| 52nd week of 2012 patent applcation highlights part 17 |
| Patent application number | Title | Published |
|---|
| 20120326212 | HIGH k GATE STACK ON III-V COMPOUND SEMICONDUCTORS - A method of forming a high k gate stack on a surface of a III-V compound semiconductor, such GaAs, is provided. The method includes subjecting a III-V compound semiconductor material to a precleaning process which removes native oxides from a surface of the III-V compound semiconductor material; forming a semiconductor, e.g., amorphous Si, layer in-situ on the cleaned surface of the III-V compound semiconductor material; and forming a dielectric material having a dielectric constant that is greater than silicon dioxide on the semiconducting layer. In some embodiments, the semiconducting layer is partially or completely converted into a layer including at least a surface layer that is comprised of AO | 2012-12-27 |
| 20120326213 | MICROWELL STRUCTURES FOR CHEMICALLY-SENSITIVE SENSOR ARRAYS - Methods and apparatus relating to FET arrays for monitoring chemical and/or biological reactions such as nucleic acid sequencing-by-synthesis reactions. Some methods provided herein relate to improving signal (and also signal to noise ratio) from released hydrogen ions during nucleic acid sequencing reactions. | 2012-12-27 |
| 20120326214 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device includes: a semiconductor substrate including an active region defined by an isolation layer; a gate line defining a bit line contact region in the active region and extending in one direction; a dielectric layer covering the semiconductor substrate and the gate line formed in the semiconductor substrate; a bit line contact hole formed in the dielectric layer and exposing the bit line contact region; and a bit line contact spaced apart from a sidewall of the bit line contact hole and formed in the bit line contact hole. | 2012-12-27 |
| 20120326215 | METHOD FOR FABRICATION OF III-NITRIDE DEVICE AND THE III-NITRIDE DEVICE THEREOF - A III-nitride device is provided comprising a semiconductor substrate; a stack of active layers on the substrate, each layer comprising a III-nitride material; a gate, a source and a drain contact on the stack, wherein a gate, a source and a drain region of the substrate are projections of respectively the gate, the source and the drain contact in the substrate; and a trench in the substrate extending from a backside of the substrate (side opposite to the one in contact with the stack of active layers) to an underlayer of the stack of active layers in contact with the substrate, the trench completely surrounding the drain region, being positioned in between an edge of the gate region towards the drain and an edge of the drain region towards the gate and having a width such that the drain region of the substrate is substantially made of the semiconductor material. | 2012-12-27 |
| 20120326216 | DEVICES AND METHODS TO OPTIMIZE MATERIALS AND PROPERTIES FOR REPLACEMENT METAL GATE STRUCTURES - Devices and methods for device fabrication include forming a gate structure with a sacrificial material. Silicided regions are formed on source/drain regions adjacent to the gate structure or formed at the bottom of trench contacts within source/drain areas. The source/drain regions or the silicided regions are processed to build resistance to subsequent thermal processing and adjust Schottky barrier height and thus reduce contact resistance. Metal contacts are formed in contact with the silicided regions. The sacrificial material is removed and replaced with a replacement conductor. | 2012-12-27 |
| 20120326217 | SEMICONDUCTOR DEVICE INCLUDING MULTIPLE METAL SEMICONDUCTOR ALLOY REGION AND A GATE STRUCTURE COVERED BY A CONTINUOUS ENCAPSULATING LAYER - A method of forming a semiconductor device is provided that in some embodiments encapsulates a gate silicide in a continuous encapsulating material. By encapsulating the gate silicide in the encapsulating material, the present disclosure substantially eliminates shorting between the gate structure and the interconnects to the source and drain regions of the semiconductor device. | 2012-12-27 |
| 20120326218 | 6F2 DRAM Cell | 2012-12-27 |
| 20120326219 | DYNAMIC MEMORY STRUCTURE - A dynamic memory structure includes a strip semiconductor material disposed on a substrate, a gate standing astride the strip semiconductor material and dividing the strip semiconductor material into a source terminal, a drain terminal and a channel region wherein a source width of the source terminal is larger than or equal to a channel width, a dielectric layer sandwiched between the gate and the strip semiconductor material, and a capacitor unit disposed on the substrate and including the source terminal serving as a lower electrode. | 2012-12-27 |
| 20120326220 | Integrated Circuits With Sidewall Nitridation - Semiconductor devices are provided with encapsulating films for protection of sidewall features during fabrication processes, such as etching to form isolation regions. In a non-volatile flash memory, for example, a trench isolation process is divided into segments to incorporate an encapsulating film along the sidewalls of charge storage material. A pattern is formed over the layer stack followed by etching the charge storage material to form strips elongated in the column direction across the substrate, with a layer of tunnel dielectric material therebetween. Before etching the substrate, an encapsulating film is formed along the sidewalls of the strips of charge storage material. The encapsulating film can protect the sidewalls of the charge storage material during subsequent cleaning, oxidation and etch processes. In another example, the encapsulating film is simultaneously formed while etching to form strips of charge storage material and the isolation trenches. | 2012-12-27 |
| 20120326221 | MULTI-TIERED SEMICONDUCTOR DEVICES AND ASSOCIATED METHODS - Methods of fabricating multi-tiered semiconductor devices are described, along with apparatus and systems that include them. In one such method, a first dielectric is formed, and a second dielectric is formed in contact with the first dielectric. A channel is formed through the first dielectric and the second dielectric with a first etch chemistry, a void is formed in the first dielectric with a second etch chemistry, and a device is formed at least partially in the void in the first dielectric. Additional embodiments are also described. | 2012-12-27 |
| 20120326222 | MEMORY STRUCTURE AND FABRICATING METHOD THEREOF - A memory structure including a memory cell is provided, and the memory cell includes following elements. A first gate is disposed on a substrate. A stacked structure includes a first dielectric structure, a channel layer, a second dielectric structure and a second gate disposed on the first gate, a first charge storage structure disposed in the first dielectric structure and a second charge storage structure disposed in the second dielectric structure. At least one of the first charge storage structure and the second charge storage structure includes two charge storage units which are physically separated. A first dielectric layer is disposed on the first gate at two sides of the stacked structure. A first source and drain and a second source and drain are disposed on the first dielectric layer and located at two sides of the channel layer. | 2012-12-27 |
| 20120326223 | SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME - According to one embodiment, a method for manufacturing a semiconductor memory device includes forming a stacked body by alternately stacking an insulating film and a conductive film. The method includes forming a trench in the stacked body. The trench extends in one direction and divides the conductive film. The method includes burying a diblock copolymer in the trench. The method includes phase-separating the diblock copolymer into a plurality of first blocks and an insulative second block extending in a stacking direction of the insulating film and the conductive film. The method includes forming a plurality of holes by removing the first blocks. The method includes forming charge accumulation layers on inner surfaces of the holes. And, the method includes forming a plurality of semiconductor pillars extending in the stacking direction by burying a semiconductor material in the holes. | 2012-12-27 |
| 20120326224 | SEMICONDUCTOR DEVICE - A semiconductor device has a semiconductor substrate, and a semiconductor element having an FET on the semiconductor substrate and comprises a different threshold voltage depending on an OFF state and an ON state. The semiconductor element has an insulating film disposed above a part where a channel of the semiconductor substrate is formed, a gate electrode disposed above the insulating film, and a charge trap film disposed between the insulating film and the gate electrode, and to exchange more electrons with the gate electrode than with the channel. | 2012-12-27 |
| 20120326225 | NON-VOLATILE MEMORY DEVICE - A non-volatile memory device includes a substrate having an active region defined by a device isolation region that has a trench and an air gap, a device isolation pattern positioned at a lower portion of the trench, a memory cell layer including a tunnel insulation layer, a trap insulation layer and a blocking insulation layer that are sequentially stacked on the active region and one of which extends from the active region toward the device isolation region encloses top of the air gap whose bottom is defined by a layer other than that of the top, and a control gate electrode positioned on the cell structure. The one of the insulation layer extending includes a recess at a region corresponding to the center of the air gap. | 2012-12-27 |
