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Liquid crystal component

Subclass of:

438 - Semiconductor device manufacturing: process

438022000 - MAKING DEVICE OR CIRCUIT EMISSIVE OF NONELECTRICAL SIGNAL

438029000 - Including integrally formed optical element (e.g., reflective layer, luminescent material, contoured surface, etc.)

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DocumentTitleDate
20130040409IN-PLANE SWITCHING MODE LIQUID CRYSTAL DISPLAY AND METHOD FOR FABRICATING THE SAME - A method for fabricating an in-plane switching (IPS) type liquid crystal display (LCD) device according to an embodiment includes forming gate lines arranged in a first direction and data lines arranged in a second direction substantially perpendicular to the first direction, the gate lines and the data lines defining pixel regions on an array substrate; forming a storage electrode on the array substrate; forming common electrodes extending across each pixel region; forming pixel electrodes arranged to be substantially parallel to the common electrodes, the common electrodes and the pixel electrodes being alternately arranged to generate an in-plane field in each pixel region; and forming thin film transistors (TFTs) at intersection areas of the gate lines and the data lines, each TFT including a source electrode connected to the corresponding data line, a drain electrode connected to the corresponding pixel electrode and a gate electrode.02-14-2013
20120184058LlQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING THE SAME - The present invention provides a thin film transistor having high performance in a liquid crystal display, and a manufacturing method of a liquid crystal display according to an exemplary embodiment of the present invention that includes: forming a gate line including a gate electrode on a substrate; forming a gate insulating layer on the gate line; forming a data line including a source electrode and a drain electrode facing the source electrode on the gate insulating layer; forming a partition defining a pixel area and having an opening region exposing the gate insulating layer on the gate electrode, the source electrode and the drain electrode on the gate line, and the data line and the drain electrode; forming a semiconductor in the opening region; forming a color filter in the pixel area defined by the partition; and forming a pixel electrode connected to the drain electrode on the color filter.07-19-2012
20100159623Method for fabricating a liquid crystal display device and an LCD device thereby - A method for fabricating a LCD having enhanced aperture ratio and brightness includes: forming a gate line, a gate electrode, a common electrode and a common line in a first mask process; depositing a gate insulating layer covering the gate line, the gate electrode and the common electrode; forming an active layer on the gate insulating layer, and an ohmic contact layer on the active layer in a second mask process; forming a data line, a source electrode, and a drain electrode facing the source electrode in a third mask process; depositing a protective layer over the data line, the source electrode and the drain electrode; forming a pixel contact hole in a fourth mask process; and forming a pixel electrode, wherein the pixel electrode is connected to the drain electrode through the pixel contact hole in a fifth mask process using a reverse tapered photo-resist pattern.06-24-2010
20100151607Liquid Crystal Electro-Optic Device - In a horizontal electric field drive type liquid crystal electro-optic device wherein a liquid crystal material is driven by controlling the strength of an electric field parallel to a substrate, noncontinuity of the electric field strength around each pixel electrode is minimized and thereby the occurrence of flaws in the orientation of the liquid crystal material and dispersion in operation are reduced and a construction having improved display characteristics and a method of manufacturing the same are provided. In a horizontal electric field drive type liquid crystal electro-optic device wherein a gate electrode 06-17-2010
20110195534Liquid Crystal Display Device and a Manufacturing Method of the Same - A four-mask process and a three-mask process proposal are constructed for a TN-type liquid crystal display device and an IPS-type liquid crystal device in which the formation of a passivation insulating layer is not required by streamlining the formation of a scan line and a pseudo-pixel element, both comprising a laminate made of a transparent conductive layer and a metal layer, at the same time and the formation of the transparent conductive pixel electrode by removing the metal layer on the pseudo-pixel electrode at the time of the formation of the opening in the gate insulating layer, by streamlining the treatment of the formation process of the contact and the formation process of the protective insulating layer using one photomask due to the introduction of half-tone exposure technology, and the formation of source-drain wires for etch-stop type insulating gate-type transistor using a photosensitive organic insulating layer and leaving the photosensitive organic insulating layer unchanged on source-drain wires or on the source wire (signal line), or by forming an anodized layer, which is an insulating layer, on source-drain wires.08-11-2011
20100112738FFS MODE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - A liquid crystal display device and method of fabricating the device where the device can control a viewing angle in all directions without forming a white pixel. The liquid crystal display device includes a display control region that is controlled such that liquid crystal molecules are inclined and a viewing-angle control region that is controlled such that liquid crystal molecules are aligned in a horizontal or vertical direction, where a control voltage is supplied through a viewing angle control line independent of a common line for the display control region.05-06-2010
20100112737METHOD FOR FORMING PIXEL STRUCTURE OF TRANSFLECTIVE LIQUID CRYSTAL DISPLAY DEVICE - A forming method of the present invention includes forming a first patterned conductive layer, which includes a transparent conductive layer and a metal layer stacked together on a substrate, where the first patterned conductive layer functions as gate lines, gate electrodes, common lines and predetermined transparent pixel electrode structures; and forming a second patterned conductive layer on the substrate. The second patterned conductive layer includes data lines and reflective pixel electrodes, and be directly connected to doping regions, such as source regions/drain regions. According to the forming method of the present invention, pixel structures of a transflective liquid crystal display device can be formed through five mask processes. Therefore, the manufacturing process of the transflective liquid crystal display device is effectively simplified, so the product yield is improved and the cost can be reduced.05-06-2010
20100075450METHOD FOR MANUFACTURING ARRAY SUBSTRATE OF LIQUID CRYSTAL DISPLAY - A method for manufacturing an array substrate of liquid crystal display comprising the following steps: providing a substrate having gate lines, a gate insulating layer and an active layer pattern formed thereon in this order; depositing a first transparent conductive layer and a source/drain metal layer in this order on the substrate; forming a photoresist pattern layer on the source/drain metal layer through a triple-tone mask; performing a wet-etching process on the source/drain metal layer and the first transparent conductive layer exposed from the photoresist pattern layer; performing a first ashing process on the photoresist pattern layer and performing a dry-etching process on the source/drain metal layer, the first transparent conductive layer and the active layer pattern exposed by the first ashing process; performing a second ashing process on the photoresist pattern layer and performing a wet-etching process on the source/drain metal layer exposed by the second ashing process; and removing the remaining photoresist pattern layer. According to the invention, the over-etching on the TFT channel region can be reduced and the display quality of the liquid crystal display can be ensured.03-25-2010
20100075449METHOD OF FORMING AMORPHOUS SILICON LAYER AND METHOD OF FABRICATING LCD USING THE SAME - Methods and systems for forming an amorphous silicon layer are disclosed for one or more embodiments. For example, a substrate may be provided, and an amorphous silicon layer, in which a ratio of Si—H to Si—H03-25-2010
20100330718Method of manufacturing liquid crystal display device - A method of manufacturing an LCD device is disclosed. The LCD device manufacturing method includes: forming first and second active patterns on P-channel and N-channel thin film transistor formation regions of a substrate using a first masking process, respectively; forming a first gate electrode on the P-channel thin film transistor formation region of the substrate using a second masking process; forming a second gate electrode on the N-channel thin film transistor formation region of the substrate using a third masking process; forming first contact holes partially exposing the respective N and P source regions and second contact holes partially exposing the respective N and P drain regions, using a fourth masking process; forming N and P source electrodes connected to the N and P source regions, and N and P drain electrodes connected to the N and P drain regions, using a fifth masking process; simultaneously forming third contact holes and a common electrode using a sixth masking process; forming fourth contact holes, which expose the respective N and P drain electrodes, using a seventh masking process; and forming a pixel electrode using a eighth masking process.12-30-2010
20130029442Liquid Crystal Display and Method for Manufacturing the Same - A liquid crystal display includes a substrate and a display region on the substrate. The display region has one or more gate lines; a gate insulating layer; a semiconductor layer; one or more pairs of source and drain electrodes, each pair being one source electrode and one corresponding drain electrode; and one or more data lines, each comprising one or more of the source electrodes. A passivation layer overlies the data lines and the drain electrodes and has a plurality of contact holes; and one or more color filters overlie the passivation layer and have a plurality of through holes. In the display region, in top view, the semiconductor layer has the same shape as the data lines and the drain electrodes except over each region between each source and corresponding drain electrode, and the contact holes' edges are aligned with the through holes' edges.01-31-2013
20130029441METHODS FOR MANUFACTURING THIN FILM TRANSISTOR ARRAY SUBSTRATE AND DISPLAY PANEL - The present invention provides methods for manufacturing a thin film transistor (TFT) array substrate and a display panel. The method for manufacturing the TFT array substrate comprises the following steps: forming a plurality of gate electrodes, a gate insulating layer, a semiconductor layer, an ohmic contact layer, an electrode layer and a photo-resist layer on a transparent substrate in sequence; using a multi tone mask to pattern the photo-resist layer; forming a plurality of source electrodes and a plurality of drain electrodes at both sides of the channels, respectively; heating the photo-resist layer; etching the semiconductor layer; removing the photo-resist layer; forming a passivation layer on the channels, the source electrodes and the drain electrodes; and forming a pixel electrode layer on the passivation layer. The present invention can reduce an amount of the required masks in the fabrication process, and only one wet etching is required to etch the metal material on the TFT array substrate.01-31-2013
20130029443PHOTOALIGNMENT MATERIAL, DISPLAY SUBSTRATE HAVING AN ALIGNMENT LAYER FORMED USING THE SAME, AND TO A METHOD OF MANUFACTURING THE DISPLAY SUBSTRATE - A photoalignment material includes an alignment polymer, a photoalignment additive including a compound represented by the following Chemical Formula 1 and an organic solvent.01-31-2013
20100093122THIN FILM PATTERNING METHOD AND METHOD FOR MANUFACTURING A LIQUID CRYSTAL DISPLAY DEVICE - A thin film patterning method comprising: depositing a first thin film and applying a photoresist layer on the first thin film; exposing and developing the photoresist layer to define first, second and third regions, wherein the photoresist layer in the first region is thicker than that in the second region, and no photoresist layer is left in the third region; over-etching to remove the first thin film in the third region and form an over-etched region in the peripheral region of the first region; removing a part of the photoresist layer to expose the first thin film in the second region; depositing a second thin film so that the first thin film contacts the second thin film in the second region; and lifting off the photoresist layer to remove the second thin film in the first region and exposing the substrate in the over-etched region of the first region.04-15-2010
20130059404Method of Manufacturing A Semiconductor Device - At present, a forming process of a base film through an amorphous silicon film is conducted in respective film forming chambers in order to obtain satisfactory films. When continuous formation of the base film through the amorphous silicon film is performed in a single film forming chamber with the above film formation condition, crystallization is not sufficiently attained in a crystallization process. By forming the amorphous silicon film using silane gas diluted with hydrogen, crystallization is sufficiently attained in the crystallization process even with the continuous formation of the base film through the amorphous silicon film in the single film forming chamber.03-07-2013
20090269872Array substrate for liquid crystal display device and method of fabricating the same - An array substrate for a liquid crystal display (LCD) device includes a substrate including a display region and a non-display region, a driving circuit in the non-display region, at least a first thin film transistor (TFT) in the display region, a storage capacitor in the display region including a first storage electrode, a second storage electrode, and a third storage electrode, wherein the first storage electrode includes a first semiconductor layer and a counter electrode, and the third storage electrode includes a first transparent electrode pattern and a first metal pattern, a gate line and a data line crossing each other to define a pixel region in the display region, and a pixel electrode connected to the first TFT in the pixel region.10-29-2009
