17th week of 2009 patent applcation highlights part 15 |
Patent application number | Title | Published |
20090101959 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME - According to an aspect of the present invention, there is provided a nonvolatile semiconductor memory device including: a semiconductor substrate; memory cell transistors that are series-connected; and a select transistor that includes: a first diffusion region that is formed in the semiconductor substrate at one end of the memory cell transistors; a first insulating film that is formed on the semiconductor substrate at a side of the first diffusion region; a select gate electrode that is formed on the first insulating film; a semiconductor pillar that is formed to extend upward from the semiconductor substrate and to be separated from the select gate electrode; a second insulating film that is formed between the select gate electrode and the semiconductor pillar; and a second diffusion region that is formed on the semiconductor pillar. | 2009-04-23 |
20090101960 | SEMICONDUCTOR MEMORY DEVICE - According to an aspect of the present invention, there is provided a semiconductor memory device including: a semiconductor substrate having: a contact region; a select gate region; and a memory cell region; a first element isolation region formed in the contact region and having a first depth; a second element isolation region formed in the select gate region and having a second depth; and a third element isolation region formed in the memory cell region and having a third depth which is smaller than the first depth. | 2009-04-23 |
20090101961 | MEMORY DEVICES WITH SPLIT GATE AND BLOCKING LAYER - The present disclosure provides a memory device having a cell stack and a select gate formed adjacent to the cell stack. The cell stack includes a tunneling dielectric layer, a charge storage layer, a blocking dielectric layer, a tantalum-nitride layer, and a control gate layer. When a positive bias is applied to the control gate and the select gate, negative charges are injected from a channel region of a substrate through the tunneling dielectric layer and into the charge storage layer to thereby store the negative charges in the charge storage layer. When a negative bias is applied to the control gate, negative charges are tunneled from the charge storage layer to the channel region of the substrate through the tunneling dielectric layer. | 2009-04-23 |
20090101962 | Semiconductor devices and methods of manufacturing and operating same - A semiconductor device and methods of manufacturing and operating the semiconductor device may be disclosed. The semiconductor device may comprise different nanostructures. The semiconductor device may have a first element formed of nanowires and a second element formed of nanoparticles. The nanowires may be ambipolar carbon nanotubes (CNTs). The first element may be a channel layer. The second element may be a charge trap layer. In this regard, the semiconductor device may be a transistor or a memory device. | 2009-04-23 |
20090101963 | SPLIT CHARGE STORAGE NODE INNER SPACER PROCESS - Methods of forming a memory cell containing two split sub-lithographic charge storage nodes on a semiconductor substrate are provided. The methods can involve forming two split sub-lithographic charge storage nodes by using spacer formation techniques. By removing exposed portions of a first poly layer while leaving portions of the first poly layer protected by the spacers, the method can provide two split sub-lithographic first poly gates. Further, by removing exposed portions of a charge storage layer while leaving portions of the charge storage layer protected by the two split sub-lithographic first poly gates, the method can provide two split, narrow portions of the charge storage layer, which subsequently form two split sub-lithographic charge storage nodes. | 2009-04-23 |
20090101964 | Method of forming nano dots, method of fabricating the memory device including the same, charge trap layer including the nano dots and memory device including the same - Provided are a method of forming nano dots, method of fabricating a memory device including the same, charge trap layer including the nano dots and memory device including the same. The method of forming the nano dots may include forming cores, coating surfaces of the cores with a polymer, and forming graphene layers covering the surfaces of the cores by thermally treating the cores coated with the polymer. Also, the cores may be removed after forming the graphene layers. In addition, the surfaces of the cores may be coated with a graphitization catalyst material before coating the cores with the polymer. Also, the cores may include metal particles that trap charges and may also function as a graphitization catalyst. | 2009-04-23 |
20090101965 | ELECTRON BLOCKING LAYERS FOR ELECTRONIC DEVICES - Methods and apparatuses for electronic devices such as non-volatile memory devices are described. The memory devices include a multi-layer control dielectric, such as a double or triple layer. The multi-layer control dielectric includes a combination of high-k dielectric materials such as aluminum oxide, hafnium oxide, and/or hybrid films of hafnium aluminum oxide. The multi-layer control dielectric provides enhanced characteristics, including increased charge retention, enhanced memory program/erase window, improved reliability and stability, with feasibility for single or multi state (e.g., two, three or four bit) operation. | 2009-04-23 |
20090101966 | Method of identifying logical information in a programming and erasing cell by on-side reading scheme - A method of identifying logical information in a cell, particularly in a programming by hot hole injection nitride electron storage (PHINES) cell by one-side reading scheme is disclosed. The method comprise steps of: erasing the first region and the second region of PHINES cell by increasing a local threshold voltage (Vt) to a certain value; programming at least one of the first region and the second region of the PHINES cell by hot hole injection; and reading a logical state of the PHINES cell by measuring an output current of one of the first region and the second region; wherein different quantity of the output current is caused by interaction between different quantity of the hot hole stored in the first region and the second region, so as to determine the logical state of the PHINES cell by one-side reading scheme. | 2009-04-23 |
20090101967 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes an insulating layer, a channel structure, an insulating structure and a gate. The channel structure includes a channel bridge for connecting two platforms. The bottom of the channel bridge is separated from the insulating layer by a distance, and the channel bridge has a plurality of separated doping regions. The insulating structure wraps around the channel bridge, and the gate wraps around the insulating structure. | 2009-04-23 |
20090101968 | STRUCTURE OF SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A field effect transistor configured in a convex type Fin structure, in which diffusion layer | 2009-04-23 |
20090101969 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device comprising: a semiconductor substrate; a first conductive layer provided on a surface of the substrate and serving as one of a source and a drain; a first insulating film provided on the first conductive layer; a gate electrode film provided on the first insulating film; a second insulating film provided on the gate electrode film; a gate opening provided so as to penetrate the second insulating film, the gate electrode film and the first insulating film to expose a part of the first conductive layer; a recess provided in the surface of the first conductive layer just below the gate opening; a gate insulator provided on the side surface of the gate opening and having a projecting shape at a portion between the first insulating film and the recess; a second conductive layer buried in the recess and in a bottom of the gate opening so as to be in contact with the gate insulator, and serving as the one of the source and the drain while being in contact with the first conductive layer; a channel which is buried in the gate opening above the second conductive layer so as to face the gate electrode film with the gate insulator therebetween, and which has a channel layer generated therein, the channel layer allowing majority carriers to flow between the source and the drain in response to a voltage applied to the gate; and a third conductive layer buried in the gate opening above the channel so as to be in contact with the gate insulator to serve as the other one of the source and the drain. | 2009-04-23 |
20090101970 | Semiconductor Device and Method for Manufacturing the Same - A method for manufacturing a semiconductor device including a vertical cell transistor structure may include forming a vertical cell transistor structure over a semiconductor substrate of a cell region; forming an insulating film over the vertical cell transistor structure; planarizing the insulating film to expose a hard mask film disposed at a top portion of the vertical cell transistor structure; and forming a storage node contact by removing the hard mask film. | 2009-04-23 |