| 20120326226 | SUPERJUNCTION DEVICE AND METHOD FOR MANUFACTURING THE SAME - A superjunction device is disclosed, wherein P-type regions in an active region are not in contact with the N+ substrate, and the distance between the surface of the N+ substrate and the bottom of the P-type regions in the active region is greater than the thickness of a transition region in the N-type epitaxial layer. Methods for manufacturing the superjunction device are also disclosed. The present invention is capable of improving the uniformity of reverse breakdown voltage and overshoot current handling capability in a superjunction device. | 2012-12-27 |
| 20120326227 | METHOD OF MAKING AN INSULATED GATE SEMICONDUCTOR DEVICE AND STRUCTURE - In one embodiment, a vertical insulated-gate field effect transistor includes a shield electrode formed in trench structure within a semiconductor material. A gate electrode is isolated from the semiconductor material using gate insulating layers. Before the shield electrode is formed, spacer layers can be used form shield insulating layers along portions of the trench structure. The shield insulating layers are thicker than the gate insulating layers. In another embodiment, the shield insulating layers have variable thickness. | 2012-12-27 |
| 20120326228 | SELF-ALIGNED CARBON ELECTRONICS WITH EMBEDDED GATE ELECTRODE - A device and method for device fabrication includes forming a buried gate electrode in a dielectric substrate and patterning a stack comprising a high dielectric constant layer, a carbon-based semi-conductive layer and a protection layer over the buried gate electrode. An isolation dielectric layer formed over the stack is opened to define recesses in regions adjacent to the stack. The recesses are etched to form cavities and remove a portion of the high dielectric constant layer to expose the carbon-based semi-conductive layer on opposite sides of the buried gate electrode. A conductive material is deposited in the cavities to form self-aligned source and drain regions. | 2012-12-27 |
| 20120326229 | Trench Transistor and Manufacturing Method of the Trench Transistor - A semiconductor device includes a semiconductor body including a first surface and a second surface. The semiconductor device further includes a trench structure extending into the semiconductor body from the first surface. The trench structure includes a first gate electrode part and a first gate dielectric part in a first part of the trench structure, and a second gate electrode part and a second gate dielectric part in a second part of the trench structure. A width of the trench structure in the first part is equal to the width of the trench structure in the second part. The semiconductor device further includes a body region adjoining the first and second gate dielectric parts at a side wall of the trench structure. A distance d | 2012-12-27 |
| 20120326230 | SILICON ON INSULATOR COMPLEMENTARY METAL OXIDE SEMICONDUCTOR WITH AN ISOLATION FORMED AT LOW TEMPERATURE - A silicon on insulator (SOI) complementary metal oxide semiconductor (CMOS) with an isolation formed at a low temperature and methods for constructing the same. An example method includes infusing an insulation material at a low temperature to form a silicon-based insulator between the active regions. | 2012-12-27 |
| 20120326231 | MOSFET AND METHOD FOR MANUFACTURING THE SAME - The present application discloses a MOSFET and a method for manufacturing the same, wherein the MOSFET comprises: an SOI wafer, which comprises a semiconductor substrate, a buried insulator layer, and a semiconductor layer, the buried insulator layer being disposed on the semiconductor substrate, and the semiconductor layer being disposed on the buried insulator layer; a gate stack, which is disposed on the semiconductor layer; a source region and a drain region, which are disposed in the semiconductor layer and on opposite sides of the gate stack; and a channel region, which are disposed in the semiconductor layer and sandwiched by the source region and the drain region, wherein the MOSFET further comprises a back gate disposed in the semiconductor substrate, and wherein the back gate comprises first, second and third compensation doping regions, the first compensation doping region is disposed under the source region and the drain region; the second compensation doping region extends in a direction away from the channel region and adjoining the first compensation doping region; and the third compensation doping region is disposed under the channel region and adjoining the first compensation doping region. By changing the doping type of the back gate, the MOSFET can have an adjustable threshold voltage, and can have a reduced parasitic capacitance and a reduced contact resistance in connection with the back gate. | 2012-12-27 |
| 20120326232 | MOSFET WITH RECESSED CHANNEL FILM AND ABRUPT JUNCTIONS - MOSFETs and methods for making MOSFETs with a recessed channel and abrupt junctions are disclosed. The method includes creating source and drain extensions while a dummy gate is in place. The source/drain extensions create a diffuse junction with the silicon substrate. The method continues by removing the dummy gate and etching a recess in the silicon substrate. The recess intersects at least a portion of the source and drain junction. Then a channel is formed by growing a silicon film to at least partially fill the recess. The channel has sharp junctions with the source and drains, while the unetched silicon remaining below the channel has diffuse junctions with the source and drain. Thus, a MOSFET with two junction regions, sharp and diffuse, in the same transistor can be created. | 2012-12-27 |
| 20120326233 | METHOD TO REDUCE THRESHOLD VOLTAGE VARIABILITY WITH THROUGH GATE WELL IMPLANT - The present disclosure provides a semiconductor device that may include a substrate including a semiconductor layer overlying an insulating layer. A gate structure that is present on a channel portion of the semiconductor layer. A first dopant region is present in the channel portion of the semiconductor layer, in which the peak concentration of the first dopant region is present within the lower portion of the gate conductor and the upper portion of the semiconductor layer. A second dopant region is present in the channel portion of the semiconductor layer, in which the peak concentration of the second dopant region is present within the lower portion of the semiconductor layer. | 2012-12-27 |
| 20120326234 | BALLAST RESISTOR FOR SUPER-HIGH-VOLTAGE DEVICES - An integrated circuit (IC) including a well region of the IC having a first doping level and a plurality of semiconductor regions implanted in the well region. Each of the plurality of semiconductor regions has a second doping level. The second doping level is greater than the first doping level. A plurality of polysilicon regions are arranged on the plurality of semiconductor regions. The polysilicon regions are respectively connected to the semiconductor regions. The plurality of semiconductor regions is a drain of a metal-oxide semiconductor field-effect transistor (MOSFET). | 2012-12-27 |
| 20120326235 | SEMICONDUCTOR DEVICE - A semiconductor device equally turns on the parasitic bipolar transistors in the finger portions of the finger form source and drain electrodes when a surge voltage is applied, even with the P+ type contact layer surrounding the N+ type source layers and the N+ type drain layers connected to the finger form source and drain electrodes. A P+ type contact layer surrounds N+ type source layers and N+ type drain layers. Metal silicide layers are formed on the N+ type source layers, the N+ type drain layers, and a portion of the P+ type contact layer. Finger form source electrodes, finger form drain electrodes, and a P+ type contact electrode surrounding these finger form electrodes are formed, being connected to the metal silicide layers respectively through contact holes formed in an interlayer insulation film deposited on the metal silicide layers. | 2012-12-27 |
| 20120326236 | MULTI-GATE TRANSISTOR HAVING SIDEWALL CONTACTS - A multi-gate transistor having a plurality of sidewall contacts and a fabrication method that includes forming a semiconductor fin on a semiconductor substrate and etching a trench within the semiconductor fin, depositing an oxide material within the etched trench, and etching the oxide material to form a dummy oxide layer along exposed walls within the etched trench; and forming a spacer dielectric layer along vertical sidewalls of the dummy oxide layer. The method further includes removing exposed dummy oxide layer in a channel region in the semiconductor fin and beneath the spacer dielectric layer, forming a high-k material liner along sidewalls of the channel region in the semiconductor fin, forming a metal gate stack within the etched trench, and forming a plurality of sidewall contacts within the semiconductor fin along adjacent sidewalls of the dummy oxide layer. | 2012-12-27 |
| 20120326237 | LOW-PROFILE LOCAL INTERCONNECT AND METHOD OF MAKING THE SAME - Embodiments of the present invention provide a structure. The structure includes a plurality of field-effect-transistors having gate stacks formed on top of a semiconductor substrate, the gate stacks having spacers formed at sidewalls thereof; and one or more conductive contacts formed directly on top of the semiconductor substrate and interconnecting at least one source/drain of one of the plurality of field-effect-transistors to at least one source/drain of another one of the plurality of field-effect-transistors, wherein the one or more conductive contacts is part of a low-profile local interconnect that has a height lower than a height of the gate stacks. | 2012-12-27 |
