Class / Patent application number | Description | Number of patent applications / Date published |
451533000 | Laminate | 53 |
20080287048 | Device for Modifying the Position of the Segments in the Event of the Inclination of a Segmented Grinding Pad - When a segmented grinding pad ( | 11-20-2008 |
20090047884 | CHEMICAL MECHANICAL POLISHING PAD STRUCTURE MINIMIZING TRAPPED AIR AND POLISHING FLUID INTRUSION - A polishing pad is attachable to a platen to minimize trapped air and polishing fluid intrusion. The pad comprises a polishing layer having a polishing surface on a first end of the pad and a polishing layer peripheral edge extending away from the polishing surface; a gas impermeable attaching layer defines an attachment surface for securing the pad to the platen at an opposed second end of the pad, the attaching layer having an attaching layer peripheral edge extending away from the attachment surface, wherein a peripheral edge of the pad extends from the polishing surface to the attaching surface formed of the peripheral edges of each pad layer; and a plurality of openings extending through the attaching layer. During pad attachment, trapped air flows through the attaching layer openings and out of the peripheral edge of the pad at a position spaced from the attaching layer peripheral edge. | 02-19-2009 |
20090093201 | POLISHING PAD - An object of the invention is to provide a polishing pad which hardly generates a scratch on a surface of a polishing object, and is excellent in planarization property. In addition, an object of the invention is to provide a polishing pad which has a high polishing rate and is excellent in planarization property. In addition, an object of the invention is to provide a polishing pad in which a groove is scarcely clogged with abrasive grains or polishing swarf during polishing and, even when continuously used for a long period of time, a polishing rate is scarcely reduced. | 04-09-2009 |
20090093202 | METHOD FOR MANUFACTURING POLISHING PAD - A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad. | 04-09-2009 |
20090170413 | CHEMICAL-MECHANICAL PLANARIZATION PAD - The present disclosure relates to a polishing pad. The polishing pad may include a polymer layer having a three-dimensional network therein and a composite layer having the ability to equalize pressure across the pad surface, including a first adhesive wherein the composite exhibits a hydrostatic modulus of 1 to 500 psi when compressed at a pressure of 1 to 50 psi. | 07-02-2009 |
20100009611 | METHOD FOR MANUFACTURING A POLISHING PAD - A method for inexpensively and easily manufacturing a polishing pad of excellent durability and polishing speed stability includes preparing a cell dispersed urethane composition by mechanical foaming, applying the cell dispersed urethane composition onto a base material layer, forming a polyurethane foamed layer having roughly spherical interconnected cells by curing the cell dispersed urethane composition, and regulating the thickness of the polyurethane foamed layer uniformly. | 01-14-2010 |
20100009612 | POLISHING PAD - The present invention provides a polishing pad which can improve qualities of an object to be polished by improving the flatness of the object. A polishing surface | 01-14-2010 |
20100015902 | CHEMICAL MECHANICAL POLISHING PAD MANUFACTURING ASSEMBLY - A chemical mechanical polishing pad manufacturing assembly is provided having a subpad layer having a top surface and a bottom surface; a backing plate having a top side and a bottom side; a sacrificial layer having at least two recessed areas designed to facilitate attachment of a subpad layer to the backing plate; wherein the subpad layer is disposed on the top side of the backing plate and the sacrificial layer is disposed on the bottom side of the backing plate, and wherein the at least two wrap around tabs extend to the bottom side of the backing plate. Also provide is a method of manufacturing a chemical mechanical polishing pad using the chemical mechanical polishing pad manufacturing assembly. | 01-21-2010 |
20100099344 | Chemical mechanical polishing pad having sealed window - A multilayer chemical mechanical polishing pad is provided, having a polishing layer with a polishing surface, a polishing layer interfacial region parallel to the polishing surface and an outer perimeter; a porous subpad layer with a bottom surface, a porous subpad layer interfacial region parallel to the bottom surface and an outer perimeter; a pressure sensitive adhesive layer; and, a light transmissive window element; wherein the polishing layer interfacial region and the porous subpad layer interfacial region form a coextensive region; wherein the coextensive region secures the polishing layer to the porous subpad layer without the use of a laminating adhesive; wherein the pressure sensitive adhesive layer is applied to