Entries |
Document | Title | Date |
20080233850 | ABRASIVE ARTICLE AND METHOD OF MAKING AND USING THE SAME - An abrasive article comprises a porous abrasive member, a nonwoven filter medium, a second nonwoven filter medium, and optionally a porous attachment layer. A plurality of openings in the porous abrasive member cooperates with the first nonwoven filter medium to allow the flow of particles from an outer abrasive surface of the porous abrasive member to the second nonwoven filter medium. Methods of making and using the abrasive articles are included. | 09-25-2008 |
20080268760 | Method and Apparatus for Improved Chemical Mechanical Planarization Pad with Pressure Control and Process Monitor - A pad for CMP operations includes a guide plate having a plurality of holes therein and being affixed to a compressible under-layer; and a plurality of pressure-sensing and process monitoring polishing elements each affixed to the compressible under-layer and passing through a corresponding hole in the guide plate so as to be maintained in a substantially vertical orientation with respect to the compressible under-layer but being translatable in a vertical direction with respect to the guide plate. | 10-30-2008 |
20090181608 | POLISHING PAD AND FABRICATING METHOD THEREOF - A method of fabricating a polishing pad for polishing an article is described. The method includes providing a semi-finished polishing pad and then forming a moving track on the surface of the semi-finished polishing pad. The moving track substantially coincides with a polishing track of the article on the polishing pad. | 07-16-2009 |
20090253357 | HAND CARRIER FOR GRINDING MATERIAL - The invention describes a hand carrier for grinding material with a grinding area ( | 10-08-2009 |
20090270019 | POLISHING PAD COMPOSITION AND METHOD OF MANUFACTURE AND USE - Polishing pads for use in chemical mechanical planarization (CMP) or polishing elements/surfaces of such pads are made from a combination of immiscible polymers, for example polyurethane and polyolefin. The polymers are selected on the basis of interfacial interaction, melt index and ratios of melt indices between the polymer phases—a matrix phase and a dispersed phase. By selecting the polymer system such that the two polymers are immiscible in one another and preferentially form separate domains; the dispersed phase can be removed when conditioning or polishing processes expose it. The melt index of individual polymers and the ratio of melt indices determines dispersability of a smaller phase into the matrix, hence the phase size. | 10-29-2009 |
20100009610 | NON-MOTORIZED HAND MANIPULATABLE SURFACE MODIFYING TOOL AND METHOD OF CONVERTING THE SAME - Disclosed is a non-motorized hand manipulatable surface modifying tool and method that facilitates improved surface modifying efficiency and ease of conversion to any one of several different surface treating assemblies. Included is a generally lightweight, low density supporting body assembly made of a block of generally rigid plastic foam material that is sized and shaped to allow a user to manipulate the tool by hand to modify a surface while retaining its shape under hand applying pressure; and a generally flexible surface modifying article. | 01-14-2010 |
20100068981 | Foam Buffing Pad with Compressed Foam Face - A polymeric foam buffing pad is made from a foam preform that has a convex outer working surface slit and compressed. Preferably, the working face is slit to form a pattern of foam fingers. The slit convex preform is flattened to place the outer working surface in compression and the flattened pad is attached, in use, to a flat backing surface to maintain the compressed surface state. The invention can also be applied to an unslit preform. | 03-18-2010 |
20100105302 | POLISHING PAD CONDITIONER - Embodiments of the present invention generally provide an improved conditioning module and conditioning disks for improved pressure distribution during the process of conditioning a polishing pad of a chemical mechanical polishing (CMP) system. In one embodiment, a conditioning module comprising multiple, small conditioning disks is provided. In one embodiment, a conditioning disk having a compliant backing member is provided. In one embodiment, the compliant backing member comprises a semi-rigid backing member cut into a spiral shape to provide compliancy. In another embodiment, the compliant backing member comprises a fluid-pressurized, flexible membrane. Each embodiment of the present invention provides an improved pressure distribution across the face of each conditioning disk, resulting in increased disk life as well as increased conditioning rate and uniformity. | 04-29-2010 |