| 20120326238 | METHOD FOR FABRICATING SEMICONDUCTOR DEVICE - A method for fabricating semiconductor device includes the steps of: providing a substrate having a first region and a second region thereon; forming a high-k dielectric layer, a barrier layer, and a first metal layer on the substrate; removing the first metal layer of the second region; forming a polysilicon layer to cover the first metal layer of the first region and the barrier layer of the second region; patterning the polysilicon layer, the first metal layer, the barrier layer, and the high-k dielectric layer to form a first gate structure and a second gate structure in the first region and the second region; and forming a source/drain in the substrate adjacent to two sides of the first gate structure and the second gate structure. | 2012-12-27 |
| 20120326239 | SRAM DEVICE - An SRAM device has a first tunnel transistor that allows a current to flow in a direction from the non-inverting output terminal to the first bit line when the first tunnel transistor turns on. The SRAM device has a second tunnel transistor allows a current to flow in a direction from the first bit line to the non-inverting output terminal when the second tunnel transistor turns on. The SRAM device has a third tunnel transistor allows a current to flow in a direction from the inverting output terminal to the second bit line when the third tunnel transistor turns on. The SRAM device has a fourth tunnel transistor allows a current to flow in a direction from the second bit line to the inverting output terminal when the fourth tunnel transistor turns on. | 2012-12-27 |
| 20120326240 | SEMICONDUCTOR DEVICE - A semiconductor device includes a first MISFET and a second MISFET which are formed over a semiconductor substrate and have the same conductive type. The first MISFET has a first gate insulating film arranged over the semiconductor substrate, a first gate electrode arranged over the first gate insulating film, and a first source region and a first drain region. The second MISFET has a second gate insulating film arranged over the semiconductor substrate, a second gate electrode arranged over the second gate insulating film, and a second source region and a second drain region. The first and the second gate electrode are electrically coupled, the first and the second source region are electrically coupled, and the first and the second drain region are electrically coupled. Accordingly, the first and the second MISFET are coupled in parallel. In addition, threshold voltages are different between the first and the second MISFET. | 2012-12-27 |
| 20120326241 | METAL SEMICONDUCTOR ALLOY STRUCTURE FOR LOW CONTACT RESISTANCE - Contact via holes are etched in a dielectric material layer overlying a semiconductor layer to expose the topmost surface of the semiconductor layer. The contact via holes are extended into the semiconductor material layer by continuing to etch the semiconductor layer so that a trench having semiconductor sidewalls is formed in the semiconductor material layer. A metal layer is deposited over the dielectric material layer and the sidewalls and bottom surface of the trench. Upon an anneal at an elevated temperature, a metal semiconductor alloy region is formed, which includes a top metal semiconductor alloy portion that includes a cavity therein and a bottom metal semiconductor alloy portion that underlies the cavity and including a horizontal portion. A metal contact via is formed within the cavity so that the top metal semiconductor alloy portion laterally surrounds a bottom portion of a bottom portion of the metal contact via. | 2012-12-27 |
| 20120326242 | Vertically-oriented semiconductor selection device providing high drive current in cross-point array memory - A vertical semiconductor material mesa upstanding from a semiconductor base that forms a conductive channel between first and second doped regions. The first doped region is electrically coupled to one or more first silicide layers on the surface of the base. The second doped region is electrically coupled to one of a plurality of second silicide layers on the upper surface of the mesa. A gate conductor is provided on one or more sidewalls of the mesa. | 2012-12-27 |
| 20120326243 | TRANSISTOR HAVING ALUMINUM METAL GATE AND METHOD OF MAKING THE SAME - A transistor having an aluminum metal gate includes a substrate, a high-k gate dielectric layer, an aluminum metal gate and a source/drain region. The high-k gate dielectric layer is disposed on the substrate. The aluminum metal gate includes a work function tuning layer and an aluminum metal layer disposed orderly on the high-k gate dielectric layer, where the aluminum metal layer comprises a first aluminum metal layer and a second aluminum metal layer. Furthermore, the source/drain region is disposed in the substrate at each of two sides of the aluminum metal gate. | 2012-12-27 |
| 20120326244 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes a semiconductor substrate, a source region, a drain region, an insulating film and a gate electrode. The source region is formed in the semiconductor substrate. The drain region is formed in the semiconductor substrate with being separate from the source region. The insulating film is formed between the source region and the drain region and on or above the semiconductor substrate. The insulating film includes lanthanum aluminate containing at least one element selected from Si, Ge, Mg, Ca, Sr, Ba and N. The lanthanum aluminate contains at least one element selected from Ti, Hf and Zr. The gate electrode is formed on the insulating film. | 2012-12-27 |
| 20120326245 | INVERSION THICKNESS REDUCTION IN HIGH-K GATE STACKS FORMED BY REPLACEMENT GATE PROCESSES - A method of forming a transistor device includes forming an interfacial layer on a semiconductor substrate, corresponding to a region between formed doped source and drain regions in the substrate; forming a high dielectric constant (high-k) layer on the interfacial layer, the high-k layer having a dielectric constant greater than about 7.5; forming a doped metal layer on the high-k layer; performing a thermal process so as to cause the doped metal layer to scavenge oxygen atoms diffused from the interfacial layer such that a final thickness of the interfacial layer is less than about 5 angstroms (Å); and forming a metal gate material over the high-k dielectric layer. | 2012-12-27 |
| 20120326246 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor device capable of improving the driving power and a manufacturing method therefor are provided. In a semiconductor device, a gate structure formed by successively stacking a gate oxide film and a silicon layer is arranged over a semiconductor substrate. An oxide film is arranged long the lateral side of the gate structure and another oxide film is arranged along the lateral side of the oxide film and the upper surface of the substrate. In the side wall oxide film comprising these oxide films, the minimum value of the thickness of the first layer along the lateral side of the gate structure is less than the thickness of the second layer along the upper surface of the substrate. | 2012-12-27 |
| 20120326247 | SELF-SEALED FLUIDIC CHANNELS FOR A NANOPORE ARRAY - A method of forming a nanopore array includes patterning a front layer of a substrate to form front trenches, the substrate including a buried layer disposed between the front layer and a back layer; depositing a membrane layer over the patterned front layer and in the front trenches; patterning the back layer and the buried layer to form back trenches, the back trenches being aligned with the front trenches; forming a plurality of nanopores through the membrane layer; depositing a sacrificial material in the front trenches and the back trenches; depositing front and back insulating layers over the sacrificial material; and heating the sacrificial material to a decomposition temperature of the sacrificial material to remove the sacrificial material and form pairs of front and back channels, wherein the front channel of each channel pair is connected to the back channel of its respective channel pair by an individual nanopore. | 2012-12-27 |
| 20120326248 | METHODS FOR CMOS-MEMS INTEGRATED DEVICES WITH MULTIPLE SEALED CAVITIES MAINTAINED AT VARIOUS PRESSURES - A Microelectromechanical systems (MEMS) structure comprises a MEMS wafer. A MEMS wafer includes a handle wafer with cavities bonded to a device wafer through a dielectric layer disposed between the handle and device wafers. The MEMS wafer also includes a moveable portion of the device wafer suspended over a cavity in the handle wafer. Four methods are described to create two or more enclosures having multiple gas pressure or compositions on a single substrate including, each enclosure containing a moveable portion. The methods include: A. Forming a secondary sealed enclosure, B. Creating multiple ambient enclosures during wafer bonding, C. Creating and breaching an internal gas reservoir, and D. Forming and subsequently sealing a controlled leak/breach into the enclosure. | 2012-12-27 |
| 20120326249 | MEMS MICROPHONE AND METHOD FOR MANUFACTURE - An improved method for manufacturing an MEMS microphone with a double fixed electrode is specified which results in a microphone which likewise has improved properties. | 2012-12-27 |
| 20120326250 | SPIN TRANSFER TORQUE CELL FOR MAGNETIC RANDOM ACCESS MEMORY - Embodiments are directed to STT MRAM devices. One embodiment of an STT MRAM device includes a reference layer, a tunnel barrier layer, a free layer and one or more conductive vias. The reference layer is configured to have a fixed magnetic moment. In addition, the tunnel barrier layer is configured to enable electrons to tunnel between the reference layer and the free layer through the tunnel barrier layer. The free layer is disposed beneath the tunnel barrier layer and is configured to have an adaptable magnetic moment for the storage of data. The conductive via is disposed beneath the free layer and is connected to an electrode. Further, the conductive via has a width that is smaller than a width of the free layer such that a width of an active STT area for the storage of data in the free layer is defined by the width of the conductive via. | 2012-12-27 |