the bottom surface of the porous subpad layer; wherein an internal opening extends through the multilayer chemical mechanical polishing pad from the bottom surface to the polishing surface and is bounded by an internal peripheral edge of the porous subpad layer and a corresponding internal peripheral edge of the polishing layer; wherein the light transmissive window element is disposed within the internal opening and contacts the internal peripheral edge of the porous subpad layer; wherein the light transmissive window element is adhered to the pressure sensitive adhesive layer; wherein the porous subpad layer has been subjected to a first critical compressive force along the internal peripheral edge forming a first irreversibly collapsed, densified region of the porous subpad layer along the peripheral edge; wherein the porous subpad layer has been subjected to a second critical compressive force along the outer perimeter of the porous subpad layer forming a second irreversibly collapsed, densified region of the porous subpad layer along the outer perimeter of the porous subpad layer; wherein the polishing surface is adapted for polishing the substrate. Also provided is a method of making such multilayer chemical mechanical polishing pads and for using them to polish a substrate. | 04-22-2010 |
20100120343 | CUSHION FOR POLISHING PAD AND POLISHING PAD USING THE CUSHION - The invention provides a cushion for a polishing pad, wherein, when a dynamic compression viscoelasticity measurement is performed under conditions of 23° C., a static load of 27.6 kPa, a frequency of 11 Hz and an amplitude of 1 μm, (1) a phase difference between dynamic stress and deformation is 4° or less, and (2) a ratio of the maximum value of the deformation amount to the maximum value of the dynamic stress ([maximum value of deformation amount]/[maximum value of dynamic stress]) is 0.5 μm/kPa or more. The invention also provides a polishing pad having a layer of the cushion for a polishing pad and a polishing layer. | 05-13-2010 |
20100267318 | POLISHING PAD WITH PROJECTING PORTION - A polishing pad include a polishing layer having a polishing surface and a backing layer on a side of the polishing layer opposite the polishing surface. An outer edge of the polishing layer overhangs an outer edge of the backing layer. | 10-21-2010 |
20110009039 | METHOD AND APPARATUS FOR MANUFACTURING AN ABRASIVE WIRE - A method and apparatus for an abrasive laden wire is described. In one embodiment, an abrasive coated wire is described. The wire includes a core wire having a symmetrical pattern of abrasive particles coupled to an outer surface of the core wire, and a dielectric film covering portions of the core wire between the abrasive particles. | 01-13-2011 |
20110171891 | SANDING IMPLEMENT - A sanding implement for filing nails or for general sanding purposes includes a readily compressible elongated body having contoured sides, with a sheet of sand paper bonded to at least one of a pair of planar surfaces defined between the sides, the sides of a substantial thickness to provide smooth side surfaces able to be comfortably gripped by a user during use. The body sides converge at either end to form rounded tips useful for sanding small confined surfaces | 07-14-2011 |
20110212673 | POLISHING PAD WITH PARTIALLY RECESSED WINDOW - A polishing pad has an opaque polishing layer with an aperture therethrough and a polishing surface, and a solid light-transmissive window in the aperture. The solid light-transmissive window includes an outer portion secured to the polishing layer and an inner portion secured to the outer portion. The outer portion has a upper surface recessed relative to the polishing surface, whereas the inner portion has an upper surface that is substantially co-planar with the polishing surface. | 09-01-2011 |
20120115405 | DOUBLE-SIDED PRESSURE-SENSITIVE ADHESIVE TAPE AND POLISHING MEMBER - A double-sided pressure-sensitive adhesive tape | 05-10-2012 |
20130017769 | POLISHING PADAANM Kimura; TsuyoshiAACI Osaka-shiAACO JPAAGP Kimura; Tsuyoshi Osaka-shi JP - An object of the present invention is to provide a polishing pad which enables high accuracy optical end-point detection in a state where polishing is carrying out, and which can prevent slurry leakage from a polishing layer to a cushion layer even in the case of being used for a long period. Another object is to provide a method for producing a semiconductor device using the polishing pad. The present invention relates to a polishing pad in which a polishing layer having a polishing region and a light-transmitting region, and a cushion layer having a through hole are laminated via a double-sided adhesive sheet such that the light-transmitting region and the through hole are laid one upon another, wherein a transparent member is stuck on an adhesive layer of the double-sided adhesive sheet in the through hole. | 01-17-2013 |