20090101971 | SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND DATA PROCESSING SYSTEM - A bottom of a gate trench has a first bottom relatively far from an STI and a second bottom relatively near from the STI A portion, in an active region, configuring the second bottom of the gate trench configures a side-wall channel region, and has a thin-film SOI structure sandwiched between the gate electrode and the STI. On the other hand, a portion configuring the first bottom of the gate trench functions as a sub-channel region. A curvature radius of the second bottom is larger than a curvature radius of the first bottom. In an approximate center in a width direction of the gate trench, a bottom of a trench is approximately flat, and on the other hand, in ends of the width direction, a nearly whole bottom of the trench is curved. | 2009-04-23 |
20090101972 | PROCESS FOR FABRICATING A FIELD-EFFECT TRANSISTOR WITH DOPING SEGREGATION USED IN SOURCE AND/OR DRAIN - Source and/or drain regions of a transistor are first doped with an appropriate dopant and a metal is subsequently deposited. After heating, a silicide will displace the dopant, creating an increased density of dopants at the border of the silicided region. The dopants that are adjacent to or in the gate region of the device will form a thin layer. The silicide or other reactant material is then removed and replaced with a desired source/drain material, while leaving the layer of dopant immediately adjacent to the newly deposited source/drain material. | 2009-04-23 |
20090101973 | Field effect transistor formed on an insulating substrate and integrated circuit thereof - A field effect transistor has an insulating substrate, a semiconductor thin film formed on the insulating substrate, and a gate insulating film on the semiconductor thin film. A first gate electrode is formed on the gate insulating film. A first region and a second region having a first conductivity type are formed on or in a surface of the semiconductor film on opposite sides of the first gate electrode in a length direction thereof. A third region having a second conductivity type opposite the first conductivity type is arranged on or in the semiconductor film side by side with the second region in a width direction of the first gate electrode. The third region and the second region are in contact with each other and make a low resistance junction. A second gate electrode is formed on the gate insulating film along the second region. A fourth region having the first conductivity type is formed on or in the semiconductor film on an opposite side of the second region with respect to the second gate electrode. One of the first and the fourth regions is used as an output region according to a circuit operation. | 2009-04-23 |
20090101974 | SEMICONDUCTOR DEVICE - A semiconductor device includes an n+ type semiconductor substrate | 2009-04-23 |
20090101975 | Integrated Circuit Arrangement Comprising a Field Effect Transistor, Especially a Tunnel Field Effect Transistor - An explanation is given of, inter alia, tunnel field effect transistors having a thicker gate dielectric (GD | 2009-04-23 |
20090101976 | BODY TIE TEST STRUCTURE FOR ACCURATE BODY EFFECT MEASUREMENT - A body tie test structure and methods for its manufacture are provided. The transistor comprises a body-tied semiconductor on insulator (SOI) transistor formed in a layer of semiconductor material, the transistor comprising a cross-shaped gate structure with a substantially constant gate length L. An insulating blocking layer enables formation of a spacer region in the layer of semiconductor material separating the source and drain regions from the body tie region. A conductive channel with substantially the same inversion characteristics as the intrinsic transistor body connects the body tie to the intrinsic transistor body through the spacer region. | 2009-04-23 |
20090101977 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - An object of the present invention is to provide a semiconductor device having a fin-type transistor that is excellent in characteristics by forming a fin-shaped semiconductor portion and a gate electrode with high precision or by making improvement regarding variations in characteristics among elements. The present invention is a semiconductor device including a fin-shaped semiconductor portion having a source region formed on one side thereof and a drain region formed on the other side thereof, and a gate electrode formed between the source region and the drain region to surround the fin-shaped semiconductor portion with a gate insulating film interposed therebetween. One solution for solving the problem according to the invention is that the gate electrode uses a metal material or a silicide material that is wet etchable. | 2009-04-23 |
20090101978 | FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE WITH MERGED SOURCE/DRAIN SILICIDE AND METHOD OF FORMING THE STRUCTURE - Disclosed herein are embodiments of a design structure of a multiple fin fin-type field effect transistor (i.e., a multiple fin dual-gate or tri-gate field effect transistor) in which the multiple fins are partially or completely merged by a highly conductive material (e.g., a metal silicide). Merging the fins in this manner allow series resistance to be minimized with little, if any, increase in the parasitic capacitance between the gate and source/drain regions. Merging the semiconductor fins in this manner also allows each of the source/drain regions to be contacted by a single contact via as well as more flexible placement of that contact via. | 2009-04-23 |
20090101979 | Methods of Forming Field Effect Transistors Having Stress-Inducing Sidewall Insulating Spacers Thereon and Devices Formed Thereby - Methods of forming integrated circuit devices include forming a field effect transistor having a gate electrode, a sacrificial spacer on a sidewall of the gate electrode and silicided source/drain regions. The sacrificial spacer is used as an implantation mask when forming highly doped portions of the source/drain regions. The sacrificial spacer is then removed from the sidewall of the gate electrode. A stress-inducing electrically insulating layer, which is configured to induce a net tensile stress (for NMOS transistors) or compressive stress (for PMOS transistors) in a channel region of the field effect transistor, is then formed on the sidewall of the gate electrode. | 2009-04-23 |
20090101980 | METHOD OF FABRICATING A GATE STRUCTURE AND THE STRUCTURE THEREOF - A method of fabricating a gate structure in a metal oxide semiconductor field effect transistor (MOSFET) and the structure thereof is provided. The MOSFET may be n-doped or p-doped. The gate structure, disposed on a substrate, includes a plurality of gates. Each of the plurality of gates is separated by a vertical space from an adjacent gate. The method deposits at least one dual-layer liner over the gate structure filling each vertical space. The dual-layer liner includes at least two thin high density plasma (HDP) films. The deposition of both HDP films occurs in a single HDP chemical vapor deposition (CVD) process. The dual-layer liner has properties conducive for coupling with plasma enhanced chemical vapor deposition (PECVD) films to form tri-layer or quadric-layer film stacks in the gate structure. | 2009-04-23 |
20090101981 | ONE-TRANSISTOR TYPE DRAM - A one-transistor type DRAM simplifies a manufacturing process and reduces the height of a chip. In the one-transistor type DRAM, an active region is defined by a device isolating film. A first word line and a second word line extend across the active region and the device isolating film. A common source region is formed in the portion of the active region between the first and second word lines. Drain regions are formed in the portions of the active region outside of the first and second word lines. A first metal line and a second metal line are connected to the common source region and the drain region, respectively, and a bit line is connected to the second metal line. | 2009-04-23 |
20090101982 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device according to an embodiment of the present invention comprises: a semiconductor substrate; a first field-effect transistor formed on the semiconductor substrate, and including a fin constituted by a semiconductor layer having source and drain regions via a channel region in an extending direction, and a gate electrode formed on the channel region via an insulating film; a stress application layer formed on a top surface of the gate electrode, and formed by a conductive material of which a difference between linear expansion coefficients at a temperature of forming a stress application layer and a room temperature is different from a difference between linear expansion coefficients of the fin at the temperature of forming the stress application layer and the room temperature, and a plug layer formed on the stress application layer and above the fin, and made of a conductive material having larger Young's modulus than that of the fin. | 2009-04-23 |