| 20120326251 | SEMICONDUCTOR MEMORY DEVICE - According to one embodiment, a semiconductor memory device includes plural magneto-resistance elements being two-dimensionally arrayed on a semiconductor substrate. In the semiconductor memory device, each of the magneto-resistance elements includes: a first magnetic layer formed on the semiconductor substrate; a non-magnetic layer formed on the first magnetic layer; and a second magnetic layer formed on the non-magnetic layer, and an insulating film buried between the magneto-resistance elements adjacent to each other, a powder made of a metallic material or a magnetic material being dispersed in the insulating film. | 2012-12-27 |
| 20120326252 | SEMICONDUCTOR MEMORY DEVICE - According to one embodiment, a semiconductor memory device includes plural magneto-resistance elements. In the semiconductor memory device, each of the magneto-resistance elements includes: a first magnetic layer formed on a semiconductor substrate, the first magnetic layer having an easy axis of magnetization perpendicular to a film surface thereof; a non-magnetic layer formed on the first magnetic layer; a second magnetic layer formed on the non-magnetic layer, the second magnetic layer having an easy axis of magnetization perpendicular to a film surface thereof; and a sidewall film provided so as to cover a sidewall of each of the magneto-resistance elements with a protective film interposed therebetween, the sidewall film providing a tensile stress to the magneto-resistance element along the easy axis of magnetization. | 2012-12-27 |
| 20120326253 | METHOD AND SYSTEM FOR PROVIDING MAGNETIC TUNNELING JUNCTIONS USABLE IN SPIN TRANSFER TORQUE MAGNETIC MEMORIES - A method and system provide a magnetic junction. A free layer, a symmetry filter, and a pinned layer are provided. The free layer has a magnetic moment switchable between stable states when a write current is passed through the magnetic junction. The symmetry filter transmits charge carriers having a first symmetry with higher probability than charge carriers having another symmetry. The symmetry filter resides between the free layer and the pinned layer. The free layer and/or the pinned layer lies in a plane, has the charge carriers of the first symmetry in a spin channel at a Fermi level, lacks the charge carriers of the first symmetry at the Fermi level in another spin channel, and has a nonzero magnetic moment component perpendicular to the plane. The free layer and/or the pinned layer and the symmetry filter has at least one lattice mismatch of less than seven percent. | 2012-12-27 |
| 20120326254 | MAGNETIC RANDOM ACCESS MEMORY - A magnetic random access memory according to the present invention is provided with: a magnetic recording layer including a magnetization free region having a reversible magnetization, wherein a write current is flown through the magnetic recording layer in an in-plane direction; a magnetization fixed layer having a fixed magnetization; a non-magnetic layer provided between the magnetization free region and the magnetization fixed layer; and a heat sink structure provided to be opposed to the magnetic recording layer and having a function of receiving and radiating heat generated in the magnetic recording layer. The magnetic random access memory thus-structured radiates heat generated in the magnetic recording layer by using the heat sink structure, suppressing the temperature increase caused by the write current flown in the in-plane direction. | 2012-12-27 |
| 20120326255 | METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICES, SEMICONDUCTOR DEVICE AND TRANSFER MEMBER - Disclosed is a method for manufacturing semiconductor devices. Said method includes: a supply step in which a process liquid ( | 2012-12-27 |
| 20120326256 | SPECTRALLY TUNED PLASMONIC LIGHT COLLECTORS - Electronic devices may be provided with imaging modules that include plasmonic light collectors. Plasmonic light collectors may be configured to exploit an interaction between incoming light and plasmons in the plasmonic light collector to alter the path of the incoming light. Plasmonic light collectors may include one or more spectrally tuned plasmonic image pixels configured to preferentially trap light of a given frequency. Spectrally tuned plasmonic image pixels may include plasmonic structures formed form a patterned metal layer over doped silicon layers. Doped silicon layers may be interposed between plasmonic structures and a reflective layer. Plasmonic image pixels may be used to absorb and detect as much as, or more than, ninety percent of incident light at wavelengths ranging from the infrared to the ultraviolet. Plasmonic image pixels that capture light of different colors may be arranged in patterned arrays to form imager modules or imaging spectrometers for optofluidic microscopes. | 2012-12-27 |
| 20120326257 | PHOTOELECTRIC CONVERSION LAYER STACK-TYPE SOLID-STATE IMAGING DEVICE AND IMAGING APPARATUS - A photoelectric conversion layer stack-type solid-state imaging device includes a semiconductor substrate, a photoelectric conversion portion, a conductive light shield film, and a dielectric layer. A signal reading portion is formed on a semiconductor substrate. The photoelectric conversion portion is stacked above a light incidence side of the semiconductor substrate and includes a photoelectric conversion layer formed between a first electrode film and a second electrode film which is divided into a plurality of regions corresponding to pixels respectively. The conductive light shield film is stacked above the light incidence side of the photoelectric conversion portion outside an effective pixel region. The dielectric layer is disposed between the conductive light shield and the first electrode film. A given voltage is applied to the first electrode film through a lowpass filter formed by a resistance of wiring to the first electrode film and a capacitor formed between the conductive light shield film and the first electrode film. | 2012-12-27 |
| 20120326258 | PHOTOELECTRIC CONVERSION DEVICE AND METHOD FOR MANUFACTURING THE PHOTOELECTRIC CONVERSION DEVICE - It is aimed to provide a photoelectric conversion device having high reliability by reducing cracks occurring in a photoelectric conversion layer. Included is a laminate in which a substrate, a pair of electrodes located on the substrate with a gap therebetween, and a photoelectric conversion layer located in the gap and on the pair of electrodes are laminated, wherein each of the pair of electrodes includes a linear portion extending along the gap and a first projecting portion including a curved tip surface projecting from the linear portion toward the gap, the linear portion and the first projecting portion being alternately arranged along the gap. | 2012-12-27 |
| 20120326259 | Avalanche Photodiode with Special Lateral Doping Concentration - Avalanche photodiodes having special lateral doping concentration that reduces dark current without causing any loss of optical signals and method for the fabrication thereof are described. In one aspect, an avalanche photodiode comprises: a substrate, a first contact layer coupled to at least one metal contract of a first electrical polarity, an absorption layer, a doped electric control layer having a central region and a circumferential region surrounding the central region, a multiplication layer having a partially doped central region, and a second contract layer coupled to at least one metal contract of a second electrical polarity. Doping concentration in the central section is lower than that of the circumferential region. The absorption layer can be formed by selective epitaxial growth. | 2012-12-27 |
| 20120326260 | PHOTODIODE THAT INCORPORATES A CHARGE BALANCED SET OF ALTERNATING N AND P DOPED SEMICONDUCTOR REGIONS - A photodiode comprises a first terminal formed in a surface of a semiconductor substrate; a second terminal formed in the substrate surface and spaced apart from the first terminal; and a plurality of adjacent alternating N-type and P-type diffusion regions formed in the substrate surface between the first terminal and the second terminal. | 2012-12-27 |
| 20120326261 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR THE SAME - A semiconductor structure and a manufacturing method for the same are provided. The semiconductor structure includes a well region, a dielectric structure, a first doped layer, a second doped layer and a first doped region. The dielectric structure is on the well region. The dielectric structure has a first dielectric sidewall and a second dielectric sidewall opposite to each other. The dielectric structure includes a first dielectric portion and a second dielectric portion, between the first dielectric sidewall and the second dielectric sidewall. The first doped layer is on the well region between the first dielectric portion and the second dielectric portion. The second doped layer is on the first doped layer. The first doped region is in the well region on the first dielectric sidewall. | 2012-12-27 |
