| Entries |
| Document | Title | Date |
|---|
| 20080287279 | Glasses having low OH, OD levels - A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen. | 11-20-2008 |
| 20090258777 | SYSTEM AND METHOD FOR TREATING FLY ASH - A method and system for treating fly ash with a treating fluid by evenly dispersing a treating fluid into a flowing stream of fly ash. By dispersing the treating fluid into the fly ash as the fly ash is flowing, the method takes advantage of natural mixing and particle motion that occurs during flow of the bulk solid. The application of treating fluid is advantageously controlled by an automated controller that has inputs and outputs that allow the controller to adjust flow rate of the treating fluid in correspondence with a measured flow rate of the fly ash. | 10-15-2009 |
| 20100041538 | FUSED SILICA GLASS AND PROCESS FOR PRODUCING THE SAME - Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 10 | 02-18-2010 |
| 20130045854 | MANUFACTURE OF SYNTHETIC SILICA GLASS - Methods are described for manufacturing silica-based glass, in which silica precursor material is supplied to a synthesis flame in the form of an emulsion. The methods involve the steps of: forming an emulsion of an aqueous phase in a non-aqueous liquid silica precursor material; supplying the emulsion as a spray of droplets into a synthesis flame, whereby the precursor material is converted in the flame into a silica-containing soot; and collecting the soot on a substrate, either as a porous soot body for subsequent consolidation to glass or directly as a substantially pore-free glass. | 02-21-2013 |
| 20130059717 | Method of strengthening glass by plasma induced ion exchanges in connection with tin baths, and articles made according to the same - Certain example embodiments relate to an improved method of strengthening glass substrates (e.g., soda lime silica glass substrates). In certain examples, a glass substrate may be chemically strengthened by creating an electric field within the glass. In certain cases, the chemical tempering may be performed by surrounding the substrate by a plasma including certain ions, such as Li | 03-07-2013 |
| 20130123092 | TIO2-CONTAINING QUARTZ GLASS SUBSTRATE AND METHOD FOR PRODUCING SAME - The present invention relates to a TiO | 05-16-2013 |
| 20100056353 | METHOD AND SYSTEM FOR PRODUCING FLUORIDE GAS AND FLUORINE-DOPED GLASS OR CERAMICS - The present invention relates generally to production of a fluoride gas and equivalents thereof, and fluorine-doped sodium silicate glass, glass ceramics, vitro ceramics and equivalents thereof. In one embodiment, the method includes providing a salt and an oxide in a reactor, heating the reactor to produce a vapor and the vitro ceramic and removing the vapor. | 03-04-2010 |
| 20110092354 | SYNTHETIC SILICA GLASS WITH UNIFORM FICTIVE TEMPERATURE - A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described. | 04-21-2011 |
| 20110301015 | PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO | 12-08-2011 |
| 20090099000 | Vial and Method for Producing the Same - To provide a vial with low alkali elution and a method for producing the same by removing a deteriorated region caused by processing on an internal surface of a vial. A vial with reduced alkali elution and a method for producing the same by forming vials from borosilicate glass tubes comprises a first step of forming a borosilicate glass tube into a cup-shaped body by formation of a bottom of a vial, and a second step of forming the cup-shaped body into the vial by formation of a mouth of the cup-shaped body. Further provided is a vial with reduced alkali elution and a method for producing the same by forming vials from borosilicate glass tubes, which comprises a first step of forming a borosilicate glass tube into a cup-shaped body to form a bottom of a vial; a second step of fire-blasting an internal surface of said cup-shaped body by a certain length from the bottom toward an opening of said cup-shaped body with flames to remove a deteriorated region caused by processing; and a third step of forming a mouth of said cup-shaped body to complete a vial with reduced alkali elution. | 04-16-2009 |
| 20100323872 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
| 20090042709 | PROCESS FOR PREPARING BATCH MATERIALS FOR THE MANUFACTURE OF GLASS - The invention relates to a process for manufacturing compounds based on one or more silicates of alkali metals and/or of alkaline-earth metals, optionally in the form of mixed silicates that combine at least two of these elements, said process involving:
| 02-12-2009 |
| 20100292068 | Method for producing glass for display substrate - A method of producing a glass having a SiO | 11-18-2010 |
| 20090029842 | Fused silica having low OH, OD levels and method of making - A fused silica article having a combined concentration of hydroxyl (OH) and deuteroxyl (OD) concentration of less than 10 parts per million (ppm) and, in one embodiment, less than 1 ppm. The fused silica article is formed by drying a soot blank in a halogen-free atmosphere comprising carbon monoxide. The dried soot blank may optionally be doped to reach target levels of OH and OD concentrations and improve homogeneity within the fused silica article. The dried soot blank is then oxidized and, sintered to form the article. A method of reducing the combined concentration of OH and OD to less than 10 ppm is also described. | 01-29-2009 |