20090101983 | Method of Achieving Dense-Pitch Interconnect Patterning in Integrated Circuits - Components in integrated circuits (ICs) are fabricated as small as possible to minimize sizes of the ICs and thus reduce manufacturing costs per IC. Metal interconnect lines are formed on minimum pitches possible using available photolithographic printers. Minimum pitches possible for contacts and vias are larger than minimum pitches possible for metal interconnect lines, thus preventing dense rectilinear grid configurations for contacts and vias. The instant invention is an integrated circuit, and a method of fabricating an integrated circuit, wherein metal interconnect lines are formed on a minimum pitch possible using a photolithographic printer. Contacts and vias are arranged to provide connections to components and metal interconnect lines, as required by the integrated circuit, in configurations that are compatible with the minimum pitch for contacts and vias, including semi-dense arrays. | 2009-04-23 |
20090101984 | Semiconductor device having gate electrode including metal layer and method of manufacturing the same - A semiconductor device may include a gate dielectric film on a semiconductor substrate and/or a gate electrode. The gate electrode may include a first metal film, a first metal silicide film, and/or a conductive polysilicon film sequentially stacked on the gate dielectric film. | 2009-04-23 |
20090101985 | TRILAYER RESIST SCHEME FOR GATE ETCHING APPLICATIONS - A trilayer resist (TLR) patterning scheme is provided to enable gate conductors, particularly polySi gate conductors, with critical dimensions (CDs) of less than 40 nm and minimal LER and LWR. In accordance with the present invention, the inventive patterning scheme utilizes an organic/inorganic/organic multilayer stack instead of an organic layer used in the prior art. The top organic layer of the inventive TLR is a photoresist material such as a 193 nm photoresist that is located atop an antireflective coating (ARC), which is also comprised of an organic material. The middle inorganic layer of the TLR comprises any oxide layer such as, for example, a low temperature (less than or equal to 250° C.) chemical vapor deposited (CVD) oxide, an oxide derived from TEOS (tetraethylorthosilicate), silicon oxide, a silane oxide, or a Si-containing ARC material. The bottom organic layer of the TLR comprises any organic layer such as, for example, a Near Frictionless Carbon (NFC), a diamond-like carbon, a thermosetting polyarylene ether. | 2009-04-23 |
20090101986 | SEMICONDUCTOR DEVICE AND ELECTRONIC APPARATUS - A semiconductor device includes: a substrate having a first surface; an insulation layer; a semiconductor layer disposed to the first surface of the substrate with the insulation layer interposed between the semiconductor layer and the first surface; and a piezoelectric layer that is positioned between the first surface and the semiconductor layer, and disposed in a region included and interposed in the insulation layer. | 2009-04-23 |
20090101987 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME - A semiconductor device includes: a semiconductor substrate; a p-channel field effect transistor formed in a first region of the semiconductor substrate; an n-channel field effect transistor formed in a second region of the semiconductor substrate; a compressive stress film with a compressive stress generated inside, the compressive stress film covering the first region; a tensile stress film with a tensile stress generated inside, the tensile stress film covering the second region; and a buffer film located between the p-channel field effect transistor and the n-channel field effect transistor on the semiconductor substrate, the magnitude of internal stress of the buffer film being smaller than the magnitude of the compressive stress of the compressive stress film and the magnitude of the tensile stress of the tensile stress film. | 2009-04-23 |
20090101988 | BIPOLAR TRANSISTORS WITH RESISTORS - Bipolar transistors in complimentary MOS (CMOS) integrated circuits (ICs) are often fabricated as parasitic components, in which emitters of bipolar transistors are implanted in the same processes as CMOS sources/drains, to avoid manufacturing costs associated with dedicated implants for bipolar emitters. Energies and doses of CMOS source/drain implants are typically selected to optimize CMOS transistor performance, resulting in less than optimum values of bipolar parameters such as gain. CMOS ICs often include implanted resistors of a same type as the emitters of the bipolar transistors in the same ICs. This invention discloses bipolar transistors with emitters implanted by CMOS source/drain implants and resistor implants to improve bipolar transistor parameters, and a method for fabricating same. | 2009-04-23 |
20090101989 | METAL GATE COMPATIBLE ELECTRICAL FUSE - A dielectric material layer is formed on a metal gate layer for a metal gate electrode, and then lithographically patterned to form a dielectric material portion, followed by formation of a polycrystalline semiconductor layer thereupon. A semiconductor device employing a metal gate electrode is formed in a region of the semiconductor substrate containing a vertically abutting stack of the metal gate layer and the polycrystalline semiconductor layer. A material stack in the shape of an electrical fuse is formed in another region of the semiconductor substrate containing a vertical stack of the metal gate layer, the dielectric material portion, and the polycrystalline semiconductor layer. After metallization of the polycrystalline semiconductor layer, an electrical fuse containing a polycrystalline semiconductor portion and a metal semiconductor alloy portion is formed over the dielectric material portion that separates the electrical fuse from the metal gate layer. | 2009-04-23 |
20090101990 | Simiconductor integrated circuit device and method of manufacturing the same - A semiconductor integrated circuit device includes a first dopant region in a semiconductor substrate, an isolation region on the semiconductor substrate, the isolation region surrounding the first dopant region, a gate wire surrounding at least a portion of the isolation region, and a plurality of second dopant regions arranged along at least a portion of the gate wire, the plurality of second dopant regions being spaced apart from each other, and the portion of the gate wire being between the first dopant region and a respective second dopant region. | 2009-04-23 |
20090101991 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A semiconductor device includes a device isolation structure having a grounded conductive layer to define an active region, and a gate formed over the active region and the device isolation structure. | 2009-04-23 |
20090101992 | Method of forming a transistor having gate protection and transistor formed according to the method - A microelectronic device and a method of forming same. The method comprises: a transistor gate; a first spacer and a second spacer respectively adjacent a first side and a second side of the gate; a diffusion layer supra-adjacent the gate; contact regions super-adjacent the diffusion layer and adjacent the first spacer and the second spacer; a protective cap super-adjacent the gate and between the contact regions, the protective cap being adapted to protect the device from shorts between the gate and the contact regions. | 2009-04-23 |
20090101993 | HIGH-TEMPERATURE STABLE GATE STRUCTURE WITH METALLIC ELECTRODE - The present invention provides a method for depositing a dielectric stack comprising forming a dielectric layer atop a substrate, the dielectric layer comprising at least oxygen and silicon atoms; forming a layer of metal atoms atop the dielectric layer within a non-oxidizing atmosphere, wherein the layer of metal atoms has a thickness of less than about 15 Å; forming an oxygen diffusion barrier atop the layer of metal atoms, wherein the non-oxidizing atmosphere is maintained; forming a gate conductor atop the oxygen diffusion barrier; and annealing the layer of metal atoms and the dielectric layer, wherein the layer of metal atoms reacts with the dielectric layer to provide a continuous metal oxide layer having a dielectric constant ranging from about 25 to about 30 and a thickness less than about 15 Å. | 2009-04-23 |
20090101994 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device and a method for fabricating the same are disclosed. The semiconductor device includes a semiconductor substrate having an active region and a device isolation region defining the active region, and a resistor string formed over the active region. | 2009-04-23 |
20090101995 | PROCESS FOR FABRICATION OF FINFETs - A method of fabricating a plurality of FinFETs on a semiconductor substrate in which the gate width of each individual FinFET is defined utilizing only a single etching process, instead of two or more, is provided. The inventive method results in improved gate width control and less variation of the gate width of each individual gate across the entire surface of the substrate. The inventive method achieves the above by utilizing a modified sidewall image transfer (SIT) process in which an insulating spacer that is later replaced by a gate conductor is employed and a high-density bottom up oxide fill is used to isolate the gate from the substrate. | 2009-04-23 |