20140017985 | ABRASIVE ARTICLE AND METHOD OF FORMING - An abrasive article includes a substrate, a tacking layer overlying the substrate, a first type of abrasive particle overlying the tacking layer, at least about 5% and not greater than about 99% of a total amount of the first type of abrasive particle has an exposed surface, and a bonding layer overlying at least a portion of the abrasive particles and the tacking layer. | 01-16-2014 |
20140038503 | POLISHING PAD AND MANUFACTURING METHOD THEREFOR - A polishing pad for polishing a semiconductor device and manufacturing method therefor, the polishing pad comprising a polishing layer having a polyurethane-polyurea resin foam containing substantially spherical cells, wherein an M-component of the polyurethane-polyurea resin foam has a spin-spin relaxation time T2 of 160 to 260 μs, the polyurethane-polyurea resin foam has a storage elastic modulus E′ of 1 to 30 MPa, the storage elastic modulus E′ being measured at 40° C. with an initial load of 10 g, a strain range of 0.01 to 4%, and a measuring frequency of 0.2 Hz in a tensile mode, and the polyurethane-polyurea resin foam has a density D in a range from 0.30 to 0.60 g/cm | 02-06-2014 |
20140106652 | POLISHING PAD AND MANUFACTURING METHOD THEREFOR - Provided are a polishing pad which remedies the problem of scratches occurring when a conventional hard (dry) polishing pad is used, which is excellent in polishing rate and polishing uniformity, and which can be used for not only primary polishing but also finish polishing, and a manufacturing method therefor. The polishing pad is a polishing pad for polishing a semiconductor device, comprising a polishing layer having a polyurethane-polyurea resin foam containing substantially spherical cells, wherein the polyurethane-polyurea resin foam has a Young's modulus E in a range from 450 to 30000 kPa, and a density D in a range from 0.30 to 0.60 g/cm | 04-17-2014 |
20140378036 | ABRASIVE ARTICLE AND METHOD OF MAKING SAME - An abrasive article may include an abrasive body having a grinding layer, where the grinding layer may include a bond and abrasive particles contained within the bond. The abrasive body also may include a volumetric ratio GLV | 12-25-2014 |
20150093979 | COMPOSITE POLISHING PAD AND METHOD FOR MAKING THE SAME - The present invention relates to a composite polishing pad and a method for making the same. The composite polishing pad includes a cushion layer and a polishing layer. The cushion layer includes a first polymeric elastomer with a hardness of 10 to 70 shore D, and is attached to the polishing layer directly. The polishing layer includes a second polymeric elastomer with a hardness of 30 to 90 shore D, and has a polishing surface for polishing a workpiece. Whereby, the polishing layer will not peel off from the cushion layer easily, so that the polishing quality is raised. | 04-02-2015 |
20160052099 | SUPERABRASIVE TOOL WITH METAL MESH STRESS STABILIZER BETWEEN SUPERABRASIVE AND SUBSTRATE LAYERS - A multi-layer polycrystalline superabrasive PCD or PCBN blank for attachment to a working tool is disclosed. The blank comprises an abrasive layer of PCD or PCBN and a substrate layer of cobalt containing cemented tungsten carbide. In between the abrasive and substrate layers is a metal mesh stabilizer layer sintered by HPHT to the abrasive and substrate layers. The apertures of the mesh layer contain PCD or PCBN which, along with the mesh are sintered to the support and substrate layers and cobalt present in the substrate layer is infiltrated through the mesh layer into the abrasive layer as a binder. The metal mesh layer provides stability to the abrasive and substrate layers which have different stress and thermal expansion properties. | 02-25-2016 |
20160136779 | POLISHING PAD AND METHOD FOR MANUFACTURING SAME - A polishing pad comprising a resin-containing polishing cloth having a polishing cloth base impregnated with a polyurethane resin and silicon carbide, wherein the silicon carbide has a particle diameter in a range from 0.2 to 3.0 μm, and the content of the silicon carbide in the resin-containing polishing cloth is in a range from 60 to 500 parts by mass relative to 100 parts by mass of the polishing cloth base. | 05-19-2016 |
20160199961 | POLISHING PAD AND METHOD FOR MAKING THE SAME | 07-14-2016 |
451534000 | Discontinuous or differential coating impregnation or bond | 3 |
20080318505 | CHEMICAL MECHANICAL PLANARIZATION PAD AND METHOD OF USE THEREOF - A web-style polishing pad includes a guide layer through which individual polishing elements protrude on one side and a flexible under-layer attached to the other side. The polishing elements may be affixed at their base to the compressible under-layer and pass through corresponding holes in the guide layer so as to be maintained and translatable in a substantially orthogonal orientation with respect to a plane defined by the guide layer. | 12-25-2008 |