| 20090163344 | Component of Quartz Glass for Use in Semiconductor Manufacture and Method for Producing the Same - The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO | 06-25-2009 |
| 20100004113 | SYNTHETIC SILICA HAVING LOW POLARIZATION-INDUCED BIREFRINGENCE, METHOD OF MAKING SAME AND LITHOGRAPHIC DEVICE COMPRISING SAME - Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm | 01-07-2010 |
| 20090143213 | LOW EXPANSION GLASS MATERIAL HAVING LOW EXPANSIVITY GRADIENT - A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/° C./° C. in a temperature range of 19° C. to 25° C. | 06-04-2009 |
| 20090203511 | SYNTHETIC SILICA GLASS OPTICAL MATERIAL HAVING HIGH RESISTANCE TO LASER INDUCED DAMAGE - Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm | 08-13-2009 |
| 20090062101 | OPTICAL GLASS - An optical glass of the present invention has optical constants of a refractive index (nd) within a range from 1.75 to 1.85 and an Abbe number (ν d) within a range from 35 to 45, comprises SiO | 03-05-2009 |
| 20110028299 | TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention provides a TiO | 02-03-2011 |
| 20100197477 | ALKALI-FREE GLASSES CONTAINING IRON AND TIN AS FINING AGENTS - Alkali-free glasses are disclosed which can be used to produce substrates for flat panel display devices, e.g., active matrix liquid crystal displays (AMLCDs). The glasses contain iron and tin as fining agents, and preferably are substantially free of arsenic and antimony. In certain embodiments, the glasses are also substantially free of barium. Methods for producing alkali-free glass sheets using a downdraw process (e.g., a fusion process) are also disclosed. | 08-05-2010 |
| 20090036289 | Optical composite material and method for its production - An optical composite material comprises an amorphous optical material ( | 02-05-2009 |
| 20090082189 | Optical glass - An optical glass having a refractive index (nd) within a range from 1.825 to 1.870, an Abbe number (νd) within a range from 22 to less than 27, a transformation temperature (Tg) within a range from 530° C. to 585° C. and an mean coefficient of linear thermal expansion (α) within a range from 80×10 | 03-26-2009 |
| 20110130265 | SYNTHETIC SILICA GLASS MOLDED BODY, METHOD OF MOLDING THE SAME, AND METHOD OF INSPECTING SYNTHETIC SILICA GLASS MOLDED BODY - A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method comprising:
| 06-02-2011 |
| 20090318279 | Low alkali, non-crystalline, vitreous silica fillers - A substantially white powder for use as a filler and/or extender derived from by-products of manufacturing vitreous low alkali, low iron glass fibers, and a method for producing the powder. The filler has very low alkalinity and by virtue of its being essentially free of crystalline silica is non-hazardous to health and therefore safe for consumer-based and industrial-based uses. | 12-24-2009 |
| 20090239733 | Methods of heat-treating soda-lime glass substrates and heat-treated soda-lime glass substrates formed using the same - A soda-lime glass substrate formed through a heat-treatment method has an absorption coefficient ranging from about 0.15 λ,W/m·K to about 0.54 λ,W/m·K, and a free path length ranging from about 0.12 cm to about 0.24 cm. The heat-treated soda-lime glass substrate is formed by heating for a selected time at a pre-specified maximum temperature of about 270° C. to about 330° C. so as to remove thermally induced residual deformations from the substrate and then the substrate is slowly cooled so as to substantially avoid reintroducing thermally induced residual deformations into the cooling substrate. Thus, the soda-lime glass substrate is transformed to one at or close to its contraction saturation point. This allows the heat-treated soda-lime glass substrate to serve in a practical way as a substrate of a flat display panel. | 09-24-2009 |
| 20110021339 | Silica Glass With Saturated Induced Absorption and Method of Making - A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C. | 01-27-2011 |
| 20100323873 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
| 20110059837 | METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS - In a known exterior deposition method for producing synthetic quartz glass, amorphous quartz glass powder particles ( | 03-10-2011 |
| 20100261597 | TIO2-CONTAINING SILICA GLASS - The present invention is to provide a TiO | 10-14-2010 |
| 20100323871 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE - The present invention provides a TiO | 12-23-2010 |
| 20120264584 | SUBSTRATE FOR EUVL OPTICAL MEMBER - The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO | 10-18-2012 |
| 20120264583 | SODA LIME SILICA GLASS COMPOSITION - A soda lime silica glass having a colourant portion falling within one of the following combinations of ranges: | 10-18-2012 |
| 20100234205 | TiO2-containing quartz glass substrate - An object of the present invention is to provide a TiO | 09-16-2010 |
| 20120289393 | Method for Producing Ulta-Low-Expansion Glass | 11-15-2012 |
| 20100167906 | PROCESS OF MAKING A DENSE SYNTHETIC SILICA GLASS, A MUFFLE FURNACE FOR PERFORMING THE PROCESS, AND SILICA GLASS OBTAINED FROM SAID PROCESS - The process of making synthetic silica glass occurs in a combustion chamber of a muffle furnace. It includes producing a gas flow containing a fuel, an oxidizer, and a silicon compound that is converted by flame hydrolysis and/or by chemical oxidation to SiO | 07-01-2010 |