20090101996 | NANOSTRUCTURES WITH ELECTRODEPOSITED NANOPARTICLES - A nanoelectronic device includes a nanostructure, such as a nanotube or network of nanotube, disposed on a substrate. Nanoparticles are disposed on or adjacent to the nanostructure so as to operatively effect the electrical properties of the nanostructure. The nanoparticles may be composed of metals, metal oxides or salts and nanoparticles composed of different materials may be present. The amount of nanoparticles may be controlled to preserve semiconductive properties of the nanostructure, and the substrate immediately adjacent to the nanostructure may remain substantially free of nanoparticles. A method for fabricating the device includes electrodeposition of the nanoparticles using one of more solutions of dissolved ions while providing an electric current to the nanostructures but not to the surrounding substrate. | 2009-04-23 |
20090101997 | Micromechanical Capacitive Pressure Transducer and Production Method - The present invention describes a method for producing a micromechanical capacitive pressure transducer and a micromechanical component produced by this method. First, a first electrode is produced in a doped semiconductor substrate. | 2009-04-23 |
20090101998 | ELECTRO-ACOUSTIC SENSING DEVICE - An electro-acoustic sensing device including a sensing chip, a carrier chip and a sealing element is provided. The sensing chip is for electro-acoustic transducing and thereby outputting an electrical signal. The carrier chip disposed below the sensing chip has at least one second connecting point, at least one electrical channel and at least one channel connecting point. The second connecting point is electrically contacted with the first connecting point. The second connecting point and the channel connecting point are located at different surfaces of the carrier chip. The electrical channel passes through the carrier chip and electrically connects the second connecting point and the channel connecting point. The electrical signal is transmitted to the channel connecting point via the first and the second connecting points and the electrical channel. The sealing element is disposed between the sensing chip and the carrier chip for air-tight coupling the two chips. | 2009-04-23 |
20090101999 | ELECTRONIC DEVICE ON SUBSTRATE WITH CAVITY AND MITIGATED PARASITIC LEAKAGE PATH - An electronic device. The electronic device includes a first electrode and a coating layer. The electronic device is fabricated on a substrate; the substrate has a cavity created in a top surface of the substrate; and the first electrode is electrically coupled to the substrate. The coating layer coats at least part of a substrate surface in the cavity, and the presence of the coating layer results in a mitigation of at least one parasitic leakage path between the first electrode and an additional electrode fabricated on the substrate. | 2009-04-23 |
20090102000 | CMOS IMAGE SENSOR DEVICE AND ITS FORMATION METHOD - A method for forming a CMOS image sensor (CIS) in accordance with embodiments includes sequentially forming a first photoresist and a blocking layer over a semiconductor substrate where a logic section including a photodiode may be formed. A micro lens array pattern may be formed by coating a second photoresist over top of the formed blocking layer, patterning the second photoresist, and then etching the blocking layer by using the patterned second photoresist as a mask. The first photoresist may be patterned by performing isotropic etching using the micro lens array pattern as a mask. A micro lens array may be formed by filling a material having a refractivity higher than that of the first PR in the patterned portion of the first photoresist. The sensitivity of the CIS can be optimized by maximizing the fill factor while maintaining the spherical surface of the lens by fabricating a micro lens array using anisotropic etching. | 2009-04-23 |
20090102001 | Image Sensor and a Method for Manufacturing Thereof - An image sensor according to an embodiment includes a semiconductor substrate including a photodiode; a protective layer pattern having a lower trench that is disposed on the semiconductor substrate to expose the photodiode; an insulating layer pattern having the upper trench that is disposed on the lower trench of the protective layer pattern to expose the photodiode; and a wave guide that is disposed in the lower trench and the upper trench. | 2009-04-23 |
20090102002 | PACKAGED SEMICONDUCTOR ASSEMBLIES AND ASSOCIATED SYSTEMS AND METHODS - Semiconductor packages, packaged semiconductor devices, methods of manufacturing semiconductor packages, methods of packaging semiconductor devices, and associated systems are disclosed. A semiconductor package in accordance with a particular embodiment includes a die having a first side carrying a first bond site electrically connected to a sensor and/or a transmitter configured to receive and/or transmit radiation signals. The semiconductor package also includes encapsulant material at least partially encapsulating a portion of the die. The semiconductor package includes a conductive path from the first bond site to a second bond site, positioned on a back surface of the encapsulant, which can include through-encapsulant interconnects. A cover can be positioned adjacent to the die and be generally transparent to a target wavelength. | 2009-04-23 |
20090102003 | PACKAGE COMPRISING AN ELECTRICAL CIRCUIT - A package including an electrical circuit may be produced in a more efficient manner when on a substrate including a plurality of electrical circuits the circuits are tested for their functionality and when the functional circuits are connected, by means of a frame enclosing the circuit on the surface of the substrate, to a second substrate whose surface area is smaller than that of the first substrate. The substrates are connected, by means of a second frame, which is adapted to the first frame and is located on the surface of the second substrate, such that the first and second frames lie one on top of the other. Subsequently, the functional packaged circuits may be singulated in a technologically simple manner. | 2009-04-23 |
20090102004 | SENSOR PACKAGE - A sensor package includes an image sensing chip having a front surface, a plurality of bumps, a glass cover plate, and a connector. The plurality of bumps are formed on the front surface, and are electrically connected to the image sensing chip. The glass cover plate has a bottom surface facing the front surface, and the glass cover plate has a plurality of transparent conductive wires formed on the bottom surface. A terminal of each of the transparent conductive wires is electrically connected to a respective bump, and another terminal of each of the transparent conductive wires extends out of an orthogonal projection area of the image sensing chip on the bottom surface. The connector is electrically connected to the another terminal of each of the transparent conductive wires. | 2009-04-23 |
20090102005 | Wafer level package and mask for fabricating the same - An exemplary wafer level package comprises a semiconductor wafer with a plurality of semiconductor chips of perfect polygonal shapes thereon. A circuit-free area is defined over the semiconductor wafer to electrically isolate the semiconductor chips. A dam structure is substantially formed over the circuit-free area, wherein a portion of the dam structure formed around an edge of the semiconductor wafer is formed with a plurality via holes therein. A transparent substrate is formed over the semiconductor wafer, defining a plurality of cavities between the semiconductor chips and the transparent substrate, wherein the transparent substrate is supported by the dam structure. | 2009-04-23 |
20090102006 | ELECTROSTATIC MICRO ACTUATOR, ELECTROSTATIC MICROACTUATOR APPARATUS AND DRIVING METHOD OF ELECTROSTATIC MICRO ACTUATOR - A semiconductor substrate; a cantilever which is formed on the semiconductor substrate so as to face the semiconductor substrate with an air layer therebetween, the cantilever being made from an electrically conductive material or a semiconductor material, and the cantilever being mechanically movable; a photodiode which is formed so as to be connected in parallel to a capacitance that is constituted from the cantilever and the semiconductor substrate, and the photodiode being formed between an anchor portion which is a portion of the cantilever and the semiconductor substrate; and a power source which supplies voltage via a resistance on a side of the cantilever which is a connection point of a parallel circuit including both the capacitance and the photodiode so as to be backward bias to the photodiode, are included. | 2009-04-23 |
20090102007 | Lateral Power Diode with Self-Biasing Electrode - A semiconductor diode includes a drift region of a first conductivity type and an anode region of a second conductivity type in the drift region such that the anode region and the drift region form a pn junction therebetween. A first highly doped silicon region of the first conductivity type extends in the drift region, and is laterally spaced from the anode region such that upon biasing the semiconductor power diode in a conducting state, a current flows laterally between the anode region and the first highly doped silicon region through the drift region. A plurality of trenches extends into the drift region perpendicular to the current flow. Each trench includes a dielectric layer lining at least a portion of the trench sidewalls and also includes at least one conductive. | 2009-04-23 |