20120225511LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME - A liquid crystal display includes a first substrate, a gate line and first and second data lines disposed on the first substrate, a first thin film transistor connected to the gate line and the first data line, a second thin film transistor connected to the gate line and the second data line, a color filter disposed on the first substrate, a protrusion disposed on the color filter, a first pixel electrode including a first linear electrode disposed on the protrusion and connected to the first thin film transistor, a second pixel electrode including a second linear electrode disposed on the protrusion and connected to the second thin film transistor, a second substrate disposed facing the first substrate, and blue phase liquid crystal disposed between the first substrate and the second substrate.09-06-2012
20130065333METHOD AND APPARATUS FOR FORMING ALIGNMENT FILM - A method and an apparatus for forming an alignment film are disclosed, comprising: providing a substrate comprising a displaying region and a non-displaying region; spraying an alignment liquid onto the displaying region of the substrate; disposing an interference plate directly above the substrate; moving the interference plate downward in the upper surface of the substrate to a level equal to an average thickness of the alignment liquid so as to promote quick and uniform diffusion of the alignment liquid in the displaying region; and baking the uniformly diffused alignment liquid to form the alignment film. By using the interference plate to limit the height of the alignment liquid after the alignment liquid is sprayed, the thickness of the alignment film is guaranteed and uniform diffusion of the alignment liquid is promoted. This enhances the uniformity of the alignment film and improves both the displaying performance and the production efficiency.03-14-2013
20090258450METHOD FOR MANUFACTURING WIRING, THIN FILM TRANSISTOR, LIGHT EMITTING DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE, AND DROPLET DISCHARGE APPARATUS FOR FORMING THE SAME - As a semiconductor device, specifically, a pixel portion included in a semiconductor device is made to have higher precision and higher aperture ratio, it is required to form a smaller wiring in width. In the case of forming a wiring by using an ink-jet method, a dot spreads on a wiring formation surface, and it is difficult to narrow width of a wiring. In the present invention, a photocatalytic substance typified by TiO10-15-2009
20090233393LIQUID CRYSTAL DISPLAY WITH WIDE VIEWING ANGLE WITH OVERLAPPING COUPLING ELECTRODES FORMING CAPACITOR INTERCONNECTING SUB-PIXEL ELECTRODES - A method of manufacturing an active matrix substrate is presented. The method includes forming a transistor having a gate line, a semiconductor layer, an insulating layer between the gate line and the semiconductor layer, a source electrode, and a drain electrode; forming a pixel electrode comprising a first sub-pixel electrode and a second sub-pixel electrode; forming an auxiliary coupling electrode connected to the second sub-pixel electrode through a first contact hole; and forming the first sub-pixel electrode through a second contact hole connected to the drain electrode of the transistor. The auxiliary coupling electrode and the first sub-pixel electrode overlap each other such that the second sub-pixel electrode is capacitively coupled to the first sub-pixel electrode and the auxiliary coupling electrode and the electrode part form a capacitor.09-17-2009
20090233392Liquid crystal display device and fabrication method thereof - Disclosed is a liquid crystal display (LCD) device having gate and data driving elements with improved heat dissipation properties. The driving elements each have the following: a source and a drain electrode, each with contact holes that provide electrical contact with an active area formed on the driving element's substrate; multiple separate channels between the source and the drain; and a gate electrode formed crossing the multiple channels. Also formed are dummy contact holes that allow the metal of the electrodes to penetrate to a layer below the active layer without contacting it. The dummy contact hole provides a thermally conductive channel whereby heat that would otherwise build up in the channels, and degrade the performance of the driving element, is conducted through the dummy contact hole and radiated away by the electrode metal.09-17-2009
20090233391Liquid crystal display device and method of fabricating the same - A liquid crystal display device includes a plurality of gate lines and data lines crossing each other to define a plurality of pixel regions, a plurality of thin film transistors, each disposed in one of the pixel regions, and a plurality of pixel electrodes, each disposed in one of the pixel regions, wherein the thin film transistor includes at least one Ti layer.09-17-2009
20090047750THIN FILM TRANSISTOR ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF - A thin film transistor array substrate is disclosed. A gate electrode is disposed overlying a substrate. A gate dielectric layer covers the substrate and the gate electrode. A semiconductor layer is disposed overlying the gate dielectric layer, wherein the semiconductor layer comprises a channel. A source electrode electrically connects a portion of the semiconductor layer on one side of the channel, and a drain electrode electrically connects a portion of the semiconductor layer on the other side of the channel, in which the drain electrode does not overlap the gate electrode.02-19-2009
20110143469METHOD FOR MANUFACTURING WIRING, THIN FILM TRANSISTOR, LIGHT EMITTING DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE, AND DROPLET DISCHARGE APPARATUS FOR FORMING THE SAME - As a semiconductor device, specifically, a pixel portion included in a semiconductor device is made to have higher precision and higher aperture ratio, it is required to form a smaller wiring in width. In the case of forming a wiring by using an ink-jet method, a dot spreads on a wiring formation surface, and it is difficult to narrow width of a wiring. In the present invention, a photocatalytic substance typified by TiO06-16-2011
20110143468FABRICATING METHODS OF REFLECTIVE LIQUID CRYSTAL DISPLAY AND TOP-EMITTING OLED DISPLAY - Methods for forming a top-emitting organic light emitting display and a reflective type liquid crystal display are provided. The method for forming a top-emitting organic light emitting display comprises: providing a handling substrate; providing a composite layer on the handling substrate; forming an organic light emitting unit on the composite layer; and forming a top electrode on the organic light emitting unit.06-16-2011
20090170228METHOD OF FORMING PATTERN HAVING STEP DIFFERENCE AND METHOD OF MAKING THIN FILM TRANSISTOR AND LIQUID CRYSTAL DISPLAY USING THE SAME - A method of forming a pattern having a step difference and a method of making a thin film transistor and an LCD device using the method of forming the pattern. The method of forming a pattern having a step difference includes forming a first pattern having a predetermined shape in a first printing roll, rotating the first printing roll on a substrate to transfer the first pattern onto the substrate, forming a second pattern having a predetermined shape in a second printing roll, and rotating the second printing roll on the substrate onto which the first pattern is transferred, to transfer the second pattern onto the substrate.07-02-2009
20090104724Method of manufacturing liquid crystal display device - A method of manufacturing a liquid crystal display device which includes pixel electrodes and common electrodes which are alternatively arranged in each pixel defined on a substrate, including the steps of: forming a conductive film on the substrate; forming a mask layer, of which etching selection ratio is different from the conductive layer, on the conductive layer; forming a photo-resist pattern of a fixed pattern on the mask layer; forming a mask pattern, which has an undercut shape to the photo-resist pattern, by etching the mask layer by use of the photo-resist pattern as an etching mask; removing the photo-resist pattern; and etching the conductive film by use of the mask pattern as an etching mask, to provide at least any one of the common electrode and the pixel electrode.04-23-2009
20110217801SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A high performance electric device which uses an adhesive layer over a substrate. A color filter is over a substrate, and an adhesive layer is also located over the substrate and color film. An insulating layer is over the adhesive layer, and thin film transistors cover the insulating film and the color filters. Light emitting elements cover the thin film transistors and emit light through the substrate that is through the adhesive layer and color filter. The substrate may be plastic, thus increasing the heat resistance.09-08-2011
20090098674MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - To realize high performance and low power consumption of a semiconductor device by controlling electric characteristics of a transistor in accordance with a required function. Further, to manufacture such a semiconductor device with high yield and high productivity without complicating a manufacturing process. An impurity element imparting one conductivity type is added to a semiconductor substrate in order to control the threshold voltage of a transistor included in the semiconductor device, before separating a semiconductor layer of the transistor from the semiconductor substrate and transferring the semiconductor layer to a supporting substrate that is a substrate having an insulating surface.04-16-2009
20120107982MANUFACTURING METHOD FOR ARRAY SUBSTRATE WITH FRINGE FIELD SWITCHING TYPE THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY - Disclosed is a method for manufacturing an array substrate of an FFS type TFT-LCD, comprising the steps of: forming a first transparent conductive film, a first metal film and an impurity-doped semiconductor film on a transparent substrate sequentially, and then patterning the stack of the films to form patterns including source electrodes, drain electrodes, data lines and pixel electrodes; forming a semiconductor film and patterning it to form a pattern of the impurity-doped semiconductor layer and a pattern of the semiconductor layer including TFT channels; forming an insulating film and a second metal film, and patterning the stack of the films to form patterns including connection holes of the data lines in a PAD region, gate lines, gate electrodes and common electrode lines; forming a second transparent conductive film, and patterning it to form patterns including the common electrode.05-03-2012
20100112739LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - A liquid crystal display device includes a first substrate and a second substrate facing each other, column spacers at designated areas of the second substrate, protrusions having a first height on the first substrate corresponding to portions of the column spacers, compensation patterns having a second height on the first substrate corresponding to the edges of the column spacers, the second height being lower than the first height, and a liquid crystal layer filling a gap between the first and second substrates.05-06-2010
20090148974Method for manufacturing an in-plane switching mode liquid display device - In an IPS mode LCD device and method, a plurality of sub-blocks are utilized to maintain a maximum transmittance even when a voltage above a predetermined value is applied to the device. The IPS mode LCD device includes a common electrode including a plurality of first segments and a plurality of second segments to define a plurality of blocks, wherein the plurality of first segments are formed substantially parallel to the gate line in the pixel region, and the plurality of second segments are formed substantially parallel to the data line, and connected to the first segments; and a pixel electrode including a plurality of third segments and at least one fourth segment, and being connected with a drain electrode of the thin film transistor, wherein each of the third segments is positioned between the first segments, and the at least one fourth segment connects the third segments.06-11-2009
20090148973METHOD OF FABRICATING PIXEL STRUCTURE OF LIQUID CRYSTAL DISPLAY - A method of fabricating a pixel structure of liquid crystal display is described. A transparent conductive layer and a first metal layer are formed over a substrate sequentially. The first metal layer and the transparent conductive layer are patterned to form a gate pattern and a pixel electrode pattern. A gate insulating layer and a semiconductor layer are formed over the substrate sequentially. A patterning process is performed to preserve the semiconductor layer and the gate insulating layer above the gate pattern and remove the first metal layer of the pixel electrode pattern. A second metal layer is formed over the substrate. The second metal layer is patterned to form a source pattern and a drain pattern. A black material layer is formed over the substrate, and then the black material layer is patterned to form a black matrix pattern uncovering the transparent conductive layer of the pixel electrode pattern.06-11-2009
20110263057Active Array Substrate, Liquid Crystal Display Panel, and Manufacturing Method Thereof - An active array substrate, liquid crystal display panel, and manufacturing method thereof are provided. The active array substrate includes a base, a plurality of scan lines disposed on the base, a plurality of data lines perpendicular to the scan lines, a plurality of pixel electrodes, a plurality of active devices, in which each active device is connected to the corresponding scan line, data line and pixel electrode to form a pixel region. The height adjust structure, disposed on the active device, the data line or the scan line, can be shaped into a circle, circle-like shape, ellipse, a compact pattern without any acute angle or a compact pattern without any right angle.10-27-2011