20090068938 | Grinding Lamella and Grinding Wheel Holding Same - A grinding lamella ( | 03-12-2009 |
20120231711 | METHOD OF MAKING A COATED ABRASIVE ARTICLE HAVING SHAPED ABRASIVE PARTICLES AND RESULTING PRODUCT - A method of making a coated abrasive article includes the steps of: applying a make coat to a first major surface of a backing; applying shaped abrasive particles to the make coat to form a first abrasive layer consisting essentially of shaped abrasive particles; applying diluent particles to the make coat over the shaped abrasive particles to form a final abrasive layer; applying a size coat over the final abrasive layer; curing the make and size coats; and wherein the shaped abrasive particles comprise a vertex opposite a base and a width of the shaped abrasive particle tapers from the base to the vertex. | 09-13-2012 |
451536000 | Integrated strands | 3 |
20110034115 | Abrasive Mesh for a Powered Grinding Wheel - An abrasive mesh for a powered grinding wheel is made by weaving plural twisted warp threads with plural single weft threads. The twisted warp threads construct an even machining surface for grinding the workpiece evenly, avoiding the occurrence of surface scratch. Since the twisted warp threads are connected to the single weft threads by weaving, the structure strength of the abrasive mesh is relatively high, thus extending its service life. Further, the abrasive mesh can be applied to grind the workpiece requiring high grinding fineness. | 02-10-2011 |
20140302760 | Anti-Clogging Mesh Abrasive Cloth - The disclosure relates to an anti-clogging mesh abrasive cloth, which is one type of coated abrasive tool. The anti-clogging mesh abrasive cloth comprises a substrate, a prime adhesive coating layer painted on the substrate, an abrasive layer planted on the prime adhesive coating layer, and a deposited adhesive coating layer covering on top of the abrasive layer. The substrate of the anti-clogging mesh abrasive cloth is mesh cloth with a plurality of uniformly distributed large meshes and small meshes. The large meshes can facilitate discharge of chips generated during grinding. The small meshes allow the plane around the large meshes to be anti-clogging. The combination of the large meshes and the small meshes makes the anti-clogging mesh abrasive cloth anti-clogging and suitable for grinding the materials apt to causing blockage while being grinded, such as wood, paint and putty. | 10-09-2014 |
20140378037 | Velcro Abrasive Cloth - The invention is a new Velcro-backed abrasive cloth. It is used in the coated abrasives industry. Its uniqueness is in the construction. It is formed by a cloth with Velcro on one side ( | 12-25-2014 |
451537000 | Non-coextensive laminae | 1 |
20090088054 | Sanding element - The invention concerns a sanding element with a succession of overlapping lamellas ( | 04-02-2009 |
451538000 | Strippable layer or component | 1 |
20160144477 | COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING - Coated compressive subpads for polishing pad stacks and methods of fabricating coated compressive subpads for polishing pad stacks are described. In an example, a polishing pad stack for polishing a substrate includes a polishing pad having a polishing surface and a back surface. The polishing pad stack also includes a compressive subpad with a first surface having a first pressure sensitive adhesive layer coated thereon. The first surface of the compressive subpad is coupled directly to the back surface of the polishing pad by the first pressure sensitive adhesive layer. | 05-26-2016 |
451539000 | Abrasive on one surface only | 21 |
20080207101 | Abrasive Element - An abrasive element has a first surface region which coincides with an enveloping surface of the element, and a second surface region which does not. When the element is pressed against a planar surface, part of the second surface region, which is provided with abrasive material, comes into contact with the surface. Also disclosed are a system comprising at least two part-elements which can be connect to form an abrasive element, and methods for making and using the abrasive element. | 08-28-2008 |
20080220703 | ABRASIVE BACKING AND ABRASIVE CLOTH - The present invention relates to an abrasive backing and abrasive cloth and more particularly, to an abrasive backing including an upper weave layer and a lower weave layer which are comprised with warps and wefts, and a binding yarn which connects the upper weave layer and the lower weave layer, wherein the abrasive backing is woven by using the wefts of the upper weave layer having a different thickness from those of the lower weave layer. when the weft of the upper weave layer and that of the lower weave layer have a different thickness, the upper weave layer and the lower weave layer may have uneven surface having different details and coat abrasive materials having different grain sizes. | 09-11-2008 |
