ratio is improved. | 01-15-2015 |
20150041870 | SENSOR AND METHOD FOR FABRICATING THE SAME - A sensor and its fabrication method are provided, the sensor includes: a base substrate, a group of gate lines and a group of data lines arranged as crossing each other, and a plurality of sensing elements arranged in an array and defined by the group of gate lines and the group of data lines, each sensing element comprising a TFT device and a photodiode sensing device, wherein: the TFT device is a top gate TFT; the photodiode sensing device includes: a bias electrode and a bias electrode pin connected with the bias electrode, both of which are disposed on the base substrate; a photodiode disposed on the bias electrode and a transparent electrode disposed on the photodiode and connected with the source electrode. | 02-12-2015 |
20150053967 | OXIDE TFT, PREPARATION METHOD THEREOF, ARRAY SUBSTRATE, AND DISPLAY DEVICE - An Oxide TFT, a preparation method thereof, an array substrate and a display device are described. The method includes forming a gate electrode, a gate insulating layer, a channel layer, a barrier layer, as well as a source electrode and a drain electrode on a substrate; the channel layer is formed by depositing an amorphous oxide semiconductor film in a first mixed gas containing H | 02-26-2015 |
20150079503 | MASK PLATE - A mask plate is used for implementing a graphic structure with a narrower line width on a target substrate. The mask plate includes a slit-shaped photic area and a lightproof area. An edge of the slit-shaped photic area is in a curve shape. | 03-19-2015 |
20150084037 | THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF AND ARRAY SUBSTRATE - A thin film transistor, a manufacturing method thereof and an array substrate are provided. The thin film transistor includes: a gate electrode ( | 03-26-2015 |