20090142867METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - The number of photomasks is reduced in a method for manufacturing a liquid crystal display device which operates in a fringe field switching mode, whereby a manufacturing process is simplified and manufacturing cost is reduced. A first transparent conductive film and a first metal film are sequentially stacked over a light-transmitting insulating substrate; the first transparent conductive film and the first metal film are shaped using a multi-tone mask which is a first photomask; an insulating film, a first semiconductor film, a second semiconductor film, and a second metal film are sequentially stacked; the second metal film and the second semiconductor film are shaped using a multi-tone mask which is a second photomask; a protective film is formed; the protective film is shaped using a third photomask; a second transparent conductive film is formed; and the second transparent conductive film is shaped using a fourth photomask.06-04-2009
20110039361LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - A liquid crystal display device includes a plurality of gate lines and data lines crossing each other to define a plurality of pixel regions, a plurality of thin film transistors, each disposed in one of the pixel regions, and a plurality of pixel electrodes, each disposed in one of the pixel regions, wherein the thin film transistor includes at least one Ti layer.02-17-2011
20120034721SEMI-TRANSMISSIVE-TYPE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING SAME - A semi-transmissive-type liquid crystal display device is provided which is capable of preventing an electric erosion reaction between a reflective film made of Al (aluminum) or an Al alloy and a transparent electrode film made of ITO or a like (Indium Tin Oxide) and of inhibiting occurrence of a flicker caused by a residual DC (Direct Current) voltage in the reflective film. In the semi-transmissive-type of a liquid crystal display device, a transmissive region to provide light from a backlight source and a reflective region to receive ambient light are placed in a pixel region and a transparent electrode film is formed above a reflective film formed in the reflective region on an active matrix substrate with a second passivation film being interposed between the reflective film and the transparent electrode film.02-09-2012
20090239322Method of fabricating liquid crystal display - A liquid crystal display device includes a driving circuit provided with a switching device on a liquid crystal display panel, the switching device including a plurality of thin film transistors connected in parallel and commonly interconnected using a gate electrode.09-24-2009
20100120186LIQUID CRYSTAL DISPLAY DEVICE - An object of the present invention is to provide a transflective liquid crystal display device having an excellent visibility obtained by optimizing the arrangement of a color filter, which would become a problem in the process of fabricating transparent and reflective liquid crystal display devices, for the transflective liquid crystal display device. In the present invention, the arrangement of a color filter is optimized for improving the visibility of the transflective liquid crystal display device. In addition, the structure, which allows the formation of color filters without increasing the capacitance that affects on a display, is fabricated. Furthermore, in the process of fabricating the transflective liquid crystal display device, an uneven structure is additionally formed without particularly increasing an additional patterning step for the formation of such an uneven structure.05-13-2010
20100081223ARRAY SUBSTRATE FOR A REFLECTIVE LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD FOR THE SAME - An array substrate of a reflective liquid crystal display device including gate and data lines on the substrate, a thin film transistor adjacent to where a gate line and a data line cross over each other, wherein the thin film transistor has a gate electrode, a source electrode and a drain electrode, a passivation layer with an uneven surface having curved profiles that are asymmetric over the thin film transistor, and an opaque conductive pixel electrode having a reflective surface with curved profiles that are asymmetric on the passivation layer.04-01-2010
20100081222Array substrate for a liquid crystal display device having multi-layered metal line and fabricating method thereof - An array substrate for a liquid crystal display device includes: a substrate; a gate electrode and a gate line on the substrate; a gate insulating layer on the gate electrode and the gate line; an active layer on the gate insulating layer; an ohmic contact layer on the active layer; source and drain electrodes and a data line on the ohmic contact layer, the source and drain electrodes and the data line having a multiple metal layer; a passivation layer on the source and drain electrodes and the data line; and a pixel electrode on the passivation layer.04-01-2010
20090087933Thin Film Transistor Substrate for a Liquid Crystal Display Wherein a Black Matrix Formed on the Substrate Comprises an Inner Aperture Formed Completely Within the Black Matrix - Disclosed is a thin film transistor substrate for a liquid crystal display and a method for repairing the substrate. The substrate comprises an insulating substrate; a black matrix formed on the insulating substrate having apertures in areas of pixels, shaped as a net; an insulating layer covering the black matrix; gate wiring formed on the insulating layer, the gate wiring including gate lines extended in a first direction across the substrate and gate electrodes connected to the gate lines; a gate insulating layer formed over the gate wiring; a semiconductor layer formed over the gate insulating layer; an ohmic contact layer formed over the semiconductor layer; data wiring including source electrodes and drain electrodes formed separated from each other over the ohmic contact layer, and data lines connected to the source electrodes and crossing the gate lines to define pixels; a protection layer formed over the data wiring; and pixel electrodes electrically connected to the drain electrodes. The method comprises the step of shorting the disconnected gate line and the first portion of the black matrix or the disconnected data line and the second portion of the black matrix.04-02-2009
20090087932SUBSTRATE SUPPORTING APPARATUS, SUBSTRATE SUPPORTING METHOD, SEMICONDUCTOR MANUFACTURING APPARATUS AND STORAGE MEDIUM - A substrate supporting apparatus includes a substrate supporting portion having a substrate supporting surface facing a rear surface of a substrate; plural protruding portions provided on the substrate supporting surface, for preventing the substrate from being slid on the substrate supporting surface by friction force generated in relation with the substrate; a gas discharge opening provided in the substrate supporting surface, for discharging gas toward the rear surface of the substrate; a gas flow path whose one end is connected to the gas discharge opening; and a temperature control unit for controlling temperature of the gas flowing through the gas flow path, wherein the gas discharged to the rear surface of the substrate flows in a gap between the substrate supporting surface and the substrate, and by Bernoulli effect causing reduction of pressure of the gap, the substrate is attracted to the substrate supporting portion, thereby supporting the substrate.04-02-2009
20100099211Method of forming a display panel - A method of forming a display panel includes providing a first substrate having a transparent electrode, and a second substrate having a pixel electrode. Subsequently, an alignment material is provided and covers on the transparent electrode and/or the pixel electrode, and a photoelectric twisting layer is provided between the first substrate and the second substrate. The alignment material is first in a non-aligned state, and is radiation-polymerizable. The photoelectric twisting layer does not include any radiation-polymerizable material. Thereafter, a voltage difference is applied to drive molecules of the photoelectric twisting layer, and a radiating process is performed on the alignment material. The twisted molecules of the photoelectric twisting layer induce the surface molecules of the alignment material to arrange in an ordered state, and the alignment material is polymerized according to the ordered state as a first alignment film.04-22-2010
20090142866Method for cutting liquid crystal display panel and method for fabricating liquid crystal display panel using the same - A method for cutting a liquid crystal display panel including: forming prearranged cut lines on a pair of attached mother substrates on which a plurality of panel regions have been disposed; and separating the liquid crystal display panel from a dummy glass around the liquid crystal display panel through a transfer unit which includes a body for adsorbing a liquid crystal display panel and transferring it, and a plate attached on an edge of the body, fixing and separating a dummy glass of a mother substrate from the liquid crystal display panel, and moving up and down separately from the body. A dummy removing plate is attached at an edge of a trans hand to remove a dummy glass when a breaking process-finished liquid crystal display panel is extracted, so a damage of the liquid crystal display panel due to the dummy glass can be prevented.06-04-2009
20090286340PROCESS FOR PRODUCING A LIQUID CRYSTAL CELL SUBSTRATE HAVING A TFT DRIVER ELEMENT, A LIQUID CRYSTAL CELL SUBSTRATE, AND LIQUID CRYSTAL DISPLAY DEVICE - A process for easy production of a liquid crystal cell substrate having a TFT driver element which contributes to reducing viewing angle dependence of color of a liquid crystal display device is provided: a process using a transfer material, more preferably, a process which comprises the following steps [1] to [4] in this order: [1] transferring on a TFT substrate a transfer material having a photosensitive polymer layer and an optically anisotropic layer on a temporary support; [2] separating the temporary support from the transfer material on the TFT substrate; [3] subjecting the transfer material to light exposure on the TFT substrate; and [4] removing unnecessary parts of the photosensitive polymer layer and the optically anisotropic layer on the substrate.11-19-2009
20090286341PIXEL CIRCUIT SUBSTRATE, LIQUID CRYSTAL DISPLAY APPARATUS, METHOD OF MANUFACTURING THE SAME AND PROJECTION DISPLAY APPARATUS - A pixel circuit substrate includes a first interlayer insulating film which is made of an inorganic material at least in a source and drain regions of a thin film transistor. A contact hole is formed in an area above the source and drain regions of a thin film transistor in the first interlayer insulating film. A wiring layer is formed on the first interlayer insulating film, extends to an inner wall and a bottom surface of the contact hole. On a top surface of the wiring layer is formed a recess reflecting the shape of a contact hole. A second interlayer insulating film is formed on the wiring layer, embedded in the recess and has a flat top surface in an area above the thin film transistor. A storage capacitor on the second interlayer insulating film is disposed in the area above the thin film transistor.11-19-2009
20080206911METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY - A method of manufacturing a liquid crystal display includes depositing a transparent conductive layer on a substrate, depositing a reflective conductive layer on the transparent conductive layer, forming a first photoresist film having a variable thickness on the reflective conductive layer, the variable thickness of the first photoresist film varying according to a position on the reflective conductive layer, first etching the reflective conductive layer and the transparent conductive layer using the first photoresist film as a first etch mask, forming a second photoresist film on the reflective conductive layer by baking the first photoresist film, and second etching the reflective conductive layer using the second photoresist film as a second etch mask.08-28-2008
20110171766LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING THE SAME - Disclosed is a liquid crystal display (LCD) device and a method for manufacturing the same, capable of maintaining a cell gap and preventing press defects caused by application of a predetermined external pressure via the use of ball spacers.07-14-2011
20090104725Liquid crystal display device and method for manufacturing the same - A liquid crystal display device includes first and second substrates bonded to each other, first column spacers on the first substrate, protrusions on the second substrate that contact a center portion of an upper surface of the spacers, respectively, recesses formed in the second substrate surrounding the protrusions, respectively, and a liquid crystal layer between the first and second substrates.04-23-2009
20090104723METHOD FOR MANUFACTURING DISPLAY DEVICE - Etching is performed using mask layers formed by a multi-tone mask which is a light-exposure mask through which light is transmitted to have a plurality of intensity, in a method for manufacturing a display device including an inverted staggered thin film transistor with a channel-etched structure. Further, a gate wiring layer and a source wiring layer are formed over a substrate in the same step, and the source wiring layer is separated (disconnected) at an intersection of the gate wiring layer and the source wiring layer. The separated source wiring layers are connected to each other electrically through an opening (a contact hole) via a conductive layer formed over a gate insulating layer in the same step as formation of source and drain electrode layers.04-23-2009
20090275158MANUFACTURING METHOD OF DISPLAY DEVICE - A liquid crystal display device having high quality and high reliability is manufactured by preventing the occurrence of damages on a terminal portion due to the radiation of laser beams in cutting a substrate of the display device which is formed using a plastic substrate by the radiation of laser beams. A first substrate has a cutting line at a position which faces a terminal portion of a second substrate. In cutting the first substrate along the cutting line, laser beams are radiated to the first substrate along the cutting line so as to form a groove having a predetermined depth in the first substrate. Then, a load is applied to the first substrate along the groove so as to cut the first substrate.11-05-2009
