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430 - Radiation imagery chemistry: process, composition, or product thereof

430269000 - IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT

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Class / Patent application numberDescriptionNumber of patent applications / Date published
430321000 Optical device 70
Entries
DocumentTitleDate
20120183907PATTERNING PROCESS FOR SMALL DEVICES - A method according to one embodiment includes applying a photoresist to a substrate; exposing the photoresist such that a local intensity of radiation applied to the photoresist at each pixel thereof is a function of a mathematically-generated representation of a target surface shape; developing the resist; and performing a subtractive process on the developed photoresist and the substrate for creating the target surface shape on the substrate. A method according to another embodiment includes applying a photoresist to a substrate; patterning the photoresist using a machine-readable profile; and performing a subtractive process to transfer the profile onto the substrate.07-19-2012
20100099047MANUFACTURE OF DROP DISPENSE APPARATUS - A drop dispense apparatus may be manufactured utilizing an imprint lithography process. Exemplary methods for manufacturing a drop dispense apparatus are described.04-22-2010
20090155729Photoimageable Nozzle Members and Methods Relating Thereto - Nozzle members, such as for a micro-fluid ejection head, micro-fluid ejection heads, and a method for making the same. One such nozzle member includes a negative photoresist composition derived from a first di-functional epoxy compound, a relatively high molecular weight polyhydroxy ether, a photoacid generator devoid of aryl sulfonium salts, an adhesion enhancer, and an aliphatic ketone solvent. The nozzle member has a thickness ranging from about 10 microns to about 30 microns.06-18-2009
20100040985FINE MOLD AND METHOD FOR REGENERATING FINE MOLD - A fine mold comprises a regeneration target film forming a convex part of a formation surface, and a light shielding unit that is configured deeper than a bottom of the formation surface and that regenerates the regeneration target film. A manufacturing cost of a product having a three-dimensional structure can be reduced.02-18-2010
20080227035METHOD OF PRODUCING AN INK JET HEAD AND METHOD OF PRODUCING AN ELECTRONIC DEVICE - Provided is a method of producing an ink jet head including: providing the substrate which includes a through hole which forms the supply opening, and a layer that covers an opening of the through hole on a side of the one surface of the substrate; forming a protective film so that the protective film covers a side wall of the through hole and reaches the layer; depositing a photosensitive resin on the protective film; applying light from the side of the one surface of the substrate to pattern the photosensitive resin; and removing the protective film formed on a portion of the opening of the through hole on the side of the one surface of the substrate, with the patterned photosensitive resin being used as a mask.09-18-2008
20130029272PROCESS FOR PRODUCING FINE PATTERN - The present invention provides a process for producing a fine pattern including, (1) forming a first resin layer containing a photosensitive resin on a substrate; (2) forming a second resin layer containing a secondary or tertiary alkynyl alcohol, a photoacid generator, and a resin on the first resin layer; (3) subjecting the second resin layer to pattern exposure; (4)subjecting the first resin layer to exposure using the pattern-exposed portion of the second resin layer as a mask; and (5) removing the second resin layer and the first resin layer.01-31-2013
20130071792METHOD FOR FABRICATING LIQUID CRYSTAL DISPLAY DEVICE - An amount of exposure of the photosensitive resin is controlled using a photomask in an exposure treatment. The photosensitive resin subjected to the exposure treatment is developed, thereby simultaneously forming a protrusion which regulates the alignment of liquid crystal molecules comprising the liquid crystal layer, and a photo spacer.03-21-2013
20090047605METHOD OF MANUFACTURING PHOTOSENSITIVE EPOXY STRUCTURE USING PHOTOLITHOGRAPHY PROCESS AND METHOD OF MANUFACTURING INKJET PRINTHEAD USING THE METHOD OF MANUFACTURING PHOTOSENSITIVE EPOXY STRUCTURE - Provided are a method of manufacturing a photosensitive epoxy structure using a photolithograph process, and a method of manufacturing an inkjet printhead using the method of manufacturing a photosensitive epoxy structure. The method of manufacturing the photosensitive epoxy structure includes forming an epoxy material layer formed of photosensitive epoxy; forming a first exposure pattern in the epoxy material layer by performing a first exposure operation; forming a second exposure pattern in the non-exposed portions of the epoxy material layer by performing a second exposure operation; and developing the epoxy material layer, wherein the amount of first UV energy used in the first exposure operation is different from the amount of second UV energy used in the second exposure operation.02-19-2009
20120115089PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD - A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic polymerization resin and a first photoacid generator; (2) laminating, on the first coating resin layer, a second coating resin layer including a second cationic polymerization resin which includes an acid-cleavable linkage in its main chain, and a second photoacid generator which generates methide acid by irradiation with an active energy ray including ultraviolet light; (3) forming a coating by curing the first coating resin layer and the second coating resin layer through exposure of the first coating resin layer and the second coating resin layer to the active energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the coating through heat treatment of the coating.05-10-2012
