Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees

Knowledge based (e.g., expert system)

Subclass of:

700 - Data processing: generic control systems or specific applications


700095000 - Product assembly or manufacturing

700097000 - Design or planning

700103000 - Constraints or rules

Patent class list (only not empty are listed)

Deeper subclasses:

20110184546METHOD AND APPARATUS FOR USING AERIAL IMAGE SENSITIVITY TO MODEL MASK ERRORS - One embodiment of the present invention provides techniques and systems for modeling mask errors based on aerial image sensitivity. During operation, the system can receive an uncalibrated process model which includes a mask error modeling term which is based at least on an aerial image sensitivity to mask modifications which represent mask errors. Next, the system can fit the uncalibrated process model using measured CD data. Note that the mask error modeling term can also be dependent on the local pattern density. In some embodiments, the mask error modeling term can include an edge bias term and a corner rounding term. The edge bias term can be based on the sensitivity of the aerial image intensity to an edge bias, and the corner rounding term can be based on the sensitivity of the aerial image intensity to a corner rounding adjustment.07-28-2011
20120179283MANAGING A PERFORMANCE OF SOLAR DEVICES THROUGHOUT AN END-TO-END MANUFACTURING PROCESS - The invention relates to managing performance of solar devices throughout a manufacturing process with multiple manufacturing steps. A method includes determining a plurality of key performance indicators for a solar device, determining a change behavior of each individual key performance indicator throughout manufacturing process steps, using a theoretical performance maximum of the solar device, comparing real performance of the solar device to the theoretical performance maximum, where the real performance is determined by key performance indicator changes throughout the entire manufacturing process resulting in a key performance indicator sensitivity matrix reflecting ultimate solar device performance, using the key performance indicator sensitivity matrix to improve each relevant manufacturing process step by modeling current manufacturing conditions to improve the key performance indicator, adapting the model in experimental manufacturing environment to match sensitivity curves between model and experiment, and using the model to calculate the performance of the solar devices.07-12-2012
20110202160METHODS AND APPARATUSES FOR UTILIZING ADAPTIVE PREDICTIVE ALGORITHMS AND DETERMINING WHEN TO USE THE ADAPTIVE PREDICTIVE ALGORITHMS FOR VIRTUAL METROLOGY - Described herein are methods, apparatuses, and systems for determining adaptive predictive algorithms for virtual metrology. In some embodiments, a computer implemented method identifies a plurality of predictive algorithms. The method determines when to use one or more of the plurality of predictive algorithms to predict one or more virtual metrology variables in a manufacturing facility.08-18-2011
20120191235INTELLIGENT OPTIMIZATION METHOD AND SYSTEM THEREFOR - A method and system of optimizing a complex manufacturing process performed to achieve one or more processing objectives for the process and/or a component produced by the process. The system includes a graphical user interface, a process module, and an optimization module. The process module includes a training module, an empirical relationships database, an analytical equations database, a heuristic knowledge database, and a process models database. The graphical user interface is used to input one or more processing variables and constraints for the processing objective. The training module generates empirical relationships from the processing variable and empirical data obtained from the manufacturing process. The process module generates a process model that takes into consideration heuristic knowledge of the manufacturing process, empirical relationships, and optionally analytical equations relating to the manufacturing process. The optimization module employs the process model to optimize the manufacturing process.07-26-2012
20090299512SEMICONDUCTOR MANUFACTURING SYSTEM AND METHOD - In the manufacturing system and the manufacturing method of a semiconductor device using a plasma treatment apparatus, a plasma treatment condition is controlled so that a desired shape is obtained after the plasma processing by using a processing shape prediction model for calculating the shape after the plasma processing from the inspection data of a wafer to be treated prior to the treatment and a response surface model for calculating the processing shape depending on a plasma treatment condition. In this configuration, the processing shape prediction model has an adjustable prediction model coefficient, and this prediction model coefficient is automatically calibrated.12-03-2009
20090292384MANUFACTURING INSTRUCTION EVALUATION SUPPORT SYSTEM, MANUFACTURING INSTRUCTION EVALUATION SUPPORT METHOD, AND MANUFACTURING INSTRUCTION EVALUATION SUPPORT PROGRAM - A manufacturing instruction evaluation support system includes a data reading part that reads a manufacturing instruction parameter group and manufacturing performance data corresponding thereto, a parameter sorting part that calculates a risk rate for each manufacturing instruction parameter configuring the manufacturing instruction parameter group and an average value of risk rates among the manufacturing instruction parameters to identify as available choices the manufacturing instruction parameters having the risk rates no greater than the average value, a parameter identifying part that calculates an explanatory variable selection reference value for the manufacturing instruction parameter group and the manufacturing instruction parameters of the available choices with the multiple regression analysis program to identify the manufacturing instruction parameter group or the manufacturing instruction parameters of the available choices having the greater calculated explanatory variable selection reference value as optimum parameters, and a regression equation calculating part that calculates and displays a regression equation when employing the optimum parameters with the multiple regression analysis program.11-26-2009
20130066456METHODS FOR MACHINE EMULATION AND PROCESS RESPONSE PREDICTION - Methods for generating predicted product values of a product produced by a machine and for predicting a process of a machine are disclosed. A method for generating predicted product values of a product manufactured by a machine controlled by programmable logic control code includes presenting a machine input fields requesting parameters associated with actuators and mechanical elements, and presenting product input fields requesting desired product properties. The method further includes receiving parameters from the machine input fields, receiving desired product properties from the product input fields, and calculating output response data by an emulation of a mechanical operation of the machine using the parameters and the desired product properties. The output response data is provided to a product model that calculates predicted product values based on the output response data provided. The method further includes presenting the one or more predicted product values.03-14-2013
20110022209METHOD AND SYSTEM FOR AUTOMATICALLY IDENTIFYING AN EXISTING WORKFLOW TO MANUFACTURE A GIVEN PRODUCT TYPE - A method and system for automatically identifying an existing workflow to manufacture a given product type. A workflow description of a workflow can be transformed into a product type description utilizing particular facts associated with the workflow. An inferred product type description can then be at least one product type among a group of product type descriptions representing known product types. A mapping can then be derived of the workflow with respect to product types, in response to comparing the inferred product type description to the product type description(s) among product type descriptions representing known product types. The workflow description can be converted into the product type description utilizing a rule-based expert system. The particular facts can be one or more of the following: processing steps, sequences of processing steps, types of operations to be performed, and outputs produced.01-27-2011
20110282478FINFET BOUNDARY OPTIMIZATION - A method for generating a layout for a semiconductor device is disclosed. The method includes: receiving a first layout. A portion of the first layout is defined as a first FinFET region. The first FinFET region has first and second sides that each extend approximately in a first direction. The method includes performing a first design rule check (DRC) simulation. The method includes obtaining a first DRC simulation result. The method includes defining a second FinFET region by moving the first side in a second direction perpendicular to the first direction. The method includes performing a second DRC simulation. The method includes obtaining a second DRC simulation result. The method includes selecting one of the first and second FinFET regions based on the first and second DRC simulation results. The method includes generating a second layout using the selected FinFET region.11-17-2011
20100174392OPTIMAL DIMENSIONAL AND MECHANICAL PROPERTIES OF LASER SINTERED HARDWARE BY THERMAL ANALYSIS AND PARAMETER OPTIMIZATION - A process for establishing manufacturing parameters includes computer simulating a manufacture of a laser-sintered part based on a set of manufacturing parameters, calculating a set of physical properties of the simulated manufacture, and modifying the set of manufacturing parameters based on the calculated set in order to obtain a desired set of physical properties.07-08-2010
20110301737INSTANT PRODUCTION PERFORMANCE IMPROVING METHOD - The invention discloses a real-time production performance improving method comprising a real-time monitoring step, a performance satisfaction determination step and a real-time performance improving step. The real-time monitoring step monitors an operation status of a production machine via a monitoring unit, records the monitored operation status into a database and determines whether the operation status of the production machine has changed. The performance satisfaction determination step determines whether the change in the operation status meets a required performance level. This involves the monitoring unit monitoring the at least one production machine to detect a next change in the operation status of the at least one production machine, and the performance satisfaction determination step determining whether the next change in the operation status meets the required performance level. The real-time performance improving step sends information illustrating the problem to an assigned task team.12-08-2011
20110301736APC Model Extension Using Existing APC Models - A method of extending advanced process control (APC) models includes constructing an APC model table including APC model parameters of a plurality of products and a plurality of work stations. The APC model table includes empty cells and cells filled with existing APC model parameters. Average APC model parameters of the existing APC model parameters are calculated, and filled into the empty cells as initial values. An iterative calculation is performed to update the empty cells with updated values.12-08-2011