20090102008 | SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor substrate having an SOI layer is provided. Between an SOI layer and a glass substrate, a bonding layer is provided which is formed of one layer or a plurality of layers of phosphosilicate glass, borosilicate glass, and/or borophosphosilicate glass, using organosilane as one material by a thermal CVD method at a temperature of 500° C. to 800° C. | 2009-04-23 |
20090102009 | Semiconductor device and method of forming the same - Provided are a semiconductor device and a method of forming the semiconductor device. The semiconductor device includes an active region of which an edge is curved. The semiconductor device includes a gate insulating layer, a floating gate, a gate interlayer dielectric layer and a control gate line on the active region. The semiconductor device includes an oxide pattern having a concave top surface between adjacent floating gates. The control gate may be sufficiently spaced apart from the active region by the oxide pattern. The method can provide a semiconductor device that includes a reoxidation process, an active region having a curved edge and an oxide pattern having a top surface of a curved concave shape. | 2009-04-23 |
20090102010 | SEMICONDUCTOR DEVICE WITH STI AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE - A semiconductor device includes: a semiconductor substrate having first and second areas; an STI isolation region being made of an isolation trench formed in the semiconductor substrate and an insulating film burying the isolation trench and defining a plurality of active regions in the first and second areas; a first structure formed on an area from the active region in the first area to a nearby STI isolation region and having a first height; and a second structure formed on an area from the active region in the second area to a nearby STI isolation region and having a second height, wherein the surface of the said STI isolation region in the first area is lower than the surface of said STI isolation region in the second area. | 2009-04-23 |
20090102011 | SEMICONDUCTOR DEVICE WITH A NOISE PREVENTION STRUCTURE - A semiconductor device including a substrate of a first semiconductor type with a pad region and a noise prevention structure in the substrate, on least one side of the pad region. The device further includes the substrate structure, a pad, and a dielectric layer therebetween. | 2009-04-23 |
20090102012 | Semiconductor devices having active elements with raised semiconductor patterns and related methods of fabricating the same - A semiconductor device may include a semiconductor region of a semiconductor substrate wherein a P-N junction is defined between the semiconductor region and a bulk of the semiconductor substrate. An insulating isolation structure in the semiconductor substrate may surround sidewalls of the semiconductor region. An interlayer insulating layer may be on the semiconductor substrate, on the semiconductor region, and on the insulating isolation structure, and the interlayer insulating layer may have first and second spaced apart element holes exposing respective first and second portions of the semiconductor region. A first semiconductor pattern may be in the first element hole on the first exposed portion of the semiconductor region, and a second semiconductor pattern may be in the second element;hole on the second exposed portion of the semiconductor region. A surface portion of the first semiconductor pattern opposite the semiconductor substrate and a surface portion of the second semiconductor pattern opposite the semiconductor substrate may have a same conductivity type. Related methods are also discussed. | 2009-04-23 |
20090102013 | FUSE BOX AND METHOD OF FORMING THE SAME - A fuse box includes a fuse pattern having a rugged profile and an interlayer insulating film including a fuse blowing window to fill the fuse pattern. | 2009-04-23 |
20090102014 | Anti-Fuse Cell and Its Manufacturing Process - An anti-fuse cell includes a standard MOS transistor of an integrated circuit, with source and drain regions covered with a metal silicide layer and at least one track of a resistive layer at least partially surrounding the MOS transistor, and adapted to pass a heating current such that the metal of said metal silicide diffuses across drain and/or source junctions. | 2009-04-23 |
20090102015 | Integrated Circuit, Memory Cell Array, Memory Cell, Memory Module, Method of Operating an Integrated Circuit, and Method of Manufacturing an Integrated Circuit - According to one embodiment of the present invention, an integrated circuit includes a plurality of resistivity changing memory cells, each memory cell including a top electrode, a bottom electrode and resistivity changing material being disposed between the top electrode and the bottom electrode. The top electrodes together form a continuous common first electrode. Alternatively, a first continuous common electrode which is electrically connected to all top electrodes is disposed above the top electrodes. A second electrode connectable to a fixed potential is disposed above the first electrode such that the first electrode and the second electrode together form a capacitor. | 2009-04-23 |
20090102016 | DESIGN STRUCTURE INCORPORATING VERTICAL PARALLEL PLATE CAPACITOR STRUCTURES - Design structure embodied in a machine readable medium for designing, manufacturing, or testing a design. The design structure includes a vertical parallel plate capacitor structure with a first plurality of conductive plates and a second plurality of conductive plates having an overlying relationship with the first plurality of conductive plates. The first plurality of conductive plates are spaced apart by a first distance. The second plurality of conductive plates are spaced apart by a second distance different than the first distance | 2009-04-23 |
20090102017 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SEMICONDUCTOR DEVICE - A semiconductor device and a method of fabricating a semiconductor device provide high quality cylindrical capacitors. The semiconductor device includes a substrate defining a cell region and a peripheral circuit region, a plurality of capacitors in the cell region, and supports for supporting lower electrodes of the capacitors. The lower electrodes are disposed in a plurality of rows each extending in a first direction. A dielectric layer is disposed on the lower electrodes, and an upper electrode is disposed on the dielectric layer. The supports are in the form of stripes extending longitudinally in the first direction and spaced from each other along a second direction. Each of the supports engages the lower electrodes of a respective plurality of adjacent rows of the lower electrodes. Each one of the supports is also disposed at a different level in the device from the support that is adjacent thereto in the second direction. | 2009-04-23 |
20090102018 | LOCALIZED MASKING FOR SEMICONDUCTOR STRUCTURE DEVELOPMENT - Container structures for use in integrated circuits and methods of their manufacture without the use of mechanical planarization such as chemical-mechanical planarization (CMP), thus eliminating CMP-induced defects and variations. The methods utilize localized masking of holes for protection of the inside of the holes during non-mechanical removal of exposed surface layers. The localized masking is accomplished through differential exposure of a resist layer to electromagnetic or thermal energy. The container structures are adapted for use in memory cells and apparatus incorporating such memory cells, as well as other integrated circuits. | 2009-04-23 |
20090102019 | CONTROLLED DOPING OF SEMICONDUCTOR NANOWIRES - A catalyst particle on a substrate is exposed to reactants containing a semiconductor material in a reactor. An intrinsic semiconductor nanowire having constant lateral dimensions is grown at a low enough temperature so that pyrolysis of the reactant is suppressed on the sidewalls of the intrinsic semiconductor nanowire. Once the intrinsic semiconductor nanowire grows to a desired length, the temperature of the reactor is raised to enable pyrolysis on the sidewalls of the semiconductor nanowire, and thereafter dopants are supplied into the reactor with the reactant. A composite semiconductor nanowire having an intrinsic inner semiconductor nanowire and a doped semiconductor shell is formed. The catalyst particle is removed, followed by an anneal that distributes the dopants uniformly within the volume of the composite semiconductor nanowire, forming a semiconductor nanowire having constant lateral dimensions and a substantially uniform doping. | 2009-04-23 |
20090102020 | WAFER AND METHOD FOR MANUFACTURING SAME - A wafer with an orientation notch being cut in a portion of its circumference, the wafer includes: a reinforcing flange formed upright at periphery; and a thin section surrounded by the reinforcing flange and having a smaller thickness than the reinforcing flange. The reinforcing flange includes a circumferential portion formed upright along the circumference and a notch portion formed upright near the orientation notch, and a width of the circumferential portion as viewed parallel to a major surface of the wafer is smaller than a depth of the orientation notch as viewed parallel to the major surface. | 2009-04-23 |