20120115088DEVELOPMENT OF PRINTING MEMBERS HAVING POST-ANODICALLY TREATED SUBSTRATES - Gum solutions are formulated to develop a negative-working photopolymer imaging layer coated on an anodized aluminum substrate that has undergone a post-anodic sealing treatment with inorganic phosphate and inorganic fluoride. The gum solution contains at least one polycarboxylic acid—which may be a polymer—that beneficially desensitizes the surface after the unexposed photopolymer layer is removed.05-10-2012
20100028812METHOD OF MANUFACTURING INKJET PRINTHEAD - Disclosed is a method of manufacturing an inkjet printhead. The method includes: forming a chamber layer comprising a plurality of ink chambers on a substrate; forming a sacrificial layer comprising water soluble polymer on the chamber layer so as to fill the ink chambers; forming a nozzle layer comprising a plurality of nozzles on the sacrificial layer and the chamber layer; forming an ink feed hole for ink supply in the substrate; and removing the sacrificial layer. The sacrificial layer and the chamber layer may be planarized using a chemical mechanical polishing (CMP) process. The CMP process may utilize a hard polishing, in which an oil based slurry along with polishing pad of hard material to reduce the occurrences of dishing phenomenon.02-04-2010
20100035189FORMING METHOD OF RESIST PATTERN AND MANUFACTURING METHOD OF THIN-FILM MAGNETIC HEAD - It is therefore an object of the present invention to provide a forming method for a resist pattern to reduce a resist residue in forming the resist pattern on a step whose gradient angle is equal to 90 degrees or more.02-11-2010
20090136875MANUFACTURING METHOD OF LIQUID EJECTION HEAD - A manufacturing method of a liquid ejection head including an ejection outlet forming member provided with an ejection outlet for ejecting liquid and a flow passage communicating with the ejection outlet is constituted by the steps of: preparing a substrate on which a flow passage wall forming member for forming a part of a wall of the flow passage and a solid layer having a shape of a part of the flow passage contact each other, wherein the flow passage wall forming member has a height, from a surface of the substrate, substantially equal to that of the solid layer; providing a first layer, on the solid layer and the flow passage wall forming member, formed of a negative photosensitive resin material for forming another part of the wall of the flow passage; exposing to light a portion of the first layer correspondingly to the another part of the wall of the flow passage; providing a second layer, on the exposed first layer, formed of a negative photosensitive resin material to constitute the ejection outlet forming member; exposing to light a portion of the second layer correspondingly to the ejection outlet forming member; and forming the ejection outlet and another part of the flow passage by removing unexposed portions of the first layer and the second layer.05-28-2009
20100266963METHOD FOR MANUFACTURING MECHANICAL SHUTTER BLADES USING BERYLLIUM-COPPER ALLOY SUBSTRATE - An exemplary method for manufacturing mechanical shutter blades using a beryllium-copper substrate is provided. The method includes providing a beryllium-copper alloy substrate having a first surface and a second surface opposite to the first surface; respectively applying a first and second photoresist layers onto the first and second surfaces; exposing and developing the first and second photoresist layers, thereby first portions of the first photoresist layer and second portions of the second photoresist layer are left on the first and second surfaces while an unwanted portion of the substrate is exposed to an exterior, the first portions are aligned with the second portions; removing the unwanted portion of the substrate using a wet etching process; and removing the first and second portions from the remaining portion of the substrate.10-21-2010
20090142707METHOD TO BUILD A WIREBOND PROBE CARD IN A MANY AT A TIME FASHION - Resilient spring contacts for use in wafer test probing are provided that can be manufactured with a very fine pitch spacing and precisely located on a support substrate. The resilient contact structures are adapted for wire bonding to an electrical circuit on a space transformer substrate. The support substrates with attached spring contacts can be manufactured together in large numbers and diced up and tested before attachment to a space transformer substrate to improve yield. The resilient spring contacts are manufactured using photolithographic techniques to form the contacts on a release layer, before the spring contacts are epoxied to the support substrate and the release layer removed. The support substrate can be transparent to allow alignment of the contacts and testing of optical components beneath. The support substrate can include a ground plane provided beneath the spring contacts for improved impedance matching.06-04-2009
20090291398LIQUID DISCHARGE HEAD PRODUCING METHOD - Three positive-type photosensitive material layers which are photosensitive to light having the same wavelength range are provided on a substrate, and an intermediate layer contains a light-absorbing agent. The ultraviolet absorbing agent contains in the intermediate layer prevents the intermediate layer and lower layer from being exposed during the exposure of an upper layer. After the upper layer is exposed, the intermediate layer and lower layer are exposed with the light having the same wavelength range, which is used to expose the upper layer.11-26-2009