| 20120326262 | Semiconductor Integrated Circuit Device and A Method of Manufacturing the Same - To reduce size of a finished product by reducing the number of externally embedded parts, embedding of a Schottky barrier diode relatively large in the amount of current in a semiconductor integrated circuit device has been pursued. It is general practice to densely arrange a number of contact electrodes in a matrix over a Schottky junction region. A sputter etching process to the surface of a silicide layer at the bottom of each contact hole is performed before a barrier metal layer is deposited. However, in a structure in which electrodes are thus arranged over a Schottky junction region, a reverse leakage current in a Schottky barrier diode is varied by variations in the amount of sputter etching. The present invention is a semiconductor integrated circuit device having a Schottky barrier diode in which contact electrodes are arranged over a guard ring in contact with a peripheral isolation region. | 2012-12-27 |
| 20120326263 | SEMICONDUCTOR DIODE - A semiconductor diode includes a semiconductor substrate having a lightly doped region with a first conductivity type therein. A first heavily doped region with a second conductivity type opposite to the first conductivity type is in the lightly doped region. A second heavily doped region with the first conductivity type is in the lightly doped region and is in direct contact with the first heavily doped region. A first metal silicide layer is on the semiconductor substrate and is in direct contact with the first heavily doped region. A second metal silicide layer is on the semiconductor substrate and is in direct contact with the second heavily doped region. The second metal silicide layer is spaced apart from the first metal silicide layer. | 2012-12-27 |
| 20120326264 | METHOD OF FABRICATING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE - A method of fabricating a semiconductor device of the present invention includes the steps of forming a single crystal semiconductor device, attaching the single crystal semiconductor device on a substrate, forming a TFT on a glass substrate, and electrically connecting the single crystal semiconductor device and the TFT. In the step of forming a single crystal semiconductor device, an alignment mark is provided at the single crystal semiconductor device. In the step of attaching a single crystal semiconductor device, the single crystal semiconductor device is positioned and attached on the glass substrate based on the machining accuracy of an attachment device. In the step of forming a TFT, the TFT is positioned and provided on the glass substrate based on the alignment mark provided at the single crystal semiconductor device. | 2012-12-27 |
| 20120326265 | METHOD OF FORMING MEMORY CELL ACCESS DEVICE - A memory device includes an access device including a first doped semiconductor region having a first conductivity type, and a second doped semiconductor region having a second conductivity type opposite the first conductivity type. Both the first and the second doped semiconductor regions are formed in a single-crystalline semiconductor body, and define a p-n junction between them. The first and second doped semiconductor regions are implemented in isolated parallel ridges formed in the single-crystal semiconductor body. Each ridge is crenellated, and the crenellations define semiconductor islands; the first doped semiconductor region occupies a lower portion of the islands and an upper part of the ridge, and the second doped semiconductor region occupies an upper portion of the islands, so that the p-n junctions are defined within the islands. | 2012-12-27 |
| 20120326266 | HIGH-VOLTAGE SEMICONDUCTOR DEVICE - A high-voltage semiconductor device is disclosed. The HV semiconductor device includes: a substrate; a well of first conductive type disposed in the substrate; a first doping region of second conductive type disposed in the p-well; a first isolation structure disposed in the well of first conductive type and surrounding the first doping region of second conductive type; and a first drift ring of second conductive type disposed between the first doping region of second conductive type and the first isolation structure. | 2012-12-27 |
| 20120326267 | COMPOSITE ISOLATION LAYER STRUCTURES FOR SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME - An isolation structure includes an oxide region in a lower portion of a trench on a substrate, an oxide layer conforming to a sidewall of the trench in an upper portion of the trench above the oxide region and a nitride region in the upper portion of the trench on the oxide region and the oxide layer. The substrate may include silicon, the oxide region may include silicon oxide and the nitride region may include silicon nitride. The oxide region may have a thickness of more than half of a height from a bottom of the trench to a top of the trench. | 2012-12-27 |
| 20120326268 | SILICON EPITAXIAL WAFER, METHOD FOR MANUFACTURING THE SAME, BONDED SOI WAFER AND METHOD FOR MANUFACTURING THE SAME - A silicon epitaxial wafer having a silicon epitaxial layer grown by vapor phase epitaxy on a main surface of a silicon single crystal substrate, wherein the main surface of the silicon single crystal substrate is tilted with respect to a [100] axis at an angle θ in a [011] direction or a [0-1-1] direction from a (100) plane and at an angle Φ in a [01-1] direction or a [0-11] direction from the (100) plane, the angle θ and the angle Φ are less than ten minutes, and a dopant concentration of the silicon epitaxial layer is equal to or more than 1×10 | 2012-12-27 |
| 20120326269 | E-FUSE STRUCTURES AND METHODS OF MANUFACTURE - E-fuse structures in back end of the line (BEOL) interconnects and methods of manufacture are provided. The method includes forming an interconnect via in a substrate in alignment with a first underlying metal wire and forming an e-fuse via in the substrate, exposing a second underlying metal wire. The method further includes forming a defect with the second underlying metal wire and filling the interconnect via with metal and in contact with the first underlying metal wire thereby forming an interconnect structure. The method further includes filling the e-fuse via with the metal and in contact with the defect and the second underlying metal wire thereby forming an e-fuse structure. | 2012-12-27 |
| 20120326270 | INTERDIGITATED VERTICAL NATIVE CAPACITOR - A metal capacitor structure includes a plurality of line level structures vertically interconnected with via level structures. Each first line level structure and each second line level structure includes a set of parallel metal lines that is physically joined at an end to a rectangular tab structure having a rectangular horizontal cross-sectional area. A first set of parallel metal lines within a first line level structure and a second set of parallel metal lines within a second line level structure are interdigitated and parallel to each other, and can collectively form an interdigitated uniform pitch structure. Because the rectangular tab structures do not protrude toward each other within a region between two facing sidewalls of the rectangular tab structures, sub-resolution assist features (SRAFs) can be employed to provide a uniform width and a uniform pitch throughout the entirety of the interdigitated uniform pitch structure. | 2012-12-27 |
| 20120326271 | SECONDARY DEVICE INTEGRATION INTO CORELESS MICROELECTRONIC DEVICE PACKAGES - The present disclosure relates to the field of fabricating microelectronic device packages and, more particularly, to microelectronic device packages having bumpless build-up layer (BBUL) designs, wherein at least one secondary device is disposed within the thickness (i.e. the z-direction or z-height) of the microelectronic device of the microelectronic device package. | 2012-12-27 |
| 20120326272 | THIN-FILM CAPACITOR, MULTILAYER WIRING BOARD AND SEMICONDUCTOR DEVICE - A thin-film capacitor with first capacitative elements each having an electrode layer with a first polarity on an upper surface of a dielectric layer and an electrode layer with a second polarity on a lower surface of the dielectric layer; second capacitative elements each having an electrode layer with the second polarity on the upper surface and an electrode layer with the first polarity on the lower surface and arranged around a specific position alternately with the first capacitative elements; a single common connection hole at the specific position connecting all electrode layers with the first polarity of the first and second capacitative elements; and individual connection holes around the common connection hole connecting each electrode layer with the second polarity of the adjacent and second capacitative elements. | 2012-12-27 |
| 20120326273 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device including a plurality of capacitors each of which has bottom electrode, dielectric layer, and top electrode includes stacking a bottom electrode layer, a dielectric layer and an top electrode layer, patterning the top electrode layer to form a plurality of top electrodes arranged in a column, forming a mask pattern that covers the plurality of top electrodes and leaves an end part of the outermost top electrode of the arrangement of the plurality of top electrodes exposed, and patterning the dielectric layer using the mask pattern. | 2012-12-27 |
| 20120326274 | SEMICONDUCTOR STRUCTURE HAVING AN INTEGRATED QUADRUPLE-WALL CAPACITOR FOR EMBEDDED DYNAMIC RANDOM ACCESS MEMORY (EDRAM) AND METHOD TO FORM THE SAME - Semiconductor structures having integrated quadruple-wall capacitors for eDRAM and methods to form the same are described. For example, an embedded quadruple-wall capacitor includes a trench disposed in a first dielectric layer disposed above a substrate. The trench has a bottom and sidewalls. A quadruple arrangement of metal plates is disposed at the bottom of the trench, spaced apart from the sidewalls. A second dielectric layer is disposed on and conformal with the sidewalls of the trench and the quadruple arrangement of metal plates. A top metal plate layer is disposed on and conformal with the second dielectric layer. | 2012-12-27 |
