38th week of 2014 patent applcation highlights part 89 |
Patent application number | Title | Published |
20140268065 | IMAGE PROJECTION SYSTEM AND IMAGE PROJECTION METHOD - An image projection system projects a plurality of same images on a plane of projection by superimposition. The image projection system includes a plurality of projectors configured to have mutually different resolutions and project the plurality of same images on the plane of projection, and an image data output device configured to output to the plurality of projectors image data corresponding to the plurality of same images with the resolutions of the plurality of projectors, respectively. | 2014-09-18 |
20140268066 | MULTI-COLOUR ILLUMINATION APPARATUS - A light engine is provided for a projection system, comprising a color wheel having a plurality of color phosphor portions; at least two light sources for illuminating the wheel at different locations for generating at least two time-sequenced beams of red, green and blue light, wherein the output beams are highly synchronized and exhibit substantially similar colorimetry, including spectrum and balance of red, green and blue light; and a digital micromirror device for modulating the time-sequenced beams of red, green and blue light to create an image. In another aspect, a light engine is provided for a tiled projection system having at least two projectors, comprising a color wheel having a plurality of color phosphor portions; a light source for generating a beam of light; a beam splitter for splitting the beam of light into at least two highly correlated beams to illuminate the wheel at different locations for generating at least two time-sequenced beams of identical red, green and blue light; and a digital micromirror device in each of the projectors for modulating the highly correlated beams to create a tiled image | 2014-09-18 |
20140268067 | ILLUMINATION DEVICE AND PROJECTOR - A illumination device includes a light source, a diffractive optical element on which light emitted from the light source is made incident, and a superimposing optical system on which diffracted light emitted from the diffractive optical element is made incident. A direction of a principal ray in the center of the diffracted light coincides with an optical axis of the superimposing optical system. Consequently, it is possible to reduce an aberration due to the superimposing optical system and to emit illumination light having a more uniform illuminance distribution. | 2014-09-18 |
20140268068 | LIGHT SOURCE UNIT, LIGHTING APPARATUS AND IMAGE PROJECTION APPARATUS - A light source unit includes a first reflector having a reflection face; a second reflector having a reflection face; a plurality of light sources; and a light condensing optical system to condense light emitted from the plurality of light sources. Light beams emitted from the plurality of light sources are reflected at a first reflection position on the reflection face of the first reflector, and then reflected at a second reflection position on the reflection face of the second reflector. The second reflection position is close to an optical axis of the light condensing optical system compared to the first reflection position. | 2014-09-18 |
20140268069 | LIGHT SOURCE UNIT AND PROJECTOR INCORPORATING THE SAME - A light source unit emitting a light on an optical axis includes a first light emitter to emit a light in a certain wavelength band, a second light emitter to emit a light in a wavelength band different from that of the first light emitter, a third light emitter to emit a light in a wavelength band different from those of the first and second light emitters, a lighting path through which the lights from the first, second, and third light emitters are guided to propagate on the optical axis and into which the light from the third light emitter is joined at a hindmost position in a traveling direction on the optical axis, and an optical adjuster to exert an optical effect on the light from the third light emitter and not to exert an optical effect on the light rays from the first and second light emitters. | 2014-09-18 |
20140268070 | DISTORTION CORRECTION FOR PROJECTOR - An image processing device for a projector including an image formation section that emits light of an image, and a projection system that projects the emitted light onto a projection surface. The image processing device has a distortion correction technique for images displayed on the projection surface. The image processing device has a target display area determination section that determines, in a display area serving as a reference on the projection surface, based on a current value of a parameter, any of target display areas set for values possibly taken by the parameter within an allowable range to be targeted on a distortion-free image for display on the projection surface; a reference formation area determination section that determines a reference formation area to be formed with a virtual distorted image and a correction application section that generates corrected image data for supply to the image formation section. | 2014-09-18 |
20140268071 | DISPLAY DEVICE HAVING A DOUBLE IMAGE DISPLAY FUNCTION - A display device having a double image display function includes a base unit, a support unit, a first image display unit, a second image display unit and an image projecting unit. The base unit includes a base body. The support unit includes a support structure disposed on the base body. The first image display unit includes at least one image display screen movably disposed on the support structure for displaying a first predetermined image. The second image display unit includes at least one projection plate movably disposed on the base body. The image projecting unit includes an image projecting module movably disposed on the image display screen. An image light beam generated by the image projecting module is projected onto the projection plate to display a second predetermined image on the projection plate. Thus, the same or different displaying images can be respectively shown on different viewing planes. | 2014-09-18 |
20140268072 | LIGHT SOURCE UNIT, LIGHTING APPARATUS AND IMAGE PROJECTION APPARATUS - A light source unit includes a first reflector having a reflection face; a second reflector having a reflection face; a plurality of light sources; and a light condensing optical system disposed between the first reflector and the second reflector. Light beams emitted from the plurality of light sources are reflected at a first reflection position on the reflection face of the first reflector, and then reflected at a second reflection position on the reflection face of the second reflector. The second reflection position is close to an optical axis of the light condensing optical system compared to the first reflection position. The light condensing optical system is configured such that the light beam passes through the light condensing optical system at least two times when the light beams reflect between the first reflector and the second reflector. | 2014-09-18 |
20140268073 | PROJECTION OPTICAL SYSTEM AND PROJECTOR APPARATUS - A projection optical system comprises an image forming unit that forms an image; a refractive optical system including a plurality of lenses that enlarges and projects the image on a screen; and a reflecting surface, wherein an intermediate image is formed between the refractive optical system and the reflecting surface, and the projection optical system satisfies conditions of “0.62014-09-18 | |
20140268074 | Lithography System with an Embedded Cleaning Module - The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism. | 2014-09-18 |
20140268075 | SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING COUNTOUR BASED ASSESSMENTS AND INTEGRATION OVER PROCESS VARIATIONS - Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints and formulating an optimization problem that is based on the source, mask and target constraints and incorporates contour-based assessments for the target shape that are based on physical design quality of a circuit. Further, the optimization problem is solved by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape. In addition, the determined source shape and mask shape are output | 2014-09-18 |
20140268076 | SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICATION - A dynamic pattern generator (DPG) device and method of making a DPG device are disclosed. The DPG device is used in semiconductor processing tools that require multiple electron-beams, such as direct-write lithography. The device is a self-aligned DPG device that enormously reduces the required tolerances for aligning the various electrode layers, as compared to other design configurations including the non-self-aligned approach and also greatly simplifies the process complexity and cost. A process sequence for both integrated and non-integrated versions of the self-aligned DPG device is described. Additionally, an advanced self-aligned DPG device that eliminates the need for a charge dissipating coating or layer to be used on the device is described. Finally, a fabrication process for the implementation of both integrated and non-integrated versions of the advanced self-aligned DPG device is described. | 2014-09-18 |