20110288673Method for Machining Composite Components - The present disclosure relates to a method for machining composite components in a CNC controlled machining station. In accordance with the present disclosure, a machining tool is guided along a preset tool edge by means of a measuring system, wherein it simultaneously carries out the machining operation, while the CNC control program to control the machining tool is generated in accordance with the measured result. The present disclosure furthermore relates to an apparatus for the carrying out of the method.11-24-2011
20100222911MULTIVARIABLE MODEL PREDICTIVE CONTROL FOR COALBED GAS PRODUCTION - A multivariable model predictive controller (MPC) for controlling a coalbed methane (CBM) production process. The MPC includes input ports for receiving a plurality of measurement signals including measured process parameters from CBM wells in a well field. A control loop includes a mathematical model that controls the CBM gas production. The model includes individual production characteristics for each CBM well that predicts its behavior for controlled variables (CVs) with respect to changes in manipulated variables (MVs) and disturbance variables (DVs). The control loop calculates future set points for the MVs based on the model and the measured process parameters for CBM production to achieve at least one control objective for the well field. A plurality of output ports provide control signals for implementing the future set points which when coupled to physical process equipment at the plurality of CBM wells control the physical equipment to reach the future set points.09-02-2010
20120109353METHOD FOR MODELING A DEFECT MANAGEMENT ROUTINE IN A MANUFACTURING PROCESS AND FOR HANDLING THE DEFECT DURING THE PRODUCTION PROCESS BASED ON THE DEFECT MANAGEMENT ROUTINE - A method models a defect management routine. Both the modeling and a handling are executed within a manufacturing execution system. During an engineering phase: modeling the production process and creating a library of possible defect types which may occur; assigning the defect types to at least one defect group; creating a library of defect specifications; creating a library of defect type specification details; creating at least one runtime defect criteria that is used to link the defect type to a certain production volume; and creating a runtime defect measurement routine that monitors a corrective measure. During a runtime production phase evaluating the product produced; identifying the respective defect type out of the library of defect types; and using the identified defect type to determine a corrective measure, a runtime defect criteria identifying the resource causing the defect type, a production volume, and to run the respective runtime defect management routine.05-03-2012
20110288671EQUATION BASED RETARGETING OF DESIGN LAYOUTS - A method, system, and computer usable program product for equation based retargeting of design layouts are provided in the illustrative embodiments. A set of desirable combination of values of a set of layout parameters of the design layout is determined. A desirable region that includes the set of the desirable combination of values is determined. An equation is computed to determine a retargeting value for a first combination of values of the set of layout parameters with respect to the desirable region. Instructions are generated to adjust a value in the first combination to generate a second combination of values of the set of layout parameters such that the second combination falls in the desirable region. A shape in the design layout is retargeted such that the retargeted shape uses the second combination of values of the set of layout parameters. The IC is manufactured using the retargeted shape.11-24-2011
20110288672Computer-implemented automated design, modeling and manufacturing system for a project - A computer-implemented automated building mechanical systems design and modeling is described. The system provides a central source for all of the design and construction information for systems in a construction project in a coordinated two-dimensional and three-dimensional spatial database that is accessible as a means to produce automatically coordinated design development and construction document information of the mechanical systems. The system acquires and stores all of the appropriate design, engineering, and construction expertise information available for any building type for use in automatically assembling and coordinating the design, cost-estimating, and scheduling for the mechanical systems of the construction project. The system output model enables automatic generation of drawings and cost, manufacturing and scheduling information.11-24-2011
20110295403SIMULATION PARAMETER CORRECTION TECHNIQUE - A parameter correction method includes: obtaining, from a variability-aware simulation, a simulation result value of a predetermined product performance for a reference candidate value set concerning statistics of predetermined product characteristics; calculating a likelihood by substituting the reference candidate value set, the obtained simulation result value, statistics of measurement values of the predetermined product characteristics and a measurement value of the predetermined product performance into a likelihood function that is defined from a probability density function for the statistics of the predetermined product characteristics and a probability density function for the predetermined product performance, and is a function to calculate a combined likelihood of the statistics of the predetermined product characteristics and the predetermined product performance; and searching for a reference candidate value set in case where the calculated likelihood becomes maximum, by carrying out the obtaining and the calculating plural times while changing the reference candidate value set.12-01-2011
20110295406Method for Monitoring Sequencing of a Control Recipe for a Batch Process - A method for monitoring sequencing of a control recipe for a batch process, wherein the recipe comprises a plurality of recipe elements and is displayable on a display unit of a batch or operator system. In order to simplify the monitoring of the sequence of the control recipe a respective recipe-element-specific rule is created for each of the plurality of recipe elements, compliance with the respective recipe-element-specific rule is monitored for each of the plurality of recipe elements during run-time of the control recipe, each recipe element of the plurality of recipe elements is automatically classified into one of a plurality of problem levels if the respective recipe-element-specific rule for a respective recipe element of the plurality of recipe elements is not complied with, and recipe elements of the plurality of recipe elements that have been classified are displayed, together with the respective problem level, on the display unit in tabular form.12-01-2011
20110295405METHOD OF CALCULATING TEMPERATURE DISTRIBUTION OF CRUCIBLE - Provided is a method of calculating a temperature distribution with higher accuracy than a conventional method, which calculates a temperature distribution of an inner surface of a silica powder molded body during manufacturing based on boundary conditions corrected in accordance with the actually measured temperature in consideration of plasma radiation by arc discharge and heat radiation of arc discharge.12-01-2011
20110295404METHOD FOR CASTING USING SIMULATION OF CASTING PROCESS, SYSTEM FOR CASTING USING SIMULATION OF CASTING PROCESS AND DATA BASE - A method and a system for casting using simulation of casting process. The system includes at least a database (12-01-2011
20100100221Expert knowledge methods and systems for data analysis - A method for adjusting a data set defining a set of process runs, each process run having a set of data corresponding to a set of variables for a wafer processing operation is provided. A model derived from a data set is received. A new data set corresponding to one process run is received. The new data set is projected to the model. An outlier data point produced as a result of the projecting is identified. A variable corresponding to the one outlier data point is identified, the identified variable exhibiting a high contribution. A value for the variable from the new data set is identified. Whether the value for the variable is unimportant is determined. A normalized matrix of data is created, using random data and the variable that was determined to be unimportant from each of the new data set and the data set. The data set is updated with the normalized matrix of data.04-22-2010
20100100218Method for Controlling and/or Regulating an Industrial Process - The invention relates to a method for controlling and/or regulating an industrial process for producing or processing products, wherein a physicomathematical model of the industrial process is formed, with which control parameters for controlling or regulating the industrial process are calculated during the production or processing of the product, a number of measurement values is detected, and the model is corrected with a number of primary correction factors, the number of primary correction factors being equal to the number of measurement values. The method is characterized in that the model is corrected with a number of secondary correction factors, such as with a correction factor reflecting the speed of the phase conversion in the rolling mill to be cooled, and in that the number of all correction factors is greater than the number of all measurement values, wherein at least the secondary correction factors are calculated numerically.04-22-2010
20110264255Configuration Mapping Using A Multi-Dimensional Rule Space And Rule Consolidation - A configuration mapping system and method increase the effectiveness of mapping of information from an established product line to a new product offering. In at least one embodiment, the configuration mapping system herein uses configuration mapping rules to map individual product features and entire configurations from established products to a new product offering. The configuration mapping system also provides a way to appropriately map, for example, demand and sales information for the purpose of demand estimation and sales prediction. Conventionally, mapping can be ineffective because the configuration mapping rules usually focus on one part of the product at a time, and, if applied in isolation, the impact on other parts is missed. The systems and method herein provide a way to integrate configuration mapping rules across feature parts, time periods, and product lines into a unified, holistic view, allowing for new insights.10-27-2011
20100131092METHOD FOR ASSISTING AT LEAST PARTIALLY MANUAL CONTROL OF A METAL PROCESSING LINE - In a method for assisting at least partially manual control of a metal processing line (05-27-2010