20090102021 | Through-Silicon Vias and Methods for Forming the Same - An integrated circuit structure and methods for forming the same are provided. The integrated circuit structure includes a substrate; a through-silicon via (TSV) extending into the substrate; a TSV pad spaced apart from the TSV; and a metal line over, and electrically connecting, the TSV and the TSV pad. | 2009-04-23 |
20090102022 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method for manufacturing a semiconductor device which minimizes the line width of a pattern and allows a low temperature oxide film and a thinly formed photoresist film to serve as ion blockers when performing an ion implantation process on the semiconductor substrate. | 2009-04-23 |
20090102023 | Method for Manufacturing a Structure, Semiconductor Device and Structure on a Substrate - One possible embodiment is a method for manufacturing a structure on a substrate which can be used in the manufacturing of a semiconductor device, including the steps of: forming a first structure on the substrate having at least one sidewall, forming at least one layer as a second structure selectively on the at least one sidewall of the first structure by an epitaxial technique, electroplating, selective silicon dioxide deposition, selective low pressure CVD or an atomic layer deposition technique. Furthermore semiconductor devices, uses of equipment and structures are covered. | 2009-04-23 |
20090102024 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SAME - A semiconductor device has an IC chip with a thickness of equal to or less than 100 μm and includes a semiconductor substrate. A device forming region is within the depth of approximately equal to or less than 5 μm from a surface of the semiconductor substrate, and a total thickness of the semiconductor substrate is from 5 μm to 100 μm. A BMD layer for carrying out gettering of metal impurities is provided immediately under the device forming region. Since a gettering site is provided immediately under the device forming region, in a device or the like of which extreme thinness is required, degradation of device characteristics and reliability due to contamination of metal impurities can be prevented, and stabilize and improve the device yield. The present invention inhibits degradation of device characteristics and reliability caused by contamination of metal impurities, in a device of which lamination of device chips is required or in a device of which extreme chip thinness for an IC card and the like is required, in an attempt to cope with an enlarged capacity of the device. | 2009-04-23 |
20090102025 | Semiconductor device and method for manufacturing the same, dry-etching process, method for making electrical connections, and etching apparatus - A method for manufacturing a semiconductor device comprises dry-etching a thin film using a resist mask carrying patterns in which at least one of the width of each pattern and the space between neighboring two patterns ranges from 32 to 130 nm using a halogenated carbon-containing compound gas with the halogen being at least two members selected from the group consisting of F, I and Br. The ratio of at least one of I and Br is not more than 26% of the total amount of the halogen atoms as expressed in terms of the atomic compositional ratio to transfer the patterns onto the thin film. Such etching of a thin film avoids causing damage to the resist mask used. The resulting thin film carrying the transferred patterns is used as a mask for subjecting the underlying material to dry-etching. | 2009-04-23 |
20090102026 | SEMICONDUCTOR-ON-INSULATOR SUBSTRATE WITH A DIFFUSION BARRIER - A diffusion barrier layer is incorporated between a top semiconductor layer and buried oxide layer. The diffusion barrier layer blocks diffusion of dopants into or out of buried oxide layer. The diffusion barrier layer may comprise a dielectric material such as silicon oxynitride or a high-k gate dielectric material. Alternately, the diffusion barrier layer may comprise a semiconductor material such as SiC. Such materials provide less charge trapping than a silicon nitride layer, which causes a high level of interface trap density and charge in the buried oxide layer. Thus, diffusion of dopants from and into semiconductor devices through the buried oxide layer is suppressed by the diffusion barrier layer without inducing a high interface trap density or charge in the buried oxide layer. | 2009-04-23 |
20090102027 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND ELECTRONIC APPLIANCE - An object of the present invention is to provide a semiconductor device including an insulating layer with a high dielectric strength voltage, a low dielectric constant, and low hygroscopicity. Another object of the present invention is to provide an electronic appliance with high performance and high reliability, which uses the semiconductor device. An insulator containing nitrogen, such as silicon oxynitride or silicon nitride oxide, and an insulator containing nitrogen and fluorine, such as silicon oxynitride added with fluorine or silicon nitride oxide added with fluorine, are alternately deposited so that an insulating layer is formed. By sandwiching an insulator containing nitrogen and fluorine between insulators containing nitrogen, the insulator containing nitrogen and fluorine can be prevented from absorbing moisture and thus a dielectric strength voltage can be increased. Further, an insulator contains fluorine so that a dielectric constant can be reduced. | 2009-04-23 |
20090102028 | METHOD FOR MANUFACTURING A SEMICONDUCTOR COMPONENT AND STRUCTURE THEREFOR - A method for manufacturing a semiconductor component that includes a leadframe having a non-metallic base structure and an intermediate leadframe structure. The non-metallic base structure may be, among other things, paper, cellulose, or plastic. A layer of electrically conductive material is formed over the non-metallic base structure. A circuit element attach structure and a plurality of leadframe leads are formed from the layer of electrically conductive material. A circuit element is coupled to the circuit element attach structure and electrically coupled to the plurality of leadframe leads. The circuit element is encapsulated and at least the non-metallic base structure is removed. Alternatively, a plurality of leadframe leads may be formed on the electrically conductive layer and a circuit element is placed over the electrically conductive layer. The circuit element is electrically coupled to the plurality of leadframe leads and encapsulated. The non-metallic base structure and the electrically conductive layer are removed. | 2009-04-23 |
20090102029 | Semiconductor Device - A semiconductor device that can cope with larger numbers of pins and finer pitches while suppressing lowering of the manufacturing yield and reliability includes: a semiconductor chip having a plurality of electrodes provided on an upper surface thereof; a plurality of lead terminals including inner lead portions disposed toward the semiconductor chip; a sheet-form wiring member having a plurality of conductors insulated from one another on one main surface thereof; and a sealing-resin layer for sealing at least the semiconductor chip, the inner lead portions and the wiring member. The electrodes of the semiconductor device and the inner lead portions of the lead terminals are electrically connected respectively to each other via the conductors of the wiring member. | 2009-04-23 |
20090102030 | INTEGRATED CIRCUIT PACKAGE WITH ETCHED LEADFRAME FOR PACKAGE-ON-PACKAGE INTERCONNECTS - Methods, systems, and apparatuses for integrated circuit packages, and for package stacking, are provided. An electrically conductive frame is attached to a first surface of a substrate. The electrically conductive frame includes a perimeter ring portion, a plurality of leads, and a plurality of interconnect members positioned within a periphery formed by the perimeter ring portion. Each interconnect member is coupled to the perimeter ring portion by a respective lead. A first end of each interconnect member is coupled to the first surface of the substrate. An encapsulating material is applied to the first surface of the substrate, without covering a second end of each interconnect member with the encapsulating material. The perimeter ring portion is removed from the electrically conductive frame to isolate the plurality of interconnect members. A first integrated circuit package is formed in this manner. A second integrated circuit package may be mounted to the first package. Signals of the first package may be electrically coupled with the second package at the exposed second ends of the interconnect members. Side surfaces of the interconnect members may be exposed at sides of the first package. | 2009-04-23 |
20090102031 | METHOD FOR CONNECTING A DIE ATTACH PAD TO A LEAD FRAME AND PRODUCT THEREOF - Disclosed in this specification is a semiconductor package with a die attach pad and a lead frame which are electrically and mechanically connected to one another through a conductive wire ribbon. Such a configuration reduces the package footprint and also permits different styles of die attach pads and lead frames to be interchanged, thus reducing production costs. | 2009-04-23 |