20100210197 | POLISHING PAD - A polishing pad which suppresses occurrence of a scratch or a roll-off on an object to be polished so that flatness is improved is provided. A polishing pad | 08-19-2010 |
20100248601 | ABRASIVE ARTICLES - The subject invention provides abrasive articles for finely polishing surfaces, particularly ceramic containing surfaces. An abrasive article formed in accordance with the subject invention includes a metallic support scaffold having an open, three-dimensional plexus of metallic elements; and, diamond powder interspersed in the plexus. Advantageously, with the subject invention, average surface roughnesses (Ra) of less than about 20 nanometers can be achieved, and more preferably, average surface roughnesses (Ra) of less than about 10 nanometers can be achieved. Also, average surface roughnesses (Ra) of about 7 to 12 nanometers have been repeatedly achieved. Although the subject invention may have applicability in various areas, it is particularly well-suited for use with ceramic containing prosthetic implants, which benefit greatly from very fine surfaces. | 09-30-2010 |
20110039483 | Apparatus and Composition for Sharpening a Paper Shredder Blade, and Preparation Process Therefor - Composition, apparatus, and methods of composition and apparatus manufacture, for sharpening a paper shredder blade. Composition includes grinding powder, thickening agent, and additive. The thickening agent may be a white oil, an animal oil, an vegetable oil, or a stearine wax. The additive may be an antirust powder, an antiwear powder, an antistatic powder, or an antioxidation powder. The grinding composition is dispensed into a polyethylene film, and sealed to form the grinding apparatus, as a grinding sheet or a grinding packet. A method for forming a grinding sheet includes selecting the constituent materials for a grinding composition; stirring the constituent grinding composition materials; heating the constituent materials to melting; mixing the constituent materials, while melting and intermixing; cooling and packaging the grinding composition to form a grinding sheet or packet. | 02-17-2011 |
20110097979 | Fusion Bonded Epoxy Removal Tool - A tool for removing fusion bonded epoxy coating from the surface of a pipe has an elongate rotatable shaft suitable for being received in a rotating tool holder of a machine. Extending radially outward of the distal end of the shaft are a plurality of fingers, the outer ends of which are spaced apart. Each of the fingers is made of a spring metal, and at the distal end of each finger is an abrasive pad having diamond particles embedded in soft metal. Spring force is independently applied by each spring finger to its associated abrasive pad. | 04-28-2011 |
20110104998 | TOOL FOR POLISHING CONVENTIONAL AND FREE-FORM OPTICAL SURFACES - A tool for polishing optical surfaces including a rigid base having a spherical surface which carries a resilient cushion with a polishing face. The diameter of the rigid base is between 50 and 65 mm, the radius of curvature of the spherical surface is between 54 and 60 mm, the thickness of the resilient cushion is between 13 and 16 mm and the resistance to compression of the resilient cushion is substantially between 0.08 and 0.15 bar at 10% compression and substantially between 0.55 and 0.8 bar at 70% compression. The tool can be used for polishing an optical surface, particularly an ophthalmic lens, and more particularly a free-form lens. | 05-05-2011 |
20110124274 | DRYWALL SANDER - A drywall sander includes a replaceable sanding pad having a layer of resilient material, and an abrasive surface. The sanding pad includes one or more edge portions that project beyond the edges of a sander head. The edges of the sanding pad can be deformed during use when the sander is used in a corner or the like to thereby prevent scuffing or other damage to adjacent orthogonal surfaces. | 05-26-2011 |
20110130080 | FLEXIBLE, FLAT SUBSTRATE WITH AN ABRASIVE SURFACE - Flexible, sheet-like substrates having an abrasive surface, which are obtainable by applying an aqueous solution or dispersion of at least one precondensate of a heat-curable resin to the top and/or bottom of a flexible, sheet-like substrate in an amount in the range from 0.1 to 90% by weight, based on the uncoated, dry substrate, crosslinking the precondensate and drying the treated substrate, wherein the aqueous solution or dispersion of at least one precondensate of a heat-curable resin comprises (i) a polymeric thickener selected from the group consisting of biopolymers, associative thickeners and wholly synthetic thickeners in an amount ranging from 0.01% by weight to 10% by weight and optionally (ii) a curative that catalyzes further condensation of the heat-curable resin at from about 60° C. | 06-02-2011 |