20140268077 | A FLOW LITHOGRAPHY TECHNIQUE TO FORM MICROSTRUCTURES USING OPTICAL ARRAYS - A continuous flow projection lithography system to form microstructures using an optical array incorporated in a continuous coating process is provided. A mask is placed at a distance from the array. Each element of the array projects one image of the mask onto a substrate, effectively forming an array thereon. A coating process allows flows that can be used to define functional regions of particles or supporting layers that prevent adhesion of crosslinked polymers to surfaces. | 2014-09-18 |
20140268078 | ELECTRON BEAM LITHOGRAPHY SYSTEMS AND METHODS INCLUDING TIME DIVISION MULTIPLEX LOADING - The present disclosure provides a systems and methods for e-beam lithography. One system includes an electron source operable to produce a beam and an array of pixels operable to pattern the beam. Control circuitry is spaced a distance from and coupled to the array of pixels. The control circuitry uses time domain multiplex loading (TMDL) to control the array of pixels. | 2014-09-18 |
20140268079 | PARTICLE COUNTER AND IMMERSION EXPOSURE SYSTEM INCLUDING THE SAME - A particle counter may include a housing having an inlet, an outlet, and a window therebetween. The inlet and the outlet may be configured such that a fluid can be flowed therethrough. A plurality of light sources may be arranged outside the housing to provide lights of different wavelengths into the housing through the window. Sensors may be provided outside the housing to detect fractions of the lights scattered by a bubble and/or a particle in the fluid. A control part may be configured to monitor intensities of the lights detected by the sensors and to analyze a difference in intensity between the scattered lights, thereby distinguishing the particles from the bubbles in the fluid. | 2014-09-18 |
20140268080 | PLANARIZED EXTREME ULTRAVIOLET LITHOGRAPHY BLANK, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR - An integrated extreme ultraviolet (EUV) blank production system includes: a vacuum chamber for placing a substrate in a vacuum; a first deposition system for depositing a planarization layer having a planarized top surface over the substrate; and a second deposition system for depositing a multi-layer stack on the planarization layer without removing the substrate from the vacuum. The EUV blank is in an EUV lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the EUV source; a reticle stage for placing a EUV mask blank with a planarization layer; and a wafer stage for placing a wafer. The EUV blank includes: a substrate; a planarization layer to compensate for imperfections related to the surface of the substrate, the planarization layer having a flat top surface; and a multi-layer stack on the planarization layer. | 2014-09-18 |
20140268081 | AMORPHOUS LAYER EXTREME ULTRAVIOLET LITHOGRAPHY BLANK, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR - An integrated extreme ultraviolet blank production system includes: a vacuum chamber for placing a substrate in a vacuum; a deposition system for depositing a multi-layer stack without removing the substrate from the vacuum; and a treatment system for treating a layer on the multi-layer stack to be deposited as an amorphous metallic layer. A physical vapor deposition chamber for manufacturing an extreme ultraviolet mask blank includes: a target, comprising molybdenum alloyed with boron. An extreme ultraviolet lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for placing an extreme ultraviolet mask blank with a multi-layer stack having an amorphous metallic layer; and a wafer stage for placing a wafer. An extreme ultraviolet blank includes: a substrate; a multi-layer stack having an amorphous metallic layer; and capping layers over the multi-layer stack. | 2014-09-18 |
20140268082 | VAPOR DEPOSITION DEPOSITED PHOTORESIST, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR - A photoresist vapor deposition system includes: a vacuum chamber having a heating element and cooled chuck for holding a substrate, the vacuum chamber having a heated inlet; and a vapor deposition system connected to the heated inlet for volatilizing a precursor into the vacuum chamber for condensing a photoresist over the substrate cooled by the cooled chuck. The deposition system creates a semiconductor wafer system that includes: a semiconductor wafer; and a vapor deposited photoresist over the semiconductor wafer. An extreme ultraviolet lithography system requiring the semiconductor wafer system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for imaging the light from the extreme ultraviolet light source; and a wafer stage for placing a semiconductor wafer with a vapor deposited photoresist. | 2014-09-18 |
20140268083 | ULTRA-SMOOTH LAYER ULTRAVIOLET LITHOGRAPHY MIRRORS AND BLANKS, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR - An extreme ultraviolet mirror or blank production system includes: a first deposition system for depositing a planarization layer over a semiconductor substrate; a second deposition system for depositing an ultra-smooth layer over the planarization layer, the ultra-smooth layer having reorganized molecules; and a third deposition system for depositing a multi-layer stack over the ultra-smooth layer. The extreme ultraviolet blank includes: a substrate; a planarization layer over the substrate; an ultra-smooth layer over the planarization layer, the ultra-smooth layer having reorganized molecules; a multi-layer stack; and capping layers over the multi-layer stack. An extreme ultraviolet lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for placing an extreme ultraviolet mask blank with a planarization layer and an ultra-smooth layer over the planarization layer; and a wafer stage for placing a wafer. | 2014-09-18 |
20140268084 | PROJECTION LENS WITH WAVEFRONT MANIPULATOR - A projection lens for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength λ<260 nm has a multiplicity of optical elements having optical surfaces which are arranged in a projection beam path between the object plane (OS) and the image plane. Provision is made of a wavefront manipulation system for dynamically influencing the wavefront of the projection radiation passing from the object plane to the image plane. | 2014-09-18 |
20140268085 | OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - The invention relates to an optical system for a microlithographic projection exposure apparatus, comprising an optical system axis (OA) and a polarization-influencing optical arrangement, wherein the polarization-influencing optical arrangement comprises a first polarization-influencing element, which is produced from optically uniaxial crystal material and has a first orientation of the optical crystal axis, the-first orientation being perpendicular to the optical system axis and a thickness that varies in the direction of the optical system axis, and a second polarization-influencing element, which is arranged downstream of the first polarization-influencing element in the light propagation direction, is produced from optically uniaxial crystal material and has a second orientation of the optical crystal axis, the second orientation being perpendicular to the optical system axis, and a plane-parallel geometry, wherein the second orientation is different from the first orientation. | 2014-09-18 |
20140268086 | Extreme Ultraviolet Lithography Process and Mask - The present disclosure is directed towards lithography processes. In one embodiment, a patterned mask is provided. An information of a position of diffraction light (PDL) on a pupil plane of a projection optics box (POB) is used to define as a light-transmitting region of a pupil filter. The patterned mask is exposed by an on-axis illumination (ONI) with partial coherence σ less than 0.3. The pupil filter is used to transmit diffraction light to a target. | 2014-09-18 |
20140268087 | Lithography and Mask for Resolution Enhancement - A lithography process in a lithography system includes loading a mask having multiple mask states and having a mask pattern consisting of a plurality of polygons and a field. Different mask states are assigned to adjacent polygons and the field. The lithography process further includes configuring an illuminator to generate an illumination pattern on an illumination pupil plane of the lithography system; configuring a pupil filter on a projection pupil plane of the lithography system with a filtering pattern determined according to the illumination pattern; and performing an exposure process to a target with the illuminator, the mask, and the pupil filter. The exposure process produces diffracted light and non-diffracted light behind the mask and the pupil filter removes most of the non-diffracted light. | 2014-09-18 |