20090269873LIQUID-CRYSTAL ELECTRO-OPTICAL APPARATUS AND METHOD OF MANUFACTURING THE SAME - A liquid crystal device comprising: 10-29-2009
20090291517Liquid crystal display device and fabricating method thereof - A liquid crystal display device is provided that includes: first and second substrates; a gate line of a double layer having a first transparent conductive layer and a second opaque conductive layer on the first substrate; a first insulation film on the gate line; a data line crossing the gate line to define a pixel region, the pixel region having a transmissive area and a reflective area; a thin film transistor connected to the gate and data lines; a pixel electrode having the first conductive layer in the pixel region and a second conductive layer along the boundary of the first conductive layer; a storage upper electrode to form a storage capacitor by overlapping with the gate line the first insulation film there between; a transmission hole to expose the side of the storage upper electrode and a drain electrode of the thin film transistor by passing through the first insulation film and a second insulation film on the thin film transistor; a reflective electrode connected the second conductive layer of the pixel electrode with the drain electrode and the storage upper electrode through an edge portion of the transmission hole; and a liquid crystal layer between the first and second substrates.11-26-2009
20080286889Manufacturing method of liquid crystal display - A method of manufacturing a liquid crystal display at a reduced cost is presented. The method entails: preparing an insulating substrate; forming a gate line and a data line on the insulating substrate to define a pixel area; forming a thin film transistor at an intersection of the gate line and the data line; forming A passivation layer on the thin film transistor; positioning a mold having a concavo-convex pattern on the organic passivation layer, pressing the mold, and forming the concavo-convex pattern on the surface of the organic passivation layer. A pixel electrode on the organic passivation layer is formed.11-20-2008
20080286891Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method - A dry etching method for forming tungsten wiring having a tapered shape and having a large specific selectivity with respect to a base film is provided. If the bias power density is suitably regulated, and if desired portions of a tungsten thin film are removed using an etching gas having fluorine as its main constituent, then the tungsten wiring having a desired taper angle can be formed.11-20-2008
20080286890LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - A liquid crystal display device including a first substrate, a second substrate facing and spaced away from the first substrate, a liquid crystal layer sandwiched between the first and second substrates, a switching device formed on the first substrate, a first electrically insulating film randomly patterned on the first substrate, a second electrically insulating film covering the first electrically insulating film therewith, and having a wavy surface, and a reflection electrode formed on the second electrically insulating film, and electrically connected to an electrode of the switching device, wherein a light passing through the second substrate and the liquid crystal layer is reflected at the reflection electrode, and the second electrically insulating film extends outwardly from the first electrically insulating film by a certain length at an end of a display region in which images are to be displayed, such that a step formed by the first and second electrically insulating films in the vicinity of the end of the display region is smoothed.11-20-2008
20080293175METHOD FOR MOUNTING ANISOTROPICALLY-SHAPED MEMBERS - A mounting method of the present invention includes the steps of: (I) disposing a first liquid in a first region provided on one principal surface of a substrate; (II) bringing a pillar-like member as an anisotropically-shaped member, disposed on one principal surface of a transfer substrate in a predetermined orientation, into contact with the first liquid disposed in the first region, so as to move the pillar-like member to a region of the first liquid; and (III) removing the first liquid from the substrate.11-27-2008
20120045860LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF, AND ELECTRONIC DEVICE - An objective is simplification of a manufacturing method of a liquid crystal display device or the like. In a manufacturing method of a thin film transistor, a stack in which a first conductive film, an insulating film, a semiconductor film, an impurity semiconductor film, and a second conductive film are stacked in this order is formed, and the first conductive film is exposed by first etching and a pattern of the second conductive film is formed by second etching. Further, after thin film transistors are formed, a color filter layer is formed so that unevenness caused by the thin film transistors or the like is relieved; thus, the level difference of the surface where the pixel electrode layer is formed is reduced. Alternatively, a color filter layer is selectively formed utilizing the unevenness caused by thin film transistors or the like.02-23-2012
20090029498Manufacturing method of display device - To improve a deposition rate of a microcrystalline semiconductor layer by using a deposition method and to improve productivity of a display device including a TFT of a microcrystalline semiconductor, a reactive gas containing helium is supplied to a treatment chamber surrounded with a plurality of juxtaposed waveguides and a wall surface; a microwave is supplied to a space which is interposed between juxtaposed waveguides to generate plasma while the pressure of the treatment chamber is held at an atmospheric pressure or a sub-atmospheric pressure typically a pressure of 1×1001-29-2009
20090137077Thin film transistor array substrate and fabricating method thereof - A liquid crystal display and a fabricating method thereof for improving an aperture ratio are disclosed. A liquid crystal display (LCD) according to the present invention includes a gate line, a data line and a common line on the thin film transistor array substrate, the gate line crossing the data line to define a pixel region; a thin film transistor near the crossing of the gate line and the data line; a common electrode connected to the common line in the pixel region; and a pixel electrode connected to the thin film transistor in the pixel area for forming an in-plane electric field in association with the common electrode during an operation of the LCD, wherein an edge of the pixel electrode overlaps the common line with at least one insulating layer therebetween, and an edge of the common electrode overlaps the pixel electrode with said at least one insulating layer therebetween.05-28-2009
20100151606Method of forming array substrate for LCD - An array substrate device having a color filter-on thin film transistor (COT) structure for a liquid crystal display device includes a gate line formed on a substrate along a transverse direction, the gate line including a gate pad at one end thereof, a first insulating layer formed on the substrate to cover the gate line, the first insulating layer exposing a first portion of the gate pad, a data line formed over the first insulating layer along a longitudinal direction on the substrate, the data line defining a pixel region with the gate line and including a data pad at one end thereof, a thin film transistor formed at a crossing region of the gate and data lines, the thin film transistor including a gate electrode, a semiconductor layer, a source electrode, and a drain electrode, a black matrix overlapping the thin film transistor, the gate line, and the data line except a second portion of the drain electrode, a second insulating layer formed over an entire surface of the substrate to cover the black matrix, the second insulating layer exposing the first portion of the gate pad, a third portion of the data pad, and the pixel region, a first pixel electrode within the pixel region and contacting the second exposed portion of the drain electrode, a color filter on the first pixel electrode within the pixel region, and a second pixel electrode on the color filter and contacting the first pixel electrode.06-17-2010
20090186437SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - To provide a semiconductor device in which a defect or fault is not generated and a manufacturing method thereof even if a ZnO semiconductor film is used and a ZnO film to which an n-type or p-type impurity is added is used for a source electrode and a drain electrode. The semiconductor device includes a gate insulating film formed by using a silicon oxide film or a silicon oxynitride film over a gate electrode, an Al film or an Al alloy film over the gate insulating film, a ZnO film to which an n-type or p-type impurity is added over the Al film or the Al alloy film, and a ZnO semiconductor film over the ZnO film to which an n-type or p-type impurity is added and the gate insulating film.07-23-2009
20090053843Method of making a TFT array with photo-imageable insulating layer over address lines - This invention is related to a thin film transistor (TFT) array and method of making same, for use in an active matrix liquid crystal display (AMLCD) having a high pixel aperture ratio. The TFT array and corresponding display are made by forming the TFTs and corresponding address lines on a substrate, coating the address lines and TFTs with a photo-imageable insulating layer which acts as a negative resist, exposing portions of the insulating layer with UV light which are to remain on the substrate, removing non-exposed areas of the insulating layer so as to form contact vias, and depositing pixel electrodes on the substrate over the insulating layer so that the pixel electrodes contact respective TFT source electrodes through the contact vias. The resulting display has an increased pixel aperture ratio because the pixel electrodes are formed over the insulating layer so as to overlap portions of the array address lines.02-26-2009
20090142865LIQUID CRYSTAL DISPLAY - A liquid crystal display using a ferroelectric liquid crystal, which can give mono-domain alignment of the ferroelectric liquid crystal without forming alignment defects such as zigzag defects, hairpin defects and double domains and which is so remarkably good in alignment stability that the alignment thereof can be maintained even if the temperature of the liquid crystal is raised to the phase transition point or higher. The liquid crystal display has a ferroelectric liquid crystal sandwiched between two substrates, wherein an electrode and a photo alignment layer are each successively formed on opposite faces of the two substrates facing each other, and a constituent material of the respective photo alignment layer has a different composition with the ferroelectric liquid crystal sandwiched there between.06-04-2009
20100003776MANUFACTURING METHOD OF ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE WITH COLOR FILTER LAYER ON THIN FILM TRANSISTOR - A method of manufacturing a liquid crystal display device includes forming a gate line and a gate electrode on a substrate, forming a gate insulating layer on substantially an entire surface of the substrate, forming an active layer, an ohmic contact layer, a source electrode, a drain electrode and a data line on the gate insulating layer, forming a black matrix on the first passivation layer, forming a color filter layer on the first passivation layer in the pixel region, forming a second passivation layer on substantially an entire surface of the substrate, forming a photoresist pattern to expose the second passivation layer, removing the exposed second passivation and removing a portion of the first passivation layer contacting the second passivation layer, forming a transparent conductive layer on substantially an entire surface of the substrate, and forming a pixel electrode in the pixel region by removing the photoresist pattern and the transparent conductive layer on the photoresist pattern.01-07-2010
20100003775Method of fabricating array substrate for in-plane switching mode liquid crystal display device having double-layered metal patterns - An array substrate of an in-plane switching liquid crystal display device includes, among other features, a gate electrode and a gate line having a first double-layered structure consisting of a first barrier layer and a first low resistance metallic layer; a data line defining a pixel region with the gate line, the data line having a second double-layered structure consisting of a second barrier layer and a second low resistance metallic layer; a plurality of common electrodes disposed in a direction opposite to an adjacent gate line; a thin film transistor (TFT) near a crossing of the gate and data lines, each of the source and drain electrodes of the TFT having the same double-layered structure as the data line; and a plurality of pixel electrodes arranged in an alternating pattern with the common electrodes and disposed in the direction opposite the adjacent gate line.01-07-2010
20110229996METHOD FOR DISPOSING A COMPONENT - A method for disposing a component comprises: a step of preparing a substrate and a first liquid; preparing a component-containing liquid containing the components and a second liquid; a step of disposing the first liquid in a hydrophilic region; a step of bringing the component-containing liquid into contact with the first liquid disposed on the hydrophilic region; a step of removing the first liquid and the second liquid to dispose the component on the hydrophilic region. The hydrophilic region is composed of a component-disposing region and a liquid-capturing region formed on the periphery of the component-disposing region. The liquid-capturing region comprises a surface represented by the following chemical formula I.09-22-2011
20090191656LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An in-plane switching liquid crystal display device is designed in such a way that an angle defined by the lengthwise direction of a common electrode and a pixel electrode and a rubbing direction of an alignment layer is set to 10 to 20°, a cell gap d is set to 2.7 μm or smaller, the dielectric anisotropy Δ∈ of a liquid crystal constituting a liquid crystal layer is set to 8 to 20, a white voltage V07-30-2009