| 20120326275 | Capacitors - Some embodiments include capacitors. The capacitors may include container-shaped storage node structures that have, along a cross-section, a pair of upwardly-extending sidewalls. Individual sidewalls may have a narrower segment over a wider segment. Capacitor dielectric material and capacitor electrode material may be along the narrower and wider segments of the sidewalls. Some embodiments include methods of forming capacitors in which an initial container-shaped storage node structure is formed to have a pair of upwardly-extending sidewalls along a cross-section, with the sidewalls being of thickness that is substantially constant or increasing from a base to a top of the initial structure. The initial structure is then converted into a modified storage node structure by reducing thicknesses of upper segments of the sidewalls while leaving thicknesses of lower segments of the sidewalls substantially unchanged. Capacitor dielectric material and capacitor electrode material are formed along the modified storage node structure. | 2012-12-27 |
| 20120326276 | Buried Layer of An Integrated Circuit - Various aspects of the technology are directed to integrated circuit manufacturing methods and integrated circuits. In one method, a first charge type buried layer in a semiconductor material of an integrated circuit by implanting first charge type dopants of the first charge type buried layer through a sacrificial oxide over the semiconductor material and through an intermediate region of the semiconductor material transited by the implanted first charge type dopants. When the implanted dopants pass through the sacrificial oxide, damage to the semiconductor crystalline lattice is averted. If the sacrificial oxide were absent, the implanted dopants would have passed through and damaged the semiconductor crystalline lattice instead. Later, a pre-anneal oxide is grown and removed. | 2012-12-27 |
| 20120326277 | POWER SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A power semiconductor device and a manufacturing method thereof are provided. The method of manufacturing a power semiconductor device includes the steps: (a) forming a cell structure on a first conductivity type semiconductor substrate; (b) implanting second conductivity type ions onto the rear surface of the first conductivity type semiconductor substrate and activating to form an electrode region; and (c) implanting ions creating first conductivity type with a doping concentration higher than that of the semiconductor substrate and activating to form a high-concentration ion implanted region at a position below the cell structure and on the electrode region. Accordingly, it is possible to form a field stop layer regardless of conditions for forming an electrode region (for example, a P-type collector region) and thus to optimize stable breakdown voltage characteristics and device characteristics. | 2012-12-27 |
| 20120326278 | METHOD TO SOLVE POTENTIAL YIELD LOSS DUE TO METAL MIGRATION TO WIRE ROUTING NETS FROM FIDUCIARY MARKS ON PRODUCT DURING CHEMICAL-MECHANICAL-POLISHING (CMP) PLANARIZATION PROCESSING STEPS - A mask for a semiconductor process step includes an indicia section. The indicia section on the mask is used to produce a field of separated polygon elements with a defined negative space in the field providing an indicia. | 2012-12-27 |
| 20120326279 | METHOD FOR FORMING SEMICONDUCTOR DEVICES WITH ACTIVE SILICON HEIGHT VARIATION - A semiconductor product has different active thicknesses of silicon on a single semiconductor substrate. The thickness of the silicon layer is changed either by selectively adding silicon or subtracting silicon from an original layer of silicon. The different active thicknesses are suitable for use in different types of devices, such as diodes and transistors. | 2012-12-27 |
| 20120326280 | LAMINATED FILM AND USE THEREOF - Provided is a laminated film wherein the space between semiconductor elements that are three-dimensionally mounted can be filled easily and securely. The laminated film of the present invention is a laminated film for filling the space between semiconductor elements that are electrically connected through a member or connection, the film including a dicing sheet in which a pressure-sensitive adhesive layer is laminated on a base material and a curable film that is laminated on the pressure-sensitive adhesive layer, wherein the curable film has a lowest melt viscosity at 50 to 200° C. of 1×10 | 2012-12-27 |
| 20120326281 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH INTERCONNECTS AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a substrate; attaching an integrated circuit to the substrate; attaching a vertical interconnect over the substrate; forming an encapsulation on the substrate and covering the vertical interconnect; and forming a rounded cavity, having a curved side, in the encapsulation with the vertical interconnect exposed in the rounded cavity. | 2012-12-27 |
| 20120326282 | METHODS AND ARRANGEMENTS RELATING TO SEMICONDUCTOR PACKAGES INCLUDING MULTI-MEMORY DIES - Embodiments provide a method comprising providing a multi-memory die that comprises multiple individual memory dies. Each of the individual memory dies is defined as an individual memory die within a wafer of semiconductor material during production of memory dies. The multi-memory die is created by singulating the wafer of semiconductor material into memory dies where at least one of the memory dies is a multi-memory die that includes multiple individual memory dies that are still physically connected together. The method further comprises coupling a semiconductor die to the multi-memory die. | 2012-12-27 |
| 20120326283 | Interconnect Regions - Some embodiments include interconnect regions. The regions may contain, along a cross section, a closed-shape interior region having an electrically conductive material therein, a first dielectric material configured as a liner extending entirely around a lateral periphery of the interior region, and at least two dielectric projections joining to the dielectric material liner and being laterally outward of the interior region. The dielectric projections may have an outer dielectric ring surrounding an inner dielectric region. The outer ring may consist of the first dielectric material and the inner dielectric region may be a composition different from a composition of the first dielectric material, and in some embodiments the composition within the inner dielectric region may be gaseous. | 2012-12-27 |
| 20120326284 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH THERMAL EMISSION AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: forming a lead array having an innermost space with an innermost lead having an inner lead profile different around an inner non-horizontal side of the innermost lead; forming a middle lead having a middle lead profile the same around a lead side of the middle lead; placing an integrated circuit in the innermost space adjacent to the innermost lead; and forming a package encapsulation over the integrated circuit, the innermost lead, and the middle lead. | 2012-12-27 |
| 20120326285 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH A LEAD AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: forming a package paddle; forming a lead adjacent to the package paddle; depositing a lead conductive cap on the lead, the lead conductive cap includes a nickel layer having a thickness between 2.55 μm to 8.00 μm deposited on the lead, a palladium layer deposited on the nickel layer, and a gold layer deposited on the palladium layer; mounting an integrated circuit over the package paddle; attaching an electrical connector between the lead conductive cap and the integrated circuit; and forming an encapsulation over the integrated circuit, a portion of the lead, and a portion of the package paddle. | 2012-12-27 |
| 20120326286 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH WAFER LEVEL RECONFIGURED MULTICHIP PACKAGING SYSTEM AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: removing a portion of a leadframe to form a partially removed region and an upper portion of a peripheral lead on the leadframe first side; mounting a first integrated circuit over the partially removed region with a first adhesive; forming a first molding layer directly on the first integrated circuit and the peripheral lead; removing a portion of a leadframe second side exposing the first adhesive; mounting a second integrated circuit on the first adhesive of the first integrated circuit; forming a first interconnection layer directly on the first integrated circuit with the first integrated circuit and the peripheral lead electrically connected; and forming a second interconnection layer directly on the second integrated circuit with the second integrated circuit and the peripheral lead electrically connected. | 2012-12-27 |
| 20120326287 | DC/DC CONVERTOR POWER MODULE PACKAGE INCORPORATING A STACKED CONTROLLER AND CONSTRUCTION METHODOLOGY - Methods and systems are described for enabling the efficient fabrication of small form factor power converters and also the small form factor power converter devices. | 2012-12-27 |
| 20120326288 | METHOD OF ASSEMBLING SEMICONDUCTOR DEVICE - A method of assembling a semiconductor device includes providing a conductive lead frame panel and selectively half-etching a top side of the lead frame panel to provide a pin pads. A flip chip die is attached and electrically connected to the pin pads and then the lead frame panel and die are encapsulated with molding compound. A second selective half etching step is performed on a backside of the lead frame panel to form a plurality of separate input/output pins. The side walls of each input/output pin include arcuate surfaces in cross-section. | 2012-12-27 |