20100121471LEARING METHOD OF ROLLING LOAD PREDICTION FOR HOT ROLLING - In the learning method of rolling load prediction in hot rolling, in the past the prediction error of the rolling load was corrected based on envisioned error factors, but in the complicated rolling phenomenon, there are many influential factors and therefore logical extraction and estimation had been difficult.05-13-2010
20100121472Remote High-Performance Computing Material Joining and Material Forming Modeling System and Method - A remote high-performance computing material joining and material forming modeling system (05-13-2010
20100100217Control System and Method for Controlled Object in Time Variant System With Dead Time, Such As Single Crystal Production Device by Czochralski Method - To accurately control controlled object in a time variant system with a dead time such as a Czochralski method single crystal production device (CZ equipment). The dead time, the time constant, and the process gain value of a controlled object (CZ equipment) (04-22-2010
20100100219FABRICATION SYSTEM OF SEMICONDUCTOR INTEGRATED CIRCUIT, FABRICATION DEVICE, FABRICATION METHOD, INTEGRATED CIRCUIT AND COMMUNICATION SYSTEM - A manufacturing system which can restrain the margin of a semiconductor integrated circuit.04-22-2010
20120296462NUMERICAL CONTROLLER WITH MACHINING TIME PREDICTION UNIT AND MACHINING ERROR PREDICTION UNIT - In connection with a machining program used in machining a workpiece by means of a machine tool controlled by a numerical controller, interpolation data, a command position point sequence, and a servo position point sequence for each processing period are determined by simulation by designating speed data for giving a machining speed and precision data for giving a machining precision. A predicted machining time for workpiece machining is determined based on the determined interpolation data, and a predicted machining error for workpiece machining is determined based on the determined command and servo position point sequences. Further, the precision data and the speed data are determined for the shortest predicted machining time within a preset machining error tolerance, based on a plurality of predicted machining times and a plurality of predicted machining errors.11-22-2012
20110270430METHOD FOR OPTIMIZING VALUE OF WOOD PRODUCTS DRIED IN A DRYING PROCESS - The present disclosure includes a method for optimizing value of current wood products dried in one or more current drying processes and associated computer software. The method comprises the steps of obtaining prior wood product data for prior wood products dried in one or more prior drying processes and generating a value function based on the prior wood product data. The method further includes identifying one or more sources of variability in the prior wood product data and quantifying a contribution to overall variability from each of the sources. The value function and the contributions to overall variability may be used to quantify one or more value opportunities associated with each the one or more sources, each value opportunity being associated with one or more executable steps for improving the one or more current drying processes.11-03-2011
20100145493PROCESS AUTOMATION SYSTEM FOR DETERMINING, MONITORING AND/OR INFLUENCING DIFFERENT PROCESS VARIABLES AND/OR STATE VARIABLES - A process automation system for determining, monitoring and/or influencing different process variables and/or state variables in at least one manufacturing or analytical process. Included is: at least one control station; and a plurality of field devices; wherein in each field device at least one sensor is provided for ascertaining a measured value of a process variable and/or state variable and/or an actuator is provided for influencing a process variable and/or state variable by means of an actuating value. Each field device makes available its cyclically or acyclically ascertained, measuring-device-specific, measured values and/or actuating values of the process variable and/or state variable to every other field device of the process automation system as information, and the current information of all ascertained measured values and/or actuating values of the process variables and/or state variables is available to each field device as a current process-state-vector.06-10-2010
20100138026METHOD AND APPARATUS FOR SELF-LEARNING AND SELF-IMPROVING A SEMICONDUCTOR MANUFACTURING TOOL - System(s) and method(s) for optimizing performance of a manufacturing tool are provided. Optimization relies on recipe drifting and generation of knowledge that capture relationships among product output metrics and input material measurement(s) and recipe parameters. Optimized recipe parameters are extracted from a basis of learned functions that predict output metrics for a current state of the manufacturing tool and measurements of input material(s). Drifting and learning are related and lead to dynamic optimization of tool performance, which enables optimized output from the manufacturing tool as the operation conditions of the tool changes. Features of recipe drifting and associated learning can be autonomously or externally configured through suitable user interfaces, which also can be drifted to optimize end-user interaction.06-03-2010
20100138024METHOD FOR PREPARING CHOCOLATES AND/OR CHOCOLATE-/COCOA-FLAVORED COMPOSITIONS - The invention relates to a computer-aided method for preparing chocolates and/or chocolate-/cocoa-flavoured compositions from a bank of ingredients P06-03-2010
20110208340METHOD FOR OPTIMISING THE LIFE CYCLE OF MEASUREMENT DATA BASED ON THE RETROACTION DURING ASSEMBLING PROCESSES WHILST BEING PRODUCED - A method for feedback-based optimisation of a measurement data life cycle in joining processes during production, comprising the following steps: 08-25-2011
20100138025ORTHODONTIC SYSTEMS AND METHODS INCLUDING PARAMETRIC ATTACHMENTS - Orthodontic systems and related methods are disclosed for designing and providing improved or more effective tooth moving systems for eliciting a desired tooth movement and/or repositioning teeth into a desired arrangement. Methods and orthodontic systems of the invention include tooth attachments having improved or optimized parameters selected or modified for more optimal and/or effective application of forces for a desired/selected orthodontic movement. Attachments of the present invention can be customized to a particular patient (e.g., patient-customized), a particular movement, and/or a sub-group or sub-set of patients, and configured to engage an orthodontic tooth positioning appliance worn by a patient, where engagement between the attachment and orthodontic appliance results in application of a repositioning force or series/system of forces to the tooth having the attachment and will generally elicit a tooth movement.06-03-2010
20100274379METHOD FOR THE INTERACTIVE CONTROL OF A MACHINE - The invention relates to a method for the interactive control of a machine (10-28-2010
20110208341METHOD AND SYSTEM FOR CONTROLLING AN INDUSTRIAL PROCESS - A control system for controlling an industrial process includes an indicator generator configured to determine at least one fuzzy logic based indicator from measured process variables. The control system also includes a state estimator configured to determine estimated physical process states based on the fuzzy indicator. For controlling the industrial process, the process controller is configured to calculate manipulated variables based on (i) defined set-points and (ii) a physical model of the process using the estimated physical process states. Combining a fuzzy logic indicator with a model based process controller provides robust indicators of the process states for controlling an industrial process in a real plant situation in which measured process variables may possibly contradict each other.08-25-2011
20090138115INTELLIGENT OPTIMIZATION METHOD AND SYSTEM THEREFOR - A method and system of optimizing a complex manufacturing process performed by an apparatus on a subject to achieve at least one processing objective. The system includes a graphical user interface, a process module, and an optimization module. The process module includes a training module, an empirical relationships database, an analytical equations database, a heuristic knowledge database, and a process models database. The graphical user interface is used to input at least one processing variable and constraints for the processing objective of the complex manufacturing process. The training module generates empirical relationships from the processing variable and empirical data obtained from the complex manufacturing process. The process module generates a process model that takes into consideration heuristic knowledge of the complex manufacturing process stored in the heuristic knowledge database, empirical relationships stored in the empirical relationships database, and optionally analytical equations stored in the analytical equations database and relating to the complex manufacturing process. The optimization module employs the process model to optimize the complex manufacturing process.05-28-2009
20110224817AUTOMATICALLY SOLVING A TRUCK CONFIGURATION PROBLEM - A truck configuration satisfying a truck configuration problem is automatically determined. The truck configuration problem is transformed to a target function, outputting values indicative of configurations satisfying the truck configuration problem. Stochastic local search methods are applied on the target function to determine the truck configuration. Preprocessing may be performed to improve efficiency, performance or the like of the stochastic local search methods. The truck configuration problem may be obtained from several sources, which may be independent of one another.09-15-2011
20090082893METHOD FOR CONSISTENT UPDATES TO AUTOMATED PROCESS CONTROL (APC) MODELS WITH PARTITIONING ALONG MULTIPLE COMPONENTS - Methods for consistent updates to APC models with partitioning along multiple components are generally described. In one example, a method includes acquiring measurement data from one or more semiconductor wafers of a processed first lot, the data having a plurality of contexts, applying a model having parameters with partitioning along the contexts to the measurement data; and applying a constraint on a subset of the model parameters such that the subset remains centered around zero to provide consistent updates for automated process control of lots processed after the first lot.03-26-2009
20120078407PROCESS SCHEDULING SYSTEM, METHOD, AND PROGRAM - System, method and computer program product for combined scheduling of two different slab sequences by a rational technique. A two-dimensional grid graph having a direct slab sequence as a first dimension and an inventory slab sequence as a second dimension is prepared by processing of a computer as a data structure represented on a memory or a hard disk drive of the computer. A processing program of the computer generates two child nodes corresponding to a direct slab and an inventory slab, in each node of the two-dimensional graph according to a predetermined algorithm. By defining an appropriate weighting function, the processing program of the computer weights edges between nodes in the two-dimensional grid graph. After forming the weighted graph on a storage device of the computer such as the memory or the hard disk drive, the processing program of the computer calculates a path from a start point to an end point as a shortest path search problem.03-29-2012