20080318506 | Abrasive article and method of making - An abrasive sheet material comprising a first sheet having a first major suface and a second major surface and second sheets having first major surfaces and second major surfaces wherein the second major surfaces of the second sheets are affixed to the first major surface of the first sheet and spaces exist between the second sheets wherein said spaces form pathways that interweave between the second sheets wherein the pathways communicate with each other and form a network of pathways. At least one aperture extends from at least the first major surface of the first sheet to the second major surface of the first sheet and communicates with at least one of the pathways. Abrasive particles are coated onto at least the first major surface of the second sheets forming an abrasive first major surface. When air moves through the pathways by a vacuum source said pathways channel air across and parallel to the work surface while the air is in contact with the work surface thereby providing a sweeping movement of air across the work surface carrying dust with the air for the purpose of vacuuming dust from the work surface. | 12-25-2008 |
20090081933 | ABRASIVES PRODUCTS WITH EDGES - A coated abrasive includes a substrate, where the substrate has a first edge and a first plurality of flaps defining a first edge. The flaps can be manufactured with different shapes and spacing between the flaps to improve the conformability of the coated abrasive. | 03-26-2009 |
20090264059 | Stain Applicator - A stain applicator and finishing pad is defined by a specialized flexible applicator pad that has on one side an absorbent applicator material that absorbs liquid stain so that the stain may be applied to a the prepared surface, and on the opposite side an abrasive coating that allows for efficient finishing of even contoured surfaces. | 10-22-2009 |
20100112920 | ABRASIVE ARTICLE - Provided is a durable abrasive article which can conform even to a surface of a complicated shape and has an excellent abrasive power and which does not give any deep flaw to become a problem at a subsequent step and is not broken even when used in sanding the surface of the complicated shape. The abrasive article comprises a flexible resin film, an abrasive grain layer formed on the surface of the resin film, and an extremely flexible resin layer formed on the abrasive grain layer, wherein the flexible resin film has a thickness of 10 to 200 μm, a tensile strength of 30 to 130 MPa and an elongation of 3 to 250%, wherein the abrasive grains of the abrasive grain layer are of P280 to P12, and wherein the extremely flexible resin layer has a 100% M of 1 to 20 MPa, a tensile strength of 20 to 90 MPa and an elongation of 250 to 1000%. | 05-06-2010 |
20100130113 | FLEXIBLE GRINDING PRODUCT AND METHOD OF PRODUCING THE SAME - The present invention relates to a flexible grinding product and a method of producing the same. Such a grinding product comprises a flexible underlay ( | 05-27-2010 |
20110021122 | FLEXIBLE COATED ABRASIVE FINISHING ARTICLE AND METHOD OF MANUFACTURING THE SAME - A flexible abrasive finishing article including a backing of fabric or paper having first and second major surfaces with abrasive particles adhesively secured to said first major surface and a layer of cyanoacrylate based material substantially covering the second major surface. The method of making a flexible abrasive finishing material including the steps of applying a layer of cyanoacrylate based material to a surface of a backing material opposite the surface to which abrasive particles are adhesively secured and covering said cyanoacrylate material. | 01-27-2011 |
20110053476 | ABRASIVE ARTICLE HAVING A LINE OF WEAKNESS - A coated abrasive article ( | 03-03-2011 |
20110124275 | FINISHING PAD AND METHOD OF MAKING - A composite abrasive or finishing pad for use in sanding includes a sandpaper sheet having a paper based substrate having a front surface which has an abrasive grit adhered thereto and a back surface, a polyfoam backing reaction bonded to the back surface, wherein the polyfoam backing includes a first layer formed across the back surface of a first thickness sufficient enough to substantially aid in rendering the sandpaper tear-resistant and including a raised portion extending outward from the first layer a sufficient amount to form a wall portion against which lateral forces can be applied by one's fingers. A method of forming the pad is provided. | 05-26-2011 |