20090246711METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM - A method for manufacturing a patterned medium employing an imprinting method is provided, which can prevent the occurrence of resist pattern faults due to gas trapped between the imprinting mold surface and the resist layer, as well as resist pattern faults due to bubbles which can be formed in the resist film and at the resist surface. As preprocessing for an imprinting process, exposure processing is performed in which a substrate with a resist film formed on the surface thereof is exposed to an atmosphere at a temperature higher than the temperature at the time of imprinting and an environmental pressure lower than the environmental pressure at the time of imprinting.10-01-2009
20080292993PHOTO-CATIONIC POLYMERIZABLE EPOXY RESIN COMPOSITION, LIQUID DISCHARGE HEAD, AND MANUFACTURING METHOD THEREOF - A liquid discharge head having a substrate provided with energy generating elements for generating energy to discharge a liquid, discharge portions including discharge ports for discharging the liquid, and flow paths supplying the liquid to the discharge portions and a method for its manufacture are provided. The method includes the steps of forming a layer of a negative type photosensitive resin on the substrate, and exposing the layer to light having a wavelength of 365 nm to form the discharge portions.11-27-2008
20090155728Fabrication Method of Topographically Modulated Microstructures Using Pattern Homogenization with UV Light - A method for microfabrication of a microfluidic device having sub-millimeter three dimensional relief structures is disclosed. In this method, homogeneous surfaces, which do not exhibit apparent pixel geometry, emerge from the interaction of the overlapping of diffracted light under opaque pixels and the nonlinear polymerization properties of the photoresist material. The method requires a single photolithographic step and allows for the fabrication of microstructures over large areas (centimeters) with topographic modulation of features smaller than 100 micrometers. The method generates topography that is useful in a broad range of microfluidic applications.06-18-2009
20090035706Method for Fabricating Micromachine Component of Resin - A method for fabricating a micromachine component of resin comprising step (a) of forming a sacrifice layer on a substrate, step (b) of forming at least two photosensitive resin composition layers sequentially on the sacrifice layer, and performing photolithography of each photosensitive resin composition layer to form an air gap portion defining the circumferential edge potion of the micromachine component and an air gap portion where an internal structure of the micromachine component is constituted to form a multilayer structure, step (c) for depositing dry film resist on the multilayer structure of the cured photosensitive resin composition layer, and performing photolithography of the dry film resist layer to form a cured dry film resist layer in which an air gap portion defining the circumferential edge of a shroud layer and an air gap where the structure of the shroud layer is constituted are formed, and step (d) for separating the micromachine component having the multilayer structure of the cured photosensitive resin composition layer and the cured dry film resist layer from the substrate by removing the sacrifice layer.02-05-2009
20090087793METHOD OF NANO-PATTERNING USING SURFACE PLASMON EFFECT AND METHOD OF MANUFACTURING NANO-IMPRINT MASTER AND DISCRETE TRACK MAGNETIC RECORDING MEDIA USING THE NANO-PATTERNING METHOD - A method of nano-patterning, a method of manufacturing a nano-imprinting master and a discrete track magnetic recording medium are all provided. The method of nano-patterning includes (a) sequentially forming on a substrate an etching object material layer, a photoresist layer, and a metal layer patterned to a first pattern having a structure in which line patterns are repeatedly arranged with a predetermined interval; (b) irradiating light onto a surface of the metal layer to excite surface plasmon so that the photoresist layer is exposed to a second pattern by the surface plasmon; (c) removing the metal layer and developing the photoresist layer; and (d) etching the etching object material layer using the photoresist layer patterned to the second pattern as a mask.04-02-2009
20090162797METHOD OF MANUFACTURING LIQUID EJECTION HEAD - A method of manufacturing a liquid ejection head includes a step of forming a layer of a positive-type photosensitive resin on a substrate; a step of forming a pattern, used to form a liquid channel, by exposing the positive-type photosensitive resin layer to light; a step of forming a photosensitive layer, used to form a discharge port-forming member, on the pattern; and a step of forming a discharge port in such a manner that the photosensitive layer is patterned by exposing the photosensitive layer to i-line. The pattern has a predetermined absorbance for i-line and contains a specific compound.06-25-2009
20090186303Method of Creating a Digital Mask for Flexographic Printing Elements In Situ - A method of creating a digital mask in situ for use in a process of making digital flexographic printing elements. The digital mask is created by laminating the negative image that is the by-product of a thermal proofer to a photosensitive printing plate. Thereafter, the photosensitive printing element can be imaged, exposed, and developed in the usual manner.07-23-2009
20110223543RADIATION SYSTEM, RADIATION COLLECTOR, RADIATION BEAM CONDITIONING SYSTEM, SPECTRAL PURITY FILTER FOR RADIATION SYSTEM AND METHOD FOR FORMING A SPECTRAL PURITY FILTER - A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.09-15-2011