20140268088 | MECHANICALLY PRODUCED ALIGNMENT FIDUCIAL METHOD AND DEVICE - The technology disclosed relates to methods and systems that can be used to reduce visible artifacts know as mura. In particular, it relates to producing alignment marks by physically modifying appearance of a layer of exposure or radiation sensitive material on a workpiece, then using those alignment marks or transferred direct or inverted images of those marks to realign a writing coordinate system between exposure writing passes, following physical movement of the workpiece within the writing system. The physical modifications described include mechanically pressing a mark into the layer, using a laser to ash or ablate the layer, or applying an ink or other substance to the surface of the laser. | 2014-09-18 |
20140268089 | PATTERN FORMING APPARATUS, MARK DETECTING APPARATUS, EXPOSURE APPARATUS, PATTERN FORMING METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - While a wafer stage linearly moves in a Y-axis direction, a multipoint AF system detects surface position information of the wafer surface at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer. That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved. | 2014-09-18 |
20140268090 | CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, REGISTRATION, AND OVERLAY TECHNIQUES - Methods for reducing reticle transmission differences and for optimizing layer placement for overlay in MTRs and CTRs are disclosed. Embodiments include providing a reticle having a prime area and a frame area surrounding the prime area; determining RT differences across the prime area; and providing RT adjustment structures on the reticle to decrease the RT differences. Other embodiments include grouping multiple layers of a semiconductor production flow, the layers for each group having an RT difference less than a predetermined value; and placing the layers on plural ordered reticles of a reticle set, each reticle having multiple image fields, by selecting, for each reticle, layers from a single group and optimizing placement of the layers for overlay. Other embodiments include selectively rotating image fields on a reticle having multiple image fields to improve overlay, or optimizing placement of DDLs on CTRs by placing each design orientation on a different reticle. | 2014-09-18 |
20140268091 | Extreme Ultraviolet Lithography Process and Mask - A system and process of an extreme ultraviolet lithography (EUVL) is disclosed. The system and process includes receiving a mask with two states, which have 180 degree phase difference to each other. These different states are assigned to adjacent main polygons and adjacent assist polygons of the mask. A nearly on-axis illumination (ONI) with partial coherence σ less than 0.3 is utilized to expose the mask to produce diffracted lights and non-diffracted lights. A majority portion of the non-diffracted lights and diffracted light with diffraction order higher than 1 are removed. Diffracted light having +1-st and −1-st diffracted order are collected and directed by a projection optics box (POB) to expose a target. | 2014-09-18 |
20140268092 | Extreme Ultraviolet Lithography Process and Mask - A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. These different states of the EUV mask are assigned to adjacent polygons and adjacent assist polygons. The EUV mask is exposed by a nearly on-axis illumination (ONI) with partial coherence σ less than 0.3 to produce diffracted lights and non-diffracted lights. Most of the non-diffracted lights reflected from main polygons and reflected lights from assist polygons are removed. The diffracted lights and the not removed non-diffracted lights reflected from main polygons are collected and directed to expose a target by a projection optics box. | 2014-09-18 |
20140268093 | THREE-DIMENSIONAL COORDINATE SCANNER AND METHOD OF OPERATION - A noncontact optical three-dimensional measuring device that includes a projector, a first camera, and a second camera; a processor electrically coupled to the projector, the first camera and the second camera; and computer readable media which, when executed by the processor, causes the first digital signal to be collected at a first time and the second digital signal to be collected at a second time different than the first time and determines three-dimensional coordinates of a first point on the surface based at least in part on the first digital signal and the first distance and determines three-dimensional coordinates of a second point on the surface based at least in part on the second digital signal and the second distance. | 2014-09-18 |
20140268094 | USING PARALLAX IN REMOTE SENSING TO DETERMINE CLOUD FEATURE HEIGHT - Techniques for using small parallax angles in remote sensing to determine cloud feature height include exploiting two identical medium-resolution SWIR bands with parallax to estimate cloud edge feature heights well enough to enable assessments of the impacts of shadows and proximate cloud scattering on ground illumination, and hence, on reflectance calculations. The bands are intentionally designed to have a suitable parallax angle, in one embodiment approximately 1.5 degrees. With this parallax, one band will see more ground pixels than the other band as they encounter a leading edge of a cloud and the other band will see more ground pixels than the one band as they encounter the lagging edge of the cloud. From these numbers of pixels, the height of the leading and lagging edges of the cloud can be determined. | 2014-09-18 |
20140268095 | DYNAMIC SENSOR SYSTEM AND METHOD FOR USING THE SAME - A sensor system includes a mounting member, an actuator disposed adjacent the mounting member, and a sensor connected to the actuator for sensing movement of an object using a signal. The actuator moves the sensor from a first sensing position to a second sensing position if the sensor is unable to read the signal. | 2014-09-18 |
20140268096 | Time-Gated Image Reconstruction Using Phase Conjugation - A method and system are described for illuminating a target with a laser source with a wide-area illuminating beam. A conjugator can receive a reflected, imprinted wavefront from the target that is imprinted with effects from beam distortions and obstructions between the laser source and the target. The conjugator can then generate a hologram. A directed laser beam can then be generated to the target by reading the generated hologram with a second reference beam creating a time-reversed wavefront that can be generated with high gain. The time-reversed wavefront can retrace the path that originated from the laser source to the target, and can reverse the effects of beam distortions and obstructions. Finally, an enhanced return can be received from the target with a receiver, and a time-gating switch can be utilized that selectively selects a particular range of return wavefronts that include wavefronts that reached the target. | 2014-09-18 |
20140268097 | Distance Measuring Laser Pointer and method thereof - A distance measuring laser pointer has: at least one laser source being capable of emitting a light ray; and two optical elements disposed in front of the at least one laser source, receiving and transferring the light ray into a first conic light beam and a set of multiple second conic light beams; wherein, the first conic light beam projects a first light pattern on a surface of a target, the set of the second conic light beams project a second light pattern on the surface of the target, an intersection between the first light pattern and the second light pattern changes position depending on variation of a distance between the distance measuring laser pointer and the target to indicate the distance. The distance measuring laser pointer simultaneously indicates a diameter or length of the target when indicating the distance. | 2014-09-18 |
20140268098 | LIDAR SCANNER - A LiDAR sensor can include a laser, a directional sensor, a window, an electromagnetic pulse receiving sensor, and a processor. The laser can be configured to emit a narrow electromagnetic pulse. Further, the directional sensor can be configured to measure the direction of the narrow electromagnetic pulse emitted by the laser. The narrow emitted electromagnetic pulse can pass through the window. The pulse can then be reflected by at least the window and an object external from the LiDAR sensor, creating at least two reflected pulses. The electromagnetic pulse receiving sensor can be configured to measure the two reflected pulses resulting from the narrow pulse emitted by the laser. The processor can be configured to receive information from the sensors, indicating a position of the object relative to the LiDAR sensor. Further, the processor can be configured to measure the intensity of the pulse being reflected by the window. | 2014-09-18 |
20140268099 | Movement and Expression Sensor - A movement and expression sensor has a plurality of fiber Bragg gratings (FBG) disposed along the length of an optical fiber, and the optical fiber is placed in contact with a subject's skin surface. The sensors are interrogated for reflected wavelength, which is converted into a temperature or a strain. A series of such measurements can be made to determine the movement or position of the sensor location. A garment may be formed using the sensors and an elastomeric material, such that the sensors may be worn and removed, and the movements of the elastomer in the areas of sensors measured as a wavelength shift to characterize movement or estimate location. The elastomeric garment may be formed as a mask, or a sock, such as for use with a face, or foot. | 2014-09-18 |