20110029117ION IMPLANTER, ION IMPLANTATION METHOD AND PROGRAM - The ion implanter includes lens elements that arrange unit lens elements along a direction of a beam width of a ribbon ion beam and regulate a magnetic field or electric field to be created by each unit lens element in order to regulate a current density distribution of the ion beam, and a controlling portion that sets the intensity of the magnetic field or electric field to be created by the unit lens element to be regulated by the lens elements in accordance with the measured current density distribution. The regulation intensity of the magnetic field or electric field to be created by the unit lens element that corresponds to a position to be regulated in the unit lens elements of the lens elements is determined from the measured current density distribution and a value obtained by multiplying the determined regulation intensity by a fixed ratio is determined as the regulation intensity of the magnetic field or electric field for the magnetic field or electric field to be created by a unit lens element adjacent to the unit lens element.02-03-2011
20090222123Method and system for scheduling a set of events in real time - A method and system for generating/regenerating a schedule of a set of events associated with at least one process in a manufacturing plant in real time. The schedule is generated/regenerated on the basis of the occurrence of one or more events associated with various processes in real time. The occurrence of each of the events is monitored continuously. Thereafter, the occurrence of the monitored events is predicted for one or more predefined instances of time. The schedule is optimized on the basis of the predicted occurrences of the monitored events to generate/regenerate the schedule. The optimized schedule may be used to control one or more automatons.09-03-2009
20100274380Virtual Machine Manager - Systems and methods for virtual machine management are disclosed. A virtual machine manager may communicate with a storehouse, which may include one or more virtual machines. The virtual machine manager may select one or more virtual machines, or may create one or more virtual machines, depending on the requirements of an input.10-28-2010
20100152875ESTIMATION APPARATUS AND ESTIMATION METHOD - An estimation apparatus for estimating a formation of a plurality of wiring layers for an integrated circuit to be manufactured by laminating the wiring layers each formed through a deposition process of a wiring material on a substrate and subsequently polishing the deposited wiring material, the apparatus includes a deposition estimator, a polishing estimator, and an adjuster. The apparatus includes an optimizer configured to optimize distribution of the height of the wiring material for each of the wiring layers within an acceptable range by controlling the adjuster to generate various combinations of adjusted patterns of the wiring layers and by controlling the deposition estimator and the polishing estimator to perform estimation of distribution of deposition height of the wiring material and distribution of the wiring material to be remained after polishing for each of the wiring layers, respectively, for each of the combinations of the adjusted patterns.06-17-2010
20100161099Optimization Method and a Lithographic Cell - Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.06-24-2010
20100185312SYSTEM FOR EVALUATING MANUFACTURABILITY OF A CASTING DESIGN - A system for evaluating a manufacturability of a casting design. The system includes at least one of a geometry analyzer, a casting evaluation tool, a residual stress evaluation tool, and a machining evaluation tool. The geometry analyzer analyzes a geometric design of the casting design to determine its geometric design-ability, the casting evaluation tool evaluates the casting design to determine its cast-ability, the residual stress evaluation tool evaluates the casting design to determine its heat treat-ability, and the machining evaluation tool evaluates the casting design to determine a machine-ability of the casting design. If the casting design is determined as not geometrically design-able, not cast-able, not heat treat-able, or not machine-able by the geometry analyzer, the casting evaluation tool, the residual stress evaluation tool, or the machining evaluation tool, respectively, then modifications to the casting design are recommended to optimize the casting design for manufacturing.07-22-2010
20100191361Controlling a Manufacturing Process with a Multivariate Model - A method, controller, and system for controlling a manufacturing process (batch-type or continuous-type) with a multivariate model are described. Dependent variable data and manipulated variable data are received. Dependent variable data represents values of uncontrolled process parameters from a plurality of sensors. Manipulated variable data represents controlled or setpoint values of controllable process parameters of a plurality of process tools. A predicted operational value, multivariate statistic, or both are determined based on the received data, and operating parameters of the manufacturing process are determined based on the predicted score, multivariate statistic, or both.07-29-2010
20120197425PRODUCTION SYSTEM CONTROL MODEL UPDATING USING CLOSED LOOP DESIGN OF EXPERIMENTS - Methods and production control systems are presented in which design of experiments are performed in situ and produce model parameter estimates that relate actuator set points to any number of response variables, and the model is periodically updated based on these designed experiments and used as the basis for determining actuator set points.08-02-2012
20100217421Industrial Production Process and Production Tool - An industrial production method and corresponding production equipment is specified, wherein, for providing the resources and/or energy needed, a load variation y(t) with time is forecast in an automated manner starting with expected environmental and planned production parameters. In at least one embodiment of this process, a forecast for the load variation y(t) with time is generated by linear interpolation in a manner which is clear for the user from parameter sets (p08-26-2010
20120035757IMPROVEMENT OF TIRE UNIFORMITY THROUGH IDENTIFICATION OF PROCESS SIGNATURES - A system and related method for improving tire uniformity includes providing a number (n) of test tires manufactured in a known order and identifying at least one candidate cyclic process effect with a corresponding frequency of introduction (f). A given uniformity parameter, such as radial or lateral run-out, balance, mass variation, radial lateral or tangential force variation, is measured for each tire in the test set, and measured data points are combined into a concatenated composite waveform. At least one process harmonic associated with each identified cyclic process effect is separated from the tire harmonics, for example, by Fourier transformation with identification of the process harmonics as positive integer multiples of the mth harmonic of the measured uniformity parameter where m=n/f. Once the process harmonics are extracted, filtered uniformity measurements can be provided or new tires can be built with the process effect minimized.02-09-2012
20100211204METHOD AND SYSTEM FOR ROBOTIC ASSEMBLY PARAMETER OPTIMIZATION - A method and system to optimize the parameters of a robot used in an assembly process. The assembly process is categorized based on its nature which may be cylindrical, radial and multi-stage insertion. The search pattern and search parameters are specified. The parameters are optimized and the optimized parameter set are verified and when a predetermined criteria such as assembly cycle time set and/or success rate is met the optimization process stops. When the optimization stops the verified parameters are used to cause the robot to perform the categorized assembly process. If the parameters do not meet the predetermined criteria, another round of optimization using the same or other parameters can be performed.08-19-2010
20100100220ARRANGEMENT FOR GUIDING USER DESIGN OF COMPREHENSIVE PRODUCT SOLUTION USING ON-THE-FLY DATA VALIDATION - A computer-implemented method guides a user in designing a product defined by data. The method involves examining (04-22-2010
20090276073INTELLIGENT MODELING AND CONTROL OF AUTOMATION - A system and method for advanced device specific knowledge based modeling as well as intelligent control to yield high performance, low cost automation for optoelectronic design, packaging and assembly. The control loop design is based on knowledge based model predictive control. A knowledge model, specific to the assembled package's characteristics, is used to set the initial “feed-forward” conditions of an automation system. In addition to this feed-forward model for setting the initial set point, the controller is designed with feedback components, along with the inclusion of a built in sensor. This system and method increases the efficiency of the automation process and the number of assembly steps can be greatly reduced. A method for the design, assembly and packaging of optoelectronic devices is also described.11-05-2009
20120123578MARKET OPTIMIZATION OF LIQUEFIED NATURAL GAS PROCESS - A method includes controlling a process control system for coordinating the operation of a liquefied natural gas (LNG) process.05-17-2012
20110245954System and Method for Optimizing Machining Simulation - Embodiments of the invention disclose a method for optimizing a simulation of a machining of a workpiece performed by removing a set of swept volumes from a volume of the workpiece, wherein the volume is partitioned into a set of cells, comprising the steps of: associating with each cell a subset of distance fields representing a subset of swept volumes intersecting with the cell, wherein at least part of the subset of swept volumes forms a composite surface of the cell; subjecting the cell with a set of rays incident to the cell from at least one direction; and selecting a distance field of the subset of distance fields into an optimal subset associated with the cell, wherein a boundary of the swept volume represented by the distance field intersects with at least one ray at a point of intersection lying on the composite surface.10-06-2011
20110245955AUTOMATED PROCESS CONTROL USING AN ADJUSTED METROLOGY OUTPUT SIGNAL - Provided is a method for controlling a fabrication cluster using an optical metrology system that includes an optical metrology tool, an optical metrology model, and a profile extraction algorithm. The method comprises: selecting a number of rays for the illumination beam, selecting beam propagation parameters, using a processor, determining beam propagation parameters from the light source of the to the sample structure, determining the beam propagation parameters from the sample structure to the detector, calculating intensity and polarization of each ray on the detector, generating a total intensity and polarization of the diffraction beam, calculating a metrology output signal from the total intensity and polarization, extracting the one or more profile parameters using the metrology output signal, transmitting at least one profile parameter to a fabrication cluster, and adjusting at least one process parameter or equipment setting of the fabrication cluster.10-06-2011