| 20120326289 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes: leads ( | 2012-12-27 |
| 20120326290 | SILICON CARRIER OPTOELECTRONIC PACKAGING - An optoelectronic (OE) package or system and method for fabrication is disclosed which includes a silicon layer with wiring. The silicon layer has an optical via for allowing light to pass therethrough. An optical coupling layer is bonded to the silicon layer, and the optical coupling layer includes a plurality of microlenses for focusing and or collimating the light through the optical via. A plurality of OE elements are coupled to the silicon layer and electrically communicating with the wiring. At least one of the OE elements positioned in optical alignment with the optical via for receiving the light. A carrier is interposed between electrical interconnect elements. The carrier is positioned between the wiring of the silicon layer and a circuit board and the carrier is electrically connecting first interconnect elements connected to the wiring of the silicon layer and second interconnect elements connected to the circuit board. | 2012-12-27 |
| 20120326291 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH UNDERFILL AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a substrate; attaching a flip chip to the substrate; attaching a heat slug to the substrate and the flip chip; and forming a moldable underfill having a top underfill surface on the substrate, the flip chip, and the heat slug, the moldable underfill having a characteristic of being liquid at room temperature and the top underfill surface over the flip chip. | 2012-12-27 |
| 20120326292 | ELECTRONIC CONTROL UNIT - An electronic control unit includes a substrate, a semiconductor module, a heat storage body, an insulator, and a heat sink. The substrate includes a wiring and a land. The semiconductor module includes a semiconductor chip working as a switching element, a terminal electrically coupled with the semiconductor chip and the wiring, a molded resin sealing the semiconductor chip and the terminal, and a heat radiation plate having a surface exposed from the molded resin and transferring heat generated at the semiconductor chip. The heat storage body has a heat capacity required to store the heat generated at the semiconductor chip. The heat storage body is coupled with the heat radiation plate. The insulator is in contact with the heat storage body or the semiconductor module. The heat sink is in contact with the insulator. | 2012-12-27 |
| 20120326293 | SEMICONDUCTOR PACKAGE HAVING ELECTRODE ON SIDE SURFACE, AND SEMICONDUCTOR DEVICE - A semiconductor package includes a substrate, a semiconductor chip disposed on the substrate, and a connection wiring connected electrically to the semiconductor chip. The semiconductor package further includes a sidewall formed of an insulator, an inner electrode formed on a first surface of the sidewall that faces the substrate, and a sidewall external electrode formed on a second surface of the sidewall different from the first surface. The inner electrode and the sidewall external electrode are connected electrically, and the inner electrode is connected to the connection wiring. With this configuration, it is possible to suppress the semiconductor package from being large due to an increase in the number of sidewall external electrodes formed on the side surfaces of the semiconductor package, and to shorten a connection distance between the semiconductor packages by connecting the sidewall external electrodes. | 2012-12-27 |
| 20120326294 | MULTICHIP ELECTRONIC PACKAGES AND METHODS OF MANUFACTURE - A multi-chip electronic package and methods of manufacture are provided. The method comprises adjusting a piston position of one or more pistons with respect to one or more chips on a chip carrier. The adjusting comprises placing a chip shim on the chips and placing a seal shim between a lid and the chip carrier. The seal shim is thicker than the chip shim. The adjusting further comprise lowering the lid until the pistons contact the chip shim. The method further comprises separating the lid and the chip carrier and removing the chip shim and the seal shim. The method further comprises dispensing thermal interface material on the chips and lowering the lid until a gap filled with the thermal interface material is about a particle size of the thermal interface material. The method further comprises sealing the lid to the chip carrier with sealant. | 2012-12-27 |
| 20120326295 | SEMICONDUCTOR MODULE - A semiconductor module includes a semiconductor chip having a switching function, a resin portion that covers the chip, terminals, and a heat dissipation portion. The resin portion includes first and second surfaces, which are opposed to each other and expand generally parallel to an imaginary plane; and a substrate is located on a first surface-side of the resin portion. The terminals project from the resin portion in a direction of the imaginary plane and are soldered onto the substrate. The heat dissipation portion is disposed on a second surface-side of the resin portion to release heat generated in the chip. One of the terminals is connected to the heat dissipation portion such that heat is transmitted from the one of the terminals to the heat dissipation portion. | 2012-12-27 |
| 20120326296 | Semiconductor Device and Method of Forming Interconnect Structure Over Seed Layer on Contact Pad of Semiconductor Die Without Undercutting Seed Layer Beneath Interconnect Structure - A semiconductor device has a semiconductor die with a first conductive layer formed over the die. A first insulating layer is formed over the die with a first opening in the first insulating layer disposed over the first conductive layer. A second conductive layer is formed over the first insulating layer and into the first opening over the first conductive layer. An interconnect structure is constructed by forming a second insulating layer over the first insulating layer with a second opening having a width less than the first opening and depositing a conductive material into the second opening. The interconnect structure can be a conductive pillar or conductive pad. The interconnect structure has a width less than a width of the first opening. The second conductive layer over the first insulating layer outside the first opening is removed while leaving the second conductive layer under the interconnect structure. | 2012-12-27 |
| 20120326297 | Semiconductor Device and Method of Forming Protective Coating Over Interconnect Structure to Inhibit Surface Oxidation - A semiconductor device has a semiconductor die with a first conductive layer formed over the semiconductor die. A first insulating layer is formed over the semiconductor die with a first opening in the first insulating layer disposed over the first conductive layer. A second conductive layer is formed over the first insulating layer and into the first opening over the first conductive layer. An interconnect structure is formed over the first and second conductive layers within openings of a second insulating layer. The second insulating layer is removed. The interconnect structure can be a conductive pillar or conductive pad. A bump material can be formed over the conductive pillar. A protective coating is formed over the conductive pillar or pad to a thickness less than one micrometer to reduce oxidation. The protective coating is formed by immersing the conductive pillar or pad into the bath containing tin or indium. | 2012-12-27 |
| 20120326298 | BUMP STRUCTURE WITH BARRIER LAYER ON POST-PASSIVATION INTERCONNECT - A semiconductor device includes a barrier layer between a solder bump and a post-passivation interconnect (PPI) layer. The barrier layer is formed of at least one of an electroless nickel (Ni) layer, an electroless palladium (Pd) layer or an immersion gold (Au) layer. | 2012-12-27 |
| 20120326299 | SEMICONDUCTOR CHIP WITH DUAL POLYMER FILM INTERCONNECT STRUCTURES - Various semiconductor chip input/output structures and methods of making the same are disclosed. In one aspect, a method of manufacturing is provided that includes applying a first polymer film to a side of a semiconductor chip and forming a first underbump metallization structure with at least a portion on the first polymer film. A second polymer film is applied on the first polymer film with an opening exposing a portion of the first underbump metallization structure. | 2012-12-27 |
| 20120326300 | LOW PROFILE PACKAGE AND METHOD - In a method aspect, a multiplicity of ICs are attached to routing on a structurally supportive carrier (such as a wafer). The dice are encapsulated and then both the dice and the encapsulant layer are thinned with the carrier in place. A second routing layer is formed over the first encapsulant layer and conductive vias are provided to electrically couple the first and second routing layers as desired. External I/O contacts (e.g. solder bumps) are provided to facilitate electrical connection of the second routing layer (or a subsequent routing layer in stacked packages) to external devices. A contact encapsulant layer is then formed over the first encapsulant layer and the second routing layer in a manner that embeds the external I/O contacts at least partially therein. After the contact encapsulant layer has been formed, the carrier itself may be thinned significantly and singulated to provide a number of very low profile packages. The described approach can also be used to form stacked multi-chip packages. | 2012-12-27 |