20140268100 | Multiple Laser Time of Arrival Probe - A system and method for performing stress measurement on rotating parts is disclosed. The system may include a laser assembly configured to emit a plurality of laser beams having different wavelengths, and a probe assembly mounted proximal to a rotatable part in a device. The probe assembly may be configured to output a reflected laser beam onto a first target on the rotatable part. The probe assembly may be configured to output another reflected laser beam onto a second target on the rotatable part. The probe assembly may include a redirector, and a lens assembly mounted proximal to the redirector and configured to converge the laser beams. The redirector may be configured to change the direction of each emitted laser beam. | 2014-09-18 |
20140268102 | Methods for Detecting Coincident Sample Events, and Devices and Systems Related Thereto - In some aspects of the present disclosure, methods of detecting coincident sample events are provided. The methods include receiving a first set of signal data representing detected signals from a flow cytometer system; detecting, with a peak detection module, one or more peaks within the signal data; and cancelling, with a successive cancellation module, one or more individual sample events from the signal data at corresponding time indexes, wherein the cancellation of more than one individual sample event is successive. Devices and system related thereto are also provided. | 2014-09-18 |
20140268103 | SIMPLE SUGAR CONCENTRATION SENSOR AND METHOD - A glucose sensor comprising an optical energy source having an emitter with an emission pattern; a first polarizer intersecting the emission pattern; a second polarizer spaced a distance from the first polarizer and intersecting the emission pattern, the second polarizer rotated relative to the first polarizer by a first rotational amount Θ; a first optical detector intersecting the emission pattern; a second optical detector positioned proximal to the second polarizer, the first polarizer and the second polarizer being positioned between the optical energy source and the second optical detector, the second optical detector intersecting the emission pattern; a compensating circuit coupled to the second optical detector; and a subtractor circuit coupled to the compensating circuit and the first optical detector. | 2014-09-18 |
20140268104 | SYSTEM AND METHOD FOR SAFER DETECTION OF UNKNOWN MATERIALS USING DUAL POLARIZED HYPERSPECTRAL IMAGING AND RAMAN SPECTROSCOPY - A first location comprising an unknown material may be scanned using SWIR hyperspectral imaging in a dual polarization configuration. Surveying may also be applied to thereby determine whether or not a human is present. This surveying may be achieved my assessing LWIR data, data acquired from motion sensors, and combinations thereof. If no human is present, a second location may be interrogated using Raman spectroscopic techniques to thereby obtain a Raman data set representative of the region of interest. This Raman data set may be assessed to associate an unknown material with a known material. This assessment may be achieved by comparing the Raman data set to one or more reference data sets in a reference database, where each reference data set is associated with a known material. | 2014-09-18 |
20140268105 | OPTICAL DEFECT INSPECTION SYSTEM - Disclosed herein is a system for determining information about one or more defects on or in a test object. The system includes a light source configured to illuminate a test object with spatially coherent light; a multi-element detector positioned to detect an interference pattern of light associated with one or more defects on or in the illuminated test object; and an electronic control module in communication with the multi-element detector and configured to process the interference pattern to determine information about the one or more defects on or in the test object. | 2014-09-18 |
20140268106 | TANDEM DISPERSIVE RANGE MONOCHROMATOR - Aspects of a tandem dispersive range monochromator are described herein. In one embodiment, the monochromator includes a light source that provides broadband light, a tandem diffraction grating including a first diffraction grating and a second diffraction grating, a grating drive motor that rotates the tandem diffraction grating to provide dispersed wavelengths of light, a detector that detects a portion of the dispersed wavelengths of light, and processing circuitry that controls a grating drive motor to regulate an angular velocity of the tandem grating based on an angular orientation of the tandem diffraction grating. By using a tandem diffraction grating having different dispersive surfaces, measurements of relatively high precision and quality may be taken throughout a wider spectral range. In another aspect, the processing circuitry controls a sample drive motor to vary an angle of incidence of the dispersed wavelengths of light onto a sample for evaluation. | 2014-09-18 |
20140268107 | Acoustic and Optical Illumination Technique for Underwater Characterization of Objects/Environment - The invention provides a method for acoustically and optically characterizing an immersed object of interest by generating a serial plurality of acoustic and optical illumination pulses through a liquid. In addition to the spectral analyses/imaging of objects/environment made possible by the white-light illumination, a target material can be ablated, generating an ionized plume to spectrally identify the target's constituent atoms. | 2014-09-18 |
20140268108 | METHOD OF DETERMINING A COMMON COORDINATE SYSTEM FOR AN ARTICULATED ARM COORDINATE MEASUREMENT MACHINE AND A SCANNER - A method of determining a mathematical transformation to place three-dimensional (3D) coordinates of points measured by an articulated arm coordinate measurement machine (AACMM) and 3D points measured by a scanner in a common coordinate system is provided. The method including providing the 3D scanner and the AACMM having a probe. The scanner and AACMM each have a local frame of reference. Three non-collinear targets are measured with the probe and then with the scanner. 3D probe reference coordinates and 3D scanner reference coordinates are determined based on the measurement of the targets by the AACMM and scanner. The mathematical transformation is determined based at least in part on the 3D probe reference coordinates and the 3D scanner reference coordinates, the mathematical transformation characterized at least in part by a collection of parameters. | 2014-09-18 |
20140268109 | MULTIFUNCTION SOLID-STATE INSPECTION SYSTEM - An inspection system includes optical components for operating the inspection system in an interference fringe imaging mode and a microscope imaging mode. The inspection system further includes at least one optical light source configured to emit a first wavelength of light to operate the inspection system in the interference fringe imaging mode and configure to emit a second wavelength of light to operate the inspection system in the microscope mode. The first wavelength of light is different from the second wavelength of light. | 2014-09-18 |
20140268110 | MEASURING BRILLOUIN BACKSCATTER FROM AN OPTICAL FIBRE USING DIGITISATION - A method for measuring Brillouin backscattering from an optical fibre, comprising mixing backscattered light received from the optical fibre and having a Brillouin frequency fβ(t) with coherent light at a frequency f i in an optical detector to produce an electrical signal with a difference frequency ΔF(t)=fβ(t)−f15 and directly digitising the electrical signal using an analog-to-digital converter to generate a sequence of samples representing the electrical signal, the samples then being processed to determine one or more properties of the Brillouin spectral line. The difference frequency may be further reduced by an additional frequency mixing stage to allow digitisation at a lower sampling rate. | 2014-09-18 |
20140268111 | INTEGRATED OPTICS REFLECTOMETER - An apparatus includes a laser source configured to output laser light at a target frequency, and a measurement unit configured to measure a deviation between an actual frequency outputted by the laser source at a current period of time and the target frequency of the laser source. The apparatus includes a feedback control unit configured to, based on the measured deviation between the actual and target frequencies, control the laser source to maintain a constant frequency of laser output from the laser source so that the frequency of laser light transmitted from the laser source is adjusted to the target frequency. The feedback control unit can control the laser source to maintain a linear rate of change in the frequency of its laser light output, and compensate for characteristics of the measurement unit utilized for frequency measurement. A method is provided for performing the feedback control of the laser source. | 2014-09-18 |