20090102032 | Electronic Device - An electronic device is disclosed. In one embodiment, the electronic device includes a substrate, a plurality of conducting lines formed on a first conducting material that is disposed on the substrate, and a layer of a second conducting material disposed on the plurality of conducting lines. The conducting lines include a top face and a side face. The layer of the second conducting material includes a first thickness disposed on each of the top faces and a second thickness disposed on each of the side faces. To this end, the first thickness is greater than the second thickness. | 2009-04-23 |
20090102033 | INTEGRATED CIRCUIT PACKAGE - Package for an integrated circuit (IC), includes a housing ( | 2009-04-23 |
20090102034 | Packaged Microchip with Spacer for Mitigating Electrical Leakage Between Components - A packaged microchip has a base, at least one spacer coupled to the base, and first and second microchips mounted to the at least one spacer. The at least one spacer is configured to substantially prevent leakage current between the first and second microchips. | 2009-04-23 |
20090102035 | Semiconductor Packaging Device - Embodiments of the invention relate to a semiconductor module and to a method for manufacturing a semiconductor module. In an embodiment of the invention, a semiconductor module for mounting to a board may include at least an integrated circuit having connections on at least one side of the integrated circuit, and at least a first layer which is applied to the side of the integrated circuit having the connections, wherein the free surface of the first layer facing away from the integrated circuit has a thermo-mechanical linear expansion in the in-plane direction of the surface which corresponds to the thermo-mechanical linear expansion of the board to which the semiconductor module is to be mounted. | 2009-04-23 |
20090102036 | Stacked semiconductor package having interposing print circuit board - A stacked semiconductor package including a number of solder ball pads formed on a lower surface of an interposing print circuit board, which is smaller than that of solder ball pads formed on an upper surface thereof, a pitch of the solder ball pads formed on the lower surface of the interposing print circuit board is greater than a pitch of the solder ball pads formed on the upper interposing print circuit board. | 2009-04-23 |
20090102037 | SEMICONDUCTOR PACKAGE, MODULE, SYSTEM HAVING SOLDER BALL COUPLED TO CHIP PAD AND MANUFACTURING METHOD THEREOF - A semiconductor package structure having a solder ball coupled to a chip pad and a manufacturing method thereof, a semiconductor package module, and a system. A circuit board includes a through hole therein, and a conductor is formed on a sidewall of the through hole. A first semiconductor chip including a first chip pad is mounted on the circuit board. A solder ball is disposed in the through hole and is bonded to the conductor and the first chip pad. Therefore, an underfill can be removed from a semiconductor package, and thus, the semiconductor package can be reduced in thickness. | 2009-04-23 |
20090102038 | CHIP SCALE STACKED DIE PACKAGE - A die prepared for stacking in a chip scale stacked die assembly, having interconnect sites in an area inward from a die edge and interconnect pads near at least one die edge. Second-level interconnection of the stacked die assembly can be made by way of connections between a first die in the assembly and circuitry on a support; and interconnection between die in the stack can be made by way of connection of z-interconnects with bonds pads in the die attach side of the support near or at one or more die edges. Methods for preparing the die include processes carried out to an advanced stage at the wafer level or at the die array level. | 2009-04-23 |
20090102039 | Package on package structure - The present invention relates to a package on package (PoP) structure, which comprises: a first packaging substrate having a plurality of conductive elements on its surface; a second packaging substrate having a plurality of conductive elements on its surface; and a surface-ceramic aluminum plate sandwiched between the first packaging substrate and the second packaging substrate. The surface-ceramic aluminum plate includes plural plated through holes extending through the layer. In addition, the first packaging substrate electrically conducts with the second packaging substrate through these plated through holes. The disclosed structure eliminates the warpage problem of PoP structure, and enhances the strength of PoP structure. | 2009-04-23 |
20090102040 | POWER SEMICONDUCTOR MODULE - An apparatus includes a housing with a plurality of restraining elements and at least one supporting element. A cover is elastically deformed by the plurality of restraining elements and the at least one supporting means. At least one substrate carrying at least one semiconductor chip is provided within the housing. | 2009-04-23 |
20090102041 | Electrical connection device and assembly method thereof - An electrical connection device and assembly method thereof includes a substrate with a plurality of contacting portions arranged on a surface thereof; a chip module having a plurality of terminals inclining in one direction and compressed and contacted with the contacting portions correspondingly; at least one restricting structure which restricts the chip module to move a distance relative to the substrate depending on the compression deformation of the terminals when the terminals are contacted with the contacting portions; and at least one elastic element just producing deformation when the chip module moves the distance. When the terminals are compressed and contacted with the contacting portions, the restricting structure restricts the chip module to move the distance depending on the compression deformation of the terminals, so that the elastic element just produces deformation, which make the chip module only move in the direction opposite to the deformation direction of the terminals. | 2009-04-23 |
20090102042 | Semiconductor device and method of fabricating semiconductor device - A semiconductor device including a semiconductor chip having external connecting terminals formed on one side is restrained to cause chipping in ridge line portion of semiconductor chip. A cover layer | 2009-04-23 |
20090102043 | Semiconductor package and manufacturing method thereof - A semiconductor package and a manufacturing method thereof are provided. The package element has a first insulating layer, and a plurality of holes are disposed on the first surface of the first insulating layer. Besides, a plurality of package traces are embedded in the insulating layer and connected to the other end of the holes. The holes function as a positioning setting for connecting the solder balls to the package traces, such that the signal of the semiconductor chip is connected to the package trace via conductor of the chip, and further transmitted externally via solder ball. The elastic modulus of the material of the first insulating layer is preferably larger than 1.0 GPa. | 2009-04-23 |
20090102044 | DEVICE INCLUDING A HOUSING FOR A SEMICONDUCTOR CHIP - A device including a housing for a semiconductor chip is disclosed. One embodiment provides a plurality of leads. A first lead forms an external contact element at a first housing side and extends at the first housing side into the housing in the direction of an opposite second housing side. The length of the first lead within the housing is greater than half the distance between the first and the second housing side. | 2009-04-23 |
20090102045 | Packaging substrate having capacitor embedded therein - A packaging substrate having capacitors embedded therein, comprising: two capacitor disposition layers, each respectively consisting of a high dielectric layer and two first circuit layers disposed on two opposite surfaces of the high dielectric layer, wherein each of the first circuit layers has a plurality of electrode plates and a plurality of circuits; an adhesive layer disposed between the capacitor disposition layers to adhere the capacitor disposition layers to form a core board structure, wherein spaces between the circuits of every first circuit layer are filled with the adhesive layer; and a plurality of conductive through holes penetrating the capacitor disposition layers and the adhesive layer, and electrically connecting the circuits of the capacitor disposition layers respectively; wherein, pairs of the electrode plates on the opposite surfaces of each of the capacitor disposition layers are parallel and correspond to each other to form capacitors. | 2009-04-23 |
20090102046 | ON-CHIP TEMPERATURE GRADIENT MINIMIZATION USING CARBON NANOTUBE COOLING STRUCTURES WITH VARIABLE COOLING CAPACITY - An electronic device comprises a die with at least one defined hot-spot area; and at least one defined intermediate temperature area at a temperature lower than the temperature of the hot-spot area. The device also comprises a cooling structure comprising at least one bundle of first nanotubes for cooling the hot spot area and at least one bundle of additional nanotubes for cooling the intermediate temperature area, and having heat conductivity lower than the bundle of first nanotubes. The heat conductivity of both sets of the nanotubes is sufficient to decrease any temperature gradient between the defined hot spot area, the defined intermediate temperature area, and at least one lower temperature area on the die. The walls of the first nanotubes and the additional nanotubes are surrounded by a heat conducting matrix material operatively associated with the lower temperature area. | 2009-04-23 |
