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Fluorine containing monomer is a mono-carboxylic acid ester

Subclass of:

526 - Synthetic resins or natural rubbers -- part of the class 520 series

526000000 - SYNTHETIC RESINS (CLASS 520, SUBCLASS 1)

526072000 - POLYMERS FROM ONLY ETHYLENIC MONOMERS OR PROCESSES OF POLYMERIZING, POLYMERIZABLE COMPOSITIONS CONTAINING ONLY ETHYLENIC MONOMERS AS REACTANTS OR PROCESSES OF PREPARING

526242000 - From fluorine containing monomer

Patent class list (only not empty are listed)

Deeper subclasses:

Class / Patent application numberDescriptionNumber of patent applications / Date published
526245000 Fluorine containing monomer is a mono-carboxylic acid ester 29
20120184696METHOD OF MAKING A CONTACT LENS - A method of making a contact lens comprising the steps of reacting in a mould a polymerisable formulation comprising at least one fluorine-containing silicone monomer at least one non-fluorine-containing silicone monomer and at least one hydrophilic monomer to form a contact lens, subjecting the contact lens to one or more solvent extraction steps to remove impurities, oligomers and unreacted monomers and hydrate the contact lens, wherein all of the solvent extraction steps are undertaken using an aqueous solvent.07-19-2012
20110196121Fluorine-Containing Compounds and their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions - A fluorine-containing compound represented by the formula 1,08-11-2011
20100076168ANTIFOULING COMPOSITION, METHOD FOR ITS PRODUCTION AND ARTICLE TREATED THEREWITH - To provide an antifouling composition which is an fluorine-type antifouling composition using a short chain perfluoroalkyl group and which can be made in the form of an aqueous dispersion containing substantially no volatile organic solvent and has excellent soil release properties.03-25-2010
20100016532NOVEL FLUORINATED COMPOUND, FLUOROPOLYMER AND METHOD FOR PRODUCING THE COMPOUND - To provide a novel fluorinated compound, a fluoropolymer and a method for producing the compound.01-21-2010
20090234086METHOD FOR PRODUCING FLUORINE-CONTAINING ELASTOMER - The present invention provides a method of producing a fluoroelastomer excellent in dispersion stability at low cost, at a high rate of polymerization and in high yields.09-17-2009
20080287625Fluoropolymer Having S-Sulfate Group and Water/Oil Repellent Composition Containing the Polymer - A fluoropolymer comprising: (A) repeating unit derived from an S-sulfate monomer having an —S—SO11-20-2008
20090036624OPTICAL COPOLYMER AND MOLDED PRODUCT COMPRISING THE SAME - This invention provides an optical copolymer which is excellent in balance among high transmittance, high heat resistance, low birefringent property, and mechanical strength, and an optical molded article comprising the optical copolymer. The optical copolymer comprises 50 to 80% by mass of methyl methacrylate units, 10 to 20% by mass of units derived from a specific lactone compound, and 10 to 30% by mass of trifluoroethyl methacrylate units. The mass ratio of the trifluoroethyl methacrylate units is in the range of 0.5 to 2.0 when the mass of the units derived from the specific lactone compound is presumed to be 1, and the glass transition temperature is 120° C. or above. The optical copolymer is suitable for objective lenses, prisms, condenser lenses, diffraction gratings, collimator lenses and sensor lenses.02-05-2009
20090176954NOVEL FLUOROADAMANTANE DERIVATIVE, FLUORINE-CONTAINING POLYMER AND PRODUCTION METHOD - To provide a novel fluoroadamantane derivative, a novel polymerizable fluoroadamantane derivativeand a novel fluoropolymer, and processes for production thereof.07-09-2009
20120296059COPOLYMER FOR ORGANIC ANTIREFLECTIVE FILM, MONOMER, AND COMPOSITION COMPRISING THE COPOLYMER - Disclosed are a copolymer for organic antireflective films containing a repeating unit represented by the following formula (1), a monomer for the copolymer, and an organic antireflective film composition including the copolymer:11-22-2012
20080287626Polymerization Products and Biomedical Devices Containing Same - Polymerization products formed from a monomeric mixture comprising (a) one or more first monomers of the general formula I:11-20-2008
20090264610Novel Copolymer of Methacrylic Ester, Composition, Optical Element and Electric Member - A copolymer of (meth)acrylic ester represented by a general formula (1) including a following repeating unit A and repeating unit B. In the general formula (1), R10-22-2009
20100144993CURABLE FLUORINE-CONTAINING POLYMER, CURABLE RESIN COMPOSITION PREPARED FROM SAME AND ANTIREFLECTION FILM - A curable fluorine-containing polymer having a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (1): -(A)-(M)- in which the structural unit M is a structural unit derived from a fluorine-containing ethylenic monomer and represented by the formula (M): [—(CX06-10-2010
20100331507Fluoro silicone acrylates and polymers thereof - The present invention is directed to fluoro silicone acrylates that are used in reaction either alone or with other monomers to make polymers that can modify the surface of hair skin or pigment. This makes them ideal for incorporation into pigmented products in personal care applications like make up and lipsticks.12-30-2010