20110244769 | ABRASIVE ARTICLE HAVING A PLURALITY OF PRECISELY-SHAPED ABRASIVE COMPOSITES - A method of making an abrasive article including the steps of treating a plurality of cavities in a contacting surface of a production tool by plasma deposition of a thin film thereby forming a plurality of plasma treated cavities. Filling the plurality of plasma treated cavities in the production tool with an abrasive slurry, and at least partially curing the abrasive slurry while residing in the plurality of cavities. | 10-06-2011 |
20120322351 | SANDPAPER WITH FIBROUS NON-SLIP LAYER - A sheet of sandpaper includes a backing layer having opposed first and second major sides, an adhesive make coat on the second major side, abrasive particles at least partially embedded in the make coat, thereby defining an abrasive surface, and an exposed fibrous non-slip layer on the first major side. Methods of making and using such sandpaper are also provided. | 12-20-2012 |
20120322352 | SANDPAPER WITH LAMINATED NON-SLIP LAYER - A sheet of sandpaper includes a backing layer having opposed first and second major sides, an adhesive make coat on the second major side, abrasive particles at least partially embedded in the make coat, thereby defining an abrasive surface, and an exposed laminated non-slip layer on the first major side. Methods of making and using such sandpaper are also provided. | 12-20-2012 |
20130084786 | Abrasive Articles Including Abrasive Particles Bonded to an Elongated Substrate Body Having a Barrier Layer, and Methods of Forming Thereof - An abrasive article including a substrate in the form of an elongated member having a core and a barrier layer in direct contact with an peripheral surface of the core. The barrier layer consists essentially of tin. A bonding layer is overlying the elongated substrate and abrasive particles are secured in the bonding layer | 04-04-2013 |
20130137350 | POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER - Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described. | 05-30-2013 |
20130189911 | ABRASIVE PRODUCTS AND METHODS FOR FINISHING COATED SURFACES - A coated abrasive product includes green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles, a nanoparticle binder, a sulfosuccinate, and a crosslinking, wherein the abrasive aggregates are dispersed within a polymer resin coating comprising a mixture of copolyester resin. The coated abrasive product is capable of finishing coated surfaces and repairing defects in coated surfaces, including surfaces coated with automotive primers, paints, clear coats, and combinations thereof. | 07-25-2013 |
20130309952 | ANTISTATIC FLEXIBLE ABRASIVE WITH A COMBINED SUPPORT - A flexible antistatic abrasive with a combined support ( | 11-21-2013 |
20140242893 | Abrasive Device - An abrasive device including at least one substrate, provided as a carrier element of a binder layer at least partially accommodating at least one abrasive grain, and having at least one fastening element, configured to detachably fasten the at least one substrate to an abrasive handling device. | 08-28-2014 |
20160001422 | METHOD TO PROVIDE AN ABRASIVE PRODUCT AND ABRASIVE PRODUCTS THEREOF - The invention relates to obtaining an abrasive product comprising a backing layer and an abrasive layer, wherein the backing layer comprises propylene homopolymer or copolymer. | 01-07-2016 |
20160144485 | DIAMOND GRINDING DISC - This invention relates to a grinding tool, and more particularly, it relates to a diamond grinding disc adapted for grinding. The diamond grinding disc is connected to a grinder via a post to be available for grinding a workpiece. The diamond grinding disc comprises a grinding layer, a transition laver, a back layer, wherein the post is a screw structure upwardly extended from the back layer, wherein the back layer is connected to the transition layer to form integration. The design, setting the back layer and the transition layer as an integrated part and applying soft material on the back layer, solves the problem that the back layer and the transition layer are easily disconnected from each other and prolongs the service life of the grinding disc. | 05-26-2016 |
20160375556 | ABRASIVE PARTICLES HAVING PARTICULAR SHAPES AND METHODS OF FORMING SUCH PARTICLES - A coated abrasive article comprising a backing, an adhesive layer disposed in a discontinuous distribution on at least a portion of the backing, wherein the discontinuous distribution comprises a plurality of adhesive contact regions having at least one of a lateral spacing or a longitudinal spacing between each of the adhesive contact regions; and at least one abrasive particle disposed on each adhesive contact region, the abrasive particle having a tip, and there being at least one of a lateral spacing or a longitudinal spacing between each of the abrasive particles, and wherein at least 65% of the at least one of a lateral spacing and a longitudinal spacing between the tips of the abrasive particles is within 2.5 standard deviations of the mean. | 12-29-2016 |