20110151758 | Finger Adhesible Abrasive Pad - A finger adhesible abrasive pad that comprises an abrasive layer, a substantially planar substrate for the abrasive layer which is made of flexible material, an adhesive layer applied to the underside of the substrate, and a peelable layer applied to the adhesive layer. The abrasive pad is attachable to a fingertip by means of the adhesive layer prior to the commencement of a sanding operation. | 06-23-2011 |
20110171890 | POLISHING PAD AND METHOD FOR MANUFACTURING THE POLISHING PAD - A polishing pad is disclosed which is less likely to cause scratches, and has an excellent planarization performance and polishing stability. In one aspect, the invention provides a polishing pad comprising an ultrafine fiber-entangled body formed of ultrafine fibers having an average fineness of 0.01 to 0.8 dtex, and a polymeric elastomer. The polymeric elastomer has a glass transition temperature of −10° C. or below, storage moduli at 23° C. and 50° C. of 90 to 900 MPa, and a water absorption ratio, when saturated with water at 50° C., of 0.2 to 5 mass %. | 07-14-2011 |
20110212672 | Flexible Membrane for Carrier Head - A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion, wherein a junction between the main portion and the outer annular portion comprises a peripheral edge hinge and an annular recess above the hinge along the outer wall of the outer annular portion. | 09-01-2011 |
20110256817 | POLISHING PAD AND METHOD FOR PRODUCING SAME - An object of the invention is to provide a polishing pad that achieves a high polishing rate and has high thickness precision so that the break-in time (dummy polishing time) can be shortened, and to provide a method for producing same. The invention is directed to a polishing pad including a base material layer and a polishing layer provided on the base material layer, wherein the polishing layer includes a thermoset polyurethane foam having roughly spherical interconnected cells with an average cell diameter of 35 to 200 μm, and the polishing layer has a storage modulus E′ (40° C.) of 130 to 400 MPa at 40° C., a ratio of storage modulus E′ (30° C.) at 30° C. to storage modulus E′ (60° C.) at 60° C. [E′(30° C.)/E′(60° C.)] of 1 to less than 2.5, and a ratio of storage modulus E′ (30° C.) at 30° C. to storage modulus E′ (90° C.) at 90° C. [E′(30° C.)/E′(90° C.)] of 15 to 130. | 10-20-2011 |
20120028551 | SCRAPER ASSEMBLY - The invention pertains to a novel scraper assembly having a plurality of interchangeable scraper heads and handles and corresponding method for use. The scraper assembly further comprises a plurality of abrasive mechanisms, namely spring bristles, coiled springs, chainmail abraders and wire cloth abraders capable of effectively cleaning a surface without scoring or otherwise damaging the surface. The invention may be particularly useful for cleaning grills and ovens. Additionally, the invention may also be useful for shaping, adding texture to, stripping materials from or otherwise preparing a surface, including wood, metal or ceramic surfaces. | 02-02-2012 |
20120064809 | TUFTED BUFFING PAD - A buffing pad is comprised of a hub with a central opening for attaching the same to a power buffer. The pad includes a layer of tufted wool or other fibrous buffing medium spaced from but surrounding the hub and a block of material such as a cylindrical block of foam positioned between the fibrous buffing medium and the hub. The block of material includes an aperture therethrough that is in alignment with the central opening in the hub. The dimensions of the block of material are such as to prevent tufts of the fibrous buffing medium from entering the central opening of the hub and interfering with the ability of the buffing pad to be attached to the power buffer. | 03-15-2012 |
20120083191 | POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION - Polishing pads for polishing semiconductor substrates using eddy current end-point detection are described. Methods of fabricating polishing pads for polishing semiconductor substrates using eddy current end-point detection are also described. | 04-05-2012 |
20120083192 | HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION - Homogeneous polishing pads for polishing semiconductor substrates using eddy current end-point detection are described. Methods of fabricating homogeneous polishing pads for polishing semiconductor substrates using eddy current end-point detection are also described. | 04-05-2012 |
20120115404 | Handheld, Portable Drum Sander - A hand held drum sander is disclosed. The sander is a self-contained power driven device having a novel method of driving and supporting the sanding drum and retaining the sanding substrate. The present invention relates to a device for the finishing of irregular shape objects by using a drum sander. | 05-10-2012 |