20090191488INK JET RECORDING HEAD AND MANUFACTURING METHOD - A method of manufacturing a liquid discharge head including a flow path forming member configured to form a flow path communicating with a discharge port to discharge liquid, includes, providing a first layer which includes a photosensitive resin and a light absorption agent on a substrate, and providing a second layer which includes a positive photosensitive resin but substantially does not include the light absorption agent on the substrate, so as to coat the first layer, forming a pattern having a shape corresponding to the flow path by performing a patterning process, and providing a layer which becomes the flow path forming member on the substrate, so as to coat the pattern. The method further includes forming the discharge port by performing a patterning process including exposure of the layer that becomes the flow path forming member, and forming the flow path by removing the pattern.07-30-2009
20090162798Method of manufacturing master plate, method of manufacturing microneedle patch and apparatus exposure apparatus - A method of manufacturing a master plate includes the steps of forming a photoresist film on a substrate, disposing a photomask having a plurality of island radiation shields on the photoresist film followed by integrating the photomask and the photoresist film, applying light from a light source to the photoresist film through the photomask for selectively exposing the photoresist film, and developing the photoresist film to form a master plate, in which the method includes irradiating the photoresist film with the light from plural directions through the photomask to selectively expose the photoresist film from the respective directions.06-25-2009
20090258320METHOD OF FORMING MEASURING TARGETS FOR MEASURING DIMENSIONS OF SUBSTRATE IN SUBSTRATE MANUFACTURING PROCESS - A method of forming measuring targets for measuring the dimensions of a substrate during a substrate manufacturing process is provided. First, a board having a base layer and a conductive layer is provided, wherein the conductive layer is disposed on a surface of the base layer. Then, at least one through hole is formed in the board as a measuring target for measuring the dimensions of the substrate. Next, a plated via is formed in the through hole as another measuring target for measuring the dimensions of the substrate. Thereafter, a patterned dielectric layer is formed on the board to expose the plated via as a next measuring target for measuring the dimensions of the substrate. In the present invention, measuring targets are formed during a substrate manufacturing process and the dimensions of the substrate are measured instantly. The accuracy in process alignment is improved without increasing the fabrication cost.10-15-2009
20100233630METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD - A method for manufacturing a liquid discharge head that includes a flow path wall member which forms a wall of a flow path communicating with a discharge port for discharging a liquid and a substrate which forms the flow path in contact with the flow path wall member includes providing a first layer, which is made of a photosensitive resin on the substrate, for forming a pattern having a shape of the flow path, providing a second layer which is capable of absorbing light within a photosensitive wavelength range of the photosensitive resin and has a shape corresponding to the shape of the flow path, on the first layer so as to come into contact with the first layer, performing patterning of the first layer which includes exposure of the first layer with the light using the second layer as a mask, and forming the pattern from the first layer, providing a cover layer which is made of a photosensitive resin and serves as the flow path wall member so as to cover the second layer and the pattern, forming the discharge port on the cover layer by performing patterning of the cover layer which includes exposure of the cover layer with the light, and forming the flow path by removing the second layer and the pattern.09-16-2010
20120034566MICRO-CHANNEL DEVICE AND METHOD FOR FABRICATING MICRO-CHANNEL DEVICE - A micro-channel device provided in a solution analysis system using pressure liquid feed comprises a plurality of straight-line channels and curved channels connecting the ends of the neighboring straight-line channels. The width w of each curved channel is smaller than the width t of each straight-line channel. The radius of curvature r of each curved channel is set so that the value of a expressed by formula (1) is equal to or smaller than the value of a at a local maximum point of the theoretical step height H expressed by formula (2) and based on the shape of the curved channel.02-09-2012
20090191487LIQUID JET HEAD, METHOD FOR MANUFACTURING LIQUID JET HEAD, AND METHOD FOR FORMING STRUCTURE FOR LIQUID JET HEAD - A liquid ejecting head including a coating resin layer including a plurality of ejection outlets for ejecting liquid and flow paths which are in fluid communication with the ejection outlets, respectively; an energy generating element for generating energy for ejecting liquid; and an adhesion improving layer provided between the coating resin layer and the substrate, wherein the coating resin layer further includes a first resin material layer closest to the substrate and at least one second resin material layer, and the first resin material layer provides at least one stepped portion continuing from a periphery of the second resin material layer.07-30-2009
20090155727METHOD OF FORMING A FLAT MEDIA TABLE FOR PROBE STORAGE DEVICE - A method of forming a flat media table for a probe-based storage device includes applying a first-photo-resistive coating to one side of a silicon wafer and a second photo-resistive coating to an opposite side of the silicon wafer. The silicon wafer includes a table layer, a suspension layer and a spacer layer sandwiched therebetween. The first photoresistive coating is applied to the table layer and the second photoresistive coating is applied to the suspension layer. A first pattern is formed through photolithography in the second photoresistive coating and etched into the suspension layer. A second pattern is formed through photolithography in the first photoresistive coating and etched into the table layer. A portion of the table layer is released from the suspension layer though selective etching of the spacer layer so as to form a plurality of stand-offs defined by remaining portions of the spacer layer.06-18-2009