20090102047 | Flip chip package structure and carrier thereof - A flip chip package structure including a chip, a carrier, and a plurality of bumps is provided. The chip has a bonding surface and a plurality of bump pads thereon. The carrier is disposed corresponding to the chip and includes a substrate and a plurality of pre-solders. The substrate has a carrying surface and a patterned trace layer thereon. The patterned trace layer has a plurality of traces, and each of the traces has an outward protruding bonding portion corresponding to the bump. The line width of the bonding portion is greater than that of the trace. The pre-solders are disposed on the bonding portions, respectively. The bumps are disposed between the bump pads and the corresponding pre-solders such that the chip is electrically connected to the carrier through the bumps. | 2009-04-23 |
20090102048 | ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREOF - Electronic device has substrate having at least one pad, electronic component having bump connected with pad of substrate electrically and mounting on substrate by flip chip bonding, conductive resin electrically connecting pad with bump, and insulation sheet disposed between substrate and electronic component. Substrate has recess on surface opposite to electronic component. Pad is formed on recess bottom. Conductive resin is provided on pad and in recess. Sheet has through hole corresponding to each bump. Opening area of through hole is smaller than that of recess. Bump is inserted into through hole, in contact with inner wall of through hole, electrically connected with pad via conductive resin, without direct contact with pad. | 2009-04-23 |
20090102049 | SEMICONDUCTOR DEVICE, LAYERED TYPE SEMICONDUCTOR DEVICE USING THE SAME, BASE SUBSTRATE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device has a plurality of external connection lands arranged on a base substrate for an external connection terminal used for electrical connection with an external member. The external connection lands at different arrangement positions have different heights in accordance with a warp of the base substrate which warp the base substrate would have when mounted. Thus, even when the semiconductor device, which attains a thin thickness and a high density, is warped, it is possible to provide a semiconductor device having a high connection yield and high connection reliability between the semiconductor device and a mounting substrate and between the semiconductor devices, and it is possible to provide a layered type semiconductor device using the same, a base substrate and a semiconductor device manufacturing method. | 2009-04-23 |
20090102050 | SOLDER BALL DISPOSING SURFACE STRUCTURE OF PACKAGE SUBSTRATE - A solder ball disposing surface structure of a package substrate is disclosed, wherein a package substrate has a chip disposing surface with a first circuit layer, an opposed solder ball disposing surface with a second circuit layer, and a first insulative protection layer formed on the chip disposing surface and the first circuit layer. The solder ball disposing surface structure includes: metal pads integral to the second circuit layer; metal flanges formed around the metal pads; and a second insulative protection layer formed on the solder ball disposing surface, the second insulative protection layer having second openings each with a size smaller than an outer diameter of each of the metal flanges so as to expose a part of surfaces of the metal flanges, thereby increasing contact area of the surface for mounting conductive elements and preventing detachment of the conductive elements from the surface due to poor bonding force. | 2009-04-23 |
20090102051 | METHOD TO CREATE SUPER SECONDARY GRAIN GROWTH IN NARROW TRENCHES - The present invention relates to a method for obtaining enlarged Cu grains in small trenches. More specifically it related to a method for creating enlarged copper grains or inducing super secondary grain growth in electrochemically deposited copper in narrow trenches and/or vias to be used in semiconductor devices. | 2009-04-23 |
20090102052 | Semiconductor Device and Fabricating Method Thereof - A semiconductor device and fabricating method thereof are disclosed. The method includes forming a first metal line over a substrate, forming a barrier layer over the substrate and the first metal line, forming an insulating layer on the barrier layer, forming a capping layer on the insulating layer, forming a photoresist pattern on the capping layer, implanting halogen ions into the insulating layer using the photoresist pattern as a mask, forming a via-hole exposing the first metal line by dry-etching the insulating layer using the photoresist pattern as an etch mask, and forming a second metal line in the via-hole in contact with the first metal line. | 2009-04-23 |
20090102053 | METAL LINE STACKING STRUCTURE IN SEMICONDUCTOR DEVICE AND FORMATION METHOD THEREOF - The method for forming a metal line stacking structure according to a preferred embodiment of the present invention comprises: sequentially forming a first barrier metal and a first metal layer on a lower dielectric layer that is disposed over a semiconductor substrate, and performing a plasma treatment; forming a second barrier metal on the plasma-treated first metal layer; selectively etching the second barrier metal, the first metal layer, and the first barrier metal to form a metal line layer including the second barrier metal, the first metal layer, and the first barrier metal, which respectively have a predetermined width; and sintering the metal line layer to raise a reaction between the first metal layer and the second barrier metal, thereby generating a metal compound layer. | 2009-04-23 |
20090102054 | SEMICONDUCTOR PACKAGE - A semiconductor package is disclosed. One embodiment provides a semiconductor package singulated from a wafer includes a chip defining an active surface, a back side opposite the active surface, and peripheral sides extending between the active surface and the back side; a contact pad disposed on the active surface; and a metallization layer extending from the contact pad onto a portion of the peripheral sides of the chip. | 2009-04-23 |
20090102055 | Semiconductor device - It is an object of the invention to provide semiconductor devices which can protect privacy of consumers or holders of commercial products and control the communication range according to use, even when the semiconductor device which can exchange data without contact is mounted on the commercial products. A semiconductor device of the invention includes an element group including a plurality of transistors over a substrate; a first conductive film functioning as an antenna over the element group; a second conductive film surrounding the first conductive film; an insulating film covering the first and second end portions; and a third conductive film over the insulating film. The first conductive film is provided in the shape of a coil, and each end portion of the first conductive film is connected to the element group. First and second end portions of the second conductive film are not connected to each other. | 2009-04-23 |
20090102056 | Patterned Leads For WLCSP And Method For Fabricating The Same - The present invention provides patterned leads for a wafer level chip size package and methods for fabricating the same. The patterned leads include connection leads and solder pads. In designing, a compensation pattern is disposed on the connection lead or on the solder pad, so as to increase the distance between the connection lead and the solder pad. The present invention meets a tendency of increasing quantity per area of peripheral arrayed compatible pads and solder bumps on a semiconductor chip, and also saves more space for layout of leads on the chip bottom surface so as to avoid potential short circuit in between which happens in increasing probability with increasing quantity per area on the condition of the lead and the solder bump. | 2009-04-23 |
20090102057 | SEMICONDUCTOR DEVICE - The semiconductor device according to the present invention includes a semiconductor layer, an interlayer dielectric film formed on the semiconductor layer, a wire formed on the interlayer dielectric film with a metallic material to have a width of not more than 0.4 μm, and a broad portion integrally formed on the wire to extend from the wire in the width direction thereof. | 2009-04-23 |
20090102058 | METHOD FOR FORMING A PLUG STRUCTURE AND RELATED PLUG STRUCTURE THEREOF - A method for forming a plug structure by utilizing a punching through process and the related plug structure are provided. An opening is defined in a substrate, and an unwanted oxide residue is disposed on a bottom of the opening. A glue layer is subsequently formed over the substrate. Portions of the glue layer are disposed on the sidewall and bottom of the opening, and cover the oxide. Thereafter, the portion of the first glue layer disposed at the bottom of the opening is punched through until the substrate is exposed so as to remove the oxide. Next, the opening is filled with a conductive structure. | 2009-04-23 |