20140268112 | COMBINATION VISUAL FAULT LOCATOR SHORT HAUL DISTANCE TEST MEASUREMENT INSTRUMENT FOR OPTICAL FIBERS - A hand-held instrument uses a red laser to both provide a visual indication to the user of where a fault is present along an optical fiber, and a distance measurement to the user where the fault is present along the optical fiber. The instrument provides a single bulkhead to which the optical fiber is attached to accomplish this dual functionality. The instrument passes a beam of red light into the optical fiber. When the red light encounters a fault in the optical fiber, the red light is emitted from the optical fiber so that the user can visually detect the fault. In addition, the red light is reflected back to the instrument and the instrument determines and outputs a distance measurement at which the fault is located. | 2014-09-18 |
20140268113 | SINGLE-FIBER NONCRITICAL-ALIGNMENT WAFER-SCALE OPTICAL TESTING - A method of determining a parameter of a wafer is disclosed. Light is propagated through a waveguide disposed in the wafer. A first measurement of optical power is obtained at a first optical tap coupled to the waveguide and a second measurement of optical power is obtained at a second optical tap coupled to the waveguide using a photodetector placed at a selected location with respect to the wafer. A difference in optical power is determined between the first optical tap and the second optical tap from the first measurement and the second measurement. The parameter of the wafer is determined from the determined difference in optical power. | 2014-09-18 |
20140268114 | APPARATUS FOR SIMULTANEOUSLY INSPECTING AND CLEANING FIBER CONNECTOR - The fiberscope for inspecting and cleaning a fiber connector simultaneously includes a housing with a front panel, a microscope system, a connector holder mounted at a distance from the front panel for receiving a connector ferrule of a fiber connector, and a translation stage for moving the microscope system transversely to align its optical axis with the connector ferrule. The fiberscope further includes a hand knob attached to a fine screw through the connector holder for adjusting the vertical position of the connector ferrule, a mirror pivotally mounted between the connector holder and the front panel, an LED lamp, air nozzles attached to the front panel, and a cleaning air tube for supplying compressed air to the air nozzles. The cleaning air from the air nozzles spray sideways onto the fiber endfaces so that the cleaning air bounces off sideways to avoid secondary contamination. | 2014-09-18 |
20140268115 | METHOD FOR MEASURING REFRACTIVE INDEX, AND REFRACTOMETER - An exemplary method for measuring a refractive index of a substance being measured through an optical window, includes arranging the optical window in contact with the substance being measured, directing light to the interface of the optical window and substance being measured, where part of the light is absorbed by the substance being measured and part of it is reflected from the substance being measured to form an image, in which the location of the boundary of light and dark areas expresses a critical angle of the total reflection dependent on the refractive index of the substance being measured, and examining the formed image. Light is directed on a first structure and to desired angles on an interface between the optical window and substance being measured. Light reflected from the interface of the optical window and substance being measured is directed on a second structure. | 2014-09-18 |
20140268116 | DEVICE AND METHOD FOR DETERMINING A DIRECTION FROM A SURFACE OF ONE OR MORE PHOTODETECTOR ELEMENTS OF AN INTEGRATED CIRCUIT TO A SOURCE PROVIDING ELECTROMAGNETIC WAVES AND METHOD FOR MANUFACTURING AN DEVICE - In various embodiments a device is provided. The device includes an integrated circuit that includes one or more photodetector elements and a blocking structure monolithically integrated with the one or more photodetector elements. The one or more photodetector elements are arranged relative to the blocking structure such that electrical currents provided by the one or more photodetector elements in response to electromagnetic waves received by the one or more photodetector elements are indicative of a direction to a source providing the electromagnetic waves. | 2014-09-18 |
20140268117 | SYSTEM AND METHOD TO DETERMINE DEPTH FOR OPTICAL WAFER INSPECTION - A computer-based method for inspecting a wafer, including: storing, in a memory element for at least one computer, computer readable instructions; detecting a first light beam rotating in a first spiral about a first central axis; and executing, using a processor for the at least one computer, the computer readable instructions to generate, using the detected first light beam, an image including at least one shape, determine an orientation of the at least one shape or a size of the at least one shape, and calculate a depth of a defect in the wafer according to the orientation or the size. | 2014-09-18 |
20140268118 | Multi-Spot Defect Inspection System - The disclosure is directed to a system and method for inspecting a spinning sample by substantially simultaneously scanning multiple spots on a surface of the sample utilizing a plurality of illumination beams. Portions of illumination reflected, scattered, or radiated from respective spots on the surface of the sample are collected by at least one detector array. Information associated with at least one defect of the sample is determined by at least one computing system in communication with the detector array. According to various embodiments, at least one of scan pitch, spot size, spot separation, and spin rate is controlled to compensate pitch error due to tangential spot separation. | 2014-09-18 |
20140268119 | Method for Repairing a Mask - The present disclosure provides a method of repairing a mask. The method includes inspecting the mask using a mask inspection tool to identify a defect on a circuit pattern of the mask; repairing the defect using a mask repair tool to form a repaired pattern; forming a first group of diffraction images of the repaired pattern and a second group of diffraction images of a reference feature; and validating the mask by comparing the first group of diffraction images with the second group of diffraction images. | 2014-09-18 |
20140268120 | SINGLE-FIBER NONCRITICAL-ALIGNMENT WAFER-SCALE OPTICAL TESTING - A method of determining a parameter of a wafer is disclosed. Light is propagated through a waveguide disposed in the wafer. A first measurement of optical power is obtained at a first optical tap coupled to the waveguide and a second measurement of optical power is obtained at a second optical tap coupled to the waveguide using a photodetector placed at a selected location with respect to the wafer. A difference in optical power is determined between the first optical tap and the second optical tap from the first measurement and the second measurement. The parameter of the wafer is determined from the determined difference in optical power. | 2014-09-18 |
20140268121 | DARK-FIELD SEMICONDUCTOR WAFER INSPECTION DEVICE - The invention relates to a dark-field semi-conductor wafer inspection device including, in the following order, a light source for emitting an incident beam to a wafer along a first axis, a concentrator ( | 2014-09-18 |
20140268122 | DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE - A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a planarly movable table, with illumination light from an inclined direction relative to a direction of a line normal to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through elliptical lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light, the elliptical lenses being formed of circular lenses having left and right portions thereof cut. | 2014-09-18 |
20140268123 | Container Inspection - Method and apparatus for detecting commercial variations in at least a portion of an at least partially transparent container. A light pattern in an angular domain is established from signals generated by a plurality of light sensors, wherein a point in the light pattern is generated by a signal from a corresponding portion of the light sensors and represents a light intensity corresponding to a particular reflection angle of a light ray reflected off the container. Different types of commercial variations in the container can be differentiated by analyzing the light pattern in the angular domain. | 2014-09-18 |
20140268124 | ENVIRONMENTAL CELL ASSEMBLY FOR USE IN FOR USE IN SPECTROSCOPY AND MICROSCOPY APPLICATIONS - An environmental cell assembly for use in microscopy and spectroscopy applications, including: an environmentally sealed body assembly configured to selectively hold and contain a sample; a plurality of ports manufactured into one or more surfaces of the body assembly for one or more of evacuating the body assembly and injecting a gas into or removing a gas from the body assembly; a port manufactured into a surface of the body assembly for receiving a translating stage configured to move the sample within the body assembly; and a port manufactured into a surface of the body assembly for receiving one or more lenses utilized in a microscopy or spectroscopy application; wherein the one or more lenses are disposed adjacent the sample without intervening structures disposed there between. The cell assembly also includes a port manufactured into a surface of the body assembly for retaining a window and providing visualization of the sample. | 2014-09-18 |