| 20120326301 | THERMOSETTING RESIN COMPOSITION, FLIP-CHIP MOUNTING ADHESIVE, SEMICONDUCTOR DEVICE FABRICATION METHOD, AND SEMICONDUCTOR DEVICE - The present invention is aimed to provide a thermosetting resin composition which is easily produced, has excellent storage stability and thermal stability while maintaining high transparency and preventing formation of voids on the occasion of semiconductor chip bonding, and gives a cured product having excellent heat resistance, a flip-chip mounting adhesive containing the thermosetting resin composition, a method for producing a semiconductor device using the flip-chip mounting adhesive, and a semiconductor device produced by the method for producing a semiconductor device. The present invention is a thermosetting resin composition including an epoxy resin, an acid anhydride having a bicycle skeleton, and an imidazole curing accelerator that is in a liquid form at an ordinary temperature. | 2012-12-27 |
| 20120326302 | Semiconductor Device and Method of Forming PIP with Inner Known Good Die Interconnected with Conductive Bumps - A PiP semiconductor device has an inner known good semiconductor package. In the semiconductor package, a first via is formed in a temporary carrier. A first conductive layer is formed over the carrier and into the first via. The first conductive layer in the first via forms a conductive bump. A first semiconductor die is mounted to the first conductive layer. A first encapsulant is deposited over the first die and carrier. The semiconductor package is mounted to a substrate. A second semiconductor die is mounted to the first conductive layer opposite the first die. A second encapsulant is deposited over the second die and semiconductor package. A second via is formed in the second encapsulant to expose the conductive bump. A second conductive layer is formed over the second encapsulant and into the second via. The second conductive layer is electrically connected to the second die. | 2012-12-27 |
| 20120326303 | Semiconductor Device and Method of Forming Partially-Etched Conductive Layer Recessed Within Substrate for Bonding to Semiconductor Die - A semiconductor device has a substrate with a die attach area. A conductive layer is formed over a surface of the substrate and extending below the surface. An insulating layer is formed over the surface of the substrate outside the die attach area. A portion of the conductive layer is removed within the die attach area to expose sidewalls of the substrate. The remaining portion of the conductive layer is recessed below the surface of the substrate within the die attach area. A semiconductor die has bumps formed over its active surface. The semiconductor die is mounted to the substrate by bonding the bumps to the remaining portion of the first conductive layer recessed below the first surface of the substrate. The sidewalls of the substrate retain the bumps during bonding to the remaining portion of the conductive layer. An encapsulant is deposited between the semiconductor die and substrate. | 2012-12-27 |
| 20120326304 | Externally Wire Bondable Chip Scale Package in a System-in-Package Module - There is provided a system and method for an externally wire bondable chip scale package in a system-in-package module. There is provided a system-in-package module comprising a substrate including a first contact pad disposed thereon, a packaged device attached to the substrate, wherein an electrode of the packaged device is wirebonded to the first contact pad, and an unpackaged device, wherein an electrode of the unpackaged device is coupled to the substrate. By flipping the packaged device within the module and utilizing wire bondable finishes on the packaged device, an externally wire bondable chip scale package may be provided. The structure of the disclosed system-in-package module provides several advantages over conventional designs including increased yields, a single assembly line, facilitated die substitution, reduced heat stress, higher package density, and a simplified single package structure for reduced fabrication time and cost. | 2012-12-27 |
| 20120326305 | SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - A semiconductor package includes: a dielectric layer having opposing first and second surfaces and side surfaces; a copper wiring layer disposed on the first surface of the dielectric layer and having extension pads; a surface processing layer disposed on the wiring layer; a semiconductor chip disposed on the wiring layer and electrically connected to the surface processing layer; and an encapsulant disposed on the first surface of the dielectric layer for encapsulating the semiconductor chip, the wiring layer and the surface processing layer while exposing the second surface of the dielectric layer. Further, vias are disposed between the side surfaces of the dielectric layer and the encapsulant such that the extension pads are exposed from the vias so as for solder balls to be disposed thereon. Due to improved electrical connection between the copper and solder materials, the electrical connection quality of the package is improved. | 2012-12-27 |
| 20120326306 | POP PACKAGE AND MANUFACTURING METHOD THEREOF - The present invention relates to a package on package (POP) package and a manufacturing method thereof, and provides a POP package and a manufacturing method thereof in which the POP package can be implemented by using a transfer mold method without employing a top gate mold method. To this end, the present invention comprises: a lower semiconductor package which includes a first solder ball and a semiconductor chip formed on the upper surface of a substrate, and a mold for molding the semiconductor chip and the solder ball so that a part of the first solder ball may be exposed; and an upper semiconductor package which is stacked so that a connection is made to an exposed part of a second solder ball through the second solder ball formed on the lower surface. | 2012-12-27 |
| 20120326307 | STACKED SEMICONDUCTOR DEVICE - A stacked semiconductor device including a plurality of semiconductor chips stacked vertically, a plurality of scribe lane elements each forming a step with a semiconductor chip of the plurality of semiconductor chips and respectively formed on a side surface of each of the plurality of semiconductor chips, a redistribution element respectively formed on each of the plurality of semiconductor chips and the scribe lane elements, and a signal connection member formed on the side surface of each of the plurality of semiconductor chips and electrically connecting the redistribution elements. | 2012-12-27 |
| 20120326308 | ENHANCED WLP FOR SUPERIOR TEMP CYCLING, DROP TEST AND HIGH CURRENT APPLICATIONS - A WLP device is provided with a flange shaped UBM or an embedded partial solder ball UBM on top of a copper post style circuit connection. | 2012-12-27 |
| 20120326309 | OPTIMIZED ANNULAR COPPER TSV - The present disclosure provides a thermo-mechanically reliable copper TSV and a technique to form such TSV during BEOL processing. The TSV constitutes an annular trench which extends through the semiconductor substrate. The substrate defines the inner and outer sidewalls of the trench, which sidewalls are separated by a distance within the range of 5 to 10 microns. A conductive path comprising copper or a copper alloy extends within said trench from an upper surface of said first dielectric layer through said substrate. The substrate thickness can be 60 microns or less. A dielectric layer having interconnect metallization conductively connected to the conductive path is formed directly over said annular trench. | 2012-12-27 |
| 20120326310 | NANOSCALE INTERCONNECTS FABRICATED BY ELECTRICAL FIELD DIRECTED ASSEMBLY OF NANOELEMENTS - The invention provides a fast, scalable, room temperature process for fabricating metallic nanorods from nanoparticles or fabricating metallic or semiconducting nanorods from carbon nanotubes suspended in an aqueous solution. The assembled nanorods are suitable for use as nanoscale interconnects in CMOS-based devices and sensors. Metallic nanoparticles or carbon nanotubes are assembled into lithographically patterned vias by applying an external electric field. Since the dimensions of nanorods are controlled by the dimensions of vias, the nanorod dimensions can be scaled down to the low nanometer range. The aqueous assembly process is environmentally friendly and can be used to make nanorods using different types of metallic particles as well as semiconducting and metallic nanaotubes. | 2012-12-27 |
| 20120326311 | ENHANCED DIFFUSION BARRIER FOR INTERCONNECT STRUCTURES - Alternative methods of fabricating an interconnect structure in which an enhanced diffusion barrier including an in-situ formed metal nitride liner formed between an interconnect dielectric material and an overlying metal diffusion barrier liner are provided. In one embodiment, the method includes forming at least one opening into an interconnect dielectric material. A nitrogen enriched dielectric surface layer is formed within exposed surfaces of the interconnect dielectric material utilizing thermal nitridation. A metal diffusion barrier liner is formed on the nitrogen enriched dielectric surface. During and/or after the formation of the metal diffusion barrier liner, a metal nitride liner forms in-situ in a lower region of the metal diffusion barrier liner. A conductive material is then formed on the metal diffusion barrier liner. The conductive material, the metal diffusion barrier liner and the metal nitride liner that are located outside of the at least one opening are removed to provide a planarized conductive material, a planarized metal diffusion barrier liner and a planarized metal nitride liner, each of which includes an upper surface that is co-planar with the nitrogen enriched dielectric surface layer of the interconnect dielectric material. | 2012-12-27 |