20090004764Method for manufacturing SOI substrate and method for manufacturing semiconductor device - To provide a method for manufacturing an SOI substrate provided with a single-crystal semiconductor layer which is suitable for practical use even when a substrate of which heat-resistant temperature is low, such as a glass substrate, is used, and to manufacture a highly reliable semiconductor device using such an SOI substrate. A semiconductor layer, which is separated from a semiconductor substrate and bonded to a supporting substrate having an insulating surface, is heated by supplying high energy by using at least one kind of particles having the high energy, and polishing treatment is performed on the heated surface of the semiconductor layer. At least part of a region of the semiconductor layer can be melted by the heat treatment by supplying high energy to reduce crystal defects in the semiconductor layer. Further, the surface of the semiconductor layer can be polished and planarized by the polishing treatment.01-01-2009
20090017569METHOD FOR FABRICATING LIQUID CRYSTAL DISPLAY DEVICE - A method for fabricating a liquid crystal display device is disclosed. The method includes forming a first conductive layer on an insulating substrate, forming a first insulating layer, a second conductive layer, and a third conductive layer on the first conductive layer, patterning the second conductive layer and the third conductive layer, such that the third conductive layer is located on a partial region of the second conductive layer and a partial region of the third conductive layer adjacent to the first conductive layer is removed, forming a second insulating layer on the patterned third conductive layer, forming a first contact hole to expose the first conductive layer by patterning the first and second insulating layers, and a second contact hole to expose the third conductive layer by patterning the second insulating layer, and forming a fourth conductive layer to connect the first and third conductive layers with each other by way of the first and second contact holes.01-15-2009
20090117677Rubbing system for alignment layer of LCD and method thereof - A rubbing system for an alignment layer of a liquid crystal display (LCD) device, comprises: a rubbing table on which a substrate having an alignment layer thereon is positioned; a rubbing roll on which a rubbing material is wound, substantially positioned on the rubbing table thus to substantially contact the alignment layer, for rubbing the alignment layer by rotation of the rubbing roll; and a controlling unit for controlling the alignment layer to be rubbed by substantially contacting the rubbing roll onto the alignment layer by simultaneously lifting and lowering a rubbing table and the rubbing roll according to an alignment controlling force to be applied to the alignment layer.05-07-2009
20080318354METHOD OF FABRICATING THIN FILM TRANSISTOR AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY - A method of fabricating a thin film transistor is provided. First, a patterned dielectric layer is formed over a substrate. A metallic layer is formed over the substrate to cover the patterned dielectric layer. Thereafter, the metallic layer is planarized until the patterned dielectric layer is exposed. The remained metallic layer serves as a gate. An insulating layer is formed over the patterned dielectric layer and the gate, and then a semiconductor layer is formed over the gate insulating layer above the gate. A source and a drain are formed over the semiconductor layer.12-25-2008
20120142128ARRAY SUBSTRATE FOR IN-PLANE SWITCHING MODE LIQUID CRYSTAL DISPLAY DEVICE HAVING DOUBLE-LAYERED METAL PATTERNS AND METHOD OF FABRICATING THE SAME - An array substrate of an in-plane switching liquid crystal display device includes, among other features, a gate electrode and a gate line having a first double-layered structure consisting of a first barrier layer and a first low resistance metallic layer; a data line defining a pixel region with the gate line, the data line having a second double-layered structure consisting of a second barrier layer and a second low resistance metallic layer; a plurality of common electrodes disposed in a direction opposite to an adjacent gate line; a thin film transistor (TFT) near a crossing of the gate and data lines, each of the source and drain electrodes of the TFT having the same double-layered structure as the data line; and a plurality of pixel electrodes arranged in an alternating pattern with the common electrodes and disposed in the direction opposite the adjacent gate line.06-07-2012
20130122621COATING METHOD FOR LIQUID CRYSTAL ALIGNMENT FILM OF TFT-LCD - A coating method for liquid crystal alignment film of TFT-LCD including: forming a layer of hydrophobic film on a TFT/CF substrate corresponding to a non-display area, the hydrophobic film separates the TFT/CF substrate into a plurality of rectangular opened areas which are separated from each other, each of the rectangular opened areas corresponds to a display area and its outer frame is formed by the hydrophobic film; and coating of a liquid of a material of an alignment film along a boundary of the rectangular opened area. Accordingly, edge waves caused by spreading of drips of the material of the alignment film can be reduced, so that a precision of printing of the alignment film can be controlled effectively.05-16-2013
20130122622TFT-LCD ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A thin film transistor liquid crystal display (TFT-LCD) array substrate comprising a gate line and a data line formed on a base substrate. The gate line and the data line intersect with each other to define a pixel region, in which a pixel electrode and a thin film transistor (TFT) are formed, and a first insulating layer and a second insulating layer are interposed between the gate line and the data line, and the pixel electrode is disposed between the first insulating layer and the second insulating layer. A method of manufacturing a TFT-LCD is also disclosed.05-16-2013
20100227425Manufacturing method of liquid crystal display device - The present invention provides a liquid crystal display device having a large holding capacitance in the inside of a pixel. A liquid crystal display device includes a first substrate, a second substrate arranged to face the first substrate in an opposed manner, and liquid crystal sandwiched between the first substrate and the second substrate. The first substrate includes a video signal line, a pixel electrode, a thin film transistor having a first electrode thereof connected to the video signal line and a second electrode thereof connected to the pixel electrode, a first silicon nitride film formed above the second electrode, an organic insulation film formed above the first silicon nitride film, a capacitance electrode formed above the organic insulation film, and a second silicon nitride film formed above the capacitance electrode and below the pixel electrode. The second silicon nitride film is a film which is formed at a temperature lower than a forming temperature of the first silicon nitride film. The first silicon nitride film and the second silicon nitride film form a contact hole therein by etching both of the first silicon nitride film and the second silicon nitride film collectively by dry etching. The second electrode and the pixel electrode are connected to each other via the contact hole. A potential different from a potential applied to the pixel electrode is applied to the capacitance electrode, and a holding capacitance is formed by the pixel electrode, the second silicon nitride film and the capacitance electrode.09-09-2010
20100210055METHOD OF FABRICATING A FLEXIBLE DISPLAY DEVICE - A method of fabricating a flexible display device. The method includes forming an adhesive layer on a first carrier substrate; laminating a first flexible substrate on the adhesive layer, so that a first separation layer of the first flexible substrate is disposed on the adhesive layer; forming a thin film transistor array on the first flexible substrate; and separating the first carrier substrate from the flexible substrate by directing a laser beam onto the first separation layer. The first separation layer comprises silicon nitride (SiNx) with amounts of nitride A1 and amounts of silicon B1 satisfying 0.18≦{A1/B1}≦0.90.08-19-2010
20100210053PHOTO MASK AND METHOD OF MANUFACTURING IN-PLANE-SWITCHING MODE LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME - A photo mask is disclosed.08-19-2010
20100144074Method of fabricating an array substrate for liquid crystal display device - A liquid crystal display device having a switching element in a pixel portion and a CMOS element in a driving portion includes: a substrate; a gate electrode on the substrate; a gate insulating layer on the gate electrode; a polycrystalline silicon layer on the gate insulating layer, the polycrystalline silicon layer having an active region in a central portion corresponding to the gate electrode and an ohmic contact region at side portions of the active region; an interlayer insulating layer having a set of contact holes for contacting the polycrystalline silicon layer at the side portions; and source and drain electrodes spaced apart from each other on the interlayer insulating layer, the source and drain electrodes contacting the polycrystalline silicon layer through the set of contact holes.06-10-2010
20100136729LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - A liquid crystal display device includes a plurality of gate lines and data lines on a first substrate defining a plurality of pixel regions, a thin film transistor within the pixel regions, a pixel electrode within the pixel regions, and at least one TiOx layer provided with the thin film transistor.06-03-2010
20090258451Liquid crystal display device - An LCD device is disclosed in which column spacers for a cell gap are arranged between gate and common lines to reduce a contact area between the column spacers and an opposing substrate, and a stable cell gap is maintained over the whole panel by reducing variation of a thickness per area of a thin film transistor (TFT) substrate corresponding to the column spacers. The LCD device includes first and second substrates facing each other, gate and data lines formed on the first substrate to cross each other, and pixel regions, a thin film transistor formed in each portion where the gate and data lines cross, common and pixel electrodes alternately formed in the pixel regions, common lines formed adjacent to the gate lines substantially parallel to the gate lines, a first column spacer formed on the second substrate corresponding to a portion between the gate line and the common line, and a liquid crystal layer filled between the first and second substrates.10-15-2009
20090148972METHOD FOR FABRICATING PIXEL STRUCTURE - A method for fabricating a pixel structure includes following steps. First, a substrate is provided. Next, a first conductive layer is formed on the substrate. Next, a first shadow mask is disposed over the first conductive layer. Next, a laser is applied through the first shadow mask to irradiate the first conductive layer to form a gate. Next, a gate dielectric layer is formed on the substrate to cover the gate. After that, a channel layer, a source and a drain are simultaneously formed on the gate dielectric layer over the gate, wherein the gate, the channel layer, the source and the drain together form a thin film transistor. A patterned passivation layer is formed on the thin film transistor and the patterned passivation layer exposes a part of the drain. Furthermore, a pixel electrode electrically connecting to the drain is formed.06-11-2009
20090111199Method of manufacturing flat panel display - The present invention relates to a method for manufacturing a flat panel display. Herein, the same mask is used to form contact holes and pixel electrodes in the display substrate. Hence, the number of masks needed for manufacturing the flat panel display can be reduced to decrease the manufacturing cost.04-30-2009
20090068777METHOD FOR MANUFACTURING PIXEL STRUCTURE - A method for manufacturing a pixel structure is provided. First, a substrate with a gate formed thereon is provided. Next, a gate dielectric layer covering the gate is formed on the substrate. Then, a channel layer, a source and a drain are formed on the gate dielectric layer over the gate. The source and the drain are disposed on a portion of the channel layer. The gate, the channel layer, the source and the drain constitute a thin film transistor. Then, a passivation layer is formed on the gate dielectric layer and the thin film transistor. After that, a laser beam is utilized to irradiate the passivation layer via a first shadow mask so as to remove a portion of the passivation layer for exposing the drain. Then, a pixel electrode is formed on the gate dielectric layer and connected to the exposed drain.03-12-2009
20110008921Method for Fabricating Flexible Display Device - A method for fabricating flexible display device includes the following steps. Firstly, a rigid substrate is provided. Secondly, a sacrificing layer is formed on the rigid substrate. Thirdly, an element layer is formed on the sacrificing layer. Fourthly, the sacrificing layer is etched by a gas and then gasified, so that the element layer is separated from the rigid substrate. Then, the element layer is adhered to a flexible substrate. Because products generated by the sacrificing layer reacting with the gas are gases, the products can be removed by air exhaust for simplifying process. Thus, the cost of the process of fabricating flexible display device can be decreased.01-13-2011
20110033963FLEXIBLE DISPLAY AND MANUFACTURING METHOD OF THE SAME - A flexible display of the present invention is an active matrix flexible display in which a TFT is provided for each pixel. In the flexible display, an adhesive layer, a protective layer, a gate electrode for the TFT, which is buried in the protective layer, a gate insulating layer for the TFT, source and drain electrodes for the TFT, a pixel electrode electrically connected to the drain electrode, an organic active layer for the TFT, an organic EL layer including a red (R) emitting layer, a green (G) emitting layer and a blue (B) emitting layer, which are formed on a plurality of the pixel electrodes, a metal electrode, and a sealing layer are formed on a plastic film.02-10-2011