20140268125 | APPARATUS FOR TAKING AN ACCURATE PHOTOMETRIC MEASUREMENT OF A LIQUID - An apparatus for taking an accurate photometric measurement of a liquid by way of forming a specimen volume of a controlled optical path length for use with photometric measurement equipment is disclosed herein. In some embodiments, the apparatus comprises a transparent body configured for displacing a volume of a fluid and at least one support element wherein the support element is configured to maintain the transparent body at a location such that specimen fluid may enter a void volume to form a specimen volume of a controlled optical path length. In some embodiments, the apparatus comprises a plurality of transparent bodies interconnected by a web such that the transparent bodies are maintained at a spacing arrangement which allows for them to be inserted into the wells of a microplate in order to create a plurality of specimen volumes of a controlled optical path length. | 2014-09-18 |
20140268126 | POSITIONING MEANS FOR A MEASURING CELL - The invention relates to a positioning means for a flow cell used for optical detection, comprising a base having at least one contact face, the contact face being provided to make contact with the end of the flow cell, wherein the base has at least one reference face, which is to be aligned and/or positioned relative to the flow channel of a flow cell, and wherein the base is designed to receive a connecting piece in such a way that the latter assumes a predefined attitude and alignment relative to the flow channel. | 2014-09-18 |
20140268127 | WIDE SPECTRAL RANGE SPECTROMETER - Featured is a spectral analysis method and a wide spectral range spectrometer including a source of electromagnetic radiation and an optical subsystem configured to disperse radiation into a plurality of wavelengths. A pixilated light modulator receives the radiation wavelengths and is configured to direct one or more selective wavelengths to a sample. | 2014-09-18 |
20140268128 | Self-Exciting Surface Enhanced Raman Spectroscopy - Self-exciting surface enhanced Raman spectroscopy (SERS) employs an integral optical excitation source to provide an excitation signal to provide self-excitation of a SERS structure. The SERS structure includes a plurality of nanofingers having SERS-enhancing nanoparticles disposed adjacent to the nanofingers. | 2014-09-18 |
20140268129 | SELF-REFERENCING FIBER-OPTIC RAMAN PROBE - In accordance with the present invention, a novel self-referencing fiber optic Raman probe is disclosed. It uses the Raman signal generated by a crystalline optical fiber to normalize the Raman signal produced by the sample in order to compensate for changes in the output power of the excitation laser light source, the coupling efficiencies of the optical fibers connecting the light source to the probe and the probe to the analyzing spectrometer, and the alignment of optical components within the probe. | 2014-09-18 |
20140268130 | METHOD FOR DETECTING NON-SUPERCONDUCTING TRANSITION OF SUPERCONDUCTING WIRE - A method for detecting a non-superconducting transition of a superconducting wire including a substrate, a superconducting layer that has a critical temperature of 77 K or more, and a metal stabilization layer, the method includes arranging an optical fiber on the superconducting wire, injecting a measurement light into the optical fiber, measuring an intensity of anti-Stokes Raman scattering light of the measurement light, and detecting an occurrence of a non-superconducting transition in the superconducting wire based on an intensity variation of the anti-Stokes Raman scattering light. | 2014-09-18 |
20140268131 | MEASUREMENT APPARATUS AND MEASUREMENT METHOD - There is provided a measurement apparatus including a light source unit configured to emit pulsed laser light used for pump light and Stokes light that excite predetermined molecular vibration of a measurement sample and for probe light that is intensity-modulated with a predetermined reference frequency and that has a same wavelength as the pump light or the Stokes light, a pulse control unit configured to cause time delay of the probe light generated by the light source unit and then to guide the pump light, the Stokes light, and the time-delayed probe light to the measurement sample, and a detection unit configured to detect transmitted light transmitted through the measurement sample or reflected light from the measurement sample. A relaxation time of the molecular vibration of the measurement sample is measured using time-resolved stimulated Raman gain spectroscopic measurement or time-resolved stimulated Raman loss spectroscopic measurement of the measurement sample. | 2014-09-18 |
20140268132 | OPTICAL EMISSION SPECTROSCOPIC (OES) INSTRUMENT WITH AUTOMATIC TOP AND BOTTOM SLIT CURTAINS - An optical emission spectroscopic (OES) instrument includes a spectrometer, a processor and an adjustable mask controlled by the processor. The adjustable mask defines a portion of an analytical gap imaged by the spectrometer. The instrument automatically adjusts the size and position of an opening in the mask, so the spectrometer images an optimal portion of plasma formed in the analytical gap, thereby improving signal and noise characteristics of the instrument, without requiring tedious and time-consuming manual adjustment of the mask during manufacture or use. | 2014-09-18 |
20140268133 | Methods and Systems for Analyzing Samples - The disclosure features methods for analyzing a sample, the methods including exposing the sample to plurality of pulses of electromagnetic radiation to convert a portion of the sample into a plasma, recording a spectrum of electromagnetic radiation emitted in response to each of the plurality of pulses to define a sequence of spectra for the sample, and using an electronic processor to determine information about the sample based on the spectra, where exposing the sample to the plurality of pulses of electromagnetic radiation includes directing the pulses to be incident on different spatial regions of the sample, and where a temporal delay between exposing the sample to each successive radiation pulse is constant. | 2014-09-18 |
20140268134 | LASER SAMPLING METHODS FOR REDUCING THERMAL EFFECTS - A method for reducing thermal effects in laser ablation optical emission spectrometry includes creating discrete ablation spots along an analysis line on a target surface. At least one of the following is also carried out. First, the ablation spots are positioned so that a pair of successive ablation spots are spaced apart from one another along the analysis line and are separated from one another by another ablation spot. Second, when the analysis line comprises generally parallel, adjacent analysis line segments, the ablation spots are positioned so that (A) a pair of successive ablation spots are on different analysis line segments, and (B) the successive ablation spots are positioned to be at different longitudinal positions along the analysis line segments when the different analysis line segments are adjacent to one another. As a result, a linear scan of isolated ablation spots can be generated. | 2014-09-18 |
20140268135 | STAND-OFF SPECTROMETRY SYSTEMS AND METHODS - Stand-off spectrometry systems and methods are described herein. One system includes a laser source configured to emit a single-spectral light, and an optical frequency comb (OFC) coupled to the laser source and configured to generate, using the single-spectral light, a multi-spectral light to determine an absorption spectrum of a substance. | 2014-09-18 |
20140268136 | APPARATUS AND METHOD FOR OPTIMIZING DATA CAPTURE AND DATA CORRECTION FOR SPECTROSCOPIC ANALYSIS - A method and an apparatus for increasing the accuracy of a spectrometer system corrects for light source quality, exposure time, distortion in y direction, distortion in x direction, temperature dependence, pixel alignment variability, dark pixels, bad pixels, pixel read noise, and pixel dark current noise. The method and apparatus produces an algorithm for optimizing spectral data and for measuring a sample within the spectrometer system using the optimization algorithm. The spectrometer apparatus comprises a composite external light source, a source light collector, an illumination light structuring component, a sample, a sample light collector, a spectrometer light structuring component, a light dispersing engine, photo detectors, an electrical signal converter, a data preprocessing unit, and a data analyzer. The method and apparatus can include a corrected photo detector algorithm, sample illumination correction algorithm, LDE-PD alignment procedure, SLSC-LDE alignment procedure, distortion correction matrix, and an algorithm for optimizing of spectral data. | 2014-09-18 |