20110087357SYSTEM, METHOD, AND INTERFACE FOR VIRTUAL COMMISSIONING OF PRESS LINES - A system, method, machine-readable medium for accurate simulation of automated machinery. A method includes loading a machine operating model. The method also includes receiving machine-specific data from an automated machinery controller. The method also includes simulating a machine operation using the machine-specific data and the machine operating model to produce optimized motion data. The method includes transmitting the optimized data to the automated machinery controller by the simulation data processing system.04-14-2011
20110178624RULE-BASED ROOT CAUSE AND ALIAS ANALYSIS FOR SEMICONDUCTOR MANUFACTURING - The present invention includes a computing system determining a best alias rule in a semiconductor manufacturing process. The computing system obtains an original rule and candidate alias rules based on sampled data from the semiconductor manufacturing process. The computing system compares the original rule to the candidate alias rules. The computing system ranks the candidate alias rules according to the comparison. The computing system filters the ranked candidate alias rules. A user selects one rule among the filtered candidate alias rules based on knowledge of the semiconductor manufacturing process.07-21-2011
20110178623PAD LAYOUT METHOD FOR SURFACE MOUNT CIRCUIT BOARD AND SURFACE MOUNT CIRCUIT BOARD THEREOF - A pad layout method for surface mount circuit board and a surface mount circuit board are described. The layout method includes the following steps. Firstly, coefficients of thermal expansion of a circuit board and a surface mounted component are obtained, and the circuit board is supplied with a plurality of predetermined layout positions in advance. Then, an operating temperature for combining the surface mounted component with the circuit board is determined, and a room temperature is measured. A plurality of actual layout positions on the circuit board is determined according to d=(CTEa−CTEb)×(Ts−Tr), where d is an offset distance between the actual layout position and the predetermined layout position. Finally, a plurality of pads is laid out on the actual layout positions, such that the pads are formed on the circuit board.07-21-2011
20100070065METHOD TO PROVIDE A PROGNOSIS OF THE SURFACE TOPOGRAPHY OF TISSUE PAPER - A method of surface topography prognosis for a tissue paper which is to be produced in a manufacturing process by utilizing a structured fabric and into which a structure is embossed by way of the fabric, the surface topography of at least one structured fabric which is already used in the production process is plotted by way of a sensor. Originating from the surface topography of the already utilized structured fabric, the surface topography of the tissue paper is simulated through data processing, through a simulation of the paper production process. The algorithm used for the simulation is calibrated with the aid of a comparison of the simulated surface topography of the tissue paper with the surface topography of the actual tissue paper produced with the structured fabric, which is already being utilized in the production process. Originating from the surface topography of a respective additional structured fabric the simulation of the surface topography of the tissue paper is subsequently conducted by utilizing the calibrated algorithm in order to provide a prognosis of the tissue paper's surface topography that can be expected.03-18-2010
20110071660Method For Controlling The Transfer Of Materials - A method for controlling an amount of material transferred in a system having a plurality of material feeds and concurrent material transfer periods. The method comprising steps of: supplying each of a primary material having a target weight and a secondary material, to a receiving vessel; determining a decision threshold; feeding the primary material to the receiving vessel, feeding the secondary material into the receiving vessel as or after the primary material begins feeding and before the decision threshold, determining a feed status of the primary and secondary materials at the decision threshold; changing the feed status of one of the primary or secondary materials at the decision threshold; and feeding only the primary material within a feed alone time period until the target weight amount is fed.03-24-2011
20110060443SCHEDULING MODELING SYSTEM FOR ADAPTIVE, AUTOMATED DATA COLLECTION AND PERFORMANCE ANALYSIS OF MANUFACTURING SYSTEM FOR OPTIMAL SCHEDULING - A scheduler system obtains a basic model of a manufacturing process for the production of one or more products. The basic model is based on a first set of data collected at a point in time from a plurality of tools used to manufacture the one or more products. The system incorporates a second set of data, which is collected from the plurality of tools after the first set of data, into the basic model to generate a comprehensive model of the manufacturing process. The second set of data reflects a current state of a factory. The system evaluates a plurality of scheduling policies using the comprehensive model and selects an optimal scheduling policy from the plurality of scheduling policies based on the comprehensive process model evaluation to achieve a manufacturing objective.03-10-2011
20120072000MODELLING OF A PROPERTY OF PAPER, PAPERBOARD OR BOARD - Properties of an end product, such as paper, paperboard or board, are important for the user of the end product. To be able to manufacture an end product of desired quality, it is important to know what kind of paper pulp used for manufacturing the end product results in a particular kind of property of the end product. Embodiments provide a method and an apparatus for generating a model, which model connects at least one property of the end product with at least one property of the paper pulp. On the basis of the model, also the manufacturing process can be controlled.03-22-2012
20120123580MES WITH EMBEDDED REPEATABLE SEGMENT REQUIREMENTS - A manufacturing executing system (MES) contains computing devices and software tools to control machines involved in a production process. The MES is configured to realize production requirements having at least one segment requirement. The MES further contains measures for a user to define whether a segment requirement is repeatable, and a database configured to store segment requirements. The database contains for each segment requirement: a dedicated area to store each segment requirement repeatability status; a dedicated area to store at least a current value of a parameter acquired during an execution of the segment requirement and representing the result of the execution of the segment requirement; and a dedicated area to store expected values of the parameter. Finally, the MES contains a coordinator operable to communicate with the database to access the segment requirement, and operable to determine whether the execution of a segment requirement has to be repeated.05-17-2012
20110153054AUTOMATED OPTICAL LENS PROCESSING SYSTEM, SUCH AS A SYSTEM FOR PROVIDING SUPPLEMENTAL INFORMATION TO LABORATORY TECHNICIANS - An electronic lens processing system receives a lens prescription and performs lens calculations to create a work ticket for manufacturing the lens. Information that the system used to create the work ticket, such as data files for lens materials and machine settings for controlling lens manufacturing equipment, are stored. The work ticket includes a form that specifies work ticket calculations and/or a graphic of the lens or lenses to be manufactured. The system displays the work ticket on an electronic screen, and a laboratory technician can select elements from the work ticket to receive supplemental information on those elements to aid in processing the lens or determining why a lens prescription is not manufacturable.06-23-2011
20110257778METHOD AND DEVICE FOR SIMULATING NC WORKING MACHINE - Even in an uncuttable state in which an actual rotational direction of a main spindle is not matched with an actually cuttable main spindle rotational direction of a tool, an interference check between a workpiece and the tool is performed. Accordingly, the cuttable main spindle rotational direction of the selected tool or the uncuttable main spindle rotational direction is compared with each main spindle rotational direction of a working machine during execution of a simulation, and it is determined whether an interference check between the tool blade edge and the workpiece is necessary on the basis of the comparison result. When it is determined that the interference check is not necessary in the step above, the interference check between the tool blade edge and the workpiece is not performed. When it is determined that the interference check is necessary, the interference check between the tool blade edge and the workpiece is performed. When the interference therebetween is present, abnormality is detected.10-20-2011
20110022210PROCESS FOR SELECTING SURROGATE PART - A process for selecting a surrogate part for metallic plating, the metallic plating of the surrogate part predicting results for the metallic plating of a new or predetermined part is disclosed. The process can include providing a reinforcement learning system having a memory circuitry and a processing circuitry. The memory circuitry can have a database with data associated with a plurality of surrogate parts and data associated with the predetermined part can be entered into the data input module. The processing circuitry can compare the data associated with each of the plurality of surrogate parts and the data associated with the predetermined part and select a surrogate part that affords predicting a plating result of the predetermined part.01-27-2011
20100179679Generating Cutting Forms Along Current Flow Direction In A Circuit Layout - Metal is deleted from portions of metal wires in an integrated circuit layout, based upon a width of the metal wires. Preliminary cutting forms having a length and a width are inserted with a first orientation in the portions of metal wire. It is determined if the width of each of the preliminary cutting forms is parallel to a width of the metal wire portions where the preliminary cutting forms are inserted. If the preliminary cutting forms have width parallel to the width of the metal wire portion, the preliminary cutting forms become part of a cutting form final layout. Cutting forms not having widths parallel to the width of the metal wire portions are removed. Cutting forms at different orientations are then inserted where the prior cutting forms were removed from and the process repeats until all portions of the metal wire have cutting forms inserted parallel to the current flow direction.07-15-2010
