| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 528030000 | From silicon-containing reactant having at least one polyvalent atom other than carbon, oxygen, or nitrogen | 7 |
| 20090156775 | POLYSILANE AND POLYSILANE-CONTAINING RESIN COMPOSITION - A polysilane having excellent functionalities (e.g., solubility in a solvent and reactivity) is obtained by introducing a structural unit of the following formula (1) to a polysilane through a reaction of a dihalosilane having a Si—H bond and adding a hydrosilylatable compound (e.g., a compound having a carbon-carbon unsaturated bond) to the Si—H bond, | 06-18-2009 |
| 20080312400 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM - A composition for forming a resist underlayer film of the present invention is capable of forming a resist underlayer film which has a good matching property with a resist, by including a siloxane polymer component having a repeating unit which contains a monovalent organic group containing a sulfur atom. Thus, the composition of the resist layer film capable of forming a resist underlayer film which has a good matching property with a resist is realized. | 12-18-2008 |
| 20100121016 | LOW REFRACTIVE INDEX HYBRID OPTICAL CLADDING AND ELECTRO-OPTIC DEVICES MADE THEREFROM - A low index of refraction hybrid optical cladding may be formed from a fluorinated sol-gel. An electro-optic device may include a poled organic chromophore-loaded modulation layer and at least one adjacent fluorinated hybrid sol-gel clad. | 05-13-2010 |
| 20110092661 | Polyhedral oligomeric silsesquioxanes and metallized polyhedral oligomeric silsesquioxanes as coatings, composites and additives - A method of using metallized and nonmetallized nanoscopic silicon containing agents for physical property control, radiation absorption, and in situ formation of nanoscopic glass layers on material surfaces. Because of their tailorable compatibility with polymers, metals, composites, ceramics, glasses and biological materials, nanoscopic silicon containing agents can be readily and selectively incorporated into materials at the nanometer level by direct mixing processes. Properties improved include gas and liquid barrier, stain resistance, resistance to environmental degradation, radiation absorption, adhesion, printability, time dependent mechanical and thermal properties such as heat distortion, creep, compression set, shrinkage, modulus, hardness and abrasion resistance, electrical and thermal conductivity, and fire resistance. The materials are useful in a number of applications, including beverage and food packaging, space-survivable materials, microelectronic packaging, and radiation absorptive paints and coatings. | 04-21-2011 |
| 20090023883 | PHOSPHOROUS-CONTAINING ORGANIC POLYMERISABLE SILANES AND SILICIC ACID POLYCONDENSATES PRODUCED THEREWITH - The invention relates to compounds of formula (I) (XaRbSi)m[ {B} ([O]oP[O]pR′cYd)n]4-a-b (I), where the groups, residues and indices have the following meanings: B=an at least doubly-valent straight chained or branched group with at least one organic polymerisable group and at least three carbon atoms, X=a group which may be cleaved from the silicon atom by hydrolysis, R=optionally substituted alkyl, alkenyl, aryl, alkylaryl or arylalkyl, R′=R, Y=Cl, OH or OR′, R″═H, alkyl or aryl, a=0, 1, 2 or 3, b=0, 1, or 2, a+b together=1, 2 or 3, c=0, 1 or 2, d=0, 1 or 2, c+d together=2, m=at least 1, with the proviso that m is not greater than 1 when a+b=1 or 2, n=at least 1, o=0 or 1 and p=0 or 1. The invention further relates to a series of methods by which the above compounds may be produced. | 01-22-2009 |
| 20120178893 | SUBSTITUTED 3,4-PROPYLENEDIOXYTHIOPHENE MONOMERS AND 3,4-PROPYLENEDIOXYTHIOPHENE-BASED CROSSLINKERS AND POLYMERS THEREOF - Substituted 3,4-propylenedioxythiophene monomers may be prepared by reacting 3-allyl-3,4-dihydro-2H-thieno[3,4-b][1,4]dioxepine or 3,3-diallyl-3,4-dihydro-2H-thieno[3,4-b][1,4]dioxepine with a thiol having a hydrocarbyl moiety optionally containing one or more heteroatom-containing functional groups under radical addition conditions under radical addition conditions. Such monomers may be used in homo- or copolymerization processes to obtain thiophene-type polymers containing substituents (which may bear functional groups such as silane, thiol, hydroxyl, carboxylic acid, amine, sugar groups, polyoxyalkylene, and the like). Crosslinkers useful for introducing crosslinking into thiophene-type polymers may be prepared by reacting 3-allyl-3,4-dihydro-2H-thieno[3,4-b][1,4]dioxepine with a compound having two or more thiol groups under radical addition conditions. | 07-12-2012 |
| 20080300375 | Ocular Lens Material and Method for Producing Same - The present invention is an eye lens material wherein phosphorylcholine groups of a specific structure are covalently bonded onto the material surface by means of an after-treatment in which a phosphorylcholine-containing chemical compound is reacted with an eye lens material. | 12-04-2008 |