20140268137 | SPECTROMETER FOR MICROSCOPE ILLUMINATION SOURCES - A compact spectrometer apparatus for characterizing a microscope illumination source in real time, and without interfering with the observation and/or characterization of a sample under observation with the microscope. The spectrometer apparatus is comprised of a light probe comprising a mirror disposed in a housing, the mirror positioned to reflect light from the illumination source into an optical coupling; an optical waveguide receiving reflected light into the optical coupling; and a spectrometer comprising a light sensor receiving reflected light directed by the optical waveguide from the optical coupling of the light probe, the sensor adapted to sense light over a range of wavelengths and output a signal indicative of the intensity of the light at any wavelength over the range. | 2014-09-18 |
20140268138 | SPECTROSCOPE - A spectroscope comprises a package provided with a light entrance part, a plurality of lead pins penetrating through a support part opposing the light entrance part in the package, a light detection unit supported on the support part within the package, and a spectroscopic unit supported on the support part within the package so as to be arranged on the support part side of the light detection unit. The light detection unit has a light transmission part for transmitting therethrough light incident thereon from the light entrance part. The spectroscopic unit has a spectroscopic part for spectrally resolving the light transmitted through the light transmission part while reflecting the light to a light detection part. The lead pins are fitted into fitting parts provided with the light detection unit and electrically connected to the light detection part. | 2014-09-18 |
20140268139 | HIGH RESOLUTION MEMS-BASED HADAMARD SPECTROSCOPY - A spectrometer includes: a collimating element configured for collimating a beam of light into a first one of a cross-dispersing element and an echelle grating, the grating in optical communication with the cross-dispersing element; a focusing element for receiving the light from a second one of the cross-dispersing element and the echelle grating and focusing wavelengths of the light onto a spatial light modulator; the spatial light modulator configured for selectively directing the wavelengths onto a detector for detection. A method of use and the method of fabrication are provided. | 2014-09-18 |
20140268140 | PULSE DISCRIMINATOR FOR PARTICLE COUNTER - An airborne, gas, or liquid particle sensor with a pulse discriminator. The pulse discriminator provides greater qualification of signals associated with detected particulate signals. | 2014-09-18 |
20140268141 | PULSE SCOPE FOR PARTICLE COUNTER - An airborne, gas, or liquid particle sensor with an on-board data acquisition system that can be used to capture detailed particle pulse information. The information can be used both for on-board analysis and reporting as well as off-line analysis and reporting. | 2014-09-18 |
20140268142 | METHOD AND DEVICE FOR DETERMINING THE SIZE OF A TRANSPARENT PARTICLE - A method is described for determining the size of a transparent particle ( | 2014-09-18 |
20140268143 | METHOD AND DEVICE FOR DETERMINING CHARACTERISTIC PROPERTIES OF A TRANSPARENT PARTICLE - The invention relates to a method for determining the size d of a transparent particle, according to which method the particle is illuminated with light from a light source, a radiation detector measures a time-resolved intensity profile of light of the light source scattered by the particle, a reflection peak ( | 2014-09-18 |
20140268144 | MULTIPLE PARTICLE SENSORS IN A PARTICLE COUNTER - An airborne, gas, or liquid particle sensor with multiple particle sensor blocks in a single particle counter. Each sensor would sample a portion of the incoming airstream, or possibly a separate airstream. The various counters could be used separately or in concert. | 2014-09-18 |
20140268145 | HIGH-SPEED VOLUME MEASUREMENT SYSTEM AND METHOD - Disclosed is a volume sensor having first, second, and third laser sources emitting first, second, and third laser beams; first, second, and third beam splitters splitting the first, second, and third laser beams into first, second, and third beam pairs; first, second, and third optical assemblies expanding the first, second, and third beam pairs into first, second, and third pairs of parallel beam sheets; fourth, fifth, and sixth optical assemblies focusing the first, second, and third beam sheet pairs into fourth, fifth, and sixth beam pairs; and first, second, and third detector pairs receiving the fourth, fifth, and sixth beam pairs and converting a change in intensity of at least one of the beam pairs resulting from an object passing through at least one of the first, second, and third parallel beam sheets into at least one electrical signal proportional to a three-dimensional representation of the object. | 2014-09-18 |
20140268146 | LENSLET ARRAY WITH INTEGRAL TUNED OPTICAL BANDPASS FILTER AND POLARIZATION - A spectral radiation detector employs at least one lenslet with a circular blazed grating for diffraction of radiation at a wavelength at nth order to a focal plane A detector is mounted at the focal plane receiving radiation passing through the at least one lenslet for detection at a predetermined order. At least one order filter associated with the at least one lenslet passes radiation at wavelengths corresponding to the predetermined order. In additional embodiments a polarizing filter is associated with the lenslet for additional discrimination of the radiation. | 2014-09-18 |
20140268147 | APPARATUS AND METHOD FOR SUPPRESSION OF BACKGROUND NOISE IN MICROSCOPY IMAGING - An apparatus and method for imaging a section of a medium is disclosed. The apparatus or method receives and returns light from the section and from sites adjacent to the section. A microscope using this apparatus or method can be telecentric in pinhole space at the detection end of the system. | 2014-09-18 |
20140268148 | Dual-Modulation Faraday Rotation Spectroscopy - A dual-modulation Faraday rotation spectroscopic (FRS) system is disclosed. The FRS system uses an FRS sample cell configured to subject a sample to a low frequency modulated magnetic field. The system includes a polarized laser light source configured to generate a high frequency wavelength-modulated light beam incident on the sample, the high frequency wavelength-modulated light beam being modulated at a higher frequency than the low frequency modulated magnetic field. A polarizer is configured to receive from the sample a transmitted light beam having a modulated polarization having a polarization rotation and translate the modulated polarization of the transmitted light beam into an intensity modulated beam. A photodetector is configured to detect the intensity modulated beam and generate a photodetector signal. A dual demodulator is coupled to the photodetector and is configured to demodulate the photodetector signal. | 2014-09-18 |
20140268149 | DEVICE AND METHOD FOR DETECTION OF POLARIZATION FEATURES - An apparatus and method for imaging a section of a medium are disclosed. The section of medium has features (“Polarization Sensitive Features”) which return light according to the polarization of the received light. The disclosed apparatus and method may be configured to measure the irradiance of light returned from the object across the lateral (with respect to the optical axis) dimension. | 2014-09-18 |
20140268150 | MULTI-SURFACE OPTICAL TRACKING SYSTEM - An optical tracking device that is capable of operation on both glossy and diffuse surfaces includes at least one housing, at least one light source, and at least one sensor. The light source emits light toward a surface on which the housing is moved and the sensor receives the light emitted by the light source after it is reflected off of the surface. The light source is oriented such that the angle of incidence of the emitted light corresponds to Brewster's angle. The sensor may be also oriented such that the angle of reflection of the reflected light corresponds to Brewster's angle. The light emitted by the light source may be polarized to increase the p-polarization of the emitted light and/or the light received by the sensor may be filtered to block s-polarized portions of the reflected light. | 2014-09-18 |
20140268151 | OPTICAL SENSOR AND IMAGE FORMING DEVICE INCORPORATING THE SAME - An optical sensor includes a light source to illuminate a linear polarization in a first direction, a first optical detector disposed on a path of a light illuminated from the light source and specularly reflected by an object, a first optical element to separate the light reflected by the object into a linear polarization in the first direction and a linear polarization in a second direction orthogonal to the first direction, a second optical detector to receive the linear polarization in the second direction separated by the first optical element, and a processor to obtain an amount of the light specularly reflected by the object on the basis of an output signal of the first optical detector and an output signal of the second optical detector. | 2014-09-18 |