20100121473System and method for optimizing lignocellulosic granular matter refining - A system and method for optimizing a process for refining lignocellulosic granular matter such as wood chips use a predictive model including a simulation model based on relations involving a plurality of matter properties characterizing the matter such as moisture content, density, light reflection or granular matter size, refining process operating parameters such as transfer screw speed, dilution flow, hydraulic pressure, plate gaps, or retention delays, at least one output controlled to a target such as primary motor load or pulp freeness, and at least one uncontrolled output such as specific energy consumption, energy split, long fibers, fines and shives. An adaptor is fed with measured values of matter properties and measured values of controlled and uncontrolled outputs, to adapt the simulation model accordingly. An optimizer generates a value of the target according to a predetermined condition on a predicted uncontrolled output parameter and to one or more process constraints.05-13-2010
20100121474Method and System for Enhancing the Yield In Semiconductor Manufacturing - Roughly described, a manufacturing process is enhanced by using TCAD and TCAD-derived models. A TCAD simulation model of the process is developed, which predicts, in dependence upon a plurality of process input parameters, a value for a performance parameter of a product to be manufactured using the process. Estimated, predicted or desired values for a calculated subset of the parameters (including either process input parameters or product performance parameters or both), are determined in dependence upon the process model, and further in dependence upon actual, estimated or desired values for a different subset of the parameters (again either process input parameters or product performance parameters or both). The determination is preferably made using a process compact model of the process, itself developed in dependence upon the simulation model.05-13-2010
20100082142Simulation System and Method - A method and system are described that enhance the computational simulation, such as a fluid flowing through a porous media, under the present techniques. In particular, a computer implemented simulation method is described that includes initializing a simulator and utilizing an intelligent performance assistant to select a set of parameters and algorithms for the simulator. Then, equations are solved with the set of parameters and algorithms and the solution to the equations is then obtained.04-01-2010
20100030358AUTOMATIC WIRING APPARATUS, AUTOMATIC WIRING METHOD, AUTOMATIC WIRING PROGRAM AND COMPUTER-READABLE RECORDING MEDIUM ON WHICH THE PROGRAM IS RECORDED - In order to make it possible to automatically execute a wiring process which satisfies not only a design condition but also design quality relating to an electric characteristic, according to the embodiment, an automatic wiring apparatus includes a design condition changing section for changing a design condition in accordance with priority information regarding the design condition where a wiring process which satisfies the design condition cannot be carried out by a first wiring processing section, a quality allowability decision section for deciding whether or not quality of a wiring region can be allowed where a wiring process which satisfies the design condition after the changing can be executed by a second wiring processing section and an outputting section for outputting a result of the wiring process of the wiring region by the second wiring processing section if it is decided that the quality of the wiring region can be allowed.02-04-2010
20110307090Tolerance analyzing apparatus, designing apparatus, viewer apparatus, and assembly order converting method - A tolerance analyzing apparatus for performing a tolerance analysis based on design data includes an assembly definition unit that allows a user to make an assembly definition and define a degree of freedom for a constituent component, and a determination unit determining a datum type corresponding to a count value based on a datum determination reference table. The determination unit obtains the count value by counting a number of normals having the same direction at an assembly location of the constituent component, a constrained degree of translational freedom in the normal direction, and a constrained degree of rotational freedom about an axis perpendicular to the normal based on the assembly definition and the degree of freedom of the constituent component. The apparatus also includes an output unit that outputs the datum type determined by the determination unit.12-15-2011
20110137445TUNING ORDER CONFIGURATOR PERFORMANCE BY DYNAMIC INTEGRATION OF MANUFACTURING AND FIELD FEEDBACK - A novel and non-obvious method, system and apparatus for tuning order configurator performance by dynamic integration of manufacturing and field feedback information. A method for dynamically tuning order configurator behavior by using product issue data can include collecting product issue data for a manufactured product, the product issue data including performance and attribute information of a part of the manufactured product, analyzing the collected product issue data to identify a problematic part, and, modifying the order configurator using the analyzed product issue data.06-09-2011
20120150330METHOD OF CONTROLLING SEMICONDUCTOR PROCESS DISTRIBUTION - A method of controlling process distribution of a semiconductor process includes receiving process distribution data representing the process distribution of the semiconductor process, receiving a parameter related to the process distribution, generating a virtual metrology model corresponding to the process distribution based on a relationship between the process distribution data and the parameter, and modifying a process variable affecting the process distribution based on the virtual metrology model.06-14-2012
20120046775METHOD FOR ENHANCING WAFER EXPOSURE EFFECTIVENESS AND EFFICIENCY - The present invention applies the data mining methodology by which the wafer exposure effectiveness and efficiency are predictable in terms of the chip size, chip length and chip width. More specifically, in the present invention, an index, named “Mask-field-utilization weighted Overall Wafer Effectiveness” (MOWE), integrates the two parameters of “Overall Wafer Effectiveness” (OWE) and “Mask-Field-Utilization” (MFU), mainly regarding the wafer exposure effectiveness and efficiency respectively, in order to construct a model tree of the MOWE to achieve the data mining. By the MOWE model tree, the causal relationship between design independent variables and fabrication dependent variables is constructed, which can be accordingly applied as design guidelines in the design phase to improve the chip layout in order to produce a better wafer exposure effectiveness and efficiency.02-23-2012
20120004756Control of an Expanded Drying Section of a Paper Machine - In order to achieve an improved or optimized operation mode of an “expanded drying section” of a paper machine—having the “actual” drying section, separated, if applicable, into pre-drying and post-drying sections with a size press located therebetween, a steam and condensate system, an exhaust air heat recovery system, a wet press and the white water—a model that includes the above system components is proposed, with which mass and energy balances for the system components as well as the specific energy consumption of the drying section are calculated, based on values for parameters relevant for the drying process.01-05-2012
20120004755CONTROLLING THE COOLING OF FERMENTERS OF A BIOFUEL PRODUCTION PLANT - According to various embodiments, a biofuel production system includes a plurality of parallel-operated fermenters, a cooling tower water system configured to supply cooling water to the plurality of parallel-operated fermenters, a chiller water system configured to supply chiller water to the plurality of parallel-operated fermenters, and a cooling system coupled to the plurality of parallel-operated fermenters, the cooling tower water system, and the chiller water system. The cooling system controls the flow rates of the cooling water and the chiller water to the plurality of parallel-operated fermenters based upon temperatures of fermentation products of the fermenters.01-05-2012
20120004757OPTIMIZATION DEVICE - A certain embodiment includes a setting calculator (01-05-2012
20110166688YIELD PREDICTION FEEDBACK FOR CONTROLLING AN EQUIPMENT ENGINEERING SYSTEM - A yield prediction is received by a run-to-run controller that includes an intra-process run-to-run control module that specifies process performance targets, wherein the yield prediction is associated with at least one of a manufacturing tool, a product or a process. The run-to-run control module adjusts first parameters associated with intra-process run-to-run control based on the yield prediction, wherein the first parameters include processing parameters of a process recipe.07-07-2011
20110166687METHOD FOR DETERMINING THE PRODUCTION PARAMETERS FOR A SUBSTRATE COATING PROCESS - A method to evaluate, determine and optimize production parameters for a coating application of a UV cationic polymerizable coating system to a substrate is provided. The method is based on a simulation model which includes both shadow and dark cure processes. Both of an active center generation process and the active center diffusion process are mathematically described. In the model, the two processes are considered separately since they are driven by different fundamental phenomena and occur on different timescales. Evaluation or prediction of the effect of process variables on the curing of a cationic coating of a complex substrate according to the described method allows characterization and understanding of process variables which may save set-up costs and improve production efficiency.07-07-2011
20110166686AUTOMATED SENSITIVITY DEFINITION AND CALIBRATION FOR DESIGN FOR MANUFACTURING TOOLS - A method of automatic calibration of a design for manufacturing (DfM) simulation tool includes providing, as a first input, one or more defined rules for each of one or more semiconductor device levels to be simulated by the tool, and providing, as a second input, a plurality of defined feature size threshold ranges and increments for use in histogram generation of a number of failures with respect to a reference circuit; providing, as a third input, the reference circuit; executing the defined rules for the semiconductor device levels to be simulated, and outputting a fail count for the reference circuit at each defined threshold value, thereby generating histogram data of fail count versus threshold for the reference circuit; and providing, as a fourth input, a defined fail count metric, thereby calibrating the DfM tool for use with respect to a target circuit.07-07-2011
20120016507PROCESSING SIMULATION METHOD AND APPARATUS, AND PROGRAM MAKING COMPUTER EXECUTE THE METHOD - A processing simulation method and apparatus is provided, which can appropriately detect interference between a tool processing area and a shape model of a material without being affected by the accuracy of expression of a tool movement path and the shape model. A tool shape model for processing a material, that includes a strict tool shape, and a tool shape model for checking interference, that is included in the strict tool shape, are generated by tool model setting unit according to an error range set in consideration of the tool movement path and the expression accuracy of the shape model, and the processed material shape model is generated by generating a tool processing area shape model from the tool movement path during processing feed and the tool shape model for processing the material and removing the tool processing area shape model from the material shape model. The tool processing area shape model is generated from a tool movement path during fast feed and the tool shape model for detecting the interference, and the interference between the tool processing area shape model and the material shape model is detected.01-19-2012