20100310990METHOD FOR MANUFACTURING STRUCTURE - A method for manufacturing a structure includes the followings in this order: preparing a substrate having a positive-type photosensitive resin layer and an absorption layer that can absorb a light having a photosensitive wavelength which the positive-type photosensitive resin senses stacked thereon in this order; pressing a projecting portion of a mold having the projecting portion into two layers of the positive-type photosensitive resin layer and the absorption layer; separating the mold from the two layers; irradiating the two layers with the light from an upper face side of the two layers; removing the absorption layer; and developing the positive-type photosensitive resin layer.12-09-2010
20110244397Methods of Fabricating a Microarray - A method of fabricating a microarray is provided, which includes providing a substrate having a surface that is protected by an acid labile protective group that includes an acetal group represented by formula (1) and has a functional group that can be coupled with a monomer of a probe; applying a photoresist including a photo acid generator to the substrate; selectively exposing the photoresist to deprotect the acid labile protective group that corresponds to an exposed region; removing the photoresist; and coupling the monomer that is combined with the acid labile protective group with the deprotected functional group. Formula (1) has the following structure:10-06-2011
20100221667Catalyst For Microelectromechanical Systems Microreactors - A microreactor comprising a silicon wafer, a multiplicity of microchannels in the silicon wafer, and a catalyst coating the microchannels. In one embodiment the catalyst coating the microchannels comprises a nanostructured material. In another embodiment the catalyst coating the microchannels comprises an aerogel. In another embodiment the catalyst coating the microchannels comprises a solgel. In another embodiment the catalyst coating the microchannels comprises carbon nanotubes.09-02-2010
20090311629METHOD FOR MANUFACTURING ROLLER MOLD - A method for manufacturing a roller mold is described, including the following steps. A body is provided, wherein the body is a cylinder. A photoresist layer is formed to completely cover a cambered surface of the body. A mold including a pattern structure including a convex portion and a concave portion is provided, and the convex portion and the concave portion are covered with a transferred pattern layer. The mold is pressed on the photoresist layer. The body is rolled to transfer the transferred pattern layer on the convex portion onto the photoresist layer. The mold is removed. An UV light exposure step is performed on an exposed portion of the photoresist layer to transfer a pattern of the transferred pattern layer to the photoresist layer. The exposed portion of the photoresist layer is removed to expose a portion of the cambered surface of the body. A structure layer is formed on the portion of the cambered surface and the transferred pattern layer. The photoresist layer, and the structure layer and the transferred pattern layer on the photoresist layer are removed.12-17-2009
20110053094METHOD FOR FABRICATING ROLLER MOLD FOR NANOIMPRINTING - A method for fabricating a roller mold is provided, including providing a roller substrate, wherein the roller substrate is a cylinder and has a curved surface. An inorganic resist layer is formed over the curved surface of the roller substrate. A laser exposure device is provided for irradiating the inorganic resist layer with a focused laser, causing phase change of the inorganic resist layer at exposed regions. The inorganic resist layer in the exposed regions is removed to form a nano-pattern over the roller substrate.03-03-2011
20100159397Method and System for Forming a Data Recording Medium - An embodiment of a method of forming a data recording medium includes the initial step of applying a resist material to a surface of a keepered medium. The embodiment of the method also includes the step of forming the resist material into a three-dimensional resist structure that corresponds to a pattern that is to be applied to the keepered media.06-24-2010
20100159396METHOD FOR PRODUCTION OF A MEDICAL MARKER - A method is provided for production of a medical marker (4) made of an X-ray-opaque material, including the following steps: 06-24-2010
20100196830METHOD FOR OBTAINING MICROFLUIDIC POLYMER STRUCTURES - The present invention relates to a method for manufacturing high-resolution microfluidic structures by means of the modification of the sealing temperature and photolithography.08-05-2010
20090197209LITHOGRAPHICALLY PATTERNED NANOWIRE ELECTRODEPOSITION - Lithographically patterned nanowire electrodeposition (LPNE) combines attributes of photolithography with the versatility of bottom-up electrochemical synthesis. Photolithography is employed to define the position of a sacrificial nanoband electrode, preferably formed from a metal such as nickel, copper, silver, gold or the like, which is stripped using electrooxidation or a chemical etchant to advantageously recess the nanoband electrode between a substrate surface and the photoresist to form a trench defined by the substrate surface, the photoresist and the nanoband electrode. The trench acts as a “nanoform” to form an incipient nanowire during its electrodeposition. The width of the nanowire is determined by the electrodeposition duration while its height is determined by the height of the nanoband electrode.08-06-2009