20110213113PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM09-01-2011
20100069590COMPOUND AND POLYMERIC COMPOUND - A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II).03-18-2010
20110178260FLUOROPOLYMER COMPOSITIONS AND METHOD OF USE - A composition comprising monomers copolymerized in the following percentages by weight: (a) from about 20% to about 95% of a monomer, or mixture of monomers, of formula (I):07-21-2011
20080207860TREATING AGENT FOR MASONRY - The application to a masonry of a fluorine-containing polymer comprising (1) a fluoroalkyl group-containing monomer, and (2) a silicon-containing monomer in the amount of 2.0 to 6.0% by weight based on the polymer, can give a masonry having excellent water- and oil-repellency and soil resistance.08-28-2008
20120116038RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING RESIN - A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.05-10-2012
20120065347FLUOROCOMPOUND HAVING HIGHLY FLUORINATED NORBORNANE STRUCTURE, FLUOROPOLYMER, AND THEIR PRODUCTION PROCESSES - The present invention provides novel polymers obtained by polymerizing a compound of formula (1) which has a highly fluorinated norbornane structure. The invention also provides compounds represented by formulas (3) and (3A-1) below, as03-15-2012
20090048409ACRYLIC COPOLYMER - It is intended to in a liquid-immersion exposure process, simultaneously prevent any degeneration, represented by bridge, etc., of resist film during the liquid-immersion exposure using water and other various liquid-immersion exposure liquids and any degeneration of liquid-immersion exposure liquids per se, and to without increasing of the number of treatment steps, realize enhancing of the post-exposure storage stability of resist film, and to enable forming of a resist pattern of high resolution through liquid-immersion exposure. Use is made of an acrylic copolymer of the general formula:02-19-2009
20100273967FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS - To provide a fluorinated polymer which enables to reduce the amount of residual ink on partition walls and to form an ink layer having high uniformity in film thickness, and a negative photosensitive composition.10-28-2010
20120271021POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME - Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1):10-25-2012
20100130711NON-HYDROCARBYL HYDROPHOBICALLY MODIFIED POLYCARBOXYLIC POLYMERS - The present invention involves a cross-linked carboxylic acid hydrophobically modified copolymer product in which cross-linked carboxylic acid is modified with a non-hydrocarbyl hydrophobe, namely, poly(dimethyl siloxane) or fluoronated alkyl methacrylates.05-27-2010
20120149860FLUOROALKYL GROUP-CONTAINING N-SUBSTITUTED (METH)ACRYLAMIDE COMPOUND, POLYMER THEREOF , AND USE THEREOF - A compound represented by the following formula (a):06-14-2012
526246000 Alcohol derived portion of ester contains ether group 5
20120190809FLUORINATED COMPOUND AND FLUORINATED POLYMER - To provide a fluorinated compound having an R07-26-2012
20080293903Optical Organic Polymer - An organic polymer suitable for preparing optical waveguides or optical fibers and methods of making same are described. The polymer is a homo- or copolymer having an olefinic backbone with a pendant group comprising fluorinated aromatic and aliphatic moieties, and is cross-linkable. Polymers having refractive index over a wide range may be prepared by selecting specific constituents of the pendant group.11-27-2008
20080281066Hardcoat Compositions and Methods - The invention relates to method of protecting a flooring surface and flooring materials by providing a hardcoat surface layer comprising a perfluororpolyether. The invention also relates to certain hardcoat compositions.11-13-2008
20100022730POLYMERIZABLE COMPOUND HAVING ADAMANTANE STRUCTURE, PROCESS FOR PRODUCTION OF THE SAME, AND RESIN COMPOSITION - A polymerizable compound having a fluorinated substituent (Z) represented by the general formula (1), an adamantane structure and a polymerizable group (A) having the structure represented by the general formula (1), a production method thereof, and a photoresist composition, a thermocurable resin composition and a photocurable resin composition containing a polymer obtained using the polymerizable compound are provided. Use of the polymerizable compound with the adamantane structure and a resin composition thereof in the present invention provides in the field of photolithography the effect of preventing a liquid immersion medium from penetration and improving dry etching resistance in a liquid immersion exposure method as well as reducing adhesion to a mold and improving dry etching resistance in a nanoimprint method.01-28-2010
20120165487FLUORINATED COMPOUND AND FLUORINATED POLYMER - To provide a fluorinated compound having an R06-28-2012

Patent applications in class Fluorine containing monomer is a mono-carboxylic acid ester

Patent applications in all subclasses Fluorine containing monomer is a mono-carboxylic acid ester