20120022678LINEAR FRICTION WELDING OF AN AEROFOIL BLISK - A method of making an aerofoil blink comprising a plurality of aerofoil blades joined to a disc to extend radially outwardly therefrom is provided, The method includes the step of: (a) modelling a linear friction welding process in which a blade member is joined to the disc, the blade member having a stub for joining to the disc, wherein the modelling provides results which are indicative of the welding power at positions along the stub during the welding process; (b) identifying adaptations to the stub using the modelling results to compensate for differences in welding power along the stub during the welding process; (c) providing a blade member having a stub with the identified adaptations; and (d) joining the provided blade member to the disc by the linear friction welding process.01-26-2012
20110098837Automated hierarchical configuration of custom products with complex geometries: method and apparatus - The present invention is a method and apparatus for automatically generating an optimal configuration of a product having a complex design, using logic implemented on digital computer processing system. A general configuration for the product will be broken down into a hierarchy of subdesigns by a designer of an artifact type, such as a bus. A particular instance of the product type must satisfy a set of external parametric constraints specified by a user. These constraints may take the form of a range of values for some performance characteristic of the product. Constraints may also be imposed for other reasons, such as governmental regulations or business requirements. The hierarchical decomposition facilitates the solution of highly complex problems. Criteria for a best solution may be specified for a given subdesign, for a collection of subdesigns, or globally. The tentative selection of a particular subdesign may impose internally generated parametric constraints upon a subsequent subdesign solution. If no acceptable solution is found for a given subdesign, the candidate overall configuration is rolled back to the most complete viable partial collection of subdesigns. The method transforms the constraints into a concrete design. The method will ordinarily be executed on a digital computer, and the instructions to program the computer will be stored on tangible digital media.04-28-2011
20110106287Wiring forming system and wiring forming method for forming wiring on wiring board - A wiring forming system comprises: maskless exposure unit which directly exposes an unexposed board by using exposure data generated based on design data relating to an wiring board; post-development inspect unit which tests the board after development, by using the exposure data and the image data of the board exposed and developed by the maskless exposure unit; etching unit which etches the developed board; and post-etching inspect unit which tests an etching pattern formed on the etched board, by using etching inspect data generated based on the design data and the image data of the board etched by the etching unit.05-05-2011
20120123579METHOD AND COMPUTING SYSTEM FOR DESIGNING A SHEET-METAL-FORMING PROCESS - In a method for designing a formed sheet-metal part performed by a processor of a computing system, by means of: 05-17-2012
20100249973METHOD AND DEVICE FOR OPTIMIZATION OF FLATNESS CONTROL IN THE ROLLING OF A STRIP - A method and a device for optimization of flatness control in the rolling of a strip using any number of mill stands and actuators. A mill model is used represented by a mill matrix that includes information of the flatness effect of each actuator. Each actuator's flatness effect is translated into a coordinate system having a dimension less than or equal to the number of actuators used. The actual flatness values are monitoring/sampling across the strip. A vector of the flatness error/deviation is computed as the difference between the monitored/sampled strip flatness and a reference flatness vector. The flatness error is converted into a smaller parameterized flatness error vector. A dynamic controller is used to calculate optimized actuator set-points in order to minimize the parameterized flatness error, thereby achieving the desired strip flatness. Also a system for optimization of flatness control in rolling a strip.09-30-2010
20120083915METHODS AND APPARATUS FOR PREDICTING GLASS PROPERTIES - Methods and apparatus for predicting viscosities of glass materials as a function of temperature and composition are provided. Two fitting parameters (fitting coefficients) are used for each of the viscosity-affecting components contained in the material. The parameters can accurately cover a wide range of temperatures (i.e., a wide range of viscosities) and a wide range of compositions. The viscosity predictions can be used as a guide for glass research as well as in feedback control systems for glass manufacturing processes. Methods and apparatus for predicting glass resistivity are also disclosed.04-05-2012
20120215337TWO-DIMENSIONAL MULTI-PRODUCTS MULTI-TOOLS ADVANCED PROCESS CONTROL - The present disclosure provides a method. The method includes gathering advanced process control (APC) data from a subset of available wafers and a subset of available processing chambers. The method includes establishing a matrix that contains a plurality of cells. The cells each correspond to one of the available wafers and one of the available processing chambers. The matrix is partially filled by populating cells for which the APC data has been gathered. The method includes determining a plurality of chamber-coverage-rate (CCR) parameters associated with the matrix. The method includes optimizing the CCR parameters through an iteration process to obtain optimized CCR parameters. The method includes predicting an APC data value for a designated cell of the matrix based on the optimized CCR parameters. The designated cell is an empty cell before the predicting and is populated by the predicting.08-23-2012
20120253497Contact Processing Using Multi-Input/Multi-Output (MIMO) Models - The invention provides a systems and methods for creating Double Pattern (DP) structures on a patterned wafer in real-time using Dual Pattern Contact-Etch (DPCE) processing sequences and associated Contact-Etch-Multi-Input/Multi-Output (CE-MIMO) models. The DPCE processing sequences can include one or more contact-etch procedures, one or more measurement procedures, one or more contact-etch modeling procedures, and one or more contact-etch verification procedures. The CE-MIMO model uses dynamically interacting behavioral modeling between multiple layers and/or multiple contact-etch procedures. The multiple layers and/or the multiple contact-etch procedures can be associated with the creation of lines, trenches, vias, spacers, contacts, and gate structures that can be created during Double Patterning (DP) procedures.10-04-2012
20120259446MONTE-CARLO BASED ACCURATE CORNER EXTRACTION - For application to analog, mixed-signal, and custom digital circuits, a system and method to extract circuit-specific process/environmental corners that is yield-aware and/or specification-aware. Simulation data from previous Monte Carlo-based verification actions can be re-used.10-11-2012
20120239178DEVICE PERFORMANCE PARMETER TUNING METHOD AND SYSTEM - A method comprises computing respective regression models for each of a plurality of failure bins based on a plurality of failures identified during wafer electrical tests. Each regression model outputs a wafer yield measure as a function of a plurality of device performance variables. For each failure bin, sensitivity of the wafer yield measure to each of the plurality of device performance variables is determined, and the device performance variables are ranked with respect to sensitivity of the wafer yield measure. A subset of the device performance variables which have highest rankings and which have less than a threshold correlation with each other are selected. The wafer yield measures for each failure bin corresponding to one of the selected subset of device performance variables are combined, to provide a combined wafer yield measure. At least one new process parameter value is selected to effect a change in the one device performance variable, based on the combined wafer yield measure. The at least one new process parameter value is to be used to process at least one additional wafer.09-20-2012
20110130857METHOD AND APPARATUS FOR OPTIMIZING A PERFORMANCE INDEX OF A BULK PRODUCT BLENDING AND PACKAGING PLANT - A method of generating capacity, production and inventory plans, over a designated planning horizon, which will optimize, with respect to a designated performance index, the operations of one or more bulk product blending and packaging plants and a specified number, ranging from zero to a certain count, of distribution centers while meeting key operating constraints. Also decision making tools and computer implemented programs for performing the method.06-02-2011
20120265332Optical Imaging Writer System - System and method for processing image data between adjacent imaging areas in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying an overlapping region between adjacent imaging areas to be imaged by corresponding SLMs, determining a stitching path for merging the adjacent imaging areas in the overlapping region in accordance with a set of predetermined cost functions, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel using the stitching path.10-18-2012
20120323353ALGORITHMIC FRAMEWORK FOR THE INTEGRATED OPTIMIZATION OF HOT STRIP MILL AND UPSTREAM MOLTEN METAL OPERATIONS FOR A LARGE-SCALE STEEL MANUFACTURING PLANT - A method and system for optimizing modules of a steel manufacturing process includes a plurality of manufacturing modules for a manufacturing process. Each of the modules have a plurality of steps. The plurality of modules include at least an upstream module, a casting module, and a downstream module. Each of the plurality of modules have parameters, and include at least one variable event. The variable event is adjustable for optimization of the manufacturing process while the parameters are being maintained for each of the plurality of modules. A communication system is used for exchanging information between the modules while the manufacturing process is occurring to adjust the at least one variable event for optimizing the manufacturing process.12-20-2012