20120058433PROCESS FOR PRODUCING INK JET HEAD - A process for producing an ink jet head, including forming an ink flow path pattern whose surface has been subjected to insolubilization treatment on a substrate having an energy-generating element, applying a UV curable flow path forming material on the pattern and substrate to form an ink flow path forming layer, irradiating part of the ink flow path forming layer with ultraviolet rays for development, thereby forming an ink ejection orifice, and removing the pattern, thereby forming an ink flow path. The step of forming the pattern includes applying a positive resist containing a resin having a phenolic hydroxyl group on the substrate to form a positive resist layer, patterning the positive resist layer to form an ink flow path pattern prior to insolubilization treatment, applying a coating agent containing a compound having two vinyl ether groups on the pattern, and heat-treating the pattern coated with the coating agent.03-08-2012
20120064461MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND OBJECT EXCHANGE METHOD - On a +X side of a first air floating unit which supports a substrate subject to carry-out, a second air floating unit which supports a substrate subject to carry-in is placed, and a third air floating unit is placed tilted in a θy direction below the second air floating unit. After the first air floating unit has been tilted in the θy direction and the substrate has been carried from above the first air floating unit onto the third air floating unit, the first air floating unit is made horizontal and another substrate is carried from above the second air floating unit onto the first air floating unit. Specifically, a carry-in path and a carry-out path of the substrate with respect to the first air floating unit are different. Accordingly, exchange of the substrate above the first air floating unit can be performed quickly.03-15-2012
20120064460MOVABLE BODY APPARATUS, OBJECT PROCESSING DEVICE, EXPOSURE APPARATUS, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD - By a substrate support member moving in predetermined strokes in a scanning direction on a Y step surface plate, a substrate held by the substrate support member moves in the scanning direction in predetermined strokes in a state supported from below by an air floating device. Further, because a Y step guide having an air floating device moves in a cross-scan direction along with the substrate holding member, the substrate can be moved optionally in the scanning direction, and/or in the cross-scan direction. In doing so, because the Y step surface plate moves in the cross-scan direction with the substrate support member and the Y step guide, the substrate support member is constantly supported by the Y step surface plate.03-15-2012
20120156624WATERLESS PRINTING MEMBERS AND RELATED METHODS - In various embodiments, a recording medium comprises an oleophilic substrate and, thereover, a topmost oleophobic layer comprising a cured polymeric silicone matrix that consists essentially of the addition-cure reaction product of a vinyl-functional polydialkylsiloxane and a silane cross-linking agent. The vinyl-functional polydialkylsiloxane has a molecular weight ranging from 30,000 to 75,000 or 110,000 to 130,000. If the molecular weight of the vinyl-functional polydialkylsiloxane is within the range of 30,000 to 75,000, the molar ratio of silane groups to vinyl groups is within the range of about 11:1 to about 25:1; and if the molecular weight of the vinyl-functional polydialkylsiloxane is within the range of 110,000 to 130,000, the molar ratio of silane groups to vinyl groups is from about 5:1 to about 27:1. The recording medium may be used as a lithographic printing plate.06-21-2012
20110091817SENSOR WITH LAYERED ELECTRODES - A thin film sensor, such as a glucose sensor, is provided for transcutaneous placement at a selected site within the body of a patient. The sensor includes several sensor layers that include conductive layers and includes a proximal segment defining conductive contacts adapted for electrical connection to a suitable monitor, and a distal segment with sensor electrodes for transcutaneous placement. The sensor electrode layers are disposed generally above each other, for example with the reference electrode above the working electrode and the working electrode above the counter electrode. The electrode layers are separated by dielectric layer.04-21-2011
20110091816SENSOR WITH LAYERED ELECTRODES - A thin film sensor, such as a glucose sensor, is provided for transcutaneous placement at a selected site within the body of a patient. The sensor includes several sensor layers that include conductive layers and includes a proximal segment defining conductive contacts adapted for electrical connection to a suitable monitor, and a distal segment with sensor electrodes for transcutaneous placement. The sensor electrode layers are disposed generally above each other, for example with the reference electrode above the working electrode and the working electrode above the counter electrode. The electrode layers are separated by dielectric layer.04-21-2011
20120107746METHOD FOR MANUFACTURING INKJET RECORDING HEAD - A method for manufacturing an inkjet recording includes forming a photo-cationic polymerizable resin layer containing a photo-cationic polymerizable resin material on a substrate; performing pattern exposure of the photo-cationic polymerizable resin layer to form a latent image of a fine pattern including an ejection port; forming a water repellent layer containing a water repellent material capable of forming a bond in reaction with the photo-cationic polymerizable resin material on the photo-cationic polymerizable resin layer; developing the photo-cationic polymerizable resin layer to thereby remove a non-exposed portion of the photo-cationic polymerizable resin layer and remove a water repellent layer portion corresponding to the non-exposed portion to thereby form the fine pattern; and curing the photo-cationic polymerizable resin layer by heat treatment to form a member provided with the fine pattern and promote a reaction of the photo-cationic polymerizable resin material and the water repellent material.05-03-2012