20120122381 | Silicate Composite Polishing Pad - The invention provides a polishing pad useful for polishing at least one of semiconductor, magnetic and optical substrates. It includes a polymeric matrix having a polishing surface. Polymeric microelements are distributed within the polymeric matrix and at the polishing surface of the polymeric matrix. Silicate-containing regions distributed within each of the polymeric microelements coat less than 50 percent of the outer surface of the polymeric microelements. Less than 0.1 weight percent total of the polymeric microelements are associated with i) silicate particles having a particle size of greater than 5 μm; ii) silicate-containing regions covering greater than 50 percent of the outer surface of the polymeric microelements; and iii) polymeric microelements agglomerated with silicate particles to an average cluster size of greater than 120 μm. | 05-17-2012 |
20120122382 | Method for Manufacturing a Flexible Abrasive Disc, and a Flexible Abrasive Disc - The present invention relates to a method for manufacturing a flexible abrasive disc, and to such an abrasive disc. The abrasive disc comprises a backing with an upper side and a lower side. The upper side has an abrasive agent coating for forming a surface layer. In order to form a surface layer as specifically patterned as possible, the backing of each abrasive disc is coated separately. In this manufacturing method, the abrasive agent coating on the upper side of the backing is embossed with an embossing mold specially structured and to be pressed against the backing. | 05-17-2012 |
20120202409 | TWO-COMPONENT URETHANE RESIN COMPOSITION FOR POLISHING PAD, POLYURETHANE POLISHING PAD, AND METHOD FOR PRODUCING POLYURETHANE POLISHING PAD - The present invention relates to a two-component urethane resin composition for a polishing pad including a base resin containing an isocyanate group-terminated urethane prepolymer (A) and a curing agent containing an isocyanate group reactive compound (B), and characterized in that the prepolymer (A) is a prepolymer having an isocyanate group equivalent of 250 to 700 and being produced by reacting a polyisocyanate (a1) with an aromatic polyester polyol (a2) and a polyether polyol (a3) which are used as polyol components in combination at a mass ratio of (a2)/(a3)=5/95 to 70/30, and the aromatic polyester polyol (a2) has 2 to 11 aromatic rings in its molecular chain, and also relates to a polyurethane polishing pad using the resin composition and a method for producing a polyurethane polishing pad. | 08-09-2012 |
20120258652 | ROTARY BUFFING PAD - Provided is a flat-faced buffing pad that includes a plurality of apertures of variable size. The apertures are generally larger in the areas toward the center of the pad, while being generally smaller in the areas toward the periphery of the pad. Some embodiments further include apertures disposed along one or more concentric circular rings located along the front surface and generally symmetrical about the rotation axis. These configurations of apertures provide both superior cut performance and superior finish. Moreover, these configurations minimize several undesirable aspects in a polishing operation, such as slinging of the polishing compound, vibration, wobbling, and drag felt by the operator as the rotary pad slides across the surface to be polished. | 10-11-2012 |
20130137349 | POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE LAYER - Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of grooves disposed therein. A continuous polishing surface layer is attached to the pattern of grooves of the foundation layer. In another example, a polishing pad for polishing a substrate includes a foundation layer with a surface having a pattern of protrusions disposed thereon. Each protrusion has a top surface and sidewalls. A non-continuous polishing surface layer is attached to the foundation layer and includes discrete portions. Each discrete portion is attached to the top surface of a corresponding one of the protrusions of the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a grooved foundation layer are also described. | 05-30-2013 |
20130244553 | REPLACEABLE FINE MACHINING MEMBRANE, STATIONARY FINE MACHINING TOOL, AND METHOD FOR PRODUCING A REPLACEABLE FINE MACHINING MEMBRANE - The invention relates to a replaceable fine machining membrane ( | 09-19-2013 |
20130252519 | SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME - The present invention is directed to a self conditioning polishing pad. The self-conditioning polishing pad comprises an insoluble polymeric foam matrix and insoluble polymeric foam particles within the foam matrix. The particles are coated with a water-soluble component over a portion of the surface area of the particle. The particles may have a diameter in the range of 5 to 1000 microns in diameter. | 09-26-2013 |