20100015740Liquid crystal display device and fabricating method thereof - A liquid crystal display device, including: first and second substrates; a gate line on the first substrate; a data line crossing the gate line having a gate insulating film therebetween to define a pixel area; a pixel electrode formed of a transparent conductive film in a pixel hole passing through the gate insulating film in the pixel area; and a thin film transistor including a gate electrode, a source electrode, a drain electrode, and a semiconductor layer defining a channel between the source electrode and the drain electrode, wherein the semiconductor layer overlaps with a source and drain metal pattern including the data line, the source electrode and the drain electrode; and wherein the drain electrode protrudes from the semiconductor layer toward inside of the pixel electrode to be connected to the pixel electrode.01-21-2010
20110097834THIN FILM TRANSISTOR, DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - As a wiring becomes thicker, discontinuity of an insulating film covering the wiring has become a problem. It is difficult to form a wiring with width thin enough for a thin film transistor used for a current high definition display device. As a wiring is made thinner, signal delay due to wiring resistance has become a problem. In view of the above problems, the invention provides a structure in which a conductive film is formed in a hole of an insulating film, and the surfaces of the conductive film and the insulating film are flat. As a result, discontinuity of thin films covering a conductive film and an insulating film can be prevented. A wiring can be made thinner by controlling the width of the hole. Further, a wiring can be made thicker by controlling the depth of the hole.04-28-2011
20100068841Thin Film Transistor Array Panel and Method of Manufacturing the Same - A method of manufacturing a thin film transistor array panel is provided, which includes: forming a semiconductor layer of polysilicon on an insulating substrate; forming a gate insulating layer on the semiconductor layer; forming a gate electrode on the gate insulating layer; forming a source region and a drain region by doping conductive impurities in the semiconductor layer; forming an interlayer insulating layer covering the gate electrode; forming a source electrode and a drain electrode respectively connected to the source and the drain regions; forming a passivation layer covering the source and the drain electrodes; forming a pixel electrode connected to the drain electrode; and forming a first alignment key when forming one selected from the semiconductor layer, the gate electrode, the source and the drain electrodes, and the pixel electrode, wherein one selected from the semiconductor layer, the gate electrode, the source and the drain electrodes, and the pixel electrode is at least formed by photolithography process using a photoresist pattern as an etch mask, and a second alignment key completely covering the first alignment key is formed at the same layer as the photoresist pattern.03-18-2010
20090023236Method for manufacturing display device - A method for manufacturing display devices including thin film transistors with high reliability in a high yield is provided. A gate insulating film is formed over a gate electrode; a microcrystalline semiconductor is formed over the gate insulating film; the microcrystalline semiconductor film is irradiated with a laser beam from the surface side thereof, whereby the crystallinity of the microcrystalline semiconductor film is improved. Then, a thin film transistor is formed using the microcrystalline semiconductor film whose crystallinity is improved. Further, a display device including the thin film transistor is manufactured.01-22-2009
20100055817METHOD OF MANUFACTURING ARRAY SUBSTRATE OF HORIZONTAL ELECTRIC FIELD TYPE TRANSREFLECTIVE LIQUID CRYSTAL DISPLAY - A method of manufacturing an array substrate of horizontal electric field type transreflective LCD is provided in the invention. An array substrate of liquid crystal display is obtained by using one full tone mask and two dual tone masks according to the method. Specifically, the gate line, the gate electrode and the display region are formed by using a full tone mask, the thin film transistor, the transmissive region and the reflective region on the electrode are formed by using a first dual tone mask, and the via hole and the electrode with slits are formed by using a second dual tone mask.03-04-2010
20100022042Method for fabricating an in-plane switching mode liquid crystal display device - An in-plane switching mode liquid crystal display (LCD) device, which reduces loss in transmittance and improves reflectance, and a method for fabricating the same are disclosed. The in-plane switching mode LCD device includes gate and data lines orthogonally crossing each other on a first substrate to define pixel regions having reflection portions and transmission portions; thin film transistors formed at the crossing of the gate and data lines; common electrodes formed at the transmission portions of the pixel regions; reflection electrodes formed at the reflection portions of the pixel regions; pixel electrodes formed parallel with the common electrodes at the transmission portions and formed above the reflection electrodes at the reflection portions; a second substrate facing and attached to the first substrate; a liquid crystal layer interposed between the first and second substrates; and first and second polarizing films respectively attached to outer surfaces of the first and second substrates.01-28-2010
20080254559Method of Fabricating Liquid Crystal Display Device - Provided is a method of fabricating a liquid crystal display device. The method includes fabricating a liquid crystal panel divided into transmission and non-transmission regions, and including an upper substrate and a lower substrate, which are spaced apart from and opposite to each other, and a liquid crystal layer filled between the substrates, wherein the lower substrate has a plurality of thin film transistors; depositing a transparent conductive layer having a certain thickness on the upper substrate exposed to the exterior of the liquid crystal panel; and performing an etching process for removing the entire transparent conductive layer and a portion of the upper substrate to form irregular prominences and depressions on a surface of the upper substrate exposed to the exterior. Therefore, it is possible to improve readability and contrast ratio by diffusely reflecting external light and scattering internal light.10-16-2008
20110136274LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME - A liquid crystal display device includes an array substrate including: gate and data lines crossing each other to define a pixel region on a first substrate; a thin film transistor connected to the gate and data lines; and first and second height adjusters; an opposing substrate facing the array substrate; a liquid crystal layer between the array substrate and the opposing substrate; a gap spacer corresponding to the first height adjuster and contacting the array substrate and the opposing substrate; a first press-buffer spacer corresponding to the second height adjuster, contacting the opposing substrate and spaced apart from the array substrate; and a second press-buffer spacer contacting the opposing substrate and spaced apart form the array substrate, wherein a distance between the first press-buffer spacer and the array substrate is substantially less than a distance between the second press-buffer spacer and the array substrate.06-09-2011
20110136275POLYMER DISPERSED LIQUID CRYSTAL DISPLAY AND METHOD OF FABRICATING THE SAME - There are provided a polymer dispersed liquid crystal (PDLC) display not using a backlight unit and a method of fabricating the same. The PDLC display comprises a rear substrate over which a thin film transistor (TFT), a first electrode, and a second electrode are formed, a front substrate apart from the rear substrate and having a first black matrix formed thereon corresponding to a region where the TFT is formed, a PDLC layer disposed below the first black matrix and formed between the front and rear substrates, a light source formed on one side of the PDLC layer and configured to provide light to the side of the PDLC layer, and a first reflection plate formed on the other side of the PDLC layer and configured to reflect light incident via the PDLC layer.06-09-2011
20100330719METHOD OF FORMING TRANSFLECTIVE LIQUID CRYSTAL DISPLAY PANEL - A method of forming a transflective LCD panel is provided. The transflective LCD includes a substrate, a first polycrystalline silicon pattern disposed in a reflection region, a second polycrystalline silicon pattern disposed in a peripheral region, an insulating layer disposed on the first and second polycrystalline silicon pattern and the substrate, a gate electrode disposed in the reflection region, a common electrode disposed in the peripheral region, a first inter-layer dielectric disposed on the insulating layer, the gate electrode and the common electrode, a reflection electrode disposed on the first inter-layer dielectric, a second inter-layer dielectric disposed on the first inter-layer dielectric and the reflection electrode, and a transmission electrode disposed on the second inter-layer dielectric and electrically connected to the reflection electrode through an opening of the second inter-layer dielectric. The second polycrystalline silicon pattern, the common electrode, and the insulating layer disposed therebetween form a storage capacitor.12-30-2010
20090209054METHOD FOR MANUFACTURING A LIQUID CRYSTAL DISPLAY - A method for manufacturing a liquid crystal display, the method includes steps of depositing a transparent conductive layer, forming a pixel electrode, and four bottom layers, depositing a semiconductor insulation layer on the pixel electrode and the four bottom layers, defining the semiconductor insulation layer to form two contact openings two of the bottom layers, depositing and defining two top layers and two scanning lines both with an indentation at an edge thereof, and the indentations face the first pixel electrode by an opposite direction, and forming four metal-insulation-metal (MIM) diodes.08-20-2009
20090191655METHOD OF ETCHING AMORPHOUS SILICON LAYER AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY USING THE SAME - A method of etching an amorphous silicon layer includes providing a substrate with an amorphous silicon layer formed thereon into an atmospheric pressure plasma etching device, providing a plasma generation gas and etching gas to a plasma generator of the atmospheric pressure plasma etching device and generating an atmospheric pressure plasma gas between two electrodes provided in the plasma generator in which the two electrodes face each other. The method further includes repeatedly passing the substrate through the plasma generator at a predetermined speed, thereby etching the amorphous silicon layer on the substrate by using the atmospheric pressure plasma gas generated from the plasma generator.07-30-2009
20120301984ARRAY SUBSTRATE FOR IN-PLANE SWITCHING MODE LIQUID CRYTAL DISPLAY DEVICE HAVING DOUBLE-LAYERED METAL PATTERNS AND METHOD OF FABRICATING THE SAME - An array substrate of an in-plane switching liquid crystal display device includes, among other features, a gate electrode and a gate line having a first double-layered structure consisting of a first barrier layer and a first low resistance metallic layer; a data line defining a pixel region with the gate line, the data line having a second double-layered structure consisting of a second barrier layer and a second low resistance metallic layer; a plurality of common electrodes disposed in a direction opposite to an adjacent gate line; a thin film transistor (TFT) near a crossing of the gate and data lines, each of the source and drain electrodes of the TFT having the same double-layered structure as the data line; and a plurality of pixel electrodes arranged in an alternating pattern with the common electrodes and disposed in the direction opposite the adjacent gate line.11-29-2012
20120301983METHOD OF FORMING ALIGNMENT LAYER AND FABRICATION METHOD OF LIQUID CRYSTAL DISPLAY USING THE SAME - An alignment layer is formed by forming an alignment solution on a base substrate, baking the alignment solution to form an alignment layer, and irradiating light having a wavelength of about 280 nanometers to about 340 nanometers to the alignment layer, thereby aligning the alignment layer. A liquid crystal display is manufactured using the method of forming the alignment layer.11-29-2012
20120064649METHOD OF FORMING AN ALIGNMENT FILM FOR USE IN AN LCD PANEL - The present invention discloses a method of forming an alignment film for use in a liquid crystal display (LCD). The method includes: Provide a glass substrate and dispose an ITO film on the glass substrate. Next, set the thickness of the alignment film. Next, determine the spray volume of thin film material droplets based on the length and the width of the glass substrate. Next, spray a plurality of thin film material droplets in rows on the glass substrate through a plurality of nozzles of an inkjet head. The thin film material droplets are distributed in an approximate equilateral triangular pattern. The thin film material droplets in the shape of an approximate equilateral triangle can reduce instability when spreading on the glass substrate, achieving a target of optimized coatings. Finally, process an alignment material thin film which is formed after the thin film material droplets spread to form an alignment film.03-15-2012
20120064650MANUFACTURING METHOD OF THIN FILM TRANSISTOR AND LIQUID CRYSTAL DISPLAY DEVICE - Etching of a semiconductor layer including a part over a gate wiring and formation of a contact hole for connection between a pixel electrode and a drain electrode are performed by one-time photolithography step and one-time etching step; thus, the number of photolithography steps is reduced. The exposed part of the gate wiring is covered by an insulating layer, and this insulating layer also functions as a spacer for maintaining a space for a liquid crystal layer. By the reduction in the number of photolithography steps, a liquid crystal display device can be provided at lower cost and higher productivity. Using an oxide semiconductor for the semiconductor layer can realize a liquid crystal display device with low power consumption and high reliability.03-15-2012