20100248156RESIN COMPOSITION, RESIN CURED PRODUCT, AND LIQUID DISCHARGE HEAD - An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B):09-30-2010
20120082941MANUFACTURING METHOD OF DISPLAY DEVICE - An organic passivation film having a high transmittance and capable of setting a taper angle of a through hole within a predetermined range in a liquid crystal display device. A pixel electrode and a source electrode of a TFT are connected by way of a through hole formed in an organic passivation film. The organic passivation film having high productivity, high transmittance, and a predetermined taper angle θ of a through hole can be formed by using a chemical amplification photosensitive resin composition comprising, as a base material, an acrylic resin having a molecular weight of 4,000 to 20,000 and containing 1 to 6 wt % of a photoacid generator as the material for the organic passivation film, performing exposure and development for forming a through hole, and then performing post exposure, prebaking, and baking under appropriate conditions.04-05-2012
20120189962METHOD FOR MANUFACTURING STAMPER FOR INJECTION MOLDING - The present invention relates to a method for manufacturing a stamper for injection molding, and more particularly, to a method for manufacturing a stamper for injection molding which can prevent a scratch from forming thereon and has an excellent durability owing to high hardness even after manufacturing of the metal stamper with micro patterns formed thereon is finished. The method for manufacturing a stamper for injection molding includes a pattern forming step for forming a predetermined micro pattern on a substrate, a metal plating step for making metal plating on the substrate to form a stamper having the micro pattern transcribed thereto, a stamper separating step for separating the stamper of the metal plating from the substrate, and a protective layer coating step for coating a protective layer on the stamper for maintaining a mirror surface.07-26-2012
20110123932METHOD FOR FORMING A FLUID EJECTION DEVICE - Methods are described for forming a fluid ejection device on a substrate having a first surface and a second surface, the first surface having plurality of electrical heater elements. A sacrificial polymer layer is added over the first surface, a conformal material over the sacrificial polymer layer forms a nozzle layer, the sacrificial polymer is then removed to form ink ejection chambers, the nozzle layer is removed to form nozzle holes, a mask layer is used to form an exposed region and an unexposed region, the exposed region defining a central ink via, which is then etched to form the central ink via.05-26-2011
20120231397Wafer Fabrication Process - A wafer fabrication process with removal of haze formation from a pellicalized photomask surface is provided. The wafer fabrication process includes pre-print wafer processing, wafer print processing using at least one photomask having a pellicle, photomask clean processing, wafer print processing using the photomask, and post-print wafer processing. The photomask clean processing step includes directing a laser through the pellicle towards an inorganic particle disposed on the photomask to remove the particle from the photomask by thermal decomposition.09-13-2012
20080299497METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD - A manufacturing method of a liquid discharge head having therein liquid discharge ports and liquid flow passageways communicated with the discharge ports, includes: providing, by depositing, on a substrate, lamination of first and second material layers containing first and second positive type photosensitive resins, respectively, first material layer containing a light absorber absorbing a light in a specific wavelength range to which first positive type photosensitive resin is photosensitive, second positive type photosensitive resin able to be photosensitive to the light in specific wavelength range; exposing second material layer to light in specific wavelength range thereby forming a pattern made of material of second material layer; exposing first material layer to light in specific wavelength range thereby forming a pattern made of first material layer; forming a coating layer covering obtained patterns formed on substrate; forming discharge ports in coating layer; and removing patterns to eventually obtain flow passageways.12-04-2008
20120100485COLOR MOTION PICTURE PRINT FILMS - A multi-color photographic silver halide element has a total gelatin level on the imaging side of the support is less than 9000 mg/m04-26-2012
20130011799METHOD FOR THE PRODUCTION OF POLYMERIC MEMBRANES HAVING AN ORDERED ARRANGEMENT OF HIGH-ASPECT-RATIO NANOPORES, BY MEANS OF HEAVY ION BOMBING - A nanoporous polymeric membrane is obtained by bombing a polymer film by means of high energy focused heavy ion beams and subsequently performing chemical etching to remove the portions of the polymer film in the zones degraded by the ion bombing, in such a manner to obtain pores passing through the polymer film. The heavy ion bombing is performed after interposing between the source of ions and the polymer film, adjacent to the film, an amplitude mask having an ordered arrangement of nanopores and having sufficient thickness to prevent the passage of the heavy ions that are not directed through the pores of said amplitude mask, in such a manner to obtain in the polymer fill an ordered arrangement of nanopores having an aspect-ratio at least exceeding 10 and preferably exceeding 100.01-10-2013