20110238198METHOD AND SYSTEM FOR IMPLEMENTING VIRTUAL METROLOGY IN SEMICONDUCTOR FABRICATION - The present disclosure provides a method of fabricating a semiconductor device. The method includes collecting a plurality of manufacturing data sets from a plurality of semiconductor processes, respectively. The method includes normalizing each of the manufacturing data sets in a manner so that statistical differences among the manufacturing data sets are reduced. The method includes establishing a database that includes the normalized manufacturing data sets. The method includes normalizing the database in a manner so that the manufacturing data sets in the normalized database are statistically compatible with a selected one of the manufacturing data sets. The method includes predicting performance of a selected one of the semiconductor processes by using the normalized database. The selected semiconductor process corresponds to the selected manufacturing data set. The method includes controlling a semiconductor processing machine in response to the predicted performance.09-29-2011
20110238197DYNAMIC COMPENSATION IN ADVANCED PROCESS CONTROL - A method of semiconductor fabrication is provided. The method includes providing a model for a device parameter of a wafer as a function of first and second process parameters. The first and second process parameters correspond to different wafer characteristics, respectively. The method includes deriving target values of the first and second process parameters based on a specified target value of the device parameter. The method includes performing a first fabrication process in response to the target value of the first process parameter. The method includes measuring an actual value of the first process parameter thereafter. The method includes updating the model using the actual value of the first process parameter. The method includes deriving a revised target value of the second process parameter using the updated model. The method includes performing a second fabrication process in response to the revised target value of the second process parameter.09-29-2011
20110276165Integrated Expert System for Identifying Abnormal Events in an Industrial Plant - A computer-implemented integrated expert system for the identification of abnormal events in an industrial plant. The expert system integrates a model-based expert system with a rule-based expert system. The model-based expert system receives data on the operating conditions of a process unit in the industrial plant and calculates one or more results that determine whether the process unit is operating abnormally. The rule-based expert system also receives data on the operating conditions of the process unit and applies its rules to the process data. The rule-based expert system also applies its rules to the one or more results generated by the model-based expert system. The integrated system may also suppress any redundant messages generated by the model-based expert system.11-10-2011
20110320027METHOD OF USING PROCESS-PARAMETER PROGNOSTIC SYSTEM FOR PREDICTING SHAPE OF SEMICONDUCTOR STRUCTURE - Provided are a process-parameter prognostic system for predicting the shape of a semiconductor structure, a semiconductor fabrication apparatus having the process-parameter prognostic system, and a method of using the same. The process-parameter prognostic system may have a process prediction unit and a process-change point corresponding unit. The process prediction unit and the process-change point corresponding unit may obtain predicted parameters using measured parameters of semiconductor structures and sensor parameters of plasmas corresponding to the semiconductor structures.12-29-2011
20110320026SYSTEM AND METHOD FOR DATA MINING AND FEATURE TRACKING FOR FAB-WIDE PREDICTION AND CONTROL - System and method for data mining and feature tracking for fab-wide prediction and control are described. One embodiment is a system comprising a database for storing raw wafer manufacturing data; a data mining module for processing the raw wafer manufacturing data to select the best data therefrom in accordance with at least one of a plurality of knowledge-, statistic-, and effect-based processes; and a feature tracking module associated with the data mining module and comprising a self-learning model wherein a sensitivity of the self-learning model is dynamically tuned to meet real-time production circumstances, the feature tracking module receiving the selected data from the data mining module and generating prediction and control data therefrom; wherein the prediction and control data are used to control future processes in the wafer fabrication facility.12-29-2011
20130018500METHODS AND APPARATUS FOR PROCESSING SUBSTRATES USING MODEL-BASED CONTROLAANM PORTHOUSE; KEITH BRIANAACI SunnyvaleAAST CAAACO USAAGP PORTHOUSE; KEITH BRIAN Sunnyvale CA USAANM LANE; JOHN W.AACI San JoseAAST CAAACO USAAGP LANE; JOHN W. San Jose CA USAANM GREGOR; MARIUSCHAACI GilroyAAST CAAACO USAAGP GREGOR; MARIUSCH Gilroy CA USAANM MERRY; NIRAACI Mountain ViewAAST CAAACO USAAGP MERRY; NIR Mountain View CA USAANM RICE; MICHAEL R.AACI PleasantonAAST CAAACO USAAGP RICE; MICHAEL R. Pleasanton CA USAANM MINKOVICH; ALEXAACI CampbellAAST CAAACO USAAGP MINKOVICH; ALEX Campbell CA USAANM LI; HONGBINAACI Mountain ViewAAST CAAACO USAAGP LI; HONGBIN Mountain View CA USAANM DZILNO; DMITRY A.AACI SunnyvaleAAST CAAACO USAAGP DZILNO; DMITRY A. Sunnyvale CA US - Methods and apparatus are disclosed herein. In some embodiments, methods of controlling process chambers may include predetermining a relationship between pressure in a processing volume and a position of an exhaust valve as a function of a process parameter; setting the process chamber to a first state having a first pressure in the processing volume and a first value of the process parameter, wherein the exhaust valve is set to a first position based on the predetermined relationship to produce the first pressure at the first value; determining a pressure control profile to control the pressure as the process chamber is changed to a second state having a second pressure and a second process parameter value from the first state; and applying the pressure control profile to control the pressure by varying the position of the exhaust valve while changing the process chamber to the second state.01-17-2013
20110144788Method for simulating casting defects and microstructures of castings - Systems for predicting casting defects and microstructure in suppliers/vendors' castings for part/system durability analysis without knowing the details of the casting layout and casting gating and riser design as well as casting process parameters are provided. The systems involve the use of an integrated pore growth and interdendritic flow model. Methods of predicting casting defects and microstructures of a part without knowing the details of the casting layout and casting gating and riser design as well as casting process parameters and articles of manufacture are also provided.06-16-2011
20110160889SEMICONDUCTOR MANUFACTURING DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SIMULATION DEVICE, AND SIMULATION PROGRAM - Disclosed herein is a semiconductor manufacturing device including, a chamber, a sensor, a sticking probability calculating section, an acting section, and a control section.06-30-2011
20080249646METHOD AND SYSTEM FOR PRODUCT LINE MANAGEMENT (PLM) - A method and system for a product line management is presented. The system is capable of performing steps of the method. The method includes a first step of obtaining a product line architecture (PLA). A second step of obtaining a Change Management Workflow (CMW), the CMW includes a plurality of change activities, and the CMW being capable of interacting with the PLA. A third step of obtaining value stream maps for both the PLA and the CMW. A fourth step of creating activity lines for each of the change activity according to the PLA and the CMW. A fifth step of computing risk indicatives for the PLA and the CMW. A sixth step of triggering changes in the PLA and the CMW according the change activity, activity line, risk indicatives, or any combination thereof. And another step of repeating the steps of obtaining value stream maps onwards while managing the product line.10-09-2008
20110276166METHODS AND SYSTEMS FOR CONTROL OF A SURFACE MODIFICATION PROCESS - A method and system for modifying a substrate, such a thin film, solar panel or the like detects error and/or variance and, if needed, re-optimizes the product design and/or process parameters on the fly, so that product can meet the product specification. This allows for methods and systems of process control that can adaptively change the product design in real time.11-10-2011
20110276164ADVANCED BATCH CONTROL - A method for advanced batch control of a batch process. The method discloses completing at least one cycle of the batch process and collecting data on at least one process variable and at least one product property. A model is created based on the data, wherein the model comprises inputs. Thereafter the batch process is initiated. At one or more decision points the model is utilized to obtain outputs. A controller utilizes the model outputs to control the batch in accordance with the model outputs. Final product properties are reached at decreased variability compared to the prior art.11-10-2011
20110213487Method and apparatus for alignment optimization with respect to plurality of layers for writing different layers with different machine configurations - A method of patterning a plurality of layers of a work piece in a series of write machines, wherein errors due to different transformation capabilities of different machines are compensated by distributing the errors over the plurality of layers.09-01-2011
20110251711IDENTIFICATION OF MOST INFLUENTIAL DESIGN VARIABLES IN ENGINEERING DESIGN OPTIMIZATION - A method of identifying most influential design variables in a multi-objective engineering design optimization of a product is disclosed. According to one aspect of the present invention, a product is optimized with a set of design variables and a set of response functions as objectives and constraints. Representative product design alternatives (samples) are chosen from the design space and evaluated for responses. Metamodels are then used for fitting the sample responses to facilitate a global sensitivity analysis of all design variables versus the response functions. A graphical presentation tool is configured for allowing the user to conduct “what-if” scenarios by interactively applying respective weight factors to response functions to facilitate identification of most influential design variables. Engineering design optimization is then conducted in a reduced design space defined by the most influential design variables.10-13-2011
20100318211CUSTOM MILLED IRON SET - A process for the custom design and automated, custom manufacture of golf clubs. According to a first embodiment, a computer user interface, preferably a graphical user interface (GUI), guides a user's selection of preferred golf club design parameters. According to a second embodiment, input data about a golfer's style of play and golf club performance needs are captured from data collection systems, and analyzed by black box algorithms, preferably fuzzy logic algorithms, to infer golf club design parameters. After preferences for, or inferences about, golf club design parameters are developed in accordance with the two embodiments, a computer aided (CA) system is used to design and manufacture the desired golf clubs.12-16-2010

Patent applications in class Knowledge based (e.g., expert system)