20100062555METHOD OF FORMING CRYSTALLIZED SILICON AND METHOD OF FABRICATING THIN FILM TRANSISTOR AND LIQUID CRYSTAL DISPLAY USING THE SAME - A method of crystallizing amorphous silicon comprises forming an amorphous silicon layer on a substrate; forming an insulating layer on the amorphous silicon layer; forming a heat distributing metal layer on the insulating layer; and forming a thermite layer on the heat distributing metal layer. Ignition heat is then applied to ignite the thermite layer and generate sufficient localized exothermic heat from the ignited thermite layer so as to crystallize the amorphous silicon layer. The substrate beneath the amorphous silicon layer can be a heat sensitive substrate which is not substantially deformed by the localized crystallizing heat applied to the top portion of the amorphous silicon layer by way of the heat distributing metal layer and the insulating layer.03-11-2010
20110104838LIQUID CRYSTAL DISPLAY AND METHOD OF MAKING THE SAME - A method of making a liquid crystal display having a display region and a non-display region, the method comprises forming a thin film transistor (“TFT”) having a drain electrode on an insulating substrate, forming an inorganic layer and an organic insulating layer sequentially on the TFT, forming an organic insulating layer pattern, by patterning the organic insulating layer, comprising a first organic layer hole to expose the inorganic layer on the drain electrode and a second organic layer hole formed along a circumference of the display region where the organic insulating layer is partially removed, removing the inorganic layer exposed through the first organic layer hole and the organic insulating layer remaining in the second organic layer hole, and forming a sealant in the second organic hole. The present invention thus provides a method of making an LCD to prevent a color filter substrate separating from a TFT substrate using fewer masks.05-05-2011
20110183451MANUFACTURING METHOD FOR LIQUID CRYSTAL APPARATUS - A manufacturing method for a liquid crystal apparatus of a transverse electric field system that is provided with a liquid crystal layer sandwiched between a first substrate and a second substrate and a pixel electrode and a common electrode formed on the first substrate and is arranged to drive liquid crystal through an electric field generated between the pixel electrode and the common electrode includes the steps of forming a material layer made of photosensitive resin on a glass substrate and performing an exposure processing with a predetermined exposure pattern, performing a development processing on the material layer and forming a resin light interruption layer having an opening section that exposes the glass substrate in a bottom section, forming an electrostatic interruption layer while covering the resin light interruption layer, and providing a colored layer in an area overlapped with the opening section on the electrostatic interruption layer.07-28-2011
20120129286PIXEL STRUCTURE OF DISPLAY AND METHOD FOR MANUFACTURING THE SAME - A pixel structure of a display including a first substrate, a second substrate, and a liquid crystal (LC) layer disposed therebetween. The pixel structure comprises a plurality of first, second, and third sub-pixels; a plurality of alignment controlling patterns, respectively formed in the first, second and third sub-pixels for controlling alignment direction of LC molecules of the LC layer; a plurality of opaque regions, respectively formed in the first, second, and third sub-pixels, and substantially aligned with the portion of the alignment controlling patterns, so that the alignment controlling patterns are shielded by the substantially corresponded opaque regions having different areas in at least two of the colored sub-pixels.05-24-2012
20120129285METHODS FOR MANUFACTURING DISPLAY PANEL AND DISPLAY APPARATUS - The present invention provides methods for manufacturing a display panel and a display apparatus. The method comprises the following steps: sputtering alignment layers on substrates; forming a liquid crystal layer between the alignment layers to form a liquid crystal cell; applying a voltage to the liquid crystal cell; irradiating an ultraviolet light to the liquid crystal cell; and arranging the display panel on a backlight module. The invention can improve the quality of alignment films of the liquid crystal display panel.05-24-2012
20120129284METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY PIXEL ARRAY - This invention discloses a method for manufacturing liquid crystal display pixel array, which is capable of promoting an aperture ratio. The method of this invention includes forming a gate metal layer on a glass substrate; forming a gate insulation layer; forming a semiconductor layer; forming a second metal layer on the semiconductor layer; forming a switch region photoresist layer and a data line region photoresist layer on the second metal layer; etching the second metal layer; etching the semiconductor layer; etching the switch region photoresist layer and the data line region photoresist layer; and etching edge portions of the semiconductor in the switch region and the data line region by using fluoride-bearing gas. To etch off more edge portions of the semiconductor in the data line region, according to this invention, the thickness of the data line region photoresist layer is made thinner when forming the photoresist layer.05-24-2012
20120315715Method of Fabricating Fringe Field Switching Liquid Crystal Display Device - A method of fabricating a fringe field switching (FFS)-liquid crystal display (LCD) device may have the following advantage. An inferior connection between the drain electrode and the pixel electrode may be prevented by preventing formation of a copper compound on the drain electrode, by performing a back channel etching after patterning a pixel electrode, and by performing a wet strip rather than a dry strip. This may result in a direct contact between copper and ITO, thereby reducing the number of mask processes.12-13-2012
20120220062LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD OF LIQUID CRYSTAL DISPLAY DEVICE - To sophisticate a portable electronic appliance without hindering reduction of the weight and the size, more specifically, to sophisticate a liquid crystal display apparatus installed in a portable electronic appliance without hindering the mechanical strength, a liquid crystal display apparatus includes a first plastic substrate, a light-emitting device which is disposed over the first plastic substrate, resin which covers the light-emitting device, an insulating film which is in contact with the resin, a semiconductor device which is in contact with the insulating film, a liquid crystal cell which is electrically connected to the semiconductor device, and a second plastic substrate, wherein the semiconductor device and the liquid crystal cell are disposed between the first plastic substrate and the second plastic substrate.08-30-2012
20120135552ARRAY SUBSTRATE FOR IN-PLANE SWITCHING MODE LIQUID CRYSTAL DISPLAY DEVICE INCLUDING PIXEL AND COMMON ELECTRODES ON THE SAME LAYER AND METHOD OF MANUFACTURING THE SAME - An array substrate for an in-plane switching mode liquid crystal display device includes a substrate, a gate line along a first direction on the substrate, a data line along a second direction and crossing the gate line to define a pixel region, a common line on the substrate, a thin film transistor connected to the gate and data lines, a pixel electrode in the pixel region and connected to the thin film transistor, the pixel electrode including horizontal parts along the first direction, and a common electrode in the pixel region and connected to the common line, the common electrode including horizontal portions along the first direction, wherein the pixel electrode and the common electrode are formed on a same layer.05-31-2012
20100009480Method for fabricating liquid crystal display device - A thin film transistor including: an active layer on a substrate, the active layer having at least two unit channels; and source and drain electrodes on the active layer, wherein an interval D between each of the channels is larger than a unit channel width W.01-14-2010
20100009479LIQUID CRYSTAL DISPLAY AND THIN FILM TRANSISTOR PANEL THEREFOR - A thin film transistor panel for a liquid crystal display includes a substrate, a plurality of data lines formed over the substrate and extending in a first direction, and a plurality of gate lines formed over the substrate and extending in a second direction. The plurality of gate lines cross the plurality of data lines to form a plurality of pixel areas, each of the plurality of pixel areas having a multi-bent band shape. Each of a plurality of pixel electrodes are formed in a corresponding pixel area.01-14-2010
20100009478IPS MODE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FABRICATING THEREOF - An IPS mode LCD device and a method for fabricating the same are disclosed. A switching device is formed at each unit pixel and then a passivation layer is formed thereon. A first concave pattern and a second concave pattern at each unit pixel by using one mask are formed, and a common electrode is formed in the first concave pattern and a pixel electrode is formed in the second concave pattern. Accordingly, the entire fabrication process is simplified.01-14-2010
20090325332METHOD FOR MANUFACTURING DISPLAY DEVICE - A method for manufacturing a display device includes forming an active layer by performing an SPC (solid phase crystallization) process on a first substrate; forming a cushioning layer of amorphous silicon (a-Si) on the active layer under an atmosphere containing about 90 to about 97% by flow rate of hydrogen (H2) and about 10 to about 3% by flow rate of silane (SiH4); forming an N-type impurity layer on the cushioning layer; forming a metal layer to cover the N-type impurity layer; forming a source and drain by removing the metal film by a first etching method; and separating the N-type impurity layer and the cushioning layer by a second etching method.12-31-2009
20080299690High quality and ultra large screen liquid crystal display device and production method thereof - A large screen liquid crystal display device using a transverse electric field system which is capable of dramatically improving an aperture ratio, a transmittance ratio, brightness, and contrast with low cost and high production yield. For example, the width of the common electrodes that shield the electric fields of the video signal lines can be decreased dramatically and the aperture ratio can be improved dramatically. Especially, the bumps covering the video signal lines can be used along with the spacers, and with the use of halftone exposure method, the bumps covering the video signal lines and the spacers can be constructed at the same time, which dramatically shortens the time required for the production process.12-04-2008
20080299689Method for manufacturing semiconductor device and display device - It is an object to provide a method for manufacturing a display device suitable for mass production without complicating a manufacturing process of a thin film transistor. A microcrystalline semiconductor film is formed by use of a microwave plasma CVD apparatus with a frequency of greater than or equal to 1 GHz using silicon hydride or silicon halide as a source gas, and a thin film transistor using the microcrystalline semiconductor film and a display element connected to the thin film transistor are formed. Since plasma which is generated using microwaves with a frequency of greater than or equal to 1 GHz has high electron density, silicon hydride or silicon halide which is a source gas can be easily dissociated, so that mass productivity of the display device can be improved.12-04-2008
20120264243FLEXIBLE LIQUID CRYSTAL DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A flexible liquid crystal display panel and method for manufacturing the same are provided. The flexible liquid crystal display panel includes a rigid substrate, a flexible substrate and a liquid crystal layer disposed therebetween.10-18-2012
20120264242IN-PLANE SWITCHING MODE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - The present invention relates to an in-plane switching mode LCD, in which data electrodes and common electrodes in a unit pixel have the same light transmitting area to reduce the luminance difference according to positive or negative polarity of an applied DC voltage. The in-plane switching mode LCD comprises a first substrate; a plurality of data lines on the first substrate; data electrodes and common electrodes alternately formed in an unit pixel area, the data electrodes having a first transmittance area and the common electrodes having a second transmittance area, wherein the first transmittance area equals the second transmittance area; and a shielding layer formed under outer most ones of the common electrodes, and wherein at least one of the data electrodes has a first width, and at least one of the common electrodes has a second width, the second width being greater than the first width.10-18-2012
20080280385Thin-film transistor, TFT-array substrate, liquid-crystal display device and method of fabricating the same - A thin-film transistor includes a gate layer, a gate insulting layer, a semiconductor layer, a drain layer, a passivation layer (each of which being formed on or over an insulating substrate), and a conductive layer formed on the passivation layer. The conductive layer is connected to the gate layer or the drain layer by way of a contact hole penetrating at least the passivation layer. The passivation layer has a multiple-layer structure comprising at least a first sublayer and a second sublayer stacked, the first sublayer having a lower etch rate than that of the second sublayer. The first sublayer is disposed closer to the substrate than the second sublayer. The second sublayer has a thickness equal to or less than that of the conductive layer. The shape or configuration of the passivation layer and the underlying gate insulating layer can be well controlled in the etching process, and the conductive layer formed on the passivation layer is prevented from being divided.11-13-2008
20120094411LIQUID CRYSTAL ELECTRO-OPTIC DEVICE - In a horizontal electric field drive type liquid crystal electro-optic device, a gate electrode, a source electrode, a drain electrode, a semiconductor film and a common electrode are formed on a glass substrate and a liquid crystal material is driven by controlling the strength of an electric field substantially parallel to the glass substrate. The electrodes and the semiconductor film are made curved, for example semi-circular or semi-elliptical, in sectional profile. These curved sectional profiles can be formed by suitably selecting and combining various patterning and etching methods.04-19-2012