20130017496METHOD FOR MANUFACTURING RECORDING HEADAANM Matsumoto; KeijiAACI Yokohama-shiAACO JPAAGP Matsumoto; Keiji Yokohama-shi JPAANM Asai; KazuhiroAACI Kawasaki-shiAACO JPAAGP Asai; Kazuhiro Kawasaki-shi JPAANM Honda; TetsuroAACI Oita-shiAACO JPAAGP Honda; Tetsuro Oita-shi JPAANM Uohashi; KunihitoAACI Yokohama-shiAACO JPAAGP Uohashi; Kunihito Yokohama-shi JPAANM Koyama; ShujiAACI Kawasaki-shiAACO JPAAGP Koyama; Shuji Kawasaki-shi JPAANM Ohsumi; MasakiAACI Yokosuka-shiAACO JPAAGP Ohsumi; Masaki Yokosuka-shi JP - A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which contains a photosensitive resin; forming an ejection orifice forming layer which contains a photopolymerization initiator and a negative photosensitive resin; exposing the ejection orifice forming layer to light, and optically determining an ejection orifice; and developing the ejection orifice forming layer, shape stabilizing layer, and flow-channel side-wall forming layer, in the order named. The photosensitive resin in the shape stabilizing layer is a material to be cured by a component that is produced upon the exposure of the ejection orifice forming layer and derives from the photopolymerization initiator.01-17-2013
20130095432DEVICE AND METHOD FOR PRODUCING FLEXOGRAPHIC PRINTING SLEEVES - Device for producing flexographic printing sleeves starting from photopolymerizable sleeves comprising at least a clean-out unit, a drying unit, and a post-exposure unit, wherein the flexographic printing sleeves are transported within the apparatus by means of a transport device, wherein the sleeves are mounted dually translationally in the longitudinal direction in the transport device, and a method for the production of flexographic printing sleeves using said device.04-18-2013
20130095431FABRICATING METHOD FOR CONTROLLING HOLE-WALL ANGLE OF CONTACT HOLE IN LCD DEVICE - A fabricating method for controlling a hole-wall angle of a contact hole in a liquid crystal display (LCD) device is disclosed, which comprises the following steps of: A) applying a photoresist on a substrate to form a photoresist layer; B) exposing the photoresist layer by using a photo-hardening monomer of a predetermined pattern; and C) using a developer to develop the photoresist layer to obtain a hole-wall having a preset angle of the contact hole by controlling a development duration, a development temperature and a concentration of the developer. The present disclosure accurately controls the hole-wall inclination angle of the contact hole to range between 45° and 70° by means of the melting point characteristics of the photoresist comprising a photo-hardening monomer.04-18-2013
20130095430METHOD FOR FABRICATING LCD - The present invention relates to a method for fabricating an LCD. The method includes fabricating a MAV layer on a glass substrate. The step of fabricating the MAV layer on the glass substrate comprises the steps of: (A) coating MAV organic monomers on the glass substrate; (B) patterning the MAV organic monomers through a photomask; and (C) curing the patterned MAV organic monomers. In accordance with a photo-curing material of the MAV layer, the fabricating method of the present invention has simple processes with low technical requirements.04-18-2013
20130130181METHOD OF FORMING ALIGNMENT FILM - A method of forming an alignment film is provided. A photosensitive polymer material is provided, wherein the photosensitive polymer material defines a first pixel area and a second pixel area respectively defining a first sub-pixel area and the second sub-pixel area. In a first exposure, the photosensitive polymer material is irradiate by a first exposure light and a second exposure light to form a first alignment portion and a second alignment portion with different alignment directions in the first sub-pixel of the first pixel area and the second sub-pixel of the second pixel area respectively. In a second exposure, the photosensitive polymer material is irradiated with the first exposure light and the second exposure light to form a third alignment portion and a fourth alignment portion with different alignment directions in the first sub-pixel of the second pixel area and the second sub-pixel of the first pixel area respectively.05-23-2013
20110223542PATCH PRODUCTION - A method of producing projections on a patch including providing a mask on a substrate and etching the substrate using an etchant and a passivant to thereby control the etching process and form the projections, wherein the passivant does not include oxygen.09-15-2011
20130149648METHOD OF MAKING NOZZLE CHIP - The present disclosure provides a method of making a nozzle chip including a step of forming an ejection orifice row by performing irradiation with light rays using a mask having ejection orifice row patterns that form an ejection orifice row pattern of one nozzle chip when the ejection orifice row patterns are connected to each other through a connection portion. The mask is configured such that, with respect to a direction in which ejection orifices of the ejection orifice row are arranged, an absolute value of off-axis telecentricity of one of the light rays with which an ejection orifice that is at the smallest distance from the connection portion is irradiated is less than an absolute value of off-axis telecentricity of one of the light rays with which an ejection orifice that is at the greatest distance from the connection portion is irradiated.06-13-2013
20120021360METHOD OF MANUFACTURING LIQUID EJECTION HEAD - A method of manufacturing a liquid ejection head includes: exposing a negative organic resin layer to be a flow path forming member except for regions in which an ejection orifice and a fluid resistance portion are to be formed, respectively, and heating the negative organic resin layer and a flow path pattern to move a portion of the negative organic resin layer which corresponds to the fluid resistance portion toward a substrate; and exposing and developing the region of the negative organic resin layer in which the fluid resistance portion is to be formed.01-26-2012

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