20140268152 | METHOD AND SYSTEM FOR CHARACTERIZING LIGHT EMITTING DEVICES - Embodiments as disclosed herein provide a method and system that characterizes physical properties, such as thickness, uniformity, polarization, and/or sizes and locations of defect (e.g. defect density distribution) of crystalline structures grown on or thin films deposited on a substrate of a solid state light emitting device. The embodiments disclosed herein generally include exciting the light emitting device with an energy source and analyze optical energy emitted by the crystalline structures grown on or the thin films deposited on the substrate. | 2014-09-18 |
20140268153 | MANUFACTURING METHOD FOR LED EMITTER WITH HIGH COLOR CONSISTENCY - A method is provided for forming multiple-LED (light-emitting-diode) light emitters from a plurality of LEDs, wherein the number of LEDs in each emitter is an integer M. The method includes providing a plurality of LEDs, each of the LEDs characterized by a first parameter and a second parameter, which are related to color coordinates CIEx and CIEy in a chromaticity diagram. The method also includes determining first and second parameter X | 2014-09-18 |
20140268154 | CHROMATOGRAPHY SYSTEM, SIGNAL PROCESSING APPARATUS, CHROMATOGRAPHY DATA PROCESSING APPARATUS, AND PROGRAM - A chromatography system has a multi-channel detection device including a flow cell, optics for directing light from light sources to the flow cell and outputting light that has passed through the flow cell, and a multi-channel detector. The optics has a function of dispersing light in wavelength in an optical path. The detector receives the light dispersed in wavelength. The multi-channel detection device also has a signal processing part connected to the detector. The chromatography system has a data processing apparatus. The signal processing circuit has a function of calculating an absorbance by absorbance=−log | 2014-09-18 |
20140268155 | AWG Filter for Wavelength Interrogator - A wavelength interrogator is coupled to a circulator which couples optical energy from a broadband source to an optical fiber having a plurality of sensors, each sensor reflecting optical energy at a unique wavelength and directing the reflected optical energy to an AWG. The AWG has a detector coupled to each output, and the reflected optical energy from each grating is coupled to the skirt edge response of the AWG such that the adjacent channel responses form a complementary pair response. The complementary pair response is used to convert an AWG skirt response to a wavelength. | 2014-09-18 |
20140268156 | METHOD AND SYSTEM FOR DETERMINING BUBBLE POINT PRESSURE - Method and systems for determining bubble point pressure of a fluid sample are described herein. The method includes transmitting light through the fluid sample and detecting transmitted light. The method also includes applying a series of thermal pulses to the fluid sample. The series of thermal pulses includes a time interval between each thermal pulse. The pressure of the fluid sample is varied and the bubble point pressure of the fluid sample is determined using an intensity of the transmitted light that corresponds to a time interval between the thermal pulses. | 2014-09-18 |
20140268157 | OPEN-PATH GAS ANALYZER WITH ENVIRONMENTAL PROTECTION - An open-path gas analyzer is disclosed and is configured to prevent or reduce contamination of the analyzer over time. | 2014-09-18 |
20140268158 | SYSTEM AND METHOD TO MEASURE 3D FLOW CHARACTERISTICS OF A GAS - A method to collect 3D measurement data regarding a working fluid in a system, e.g., a turbo-machine, including: arranging sources of beams proximate to a passage of the working fluid in or downstream of the turbo-machine such that beams from the sources are projected through the working fluid; detecting intensities of the beams after they pass through the working fluid, and generating at least a two dimensional (2D) representation of the working fluid based on the detected intensities of the beams. | 2014-09-18 |
20140268159 | SURFACE PLASMON RESONANCE BASED SENSING DEVICES AND METHODS FOR REAL-TIME ANALYSIS OF ANALYTE SECRETION FROM LIVING CELLS - The present invention provides surface plasmon resonance (SPR) based sensing systems and methods for rapid, sensitive, and real-time analysis of analyte secretion from living cells. In one embodiment, the SPR based sensing device of the present invention comprises at least one cell culture module for culturing living cells, wherein the cell culture module is configured so that analytes secreted from the living cells can be released onto a SPR sensing surface. | 2014-09-18 |
20140268160 | SPECULAR OBJECT SCANNER FOR MEASURING REFLECTANCE PROPERTIES OF OBJECTS - An apparatus to measure surface orientation maps of an object may include a light source that is configured to illuminate the object with a controllable field of illumination. One or more cameras may be configured to capture at least one image of the object. A processor may be configured to process the image(s) to extract the reflectance properties of the object including an albedo, a reflection vector, a roughness, and/or anisotropy parameters of a specular reflectance lobe associated with the object. The controllable field of illumination may include limited-order Spherical Harmonics (SH) and Fourier Series (FS) illumination patterns with substantially similar polarization. The SH and FS illumination patterns are used with different light sources. | 2014-09-18 |
20140268161 | METHODS AND APPARATUS FOR AN OPTICAL SYSTEM OUTPUTTING DIRECT LIGHT AND HAVING A SENSOR - In some embodiments, an apparatus includes a housing and an image sensor that is coupled to the housing. The apparatus also includes a non-imaging optical system coupled to the housing that can output light to a surface and produce a scattered light component and a specular reflected light component. The image sensor and the non-imaging optical system are collectively configured in such a manner that during operation, the image sensor receives from a surface (1) at least a portion of the scattered light component and not the specular reflected light component or (2) at least a portion of the scattered light component having a magnitude and at least a portion of the specular reflective light component having a magnitude less than the magnitude of the portion of the scattered light component. | 2014-09-18 |
20140268162 | LENSLESS IMAGING WITH REDUCED APERTURE - An image of an object can be synthesized either from the Fourier components of the electric field or from the Fourier components of the intensity distribution. Imaging with a lens is equivalent to assembling the Fourier components of the electric field in the image plane. This invention provides a method and a means for lensless imaging by assembling the Fourier components of the intensity distribution and combining them to form the image with the use of amplitude splitting interferometer. The angular spectrum of the electromagnetic radiation consists of wavefronts propagating at different angles. The amplitude of each wavefront is split and interfered with itself to create sinusoidal fringe patterns having different spatial frequencies. The sinusoidal fringe patterns are combined to form an image of the object. This method applies to coherent and incoherent light. | 2014-09-18 |
20140268163 | Methods and Apparatus Related to Multi Wavelength Photothermal Optical Coherence Tomography - Embodiments of the invention include apparatus and methods of non-invasively detecting one or more constituents of a target using multiple wavelength photothermal optical coherence tomography. | 2014-09-18 |
20140268164 | Suppression of lock-in effect due to a MIOC frequency response in a fiber-optic sagnac interferometer - A fiber-optic Sagnac interferometer in a rotation rate sensor comprises a multifunctional integrated optical chip (MIOC) with a MIOC transfer function. A digital filter is connected upstream to the multi-functional integrated optical chip, whose filter transfer function corresponds basically to the inverse MIOC transfer function such that the MIOC transfer function is compensated by the filter transfer function. Corresponding coefficients of the filter transfer function may be determined in a main control loop. | 2014-09-18 |
20140268165 | OPTICAL BIOSENSOR AND METHOD OF OPERATING THE SAME - An optical biosensor may include a biosensing unit, detection unit, and signal processing unit. The biosensing unit may be configured for receiving first and second optical signals (which are generated from a phase-modulated optical signal), outputting a sensing signal by transmitting the first optical signal via a first optical path that includes a sensing resonator, and outputting a reference signal by transmitting the second optical signal via a second optical path that includes a reference resonator. The detection unit may be configured for receiving the sensing signal and the reference signal, detecting a phase element of each of the sensing signal and the reference signal through a signal demodulation operation, and detecting a phase difference between the sensing signal and the reference signal according to the detected phase elements. The signal processing unit may be configured for calculating the concentration of a bio-material based on the detected phase difference. | 2014-09-18 |