20120088325MANUFACTURING METHOD OF DISPLAY DEVICE - Disclosed is a manufacturing method of a liquid crystal display device where first color filters, second color filters and third color filters which are formed adjacent to each other are provided, the first color filter and the second color filter are patterned in such a manner that one edge portion of the second color filter overlaps an edge portion of the first color filter, and the second color filter and the third color filter are patterned in such a manner that an edge portion of the third color filter overlaps the other edge portion of the second color filter wherein in an exposure step for patterning the second color filter, an exposure quantity in a region corresponding to one edge portion and an exposure quantity in a region corresponding to the other edge portion differ from each other.04-12-2012
20120329186Method For Manufacturing Semiconductor Device - The number of photomasks is reduced in a method for manufacturing a liquid crystal display device which operates in a fringe field switching mode, whereby a manufacturing process is simplified and manufacturing cost is reduced. A first transparent conductive film and a first metal film are sequentially stacked over a light-transmitting insulating substrate; the first transparent conductive film and the first metal film are shaped using a multi-tone mask which is a first photomask; an insulating film, a first semiconductor film, a second semiconductor film, and a second metal film are sequentially stacked; the second metal film and the second semiconductor film are shaped using a multi-tone mask which is a second photomask; a protective film is formed; the protective film is shaped using a third photomask; a second transparent conductive film is formed; and the second transparent conductive film is shaped using a fourth photomask.12-27-2012
20120100649METHOD FOR MANUFACTURING A FILM STRUCTURE - Provided is a method for manufacturing a film structure.04-26-2012
20100173435ARRAY SUBSTRATE FOR IN-PLANE SWITCHING MODE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An array substrate for an IPS mode LCD device comprises a substrate; a gate line along a first direction; a data line along a second direction; a TFT connected to the gate and data lines; a common electrode having a plate shape on the substrate and formed of a first transparent conductive material; and a pixel electrode formed of a second transparent conductive material on the common electrode and including first and second portions and a plurality of third portions combining the first portion with the second portion. The first and second portions are parallel to the second direction and separated from each other and the plurality of third portions are oblique to the first and second portions and separated from one another.07-08-2010
20100167442ARRAY SUBSTRATE FOR DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An array substrate includes a substrate, a data line formed on the substrate, a passivation layer formed on the data line, a gate line including a gate electrode and a capacitor line formed on the passivation layer, a gate insulation layer formed on the gate electrode and the capacitor line, a semiconductor layer formed on the gate insulation layer, a contact hole formed through the passivation layer and the gate insulation layer to expose the data line and a source electrode and a drain electrode formed on the semiconductor layer. The capacitor electrode is overlapped with the data line. The source electrode is connected to the data line through the contact hole and the source electrode and the drain electrode include a transparent conductive material.07-01-2010
20110159619METHOD FOR MANUFACTURING DISPLAY DEVICE - One object is to provide a method for manufacturing a display device in which shift of the threshold voltage of a thin film transistor including an oxide semiconductor layer can be suppressed even when ultraviolet light irradiation is performed in the process for manufacturing the display device. In the method for manufacturing a display device, ultraviolet light irradiation is performed at least once, a thin film transistor including an oxide semiconductor layer is used for a switching element, and heat treatment for repairing damage to the oxide semiconductor layer caused by the ultraviolet light irradiation is performed after all the steps of ultraviolet light irradiation are completed.06-30-2011
20110159618Method for Manufacturing Oxide Thin Film Transistor and Method for Manufacturing Display Device - A method for manufacturing an oxide thin film transistor includes the steps of forming an oxide semiconductor active layer by a deposition process. In the deposition process, a total flow rate of a gas is more than 100 standard cubic centimeters per minute and an electric power is in a range from 1.5 kilowatts to 10 kilowatts. The oxide thin film transistor manufactured by the above methods has advantages of low leakage currents, high electron mobility, and excellent temperature stability. The present invention also provides a method for manufacturing a display device. The display quality of the display device can be improved.06-30-2011
20080241981THIN FILM SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME - A thin film semiconductor device is provided that includes a semiconductor thin film and a gate electrode. The semiconductor thin film has an active region turned into a polycrystalline region through irradiation with an energy beam. The gate electrode is provided to traverse the active region. In a channel part that is the active region overlapping with the gate electrode, a crystalline state is changed cyclically in a channel length direction, and areas each having a substantially same crystalline state traverse the channel part.10-02-2008
20080241980LIQUID CRYSTAL DISPLAY - A thin film transistor array substrate including an insulating substrate, a first metallic pattern formed on the insulating substrate, and an insulating film provided on the first metallic pattern. A semiconductor pattern is provided on the insulating film, and a second metallic pattern is provided on the semiconductor pattern. The second metallic pattern is surrounded by the semiconductor pattern.10-02-2008
20080227231THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY AND MANUFACTURING METHOD THEREOF - A manufacturing method and the structure of a thin film transistor liquid crystal display (TFT-LCD) are disclosed. The TFT-LCD uses metal electrodes as a mask to thoroughly remove the unwanted semiconductor layer during the etching process for forming the source and drain electrodes. This manufacturing method can reduce the problems caused by the unwanted semiconductor layer, hence improving the quality of the TFT.09-18-2008
20080220553Method of producing liquid crystal display device including forming an align mark in an insulating mother substrate - A method of producing a liquid crystal display in which elements can be precisely aligned includes: providing an insulating mother substrate; forming an align mark within the insulating mother substrate by irradiating laser light, which has a wavelength less than 355 nm and having an insulating mother substrate absorbance of 10% or greater for the laser light; forming a plurality of elements with reference to the align mark on the insulating mother substrate; and forming a plurality of insulating unit substrates by cutting the insulating mother substrate.09-11-2008
20080213932METHOD OF IMPROVING THE FLATNESS OF A MICRODISPLAY SURFACE AND METHOD OF MANUFACTURING LIQUID CRYSTAL ON SILICON (LCOS) DISPLAY PANEL THE SAME - A method of improving the flatness of a microdisplay surface is disclosed. A reflective mirror layer and a raised layer are formed in order on substrate. The raised layer may comprise a buffer layer and a stop layer, and pixel electrode areas are defined therefrom and gaps are consequently formed among the pixel electrode areas. A dielectric layer is deposited on the pixel electrode areas and fills the gaps. A dielectric layer is partially removed such that the portion on the raised layer is completely removed and the portion filling the gaps are partially removed, thereby the remaining dielectric layer in the gaps has a height not lower than the top of the mirror layer. Thereafter, the raised layer is entirely or partially removed. A transparent conductive layer may be further combined onto the semiconductor substrate and a liquid crystal filling process is performed to form an LCoS display panel.09-04-2008
20130102098ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An array substrate for an in-plane switching mode liquid crystal display device includes a substrate, a gate line disposed along a first direction on the substrate, a data line disposed along a second direction and crossing the gate line to define a pixel region, a thin film transistor connected to the gate line and the data line, pixel electrodes disposed in the pixel region and connected to the thin film transistor, common electrodes disposed in the pixel region and alternating with the pixel electrodes, a semiconductor layer underlying the data line and including a portion having a width greater than a width of the data line, and a first blocking pattern comprising an opaque material and disposed under the semiconductor layer.04-25-2013
20080206912ARRAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND METHOD OF CRYSTALLIZING SILICON - An array substrate includes a base substrate, a switching element, and a pixel electrode. The switching element is on the base substrate. The switching element includes a poly silicon pattern having at least one block. Grains are formed in each of the at least one block that are extended in a plurality of directions. The pixel electrode is electrically connected to the switching element. Therefore, current mobility and design margin of the switching element are improved.08-28-2008
20110312114METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE - It is an object to prevent disordered orientation of liquid crystal molecules which is due to division of substrates even when a liquid crystal dripping method is used, and to provide a method for manufacturing a liquid crystal display device in which liquid crystal is not adversely affected even when a sealant not cured and liquid crystal are in contact. In a method for manufacturing a liquid crystal display device using a liquid crystal dripping method, a scribe groove is provided for at least one of a pair of substrates with a diamond cutter or the like before the pair of substrates are attached under reduced pressure. After the scribing, the pair of substrates are attached under reduced pressure, heat treatment for curing the sealant and aligning the liquid crystal molecules is performed, and the substrates are divided by applying impact using a breaking apparatus.12-22-2011
20120045859Color Filterless Display Device, Optical Element, and Manufacture - A method of forming liquid crystal cell for a color display device includes forming a liquid crystal layer and a prism structure between top and bottom substrates. Forming the prism structure includes forming a lens shaped die, coating a low refractive index resin on the lens shaped die, pasting the lens shaped die to the top substrate, and irradiating the coated low refractive index resin so as to set the low refractive index resin and form a low refractive index layer. The lens shaped die is removed from the low refractive index layer, a high refractive index resin is coated on the low refractive index layer by use of a planarizing die. The coated high refractive index resin is irradiated so as to set the high refractive index resin and form a high refractive index layer, and the planarizing die is removed from the high refractive index layer.02-23-2012
20120094413LIQUID CRYSTAL DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - In an LCD apparatus and a method of manufacturing the same, a first substrate on which a pixel electrode is formed includes a color filter formed at a pixel area thereof. A color filter spacer is formed at a position between the pixel area and an adjacent pixel area while the color filter is formed. A second substrate on which the common electrode is formed includes a light blocking pattern formed at the position between the pixel area and adjacent pixel area so as to block light incident through between the pixel area and adjacent pixel area, and a light visual angle pattern formed at the position corresponding to the pixel area so as to widen a visual angle of light incident into the pixel area. Thus, the LCD apparatus may be manufactured through simplified and reduced processes and improve display quality of an image.04-19-2012
20120094412METHOD FOR MANUFACTURING WIRING, THIN FILM TRANSISTOR, LIGHT EMITTING DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE, AND DROPLET DISCHARGE APPARATUS FOR FORMING THE SAME - As a semiconductor device, specifically, a pixel portion included in a semiconductor device is made to have higher precision and higher aperture ratio, it is required to form a smaller wiring in width. In the case of forming a wiring by using an ink-jet method, a dot spreads on a wiring formation surface, and it is difficult to narrow width of a wiring. In the present invention, a photocatalytic substance typified by TiO04-19-2012
20120094410METHOD AND SYSTEM FOR CONTINUOUSLY MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE - A method for continuously manufacturing a liquid crystal display device by bonding a polarizing film to a liquid crystal panel with a pressure-sensitive adhesive interposed therebetween, includes a polarizing film supply step including drawing an optical film laminate from the continuous roll placed in a dry environment, cutting at least a polarizing film and a pressure-sensitive adhesive, while leaving a carrier film uncut and feeding the sheet piece and the pressure-sensitive adhesive piece; a liquid crystal panel supply step including feeding the liquid crystal panel in a first humid environment having a relative humidity higher than that of the dry environment; and a bonding step including bonding the sheet piece to the liquid crystal panel with the pressure-sensitive adhesive piece interposed therebetween in a second humid environment having a relative humidity higher than that of the dry environment.04-19-2012

Patent applications in class Liquid crystal component