20130280994 | ABRASIVE ARTICLE HAVING MULTI-DIRECTIONAL ABRASION PROTRUSION - An abrasive article having a multi-directional abrasion protrusion according to an exemplary embodiment of the present invention includes a flexible base substrate, and a plurality of abrasion protrusions integrally molded with the base substrate and having at least three sides forming a triangle, in which a plurality of abrasion protrusions has a directional property by grouping. | 10-24-2013 |
20130303061 | Alkaline-Earth Metal Oxide-Polymeric Polishing Pad - The invention provides a polishing pad useful for polishing at least one of semiconductor, magnetic and optical substrates. The polishing pad includes a polymeric matrix, the polymeric matrix having a polishing surface. In addition, polymeric microelements are distributed within the polymeric matrix and at the polishing surface of the polymeric matrix. The polymeric microelements have an outer surface and being fluid-filled for creating texture at the polishing surface. And alkaline-earth metal oxide-containing regions are distributed within each of the polymeric microelements paced to coat less than 50 percent of the outer surface of the polymeric microelements. | 11-14-2013 |
20130344784 | COATED ABRASIVE ARTICLE WITH FOAM BACKING AND METHOD OF MAKING - A polyurethane foam backing suitable for making a coated abrasive article is disclosed. The polyurethane foam backing has a textured surface bearing an array of raised features and land areas. The array's geometry is designed such that a 90 degree peel force to remove a production tooling having a contacting surface bearing a plurality of microreplicated mold cavities from the textured surface is accept able. | 12-26-2013 |
20140179206 | METHOD FOR PRODUCING A COATED GRINDING MEANS, COATING GRINDING MEANS, AND USE OF A COATED GRINDING MEANS - A method for producing a coated abrasive includes producing or providing an intermediate abrasive product that comprises a substrate, a plurality of abrasive grains that are bonded to the substrate, and at least one layer of an uncured size coat that at least partially covers the abrasive grains with the uppermost size coat being uncured. The method further includes applying at least one grinding additive to the uppermost, uncured size coat with the grinding additive applied to the size coat in dry form. The method also includes curing the uppermost size coat. A coated abrasive is produced by the method and the coated abrasive is used to process a surface. | 06-26-2014 |
20140287663 | Multilayer Polishing Pads Made by the Methods for Centrifugal Casting of Polymer Polish Pads - A method for making a multilayer polishing pad includes rotating a cylinder about a central axis. The cylinder encloses in an interior space a single polymer mixture that phase separates under centrifugal force. The method also includes forming the polishing pad from at least some of a polymer formed after the polymer mixture has reacted. The method includes forming at least two distinct layers in the polishing pad by casting and gelling sequentially at least two different polymers. | 09-25-2014 |
20150133039 | POLISHING PAD AND METHOD FOR MANUFACTURING SAME - Polishing pad and method of manufacturing the same, the method, whereby materials for forming a polishing layer are mixed and solidified by a chemical reaction so as to manufacture the polishing pad, the method including: grinding organic materials by using a physical method so as to form micro-organic particles; mixing the micro-organic particles formed in the operation with the materials for forming the polishing layer; mixing at least one selected from the group consisting of inert gas, a capsule type foaming agent, and a chemical foaming agent that are capable of controlling sizes of pores, with the mixture in the operation so as to form gaseous pores; performing gelling and hardening of the mixture generated in the operation so as to form a polishing layer; and processing the polishing layer so as to distribute open pores defined by opening gaseous pores on a surface of the polishing layer. | 05-14-2015 |
20160151876 | METHODS OF POLISHING SAPPHIRE SURFACES | 06-02-2016 |
20220134511 | ABRASIVE SEGMENT FOR AN ABRASIVE ROLL, GRINDING MACHINE, AND USE - An abrasive segment includes a carrier body for attaching the abrasive segment to a lateral surface of an abrasive roll in an interlocking manner; and a substantially planar abrasive layer. The abrasive layer is oriented substantially parallel to the lateral surface of the abrasive roll in a state of the abrasive segment in which it is attached to the abrasive roll, and an elastic intermediate layer is located between the carrier body and the abrasive layer. | 05-05-2022 |